CN109412574B - Power transmission method of radio frequency power supply - Google Patents
Power transmission method of radio frequency power supply Download PDFInfo
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- CN109412574B CN109412574B CN201811253867.2A CN201811253867A CN109412574B CN 109412574 B CN109412574 B CN 109412574B CN 201811253867 A CN201811253867 A CN 201811253867A CN 109412574 B CN109412574 B CN 109412574B
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K19/00—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits
- H03K19/0175—Coupling arrangements; Interface arrangements
- H03K19/017545—Coupling arrangements; Impedance matching circuits
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- H—ELECTRICITY
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- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
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Abstract
The present disclosure provides a power transmission method of a radio frequency power supply, which transmits power of the radio frequency power supply to a reaction chamber by using a power transmission network to excite a process gas in the reaction chamber, comprising the following steps: first adjusting the power transmission network; judging whether the process gas is ignited successfully; if not, continuing the first adjustment; and if the ignition is successful, carrying out second adjustment on the power transmission network in real time, and simultaneously carrying out impedance matching and power distribution on the radio frequency power supply.
Description
Technical Field
The disclosure relates to the technical field of semiconductor manufacturing, in particular to a power transmission method of a radio frequency power supply.
Background
The rf power of the inductively coupled plasma processing apparatus is distributed through a power transmission network to a coil that is used to excite a process gas to produce a plasma. The power transmission network is used for matching the output impedance of the radio frequency power supply, so that the power emitted by the radio frequency power supply is transmitted to the reaction chamber with the maximum efficiency. The power transfer network is also used to adjust the current sharing ratio of the coils to achieve the target sharing ratio.
The prior art is to perform impedance matching and current distribution directly in parallel using a power transfer network. This approach is straightforward, but it suffers from several problems as follows. First, the problem of ignition is not taken into account in impedance matching and current distribution, and therefore it is not necessarily guaranteed that the process gas ignites successfully. Secondly, even if it enables the process gas to be ignited successfully, since the gas composition and pressure of the reaction chamber may be changed greatly after ignition, impedance matching and current distribution need to be performed again, which affects the efficiency of impedance matching and current distribution. Finally, if the process gas is successfully ignited during the impedance matching and current sharing process, the tunable capacitors used for current sharing in the power transfer network are easily damaged by sparking, which adversely affects the useful life of the device.
Disclosure of Invention
The present disclosure is directed to at least partially solve the technical problems in the prior art and a power transmission method of a radio frequency power supply is provided.
According to one aspect of the present disclosure, there is provided a power transmission method of an rf power supply for transmitting power of the rf power supply to a reaction chamber using a power transmission network to excite a process gas in the reaction chamber, comprising the steps of: first adjusting the power transmission network; judging whether the process gas is ignited successfully; if not, continuing the first adjustment; and if the ignition is successful, carrying out second adjustment on the power transmission network in real time, and simultaneously carrying out impedance matching and power distribution on the radio frequency power supply.
In some embodiments of the disclosure, the power transfer network comprises: an impedance matching sub-network, the impedance matching sub-network comprising: at least one adjustable impedance element; the first adjustment includes: adjusting an impedance value of the at least one adjustable impedance element.
In some embodiments of the present disclosure, the power transmission network connects a plurality of excitation elements; the judging whether the process gas is ignited successfully comprises the following steps: detecting parameter values of the plurality of excitation elements; judging whether the instantaneous variation of the parameter value reaches a threshold value; if the threshold is reached, the process gas is ignited successfully; if the threshold is not reached, the process gas is not ignited successfully.
In some embodiments of the disclosure, the power transfer network comprises: an impedance matching sub-network and a power distribution sub-network, each comprising: at least one adjustable impedance element; the second adjustment includes: adjusting at least one adjustable impedance element of the impedance matching sub-network and at least one adjustable impedance element of the power distribution sub-network simultaneously.
