CN104326433B - A kind ofly receive runner preparation method based on template-mediated be full of cracks effect - Google Patents
A kind ofly receive runner preparation method based on template-mediated be full of cracks effect Download PDFInfo
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- CN104326433B CN104326433B CN201410608038.7A CN201410608038A CN104326433B CN 104326433 B CN104326433 B CN 104326433B CN 201410608038 A CN201410608038 A CN 201410608038A CN 104326433 B CN104326433 B CN 104326433B
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Abstract
The present invention relates to a kind of based on template-mediated be full of cracks effect receive runner preparation method, belong to micro nano structure processing and biochemical field, receive the distribution of runner according to target, the pattern structure that design processing has the micro-point of nanometer is as induction pattern plate; Select the substrate of polishing as receiving the basalis of runner, apply the macromolecule polymer material of a floor height cubical contraction on its surface; Induction pattern plate is aimed at and is stamped on polymeric material rete, and polymeric material is cured; Due to the volume contraction of polymeric material when the curing cross-linked, micro-sharp nanostructured is as the outside induction point of be full of cracks, in the time that material meets volume contraction power and is greater than internal stress, in solidification process, there is be full of cracks effect in induced polymer material, form be full of cracks passage along micro-sharp structure plan, realize and receive the preparation of runner. The present invention is based on nano impression process and template-mediated be full of cracks effect, simple to operate, with low cost, structure is controlled, have broad application prospects in Nanometer scale science and technology research field.
Description
Technical field
The invention belongs to micro-nano structure processing and biochemical field, be specifically related to a kind of stream of receiving based on template-mediated be full of cracks effectRoad preparation method.
Background technology
Be accompanied by the development of advanced micro-nano process technology, micro nano structure is at aspect tools such as optics, electronics, biochemistriesThere is application more and more widely. The application prospect of flow passage structure in biochemistry of receiving caused people's great attention. DNASeparation is the important means of foranalysis of nucleic acids, in biological function gene sequencing, biometric fingerprint recognition, legal medical expert's method card, diseaseThe aspects such as substance and genopathy qualification have important function. Standard gel electrophoretic techniques is the Main Means that DNA separates, butBut can not be greater than 40,000 base-pairs by separation length. For this problem, some research groups utilize the nanochannel knot of optimal designStructure has been realized and has been received Flow Control DNA separating chips, has realized trace, high-throughout biochemical analysis. Therefore, development process is simply fastThe nanochannel manufacturing technology of speed is the key issue that promotes correlative study.
At present, the manufacture of runner received mainly contains two kinds of approach, and the one, taking " ultraviolet, deep ultraviolet, extreme ultraviolet, X ray " as representativeConventional lithographic techniques, these photoetching techniques are mainly to realize high-resolution nano-photoetching by continuous shortening exposure wavelength,But a series of other problems has been introduced in the shortening of optical wavelength, as mask, resist, imaging system, technique and equipment etc. allNeed to carry out corresponding adjustment and develop again. This not only gives the technical great difficulty of having brought, and R&D costs also will be sharply simultaneouslyRise violently; Another nanostructured processing method is to process by the straight write device such as electron beam and FIB, this addingWork method is focused on material is carried out to pointwise processing by the particle beams, and sweep time is long, and working (machining) efficiency is very low, the nano junction of makingStructure area is difficult to break through 200 microns, and expensive beamwriter lithography and ion beam lithography equipment and cost of manufacture thereof make us being difficult toBear, be not easy to carry out related work in common laboratory, therefore, these two kinds of manufacturing technologies are difficult to meet research and production to receivingThe wilderness demand of runner.
Based on the variation of polymeric material volume and crosslink density in curing cross-linked process, in moulding process, occur that be full of cracks is existingResemble, thereby formed and the flow passage structure of receiving of the closely-related regularity of formwork structure, in enormous quantities, low cost fabrication are received runnerStructure provides new thinking.
Summary of the invention
The object of this invention is to provide a kind of based on template-mediated be full of cracks effect receive runner controllable method for preparing, by simple pressurePrint, solidify, the process such as be full of cracks, realize the preparation of large-area nano runner. Receive compared with runner preparation technology with existing, there is effectThe advantages such as rate is high, technique is simple, cost is low, prepared by large area.
