CN103837967B - The i-line projection lens of lithography machine of a kind of large visual field high-NA - Google Patents
The i-line projection lens of lithography machine of a kind of large visual field high-NA Download PDFInfo
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- CN103837967B CN103837967B CN201410076527.2A CN201410076527A CN103837967B CN 103837967 B CN103837967 B CN 103837967B CN 201410076527 A CN201410076527 A CN 201410076527A CN 103837967 B CN103837967 B CN 103837967B
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Abstract
The invention discloses the i-line projection lens of lithography machine of a kind of large visual field high-NA, it has adopted two hearts far away, 25 4 groups of structures, has wherein used 5 low order aspheric surfaces to carry out balance aberration. The image space available field of view of object lens is 132 × 132mm, and image space numerical aperture can reach 0.17. Through face type optimize and fine setting after, the resolution ratio that can effectively solve domestic existing large-area flat-plate lithographic equipment is low, the problem of image transfer ability.
Description
Technical field
The present invention relates to the i-line projection lens of lithography machine design of a kind of large visual field, high-NA, belong to micro-nano process equipmentIn Optical System Design field.
Background technology
Along with all trades and professions constantly expand the demand of LCD, LED panel, manufacturer is also carried large area projection mask alignerGone out higher technical indicator, be mainly reflected in the visual field of light projection photoetching objective lens is required increasing, the one-tenth picture element of object lens simultaneouslyAmount must be guaranteed. Can effectively promote like this production efficiency of large area projection mask aligner.
Japan Patent JP2006266738A has announced a kind of large area lithography projection objective of the 365nm of being applied to wavelength, its pictureSide NA is 0.145, image space available field of view 132 × 132mm, and system is always about 1500mm, and process factor can be controlled at 0.5Below. Optical system comprises 27 pieces of eyeglasses altogether, has wherein applied 1 low order aspheric surface (14 rank). The curvature of field of these object lens approximatelyFor 10um left and right, its distortion can be lower than 0.0002%. The design of the outer most of large view-field projection lithography objective lens of Current DomesticAll with reference to this patent.
Because the processing of domestic optics and assembly technology lag behind abroad, after balance cost, the general selection of process factor is controlled at0.7 left and right. So in order to improve resolution ratio, large visual field photoetching projection objective lens can only be designed to high-NA. But raising numerical valueAperture can significantly increase again the design difficulty of object lens, so domestic at present not ripe especially large visual field, high-NA (asVisual field, side is greater than 130 × 130mm and numerical aperture exceedes 0.15) photoetching projection objective lens design. In a word, be with lessEyeglass number in large field range, correct, all kinds of aberrations of balance to reduce mirror finish difficulty be at present large visual field, high numerical apertureFootpath photoetching projection objective lens continues the difficult problem breaking through.
Summary of the invention
In order to solve an above-mentioned difficult problem, the present invention has designed the i-line projection lens of lithography machine of a kind of large visual field high-NA, mirrorSheet number is less, can effectively proofread and correct all kinds of aberrations, reaches higher resolution ratio.
An i-line projection lens of lithography machine for large visual field high-NA, is characterized in that this object lens conjugate distance L=1500mm,Eyeglass is divided into four groups of independent design integrated optimization again;
Start to be disposed with first lens group from incident direction, numbering G1, eyeglass numbering L1～L8, totally 8 pieces of eyeglasses, itsIn the 5th piece of eyeglass be 14 rank aspheric surfaces towards the plane of incidence of object space;
The second set of lenses numbering G2, eyeglass numbering L9～L12, totally 4 pieces of eyeglasses, Guang Lan (STOP), wherein the 2nd piece of eyeglass courtBe 14 rank aspheric surfaces to the plane of incidence of object space;
The 3rd set of lenses numbering G3, eyeglass numbering L13～L17, totally 5 pieces of eyeglasses; Wherein the 3rd piece and the 5th piece of eyeglass towardsThe plane of incidence of object space is 14 rank aspheric surfaces;
And the 4th set of lenses numbering G4, eyeglass numbering L18～L25, totally 8 pieces of eyeglasses; Wherein the 8th piece of entering towards object spaceThe face of penetrating is 14 rank aspheric surfaces; Four set of lenses altogether 25 pieces of eyeglasses form a two telecentric beam path, Qi Zhongyou about light hurdle is symmetrical5 faces have adopted low order aspheric surface with balance aberration;
Four arrangement of mirrors head composition double telecentric structures, multiple aspheric uses can reduce eyeglass quantity and effectively proofread and correct multiple aberration, outstandingIt is distortion and the curvature of field under large visual field.
The i Lithography machine projection objective of the large visual field of the present invention, high-NA comprises 25 pieces of eyeglasses altogether. Be less than existing abroadRipe design can effectively improve transmitance in the situation that using with producer with trade mark glass. Also can ensure to change simultaneouslyWhile becoming the domestic glass of correspondence, the transmitance of object lens approaches external design.
