CN113649097B - Method for preparing double-channel structure on micro-fluidic chip by using single-channel PDMS (polydimethylsiloxane) induced template - Google Patents
Method for preparing double-channel structure on micro-fluidic chip by using single-channel PDMS (polydimethylsiloxane) induced template Download PDFInfo
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Abstract
The invention discloses a method for preparing a double-channel structure on a microfluidic chip by using a single-channel PDMS (polydimethylsiloxane) induction template, which breaks through the rule that the existing single-channel template can only be used for preparing the single-channel structure, and provides a method for preparing the double-channel structure on the microfluidic chip by using the single-channel PDMS induction template. The method of the invention comprises the following steps: firstly preparing a required single-channel master plate structure by utilizing a photoetching technology, preparing a single-channel PDMS induction template by using a PDMS material, then tightly adhering the induction template and a substrate together to form a single-channel cavity, dripping S1813 photoresist on one side of the cavity, standing for 2 hours, heating the cavity, reflowing the photoresist, simultaneously forming a double-channel structure under the induction of the single-channel PDMS induction template, cooling, solidifying and removing the induction template, and then preparing the double-channel structure on the surface of the substrate. The invention is suitable for the application fields of microfluidic chips, biological medicines and the like.
Description
Technical Field
The invention relates to the fields of micromachining, microfluidic chips, biological medicines and the like, in particular to a method for preparing a double-channel structure on a microfluidic chip by using a single-channel PDMS (polydimethylsiloxane) induced template.
Background
Microfluidic chips are a technology for precise manipulation of fluids on the micrometer, hundred micrometer and even millimeter scale, and have the ability to integrate some basic functions of a laboratory such as biology, chemistry, medicine, optics, physics, mechanics, etc. onto a small area chip, and are therefore also called labs on a chip. Because of its great potential in the fields of biology, chemistry, medicine, environmental detection, optics, etc., it has been developed into a new field of research across multiple disciplines.
Microfluidic chips have some advantages not possessed by conventional experimental methods, such as: the method has the advantages of ultra-low reagent consumption, high integration, high automation degree, high efficiency, environmental friendliness, microminiaturization, portability, low cost, simple operation and the like, and has unique advantages in the aspect of operating trace fluid. Typical applications of microfluidic technology mainly include in-situ diagnostics, material screening and synthesis, and cell analysis.
There are many methods for preparing micro-channel structures on microfluidic chips, such as plasma bonding technology, thermocompression bonding technology, soft lithography technology, laser ablation technology, molding technology, photolithography and etching technology, and these methods have advantages and disadvantages.
No related report that a double-channel structure can be prepared on a microfluidic chip by utilizing a single-channel PDMS induction template is found in China or abroad.
Disclosure of Invention
The invention can prepare a double-channel structure on the microfluidic chip by utilizing the single-channel PDMS induction template, breaks through the rule that only the single-channel structure can be prepared by using the existing single-channel template, and fills the technical blank in the research direction. The invention provides a method for preparing a double-channel structure on a microfluidic chip by using a single-channel PDMS (polydimethylsiloxane) induced template.
The technical scheme of the invention is as follows:
1. the method for preparing the double-channel structure on the microfluidic chip by using the single-channel PDMS induction template is characterized by comprising the following steps of:
s1: the photoetching preparation of the single-channel master plate structure comprises the following steps:
s11: cleaning a substrate, spin-coating a photoresist material on the substrate, coating the substrate for 40S at a high speed of 1200rpm by using S1813 photoresist, standing for 2 minutes, heating the substrate on a hot plate at 90 ℃ for 5 minutes, taking down the substrate to cool the substrate to room temperature, and repeating the process for 3 times to obtain a photoresist coating with the thickness of 4.1 mu m;
s12: using a strip pattern mask plate with the total width of 40 mu m, wherein the width of a light-tight area is 36 mu m, and a light-tight area with the width of 4 mu m is arranged in the middle, closely contacting the strip pattern mask plate with the S1813 photoresist coating prepared in the step S11, and carrying out photoetching exposure, wherein the exposure energy is 125mJ;
s13: developing the exposed substrate in 5 per mill NaOH solution for 16 seconds to obtain a single-channel master plate structure with the width of 40 mu m and similar to a concave shape in cross section;
s2: the preparation of the single-channel PDMS induction template comprises the following steps:
s21: mixing PDMS bulk material and curing agent in a beaker according to the volume ratio of 10:1, and uniformly stirring, and standing the mixed solution in air for 1 hour to sufficiently remove bubbles;
s22: pouring the mixed solution without bubbles in the step S21 on the single-channel master mask structure prepared in the step S1, enabling the mixed solution to completely cover the single-channel master mask structure, standing for 1 hour, and heating the whole on a hot plate at 65 ℃ for 1 hour to solidify the mixed solution; naturally cooling to room temperature, and then removing the cured PDMS material from the single-channel master plate structure, so that a single-channel PDMS induction template is obtained;
s3: the preparation of the double-channel structure on the micro-fluidic chip comprises the following steps:
s31: closely adhering the single-channel PDMS induction template prepared in the step S2 with a clean substrate for preparing the microfluidic chip, so that a strip-shaped single-channel cavity with a cross section similar to a concave shape is formed between the substrate and the single-channel PDMS induction template;
s32: then dripping S1813 photoresist on one side of the single-channel PDMS induction template, enabling the photoresist to flow into the single-channel cavity under the action of capillary force, and standing for 2 hours to enable the photoresist liquid to have enough time to fill the single-channel cavity;
s33: and then the whole body of the single-channel PDMS-induced template is placed on a hot plate to be heated for 40 minutes at 110 ℃, in the process, the solvent in the S1813 photoresist in the single-channel cavity volatilizes, along with the volatilization of the solvent, the area which is originally filled with the photoresist slowly reflows from the forefront end, the photoresist contacted with the inner wall of the single-channel PDMS-induced template adheres to the inner wall of the cavity due to the adhesion between the inner wall of the single-channel PDMS-induced template and the photoresist, simultaneously, the photoresist forms a double-channel structure in the reflow process due to the existence of the inner induction structure of the single-channel PDMS-induced template, the photoresist on the inner wall of the single-channel PDMS-induced template is completely solidified after being heated for 40 minutes, at the moment, the heating is stopped, the whole substrate is cooled to the room temperature, and then the single-channel PDMS-induced template is stripped off, so that the double-channel structure is manufactured on the surface of the substrate.
