CN203858413U - Symmetric relay optical system - Google Patents
Symmetric relay optical system Download PDFInfo
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- CN203858413U CN203858413U CN201420154395.6U CN201420154395U CN203858413U CN 203858413 U CN203858413 U CN 203858413U CN 201420154395 U CN201420154395 U CN 201420154395U CN 203858413 U CN203858413 U CN 203858413U
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- relay optical
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- symmetrical expression
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Abstract
The utility model relates to a symmetric relay optical system, which sequentially comprises a first lens, a second lens, a third lens, an aperture diaphragm, a fourth lens, a fifth lens and a sixth lens from an object surface side along the direction of an optical axis. The symmetric relay optical system adopts a symmetric structure, and can effectively correct the vertical axis aberration. Meanwhile, positive and negative focal power balance matching is adopted, thereby effectively correcting the axial aberration, and meeting requirements of a Rayleigh criterion. The symmetric relay optical system realizes a larger field of view by adopting a small number of lenses, is compact in structure, small in size, light in weight and conducive to conducting various experiments, can be applied to a polarization state measuring experiment for a polarization lighting system, can be applied to a light pupil filtering experiment, and can also be applied to a lighting mode optimization experiment and the like.
Description
Technical field
The utility model relates to a kind of symmetrical expression relay optical system, particularly a kind of symmetrical expression relay optical system for polarized illumination system polarimetry experiment.
Background technology
Adopt argon fluoride (ArF) excimer laser technology and immersion lithography technology, and coordinate digraph shape exposure technique, realized at present 32nm node optical semiconductor lithography volume production, the exemplary apparatus of realizing this technology is that Dutch ASML company model is the litho machine of TWINSCAN NXT:1950i.For current 22nm node optical lithography volume production, because still having some gordian techniquies at present, extreme ultraviolet lithography (EUVL) need to improve, ArF immersion lithography technology obtains the support of polarization illumination technology, digraph shape and multiple graphs technology simultaneously, still show powerful vitality, for example ASML company model is that the litho machine of TWINSCAN NXT:1960Bi and 1970Ci is still one of strong rival of 22nm node, and this three equipment all adopts the projection objective of industry maximum numerical aperture (NA=1.35).
ArF photoetching technique develops into the NA=1.35 epoch support energetically that (the 5th generation immersion lithography technology) obtained some gordian techniquies, and ASML company is as far back as the NA=0.75 epoch of the PAS series litho machine life of immersion liquid technology, polarization illumination technology etc. some gordian techniquies with continuity ArF photoetching technique that just begins one's study.For example, it is to adopt conventional art that PAS5500/1150C litho machine is realized 90nm node optical lithography, for TWINSCAN XT:1450H litho machine (NA=0.93), adopt conventional art can realize 65nm node technology, and adopt polarization illumination technology just resolution can be brought up to 57nm.Visible, in the situation that extreme ultraviolet lithography (EUVL) still has some gordian techniquies (such as light source power problem, mask problem, photoresist problem etc.) to improve at present, research immersion lithography technology, polarization illumination technology etc. just seem there is very much realistic meaning.
The gordian techniquies such as research immersion lithography technology, polarization illumination technology, first need to have the photoetching projection objective lens of an experiment use, it can be tested for pupil filtering for the measuring polarization state experiment of polarized illumination system, can also be for lighting system Optimal Experimental etc.
Summary of the invention
The purpose of this utility model is to provide a kind of symmetrical expression relay optical system, and this optical system can, for the measuring polarization state of polarized illumination system, can, for pupil filtering, can also be optimized etc. for lighting system.
The purpose of this utility model is achieved in that
A kind of symmetrical expression relay optical system, along its optical axis direction, from object plane one side, comprise successively: first lens to the three lens, aperture diaphragm, the 4th lens to the six lens, it is characterized in that, first lens has positive light coke with the 6th lens and focal length is identical, the second lens have negative power with the 5th lens and focal length is identical, the 3rd lens have negative power with the 4th lens and focal length is identical, first lens and the 6th lens are biconvex lens, the second lens and the 4th lens are that concave surface is towards the meniscus lens of image planes, the 3rd lens and the 5th lens are that concave surface is towards the meniscus lens of object plane.
