CN104349567A - Radio frequency power supply system and a method for performing impedance matching by utilizing radio frequency power supply system - Google Patents

Radio frequency power supply system and a method for performing impedance matching by utilizing radio frequency power supply system Download PDF

Info

Publication number
CN104349567A
CN104349567A CN201310322341.6A CN201310322341A CN104349567A CN 104349567 A CN104349567 A CN 104349567A CN 201310322341 A CN201310322341 A CN 201310322341A CN 104349567 A CN104349567 A CN 104349567A
Authority
CN
China
Prior art keywords
impedance
power supply
frequency
frequency power
radio
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201310322341.6A
Other languages
Chinese (zh)
Inventor
张璐
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Beijing NMC Co Ltd
Beijing North Microelectronics Co Ltd
Original Assignee
Beijing North Microelectronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Beijing North Microelectronics Co Ltd filed Critical Beijing North Microelectronics Co Ltd
Priority to CN201310322341.6A priority Critical patent/CN104349567A/en
Priority to TW102145329A priority patent/TWI523417B/en
Priority to PCT/CN2013/089080 priority patent/WO2015014068A1/en
Publication of CN104349567A publication Critical patent/CN104349567A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H7/00Multiple-port networks comprising only passive electrical elements as network components
    • H03H7/38Impedance-matching networks
    • H03H7/40Automatic matching of load impedance to source impedance

Landscapes

  • Plasma Technology (AREA)

Abstract

The invention provides a radio frequency power supply system comprising a radio frequency power supply and an automatic impedance matcher which is electrically connected between the radio frequency power supply and a plasma chamber. Frequency of the radio frequency power supply can be adjusted between the minimum preset frequency and the maximum preset frequency. Frequency of the radio frequency power supply is adjusted and input impedance of a matching network is adjusted via the automatic impedance matcher so that input impedance of the matching network is enabled to be equal to constant output impedance of the radio frequency power supply. The invention also provides a method for performing impedance matching by utilizing the radio frequency power supply system. Impedance matching can be achieved within a relatively short period of time by utilizing the radio frequency power supply system.