The substrate used in the step is a silicon wafer, a glass sheet, or a quartz sheet.
The invention has the following beneficial effects: the single-channel PDMS induction template can be used for preparing the double-channel structure on the micro-fluidic chip very simply, breaks through the rule that the existing single-channel template can only be used for preparing the single-channel structure, and fills the technical blank in the research direction. The materials used by the technology are easy to obtain, the whole manufacturing cost is low, the operation is simple and feasible, and the technology has a wide application prospect in the field of preparation of the double-channel structure on the microfluidic chip.
Drawings
FIG. 1 is a flow chart for preparing a two-channel structure on a microfluidic chip.
Fig. 2 is a photograph of a cross-section of a single-channel master structure prepared using photolithography.
In the figure: 1. s1813 photoresist material, 2, substrate.
FIG. 3 is a photograph of a cross section of a single channel PDMS induced template made using PDMS material.
In the figure: 3. PDMS material.
Fig. 4 is a cross-sectional SEM photograph of a dual channel structure on a microfluidic chip prepared.
In the figure: 4. and 5, S1813 photoresist materials.
Detailed Description
The specific embodiment is as follows: a method for preparing a double-channel structure on a microfluidic chip by using a single-channel PDMS (polydimethylsiloxane) induction template is completed by the following steps:
s1: the photoetching preparation of the single-channel master plate structure comprises the following steps:
s11: cleaning a substrate, spin-coating a photoresist material on the substrate, coating the substrate for 40S at a high speed of 1200rpm by using S1813 photoresist, standing for 2 minutes, heating the substrate on a hot plate at 90 ℃ for 5 minutes, taking down the substrate to cool the substrate to room temperature, and repeating the process for 3 times to obtain a photoresist coating with the thickness of 4.1 mu m;
s12: using a strip pattern mask plate with the total width of 40 mu m, wherein the width of a light-tight area is 36 mu m, and a light-tight area with the width of 4 mu m is arranged in the middle, closely contacting the strip pattern mask plate with the S1813 photoresist coating prepared in the step S11, and carrying out photoetching exposure, wherein the exposure energy is 125mJ;
s13: developing the exposed substrate in 5 per mill NaOH solution for 16 seconds to obtain a single-channel master plate structure with the width of 40 mu m and similar to a concave shape in cross section;
s2: the preparation of the single-channel PDMS induction template comprises the following steps:
s21: mixing PDMS bulk material and curing agent in a beaker according to the volume ratio of 10:1, and uniformly stirring, and standing the mixed solution in air for 1 hour to sufficiently remove bubbles;
s22: pouring the mixed solution without bubbles in the step S21 on the single-channel master mask structure prepared in the step S1, enabling the mixed solution to completely cover the single-channel master mask structure, standing for 1 hour, and heating the whole on a hot plate at 65 ℃ for 1 hour to solidify the mixed solution; naturally cooling to room temperature, and then removing the cured PDMS material from the single-channel master plate structure, so that a single-channel PDMS induction template is obtained;
s3: the preparation of the double-channel structure on the micro-fluidic chip comprises the following steps:
s31: closely adhering the single-channel PDMS induction template prepared in the step S2 with a clean substrate for preparing the microfluidic chip, so that a strip-shaped single-channel cavity with a cross section similar to a concave shape is formed between the substrate and the single-channel PDMS induction template;
s32: then dripping S1813 photoresist on one side of the single-channel PDMS induction template, enabling the photoresist to flow into the single-channel cavity under the action of capillary force, and standing for 2 hours to enable the photoresist liquid to have enough time to fill the single-channel cavity;
s33: and then the whole body of the single-channel PDMS-induced template is placed on a hot plate to be heated for 40 minutes at 110 ℃, in the process, the solvent in the S1813 photoresist in the single-channel cavity volatilizes, along with the volatilization of the solvent, the area which is originally filled with the photoresist slowly reflows from the forefront end, the photoresist contacted with the inner wall of the single-channel PDMS-induced template adheres to the inner wall of the cavity due to the adhesion between the inner wall of the single-channel PDMS-induced template and the photoresist, simultaneously, the photoresist forms a double-channel structure in the reflow process due to the existence of the inner induction structure of the single-channel PDMS-induced template, the photoresist on the inner wall of the single-channel PDMS-induced template is completely solidified after being heated for 40 minutes, at the moment, the heating is stopped, the whole substrate is cooled to the room temperature, and then the single-channel PDMS-induced template is stripped off, so that the double-channel structure is manufactured on the surface of the substrate.