This camera lens is amplification imaging, object space mask plate size 93.4 × 93.4mm, and enlargement ratio M=-1.25 ×, effectively image space132 × 132mm, image space numerical aperture 0.17.
According to depth of focus computing formulaCan calculate be about ± 12.6um of the depth of focus left and right of learning these object lens, therefore the curvature of fieldCould effectively expose in 1/3～1/2 left and right that is controlled at depth of focus. Object lens use multiple aspheric surfaces can effectively proofread and correct the curvature of field and distortion,Ensure the image quality of exposure.
In the present invention, camera lens numerical aperture can be up to 0.17, according to formulaKnown, numerical aperture NA is higher, canImpact resolution ratio being caused to make up process factor. Even if the process factor of this camera lens is got k=0.7, still can protect in theoryCard resolution ratio σ reaches 1.5um.
In the present invention, because the visual field of camera lens is larger, so need the strict distortion of controlling camera lens, especially visual field, edge is abnormalBecome. According to camera lens theoretical resolution σ=1.5um of above mentioning, less for ensureing the distortion of object lens projection imaging, distortionNeed to be strict controlled in σ 5 or lower.
H-K9L, F2, QF3 that the glass material of object lens all selects Chengdu bright photoelectricity company to produce, through actual test,The domestic glass material of these three kinds of trades mark is better at i line imaging performance.
Shown in three kinds of glass materials following form of parameter under i line:
| Refractive index (n365） | Abbe number | |
| H-K9L | 1.53622 | 500.7057 |
| F2 | 1.66623 | 228.6286 |
| QF3 | 1.61200 | 267.6581 |
Wherein the computing formula of Abbe number is υ=(n365-1)/(n362-n368); Wherein n365、n362、n368Be respectively exposureCorresponding refractive index rolls off the production line on centre wavelength and wave band.
Brief description of the drawings
Fig. 1 is the large visual field of the present invention, high-NA photoetching projection objective lens structure chart;
Fig. 2 is the large visual field of the present invention, high-NA photoetching projection objective lens MTF curve;
Fig. 3 is the large visual field of the present invention, high-NA photoetching projection objective lens aberration curve;
Fig. 4 is that the large visual field of the present invention, high-NA photoetching projection objective lens point expand speckle pattern.
Detailed description of the invention
Below in conjunction with accompanying drawing, specific embodiments of the present invention is described in detail.
As shown in Figure 1, using mercury lamp as light source, emergent ray is got to (thing on mask plate to structure of the present invention after collimationFace), through the large visual field of the present invention, high-NA photoetching projection objective lens, become-1.25 times of intensified images in the image planes (silicon of even good glueSheet) on. The visual field of object lens of the present invention is very large, numerical aperture is very high and only use low order aspheric surface just to proofread and correct multiple aberration, obtainsObtained into preferably image quality, this difficulty for the lithographic objective that relies on domestic optical material to design is very large, domesticAlso lack the practical case of this class.
These object lens taking the 1st piece of object lens towards the plane of incidence of object space as the 1st, by that analogy, amount to 50 faces, 25 pieces of eyeglasses. ItsIn the the the 9th, 19,29,33,49 faces be 14 rank low order aspheric surfaces, reduce when difficulty of processing and proofread and correct multiple aberration, especiallyDistortion and the curvature of field.
For reducing manufacturing cost, through repeatedly strict actual measurement, tri-kinds of H-K9L, F2, QF3 that the bright photoelectricity in Chengdu is producedTrade mark glass is good at i line imaging performance, and transmitance is higher. In this example, also adopt these three sections of glass design and optimize.
Adopt after above-mentioned glass, the transmitance of whole object lens is estimated as 30% left and right through software. So, less mirror in this exampleSheet number (25 pieces) can effectively ensure that whole projection objective has good transmitance in the time using domestic glass.
In this example, the more general optical surface type of thing mirror type machining tolerance machining tolerance is strict. Because bore is larger, intermediate frequency error andHigh frequency error all needs strict control.
In the time of assembling, need finely tune the thickness of the air gap between each eyeglass and eyeglass, to adjust the picture producing because of the processing of face typeMatter deviation, ensures that object lens image quality reaches optimum.
Implement after this example according to such scheme, the picture element of these object lens is approximation theory result of calculation well. The MTF curve of object lensAs shown in Figure 2, with the maximum of diffraction limit difference lower than 5%.
Meanwhile, as shown in Figure 3, the maximum curvature of field < 6um of object lens, meets the curvature of field and is less than 0.5 times of depth of focus (DOF); Object lensLarge distortion is about 0.0003%, and the definitely approximately amount that is converted into is 0.27um, satisfied distortion be less than or equal to σ/5 resolution (technique because ofSon gets 0.7, and resolution ratio is σ=1.5um).
