CN102998779B - A kind of varifocal lithographic objective system - Google Patents
A kind of varifocal lithographic objective system Download PDFInfo
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- CN102998779B CN102998779B CN201210279818.2A CN201210279818A CN102998779B CN 102998779 B CN102998779 B CN 102998779B CN 201210279818 A CN201210279818 A CN 201210279818A CN 102998779 B CN102998779 B CN 102998779B
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Abstract
A kind of varifocal lithographic objective system, belong to optical technical field, the present invention cannot realize to solve existing lithographic objective the problem that same lithographic objective exposes the mask plate exposure figure of different proportion size, and present system is followed successively by from object plane to image planes: object plane, the first lens combination, the second lens combination, the 3rd lens combination, the 4th lens combination, the 5th lens combination and image planes; Object plane is mask plate place plane; First lens combination is used for the distance of fixing object plane and zoom system first lens; Second lens combination plays the effect changing lithographic objective focal length and image planes size; 3rd lens combination effect is, when the movement compensating image planes in zoom group moving process, image planes to be fixed holding position in whole zoom process; 4th lens combination, has negative power, and the 5th lens combination, has positive light coke, and both form latter fixing group, for ensureing that the last a slice lens of lithographic objective near image planes side and image planes are apart from constant; Image planes are etching substrate place plane.
Description
Technical field
The invention belongs to optical technical field, be specifically related to a kind of varifocal lithographic objective system.
Background technology
In the photoetching technique of modem high-resolution integrated circuit fabrication process, lithographic equipment is a kind of very important equipment.Lithographic objective system is vital core component in lithography equipment.Lithographic equipment has mask lithography device and the large class of maskless lithography device two by whether adopting mask plate to be mainly divided into, and two kinds of photolithographicallpatterned adopt projection lithography exposure form mostly.There is mask lithography device by the exposure figure information projection on mask plate on etching substrate; Maskless lithography device is by the exposure figure information projection of spatial light modulator on etching substrate, and the exposure figure information on mask plate is presented by complicated technologies such as developments by etching substrate.But lithographic objective system adopts fixed-focus system substantially, namely a set of lithographic objective system can only expose the exposure figure of a kind of ratio of mask plate or digital light modulator, the varifocal function of lithographic objective in same lithographic equipment cannot be realized, namely can not realize presenting of mask plate exposure figure different proportion size.
Summary of the invention
The present invention is fixed-focus system to solve existing lithographic objective, cannot realize the problem that same lithographic objective exposes the mask plate exposure figure of different proportion size, provides a kind of varifocal lithographic objective system.
Technical scheme of the present invention is:
A kind of varifocal lithographic objective system, is followed successively by: object plane, the first lens combination, the second lens combination, the 3rd lens combination, the 4th lens combination, the 5th lens combination and image planes from object plane to image planes;
Object plane is mask plate place plane;
First lens combination is first fixing group, has positive light coke, for the distance of fixing object plane and zoom system first lens;
Second lens combination is zoom group, has negative power, plays the effect changing lithographic objective focal length and image planes size;
3rd lens combination is compensating group, has positive light coke, and effect is, when the movement compensating image planes in zoom group moving process, image planes to be fixed holding position in whole zoom process;
4th lens combination, has negative power, and the 5th lens combination, has positive light coke, and both form latter fixing group, for ensureing that the last a slice lens of lithographic objective near image planes side and image planes are apart from constant;
Image planes are etching substrate place plane.
Described a kind of varifocal lithographic objective system comprises 22 pieces of lens altogether, is arranged in order near object plane side near image planes side.
Described first lens combination is made up of to the 3rd lens the first lens, and the first lens are biconvex positive lens, the second lens are the recessed negative lens in the left convex right side and the 3rd lens are the thin positive lens of biconvex.