In some embodiments of the present disclosure, said adjusting at least one adjustable impedance element of said impedance matching sub-network comprises: detecting an input impedance of the power transfer network; judging whether the input impedance is matched with the output impedance of the radio frequency power supply; if the matching is carried out, the detection is continued; if not, calculating the impedance matching value of the at least one adjustable impedance element, calculating the adjustment amount of the impedance value according to the current impedance value of the at least one adjustable impedance element and the impedance matching value, and adjusting the impedance value of the at least one adjustable impedance element to the impedance matching value according to the adjustment amount to match the input impedance with the output impedance.
In some embodiments of the present disclosure, the power distribution sub-network connects a plurality of excitation elements; the adjusting at least one adjustable impedance element of the power distribution sub-network comprises: detecting power parameters of a plurality of excitation elements; judging whether the power parameter distribution proportion of the excitation elements reaches a target value or not; if the target value is reached, continuing the detection; if the target value is not reached, calculating the impedance target value of the at least one adjustable impedance element, calculating the adjustment quantity of the impedance value according to the current impedance value of the at least one adjustable impedance element and the impedance target value, and adjusting the impedance value of the at least one adjustable impedance element to the impedance target value according to the adjustment quantity so that the power parameter distribution proportion of the excitation elements reaches the target value.
In some embodiments of the present disclosure, the excitation element is a coil and the power parameter is a current.
In some embodiments of the present disclosure, the excitation element is a capacitive plate and the power parameter is power.
Drawings
The above and other objects, features and advantages of the present disclosure will become more apparent from the following description of embodiments of the present disclosure with reference to the accompanying drawings, in which:
fig. 1 is a schematic structural diagram of an inductively coupled plasma semiconductor processing apparatus according to an embodiment of the present disclosure.
Fig. 2 is a schematic structural diagram of a power transmission network used in a power transmission method of a radio frequency power supply according to an embodiment of the disclosure.
Fig. 3 is a flowchart of a power transmission method of a radio frequency power supply according to an embodiment of the disclosure.
Fig. 4 is a flow chart of an impedance matching sub-step and a power distribution sub-step of the method shown in fig. 3.
Fig. 5 is a schematic structural diagram of a capacitively-coupled plasma semiconductor processing apparatus according to another embodiment of the present disclosure.
Fig. 6 is a schematic diagram of a power transmission network of the semiconductor processing apparatus shown in fig. 5.
Fig. 7 is a flowchart illustrating a power transmission method of a radio frequency power supply according to another embodiment of the disclosure.
Fig. 8 is a flow chart of an impedance matching sub-step and a power distribution sub-step of the method of fig. 7.
Description of the symbols
1-a radio frequency power supply; 11-output impedance;
2-a power transmission network;
21-input end sensor; 22-a controller; 23-impedance matching and power distribution network; 231-first output sensor; 232-a second output sensor; 233-impedance matching sub-network; 234-a power distribution sub-network;
31-a first coil; 32-a second coil; 33-a first capacitor plate; 34-a second capacitor plate;
4-a reaction chamber; 5-a wafer; 6-a lower electrode; 7-bias radio frequency power supply; 8-a bias matcher;
C1-a first adjustable capacitance; c2-a second adjustable capacitance; c3-a third adjustable capacitance; c4-a fourth adjustable capacitance; c5Fixed capacitor L inductor M1 first actuator M2 second actuator M3 third actuator M4 fourth actuator V, V1、V2-a voltage value; I. i is1、I2-a current value.
Detailed Description
For the purpose of promoting a better understanding of the objects, aspects and advantages of the present disclosure, reference is made to the following detailed description taken in conjunction with the accompanying drawings. It should be understood that the description is illustrative only and is not intended to limit the scope of the present disclosure. Moreover, in the following description, descriptions of well-known structures and techniques are omitted so as to not unnecessarily obscure the concepts of the present disclosure.
An embodiment of the disclosure provides a power transmission method of a radio frequency power supply, which is suitable for Inductively Coupled Plasma (ICP) semiconductor processing equipment. The impedance matching and power distribution method is realized through a power transmission network. As shown in fig. 1, one end of the power transmission network 2 is connected to the rf power source 1, and the other end is connected to the coil, which is disposed in the reaction chamber and used for exciting the process gas in the reaction chamber to generate plasma. The bottom of the reaction chamber is provided with a lower electrode 6 which is connected with a bias radio frequency power supply 7 through a bias matcher 8.