Description

Rf power system and utilize rf power system to carry out the method for impedance matching
Technical field
The present invention relates to impedance match technique field, particularly, relate to a kind of rf power system and a kind of method utilizing this rf power system to carry out impedance matching.
Background technology
In typical radio frequency plasma generating means, the radio-frequency power supply 10 of constant output impedance produces the rf wave of fixed frequency, for plasma chamber 30 provides radio-frequency power, produces for etch or for the plasma of other technique to excite.Wherein the constant output impedance of radio freqnency generator is generally 50 Ω, and the fixed frequency of generation is generally 13.56MHz.Under normal circumstances, the nonlinear load impedance of plasma chamber 30 and the constant output impedance of radio-frequency power supply 10 are also unequal, so, more serious impedance mismatching can be there is between radio-frequency power supply 10 with plasma chamber 30, thus making that the radio-frequency transmission line between radio-frequency power supply 10 and plasma chamber 30 exists larger reflection power, the power causing radio-frequency power supply 10 to produce cannot all flow to plasma chamber 30.
In order to address this problem, in prior art, an automatic impedance matcher 20 is set between radio-frequency power supply 10 and plasma cavity usually, as shown in Figure 1.This automatic impedance matcher 20 comprises impedance transducer 22, controller 21 and actuator 23, and wherein actuator 23 comprises the variable impedance element in matching network further and changes the drive unit of variable impedance element value.Here mentioned matching network refers to the network be made up of the nonlinear load impedance of variable impedance element and plasma chamber 30.Impedance transducer 22 detects the parameters such as voltage, electric current, forward power and backward power on the radio-frequency transmission line between automatic impedance matcher 20 and radio-frequency power supply 10, for controller 21 provides the input variable required for match control algorithm.This input variable is normally according to the parameter that the parameters such as voltage, electric current, forward power and backward power calculate further.Wherein, the reflection power that backward power is introduced before being, impedance transducer 22, also for detecting the input impedance of matching network, exports to controller 21 simultaneously.The input impedance of the input variable that controller 21 provides according to impedance transducer 22 and matching network, by certain match control algorithm, and delete the adjustment amount of variable impedance element, and the drive unit exported in actuator 23, drive unit changes the impedance of variable impedance element according to the adjustment amount carrying out self-controller 21, thus make the input impedance of matching network equal with the constant output impedance of radio-frequency power supply 10, that is, reach impedance matching.Like this, the reflection power on radio-frequency transmission line is zero, and the power that radio freqnency generator produces all has been transported to plasma chamber 30.
Because adjustable element is less, the matching range of whole matching system is narrower, if the element selecting variable range large, response speed is comparatively slow, and cost is higher.Therefore, the adjustable range how heightening impedance matching system and the response speed improving impedance matching system become this area technical problem urgently to be resolved hurrily.
Summary of the invention
The object of the present invention is to provide a kind of rf power system and a kind of method utilizing this rf power system to carry out impedance matching, described rf power system can complete impedance matching fast.
To achieve these goals, as one aspect of the present invention, a kind of rf power system is provided, this rf power system comprises radio-frequency power supply and is connected electrically in the automatic impedance matcher between described radio-frequency power supply and plasma chamber, wherein, the frequency of described radio-frequency power supply can regulate between minimum preset frequency and maximum preset frequency, by regulating the frequency of described radio-frequency power supply and regulating the input impedance of matching network that the input impedance of matching network can be made equal with the constant output impedance of described radio-frequency power supply by described automatic impedance matcher.
Preferably, described automatic impedance matcher comprises impedance transducer, controller and actuator, described impedance transducer is for the original frequency of the initial impedance and described radio-frequency power supply that detect described actuator, and the original frequency of the initial impedance of described actuator and described radio-frequency power supply is sent to described controller, described controller can according to the initial impedance of described actuator, the original frequency of described radio-frequency power supply and the equiva lent impedance of described plasma chamber calculate the initial input impedance of described matching network, and the frequency of radio-frequency power supply and the impedance of control actuator according to this initial input impedance adjustment.
Preferably, described actuator comprises the transformer of impedance adjustable element and adjustable turn ratio, by the real part regulating the turn ratio of this transformer can regulate the resistance value of the input impedance of described matching network, by the imaginary part regulating the impedance of described impedance adjustable element can regulate the resistance value of the input impedance of described matching network.
Preferably, described impedance adjustable element comprises the first electric capacity and inductance, and this first electric capacity and inductance are connected with described plasma chamber, and described first electric capacity is tunable capacitor, and/or described inductance is controllable impedance.
Preferably, described first electric capacity and described inductance are all connected on the input of described transformer.
Preferably, described impedance adjustable element is all arranged on the output of described transformer, and described impedance adjustable element comprises the second electric capacity and the 3rd electric capacity, described second electric capacity is tunable capacitor, and this second electric capacity is in parallel with described plasma chamber, described 3rd electric capacity is connected with described plasma chamber.
As another aspect of the present invention, a kind of method utilizing rf power system to carry out impedance matching is provided, described rf power system radio-frequency power supply, be connected electrically in automatic impedance matcher between described radio-frequency power supply and plasma chamber, wherein, the frequency of described radio-frequency power supply can regulate between minimum preset frequency and maximum preset frequency, and described automatic impedance matching method comprises:
Step 100, utilize automatic impedance matcher to detect to obtain the equiva lent impedance of predetermined plasma chamber, and calculate the initial input impedance of matching network;
Step 200, regulate the frequency of described radio-frequency power supply, and utilize described automatic impedance matcher to regulate the input impedance of matching network, to make the input impedance of described matching network equal with the constant output impedance of described radio-frequency power supply.
Preferably, described automatic impedance matcher comprises impedance transducer, controller and actuator;
Described step 100 comprises and utilizes described impedance transducer to detect the initial input impedance of described matching network and the original frequency of described radio-frequency power supply, and the initial input impedance of described matching network and the original frequency of described radio-frequency power supply are sent to described controller, utilize described controller to calculate the initial input impedance of described matching network;
Described step 200 comprises the frequency utilizing described controller radio-frequency power supply according to the initial input impedance adjustment of described matching network and the impedance controlling actuator.
Preferably, described actuator comprises the transformer of impedance adjustable element and adjustable turn ratio;
Described step 200 comprises:
Step 210, regulate the turn ratio of described transformer, equal the constant output impedance of described radio-frequency power supply with the real part of the resistance value making the input impedance of described matching network;
Step 220, regulate the impedance of described impedance adjustable element and the frequency of described radio-frequency power supply, to make the imaginary part of the resistance value of the input impedance of described matching network for zero.
Preferably, described step 220 comprises:
Step 221, determine the matching frequency of the described radio-frequency power supply when the input impedance of described matching network is equal with the constant output impedance of described radio-frequency power supply according to the relation between described matching initial impedance and the initial radio frequency of described radio-frequency power supply;
Step 222, described impedance adjustable element to be regulated, to make the input impedance of described matching network equal with the constant output impedance of described radio-frequency power supply.
In the present invention, automatic impedance matcher can regulate the input impedance of matching network.Similar to prior art, automatic impedance matcher also can comprise impedance adjustable element, by the input impedance regulating the impedance of impedance adjustable element to regulate matching network.By regulating the frequency of radio-frequency power supply to combine with the adjustment of automatic impedance matcher to matching network, the matching range of whole rf power system can be increased.Further, when utilizing rf power system provided by the present invention to carry out automatic impedance matching, can without the need to increasing the adjustable range of automatic impedance matcher middle impedance adjustable element, thus make can reach impedance matching in the short period of time.
Accompanying drawing explanation
Accompanying drawing is used to provide a further understanding of the present invention, and forms a part for specification, is used from explanation the present invention, but is not construed as limiting the invention with embodiment one below.In the accompanying drawings:
