CN104325736A - 一种三银low-e镀膜玻璃 - Google Patents
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Abstract
一种三银LOW-E镀膜玻璃,包括玻璃基材,所述玻璃基材的上表面由下而上依次设有SixNy基膜层、第一TiOx膜层、第一AZO阻挡层、第一Ag层、第一NiCr阻挡层、第二AZO阻挡层、第二TiOx膜层、第三AZO阻挡层、第二Ag层、第二NiCr阻挡层、第四AZO阻挡层、第三TiOx膜层、第五AZO阻挡层、第三Ag层、第三NiCr阻挡层、第六AZO阻挡层、第四TiOx膜层、以及SixNy顶膜层。本发明具有较好的粘结性和较佳机械强度,且可延长保存期。
Description
技术领域:
本发明涉及一种三银LOW-E镀膜玻璃。
背景技术:
LOW-E玻璃,是一种高端的低辐射玻璃,是在玻璃基材表面镀制包括银层在内的多层金属及其它化合物组成的膜系产品。但现有LOW-E玻璃,其膜层粘结力较差,机械强度不佳,容易出现脱膜、氧化等质量缺陷。同时,Ag层上下表面之间均使用NiCr膜层作为阻挡层,容易掉渣,无法保护Ag层,使得LOW-E玻璃的保存期最长才为6个月。
故有必要对现有的LOW-E玻璃作出改进,以提供一种具有较好粘结性、较佳机械强度、且可延长保存期的LOW-E镀膜玻璃。
发明内容:
本发明的目的在于提供一种三银LOW-E镀膜玻璃,其具有较好的粘结性和较佳机械强度,且可延长保存期。
一种三银LOW-E镀膜玻璃,包括玻璃基材,所述玻璃基材的上表面由下而上依次设有SixNy基膜层、第一TiOx膜层、第一AZO阻挡层、第一Ag层、第一NiCr阻挡层、第二AZO阻挡层、第二TiOx膜层、第三AZO阻挡层、第二Ag层、第二NiCr阻挡层、第四AZO阻挡层、第三TiOx膜层、第五AZO阻挡层、第三Ag层、第三NiCr阻挡层、第六AZO阻挡层、第四TiOx膜层、以及SixNy顶膜层。
本发明可通过如下方案进行改进:
所述SixNy基膜层的厚度为10~25nm,SixNy顶膜层的厚度为20~35nm。
所述第一TiOx膜层的厚度为10~20nm,第二TiOx膜层、第三TiOx膜层、第四TiOx膜层的厚度为25~40nm。
所述第一AZO阻挡层的厚度为5~15nm,第二AZO阻挡层的厚度为15~25nm,第三AZO阻挡层的厚度为5~15nm,第四AZO阻挡层的厚度为5~10nm,第五AZO阻挡层的厚度为8~14nm,第六AZO阻挡层的厚度为15~25nm。
所述第一Ag层的厚度为2~5nm,第二Ag层的厚度为3~10nm,第三Ag层的厚度为5~10nm。
所述第一NiCr阻挡层的厚度为3~6nm,第二NiCr阻挡层的厚度为2~8nm,第三NiCr阻挡层的厚度为0.5~2nm。
所述SixNy基膜层、所述SixNy顶膜层为Si3N4保护层。
本发明具有如下优点:1、利用SixNy作为基膜层和顶膜层,使膜层具有较好的粘结性和较佳机械强度;同时,利用TiOx提高玻璃的透光率,各Ag层下面均用AZO阻挡层,各Ag层上面均用NiCr阻挡层和AZO阻挡层,AZO阻挡层具有附着力较强,不容易掉渣的性能,可以使各Ag层得到更好的保护,可将LOW-E玻璃的保存期延长至7-8个月。2、本玻璃透过率≥60%,辐射率≤0.03,反射率≤15,遮阳系数SC≤0.35;本玻璃颜色显现浅蓝色,通过色度仪可以测得如下颜色坐标值:a*=-3.0~-3.5,b*=-6~-7,光学性能良好。
附图说明:
图1为本发明结构剖视图。
具体实施方式:
如图所示,一种三银LOW-E镀膜玻璃,包括玻璃基材1,所述玻璃基材1的上表面由下而上依次设有SixNy基膜层2、第一TiOx膜层3、第一AZO阻挡层4、第一Ag层5、第一NiCr阻挡层6、第二AZO阻挡层7、第二TiOx膜层8、第三AZO阻挡层9、第二Ag层10、第二NiCr阻挡层11、第四AZO阻挡层12、第三TiOx膜层13、第五AZO阻挡层14、第三Ag层15、第三NiCr阻挡层16、第六AZO阻挡层17、第四TiOx膜层18、以及SixNy顶膜层19。