As shown in fig. 2, the power transmission network 2 includes: input sensor 21, controller 22, actuator and impedance matching and power distribution network 23. The output impedance 11 of the radio frequency power supply 1 is 50 Ω. The input end of the impedance matching and power distribution network 23 is connected to the rf power supply 1 via the input end sensor 21, and the first output end and the second output end thereof are connected to the first coil 31 and the second coil 32, respectively.
The impedance matching and power distribution network 23 includes: first tunable capacitor C1A second adjustable capacitor C2Comprising an impedance matching sub-network 233 and a third tunable capacitor C3And a fourth tunable capacitor C4A constituent power distribution sub-network 234. The two networks may be two separate components or may be an integrated integral component. First tunable capacitor C1And a second adjustable capacitor C2One terminal of the impedance matching and power distribution sub-network 23 is connected to the radio frequency power supply 1. First tunable capacitor C1Is grounded, and a second adjustable capacitor C2The other end of the first branch circuit and the second branch circuit are connected in parallel. The first branch circuit comprises a third adjustable capacitor C connected in series3A first output sensor 231 and a first coil 31. The second branch circuit comprises a fourth adjustable capacitor C connected in series4A second output sensor 232 and a second coil 32.
The input sensor 21 is used to measure the voltage value V and the current value I at the input of the impedance matching and power distribution network 23. The first output terminal sensor 231 is used for detecting the voltage value V of the first coil 311Sum current value I1And a second output terminal sensor 232 for detecting a voltage value V of the second coil 322Sum current value I2. The input end sensor 21 and the first and second output end sensors are connected to the controller 22 for respectively connecting the voltage value V with the current value I and the voltage value V1Sum current value I1Voltage value V2Sum current value I2To the controller 22. The controller 22 controls the actions of four actuators, namely a first actuator M1, a second actuator M2 and a third actuator M2The actuator M3 and the fourth actuator M4 are respectively used for adjusting the first adjustable capacitor C1A second adjustable capacitor C2A third adjustable capacitor C3And a fourth tunable capacitor C4The capacitance value of (2).
As shown in fig. 3, the power transmission method of the rf power supply of the present embodiment includes:
first adjusting a power transmission network;
judging whether the process gas is ignited successfully;
if not, continuing the first adjustment; and if the ignition is successful, carrying out second adjustment on the power transmission network in real time, and simultaneously carrying out impedance matching and coil current distribution on the radio frequency power supply.
First adjustments are made to the power transfer network.
The purpose of the first adjustment is to ignite the process gas in the reaction chamber before impedance matching and coil current distribution. When the rf power supply 1 starts to output power, the process gas is ignited by adjusting the impedance match sub-network 233. Specifically, the controller 22 controls the actuation of the first actuator M1 and the second actuator M2 such that the first and second actuators M1 and M2 respectively adjust the first adjustable capacitor C1And a second tunable capacitor C2The capacitance value of (2). The first output terminal sensor 231 detects the voltage value V of the first coil 311Sum current value I1The second output terminal sensor 232 detects the voltage value V of the second coil 322Sum current value I2The first and second output end sensors measure the voltage value V1Sum current value I1Voltage value V2Sum current value I2The first adjustable capacitance C is transmitted to the controller 22, and the controller 22 may calculate the first adjustable capacitance C by using a control algorithm, such as a proportional algorithm, a fuzzy algorithm, and the like1And a second tunable capacitor C2According to the adjustment quantity, a control command is sent to the first actuator M1 and the second actuator M2 to control the actuators to change the first adjustable capacitor C1And a second tunable capacitor C2Until ignition of the process gas.
It should be noted that the first adjustment does not make a distribution of the coil current, that is, the power distribution sub-network 234 is not adjusted until ignition is successful.
Then judging whether the process gas is ignited successfully; if the ignition is not successful, continuing the first regulation; and if the ignition is successful, carrying out second adjustment on the power transmission network in real time, and simultaneously carrying out impedance matching and coil current distribution on the radio frequency power supply.