Fig. 1 is the composition structural representation of existing radio frequency automatic impedance matcher;
Fig. 2 is the structural representation of rf power system of the present invention;
Fig. 3 is the schematic diagram of the first execution mode of rf power system of the present invention;
Fig. 4 is the schematic diagram of the second execution mode of rf power system of the present invention;
Fig. 5 is the schematic diagram of the third execution mode of rf power system of the present invention;
Fig. 6 is the schematic diagram of the 4th kind of execution mode of rf power system of the present invention;
Fig. 7 is the schematic diagram of the 5th kind of execution mode of rf power system of the present invention;
Fig. 8 is the flow chart utilizing this rf power system to carry out the method for impedance matching of the present invention;
Fig. 9 is the flow chart of the step 200 in the method described in exploded view 8.
Description of reference numerals
10: radio-frequency power supply 20: automatic impedance matcher
21: controller 22: impedance transducer
23: actuator 30: plasma chamber
23a: transformer 23b: impedance adjustable element
231b: inductance 232b: the first electric capacity
233b: the second electric capacity 234b: the three electric capacity
Embodiment
Below in conjunction with accompanying drawing, the specific embodiment of the present invention is described in detail.Should be understood that, embodiment described herein, only for instruction and explanation of the present invention, is not limited to the present invention.
As shown in Figure 2, as one aspect of the present invention, a kind of radio frequency automatic patching system is provided, the automatic impedance matcher 20 that this radio frequency automatic patching system comprises radio-frequency power supply 10, plasma chamber 30 and is connected electrically between radio-frequency power supply 10 and plasma chamber 30, wherein, the frequency of radio-frequency power supply 10 can at minimum preset frequency f minwith maximum preset frequency f maxbetween regulate, by regulating the frequency of radio-frequency power supply 10, and regulate the input impedance of matching network can make the input impedance of matching network equal with the constant output impedance of radio-frequency power supply 10 (that is, impedance matching) by automatic impedance matcher 20.
In the present invention, automatic impedance matcher 20 can regulate the input impedance of matching network.Similar to prior art, automatic impedance matcher 20 also can comprise impedance adjustable element, by the input impedance regulating the impedance of impedance adjustable element to regulate matching network.By the adjustment of frequency and the automatic impedance matcher 20 pairs of matching networks regulating radio-frequency power supply 10 being combined, the matching range of whole rf power system can be increased.Further, when utilizing rf power system provided by the present invention to carry out automatic impedance matching, can without the need to increasing the adjustable range of automatic impedance matcher 20 middle impedance adjustable element, thus make can reach impedance matching in the short period of time.
In addition, in the present invention, the frequency of radio-frequency power supply 10 can be regulated by digital regulated mode.That is, set by controller radio frequency power supply 10, i.e. the frequency of adjustable radio-frequency power supply 10.
Usually, the impedance of impedance adjustable element is regulated by the form of mechanical adjustment.That is, usual adjustable element comprises tunable capacitor and controllable impedance.Tunable capacitor comprises capacitance adjusting device, controllable impedance comprises inductance value adjusting device, in this case, automatic impedance matcher 20 also comprises the capacitance adjustment motor be connected with the capacitance adjusting device of tunable capacitor and the adjustment of inductance motor be connected with the inductance adjustment device of controllable impedance.The capacitance of tunable capacitor can be regulated by the rotation of capacitance adjustment motor, the inductance value of controllable impedance can be regulated by the rotation of adjustment of inductance motor.
And digital regulated speed is faster than the speed of mechanical adjustment, therefore, in the present invention, utilize the radio-frequency power supply of frequency-adjustable and automatic impedance matcher 20 can shorten time needed for impedance matching further.
Because the adjustable range of radio-frequency power supply is larger, therefore, when utilizing radio-frequency power supply provided by the present invention to carry out automatic impedance matching, first can regulate the frequency of radio-frequency power supply, so that the input impedance of matching network is adjusted near matched impedance, then by fine setting automatic impedance matcher, make the input impedance of matching network equal with the constant output impedance of radio-frequency power supply 10, thus the time needed for impedance matching can be shortened further.
One skilled in the art will appreciate that the frequency that can control separately radio-frequency power supply 10.Such as, the control panel of the frequency controlling separately radio-frequency power supply can be set in described rf power system.
Or, automatic impedance matcher 20 can be utilized to realize the control of the frequency of radio frequency power supply 10, thus be convenient to realize automatic impedance matching.Further, in the present invention, particular restriction is not had to the concrete structure of automatic impedance matcher 20, as long as the impedance of matching network can be regulated.Particularly, as shown in Figure 2, automatic impedance matcher 20 can comprise impedance transducer 22, controller 21 and actuator 23, the original frequency of the initial impedance of actuator and radio-frequency power supply 10 for detecting the original frequency of actuator's initial impedance and radio-frequency power supply 10, and is sent to controller 21 by impedance transducer 22.Controller 21 can calculate the initial input impedance of described matching network according to the original frequency of the initial impedance of the equiva lent impedance of plasma chamber 30, actuator 23 and radio-frequency power supply 10.Controller 21 according to the frequency of the initial input impedance adjustment radio-frequency power supply 10 of the described matching network calculated and can control the impedance of actuator 23, to reach impedance matching subsequently.
Usually, the form of the input impedance Z of described matching network is Z=Z a+ Z b, wherein, Z afor the real part of input impedance Z, Z bfor the imaginary part of input impedance Z.After realizing impedance matching, the real part Z of demand fulfillment input impedance Z afor the constant output impedance of radio-frequency power supply 10, and the imaginary part Z of input impedance Z bbe zero.
Therefore, when utilizing rf power system provided by the present invention to realize automatic impedance matching, can first by the real part Z of the input impedance of matching network abe adjusted to the constant output impedance of radio-frequency power supply 10, then by the imaginary part Z of the input impedance of matching network bbe adjusted to zero.
As the preferred embodiment of the present invention, actuator 23 can comprise transformer 23a and the impedance adjustable element 23b of adjustable turn ratio.The turn ratio can passing through adjustment transformer 23a can by the real part Z of the resistance value of the input impedance of matching network abe adjusted to the constant output impedance of radio-frequency power supply 10.
Can by the imaginary part Z of the resistance value of the input impedance of matching network by the impedance of adjustment impedance adjustable element 23b bbe adjusted to zero.
In the present invention, particular determination is not had to the concrete structure of impedance adjustable element 23b, as long as the imaginary part of the input impedance of matching network can be adjusted to zero, such as, as as shown in Fig. 3 to Fig. 6, impedance adjustable element 23b comprises the first electric capacity 232b and inductance 231b, and this first electric capacity 232b and inductance 231b connects with described plasma chamber 30, first electric capacity 232b is tunable capacitor, and/or inductance 231b is controllable impedance.
The operation principle of the transformer 23a of adjustable turn ratio is introduced below by concrete execution mode.
As shown in Figure 3, in the first execution mode of rf power system provided by the present invention, first electric capacity 232b is tunable capacitor, inductance 231b be fixed inductance (namely, inductance value is non-adjustable), impedance adjustable element 23b comprises the first electric capacity 232b and inductance 231b, and this first electric capacity 232b and inductance 231b connects with described plasma chamber 30, and described first electric capacity 232b is tunable capacitor.The equiva lent impedance setting now plasma chamber 30 is R+jX.
Therefore, in figure, the input impedance of transformer right part is:
Z 1 = R + jX + j ω 0 L 231 b - j 1 ω 0 C 232 b , 0 ;
The input impedance of whole matching network is:
Z 0 = n 2 R + jn 0 2 ( X + ω 0 L 231 b - 1 ω 0 C 231 b , 0 ) .
Wherein, C 232b, 0be the initial capacitance value (being generally the half of the maximum capacitor value of the first electric capacity 232b) of the first electric capacity 232b, L 231bfor the inductance value of inductance 231b, ω 0for the initial angular frequency of radio-frequency power supply 10 (one skilled in the art will appreciate that the frequency f of radio-frequency power supply 10 and angular frequency meet: ω=2 π f), n 0for the turn ratio of transformer 23a.
The real part of the input impedance of matching network is n 0 2r, imaginary part is wherein, X is relevant with the type of plasma chamber 30, can be perception (ω 0l 0) or capacitive
It can thus be appreciated that the real part of the input impedance of described matching network is only relevant with the turn ratio of transformer 23a, and imaginary part is relevant with the angular frequency of radio-frequency power supply 10 and the capacitance of the first electric capacity 232b.So, in the process of Auto-matching, real part and the imaginary part of impedance can be regulated simultaneously, make real part be the constant output impedance R of radio-frequency power supply 10 10(being generally 50 Ω), imaginary part is 0.
Such as when the equiva lent impedance of plasma chamber 30 is R+j ω L 0time, the impedance Z that impedance transducer detects 0for:
Z 0 = n 2 ( R + jω 0 L 0 + jω 0 L 231 b - j 1 ωC 232 b , 0 ) = n 2 R + jn 2 [ ω 0 ( L 0 + L 231 b ) - 1 ω 0 C 232 b , 0 ] .
