CN104357802A - 一种氟化物轴封超薄旋转阴极端头 - Google Patents
一种氟化物轴封超薄旋转阴极端头 Download PDFInfo
- Publication number
- CN104357802A CN104357802A CN201410618362.7A CN201410618362A CN104357802A CN 104357802 A CN104357802 A CN 104357802A CN 201410618362 A CN201410618362 A CN 201410618362A CN 104357802 A CN104357802 A CN 104357802A
- Authority
- CN
- China
- Prior art keywords
- base
- shaft seal
- end cover
- assembly
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 title abstract description 3
- 239000007788 liquid Substances 0.000 claims abstract description 57
- 238000007789 sealing Methods 0.000 claims abstract description 15
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical group [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 5
- 229910052802 copper Inorganic materials 0.000 claims description 5
- 239000010949 copper Substances 0.000 claims description 5
- 239000012530 fluid Substances 0.000 claims description 5
- ZQXCQTAELHSNAT-UHFFFAOYSA-N 1-chloro-3-nitro-5-(trifluoromethyl)benzene Chemical compound [O-][N+](=O)C1=CC(Cl)=CC(C(F)(F)F)=C1 ZQXCQTAELHSNAT-UHFFFAOYSA-N 0.000 claims description 4
- 230000005611 electricity Effects 0.000 claims description 3
- 210000004907 gland Anatomy 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 abstract description 5
- 239000000463 material Substances 0.000 abstract description 4
- 238000005086 pumping Methods 0.000 abstract description 3
- 230000001360 synchronised effect Effects 0.000 abstract 1
- 238000001771 vacuum deposition Methods 0.000 abstract 1
- 230000005540 biological transmission Effects 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 238000012423 maintenance Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000002360 explosive Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 230000009466 transformation Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000009504 vacuum film coating Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Sealing Of Bearings (AREA)
- Rolling Contact Bearings (AREA)
Abstract
Description
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201410618362.7A CN104357802B (zh) | 2014-11-06 | 2014-11-06 | 一种氟化物轴封超薄旋转阴极端头 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201410618362.7A CN104357802B (zh) | 2014-11-06 | 2014-11-06 | 一种氟化物轴封超薄旋转阴极端头 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN104357802A true CN104357802A (zh) | 2015-02-18 |
CN104357802B CN104357802B (zh) | 2017-03-15 |
Family
ID=52525106
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201410618362.7A Active CN104357802B (zh) | 2014-11-06 | 2014-11-06 | 一种氟化物轴封超薄旋转阴极端头 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN104357802B (zh) |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5200049A (en) * | 1990-08-10 | 1993-04-06 | Viratec Thin Films, Inc. | Cantilever mount for rotating cylindrical magnetrons |
CN102108489A (zh) * | 2009-12-25 | 2011-06-29 | 甘国工 | 真空镀膜磁控溅射磁流体密封旋转靶 |
CN201981252U (zh) * | 2011-01-25 | 2011-09-21 | 上海子创镀膜技术有限公司 | 一种新型传动旋转端头 |
US20110240465A1 (en) * | 2010-04-01 | 2011-10-06 | Applied Materials, Inc. | End-block and sputtering installation |
CN102230161B (zh) * | 2011-06-28 | 2012-12-19 | 黄峰 | 用于旋转靶的水电端头连接装置 |
CN102953039A (zh) * | 2012-10-26 | 2013-03-06 | 湘潭宏大真空技术股份有限公司 | 一种真空磁控溅射镀膜用的旋转阴极 |
CN204265834U (zh) * | 2014-11-06 | 2015-04-15 | 邵海平 | 一种氟化物轴封超薄旋转阴极端头 |
-
2014
- 2014-11-06 CN CN201410618362.7A patent/CN104357802B/zh active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5200049A (en) * | 1990-08-10 | 1993-04-06 | Viratec Thin Films, Inc. | Cantilever mount for rotating cylindrical magnetrons |
CN102108489A (zh) * | 2009-12-25 | 2011-06-29 | 甘国工 | 真空镀膜磁控溅射磁流体密封旋转靶 |
US20110240465A1 (en) * | 2010-04-01 | 2011-10-06 | Applied Materials, Inc. | End-block and sputtering installation |
CN201981252U (zh) * | 2011-01-25 | 2011-09-21 | 上海子创镀膜技术有限公司 | 一种新型传动旋转端头 |
CN102230161B (zh) * | 2011-06-28 | 2012-12-19 | 黄峰 | 用于旋转靶的水电端头连接装置 |
CN102953039A (zh) * | 2012-10-26 | 2013-03-06 | 湘潭宏大真空技术股份有限公司 | 一种真空磁控溅射镀膜用的旋转阴极 |
CN204265834U (zh) * | 2014-11-06 | 2015-04-15 | 邵海平 | 一种氟化物轴封超薄旋转阴极端头 |
Also Published As
Publication number | Publication date |
---|---|
CN104357802B (zh) | 2017-03-15 |
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Legal Events
Date | Code | Title | Description |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
C41 | Transfer of patent application or patent right or utility model | ||
GR01 | Patent grant | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20170223 Address after: Longgang District of Shenzhen City, Guangdong province 518116 Longgang Street South Community Bing Hang industrial area 7 Building 3 floor, 4 floor Applicant after: Shenzhen Metal Technology Co., Ltd. Address before: Longgang District of Shenzhen City, Guangdong province 518000 Baolong Avenue Baoqing Lu Hua Feng Digital Technology Park 7 Applicant before: Shao Haiping |
|
TR01 | Transfer of patent right |
Effective date of registration: 20181129 Address after: 518000 Huafeng Digital Science Park, Baolong Avenue, Longgang District, Shenzhen City, Guangdong Province Patentee after: Shao Haiping Address before: 518116 3rd and 4th floors of 7 buildings in Bingkeng Industrial Zone, Nanyue Community, Longgang Street, Longgang District, Shenzhen City, Guangdong Province Patentee before: Shenzhen Metal Technology Co., Ltd. |
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TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20200904 Address after: 523000 Second Floor, Building B, 99 Jinghai West Road, Shatou Community, Chang'an Town, Dongguan City, Guangdong Province Patentee after: GUANGDONG TISNAWELL NEW MATERIAL TECHNOLOGY Co.,Ltd. Address before: Longgang District of Shenzhen City, Guangdong province 518000 Baolong Avenue Baoqing Lu Hua Feng Digital Technology Park 7 Patentee before: Shao Haiping |
|
TR01 | Transfer of patent right | ||
PE01 | Entry into force of the registration of the contract for pledge of patent right | ||
PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of invention: A fluoride shaft seal ultra thin rotating cathode end Effective date of registration: 20220525 Granted publication date: 20170315 Pledgee: Industrial and Commercial Bank of China Limited Dongguan Chang'an sub branch Pledgor: GUANGDONG TISNAWELL NEW MATERIAL TECHNOLOGY Co.,Ltd. Registration number: Y2022980006390 |