The technical solution used in the present invention is: a kind of based on template-mediated be full of cracks effect receive runner preparation method, comprise following stepRapid:
Step (1), receive the distribution of runner according to target, design processing has the pattern structure of the micro-point of nanometer as induction be full of cracksThe template that effect occurs;
Step (2), select the substrate of polishing as receiving the basalis of runner, effects on surface carries out acetone ultrasonic cleaning, adopts spin coatingTechnique applies the macromolecule polymer material of the high cubical contraction of last layer at substrate surface;
Step (3), by induction pattern plate aim at be stamped on polymeric material rete, template contacts with polymeric material conformal, andBe placed under suitable curing environment polymeric material is cured;
Step (4), due to the volume contraction of polymeric material when the curing cross-linked, micro-sharp nanostructured lures as the outside of be full of cracksLead a little, in the time that material meets volume contraction power and is greater than internal stress, there is be full of cracks effect in induced polymer material in solidification process,Form be full of cracks passage along micro-sharp structure plan;
Step (5), by regulating material property, micro-sharp structure, pressure, condition of cure factor, can control be full of cracks passageWidth and the degree of depth, realize target is received the making of runner.
Further, the processing method of the induction pattern plate in described step (1) can be optical exposure technology, beamwriter lithographyTechnology, focused ion beam lithography technology, structure replication technology, autonomous packing technique; Nanostructured can be taper, ridge-shaped,Bowl-type nanostructured, the characteristic size of micro-nose part is 10 nanometer to 100 nanometers.
Further, in described step (2), substrate can be silicon, silica, dimethyl silicone polymer, polymethylAcid methyl esters, polystyrene or Merlon.
Further, in described step (2), macromolecule polymer material can be the ultraviolet with high cubical contraction and hardnessPhoto-curing material, thermoplasticity and thermosets, cubical contraction is for being more than or equal to 5%, and cross-link intensity is for being more than or equal to5GPa, thicknesses of layers is 50 nanometer to 200 nanometers.
Further, the conformal contact in (3) of described step refers to that template and polymeric material fit tightly, middle without gasBubble and dust, if impression block is hard template, need the external world that certain pressure is provided.
Further, the suitable curing environment in described step (3) is UV-irradiation or high-temperature and high-pressure conditions.
Further, the width of runner received that can make in described step (5) is 10 nanometer to 100 nanometers, and the degree of depth is 10Nanometer to 200 nanometer.
Further, the runner of receiving in described step (5) can be delivered on base material by etching technics, prepares notWith the runner of receiving of material, etching crimping and transfer processes can be dry etching and wet etching.
The invention has the advantages that:
(1) preparation is received the physics photoetching method of runner and is compared, and the present invention is not subject to the restriction of diffraction limit and material, complies with completelyPrepared by the structure of master plate and the chemistry of polymeric material and physical characteristic, cost is low, and efficiency is high.
(2) chemical method is compared, and what the present invention was prepared receive, and flow passage structure is that large area is controlled, changes the knot of template simultaneouslyStructure, regulate material property to control flexibly to receive the structure of runner, what therefore the present invention was prepared receive, and flow passage structure has goodControllability and repeatability.
In sum, the invention solves existing preparation, to receive the cost of flow passage structure method high, and inefficient problem, can be efficientFlow passage structure is received in rate, low cost and large-area preparation.
Brief description of the drawings
Fig. 1 is example one: based on the ultraviolet light polymerization sulfydryl taking PDMS as substrate of porous alumina formwork induction be full of cracks effect-alkene material is received flow chart prepared by runner;
Fig. 2 is example two: the silicon materials based on the micro-sharp nano-form induction of annular be full of cracks effect are received flow chart prepared by runner;
Fig. 3 is the electron scanning micrograph of several induced nano formwork structures; Wherein (a) is the micro-sharp induced nano of annularFormwork structure; (b) be Woelm Alumina induced nano formwork structure; (c) be the micro-sharp induced nano formwork structure of bar shaped;
Fig. 4 is that the polygon of the sulfydryl-alkene material taking dimethyl silicone polymer (PDMS) as substrate of preparation is received the electricity of flow passage structureSub-flying-spot microscope photo;
Fig. 5 is the multiple flow passage structure schematic diagram of receiving that utilizes preparation method of the present invention to prepare.
Detailed description of the invention
Introduce in detail the present invention below in conjunction with the drawings and the specific embodiments. Protection scope of the present invention should comprise the complete of claimPortion's content. By following examples, those skilled in the art can realize the full content of the claims in the present invention.