After impedance matching, the turn ratio of transformer is n m, real part n m 2r is the constant output impedance R of radio-frequency power supply 10 10, therefore, the frequency of radio-frequency power supply 10 is ω m, the capacitance of the first electric capacity 232b is C 232b, m, and imaginary part meets following formula: therefore, the angular frequency of radio-frequency power supply 10 is ω mwith the capacitance C of the first electric capacity 232b 232b, mmeet this formula:
When utilizing radio-frequency power supply Auto-matching impedance provided by the present invention, first the turn ratio n of transformer 23a can be adjusted to n m, then regulate the angular frequency of radio-frequency power supply 10 and the capacitance of the first electric capacity 232b respectively, meet with the capacitance of the angular frequency and the first electric capacity 232b that make radio-frequency power supply 10 should be understood that, ω mand C 232b, mnot specific value.
Particularly, controller 21 is first utilized to calculate if controller 21 calculates then the frequency of radio-frequency power supply 10 is directly adjusted to f minmin=2 π f min), subsequently the capacitance of the first electric capacity 232b is finely tuned, make now, minimum angular frequency minbe ω m.
If in like manner then the frequency of radio-frequency power supply 10 is directly adjusted to f maxmin=2 π f min), subsequently the first electric capacity 232b is finely tuned, make now, maximum angular frequencies omega maxbe ω m.
If in minimum angular frequency minwith maximum angular frequencies omega maxbetween, so utilize controller 21 by the frequency adjustment of radio-frequency power supply 10 extremely near, then finely tune the first electric capacity 232b, to make
Should be understood that, in above-mentioned three kinds of situations, during impedance matching, the frequency of radio-frequency power supply and the capacitance of the first electric capacity 232b are all unequal.
In the second execution mode of the present invention, as shown in Figure 4, the first electric capacity 232b is tunable capacitor, and inductance 231b is controllable impedance (that is, inductance value is adjustable).When regulating the imaginary part of input impedance of matching network, the first electric capacity 232b and inductance 231b can be regulated simultaneously, concrete and the first execution mode is similar, repeat no more here.The match time required when utilizing the radio system of the second execution mode of the present invention to carry out automatic impedance matching is shorter.
In addition, in the present invention, not special to the setting position of the first electric capacity 232b and inductance 231b restriction.Such as, in the third execution mode of the present invention in Figure 5, the first electric capacity 232b is connected on the output of transformer 23a, and inductance 231b is connected on the input of transformer 23a.
It is easily understood that in the third execution mode, the input impedance of matching network is:
Z 0 = n 2 R + j ( n 2 X - n 2 ω 0 C 232 b , 0 + ω 0 L 231 b ) .
Similarly, after impedance matching, the turn ratio of transformer is n m, real part n m 2r is the constant output impedance R of radio-frequency power supply 10 10, therefore, the frequency of radio-frequency power supply 10 is ω m, the capacitance of the first electric capacity 232b is C 232b, m, and imaginary part meets following formula: this formula is had to draw ω mand C 232b, mbetween relation.Thus controller 21 can be utilized to regulate radio-frequency power supply 10, transformer 23a and the first electric capacity 232b, to realize impedance matching.Control method disclosed in concrete control method and the first execution mode is similar, repeats no more here.
In the 4th kind of execution mode of the present invention in figure 6, inductance 231b and the first electric capacity 232b is all connected on the input of transformer 23a.Now, the input impedance of matching network is:
Z 0 = n 2 R + j ( n 2 X - 1 ω 0 C 232 b , 0 + ω 0 L 231 b ) .
Similarly, after impedance matching, the turn ratio of transformer is n m, real part n m 2r is the constant output impedance R of radio-frequency power supply 10 10, therefore, the frequency of radio-frequency power supply 10 is ω m, the capacitance of the first electric capacity 232b is C 232b, m, and imaginary part meets following formula: this formula is had to draw ω mand C 232b, mbetween relation.Thus controller 21 can be utilized to regulate radio-frequency power supply 10, transformer 23a and the first electric capacity 232b, to realize impedance matching.Regulative mode in concrete regulative mode and the first execution mode is similar, repeats no more here.
In the 5th kind of execution mode of the present invention, as shown in Figure 7, impedance adjustable element 23b is all arranged on the output of transformer 23a, and impedance adjustable element 23b comprises the second electric capacity 233b and the 3rd electric capacity 234b, described second electric capacity 233b is tunable capacitor, and this second electric capacity 233b is in parallel with plasma chamber 30, the 3rd electric capacity 234b connects with plasma chamber 30.Matching network is now " L " type network.
When the equiva lent impedance of plasma chamber 300 is R+j ω L, the admittance Y of the part in Fig. 7 on the right side of transformer 1for:
Y 1 = 1 n 2 [ R R 2 + P 2 + j ( ω 0 C 233 b , 0 - P R 2 + P 2 ) ] ;
The input admittance Y of matching network 0for:
Y 0 = R n 2 ( R 2 + P 2 ) + j 1 n 2 ( ω 0 C 233 b , 0 - P R 2 + P 2 ) ;
Wherein, P = ω 0 L - 1 ω 0 C 234 b , 0 .
The input admittance Y of matching network 0real part be the input admittance Y of matching network 0imaginary part be similarly, after impedance matching, the turn ratio of transformer is n m, real part for the constant output impedance R of radio-frequency power supply 10 10inverse, and imaginary part meets following formula: ω can be calculated according to above two formula mand C 233b, mbetween relation.Thus controller 21 can be utilized to regulate radio-frequency power supply 10, transformer 23a and the 4th electric capacity 234b, to realize impedance matching.Regulative mode in concrete regulative mode and the first execution mode is similar, repeats no more here.
Corresponding to rf power system of the present invention, as shown in Figure 8, a kind of method utilizing rf power system to carry out impedance matching is also provided, described rf power system radio-frequency power supply, be connected electrically in automatic impedance matcher between described radio-frequency power supply and plasma chamber, wherein, the frequency of described radio-frequency power supply can regulate between minimum preset frequency and maximum preset frequency, and described automatic impedance matching method comprises:
Step 100, utilize automatic impedance matcher to detect to obtain the equiva lent impedance of predetermined plasma chamber, and calculate the initial input impedance of matching network;
Step 200, regulate the frequency of described radio-frequency power supply, and utilize described automatic impedance matcher to regulate the input impedance of matching network, to make the input impedance of described matching network equal with the constant output impedance of described radio-frequency power supply.
Because the adjustable range of radio-frequency power supply is larger, therefore, when utilizing radio-frequency power supply provided by the present invention to carry out automatic impedance matching, first can regulate the frequency of radio-frequency power supply, so that the input impedance of matching network is adjusted near matched impedance, then by fine setting automatic impedance matcher, make the input impedance of matching network equal with the constant output impedance of radio-frequency power supply, thus the time needed for impedance matching can be shortened further.
Should be understood that, rf power system described herein can for the above-mentioned rf power system provided in the present invention.
When described automatic impedance matcher comprise impedance transducer, controller and actuator:
Described step 100 comprises and utilizes described impedance transducer to detect the initial input impedance of described matching network and the original frequency of described radio-frequency power supply, and the initial input impedance of described matching network and the original frequency of described radio-frequency power supply are sent to described controller, utilize described controller to calculate the initial input impedance of described matching network;
Described step 200 comprises the frequency utilizing described controller radio-frequency power supply according to the initial input impedance adjustment of described matching network and the impedance controlling actuator.
When described actuator comprises the transformer of impedance adjustable element and adjustable turn ratio, as shown in Figure 9, described step 200 comprises:
Step 210, regulate the turn ratio of described transformer, equal the constant output impedance of described radio-frequency power supply with the real part of the resistance value making the input impedance of described matching network;
Step 220, regulate the impedance of described impedance adjustable element and the frequency of described radio-frequency power supply, to make the imaginary part of the resistance value of the input impedance of described matching network for zero.
Particularly, described step 220 comprises:
Step 221, determine the matching frequency of the described radio-frequency power supply when the input impedance of described matching network is equal with the constant output impedance of described radio-frequency power supply according to the relation between described matching initial impedance and the initial radio frequency of described radio-frequency power supply;
Step 222, described impedance adjustable element to be regulated, to make the input impedance of described matching network equal with the constant output impedance of described radio-frequency power supply.
Give the matching frequency specifically how determining the described radio-frequency power supply when the input impedance of described matching network is equal with the constant output impedance of described radio-frequency power supply according to the relation between described matching initial impedance and the initial radio frequency of described radio-frequency power supply above in the first execution mode, repeated no more here.
Be understandable that, the illustrative embodiments that above execution mode is only used to principle of the present invention is described and adopts, but the present invention is not limited thereto.For those skilled in the art, without departing from the spirit and substance in the present invention, can make various modification and improvement, these modification and improvement are also considered as protection scope of the present invention.

