CN104362114B - A kind of large diameter zone melting cleaning device and its cleaning method of polycrystalline bar - Google Patents
A kind of large diameter zone melting cleaning device and its cleaning method of polycrystalline bar Download PDFInfo
- Publication number
- CN104362114B CN104362114B CN201410525225.9A CN201410525225A CN104362114B CN 104362114 B CN104362114 B CN 104362114B CN 201410525225 A CN201410525225 A CN 201410525225A CN 104362114 B CN104362114 B CN 104362114B
- Authority
- CN
- China
- Prior art keywords
- acid
- polycrystalline
- polycrystalline bar
- large diameter
- zone melting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 47
- 238000004857 zone melting Methods 0.000 title claims abstract description 27
- 238000000034 method Methods 0.000 title claims abstract description 20
- 239000002253 acid Substances 0.000 claims abstract description 71
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 52
- 230000007797 corrosion Effects 0.000 claims abstract description 44
- 238000005260 corrosion Methods 0.000 claims abstract description 44
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 26
- 239000000463 material Substances 0.000 claims abstract description 18
- 238000001035 drying Methods 0.000 claims abstract description 14
- 238000004506 ultrasonic cleaning Methods 0.000 claims abstract description 12
- 239000012535 impurity Substances 0.000 claims abstract description 10
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 19
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical group O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 11
- 229910017604 nitric acid Inorganic materials 0.000 claims description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 8
- 239000000203 mixture Substances 0.000 claims description 7
- 238000005554 pickling Methods 0.000 claims description 6
- 238000005096 rolling process Methods 0.000 claims description 6
- 238000005530 etching Methods 0.000 claims description 4
- 235000011194 food seasoning agent Nutrition 0.000 claims description 4
- 238000006396 nitration reaction Methods 0.000 claims description 4
- 238000010301 surface-oxidation reaction Methods 0.000 claims description 4
- 239000001257 hydrogen Substances 0.000 claims description 3
- 229910052739 hydrogen Inorganic materials 0.000 claims description 3
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims description 2
- 229910052731 fluorine Inorganic materials 0.000 claims description 2
- 239000011737 fluorine Substances 0.000 claims description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 6
- 229910052710 silicon Inorganic materials 0.000 abstract description 6
- 239000010703 silicon Substances 0.000 abstract description 6
- 239000013078 crystal Substances 0.000 abstract description 4
- 239000002184 metal Substances 0.000 abstract description 4
- 239000004065 semiconductor Substances 0.000 abstract description 2
- 229960002050 hydrofluoric acid Drugs 0.000 description 9
- 239000003153 chemical reaction reagent Substances 0.000 description 3
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 229920005591 polysilicon Polymers 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229940023184 after bite Drugs 0.000 description 1
- 239000011260 aqueous acid Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 235000013312 flour Nutrition 0.000 description 1
- 238000011010 flushing procedure Methods 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 230000008092 positive effect Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
Landscapes
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
Description
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201410525225.9A CN104362114B (en) | 2014-09-30 | 2014-09-30 | A kind of large diameter zone melting cleaning device and its cleaning method of polycrystalline bar |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201410525225.9A CN104362114B (en) | 2014-09-30 | 2014-09-30 | A kind of large diameter zone melting cleaning device and its cleaning method of polycrystalline bar |
Publications (2)
Publication Number | Publication Date |
---|---|
CN104362114A CN104362114A (en) | 2015-02-18 |
CN104362114B true CN104362114B (en) | 2017-07-18 |
Family
ID=52529363
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201410525225.9A Active CN104362114B (en) | 2014-09-30 | 2014-09-30 | A kind of large diameter zone melting cleaning device and its cleaning method of polycrystalline bar |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN104362114B (en) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104624571B (en) * | 2015-03-04 | 2016-06-01 | 烽火通信科技股份有限公司 | The automatic tube cleaner of crystal reaction tube and automatically wash pipe method |
CN109560006B (en) * | 2017-09-26 | 2023-10-20 | 天津环鑫科技发展有限公司 | Automatic source production line of scribbling of silicon chip |
CN111151504A (en) * | 2020-01-19 | 2020-05-15 | 洛阳中硅高科技有限公司 | Polycrystalline silicon cleaning machine and method for cleaning polycrystalline silicon |
CN111977988B (en) * | 2020-08-04 | 2021-06-08 | 湖南巨强再生资源科技发展有限公司 | Waste glass recycling production line based on horseshoe flame smelting furnace |
CN112222097B (en) * | 2020-09-04 | 2022-03-08 | 山东国晶新材料有限公司 | Method for removing residues on surface of clamping rod |
CN112959527B (en) * | 2021-02-05 | 2023-04-28 | 浙江快驴科技有限公司 | Battery intelligent management chip production and feeding device and use method |