Specifically, the controller 22 detects the voltage value V through the first and second output end sensors1Sum current value I1Voltage value V2Sum current value I2And judging whether the process gas is ignited or not. When the process gas is ignited, the voltage and current of the first coil 31 and the second coil 32 jump, and therefore, when the instantaneous variation of the voltage and current reaches a threshold value, the controller 22 considers that the process gas is ignited, and conversely, if the instantaneous variation of the voltage and current does not reach the threshold value, the process gas is not ignited.
If the process gas is not ignited successfully, the first adjustment is continued, the impedance matching sub-network 233 is continuously adjusted until the process gas is ignited, and if the process gas is ignited, the second adjustment is performed in real time, that is, the impedance matching sub-network 233 and the power distribution sub-network 234 are adjusted simultaneously, and the impedance matching and the coil current distribution are performed in parallel, so that the radio frequency power supply output impedance 11 is matched with the input impedance, and the distribution ratio of the coil current reaches a target value.
As shown in fig. 4, the impedance matching includes:
first, the input impedance of the impedance matching and power distribution network 23 is detected.
The input sensor 21 detects the voltage value V and the current value I at the input of the impedance matching and power distribution network 23 and transmits the voltage value V and the current value I to the controller 22. The controller 22 may use amplitude and phase discrimination to calculate the modulus | Z | and phase θ of the input impedance of the impedance matching and power distribution network 23.
Then, judging whether the input impedance of the impedance matching and power distribution network 23 is matched with the output impedance 11 of the radio frequency power supply, if so, returning to the step of detecting the input impedance; if not, then go to the adjustment step.
If the input impedance is matched with the output impedance 11, the ICP device is in an impedance matching state, and the previous step is returned to continuously monitor the input impedance value.
If the input impedance is not matched with the output impedance 11, or if the composition and pressure of the process gas in the reaction chamber are continuously changed along with the progress of the process, and the load impedance is also changed, so that the input impedance and the output impedance 11 of the radio frequency power supply are changed from matching to mismatching, the following adjustment steps are performed.
The controller 22 then calculates a first tunable capacitance C1And a second tunable capacitor C2The capacitance matching value is the first adjustable capacitance C during impedance matching1And a second tunable capacitor C2The capacitance value of (2). According to the capacitance matching value and the first and second adjustable capacitors C1、C2The controller 22 calculates a first tunable capacitance C1And a second tunable capacitor C2The control command is sent to the first actuator M1 and the second actuator M2 according to the adjustment amount. The actuator changes the first adjustable capacitor C after receiving the control command1And a second tunable capacitor C2The capacitance value of (3) makes the input impedance of the impedance matching and power distribution network 23 equal to the output impedance 11 of the radio frequency power supply, and the two reach conjugate matching, thus realizing real-time dynamic matching of impedance.
The coil current distribution includes:
first, the first output terminal sensor 231 detects the current value I of the first coil 311The second output terminal sensor 232 detects the current value I of the second coil 322。
Then, the first coil current value I is judged1And a second coil current value 12If the ratio reaches the target value, returning to the step of detecting the current value; if the target value is not reached, the following adjustment step is entered.
And if the coil current distribution proportion reaches the target value, returning to the previous step to continuously monitor the coil current value.
If the coil current distribution ratio does not reach the target value, or if the coil current distribution ratio needs to be readjusted as the process proceeds to maintain the uniformity of the film deposition or etching, i.e., if the target value changes, the following adjustment step is performed.
Thereafter, the controller 22 calculates a third tunable capacitance C3And a fourth tunable capacitor C4The target capacitance value is the third adjustable capacitance C when the current distribution proportion of the coil reaches the target value3And a fourth tunable capacitor C4The capacitance value of (2). The target value of the capacitance and the third and fourth adjustable capacitances C3、C4The controller 22 calculates a third adjustable capacitance C3And a fourth tunable capacitor C4According to the adjustment amount, control commands are sent to the third actuator M3 and the fourth actuator M4. After receiving the control command, the actuator changes the third adjustable capacitor C3And a fourth tunable capacitor C4So that the first coil current value I1And a second coil current value I2The proportion of the current distribution reaches a target value, and the dynamic real-time adjustment of the current distribution proportion is realized.