Described second lens combination is made up of the 4th lens and the 5th lens, 4th lens are the convex thin negative lens in the left recessed right side, 5th lens are double-concave negative lens, and the rear surface of the 4th lens is identical with the front surface radius-of-curvature of the 5th lens, together with the 4th lens can be joined with the 5th lens or can infinite approach.
Described 3rd lens combination is made up of the 6th lens and the 7th lens, and the 6th lens and the 7th lens are biconvex positive lens.
Described 4th lens combination is made up of to the 12 lens the 8th lens, and the 8th lens are the convex positive meniscus lens in the left recessed right side, and the 9th lens to the 12 lens are the convex negative lens in the left recessed right side, and the 12 lens, the 13 lens are double-concave negative lens; The rear surface of the 8th lens is identical with the front surface radius-of-curvature of the 9th lens, together with the 8th lens are glue-bondable with the 9th lens or can infinite approach.
Described 5th lens combination is made up of to the 22 lens the 14 lens, 14 lens are the convex positive lens in the left recessed right side, 15 lens are biconvex positive lens, 16 lens and the 17 lens are the recessed positive lens in the left convex right side, 18 lens are the recessed negative lens mirror in the left convex right side, 19 lens are double-concave negative lens, and the 20 lens are the recessed positive lens in the left convex right side, and the 21 lens and the 22 lens are the recessed positive meniscus lens in the left convex right side.
Principle of work illustrates: the telecentric beam of object space compresses into zoom group by the first lens combination G1, second lens combination G2 and zoom group move to four varifocal positions from left to right, object space telecentric beam is pressed into the 4th lens combination by the movement that movement compensates image planes in zoom group moving process from left to right simultaneously of the 3rd lens combination G3 and compensating group simultaneously again, light beam is put upside down the 5th lens combination inciding and be made up of ten lens by the 4th lens combination, and the 5th lens combination mainly completes the correction of aberration and produces the image space heart far away.The distance controlling object plane O to image planes I in whole zooming procedure is always 805mm, and object plane is 147.5733mm to the distance of the first lens front surface, and the 22 lens rear surface is 3.5mm to the distance of image planes.
The invention has the beneficial effects as follows: varifocal is combined in a system with double telecentric structure by the present invention, in a group for photo etching objective system, realize the high-resolution image quality of different multiplying; All lens of light varifocal lithographic objective of the present invention are spherical mirror, and the total length of optics, clear aperture are less, and compact conformation reduces difficulty of processing and manufacturing cost.
Accompanying drawing explanation
Fig. 1 is the structural representation of optical system of the present invention when zoom position zoom1.
Fig. 2 is the transport function of optical system of the present invention when zoom position zoom1.
Fig. 3 is the transport function of optical system of the present invention when zoom position zoom1 during out of focus 1 μm.
Fig. 4 is the curvature of field figure of optical system of the present invention when zoom position zoom1.
Fig. 5 is the distortion figure of optical system of the present invention when zoom position zoom1.
Fig. 6 is the structural representation of optical system of the present invention when zoom position zoom2.
Fig. 7 is the transport function of optical system of the present invention when zoom position zoom2.
Fig. 8 is the transport function of optical system of the present invention when zoom position zoom2 during out of focus 1 μm.
Fig. 9 is the curvature of field figure of optical system of the present invention when zoom position zoom2.
Figure 10 is the distortion figure of optical system of the present invention when zoom position zoom2.
Figure 11 is the structural representation of optical system of the present invention when zoom position zoom3.
Figure 12 is the transport function of optical system of the present invention when zoom position zoom3.
Figure 13 is the transport function of optical system of the present invention when zoom position zoom3 during out of focus 1 μm.
Figure 14 is the curvature of field figure of optical system of the present invention when zoom position zoom3.
Figure 15 is the distortion figure of optical system of the present invention when zoom position zoom3.
Figure 16 is the structural representation of optical system of the present invention when zoom position zoom4.
Figure 17 is the transport function of optical system of the present invention when zoom position zoom4.
