CN103923569A - Preparation method of jade polishing powder - Google Patents
Preparation method of jade polishing powder Download PDFInfo
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- CN103923569A CN103923569A CN201410186361.XA CN201410186361A CN103923569A CN 103923569 A CN103923569 A CN 103923569A CN 201410186361 A CN201410186361 A CN 201410186361A CN 103923569 A CN103923569 A CN 103923569A
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Abstract
The invention discloses a preparation method of jade polishing powder. The method is characterized by comprising the steps of feeding 12-26% of cerium chloride and 20-32% of zirconium oxychloride into a reactor according to the mass percent concentration, and dissolving the mixture in water; then, feeding 15-30% of aluminium oxide, 8-15% of silicon nitride, 2-6% of chromic oxide and 0.5-3% of dispersing agent into the water solution, and stirring to obtain slurry; dissolving 15-30% of ammonium oxalate into water, and then feeding the product into the slurry, wherein the sum of the content of all the components except water of the slurry is 100%; stirring under the normal pressure, heating up to 85 DEG C, and carrying out a reaction for 30-36h; then, heating up to 120 DEG C, and carrying out the reaction for 2-4h; carrying out calcination for 2-4h at the temperature of 950-1000 DEG C, cooling and crushing by airflow to obtain the jade polishing powder. The preparation technology is simple, easy in control of conditions, low in production cost and easy in industrial production. When being used for the polishing process, the polishing powder is good in powder polishing effect, high in glossiness, free from scratch, high in flatness and less in power dosage.
Description
Technical field
What the present invention relates to is a kind of preparing technical field of polishing powder, particularly a kind of preparation technology of jade emerald polishing powder and for the polishing of jade emerald.
Background technology
The second half in 19th century, French mineralogist De Muer is divided into nephrite and jadeite two classes by " jade " of China.Jadeite, China is commonly called as " emerald ", is the up-and-coming youngster in China tradition jade, is again top grade in all jades in modern age.Emerald, no matter be " mountain material " (primary ore) or " seed material " (secondary ore), is mainly the compact block by jadeite mineral composition.Examine under a microscope, the jadeite mineral of composition emerald are weave in closely, forms the filamentary structure of emerald.This filamentary structure closely, makes emerald have fine and smooth and tough and tensile feature.Jadeite is comprised of the silicate minerals of a kind of steel and aluminium, and pure person is colourless or white.The chemical composition of its block is: silicon-dioxide accounts for 58.28%, and sodium oxide accounts for 13.94%, and calcium oxide accounts for 1.62%, and magnesium oxide accounts for 0.91%, and ferric oxide accounts for 0.64%, contains in addition micro-chromium, nickel etc.Wherein, chromium is to make emerald have emerald principal element.Conventionally emerald, containing chromic oxide 0.2~0.5%, reaches more than 2~3.75% individually.Emerald hardness is 7, proportion 3.33.
The health mechanism of jade is confirmed by modern science.According to chemical analysis, jade contains the multiple trace element useful to human body, as zinc, magnesium, iron, copper, selenium, chromium, manganese, cobalt etc., wears jade and can make trace element be absorbed by human body skin, active cells tissue, the immunologic function of raising human body.Therefore have the traditional Chinese medical science said " disease having is taken medicine and can not be cured, and often wears jadeware and but reaches a cure ", reason is just this.If wear the long-term optimum massage of jade bracelet, can not only be passive except the disease of blurred vision, and can hold vigour, support spirit.Jade not only can beautify people's life, moulds a person's temperament, and the peace of keeping tie that gets rid of illness.Its product is directly used in having of health: Yuzhen, jade mattress, ball for health, masseur, walking stick, beautiful comb, and the curative effect that human body is had beauty treatment, calmness, calmed the nerves, life-time service, can make you in high spirits, promotes longevity.