It can thus be seen that the present disclosure ensures the success of process gas ignition by igniting the process gas prior to impedance matching and coil current distribution. After the process gas is ignited successfully, the impedance matching and the coil current distribution are carried out simultaneously, so that the influence of the ignition on the impedance matching and the power distribution is reduced, and the impedance matching efficiency is improved. Meanwhile, the adjustable capacitor is adjusted after the ignition is successful, so that the risk of damage caused by the ignition of the impedance matching and power distribution network element is reduced, and the service life of the device is prolonged.
In the above embodiment, the power distribution sub-network 234 includes two branches, and two coils are connected through two output terminals, respectively, and the current can be distributed to the two coils, but the disclosure is not limited thereto. The inductively coupled plasma semiconductor processing apparatus may include more coils, and accordingly, the power distribution sub-network 234 may include more branches and outputs, respectively connected to the respective coils, with output sensors connected between the adjustable capacitors of the respective branches and the coils for detecting voltages and currents of the corresponding coils. Correspondingly, the multi-branch-circuit current divider further comprises more actuators respectively used for adjusting the capacitance values of the impedance network and the adjustable capacitors of the branches, so that the current distribution of the coils is realized. The actuator may be a motor, and the control command sent by the controller 22 is a motor rotation command.
Another embodiment of the present disclosure provides a power transmission method for a radio frequency power supply, which is suitable for a Capacitively Coupled Plasma (CCP) semiconductor processing apparatus. The features that are the same as or similar to those of the previous embodiment are not repeated, and only the features that are different from those of the previous embodiment are described below.
Referring to fig. 5, the capacitively coupled plasma semiconductor processing apparatus includes a reaction chamber 4, a power delivery network 2, and a radio frequency power supply 1. The reaction chamber 4 is provided with a first capacitor plate 33 and a second capacitor plate 34 at the top and a lower electrode 6 at the bottom, wherein the lower electrode 6 is used for supporting the wafer 5. One end of the power transmission network 2 is connected to the radio frequency power supply 1, and the other end is connected to the first capacitor plate 33 and the second capacitor plate 34.
Referring to fig. 6, impedance matching sub-network 233 is formed by a first tunable capacitor C1A second adjustable capacitor C2And an inductor L, wherein one end of the second adjustable capacitor C2 is connected to the RF power supply 1, the other end is connected to the inductor L, the inductor L is connected to the first branch and the second branch in parallel, and a fourth adjustable capacitor C of the second branch of the power distribution sub-network 2344Replaced by a fixed capacitor C5. Cancels a corresponding fourth adjustable capacitor C4And a fourth actuator M4.
Referring to fig. 7, the power transmission method of the radio frequency power supply in this embodiment specifically includes:
first adjusting a power transmission network;
judging whether the process gas is ignited successfully;
if not, continuing the first adjustment; and if the ignition is successful, performing second adjustment on the power transmission network in real time, and performing impedance matching and capacitance plate power distribution on the radio frequency power supply at the same time.
First adjustments are made to the power transfer network.
The process gas in the reaction chamber 4 is ignited before impedance matching and capacitive plate power distribution. When the rf power supply 1 starts to output power, the process gas is ignited by adjusting the impedance match sub-network 233. Specifically, the controller 22 controls the actuation of the first actuator M1 and the second actuator M2 such that the first and second actuators M1 and M2 respectively adjust the first adjustable capacitor C1And a second tunable capacitor C2The capacitance value of (2). The first output terminal sensor 231 detects the voltage value V of the first capacitive plate 331Sum current value I1The second output end sensor 232 detects the voltage value V of the second capacitor plate 342Sum current value I2The first and second output end sensors measure the voltage value V1Sum current value I1Voltage value V2Sum current value I2The first adjustable capacitance C is transmitted to the controller 22, and the controller 22 may calculate the first adjustable capacitance C by using a control algorithm, such as a proportional algorithm, a fuzzy algorithm, and the like1And a second tunable capacitor C2According to the adjustment quantity, a control command is sent to the first actuator M1 and the second actuator M2 to control the actuators to change the first adjustable capacitor C1And a second tunable capacitor C2Until ignition of the process gas.