Example one:
As shown in 1-1 in Figure 1, selecting the thickness of a slice surface finish is 1 millimeter, and area is the poly-diformazan of 2 centimetres of 2 cm xRadical siloxane (PDMS) thin plate 1, utilizes the mixed liquor of alcohol and acetone to clean its surface, removes surperficial spot,Dry up rear stand-by;
As shown in 1-2 in Figure 1, utilize sol evenning machine, rotating speed is set is 2000 and turn per minute, spin coating thick layer on PDMS plateDegree is ultraviolet light polymerization sulfydryl-alkene material 2 of 150 nanometers, and spin coating precision is ± 3 nanometers, and uniformity is ± 3%;
As shown in 1-3 in Figure 1, utilizing a bore dia is that 500 nanometers, border width are the Woelm Alumina work of 30 nanometersFor impression induction pattern plate 3, by aiming at moulding process 4, induction pattern plate 3 is attached in sulfydryl-alkene film layer 2 lightly,Because PDMS is flexible, thus provide pressure to contact with template conformal without the external world, middle without Bubble formation;
As shown in 1-4 in Figure 1, the three-decker in Fig. 1-3 is positioned over to curing molding 5 under ultraviolet light, the centre wavelength of lightBe 365 nanometers, light intensity is 40mW/cm2, be 1 minute hardening time. Due to selected ultraviolet light polymerization sulfydryl-alkene materialShrinkage factor be about 5%, solidify after hardness be about 5GPa, so in the process of crosslinking curing, induction pattern plate 3 is appliedSize is the pressure of 1 handkerchief, and crack performance 6 can occur sulfydryl-alkene material part that the sharp edges in hole touches.
As shown in 1-5 in Figure 1, induction pattern plate 3 is stripped down, obtaining width is 30 nanometers, and the degree of depth is that 100 nanometers are poly-Compound is received runner 7, and polymeric material is received runner electron scanning micrograph as shown in Figure 4.
Example two:
As shown in 2-1 in Figure 2, select a slice area be the silicon chip of single-sided polishing of 2 centimetres of 2 cm x as substrate 1, utilizeThe mixed liquor of alcohol and acetone cleans its surface, removes surperficial spot, dries up rear stand-by;
As shown in 2-2 in Figure 2, utilize sol evenning machine, rotating speed is set is 1500 and turn per minute, spin coating thick layer on PDMS plateDegree is ultraviolet light polymerization sulfydryl-alkene material 2 of 200 nanometers, and spin coating precision is ± 3 nanometers, and uniformity is ± 3%;
As shown in 2-3 in Figure 2, utilizing a block period is 200 nanometers, and micro-point is of a size of the micro-sharp nano junction of annular of 20 nanometersStructure, as impression induction pattern plate 3, by aiming at moulding process 4, is attached to sulfydryl-alkene film layer by induction pattern plate 3 lightlyOn 2, the external world applies the pressure that size is 2 handkerchiefs, and induction pattern plate 3 is contacted with material conformal, middle without Bubble formation;
As shown in 2-4 in Figure 2, the three-decker in Fig. 2-3 is positioned over to curing molding 5 under ultraviolet light, the centre wavelength of lightBe 365 nanometers, light intensity is 40mW/cm2, be 1 minute hardening time. Due to selected ultraviolet light polymerization sulfydryl-alkene materialShrinkage factor be about 5%, solidify after hardness be about 5GPa, so in the process of crosslinking curing, micro-sharp structure touchesCan there is crack performance 6 in sulfydryl-alkene material part.
As shown in 2-5 in Figure 2, induction pattern plate 3 glass are got off, preparation show that width is 35 nanometers, and the degree of depth is 176 to receiveRice polymer nano runner 7.
As shown in 2-6 in Figure 2, utilize reactive ion etching process, selection fluoroform is etching gas, and flow is 30 public affairsRise per minute, power is 100 watts, and taking polymer nano runner 7 as mask, etching is after 10 minutes, and the flow passage structure of receiving is passed toIn silicon materials substrate 1, obtaining width is 35 nanometers, the degree of depth be 204.8 nano silicon materials receive runner 8.
In the present invention, substrate can be the materials such as silicon, quartz or glass; Template can be the structures such as taper, ridge-shaped, bowl-type;Can to be ultraviolet photocureable material meet volume contraction and hardness as acrylate, epoxy resin, sulfydryl-alkene etc. to the material of be full of cracksThe macromolecular material of condition or thermoplasticity, thermoset copolymer material; The structure of runner received is come by the nanostructured of template completelyDetermine, the pattern that can prepare has a variety of, and as shown in Figure 3, wherein (a) is the micro-sharp induced nano formwork structure of annular; (b)For Woelm Alumina induced nano formwork structure; (c) be the micro-sharp induced nano formwork structure of bar shaped; On polymeric material, receive streamRoad structure can etching be delivered on base material, produces the runner of receiving of unlike material, and etching technics comprises dry etching and wetMethod corrosion.
