CN104330870A - High-numerical-aperture imaging objective lens for photoetching three-dimensional printer - Google Patents
High-numerical-aperture imaging objective lens for photoetching three-dimensional printer Download PDFInfo
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- CN104330870A CN104330870A CN201410614414.3A CN201410614414A CN104330870A CN 104330870 A CN104330870 A CN 104330870A CN 201410614414 A CN201410614414 A CN 201410614414A CN 104330870 A CN104330870 A CN 104330870A
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- photoetching
- objective lens
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- 238000001259 photo etching Methods 0.000 title claims abstract description 23
- 238000003384 imaging method Methods 0.000 title abstract description 7
- 239000011521 glass Substances 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 12
- 230000005622 photoelectricity Effects 0.000 claims description 5
- 238000005259 measurement Methods 0.000 claims description 2
- 230000003287 optical effect Effects 0.000 abstract description 15
- 230000004304 visual acuity Effects 0.000 description 6
- 238000013461 design Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 238000011160 research Methods 0.000 description 3
- 230000004075 alteration Effects 0.000 description 2
- 239000003292 glue Substances 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 239000005331 crown glasses (windows) Substances 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000005308 flint glass Substances 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002086 nanomaterial Substances 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 210000000056 organ Anatomy 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Lenses (AREA)
Abstract
The invention discloses a high numerical aperture imaging objective lens for a photoetching three-dimensional printer, which adopts a double telecentric structure and has 10 lenses in total, and the working waveband is 365nm +/-10 nm. The conjugate distance of the optical object image of the objective lens is 350mm, wherein the working distance of the object space is 85.2mm, and the working distance of the image space is about 79.5 mm. The effective field of view of the object space is 20mm multiplied by 20mm, the numerical aperture NA of the object space is 0.19, and the working resolution is sigma less than 100 mu m.
Description
Technical field
The present invention is a kind of high-NA image-forming objective lens for photoetching three-dimensional printer, belongs to the Research on Optical System field in three-dimensional microstructures process equipment.
Background technology
At present, three-dimensional structure printer has become the focus of engineering field investigation and application.Most three-dimensional structure printers are mainly used in the making of macroscopical components and parts, such as, substitute traditional machined components with 3 D-printing element.But in the microscopic three-dimensional components and parts making of CONSTRUCTED SPECIFICATION (resolving power) σ < 20um, the achievement of research is also few.Lacking a kind of reliable microtexture 3 D-printing equipment is hinder its major reason developed to meticulousr node.
Photoelectric technology research institute of the Chinese Academy of Sciences proposes a kind of 3D printer (number of patent application: 201310676063.4) of photoetching.This 3D printer, combines mask-free photolithography technology and three-dimensional curing technology, can effectively realize.
The time causing each subdivision face to expose due to the process that there is a rotation exposure is very short, and this photoetching three-dimensional printer needs larger instantaneous exposure energy.At present, most projection lens of lithography machine focus on image quality, number of lenses is comparatively huge, thus causes transmitance lower.In Practical Project, utilization is changed more high power light source and is solved this problem usually.But this type of solution significantly can increase volume and the cost of equipment, this mini-plant of photoetching three-dimensional printer is difficult to accept.Taking into account cost, volume and exposure efficiency is the problem that photoetching three-dimensional printer optical system needs solution badly.
Summary of the invention
In order to solve the above-mentioned problem mentioned, the present invention devises a kind of high-NA image-forming objective lens for photoetching three-dimensional printer.Compared to like product design, these object lens only have 10 pieces of eyeglasses, and numerical aperture is comparatively large, can balance all kinds of aberration preferably.