CN113319058A (en) * | 2021-06-16 | 2021-08-31 | 中国恩菲工程技术有限公司 | Polycrystalline silicon cleaning device |
CN114226334A (en) * | 2021-12-29 | 2022-03-25 | 有研半导体硅材料股份公司 | Polycrystalline silicon rod cleaning device and method |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1395155A (en) * | 2001-07-05 | 2003-02-05 | 丽台科技股份有限公司 | Conversion device of DDR and QDR and adapter card, main board and internal memory module interface using it |
CN1466173A (en) * | 2002-06-04 | 2004-01-07 | 联华电子股份有限公司 | Method for cleaning wafer after metal plasma etching |
CN101127181A (en) * | 2006-08-17 | 2008-02-20 | 精工爱普生株式会社 | Electro-optical device and electronic apparatus |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10202209A (en) * | 1997-01-20 | 1998-08-04 | Otsuka Giken Kogyo Kk | Cleaning device |
JP4815000B2 (en) * | 2010-01-13 | 2011-11-16 | 株式会社カイジョー | Ultrasonic cleaning equipment |
CN201924079U (en) * | 2010-12-10 | 2011-08-10 | 自贡佳源炉业有限公司 | On-line ultrasonic cleaning and drying machine |
JP2014063920A (en) * | 2012-09-21 | 2014-04-10 | Kurita Water Ind Ltd | Cleaning method and cleaning device |
CN203695506U (en) * | 2014-01-24 | 2014-07-09 | 北京亦庄国际诊断试剂技术有限公司 | ELISA plate cleaning system |
-
2014
- 2014-09-30 CN CN201410525225.9A patent/CN104362114B/en active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1395155A (en) * | 2001-07-05 | 2003-02-05 | 丽台科技股份有限公司 | Conversion device of DDR and QDR and adapter card, main board and internal memory module interface using it |
CN1466173A (en) * | 2002-06-04 | 2004-01-07 | 联华电子股份有限公司 | Method for cleaning wafer after metal plasma etching |
CN101127181A (en) * | 2006-08-17 | 2008-02-20 | 精工爱普生株式会社 | Electro-optical device and electronic apparatus |
Also Published As
Publication number | Publication date |
---|---|
CN104362114A (en) | 2015-02-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN104362114B (en) | A kind of large diameter zone melting cleaning device and its cleaning method of polycrystalline bar | |
CN108499957B (en) | Full-automatic ultrasonic cleaning system | |
CN205762829U (en) | With station turning by formula Spray-cleaning Machine | |
CN105220235B (en) | A kind of single polycrystalline etching method | |
CN204257598U (en) | A kind of cleaning device of large diameter zone melting polycrystalline bar | |
CN102560615B (en) | Devicefor improving washing quality of cold-rolling strip steel surface | |
CN101191232A (en) | Surface treatment water liquid for removing stainless steel surface oxidation involucra and application thereof | |
CN110976414A (en) | Ultra-high clean cleaning process for semiconductor aluminum alloy parts | |
CN106733821A (en) | A kind of aluminum oxide semiconductor cleaning apparatus | |
CN104438187A (en) | Crystal edge cleaning device | |
CN208466675U (en) | Engine cylinder body cleaning machine | |
CN109234722A (en) | A kind of copper strip surface treatment process | |
CN203695538U (en) | Pass-type cleaning machine | |
CN206714021U (en) | A kind of novel vegetable cleaning device | |
CN103834948B (en) | A kind of double fluted trench etch machine | |
CN105986300A (en) | Fixing frame for coating bicycle frames | |
CN205413937U (en) | Steel band cleaning system | |
CN102212832A (en) | Silicon material cleaning technology | |
CN205096250U (en) | Brusher | |
CN105293936B (en) | A kind of frosting processing unit (plant) | |
CN104028503B (en) | The cleaning method of silicon material | |
CN205684373U (en) | A kind of device for cleaning screen board | |
CN206373107U (en) | A kind of device of automatic oil abrasion and cleaning titanium roller roll surface | |
CN103599897A (en) | Fresh corn cob cleaning machine | |
CN203621023U (en) | Battery cleaning equipment |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right |
Effective date of registration: 20181101 Address after: 300384 Tianjin Binhai New Area high tech Zone Huayuan Industrial Area (outside the ring) Hai Tai Road 12 Patentee after: TIANJIN ZHONGHUAN ADVANCED MATERIAL TECHNOLOGY Co.,Ltd. Address before: 300384 Tianjin Binhai New Area high tech Zone Huayuan Industrial Park (outside the ring) Hai Tai Road 12 Patentee before: TIANJIN HUANOU SEMICONDUCTOR MATERIAL TECHNOLOGY Co.,Ltd. |
|
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20191209 Address after: 214200 Dongfen Avenue, Yixing Economic and Technological Development Zone, Wuxi City, Jiangsu Province Co-patentee after: TIANJIN ZHONGHUAN ADVANCED MATERIAL TECHNOLOGY Co.,Ltd. Patentee after: Zhonghuan leading semiconductor materials Co.,Ltd. Address before: 300384 in Tianjin Binhai high tech Zone Huayuan Industrial Zone (outer ring) Haitai Road No. 12 Patentee before: TIANJIN ZHONGHUAN ADVANCED MATERIAL TECHNOLOGY Co.,Ltd. |
|
TR01 | Transfer of patent right | ||
CP03 | Change of name, title or address |
Address after: 214200 Dongjia Avenue, Yixing Economic and Technological Development Zone, Wuxi City, Jiangsu Province Patentee after: Zhonghuan Leading Semiconductor Technology Co.,Ltd. Country or region after: China Patentee after: TIANJIN ZHONGHUAN ADVANCED MATERIAL TECHNOLOGY Co.,Ltd. Address before: 214200 Dongjia Avenue, Yixing Economic and Technological Development Zone, Wuxi City, Jiangsu Province Patentee before: Zhonghuan leading semiconductor materials Co.,Ltd. Country or region before: China Patentee before: TIANJIN ZHONGHUAN ADVANCED MATERIAL TECHNOLOGY Co.,Ltd. |
|
CP03 | Change of name, title or address |