Claims (10)

1. a rf power system, this rf power system comprises radio-frequency power supply and is connected electrically in the automatic impedance matcher between described radio-frequency power supply and plasma chamber, it is characterized in that, the frequency of described radio-frequency power supply can regulate between minimum preset frequency and maximum preset frequency, by regulating the frequency of described radio-frequency power supply and regulating the input impedance of matching network that the input impedance of matching network can be made equal with the constant output impedance of described radio-frequency power supply by described automatic impedance matcher.
2. rf power system according to claim 1, it is characterized in that, described automatic impedance matcher comprises impedance transducer, controller and actuator, described impedance transducer is for the original frequency of the initial impedance and described radio-frequency power supply that detect described actuator, and the original frequency of the initial impedance of described actuator and described radio-frequency power supply is sent to described controller, described controller can according to the initial impedance of described actuator, the original frequency of described radio-frequency power supply and the equiva lent impedance of described plasma chamber calculate the initial input impedance of described matching network, and the frequency of radio-frequency power supply and the impedance of control actuator according to this initial input impedance adjustment.
3. rf power system according to claim 2, it is characterized in that, described actuator comprises the transformer of impedance adjustable element and adjustable turn ratio, by the real part regulating the turn ratio of this transformer can regulate the resistance value of the input impedance of described matching network, by the imaginary part regulating the impedance of described impedance adjustable element can regulate the resistance value of the input impedance of described matching network.
4. rf power system according to claim 3, it is characterized in that, described impedance adjustable element comprises the first electric capacity and inductance, and this first electric capacity and inductance are connected with described plasma chamber, described first electric capacity is tunable capacitor, and/or described inductance is controllable impedance.
5. rf power system according to claim 4, is characterized in that, described first electric capacity and described inductance are all connected on the input of described transformer.
6. rf power system according to claim 3, it is characterized in that, described impedance adjustable element is all arranged on the output of described transformer, and described impedance adjustable element comprises the second electric capacity and the 3rd electric capacity, described second electric capacity is tunable capacitor, and this second electric capacity is in parallel with described plasma chamber, described 3rd electric capacity is connected with described plasma chamber.
7. the method utilizing rf power system to carry out impedance matching, described rf power system radio-frequency power supply, be connected electrically in automatic impedance matcher between described radio-frequency power supply and plasma chamber, it is characterized in that, the frequency of described radio-frequency power supply can regulate between minimum preset frequency and maximum preset frequency, and described automatic impedance matching method comprises:
Step 100, utilize automatic impedance matcher to detect to obtain the equiva lent impedance of predetermined plasma chamber, and calculate the initial input impedance of matching network;
Step 200, regulate the frequency of described radio-frequency power supply, and utilize described automatic impedance matcher to regulate the input impedance of matching network, to make the input impedance of described matching network equal with the constant output impedance of described radio-frequency power supply.
8. method according to claim 7, is characterized in that, described automatic impedance matcher comprises impedance transducer, controller and actuator;
Described step 100 comprises and utilizes described impedance transducer to detect the initial input impedance of described matching network and the original frequency of described radio-frequency power supply, and the initial input impedance of described matching network and the original frequency of described radio-frequency power supply are sent to described controller, utilize described controller to calculate the initial input impedance of described matching network;
Described step 200 comprises the frequency utilizing described controller radio-frequency power supply according to the initial input impedance adjustment of described matching network and the impedance controlling actuator.
9. method according to claim 8, is characterized in that, described actuator comprises the transformer of impedance adjustable element and adjustable turn ratio;
Described step 200 comprises:
Step 210, regulate the turn ratio of described transformer, equal the constant output impedance of described radio-frequency power supply with the real part of the resistance value making the input impedance of described matching network;
Step 220, regulate the impedance of described impedance adjustable element and the frequency of described radio-frequency power supply, to make the imaginary part of the resistance value of the input impedance of described matching network for zero.
10. method according to claim 9, is characterized in that, described step 220 comprises:
Step 221, determine the matching frequency of the described radio-frequency power supply when the input impedance of described matching network is equal with the constant output impedance of described radio-frequency power supply according to the relation between described matching initial impedance and the initial radio frequency of described radio-frequency power supply;
Step 222, described impedance adjustable element to be regulated, to make the input impedance of described matching network equal with the constant output impedance of described radio-frequency power supply.
CN201310322341.6A 2013-07-29 2013-07-29 Radio frequency power supply system and a method for performing impedance matching by utilizing radio frequency power supply system Pending CN104349567A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
CN201310322341.6A CN104349567A (en) 2013-07-29 2013-07-29 Radio frequency power supply system and a method for performing impedance matching by utilizing radio frequency power supply system
TW102145329A TWI523417B (en) 2013-07-29 2013-12-10 RF power supply system and the use of RF power supply system impedance matching method
PCT/CN2013/089080 WO2015014068A1 (en) 2013-07-29 2013-12-11 Radio frequency power supply system, and method for performing impedance matching by using radio frequency power supply system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201310322341.6A CN104349567A (en) 2013-07-29 2013-07-29 Radio frequency power supply system and a method for performing impedance matching by utilizing radio frequency power supply system