The substrate used in the steps described in this embodiment is a silicon wafer, a glass wafer, or a quartz wafer.
The foregoing is merely an embodiment of the present invention, and it should be noted that, for those skilled in the art, several modifications may be made without departing from the concept of the present invention, for example, changing the preparation process of the single-channel master structure, changing the material proportion and curing manner of the single-channel PDMS-induced template, changing the molding material used for preparing the dual-channel structure, and the like, which are also considered as the protection scope of the present invention.
Claims (2)
1. The method for preparing the double-channel structure on the microfluidic chip by using the single-channel PDMS induction template is characterized by comprising the following steps of:
s1: the photoetching preparation of the single-channel master plate structure comprises the following steps:
s11: cleaning a substrate, spin-coating a photoresist material on the substrate, coating the substrate for 40S at a high speed of 1200rpm by using S1813 photoresist, standing for 2 minutes, heating the substrate on a hot plate at 90 ℃ for 5 minutes, taking down the substrate to cool the substrate to room temperature, and repeating the process for 3 times to obtain a photoresist coating with the thickness of 4.1 mu m;
s12: using a strip pattern mask plate with the total width of 40 mu m, wherein the width of a light-tight area is 36 mu m, and a light-tight area with the width of 4 mu m is arranged in the middle, closely contacting the strip pattern mask plate with the S1813 photoresist coating prepared in the step S11, and carrying out photoetching exposure, wherein the exposure energy is 125mJ;
s13: developing the exposed substrate in 5 per mill NaOH solution for 16 seconds to obtain a single-channel master plate structure with the width of 40 mu m and similar to a concave shape in cross section;
s2: the preparation of the single-channel PDMS induction template comprises the following steps:
s21: mixing PDMS bulk material and curing agent in a beaker according to the volume ratio of 10:1, and uniformly stirring, and standing the mixed solution in air for 1 hour to sufficiently remove bubbles;
s22: pouring the mixed solution without bubbles in the step S21 on the single-channel master mask structure prepared in the step S1, enabling the mixed solution to completely cover the single-channel master mask structure, standing for 1 hour, and heating the whole on a hot plate at 65 ℃ for 1 hour to solidify the mixed solution; naturally cooling to room temperature, and then removing the cured PDMS material from the single-channel master plate structure, so that a single-channel PDMS induction template is obtained;
s3: the preparation of the double-channel structure on the micro-fluidic chip comprises the following steps:
s31: closely adhering the single-channel PDMS induction template prepared in the step S2 with a clean substrate for preparing the microfluidic chip, so that a strip-shaped single-channel cavity with a cross section similar to a concave shape is formed between the substrate and the single-channel PDMS induction template;
s32: then dripping S1813 photoresist on one side of the single-channel PDMS induction template, enabling the photoresist to flow into the single-channel cavity under the action of capillary force, and standing for 2 hours to enable the photoresist liquid to have enough time to fill the single-channel cavity;
s33: and then the whole body of the single-channel PDMS-induced template is placed on a hot plate to be heated for 40 minutes at 110 ℃, in the process, the solvent in the S1813 photoresist in the single-channel cavity volatilizes, along with the volatilization of the solvent, the area which is originally filled with the photoresist slowly reflows from the forefront end, the photoresist contacted with the inner wall of the single-channel PDMS-induced template adheres to the inner wall of the cavity due to the adhesion between the inner wall of the single-channel PDMS-induced template and the photoresist, simultaneously, the photoresist forms a double-channel structure in the reflow process due to the existence of the inner induction structure of the single-channel PDMS-induced template, the photoresist on the inner wall of the single-channel PDMS-induced template is completely solidified after being heated for 40 minutes, at the moment, the heating is stopped, the whole substrate is cooled to the room temperature, and then the single-channel PDMS-induced template is stripped off, so that the double-channel structure is manufactured on the surface of the substrate.
2. The method of claim 1, wherein the substrate used in the step is a silicon wafer, a glass wafer, or a quartz wafer.
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