As shown in Figure 4, some diffusion spot geometric diameter and the root mean square diameter of each visual field all calculate lower than diffraction limit point diffusion spotValue, spherical aberration, the coma control of object lens obtain fine.
Above-mentioned detailed description of the invention and result are not all that the best of performance of the present invention embodies, but every evaluation index all reaches or superGet over expected design. If can effectively reduce in actual applications process factor, image quality can further improve.
Claims (6)
1. an i-line projection lens of lithography machine for large visual field high-NA, is characterized in that this object lens conjugate distance L=1500mm,Eyeglass is divided into four groups of independent design integrated optimization again;
Start to be disposed with first lens group from incident direction, numbering G1, eyeglass numbering L1～L8, totally 8 pieces of eyeglasses, itsIn the 5th piece of eyeglass be 14 rank aspheric surfaces towards the plane of incidence of object space;
The second set of lenses numbering G2, eyeglass numbering L9～L12, totally 4 pieces of eyeglasses, Guang Lan (STOP), wherein the 2nd piece of eyeglass courtBe 14 rank aspheric surfaces to the plane of incidence of object space;
The 3rd set of lenses numbering G3, eyeglass numbering L13～L17, totally 5 pieces of eyeglasses; Wherein the 3rd piece and the 5th piece of eyeglass towardsThe plane of incidence of object space is 14 rank aspheric surfaces;
And the 4th set of lenses numbering G4, eyeglass numbering L18～L25, totally 8 pieces of eyeglasses; Wherein the 8th piece of entering towards object spaceThe face of penetrating is 14 rank aspheric surfaces; Four set of lenses altogether 25 pieces of eyeglasses form a two telecentric beam path, Qi Zhongyou about light hurdle is symmetrical5 faces have adopted low order aspheric surface with balance aberration;
Four arrangement of mirrors head composition double telecentric structures, multiple aspheric uses can reduce eyeglass quantity and effectively proofread and correct multiple aberration, outstandingIt is distortion and the curvature of field under large visual field.
2. the i-line projection lens of lithography machine of large visual field according to claim 1 high-NA, is characterized in that: its lightSystem conjugate distance is 1500mm, object space working distance 70mm, and image space working distance is greater than 100mm, and operation wavelength is i-line365nm。
3. the i-line projection lens of lithography machine of large visual field according to claim 1 high-NA, is characterized in that: its lightSystem is amplification imaging, enlargement ratio M=-1.25 ×.
4. the i-line projection lens of lithography machine of large visual field according to claim 1 high-NA, is characterized in that: its lightLu Weishuan telecentric beam path, be all controlled at ± 0.5 degree of the heart degree far away of object space, image space.
5. according to the i-line projection lens of lithography machine of claim 1,2,3, one of 4 described large visual field high-NAs,It is characterized in that: its image space available field of view is 132 × 132mm, and image space numerical aperture can reach 0.17; According to formulaK represents the photoetching process factor, and NA is numerical aperture of objective, and σ is resolution ratio, and wherein the photoetching process factor gets 0.7, these object lensResolution ratio reach 1.5um.
6. the i-line projection lens of lithography machine of large visual field according to claim 5 high-NA, is characterized in that: its mirrorSheet material adopt Chengdu bright photoelectricity company, the trade mark is respectively the glass of H-K9L, H-QK3L and F2.
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| CN201410076527.2A CN103837967B (en) | 2014-03-04 | 2014-03-04 | The i-line projection lens of lithography machine of a kind of large visual field high-NA |
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| CN104111534B (en) * | 2014-08-07 | 2016-07-06 | 张家港鹏博光电科技有限公司 | A kind of multiplying power control method of symmetrical expression double-telecentric projection optical system |
| CN104950427B (en) * | 2015-07-02 | 2017-06-13 | 中国科学院光电技术研究所 | A kind of big visual field high-NA whole world face projection lens of lithography machine |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101206299A (en) * | 2006-12-21 | 2008-06-25 | 比亚迪股份有限公司 | Optical lens component |
| CN101963693A (en) * | 2009-07-22 | 2011-02-02 | 比亚迪股份有限公司 | Optical lens assembly |
| CN102213821A (en) * | 2011-06-24 | 2011-10-12 | 浙江舜宇光学有限公司 | Near infrared lens |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP5097086B2 (en) * | 2008-11-13 | 2012-12-12 | パナソニック株式会社 | Imaging optical system and imaging apparatus using the same |
| JP5890219B2 (en) * | 2012-03-29 | 2016-03-22 | カンタツ株式会社 | Imaging lens |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101206299A (en) * | 2006-12-21 | 2008-06-25 | 比亚迪股份有限公司 | Optical lens component |
| CN101963693A (en) * | 2009-07-22 | 2011-02-02 | 比亚迪股份有限公司 | Optical lens assembly |
| CN102213821A (en) * | 2011-06-24 | 2011-10-12 | 浙江舜宇光学有限公司 | Near infrared lens |
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