Publications (1)

Publication Number Publication Date
CN104349567A true CN104349567A (en) 2015-02-11

Family

ID=52430927

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201310322341.6A Pending CN104349567A (en) 2013-07-29 2013-07-29 Radio frequency power supply system and a method for performing impedance matching by utilizing radio frequency power supply system

Country Status (3)

Country Link
CN (1) CN104349567A (en)
TW (1) TWI523417B (en)
WO (1) WO2015014068A1 (en)

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106406193A (en) * 2016-12-15 2017-02-15 北京北广科技股份有限公司 Dynamically monitoring system for radio frequency power supply with integrated control panel
CN107201309A (en) * 2016-03-16 2017-09-26 洛阳华清天木生物科技有限公司 A kind of novel plasma mutation breeding device
CN107256820A (en) * 2016-03-23 2017-10-17 北京北方华创微电子装备有限公司 Coalignment, matching process and semiconductor processing equipment
CN107256821A (en) * 2016-03-23 2017-10-17 北京北方华创微电子装备有限公司 Impedance matching system, impedance matching methods and semiconductor processing equipment
CN107403711A (en) * 2016-05-18 2017-11-28 东京毅力科创株式会社 Plasma processing apparatus
CN108012401A (en) * 2016-10-28 2018-05-08 北京北方华创微电子装备有限公司 RF impedance matching process, adaptation and semiconductor processing device
CN108519559A (en) * 2018-03-27 2018-09-11 上海尼诺电子设备有限公司 Radio-frequency power supply detection device
WO2018233156A1 (en) * 2017-06-23 2018-12-27 北京北方华创微电子装备有限公司 Adjustable capacitor, impedance-matching apparatus and semiconductor-processing device
US10381197B2 (en) 2016-04-27 2019-08-13 Tokyo Electron Limited Transformer, plasma processing apparatus, and plasma processing method
US10699881B2 (en) 2016-03-23 2020-06-30 Beijing Naura Microelectronics Equipment Co., Ltd. Impedance matching system, impedance matching method, and semiconductor processing apparatus thereof
CN111430211A (en) * 2020-04-02 2020-07-17 上海理想万里晖薄膜设备有限公司 Radio frequency system for plasma processing apparatus and method of tuning the same
CN111466508A (en) * 2020-04-10 2020-07-31 四川长虹电器股份有限公司 Radio frequency unfreezing device, refrigerator and radio frequency unfreezing method
CN112014762A (en) * 2020-10-21 2020-12-01 佛仪科技(佛山)有限公司 Impedance matching test method, device, medium and test platform of radio frequency power supply
CN113241296A (en) * 2021-04-29 2021-08-10 北京北方华创微电子装备有限公司 Radio frequency power supply, impedance matching method thereof and semiconductor process equipment