All six lens all adopt the fused quartz material of high permeability to make.
All six lens all adopt the fused quartz material of high permeability, and the fused quartz material of optional Corning Incorporated 7980 trades mark also can select the Lithosil of Schott AG
tMq0/1-E193 fused quartz material.
The utility model compared with prior art, has following advantage and good effect:
1, symmetrical expression relay optical system of the present utility model, adopts symmetrical structure, can effectively proofread and correct vertical axial aberration, adopts positive negative power balance coupling effectively to proofread and correct axial aberration simultaneously, meets the requirement of Rayleigh criterion;
2, symmetrical expression relay optical system of the present utility model, adopts the lens try one's best few to realize larger visual field, and compact conformation, volume are little, lightweight, are conducive to carrying out of various experiments.
Accompanying drawing explanation
Fig. 1 is structure and the index path of symmetrical expression relay optical system of the present utility model;
Fig. 2 is the modulation transfer function figure of symmetrical expression relay optical system of the present utility model;
Fig. 3 is the RMS wave aberration distribution plan of symmetrical expression relay optical system of the present utility model.
Embodiment
Below will be described in further detail symmetrical expression relay optical system of the present utility model.
The purpose of this utility model is to provide a kind of symmetrical expression relay optical system, can test for pupil filtering for the measuring polarization state experiment of polarized illumination system, can also be for lighting system Optimal Experimental etc.
The constrained parameters of symmetrical expression relay optical system of the present utility model are as shown in table 1, operation wavelength is that 193.368nm(adopts argon fluoride ArF quasi-molecule laser source), therefore all lens all adopt the fused quartz material of high permeability, the fused quartz material of optional Corning Incorporated 7980 trades mark, also can select the Lithosil of Schott AG
tMq0/1-E193 fused quartz material.Image space numerical aperture is 0.02, and image space diameter is 8.192mm, and enlargement ratio is-1 times, and optics overall length (conjugate distance) is for being less than 101.6mm.
Table 1 symmetrical expression relay optical system of the present utility model design constraint parameter
| Constraint project | Parameter |
| Operation wavelength | 193.368nm |
| Image space numerical aperture | 0.02 |
| Image space diameter | 8.192mm |
| Enlargement ratio | -1 |
| Object space working distance | >25.4mm |
| Image space working distance | >25.4mm |
| Conjugate distance | <101.6mm |
| Fused quartz refractive index 193.368nm | 1.560259 |
The utility model discloses a kind of symmetrical expression relay optical system, as shown in Figure 1, this symmetrical expression relay optical system altogether comprises six lens, along optical axis direction, from object plane 101 1 sides, to image planes 303, comprise successively: first lens L1 to the three lens L3, aperture diaphragm 202, the 4th lens L4 to the six lens L6, it is characterized in that, first lens L1 has positive light coke with the 6th lens L6 and focal length is identical, the second lens L2 has negative power with the 5th lens L5 and focal length is identical, the 3rd lens L3 has negative power with the 4th lens L4 and focal length is identical, it is characterized in that, first lens L1 and the 6th lens L6 are biconvex lens, the second lens L2 and the 4th lens L4 are that concave surface is towards the meniscus lens of image planes, the 3rd lens L3 and the 5th lens L5 are that concave surface is towards the meniscus lens of object plane.
All six lens all adopt the fused quartz material of high permeability to make.
All six lens all adopt the fused quartz material of high permeability, and the fused quartz material of optional Corning Incorporated 7980 trades mark also can select the Lithosil of Schott AG
tMq0/1-E193 fused quartz material.