The technical solution used in the present invention is: a kind of high-NA image-forming objective lens for photoetching three-dimensional printer, it is characterized in that this projection objective image conjugate distance L=350mm;
Wherein object space working distance is 85.2mm, and image space working distance is 79.5mm;
Wherein operating central wavelength is 365nm, and effective service band is 360nm ~ 370nm;
These object lens are two heart symmetrical structure, altogether 10 pieces of eyeglasses far away;
Be the first arrangement of mirrors sheet before diaphragm from object plane light direction, the first arrangement of mirrors sheet comprises the first eyeglass L1, the second eyeglass L2, the 3rd eyeglass L3, the 4th eyeglass L4, the 5th eyeglass L5, and wherein the 5th eyeglass L5 is negative lens, and all the other eyeglasses are positive lens; From being the second arrangement of mirrors sheet before image planes after diaphragm, the second arrangement of mirrors sheet comprises the 6th eyeglass L6, the 7th eyeglass L7, the 8th eyeglass L8, the 9th eyeglass L9, the tenth eyeglass L10; Second arrangement of mirrors sheet and the first arrangement of mirrors sheet are about diaphragm symmetry, and namely the 6th eyeglass L6 is identical with the 5th eyeglass L5, and the 7th eyeglass L7 is identical with the 4th eyeglass L4, and by that analogy;
Further, simultaneously the object space of object lens, image space telecentricity control within ± 0.5 °, telecentricity described in these object lens controls within ± 0.5 °, can ensure that object lens are when a certain amount of skew occurs for image planes or object plane like this, and image quality and enlargement ratio can not be much affected.
Further, these object lens become-1 times of inverted image, namely enlargement ratio be-1 ×.
Further, object space apparent field is 20mm × 20mm, and object-side numerical aperture is NA
thing=0.19.
Further, all glass for lenses materials all adopt the material of the bright photoelectricity company in domestic Chengdu, and the trade mark is respectively: H-K9L, H-QK3L, F2; These three kinds of materials have good transmitance in the actual measurement of 356nm wave band.
Principle of the present invention is:
For a high-NA image-forming objective lens for photoetching three-dimensional printer, its image conjugate distance L=350mm.Wherein object space working distance L
thing=85.2mm, image space working distance L
picture=79.5mm.These object lens object space apparent field 20mm × 20mm, object-side numerical aperture NA
thing=0.19.Object lens enlargement ratio β=-1 ×, therefore image space apparent field is similarly 20mm × 20mm, image-side numerical aperture NA
picture=0.19.This objective lens design centre wavelength is i line, i.e. 365nm, and effective service band is 360nm ~ 370nm.The image-forming objective lens for photoetching three-dimensional printer proposed in the present invention, has 10 pieces of eyeglasses.From incident direction before diaphragm, being provided with L1 ~ L5 totally 5 pieces of eyeglasses successively, is the first mirror group.Wherein L5 is negative lens, and all the other eyeglasses are positive lens.To image planes from diaphragm, being provided with L6 ~ L10 totally 5 pieces of eyeglasses successively, is the second mirror group.Second mirror group optical parametric becomes specular with the first mirror group optical parametric about diaphragm, and center air interval can carry out finely tuning to balance picture element.Whole image-forming objective lens optical texture is double telecentric structure.The advantage of this structure is: when object plane or image planes generation minor shifts, and enlargement ratio, the image quality of camera lens can not have greatly changed.