Figure 18 is the transport function of optical system of the present invention when zoom position zoom4 during out of focus 1 μm.
Figure 19 is the curvature of field figure of optical system of the present invention when zoom position zoom4.
Figure 20 is the distortion figure of optical system of the present invention when zoom position zoom4.
Embodiment
Below in conjunction with accompanying drawing, embodiment is further illustrated.
Embodiment 1: as shown in Figure 1, the present invention provides a kind of refraction type varifocal lithographic objective system being operated in 410nm wavelength by the structure of zoom1, for the pattern of object plane O is imaged on image planes I, it is made up of 22 optical lenses, be L1 ~ L22 from object plane one side to image planes one side by lens markings, these 22 optical lenses are divided into G1 ~ G5 group by focal power and effect in a system of the invention, the distribution of focal power is followed successively by Negative-Positive-Negative-negative-just from object plane to image planes, object plane is 805mm to image planes distance, in system, maximum eyeglass is unified is less than 153mm, image space F number 2, image-side numerical aperture 0.2, enlargement ratio is 0.25, image planes size 14.8mm.
The concrete structure of varifocal lithographic objective system:
First lens combination G1 has positive light coke, comprises three lens i.e. the first lens L1 ~ the 3rd lens L3, and wherein, the first lens L1 is biconvex positive lens, and the second lens L2 is the recessed negative lens in the left convex right side (the right is towards image planes), and the 3rd lens L3 is the thin positive lens of biconvex.First lens L1 adopts the object of biconvex positive lens to be outer for axle field rays to force down, avoid the generation of the excessive clear aperture of eyeglass, second lens L2 can provide larger spherical aberration, balance the barrel distortion of the first lens L1, the 3rd lens L3 adopts thin positive lens to correct the excessive positive Petzval curvature of field of the second lens L2 generation simultaneously.
Second lens combination G2 has negative power, comprise two panels lens i.e. the 4th lens L4 and the 5th lens L5, wherein the 4th lens L4 is the convex negative lens in the left recessed right side (right convex surface is towards image planes), 5th lens L5 is double-concave negative lens, wherein the right convex surface of the 4th lens L4 is equal with the left concave curvature radius of the 5th lens L5, 4th lens L4 and the 5th lens L5 interval infinitely small (for easy to process can by the 4th lens L4, 5th lens L5 does two gummed process), preferably, second lens combination G2 adopts less eyeglass number, ensure the generation of negative power simultaneously, fundamental purpose has 2 points: reduce number of lenses in the second lens combination G2 zoom group as far as possible and made the number of lenses of whole system reduce and then can shorten system overall length, make system architecture compacter, correct the barrel distortion of the first lens combination G1 on the other hand.
3rd lens combination G3 has positive light coke, comprise two panels lens i.e. the 6th lens L6 and the 7th lens L7, 6th lens L6 and the 7th lens L7 is biconvex positive lens, two panels mirror produces larger positive light coke, system front portion is appeared at as compensating group, fundamental purpose in zooming procedure, keeps image planes not to be moved as the second lens combination G2 and realize the function of system zoom, the lens of two other positive light coke can correct the positive spherical aberration of front two groups of lens, 6th lens L6 and the 7th lens L7 produces negative meridian and sagittal coma, compensate the larger positive coma of first two groups, correct the positive Petzval curvature of field that the second lens combination G2 produces simultaneously.
4th lens combination G4 has negative power, comprise six-element lens i.e. the 8th lens L8 ~ the 13 lens L13,8th lens L8 is the convex positive lens in the left recessed right side, 9th lens L9, the tenth lens L10, the 11 lens L11 are the convex negative lens in the left recessed right side, 12 lens L12, the 13 lens L13 are double-concave negative lens, wherein the right convex surface of the 8th lens L8 is equal with the left concave curvature radius of the 9th lens L9, interval infinitely small (doing two gummed process for easy to process).Because the marginal ray of visual field each after first three groups lens combination is approximately parallel to optical axis, very large aberration will be produced when converging directly in image planes at rear arrangement of mirrors sheet negligible amounts, especially when image-side numerical aperture is larger, aberration is very serious, 4th lens combination G4 incident light is outwards dispersed certain angle and lens combination below forms a protuberance, monochrome correction aberration.