Jade emerald product producing process comprises: cutting → hand hay cutter → engraving tool → punching → mill → carving → sanding and polishing.The quality of jade emerald polishing process quality directly affects the quality of its product, and polishing process is very important in jade emerald production process thus, and in polishing process, polishing powder used directly affects the quality of finish of jadeware.
The polishing of jade emerald is an extremely complicated mechanochemical process.In this process, except mechanical effect, also has the chemical action between jade emerald component, polishing powder composition and polished die composition.Therefore,, in polishing powder system, the variation of chemical constitution, will cause the adhesive power between polished die and jade emerald to change, and also causes changing in work area temperature, polishing powder concentration, finally affects polishing efficiency.Therefore, the chemical constitution of polishing powder is most important to jade ware polishing effect.Jade emerald hardness is spent high, and the color of emerald is rich and varied, and crystal grain is tiny, even.Highly polished after polished finish, thus at processing jade, need polishing powder requirement will have certain degree of hardness, soft fine and smooth again.
With regard to polishing powder, different polishing powders has different polishing abilities.Polishing powder is comprised of components such as cerium oxide, aluminum oxide, silicon oxide, ferric oxide, zirconium white, chromic oxide, stannic oxide conventionally, and the hardness of different materials is different, and the chemical property in water is also different, so use occasion is different.The Mohs' hardness of aluminum oxide and chromic oxide is 9, and cerium oxide and zirconium white are 7, and ferric oxide is lower.In jade polishing process, add polishing powder, now people are at aluminium oxide powder or other is as ferric oxide or a certain powder of chromium sesquioxide, adopting single abrasive material is that single polishing powder carries out polishing, but this single polishing powder does not reach good polishing effect to the polishing of jade.May be that single polishing powder is in polishing friction process.Between the powder of polishing powder, mobility or soft durometer can not be complementary.Several oxide compounds are composite can overcome above-mentioned deficiency, a kind of composite polishing powder and preparation method and glossing of polishing of optical element are disclosed in Chinese patent application CN101362925B, be to have the chromium sesquioxide of 0.5 part ~ 3 parts and the aluminium sesquioxide of 1.0 parts to form, but the wear resistance of this compound polishing powder does not reach the polishing requirement of emerald.
At present, about the report of polishing powder be mainly much polishing powder from rare earth for the polishing of lens, sheet glass, eyes, watchcase, precision optical instrument element etc., have the advantages that polishing velocity is fast, precision is high.Since 20th century invention forties polishing powder from rare earth, turnout and application quantity increase year by year, and the production technique of polishing powder from rare earth changes along with the progress of Rare Earth Separation technique.A kind of production method of high-cerium rare-earth polishing powder is disclosed in Chinese patent application CN1939990A; A kind of high precision rare earth polishing powder and preparation method thereof is disclosed in Chinese patent application CN101475777B.
Silicon nitride, chemical formula is Si
3n
4, be a kind of important structured material.It is a kind of superhard material, and itself has oilness, and wear-resistant, is atomic crystal; Anti-oxidant during high temperature, cutting power is stronger, stable chemical nature, and also it can also resist thermal shock.The application is by silicon nitride and rare-earth oxidation, aluminum oxide, zirconium white, and chromic oxide is prepared a kind of polishing powder for jade polishing, this polishing powder has that hardness is high, good fluidity, soft durometer can not be complementary etc. advantage.
Summary of the invention
Order of the present invention is to provide a kind ofly can reduce polishing cut, improve polishing powder friction hardness, improves preparation method and the technique of the polishing powder of jade smooth finish;
Object of the present invention is achieved through the following technical solutions.