Likewise, during the ignition step, no capacitive plate power is distributed, i.e., no adjustment is made to power distribution sub-network 234 until ignition is successful.
Judging whether the process gas is ignited successfully; if not, continuing the first adjustment; and if the ignition is successful, performing second adjustment on the power transmission network in real time, and performing impedance matching and capacitance plate power distribution on the radio frequency power supply at the same time.
The voltage value V detected by the controller 22 through the first and second output end sensors1Sum current value I1Voltage value V2Sum current value I2And judging whether the process gas is ignited or not. When the process gas is ignited, the voltage and current of the first and second capacitor plates 33 and 34 will jump, and thus, when the voltage and current change instantaneouslyUpon reaching a threshold, the controller 22 assumes that the process gas has ignited, and conversely, if the instantaneous change in voltage and current does not reach the threshold, assumes that the process gas has not ignited.
If the process gas is not ignited, the ignition step is returned to, the impedance matching sub-network 233 is continuously adjusted until the process gas is ignited, and if the process gas is ignited, a second adjustment is made to the power transmission network in real time, and the impedance matching and the capacitor plate power distribution are performed to the radio frequency power supply at the same time. And simultaneously, the impedance matching sub-network 233 and the power distribution sub-network 234 are adjusted to perform impedance matching and capacitance plate power distribution in parallel, so that the matching of the output impedance 11 of the radio frequency power supply and the input impedance and the distribution proportion of the capacitance plate power reach target values.
Referring to fig. 8, the impedance matching includes:
first, the input impedance of the impedance matching and power distribution network 23 is detected.
The input sensor 21 detects the voltage value V and the current value I at the input of the impedance matching and power distribution network 23 and transmits the voltage value V and the current value I to the controller 22. The controller 22 may use amplitude and phase discrimination to calculate the modulus | Z | and phase θ of the input impedance of the impedance matching and power distribution network 23.
Then, judging whether the input impedance of the impedance matching and power distribution network 23 is matched with the output impedance 11 of the radio frequency power supply, if so, returning to the step of detecting the input impedance; if not, then go to the adjustment step.
If the input impedance is matched with the output impedance 11, the CCP equipment is indicated to be in an impedance matching state, and the last step is returned to continuously monitor the input impedance value.
If the input impedance is not matched with the output impedance 11, or if the composition and pressure of the process gas in the reaction chamber 4 are continuously changed along with the progress of the process, and the load impedance is also changed, so that the input impedance and the output impedance 11 of the radio frequency power supply are changed from matching to mismatching, the following adjustment steps are performed.
Thereafter, the controller 22 calculates a first tunable capacitanceC1And a second tunable capacitor C2The capacitance match value of (c). The controller 22 further calculates a first tunable capacitance C1And a second tunable capacitor C2Sends control commands to the first actuator M1 and the second actuator M2 according to the adjustment amount. The actuator changes the first adjustable capacitor C after receiving the control command1And a second tunable capacitor C2The capacitance value of (3) makes the input impedance of the impedance matching and power distribution network 23 equal to the output impedance 11 of the radio frequency power supply, and the two reach conjugate matching, thus realizing automatic impedance matching.
The power allocation includes:
first, the first output terminal sensor 231 detects the voltage value V of the first capacitor plate 331Sum current value I1The second output end sensor 232 detects the voltage value V of the second capacitor plate 342Sum current value I2。
Then, the voltage value V is calculated1Sum current value I1And a voltage value V2Sum current value I2The power P of the first capacitor plate 33 is calculated separately1And power P of the second capacitor plate 342。
Then, the power P of the first capacitor plate 33 is determined1And power P of the second capacitor plate 342If the ratio reaches the target value, returning to the step of detecting the voltage value and the current value; if the target value is not reached, the following adjustment step is entered.
And if the power distribution proportion of the capacitor plate reaches the target value, returning to the previous step to continuously monitor the voltage value and the current value of the capacitor plate.