5th lens combination G5 has positive light coke, and bear focal power maximum, the image quality of image planes in comprehensive compensation zooming procedure, produces the homogeneous illumination in each visual field and large image-side numerical aperture value simultaneously.Comprise nine lens i.e. the 14 lens L14 ~ the 22 lens L22, 14 lens L14 is the convex positive meniscus lens in the left recessed right side, 15 lens L15 is biconvex positive lens, 16 lens L16 is two prominent positive meniscus lenss, 17 lens L17 is the recessed positive lens in the left convex right side, 18 lens L18 is the recessed negative lens in the left convex right side, 19 lens L19 is double-concave negative lens, 20 lens L20 is the recessed positive lens in the left convex right side, 21 lens L21, 22 lens L22 is the recessed positive meniscus lens in the left convex right side, wherein the 18 lens L18, 19 lens L19 is mainly used in the primary spherical aberration that balanced system positive lens produces, the recessed positive meniscus lens L21 in the convex right side, last two pieces of left sides, L22 mainly corrects curvature of the image.
The design parameter of each eyeglass in varifocal lithographic objective when system that what table 1 provided below is is in zoom1 position, have recorded every a slice lens front and rear surfaces radius-of-curvature, refractive index, the spacing distance (unit at radius-of-curvature and thickness or interval is mm) of dispersion Abbe number and lens thickness or adjacent two lens surfaces.
Table 1: the optical system structure parameter list of concrete embodiment.
Need to provide the number list corresponding to all zoom positions according to the principle of variable focal length optical system, table 2 is the space-number value lists (variable spacing D1, variable spacing D2, variable spacing D3 unit are mm) corresponding to the present invention's four zoom positions.
Table 2: the space-number value list corresponding to four zoom positions.
| Convergent-divergent multiplying power | Variable spacing D1 | Variable spacing D2 | Variable spacing D3 |
| -0.4× | 5.169 | 18.901 | 144.545 |
| -0.35× | 46.991 | 19.021 | 103.053 |
| -0.3× | 93.777 | 19.714 | 55.574 |
| -0.25× | 146.918 | 21.345 | 0.800 |
In above-mentioned specific embodiment 1, as shown in Figure 2, the transport function of optical system when zoom position zoom1, visible each visual field transport function is all greater than 0.4 when 500cl/mm.As shown in Figure 3, in real work, there is focusing inaccurate, the transport function of optical system when zoom position zoom1 during out of focus 1 μm, visible each visual field transport function when 500cl/mm all close to or be greater than 0.4.As shown in Figure 4, the curvature of field figure of optical system of the present invention when zoom position zoom1.Fig. 5 is the distortion figure of optical system of the present invention when zoom position zoom1.
Because lithographic objective system of the present invention has four zoom positions, be respectively zoom1, zoom2, zoom3, zoom4, image-side numerical aperture is respectively 0.25,0.3,0.35,0.4 in zoom1, zoom2, zoom3, zoom4 position, zoom1 pantograph ratio is-0.4, zoom2 pantograph ratio is-0.35, zoom3 pantograph ratio is-0.3, zoom4 pantograph ratio is-0.25, object plane can be reduced 2.5 times to reducing 4 times, image space F number is respectively 2,1.75,1.5,1.25 in zoom1, zoom2, zoom3, zoom4 position.
The implementation method of other three zoom position situations same can refer to the above-mentioned description in zoom1 position embodiment 1.