进一步地,所述SixNy基膜层2的厚度为10~25nm。其采用磁控溅射镀膜工艺,用交流中频电源、氩气作为溅射气体、氮气作反应气体溅射硅铝靶(硅铝质量百分比92:8)制备而成,其中,氩氮比为(400SCCM~420SCCM):(450SCCM~500SCCM),氩氮比是该膜层的核心,决定了成膜的质量。
再进一步地,所述第一TiOx膜层3的厚度为10~20nm。其采用磁控溅射镀膜工艺,用交流中频电源、以氩气为溅射气体、氧气作反应气体射陶瓷钛靶制备而成,其中,氩氧比为(400SCCM~420SCCM):(50SCCM~60SCCM),氩氧比是该膜层的核心。
更进一步地,所述第一AZO阻挡层4的厚度为5~15nm。其采用磁控溅射镀膜工艺,用中频交流电源溅射陶瓷Zn(AZO)靶、用氩气作为溅射气体、掺入少量氧气制备而成,其中,氩氧比为:(400SCCM~420SCCM):(20~40SCCM)。为第一Ag层5作铺垫,降低辐射率。
又进一步地,所述第一Ag层5的厚度为2~5nm。其采用磁控溅射镀膜工艺,用直流电源溅射银靶、用氩气作为溅射气体制备而成,气体流量500~550SCCM。
再进一步地,所述第一NiCr阻挡层6的厚度为3~6nm。其采用磁控溅射镀膜工艺,用直流电源溅射镍铬合金、用氩气作为溅射气体制备而成。
再进一步地,所述第二AZO阻挡层7的厚度为15~25nm。其采用磁控溅射镀膜工艺,用中频交流电源溅射陶瓷Zn(AZO)靶、用氩气作为溅射气体、掺入少量氧气制备而成,其中,氩氧比为:(400SCCM~420SCCM):(20~40SCCM)。
再进一步地,所述第二TiOx膜层8的厚度为25~40nm。其采用磁控溅射镀膜工艺,用交流中频电源、以氩气为溅射气体、氧气作反应气体射陶瓷钛靶制备而成,其中,氩氧比为(400SCCM~420SCCM):(50SCCM~60SCCM),氩氧比是该膜层的核心。
再进一步地,所述第三AZO阻挡层9的厚度为5~15nm。其采用磁控溅射镀膜工艺,用中频交流电源溅射陶瓷Zn(AZO)靶、用氩气作为溅射气体、掺入少量氧气制备而成,其中,氩氧比为:(400SCCM~420SCCM):(20~40SCCM)。
再进一步地,所述第二Ag层10的厚度为3~10nm。其采用磁控溅射镀膜工艺,用直流电源溅射银靶、用氩气作为溅射气体制备而成,气体流量500~550SCCM。
再进一步地,所述第二NiCr阻挡层11的厚度为2~8nm。其采用磁控溅射镀膜工艺,用直流电源溅射镍铬合金、用氩气作为溅射气体制备而成。
再进一步地,所述第四AZO阻挡层12的厚度为5~10nm。其采用磁控溅射镀膜工艺,用中频交流电源溅射陶瓷Zn(AZO)靶、用氩气作为溅射气体、掺入少量氧气制备而成,其中,氩氧比为:(400SCCM~420SCCM):(20~40SCCM)。
再进一步地,所述第三TiOx膜层13的厚度为25~40nm。其采用磁控溅射镀膜工艺,用交流中频电源、以氩气为溅射气体、氧气作反应气体射陶瓷钛靶制备而成,其中,氩氧比为(400SCCM~420SCCM):(50SCCM~60SCCM),氩氧比是该膜层的核心。
再进一步地,所述第五AZO阻挡层14的厚度为8~14nm。其采用磁控溅射镀膜工艺,用中频交流电源溅射陶瓷Zn(AZO)靶、用氩气作为溅射气体、掺入少量氧气制备而成,其中,氩氧比为:(400SCCM~420SCCM):(20~40SCCM)。
再进一步地,所述第三Ag层15的厚度为5~10nm。其采用磁控溅射镀膜工艺,用直流电源溅射银靶、用氩气作为溅射气体制备而成,气体流量500~550SCCM。
再进一步地,所述第三NiCr阻挡层16的厚度为0.5~2nm。其采用磁控溅射镀膜工艺,用直流电源溅射镍铬合金、用氩气作为溅射气体制备而成。
再进一步地,所述第六AZO阻挡层17的厚度为15~25nm。其采用磁控溅射镀膜工艺,用中频交流电源溅射陶瓷Zn(AZO)靶、用氩气作为溅射气体、掺入少量氧气制备而成,其中,氩氧比为:(400SCCM~420SCCM):(20~40SCCM)。