A kind of preparation method of jade emerald polishing powder, be characterised in that the method has following processing step: in reactor, by mass percentage concentration, add 12% ~ 26% Cerium II Chloride, 20% ~ 32% basic zirconium chloride is dissolved in the water, add again 15% ~ 30% aluminium sesquioxide, 8% ~ 15% silicon nitride, 2% ~ 6% chromium sesquioxide, 0.5% ~ 3% dispersion agent agent, stirring is slurries, after again 15% ~ 30% ammonium oxalate being dissolved in to water, add, each component sum is absolutely, water is not counted in component, under normal pressure, stir, add 85 ℃ of heat, reaction 30 ~ 36h, make Cerium II Chloride generate evengranular Sedemesis, basic zirconium chloride generates evengranular zirconium dioxide particle, solid-liquid separation, evaporating water, temperature is elevated to 120 ℃ again, reaction 2 ~ 4h, at 950 ℃ ~ 1000 ℃ roasting 2 ~ 4h, after cooling, through comminution by gas stream, obtain jade emerald polishing powder, the particle diameter of resulting jade emerald polishing powder is in the scope of 0.5 ~ 2.5 μ m.
In a kind of preparation method of jade emerald polishing powder, described Cerium II Chloride is anhydrous cerium chloride.
In a kind of preparation method of jade emerald polishing powder, described basic zirconium chloride is the basic zirconium chloride containing 8 water.
In a kind of preparation method of jade emerald polishing powder, described aluminium sesquioxide is α-aluminium sesquioxide, and its particle diameter is in 0.5 ~ 2.0 μ m scope.
In a kind of preparation method of jade emerald polishing powder, described dispersion agent is tripoly phosphate sodium STPP or polyvinyl alcohol.
In a kind of preparation method of jade emerald polishing powder, described chromium sesquioxide, the particle diameter of silicon carbide are all in 0.5 ~ 2.0 μ m scope.
In a kind of preparation method of jade emerald polishing powder, described chloric acid cerium: the mol ratio of ammonium oxalate will be between 1:1.6 ~ 2.5.
In a kind of preparation method of jade emerald polishing powder, one of effect of ammonium oxalate is that the pH value of regulation system makes basic zirconium chloride generate the surface that zirconium hydroxide precipitation is attached to solid phase, another effect of ammonium oxalate is to make Cerium II Chloride oxalic cerium precipitation be attached to the surface of solid phase, excessive ammonium oxalate by thermal degradation on product without impact.
Particle size test method of the present invention is the granularity equivalent diameter size that adopts laser particle analyzer to record.
The resulting jade emerald of the present invention polishing powder method: can also can be used for dry throwing for wet throwing, during wet throwing, the ratio of powder and water is advisable between 1:1 ~ 2.5, and every square metre of consumption is 20 ~ 40g.
Compared with the prior art, tool has the following advantages and beneficial effect in the present invention:
(1) the present invention obtains jade emerald polishing powder, in preparation process, adopts and adds silicon nitride composition, and the polishing friction hardness of polishing powder is significantly improved, can be for the polishing of various high rigidity jade emeralds.
(2) the present invention obtains jade emerald polishing powder, in preparation process, adding ammonium oxalate is precipitation agent, ammonium oxalate decomposites the pH value that ammonia carrys out regulation system in the process of heating, make basic zirconium chloride generate zirconium hydroxide precipitation, oxalic acid is followed and Cerium II Chloride oxalic cerium, and owing to adding the ammonium oxalate precipitation from homogeneous solution (PFHS) system that made System forming, generates ZrO after oversintering
2, CeO
2
The tiny Al that is evenly distributed on of particle
2o
3, Si
3c
4, Cr
2o
3on surface, have meso-position radius grain little, the feature that particle size distribution is narrow makes between the powder of polishing powder mobility or soft durometer complementary simultaneously, reaches better polishing effect.
(3) the present invention obtains jade emerald polishing powder, and preparation technology is simple, and condition is easy to control, and production cost is low, is easy to suitability for industrialized production.