A kind of high-NA image-forming objective lens initial optimization structural parameters for photoetching three-dimensional printer of the present invention are as shown in the table:
| Radius | Centre distance | The glass trade mark | |
| Object plane | 85.20 | ||
| 1 | 2151 | 14.00 | H-K9L |
| 2 | -83 | 12.20 | |
| 3 | 45 | 8.30 | H-K9L |
| 4 | 100 | 24.50 | |
| 5 | 61 | 10.00 | H-QK3L |
| 6 | -931 | 0.20 | |
| 7 | 32 | 10.00 | H-QK3L |
| 8 | 95 | 2.00 | |
| 9 | -120 | 6.00 | F2 |
| 10 | 23 | 2.80 | |
| Diaphragm | 6.40 | ||
| 11 | -23 | 6.00 | F2 |
| 12 | 120 | 2.00 | |
| 13 | -95 | 10.00 | H-QK3L |
| 14 | -32 | 0.20 | |
| 15 | 931 | 10.00 | H-QK3L |
| 16 | -61 | 24.50 | |
| 17 | -100 | 8.30 | H-K9L |
| 18 | -45 | 13.00 | |
| 19 | 83 | 14.00 | H-K9L |
| 20 | -2151 | 79.48 | |
| Image planes | 0.00 |
According to Rayleigh criterion
known, numerical aperture NA is directly proportional to the resolving power of optical system, and namely the numerical aperture of image-forming objective lens is larger, and the minimum feature of its imaging is narrower.The numerical aperture 0.19 of this image-forming objective lens, if process factor k=0.8, then can ensure that this image-forming objective lens resolving power is less than 30 μm in theory.The demand making characteristic dimension and be less than hundred micron order three-dimensional micro-nano structures can be met completely.
The glass material that these object lens adopt domestic Chengdu Guangming Photoelectricity Joint-stock Co., Ltd to produce, the trade mark is H-K9L, F2, H-QK3L.These three kinds of trade mark glass are better performances in the actual test of i line, and transmitance is higher.
| Refractive index (n 365) | Abbe number (ν) | |
| H-K9L | 1.53622 | 500.7057 |
| F2 | 1.66623 | 228.6286 |
| H-QK3L | 1.50405 | 555.9296 |
Wherein Abbe number is mainly used to weigh a certain glass material or the dispersion degree of medium in corresponding wave band.Its value and glass dispersive power are inversely proportional to, and flint glass (F2) dispersive power is greater than crown glass (H-K9L, H-QK3L).The computing formula of Abbe number is
n
365, n
362, n
368be respectively corresponding refractive index that exposure center wavelength and wave band roll off the production line.
The present invention's advantage is compared with prior art:
(1) numerical aperture of object lens of the present invention is comparatively large, and resolving power is higher, and all kinds of aberration obtains and effectively balances.
(2) the eyeglass number of object lens employing of the present invention is less, and optical energy loss is less, and lens materials all adopts domestic glass, and cost is lower.
Accompanying drawing explanation
Fig. 1 is a kind of high-NA image-forming objective lens optical structure chart for photoetching three-dimensional printer of the present invention;
Fig. 2 is a kind of high-NA image-forming objective lens MTF curve for photoetching three-dimensional printer of the present invention;
Fig. 3 is the some disc of confusion figure of a kind of high-NA image-forming objective lens for photoetching three-dimensional printer of the present invention;
Fig. 4 is a kind of high-NA image-forming objective lens for photoetching three-dimensional printer of the present invention.
Embodiment
Below in conjunction with accompanying drawing, specific embodiments of the present invention is described in detail.
As shown in Figure 1, purple LED array emergent ray result illuminator collimates and parallelly after even light incides on digital micromirror array (DMD) optical texture of the present invention, i.e. on the object plane of these object lens.Wherein the maximum effective working size of DMD is no more than 20mm × 20mm.The pattern that DMD is formed to ultraviolet glue, makes the instantaneous solidification of ultraviolet glue through the imaging of these object lens, forms spatial structure.
As shown in Figure 1, this image-forming objective lens with first piece of eyeglass L1 towards the plane of incidence of object plane for first surface, along optical axis by that analogy, 20 optical surfaces altogether, 10 pieces of eyeglasses, image conjugate distance is L=350mm.Wherein numbering L5, L6 are negative lens, and all the other eyeglasses are positive lens.The optical parametric of all eyeglasses becomes specular, double telecentric structure centered by diaphragm, and can ensure thing, image planes are when having trace to depart from, image quality and enlargement ratio all can not change.