If the power distribution proportion of the capacitor plate does not reach the target value, or if the power distribution proportion of the capacitor plate needs to be readjusted along with the progress of the process so as to keep the uniformity of the film deposition or etching, namely, if the target value changes, the following adjusting step is performed.
Thereafter, the controller 22 calculates a third tunable capacitance C3The target value of capacitance. The controller 22 further calculates a third tunable capacitance C3Is prepared byAnd (4) adjusting the quantity, and sending a control command to the third actuator M3 according to the adjustment quantity. After receiving the control command, the actuator changes the third adjustable capacitor C3So that the first capacitor plate power P1And second capacitor plate power P2The proportion of the capacitor plate reaches a target value, and the adjustment of the power distribution proportion of the capacitor plate is realized.
Also, the present embodiment can ensure successful ignition of the process gas, improving the efficiency of impedance matching. Meanwhile, the risks of impedance matching of the capacitor and the inductor and damage of ignition of power distribution network elements are reduced, and the service life of the device is prolonged.
In the above-described embodiment, the capacitively coupled plasma semiconductor processing tool may include more capacitive plates, and accordingly, the power distribution sub-network 234 may include more branches and outputs, each of which is connected to a respective capacitive plate, and an output sensor is connected between the capacitance of each branch and the capacitive plate for detecting the voltage and current of the corresponding capacitive plate. The capacitance of each branch may be an adjustable capacitance, or the capacitance of one branch may be a fixed capacitance C5And the capacitors of other branches are all adjustable capacitors. Correspondingly, the circuit also comprises a plurality of actuators corresponding to the number of the adjustable capacitors, wherein the actuators are respectively used for adjusting the capacitance values of the impedance network and the adjustable capacitors of each branch circuit, and realizing power distribution to a plurality of capacitor plates.
The above-mentioned embodiments are intended to illustrate the objects, aspects and advantages of the present disclosure in further detail, and it should be understood that the above-mentioned embodiments are only illustrative of the present disclosure and are not intended to limit the present disclosure, and any modifications, equivalents, improvements and the like made within the spirit and principle of the present disclosure should be included in the scope of the present disclosure.
It should also be noted that directional terms, such as "upper", "lower", "front", "rear", "left", "right", and the like, used in the embodiments are only directions referring to the drawings, and are not intended to limit the scope of the present disclosure. Throughout the drawings, like elements are represented by like or similar reference numerals. Conventional structures or constructions will be omitted when they may obscure the understanding of the present disclosure.
Unless otherwise indicated, the numerical parameters set forth in the specification and attached claims are approximations that can vary depending upon the desired properties sought to be obtained by the present disclosure. In particular, all numbers expressing quantities of ingredients, reaction conditions, and so forth used in the specification and claims are to be understood as being modified in all instances by the term "about". Generally, the expression is meant to encompass variations of ± 10% in some embodiments, 5% in some embodiments, 1% in some embodiments, 0.5% in some embodiments by the specified amount.
Furthermore, the word "comprising" does not exclude the presence of elements or steps not listed in a claim. The word "a" or "an" preceding an element does not exclude the presence of a plurality of such elements.
The use of ordinal numbers such as "first," "second," "third," etc., in the specification and claims to modify a corresponding element is not itself intended to imply any ordinal numbers for the element, nor the order in which an element is sequenced or methods of manufacture, but are used to distinguish one element having a certain name from another element having a same name, but rather, to distinguish one element having a certain name from another element having a same name.
Similarly, it should be appreciated that in the foregoing description of exemplary embodiments of the disclosure, various features of the disclosure are sometimes grouped together in a single embodiment, figure, or description thereof for the purpose of streamlining the disclosure and aiding in the understanding of one or more of the various disclosed aspects. However, the disclosed method should not be interpreted as reflecting an intention that: that is, the claimed disclosure requires more features than are expressly recited in each claim. Rather, as the following claims reflect, disclosed aspects lie in less than all features of a single foregoing disclosed embodiment. Thus, the claims following the detailed description are hereby expressly incorporated into this detailed description, with each claim standing on its own as a separate embodiment of this disclosure.