Embodiment
Embodiment 1
A kind of preparation method of jade emerald polishing powder, in reactor, the Cerium II Chloride that adds respectively 20g, 26g basic zirconium chloride is dissolved in the water, the aluminium sesquioxide that adds again 20g, the silicon nitride of 10g, the chromium sesquioxide of 3g, the agent of 1.0g dispersion agent, stirring is slurries, after again 20g ammonium oxalate being dissolved in to water, add, under normal pressure, stir, add 85 ℃ of heat, reaction 32h, make Cerium II Chloride generate evengranular Sedemesis, basic zirconium chloride generates evengranular zirconium dioxide particle, solid-liquid separation, evaporating water, temperature is elevated to 120 ℃ again, reaction 3h, at 950 ℃ of roasting 3h, after cooling, through comminution by gas stream, obtain jade emerald polishing powder.
Embodiment 2
A kind of preparation method of jade emerald polishing powder, in reactor, the Cerium II Chloride that adds respectively 400g, 520g basic zirconium chloride is dissolved in the water, the aluminium sesquioxide that adds again 400g, the silicon nitride of 200g, the chromium sesquioxide of 60g, the agent of 20g dispersion agent, stirring is slurries, after again 400g ammonium oxalate being dissolved in to water, add, under normal pressure, stir, add 85 ℃ of heat, reaction 32h, make Cerium II Chloride generate evengranular Sedemesis, basic zirconium chloride generates evengranular zirconium dioxide particle, solid-liquid separation, evaporating water, temperature is elevated to 120 ℃ again, reaction 3h, at 1000 ℃ of roasting 3h, after cooling, through comminution by gas stream, obtain jade emerald polishing powder.
Embodiment 3
A kind of preparation method of jade emerald polishing powder, in reactor, the Cerium II Chloride that adds respectively 15g, 32g basic zirconium chloride is dissolved in the water, the aluminium sesquioxide that adds again 15g, the silicon nitride of 8g, the chromium sesquioxide of 2g, the agent of 0.5g dispersion agent, stirring is slurries, after again 28g ammonium oxalate being dissolved in to water, add, under normal pressure, stir, add 85 ℃ of heat, reaction 30h, make Cerium II Chloride generate evengranular Sedemesis, basic zirconium chloride generates evengranular zirconium dioxide particle, solid-liquid separation, evaporating water, temperature is elevated to 120 ℃ again, reaction 2h, at 950 ℃ of roasting 4h, after cooling, through comminution by gas stream, obtain jade emerald polishing powder.
Embodiment 4
A kind of preparation method of jade emerald polishing powder, in reactor, the Cerium II Chloride that adds respectively 25g, 20g basic zirconium chloride is dissolved in the water, the aluminium sesquioxide that adds again 15g, the silicon nitride of 8g, the chromium sesquioxide of 3g, the agent of 2g dispersion agent, stirring is slurries, after again 27g ammonium oxalate being dissolved in to water, add, under normal pressure, stir, add 85 ℃ of heat, reaction 36h, make Cerium II Chloride generate evengranular Sedemesis, basic zirconium chloride generates evengranular zirconium dioxide particle, solid-liquid separation, evaporating water, temperature is elevated to 120 ℃ again, reaction 4h, at 1000 ℃ of roasting 3h, after cooling, through comminution by gas stream, obtain jade emerald polishing powder.
Embodiment 5
A kind of preparation method of jade emerald polishing powder, in reactor, the Cerium II Chloride that adds respectively 18g, 22g basic zirconium chloride is dissolved in the water, the aluminium sesquioxide that adds again 18g, the silicon nitride of 11g, the chromium sesquioxide of 6g, the agent of 3g dispersion agent, stirring is slurries, after again 22g ammonium oxalate being dissolved in to water, add, under normal pressure, stir, add 85 ℃ of heat, reaction 34h, make Cerium II Chloride generate evengranular Sedemesis, basic zirconium chloride generates evengranular zirconium dioxide particle, solid-liquid separation, evaporating water, temperature is elevated to 120 ℃ again, reaction 2.5h, at 1000 ℃ of roasting 2.5h, after cooling, through comminution by gas stream, obtain jade emerald polishing powder.