As shown in Figure 1, the high-NA lithographic objective optical material be similar in the present invention all adopts the bright photoelectricity Products in domestic Chengdu, and this still lacks use case at home.Through after strict experiment test, the glass of H-K9L, H-QK3L, F2 tri-kinds of trades mark of the bright photoelectricity company in Chengdu is functional in the imaging of 365nm wave band, transmitance is relatively high and price is comparatively cheap, therefore this camera lens adopts these three sections of glass to be optimized design.
After applying above-mentioned three kinds of glass materials, the transmitance of these object lens is estimated and is roughly about 55%, so object lens have good transmitance in this example in ZEMAX software.
When optical element and mechanical organ assembling, the centre distance between needing each eyeglass carries out trace adjustment, to make up the picture element deviation because type processing in face produces, to ensure that object lens image quality reaches optimum.In this example, after centre distance fine setting, Optic structure parameter is:
| Radius | Centre distance | Glass material | |
| Image planes | 85.20 | ||
| 1 | 2151 | 14.00 | H-K9L |
| 2 | -83 | 12.17 | |
| 3 | 45 | 8.32 | H-K9L |
| 4 | 100 | 25.57 | |
| 5 | 61 | 10.00 | H-QK3L |
| 6 | -931 | 0.20 | |
| 7 | 32 | 10.00 | H-QK3L |
| 8 | 95 | 1.74 | |
| 9 | -120 | 6.00 | F2 |
| 10 | 23 | 2.63 | |
| Diaphragm | 5.64 | ||
| 11 | -23 | 6.00 | F2 |
| 12 | 120 | 2.07 | |
| 13 | -95 | 10.00 | H-QK3L |
| 14 | -32 | 0.20 | |
| 15 | 931 | 10.00 | H-QK3L |
| 16 | -61 | 24.83 | |
| 17 | -100 | 8.32 | H-K9L |
| 18 | -45 | 16.92 | |
| 19 | 83 | 14.00 | H-K9L |
| 20 | -2151 | 79.49 | |
| Image planes |
According to the image-forming objective lens after parameter adjustment in upper table, its image quality can be calculated comparatively truly in optical simulation software ZEMAX, as shown in Figure 2,3, 4.In this example, object lens 50 lines right/spatial frequency spectrum of mm in, peripheral field contrast is greater than 0.7; RMS (root mean square) the radius value < 3 μm of object lens point spread function and GEO (geometry) radius value < 14 μm, best resolving power is lower than 30 μm; Meanwhile, the maximum curvature of field of object lens 70 μm, peripheral field maximum distortion < 10 μm, meets distortion for design resolving power
requirement.
Above-mentioned embodiment and result are not the preferably embodiment of imaging performance of the present invention, but its every evaluation index is all better than designing requirement, has good imaging effect.If can reduce process factor further when mirror finish and mechanical-optical setup assembling, a step gets a promotion by the image quality of object lens.In addition, this image-forming objective lens small volume and conjugate distance is shorter, can be integrated in photoetching three-dimensional printer preferably.
Claims (5)
1. for a high-NA image-forming objective lens for photoetching three-dimensional printer, it is characterized in that: this projection objective image conjugate distance is L=350mm;
Wherein the object space working distance of object lens is 85.2mm, and image space working distance is 79.5mm, and object lens operating central wavelength is 365nm, and effective service band is 360nm ~ 370nm;
These object lens have 10 pieces of eyeglasses, form two heart symmetrical structure far away, be the first arrangement of mirrors sheet before diaphragm from object plane light direction, first arrangement of mirrors sheet comprises the first eyeglass L1, the second eyeglass L2, the 3rd eyeglass L3,4th eyeglass L4,5th eyeglass L5, wherein the 5th eyeglass L5 is negative lens, and all the other eyeglasses are positive lens; From being the second arrangement of mirrors sheet before image planes after diaphragm, the second arrangement of mirrors sheet comprises the 6th eyeglass L6, the 7th eyeglass L7, the 8th eyeglass L8, the 9th eyeglass L9, the tenth eyeglass L10; Second arrangement of mirrors sheet and the first arrangement of mirrors sheet are about diaphragm symmetry, and namely the 6th eyeglass L6 is identical with the 5th eyeglass L5, and the 7th eyeglass L7 is identical with the 4th eyeglass L4, and by that analogy.