再进一步地,所述第四TiOx膜层18的厚度为25~40nm。其采用磁控溅射镀膜工艺,用交流中频电源、以氩气为溅射气体、氧气作反应气体射陶瓷钛靶制备而成,其中,氩氧比为(400SCCM~420SCCM):(50SCCM~60SCCM),氩氧比是该膜层的核心。
再进一步地,所述SixNy顶膜层19的厚度为20~35nm。其采用磁控溅射镀膜工艺,用交流中频电源、氩气作为溅射气体、氮气作反应气体溅射硅铝靶(硅铝质量百分比92:8)制备而成,其中,氩氮比为(400SCCM~420SCCM):(450SCCM~500SCCM),氩氮比是该膜层的核心,决定了成膜的质量。
具体地,所述SixNy基膜层2、所述SixNy顶膜层19为Si3N4保护层。
本发明利用SixNy作为基膜层和顶膜层,使膜层具有较好的粘结性和较佳机械强度;同时,利用TiOx提高玻璃的透光率,各Ag层下面均用AZO阻挡层,各Ag层上面均用NiCr阻挡层和AZO阻挡层,AZO阻挡层具有附着力较强,不容易掉渣的性能,可以使各Ag层得到更好的保护,可将LOW-E玻璃的保存期延长至7-8个月。另外,本发明透过率≥60%,辐射率≤0.03,反射率≤15,遮阳系数SC≤0.35;本发明颜色显现浅蓝色,通过色度仪可以测得如下颜色坐标值:a*=-3.0~-3.5,b*=-6~-7,光学性能良好。
以上所述仅为本发明的较佳实施例,并非用来限定本发明实施的范围,凡依本发明专利范围所做的同等变化与修饰,皆落入本发明专利涵盖的范围。
Claims (7)
1.一种三银LOW-E镀膜玻璃,包括玻璃基材,其特征在于:所述玻璃基材的上表面由下而上依次设有SixNy基膜层、第一TiOx膜层、第一AZO阻挡层、第一Ag层、第一NiCr阻挡层、第二AZO阻挡层、第二TiOx膜层、第三AZO阻挡层、第二Ag层、第二NiCr阻挡层、第四AZO阻挡层、第三TiOx膜层、第五AZO阻挡层、第三Ag层、第三NiCr阻挡层、第六AZO阻挡层、第四TiOx膜层、以及SixNy顶膜层。
2.根据权利要求1所述的一种三银LOW-E镀膜玻璃,其特征在于:所述SixNy基膜层的厚度为10~25nm,SixNy顶膜层的厚度为20~35nm。
3.根据权利要求1所述的一种三银LOW-E镀膜玻璃,其特征在于:所述第一TiOx膜层的厚度为10~20nm,第二TiOx膜层、第三TiOx膜层、第四TiOx膜层的厚度为25~40nm。
4.根据权利要求1所述的一种三银LOW-E镀膜玻璃,其特征在于:所述第一AZO阻挡层的厚度为5~15nm,第二AZO阻挡层的厚度为15~25nm,第三AZO阻挡层的厚度为5~15nm,第四AZO阻挡层的厚度为5~10nm,第五AZO阻挡层的厚度为8~14nm,第六AZO阻挡层的厚度为15~25nm。
5.根据权利要求1所述的一种三银LOW-E镀膜玻璃,其特征在于:所述第一Ag层的厚度为2~5nm,第二Ag层的厚度为3~10nm,第三Ag层的厚度为5~10nm。
6.根据权利要求1所述的一种三银LOW-E镀膜玻璃,其特征在于:所述第一NiCr阻挡层的厚度为3~6nm,第二NiCr阻挡层的厚度为2~8nm,第三NiCr阻挡层的厚度为0.5~2nm。
7.根据权利要求1或2所述的一种三银LOW-E镀膜玻璃,其特征在于:所述SixNy基膜层、所述SixNy顶膜层为Si3N4保护层。
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105152549A (zh) * | 2015-05-26 | 2015-12-16 | 信义玻璃工程(东莞)有限公司 | 一种镀膜玻璃及其制备方法 |
CN108439825A (zh) * | 2018-05-15 | 2018-08-24 | 浙江旗滨节能玻璃有限公司 | 星空蓝三银低辐射镀膜玻璃及其制备方法 |