Claims (8)
1. A method of delivering power from an rf power source to a reaction chamber using a power delivery network to energize process gases within the reaction chamber, comprising:
first adjusting the power transmission network;
judging whether the process gas is ignited successfully;
if not, continuing the first adjustment; and if the ignition is successful, carrying out second adjustment on the power transmission network in real time, and simultaneously carrying out impedance matching and power distribution on the radio frequency power supply.
2. The power transmission method of claim 1, wherein the power transmission network comprises: an impedance matching sub-network, the impedance matching sub-network comprising: at least one adjustable impedance element; the first adjustment includes: adjusting an impedance value of the at least one adjustable impedance element.
3. The power delivery method of claim 1 wherein the power delivery network connects a plurality of driven elements;
the judging whether the process gas is ignited successfully comprises the following steps:
detecting parameter values of the plurality of excitation elements;
judging whether the instantaneous variation of the parameter value reaches a threshold value;
if the threshold is reached, the process gas is ignited successfully;
if the threshold is not reached, the process gas is not ignited successfully.
4. The power transmission method of claim 1, wherein the power transmission network comprises: an impedance matching sub-network and a power distribution sub-network, each comprising: at least one adjustable impedance element;
the second adjustment includes: adjusting at least one adjustable impedance element of the impedance matching sub-network and at least one adjustable impedance element of the power distribution sub-network simultaneously.
5. The power transfer method of claim 4, wherein said adjusting at least one adjustable impedance element of said impedance matching sub-network comprises:
detecting an input impedance of the power transfer network;
judging whether the input impedance is matched with the output impedance of the radio frequency power supply;
if the matching is carried out, the detection is continued;
if not, calculating the impedance matching value of the at least one adjustable impedance element, calculating the adjustment amount of the impedance value according to the current impedance value of the at least one adjustable impedance element and the impedance matching value, and adjusting the impedance value of the at least one adjustable impedance element to the impedance matching value according to the adjustment amount to match the input impedance with the output impedance.
6. The power transmission method of claim 4, wherein the power distribution sub-network connects a plurality of excitation elements;
the adjusting at least one adjustable impedance element of the power distribution sub-network comprises:
detecting power parameters of a plurality of excitation elements;
judging whether the power parameter distribution proportion of the excitation elements reaches a target value or not;
if the target value is reached, continuing the detection;
if the target value is not reached, calculating the impedance target value of the at least one adjustable impedance element, calculating the adjustment quantity of the impedance value according to the current impedance value of the at least one adjustable impedance element and the impedance target value, and adjusting the impedance value of the at least one adjustable impedance element to the impedance target value according to the adjustment quantity so that the power parameter distribution proportion of the excitation elements reaches the target value.
7. The power transfer method of claim 6, wherein the driven element is a coil and the power parameter is a current.
8. A power transmission method as claimed in claim 6, wherein the excitation element is a capacitive plate and the power parameter is power.
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| CN201811253867.2A CN109412574B (en) | 2018-10-25 | 2018-10-25 | Power transmission method of radio frequency power supply |
| PCT/CN2019/113036 WO2020083340A1 (en) | 2018-10-25 | 2019-10-24 | Power transmission method for radio frequency power supply |
| TW108138477A TWI755642B (en) | 2018-10-25 | 2019-10-24 | A kind of power transmission method of radio frequency power supply |
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| CN109412574B (en) * | 2018-10-25 | 2020-07-17 | 北京北方华创微电子装备有限公司 | Power transmission method of radio frequency power supply |
| CN111725091A (en) * | 2019-03-22 | 2020-09-29 | 北京北方华创微电子装备有限公司 | Method and device for optimizing process flow, storage medium and semiconductor processing equipment |
| CN113517169B (en) * | 2021-04-22 | 2024-03-26 | 北京北方华创微电子装备有限公司 | Matcher output power debugging method and matcher output power debugging system |
| CN114501764B (en) * | 2022-01-26 | 2024-02-09 | 江苏神州半导体科技有限公司 | Gas dissociation circuit control device and system based on multi-coil coupling |
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