2. a kind of high-NA image-forming objective lens for photoetching three-dimensional printer according to claim 1, it is characterized in that: simultaneously the object space of object lens, image space telecentricity control within ± 0.5 °, telecentricity described in these object lens controls within ± 0.5 °, can ensure that object lens are when a certain amount of skew occurs for image planes or object plane like this, and image quality and enlargement ratio can not be much affected.
3. a kind of high-NA image-forming objective lens for photoetching three-dimensional printer according to claim 1, is characterized in that: these object lens become-1 times of inverted image, namely enlargement ratio be-1 ×.
4. a kind of high-NA image-forming objective lens for photoetching three-dimensional printer according to claim 1, it is characterized in that: object space apparent field is 20mm × 20mm, object-side numerical aperture is NA
thing=0.19.
5. a kind of high-NA image-forming objective lens for photoetching three-dimensional printer according to claim 1, is characterized in that: all glass for lenses materials all adopt the material of the bright photoelectricity company in domestic Chengdu, and the trade mark is respectively: H-K9L, H-QK3L, F2; These three kinds of materials have good transmitance in the actual measurement of 356nm wave band.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201410614414.3A CN104330870B (en) | 2014-11-04 | 2014-11-04 | High-numerical-aperture imaging objective lens for photoetching three-dimensional printer |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410614414.3A CN104330870B (en) | 2014-11-04 | 2014-11-04 | High-numerical-aperture imaging objective lens for photoetching three-dimensional printer |
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| CN104330870A true CN104330870A (en) | 2015-02-04 |
| CN104330870B CN104330870B (en) | 2016-11-30 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109541782A (en) * | 2018-12-24 | 2019-03-29 | 中国科学院福建物质结构研究所 | Double telecentric optical system, silent frame imaging device, optical lens is imaged in silent frame |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4650295A (en) * | 1984-04-03 | 1987-03-17 | Nippon Kogaku K. K. | Wide angle and variable magnification lens system for finite distance |
| JPS63186207A (en) * | 1987-01-29 | 1988-08-01 | Ricoh Co Ltd | Large-aperture lens for copying |
| CN102346291A (en) * | 2010-08-02 | 2012-02-08 | 上海微电子装备有限公司 | Coaxial double-telecentric imaging optics system |
| CN103631002A (en) * | 2013-11-14 | 2014-03-12 | 中国科学院上海光学精密机械研究所 | Compact photolithographic projection lens |
-
2014
- 2014-11-04 CN CN201410614414.3A patent/CN104330870B/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4650295A (en) * | 1984-04-03 | 1987-03-17 | Nippon Kogaku K. K. | Wide angle and variable magnification lens system for finite distance |
| JPS63186207A (en) * | 1987-01-29 | 1988-08-01 | Ricoh Co Ltd | Large-aperture lens for copying |
| CN102346291A (en) * | 2010-08-02 | 2012-02-08 | 上海微电子装备有限公司 | Coaxial double-telecentric imaging optics system |
| CN103631002A (en) * | 2013-11-14 | 2014-03-12 | 中国科学院上海光学精密机械研究所 | Compact photolithographic projection lens |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109541782A (en) * | 2018-12-24 | 2019-03-29 | 中国科学院福建物质结构研究所 | Double telecentric optical system, silent frame imaging device, optical lens is imaged in silent frame |
| CN109541782B (en) * | 2018-12-24 | 2020-08-28 | 中国科学院福建物质结构研究所 | Full-frame imaging double telecentric optical system, full-frame imaging device and optical lens |
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