CN111253082A (zh) * | 2020-03-23 | 2020-06-09 | 中山市格兰特实业有限公司 | 一种超屏蔽隔热型三银可钢化Low-E玻璃及制备方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20030150711A1 (en) * | 2001-10-17 | 2003-08-14 | Laird Ronald E. | Coated article with high visible transmission and low emissivity |
CN102503172A (zh) * | 2011-10-31 | 2012-06-20 | 中山市格兰特实业有限公司火炬分公司 | 一种低辐射可钢化双银low-e玻璃 |
CN102555330A (zh) * | 2012-01-13 | 2012-07-11 | 林嘉宏 | 具有多层功能层的低辐射镀膜玻璃 |
CN103213348A (zh) * | 2013-04-26 | 2013-07-24 | 巨野耀华玻璃科技有限公司 | 一种三银低辐射镀膜玻璃 |
CN103753896A (zh) * | 2014-01-06 | 2014-04-30 | 天津南玻节能玻璃有限公司 | 一种掺杂硼化镧azo低辐射镀膜玻璃及其制备方法 |
-
2014
- 2014-10-30 CN CN201410604662.XA patent/CN104325736A/zh active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20030150711A1 (en) * | 2001-10-17 | 2003-08-14 | Laird Ronald E. | Coated article with high visible transmission and low emissivity |
CN102503172A (zh) * | 2011-10-31 | 2012-06-20 | 中山市格兰特实业有限公司火炬分公司 | 一种低辐射可钢化双银low-e玻璃 |
CN102555330A (zh) * | 2012-01-13 | 2012-07-11 | 林嘉宏 | 具有多层功能层的低辐射镀膜玻璃 |
CN103213348A (zh) * | 2013-04-26 | 2013-07-24 | 巨野耀华玻璃科技有限公司 | 一种三银低辐射镀膜玻璃 |
CN103753896A (zh) * | 2014-01-06 | 2014-04-30 | 天津南玻节能玻璃有限公司 | 一种掺杂硼化镧azo低辐射镀膜玻璃及其制备方法 |
Non-Patent Citations (2)
Title |
---|
中国南玻基团工程玻璃事业部: "《建筑玻璃加工技术》", 31 March 2010, 华南理工大学出版社 * |
周家斌等: "低辐射镀膜玻璃的研究发展进展", 《建筑结构学报》 * |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105152549A (zh) * | 2015-05-26 | 2015-12-16 | 信义玻璃工程(东莞)有限公司 | 一种镀膜玻璃及其制备方法 |
CN108439825A (zh) * | 2018-05-15 | 2018-08-24 | 浙江旗滨节能玻璃有限公司 | 星空蓝三银低辐射镀膜玻璃及其制备方法 |
CN111253082A (zh) * | 2020-03-23 | 2020-06-09 | 中山市格兰特实业有限公司 | 一种超屏蔽隔热型三银可钢化Low-E玻璃及制备方法 |
CN111253082B (zh) * | 2020-03-23 | 2023-11-14 | 中山市格兰特实业有限公司 | 一种超屏蔽隔热型三银可钢化Low-E玻璃及制备方法 |
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