Embodiment 6
A kind of preparation method of jade emerald polishing powder, in reactor, the Cerium II Chloride that adds respectively 130g, 200g basic zirconium chloride is dissolved in the water, the aluminium sesquioxide that adds again 300g, the silicon nitride of 150g, the chromium sesquioxide of 40g, the agent of 20g dispersion agent, stirring is slurries, after again 160g ammonium oxalate being dissolved in to water, add, under normal pressure, stir, add 85 ℃ of heat, reaction 35h, make Cerium II Chloride generate evengranular Sedemesis, basic zirconium chloride generates evengranular zirconium dioxide particle, solid-liquid separation, evaporating water, temperature is elevated to 120 ℃ again, reaction 4h, at 950 ℃ of roasting 4h, after cooling, through comminution by gas stream, obtain jade emerald polishing powder.
Using method: can also can be used for dry throwing for wet throwing, during wet throwing by the ratio of polishing powder and water at 1:1 ~ 2.5 furnishing starchiness, wet throwing selected in suggestion, because do polishing powder dirt, can pollute.
The present invention obtains jade emerald polishing powder, and powder polishing effect is good, glossiness, and more than can reaching 99 degree, no marking, planeness is high, and the consumption of powder is few.
Claims (8)
1. the preparation method of a jade emerald polishing powder, be characterised in that the method has following processing step: in reactor, by mass percentage concentration, add 12% ~ 26% Cerium II Chloride, 20% ~ 32% basic zirconium chloride is dissolved in the water, add again 15% ~ 30% aluminium sesquioxide, 8% ~ 15% silicon nitride, 2% ~ 6% chromium sesquioxide, 0.5% ~ 3% dispersion agent agent, stirring is slurries, after again 15% ~ 30% ammonium oxalate being dissolved in to water, add, each component sum is absolutely, water is not counted in component, under normal pressure, stir, add 85 ℃ of heat, reaction 30 ~ 36h, make Cerium II Chloride generate evengranular Sedemesis, basic zirconium chloride generates evengranular zirconium dioxide particle, solid-liquid separation, evaporating water, temperature is elevated to 120 ℃ again, reaction 2 ~ 4h, at 950 ℃ ~ 1000 ℃ roasting 2 ~ 4h, after cooling, through comminution by gas stream, obtain jade emerald polishing powder, the particle diameter of resulting jade emerald polishing powder is in the scope of 0.5 ~ 2.5 μ m.
2. a kind of preparation method of jade emerald polishing powder according to claim 1, is characterized in that described Cerium II Chloride is anhydrous cerium chloride.
3. a kind of preparation method of jade emerald polishing powder according to claim 1, is characterized in that described basic zirconium chloride is for the basic zirconium chloride containing 8 crystal water, and molecular formula is: ZrOCl
28H
2o.
4. a kind of preparation method of jade emerald polishing powder according to claim 1, is characterized in that described aluminium sesquioxide is α-aluminium sesquioxide, and its particle diameter is in 0.5 ~ 2.0 μ m scope.
5. a kind of preparation method of jade emerald polishing powder according to claim 1, is characterized in that described dispersion agent is tripoly phosphate sodium STPP or polyvinyl alcohol.
6. a kind of preparation method of jade emerald polishing powder according to claim 1, is characterized in that the particle diameter of described chromium sesquioxide, silicon carbide is all in 0.5 ~ 2.0 μ m scope.
7. a kind of preparation method of jade emerald polishing powder according to claim 1, is characterized in that described chloric acid cerium: the mol ratio of ammonium oxalate will be between 1:1.6 ~ 2.5.
8. the application in the polishing of jade emerald according to the jade emerald polishing powder of claim 1 preparation.