According to symmetrical expression relay optical system design constraint parameter in table 1, the design data of the disclosed symmetrical expression relay optical system of the utility model is as shown in table 2, table 2 has provided the specific design parameter value of each piece lens of the symmetrical expression relay optical system of the present embodiment, wherein, the numbering from object plane (Object) to each optical surface image planes (Image) has been indicated on " surface " hurdle, and wherein STOP represents aperture diaphragm." radius " hurdle has provided each surperficial corresponding surface radius." thickness/interval " hurdle has provided the axial distance between adjacent two surfaces, if this two surface belongs to same lens, and the thickness of these lens of numeric representation at " thickness/interval ", otherwise represent that thing/image planes are to the distance of lens or the spacing of adjacent lens." optical material " hurdle indicate the material of corresponding lens." semiaperture " hurdle indicated 1/2 aperture value on corresponding surface, i.e. half height." affiliated object " hurdle indicated from object plane to image planes between each surperficial corresponding lens.
The design parameter of table 2 symmetrical expression relay optical system of the present utility model
Under the Parameter Conditions such as operation wavelength in table 1, visual field, numerical aperture, known according to the analytical calculation of professional optical design software CODE_V, its aberration correction degree is as follows.
Fig. 2 has shown the modulation transfer function of the present embodiment, approaches diffraction limit, and Fig. 3 is the distribution of the RMS wave aberration of the present embodiment, and maximal value is 4.2nm.This has reflected that the image quality of the present embodiment meets the requirement of Rayleigh criterion.
The utlity model has following advantage and good effect:
1, symmetrical expression relay optical system of the present utility model, adopts symmetrical structure, can effectively proofread and correct vertical axial aberration, adopts positive negative power balance coupling effectively to proofread and correct axial aberration simultaneously, meets the requirement of Rayleigh criterion;
2, symmetrical expression relay optical system of the present utility model, adopts the lens try one's best few to realize larger visual field, and compact conformation, volume are little, lightweight, are conducive to carrying out of various experiments.
Claims (2)
1. a symmetrical expression relay optical system, along its optical axis direction, from object plane one side, comprise successively first lens to the three lens, aperture diaphragm, the 4th lens to the six lens, it is characterized in that, first lens has positive light coke with the 6th lens and focal length is identical, the second lens have negative power with the 5th lens and focal length is identical, the 3rd lens have negative power with the 4th lens and focal length is identical, first lens and the 6th lens are biconvex lens, the second lens and the 4th lens are that concave surface is towards the meniscus lens of image planes, the 3rd lens and the 5th lens are that concave surface is towards the meniscus lens of object plane.
2. symmetrical expression relay optical system according to claim 1, is characterized in that, all six lens all adopt the fused quartz material of high permeability to make.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420154395.6U CN203858413U (en) | 2014-04-01 | 2014-04-01 | Symmetric relay optical system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420154395.6U CN203858413U (en) | 2014-04-01 | 2014-04-01 | Symmetric relay optical system |
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| Publication Number | Publication Date |
|---|---|
| CN203858413U true CN203858413U (en) | 2014-10-01 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201420154395.6U Expired - Fee Related CN203858413U (en) | 2014-04-01 | 2014-04-01 | Symmetric relay optical system |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103926801A (en) * | 2014-04-01 | 2014-07-16 | 中国科学院上海光学精密机械研究所 | Projection optical system |
| CN111736438A (en) * | 2020-07-24 | 2020-10-02 | 苏州天准科技股份有限公司 | Direct imaging optical apparatus |
-
2014
- 2014-04-01 CN CN201420154395.6U patent/CN203858413U/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103926801A (en) * | 2014-04-01 | 2014-07-16 | 中国科学院上海光学精密机械研究所 | Projection optical system |
| CN103926801B (en) * | 2014-04-01 | 2016-03-09 | 中国科学院上海光学精密机械研究所 | Projection optical system |
| CN111736438A (en) * | 2020-07-24 | 2020-10-02 | 苏州天准科技股份有限公司 | Direct imaging optical apparatus |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20141001 Termination date: 20200401 |