Non-elaborated part of the present invention belongs to those skilled in the art's known technology.
The foregoing is only preferred embodiment of the present invention, not in order to limit the present invention, all the spirit and principles in the present invention itIn, any amendment of doing, be equal to replacement, improvement etc., within all should being included in protection scope of the present invention.
Claims (8)
- Based on template-mediated be full of cracks effect receive a runner preparation method, it is characterized in that: comprise the steps:Step (1), receive the distribution of runner according to target, design processing has the pattern structure of the micro-point of nanometer as induction be full of cracksThe template that effect occurs;Step (2), select the substrate of polishing as receiving the basalis of runner, effects on surface carries out acetone ultrasonic cleaning, adopts spin coatingTechnique applies the macromolecule polymer material of the high cubical contraction of last layer at substrate surface;Step (3), by induction pattern plate aim at be stamped on polymeric material rete, template contacts with polymeric material conformal, andBe placed under suitable curing environment polymeric material is cured;Step (4), due to the volume contraction of polymeric material when the curing cross-linked, micro-sharp nanostructured lures as the outside of be full of cracksLead a little, in the time that material meets volume contraction power and is greater than internal stress, there is be full of cracks effect in induced polymer material in solidification process,Form be full of cracks passage along micro-sharp structure plan;Step (5), by regulating material property, micro-sharp structure, pressure, condition of cure factor, can control be full of cracks passageWidth and the degree of depth, realize target is received the making of runner.
- According to claim 1 a kind of based on template-mediated be full of cracks effect receive runner preparation method, it is characterized in that:The processing method of the induction pattern plate in described step (1) can be optical exposure technology, electron beam lithography, focused ionBundle photoetching technique, structure replication technology, self-assembling technique; Nanostructured can be taper, ridge-shaped, bowl-type nanostructured,The characteristic size of micro-nose part is 10 nanometer to 100 nanometers.
- According to claim 1 a kind of based on template-mediated be full of cracks effect receive runner preparation method, it is characterized in that:In described step (2), substrate can be silicon, silica, dimethyl silicone polymer, polymethyl methacrylate, polyphenyl secondAlkene or Merlon.
- According to claim 1 a kind of based on template-mediated be full of cracks effect receive runner preparation method, it is characterized in that:In described step (2), macromolecule polymer material can be ultraviolet photocureable material, the heat with high cubical contraction and hardnessPlasticity and thermosets, cubical contraction is for being more than or equal to 5%, and cross-link intensity is for being more than or equal to 5GPa, thicknesses of layersBe 50 nanometer to 200 nanometers.
- According to claim 1 a kind of based on template-mediated be full of cracks effect receive runner preparation method, it is characterized in that:Conformal contact in (3) of described step refers to that template and polymeric material fit tightly, middle without bubble and dust, if pressDie plate is hard template, needs the external world that certain pressure is provided.
- According to claim 1 a kind of based on template-mediated be full of cracks effect receive runner preparation method, it is characterized in that:Suitable curing environment in described step (3) is UV-irradiation or high-temperature and high-pressure conditions.
- According to claim 1 a kind of based on template-mediated be full of cracks effect receive runner preparation method, it is characterized in that:The width of runner received that can make in described step (5) is 10 nanometer to 100 nanometers, and the degree of depth is that 10 nanometers to 200 are receivedRice.
- According to claim 1 a kind of based on template-mediated be full of cracks effect receive runner preparation method, it is characterized in that:The runner of receiving in described step (5) can be delivered on base material by etching technics, prepares the runner of receiving of unlike material,Etching crimping and transfer processes can be dry etching and wet etching.
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| CN113470868B (en) * | 2021-05-19 | 2023-06-30 | 华南师范大学 | Preparation method of metal network electrode cracking template for improving controllability |
| CN113649097B (en) * | 2021-09-17 | 2023-06-16 | 鲁东大学 | Method for preparing double-channel structure on micro-fluidic chip by using single-channel PDMS (polydimethylsiloxane) induced template |
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| CN102627255B (en) * | 2012-04-16 | 2015-01-14 | 北京大学 | Micro-nano integrated processing technology based implantable three-dimensional anti-drag micro-channel and preparation method thereof |
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