CN104299630B - The compound method of metal negative surface clean solution - Google Patents
The compound method of metal negative surface clean solution Download PDFInfo
- Publication number
- CN104299630B CN104299630B CN201410540559.3A CN201410540559A CN104299630B CN 104299630 B CN104299630 B CN 104299630B CN 201410540559 A CN201410540559 A CN 201410540559A CN 104299630 B CN104299630 B CN 104299630B
- Authority
- CN
- China
- Prior art keywords
- metal negative
- surface clean
- negative surface
- clean solution
- solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000004140 cleaning Methods 0.000 title claims abstract description 32
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 32
- 239000002184 metal Substances 0.000 title claims abstract description 32
- 150000001875 compounds Chemical class 0.000 title claims abstract description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims abstract description 24
- 239000010452 phosphate Substances 0.000 claims abstract description 14
- NBIIXXVUZAFLBC-UHFFFAOYSA-K [O-]P([O-])([O-])=O Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims abstract description 12
- 239000000080 wetting agent Substances 0.000 claims abstract description 12
- IIACRCGMVDHOTQ-UHFFFAOYSA-N Sulfamic acid Chemical compound NS(O)(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-N 0.000 claims abstract description 6
- 239000008367 deionised water Substances 0.000 claims abstract description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 6
- 239000000243 solution Substances 0.000 claims description 27
- 239000002994 raw material Substances 0.000 claims description 7
- 239000003344 environmental pollutant Substances 0.000 claims description 6
- 231100000719 pollutant Toxicity 0.000 claims description 6
- 239000007836 KH2PO4 Substances 0.000 claims description 5
- GNSKLFRGEWLPPA-UHFFFAOYSA-M Monopotassium phosphate Chemical compound [K+].OP(O)([O-])=O GNSKLFRGEWLPPA-UHFFFAOYSA-M 0.000 claims description 5
- 239000003945 anionic surfactant Substances 0.000 claims description 5
- 239000007853 buffer solution Substances 0.000 claims description 5
- 235000014113 dietary fatty acids Nutrition 0.000 claims description 5
- 229910000397 disodium phosphate Inorganic materials 0.000 claims description 5
- 239000000194 fatty acid Substances 0.000 claims description 5
- 150000004665 fatty acids Chemical class 0.000 claims description 5
- 229910000402 monopotassium phosphate Inorganic materials 0.000 claims description 5
- 230000001264 neutralization Effects 0.000 claims description 5
- LSNNMFCWUKXFEE-UHFFFAOYSA-L Sulphite Chemical compound [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 claims description 3
- 150000008051 alkyl sulfates Chemical class 0.000 claims description 3
- 150000002148 esters Chemical class 0.000 claims description 2
- -1 phosphate ester Chemical class 0.000 claims description 2
- QAOWNCQODCNURD-UHFFFAOYSA-L sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims description 2
- 239000000203 mixture Substances 0.000 claims 1
- 229920002120 photoresistant polymer Polymers 0.000 abstract description 5
- 239000000428 dust Substances 0.000 abstract description 3
- 238000000034 method Methods 0.000 abstract description 3
- 235000014593 oils and fats Nutrition 0.000 abstract description 2
- 239000002351 wastewater Substances 0.000 abstract description 2
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 230000003287 optical Effects 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005323 electroforming Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 239000005304 optical glass Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Abstract
The present invention relates to the compound method of a kind of metal negative surface clean solution, belong to abluent technical field.It includes deionized water, mixed phosphate, sulfamic acid, wetting agent and sodium hydroxide, obtains metal negative surface clean solution after mixing.The cleaning solution that the present invention the provides less pollution to environment, waste water processes simple.This formula solution has stronger dissolubility, it is possible to oils and fats on adsorbing metal stamper, impression of the hand, dust etc., the most also can the effective photoresist on the stamper of place to go.
Description
The present invention relates to the compound method of a kind of metal negative surface clean solution, belong to abluent technical field.