Embodiment 2:
As shown in Figure 6, the structural representation of optical system of the present invention when zoom position zoom2, as shown in Figure 7, this optical system is at the transport function figure of zoom position zoom2, as shown in Figure 8, the transport function figure of optical system of the present invention when zoom position zoom2 during out of focus 1 μm, as shown in Figure 9, schemes the curvature of field figure of optical system of the present invention when zoom position zoom2.As shown in Figure 10, the distortion figure of optical system of the present invention when zoom position zoom2.
Embodiment 3:
As shown in figure 11, the structural representation of optical system of the present invention when zoom position zoom3, as shown in figure 12, this optical system is at the transport function figure of zoom position zoom3, as shown in figure 13, the transport function figure of optical system of the present invention when zoom position zoom3 during out of focus 1 μm, as shown in figure 14, schemes the curvature of field figure of optical system of the present invention when zoom position zoom3.As shown in figure 15, the distortion figure of optical system of the present invention when zoom position zoom3.
Embodiment 4:
As shown in figure 16, the structural representation of optical system of the present invention when zoom position zoom4, as shown in figure 17, this optical system is at the transport function figure of zoom position zoom4, as shown in figure 18, the transport function figure of optical system of the present invention when zoom position zoom4 during out of focus 1 μm, as shown in figure 19, schemes the curvature of field figure of optical system of the present invention when zoom position zoom4.As shown in figure 20, the distortion figure of optical system of the present invention when zoom position zoom4.
Equally, when above-mentioned three zoom positions, the each visual field (0.0 of optical system, 0.3, 0.5, 0.7, 1.0 meridians and sagitta of arc direction) transport function all close to diffraction limit, when 500cl/mm the transfer function values of each visual field all close to or be greater than 0.4, still can keep good transfer function values when 1 μm of out of focus occurs system simultaneously, when 500cl/mm the transfer function values of each visual field all close to or be greater than 0.4, the curvature of field of three each zoom positions and distortion value all less, the curvature of field is less than 5 μm, astigmatism is less than 6um, the maximum distortion of each visual field is less than 0.007%, maximum absolute distortion is less than 0.563 μm, the impact of distortion is essentially eliminated when meeting resolution, provide good picture element.
Namely the varifocal lithographic objective system with variable power can be obtained by above-mentioned setting.
The present invention's 22 global face lens combination synthesize the double telecentric structure of the object space hearts far away and the image space heart far away, object space chief ray and image space chief ray are all parallel to optical axis, its convergence center at the infinite point of object space and image space, this pair of heart lithographic objective system far away can avoid the convergent-divergent multiplying power that makes the mistake due to the out of focus of object plane and illuminance of image plane uneven.
Varifocal lithographic objective system of the present invention is made up of five lens combination, from object plane to receiving plane focal power distribution condition be: Negative-Positive-Negative-negative-just, diaphragm is positioned at the first lens of the first lens combination, whole optical system is made up of 22 global face lens, the combination of multiple lens shape and focal power can effective axis calibration outer visual field aberration, obtains good image quality.Anamorphosis function is realized by the position of adjustment zoom group, compensating group, front fixing group with latter fixing group in the guaranteed image planes of the various combination of lens difference just constant by holding position during position, object plane and image planes distance perseverance are 805mm, front fixing group first lens and rear fixing group of last a slice lens distance perseverance are 655.4mm, and compact conformation effectively improves system transmitance.The employing of full spherical lens greatly reduces difficulty of processing, is convenient to actual production and processing manufacture.The present invention is that one can provide variable power, and have high resolving power, distort lenses negligible amounts little, used, maximum caliber is less, the lithographic objective of compact conformation.