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106376168B (en) * 2015-07-20 2019-11-29 北京北方华创微电子装备有限公司 Impedance matching box, impedance matching methods and semiconductor processing equipment
KR102460246B1 (en) * 2016-03-04 2022-10-27 램 리써치 코포레이션 Systems and methods for tuning an impedance matching network in a step-wise fashion
KR20170117312A (en) * 2016-04-13 2017-10-23 램 리써치 코포레이션 Systems and methods for reducing reflected power during state transitions by using radio frequency values

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1227678A (en) * 1996-06-13 1999-09-01 射频功率产品公司 Method and apparatus for matching a variable load impedence with an RF power generator impedance
US20030184319A1 (en) * 2002-02-08 2003-10-02 Daihen Corporation Impedance matching device provided with reactance-impedance table
US7298091B2 (en) * 2002-02-01 2007-11-20 The Regents Of The University Of California Matching network for RF plasma source
CN101741337A (en) * 2009-11-24 2010-06-16 北京北方微电子基地设备工艺研究中心有限责任公司 Impedance adjusting device and impedance matching system comprising same
CN101754567A (en) * 2008-12-18 2010-06-23 北京北方微电子基地设备工艺研究中心有限责任公司 Matching device and plasma equipment
JP2011124192A (en) * 2009-12-14 2011-06-23 Shindengen Electric Mfg Co Ltd Impedance matching device and plasma generation device having the same
CN102573261A (en) * 2010-12-10 2012-07-11 北京北方微电子基地设备工艺研究中心有限责任公司 Radio frequency matching method and device, as well as plasma device
CN103107793A (en) * 2011-11-09 2013-05-15 中国科学院微电子研究所 Automatic impedance matching system of transmission line

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6020794A (en) * 1998-02-09 2000-02-01 Eni Technologies, Inc. Ratiometric autotuning algorithm for RF plasma generator
US20050069651A1 (en) * 2003-09-30 2005-03-31 Tokyo Electron Limited Plasma processing system
US7459899B2 (en) * 2005-11-21 2008-12-02 Thermo Fisher Scientific Inc. Inductively-coupled RF power source
CN102315582A (en) * 2011-07-26 2012-01-11 华中科技大学 RF (radio frequency) power supply used for CO2 (carbon dioxide) laser

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1227678A (en) * 1996-06-13 1999-09-01 射频功率产品公司 Method and apparatus for matching a variable load impedence with an RF power generator impedance
US7298091B2 (en) * 2002-02-01 2007-11-20 The Regents Of The University Of California Matching network for RF plasma source
US20030184319A1 (en) * 2002-02-08 2003-10-02 Daihen Corporation Impedance matching device provided with reactance-impedance table
CN101754567A (en) * 2008-12-18 2010-06-23 北京北方微电子基地设备工艺研究中心有限责任公司 Matching device and plasma equipment
CN101741337A (en) * 2009-11-24 2010-06-16 北京北方微电子基地设备工艺研究中心有限责任公司 Impedance adjusting device and impedance matching system comprising same
JP2011124192A (en) * 2009-12-14 2011-06-23 Shindengen Electric Mfg Co Ltd Impedance matching device and plasma generation device having the same
CN102573261A (en) * 2010-12-10 2012-07-11 北京北方微电子基地设备工艺研究中心有限责任公司 Radio frequency matching method and device, as well as plasma device
CN103107793A (en) * 2011-11-09 2013-05-15 中国科学院微电子研究所 Automatic impedance matching system of transmission line