Background technology
Metal negative used in optical disc production process, its manufacturing process is even spread photoresist on optical glass, utilizes laser to carry out imprinting on photoresist coating, uses developer solution to develop, imprinting hole point then at one layer of silver of its surface sputter.During electroforming, the nickel dish that glass surface is formed can remain the impurity such as substantial amounts of photoresist, silver at the pitted surface and table top separating hole, rear surface point with glass, the error code causing metal negative increases, exceed standard, outward appearance is gloomy, simultaneously metal negative can be made to be stained with the pollutant such as dust, impression of the hand, oil stain in the use, transmittance process of metal negative, the error code of metal negative can be caused equally to exceed standard, bad order.
Summary of the invention
It is an object of the invention to provide the compound method of a kind of metal negative surface clean solution simple, easy-operating, utilize this cleaning solution, the pollutant on metal negative surface can be washed, guarantee that its error code of stamper produced and outward appearance are improved, so that its CD outward appearance produced and performance are more preferable.
The technical scheme provided according to the present invention, the compound method of a kind of metal negative surface clean solution, raw material is as follows: mixed phosphate 1-2 part, sulfamic acid 1-1.5 part, wetting agent 1-3 part, sodium hydroxide 10-12 part, deionized water 150-200；Above-mentioned raw materials is mixed, regulates pH to 11-12, keep temperature to be 45-55 DEG C, i.e. obtain metal negative surface clean solution.
Described mixed phosphate be pH be the neutral standard buffer solution of 6-7, containing Na2HPO4And KH2PO4。
Described wetting agent is anionic surfactant, including alkyl sulfate, sulfonate, fatty acid, fatty acid ester sulfate, phosphate ester etc., has excellent detergent power and the tendency of solubilising.
Metal negative surface clean solution is heated to 45-55 DEG C, is placed in metal negative groove to be cleaned, circulates；Increase a filter, be used for catching the pollutant cleaned out.
Beneficial effects of the present invention: the cleaning solution that the present invention the provides less pollution to environment, waste water processes simple；This formula solution has stronger dissolubility, it is possible to oils and fats on adsorbing metal stamper, impression of the hand, dust etc., the most also can the effective photoresist on the stamper of place to go；The pH of solution maintains about 12, and temperature keeps about 50 DEG C, and phosphate is used for improving cleaning performance, and wetting agent is used for reducing surface tension, makes pollutant be more prone to separate；Maintaining is simple, every 2 weeks cleaning solvent grooves, replacing solvents.
Detailed description of the invention
Hereinafter executing the sodium hydroxide in example is EL level, molecular weight 40.00.
Embodiment 1
A kind of metal negative surface clean solution preparation, as follows: mixed phosphate 1 part, sulfamic acid 1 part, wetting agent 1 part, sodium hydroxide 10 parts, deionized water 200；Above-mentioned raw materials is mixed, regulates pH to 11-12, keep temperature to be 45-55 DEG C, i.e. obtain metal negative surface clean solution.
Described mixed phosphate be pH be the neutral standard buffer solution of 6.86, containing Na2HPO4And KH2PO4。
Described wetting agent is anionic surfactant alkyl sulfate.
NaOH makes the pH value of solution maintain about 12；Heater makes solution temperature maintain 45-55 DEG C；Solution, at groove internal circulation flow, increases a filter, is used for catching the pollutant cleaned out.
Embodiment 2
A kind of metal negative surface clean solution preparation, as follows: mixed phosphate 2 parts, sulfamic acid 1.5 parts, wetting agent 3 parts, sodium hydroxide 12 parts, deionized water 150；Being mixed by above-mentioned raw materials, regulate pH to 12, keeping temperature is 50 DEG C, i.e. obtains metal negative surface clean solution.
Described mixed phosphate be pH be the neutral standard buffer solution of 6.86, containing Na2HPO4And KH2PO4。
Described wetting agent is anionic surfactant sulfonate.