Claims (3)
1. a varifocal lithographic objective system, is followed successively by from object plane side to image planes side: object plane (O), the first lens combination (G1), the second lens combination (G2), the 3rd lens combination (G3), the 4th lens combination (G4), the 5th lens combination (G5) and receiving plane (I);
Object plane (O) is mask plate place plane;
First lens combination (G1) is first fixing group, has positive light coke, for the distance of fixing object plane (O) with zoom system first lens;
Second lens combination (G2) is zoom group, has negative power, plays the effect changing lithographic objective focal length and image planes size;
3rd lens combination (G3) is compensating group, has positive light coke, and effect is, when the movement compensating image planes in zoom group moving process, image planes to be fixed holding position in whole zoom process;
4th lens combination (G4), has negative power, and the 5th lens combination (G5), has positive light coke, and both form latter fixing group, for ensureing that the last a slice lens of lithographic objective near image planes side and image planes are apart from constant;
Image planes (I) are etching substrate place plane;
It is characterized in that, varifocal lithographic objective system comprises 22 pieces of lens altogether, is arranged in order near object plane side near image planes side;
First lens combination (G1) is made up of to the 3rd lens the first lens, and the first lens are biconvex lens, the second lens are the recessed negative lens in the left convex right side and the 3rd lens are biconvex lens;
Second lens combination (G2) is made up of the 4th lens and the 5th lens, 4th lens are the convex negative lens in the left recessed right side, 5th lens are double-concave negative lens, and the rear surface of the 4th lens is identical with the front surface radius-of-curvature of the 5th lens, together with the 4th lens can be joined with the 5th lens or can infinite approach;
3rd lens combination (G3) is made up of the 6th lens and the 7th lens, and the 6th lens are biconvex lens, and the 7th lens are biconvex lens;
4th lens combination (G4) is made up of to the 13 lens the 8th lens, and the 8th lens are the convex positive lens in the left recessed right side, and the 9th lens to the 11 lens are the convex negative lens in the left recessed right side, and the 12 lens, the 13 lens are double-concave negative lens; And the rear surface of the 8th lens is identical with the front surface radius-of-curvature of the 9th lens, together with the 8th lens can be joined with the 9th lens or can infinite approach;
5th lens combination (G5) is made up of to the 22 lens the 14 lens, 14 lens are the convex positive meniscus lens in the left recessed right side, 15 lens are biconvex positive lens, 16 lens are two prominent positive meniscus lenss, 17 lens are the recessed positive lens in the left convex right side, and the 18 lens are the recessed negative lens in the left convex right side, and the 19 lens are double-concave negative lens, 20 lens are the recessed positive lens in the left convex right side, and the 21 lens, the 22 lens are the recessed positive meniscus lens in the left convex right side.
2. a kind of varifocal lithographic objective system according to claim 1, it is characterized in that, in lithographic objective system, maximum lens are unified is less than 153mm.
3. a kind of varifocal lithographic objective system according to claim 1, is characterized in that, the operation wavelength of lithographic objective system is 410nm.
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| CN104049347B (en) * | 2014-06-20 | 2016-06-15 | 福建福光股份有限公司 | Compact super large image planes continuous magnification lens |
| CN104062748B (en) * | 2014-07-17 | 2016-04-13 | 张家港中贺自动化科技有限公司 | A kind of multiplying power control method of wide spectrum projection optical system |
| CN105445933B (en) * | 2015-12-22 | 2018-06-26 | 中国科学院长春光学精密机械与物理研究所 | A kind of high-resolution moon edge optical image-forming objective lens |
| CN110045492B (en) * | 2019-04-26 | 2024-03-15 | 中国科学院长春光学精密机械与物理研究所 | Wide-spectrum large-numerical aperture ultrahigh-flux micro-objective optical system |
| CN212111958U (en) * | 2020-03-20 | 2020-12-08 | 华为技术有限公司 | Zoom lens, camera module and terminal equipment |
| CN111856735B (en) * | 2020-07-10 | 2022-07-12 | 宁波永新光学股份有限公司 | Objective lens for 40 times biological observation |
| CN112612128B (en) * | 2020-12-24 | 2021-11-26 | 西安中科立德红外科技有限公司 | Medium-wave infrared refrigeration continuous zoom lens with large target surface and small F number and optical system |
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