Cited By (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107201309A (en) * 2016-03-16 2017-09-26 洛阳华清天木生物科技有限公司 A kind of novel plasma mutation breeding device
CN107201309B (en) * 2016-03-16 2021-03-09 洛阳华清天木生物科技有限公司 Novel plasma mutation breeding device
CN107256821B (en) * 2016-03-23 2019-02-19 北京北方华创微电子装备有限公司 Impedance matching system, impedance matching methods and semiconductor processing equipment
CN107256820A (en) * 2016-03-23 2017-10-17 北京北方华创微电子装备有限公司 Coalignment, matching process and semiconductor processing equipment
CN107256821A (en) * 2016-03-23 2017-10-17 北京北方华创微电子装备有限公司 Impedance matching system, impedance matching methods and semiconductor processing equipment
US10699881B2 (en) 2016-03-23 2020-06-30 Beijing Naura Microelectronics Equipment Co., Ltd. Impedance matching system, impedance matching method, and semiconductor processing apparatus thereof
CN107256820B (en) * 2016-03-23 2019-02-19 北京北方华创微电子装备有限公司 Coalignment, matching process and semiconductor processing equipment
US10381197B2 (en) 2016-04-27 2019-08-13 Tokyo Electron Limited Transformer, plasma processing apparatus, and plasma processing method
CN107403711A (en) * 2016-05-18 2017-11-28 东京毅力科创株式会社 Plasma processing apparatus
CN107403711B (en) * 2016-05-18 2019-07-05 东京毅力科创株式会社 Plasma processing apparatus
US10593517B2 (en) 2016-05-18 2020-03-17 Tokyo Electron Limited Plasma processing apparatus
CN108012401A (en) * 2016-10-28 2018-05-08 北京北方华创微电子装备有限公司 RF impedance matching process, adaptation and semiconductor processing device
CN106406193A (en) * 2016-12-15 2017-02-15 北京北广科技股份有限公司 Dynamically monitoring system for radio frequency power supply with integrated control panel
CN109119248A (en) * 2017-06-23 2019-01-01 北京北方华创微电子装备有限公司 Tunable capacitor and impedance-matching device
WO2018233156A1 (en) * 2017-06-23 2018-12-27 北京北方华创微电子装备有限公司 Adjustable capacitor, impedance-matching apparatus and semiconductor-processing device
KR102381337B1 (en) * 2017-06-23 2022-04-01 베이징 나우라 마이크로일렉트로닉스 이큅먼트 씨오., 엘티디. Adjustable capacitor, impedance-matching apparatus and semiconductor-processing device
US11189465B2 (en) 2017-06-23 2021-11-30 Beijing Naura Microelectronics Equipment Co., Ltd. Adjustable capacitor, impedance matching device and semiconductor processing apparatus
JP2020527824A (en) * 2017-06-23 2020-09-10 北京北方華創微電子装備有限公司Beijing Naura Microelectronics Equipment Co., Ltd. Variable capacitors, impedance matching devices and semiconductor processing equipment
KR20210130828A (en) * 2017-06-23 2021-11-01 베이징 나우라 마이크로일렉트로닉스 이큅먼트 씨오., 엘티디. Adjustable capacitor, impedance-matching apparatus and semiconductor-processing device
CN108519559A (en) * 2018-03-27 2018-09-11 上海尼诺电子设备有限公司 Radio-frequency power supply detection device
CN111430211A (en) * 2020-04-02 2020-07-17 上海理想万里晖薄膜设备有限公司 Radio frequency system for plasma processing apparatus and method of tuning the same
CN111466508A (en) * 2020-04-10 2020-07-31 四川长虹电器股份有限公司 Radio frequency unfreezing device, refrigerator and radio frequency unfreezing method
CN112014762A (en) * 2020-10-21 2020-12-01 佛仪科技(佛山)有限公司 Impedance matching test method, device, medium and test platform of radio frequency power supply
CN113241296A (en) * 2021-04-29 2021-08-10 北京北方华创微电子装备有限公司 Radio frequency power supply, impedance matching method thereof and semiconductor process equipment
CN113241296B (en) * 2021-04-29 2024-06-04 北京七星华创流量计有限公司 Radio frequency power supply, impedance matching method thereof and semiconductor process equipment

Also Published As

Publication number Publication date
WO2015014068A1 (en) 2015-02-05
TWI523417B (en) 2016-02-21
TW201505366A (en) 2015-02-01

Similar Documents

Publication Publication Date Title
CN104349567A (en) Radio frequency power supply system and a method for performing impedance matching by utilizing radio frequency power supply system
CN101374381B (en) Method and system for matching radio frequency impedance
EP3203604B1 (en) Controlling wireless power transfer systems
CN102474294B (en) Apparatus for controlling impedance in adaptive tuning antenna circuit
EP3695435B1 (en) Matched source impedance driving system and method of operating the same
US8203859B2 (en) High frequency device with variable frequency and variable load impedance matching
KR100362598B1 (en) Electrically tuned matching network using predictor-corrector control systems
JP6157036B1 (en) High frequency power supply device and control method of high frequency power supply device
RU2017134985A (en) MANAGEMENT OF THE FORMING AEROSOL SYSTEM
KR102663551B1 (en) Method and impedance adjustment assembly for adjusting the impedance of a load to the output impedance of a power generator
CN105423363A (en) Microwave source system, microwave oven and execution method in microwave source system
CN108199494B (en) Gain-adjustable active load wireless charging device and adjusting method thereof
EP2498407B1 (en) Mobile wireless communications device with adjustable impedance matching network and associated methods
CN103926850A (en) Tuning A Parameter Associated With Plasma Impedance
US20220084790A1 (en) Method and apparatus for emulating a reactive source impedance of a generator
CN109412574B (en) Power transmission method of radio frequency power supply
Iordache et al. On exact circuit analysis of frequency splitting and bifurcation phenomena in wireless power transfer systems
KR20160104688A (en) Matcher and matching method
US10741362B2 (en) Impedance matching method and impedance matching device
CN113519753B (en) Thawing method for heating device and heating device
EP2709275B1 (en) An amplifier circuit
CN107465271A (en) A kind of ultrasonic wireless power transmission power boost system based on resonance compensation network
US20230253185A1 (en) Systems and Methods for Radiofrequency Signal Generator-Based Control of Impedance Matching System
CN101640969B (en) Matching method and plasma device applying same
JP2019032963A (en) High frequency decompression device

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
CB02 Change of applicant information

Address after: 100176 No. 8 Wenchang Avenue, Beijing economic and Technological Development Zone

Applicant after: Beijing North China microelectronics equipment Co Ltd

Address before: 100176 Beijing economic and Technological Development Zone, Wenchang Road, No. 8, No.

Applicant before: Beifang Microelectronic Base Equipment Proces Research Center Co., Ltd., Beijing

CB02 Change of applicant information
RJ01 Rejection of invention patent application after publication

Application publication date: 20150211

RJ01 Rejection of invention patent application after publication