Embodiment 3
A kind of metal negative surface clean solution preparation, as follows: mixed phosphate 1.5 parts, sulfamic acid 1.2 parts, wetting agent 1 part, sodium hydroxide 11 parts, deionized water 180；Being mixed by above-mentioned raw materials, regulate pH to 12, keeping temperature is 50 DEG C, i.e. obtains metal negative surface clean solution.
Described mixed phosphate be pH be the neutral standard buffer solution of 6.86, containing Na2HPO4And KH2PO4。
Described wetting agent is anionic surfactant fatty acid.
ISOPREP, StamperPrep these 2 kinds is mainly had to be specifically designed to the abluent of optical disc production, the cost of metal negative surface clean solution prepared by embodiment of the present invention 1-3 is only equivalent to 1/10th of these 2 sections of abluents, cheap, configure simple and convenient, i.e. join i.e. use, there is prospects for commercial application widely.
Claims (4)
1. a compound method for metal negative surface clean solution, is characterized in that raw material is as follows: mixed phosphate 1-2 part, sulfamic acid 1-1.5 part, wetting agent 1-3 part, sodium hydroxide 10-12 part, deionized water 150-200；Above-mentioned raw materials is mixed, regulates pH to 11-12, keep temperature to be 45-55 DEG C, i.e. obtain metal negative surface clean solution.
2. the compound method of as claimed in claim 1 metal negative surface clean solution, is characterized in that: described mixed phosphate be pH be the neutral standard buffer solution of 6.86, containing Na2HPO4And KH2PO4。
3. the compound method of metal negative surface clean solution as claimed in claim 1, it is characterized in that: described wetting agent is anionic surfactant, specially the mixture of one or more in alkyl sulfate, sulfonate, fatty acid, fatty acid ester sulfate, phosphate ester.
4. the application of metal negative surface clean solution described in claim 1, is characterized in that: metal negative surface clean solution is heated to 45-55 DEG C, is placed in metal negative groove to be cleaned, circulates；Increase a filter, be used for catching the pollutant cleaned out.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410540559.3A CN104299630B (en) | 2014-10-14 | The compound method of metal negative surface clean solution |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410540559.3A CN104299630B (en) | 2014-10-14 | The compound method of metal negative surface clean solution |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104299630A CN104299630A (en) | 2015-01-21 |
| CN104299630B true CN104299630B (en) | 2017-01-04 |
Family
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1051585A (en) * | 1989-10-30 | 1991-05-22 | 国际商业机器公司 | Water based cleaning composition |
| CN1394986A (en) * | 2002-08-01 | 2003-02-05 | 江苏新广联光盘有限公司 | Nickel-base submicron information surface layer quick silver-removing liquor |
| TW200623099A (en) * | 2004-12-24 | 2006-07-01 | Prodisc Technology Inc | Preparation method of disc master |
| TW200631009A (en) * | 2005-02-22 | 2006-09-01 | Prodisc Technology Inc | Preparation method of disc stamper |
| CN101186758A (en) * | 2007-06-05 | 2008-05-28 | 黄新兰 | Metal chelation azo compact disc dyestuff and preparation method thereof |
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1051585A (en) * | 1989-10-30 | 1991-05-22 | 国际商业机器公司 | Water based cleaning composition |
| CN1394986A (en) * | 2002-08-01 | 2003-02-05 | 江苏新广联光盘有限公司 | Nickel-base submicron information surface layer quick silver-removing liquor |
| TW200623099A (en) * | 2004-12-24 | 2006-07-01 | Prodisc Technology Inc | Preparation method of disc master |
| TW200631009A (en) * | 2005-02-22 | 2006-09-01 | Prodisc Technology Inc | Preparation method of disc stamper |
| CN101186758A (en) * | 2007-06-05 | 2008-05-28 | 黄新兰 | Metal chelation azo compact disc dyestuff and preparation method thereof |
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