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Cited By (11)
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CN104403573A (en) * | 2014-11-27 | 2015-03-11 | 安顺市西秀区璞玉奇石加工厂 | Jade polishing powder |
CN104694017A (en) * | 2015-03-23 | 2015-06-10 | 济南大学 | Preparation method of polishing powder for polishing of silicon nitride ceramics |
CN104694018A (en) * | 2015-03-23 | 2015-06-10 | 济南大学 | Preparing method for polishing powder used for polishing of zirconium dioxide ceramic |
CN105754490A (en) * | 2016-05-05 | 2016-07-13 | 济南大学 | Preparation method of polishing powder for polishing of red agate |
CN105754489A (en) * | 2016-05-05 | 2016-07-13 | 济南大学 | Preparation method of polishing powder for polishing of emeralds |
CN105820760A (en) * | 2016-05-05 | 2016-08-03 | 济南大学 | Method for preparing polishing solution used for disk substrate polishing |
CN105860855A (en) * | 2016-05-05 | 2016-08-17 | 济南大学 | Preparation method of boron nitride composite polishing solution |
CN105925199A (en) * | 2016-05-05 | 2016-09-07 | 济南大学 | Preparing method of polishing solution for marble |
CN106479374A (en) * | 2016-10-28 | 2017-03-08 | 扬州翠佛堂珠宝有限公司 | A kind of jasper polishing fluid |
CN106479373A (en) * | 2016-10-28 | 2017-03-08 | 扬州翠佛堂珠宝有限公司 | A kind of emerald polishing fluid |
CN106566419A (en) * | 2016-10-28 | 2017-04-19 | 扬州翠佛堂珠宝有限公司 | Jade polishing powder |
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CN104403573A (en) * | 2014-11-27 | 2015-03-11 | 安顺市西秀区璞玉奇石加工厂 | Jade polishing powder |
CN104694017A (en) * | 2015-03-23 | 2015-06-10 | 济南大学 | Preparation method of polishing powder for polishing of silicon nitride ceramics |
CN104694018A (en) * | 2015-03-23 | 2015-06-10 | 济南大学 | Preparing method for polishing powder used for polishing of zirconium dioxide ceramic |
CN104694017B (en) * | 2015-03-23 | 2017-04-19 | 济南大学 | Preparation method of polishing powder for polishing of silicon nitride ceramics |
CN105860855A (en) * | 2016-05-05 | 2016-08-17 | 济南大学 | Preparation method of boron nitride composite polishing solution |
CN105820760A (en) * | 2016-05-05 | 2016-08-03 | 济南大学 | Method for preparing polishing solution used for disk substrate polishing |
CN105754489A (en) * | 2016-05-05 | 2016-07-13 | 济南大学 | Preparation method of polishing powder for polishing of emeralds |
CN105925199A (en) * | 2016-05-05 | 2016-09-07 | 济南大学 | Preparing method of polishing solution for marble |
CN105754490A (en) * | 2016-05-05 | 2016-07-13 | 济南大学 | Preparation method of polishing powder for polishing of red agate |
CN105754490B (en) * | 2016-05-05 | 2017-07-25 | 济南大学 | A kind of preparation method of the polishing powder polished for carnelian |
CN105820760B (en) * | 2016-05-05 | 2017-10-17 | 济南大学 | A kind of polishing liquid and preparation method thereof polished for magnetic disk substrate |
CN105754489B (en) * | 2016-05-05 | 2017-12-26 | 济南大学 | A kind of preparation method of polishing powder for emerald polishing |
CN106479374A (en) * | 2016-10-28 | 2017-03-08 | 扬州翠佛堂珠宝有限公司 | A kind of jasper polishing fluid |
CN106479373A (en) * | 2016-10-28 | 2017-03-08 | 扬州翠佛堂珠宝有限公司 | A kind of emerald polishing fluid |
CN106566419A (en) * | 2016-10-28 | 2017-04-19 | 扬州翠佛堂珠宝有限公司 | Jade polishing powder |
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