CN104279779A - Metal nitride solar spectrum selective absorption coating - Google Patents

Metal nitride solar spectrum selective absorption coating Download PDF

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Publication number
CN104279779A
CN104279779A CN201310278545.4A CN201310278545A CN104279779A CN 104279779 A CN104279779 A CN 104279779A CN 201310278545 A CN201310278545 A CN 201310278545A CN 104279779 A CN104279779 A CN 104279779A
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layer
coating
selective absorption
absorption
sunlight spectrum
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Inventor
杜淼
郝雷
蒋利军
刘晓鹏
王笑静
于庆河
米菁
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Beijing General Research Institute for Non Ferrous Metals
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Beijing General Research Institute for Non Ferrous Metals
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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24—HEATING; RANGES; VENTILATING
    • F24S—SOLAR HEAT COLLECTORS; SOLAR HEAT SYSTEMS
    • F24S70/00—Details of absorbing elements
    • F24S70/30—Auxiliary coatings, e.g. anti-reflective coatings
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24—HEATING; RANGES; VENTILATING
    • F24S—SOLAR HEAT COLLECTORS; SOLAR HEAT SYSTEMS
    • F24S70/00—Details of absorbing elements
    • F24S70/20—Details of absorbing elements characterised by absorbing coatings; characterised by surface treatment for increasing absorption
    • F24S70/225—Details of absorbing elements characterised by absorbing coatings; characterised by surface treatment for increasing absorption for spectrally selective absorption
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/40—Solar thermal energy, e.g. solar towers

Abstract

Disclosed is a solar spectrum selective absorption coating. The solar spectrum selective absorption coating sequentially comprises a metal infrared high-reflection layer, an absorption layer and an anti-reflection layer from a substrate to the outside, wherein the metal infrared high-reflection layer is composed of any one of W, Mo, Al, Cu, Au, Ag, Pt, Ni and Cr, and the thickness of the metal infrared high-reflection layer is 30-500 nanometers; the absorption layer is composed of MoxA11-xN, x is equal to 0.1-0.9, and the thickness of the absorption layer is 30-300 nanometers; the anti-reflection layer is composed of nitride or oxide of Al, the nitride or the oxide of the Al comprises AlN or Al2O3, and the thickness of the anti-reflection layer is 10-300 nanometers. The solar spectrum selective absorption coating can further comprise a bonding layer, a diffusion blocking layer and a protection layer, wherein the bonding layer is located between the substrate and the metal infrared high-reflection layer, the diffusion blocking layer is located between the metal infrared high-reflection layer and the absorption layer, and the protection layer is located on the outer side of the anti-reflection layer. The absorption rate alpha of the manufactured coating can reach 0.96, the emissivity epsilon of the manufactured coating is equal to or less than 0.05 at the temperature of 82 DEG C, equal to or less than 0.10 at the temperature of 400 DEG C and equal to or less than 0.13 at the temperature of 500 DEG C, and the withhold temperature of the coating reaches 550 DEG C.

Description

A kind of metal nitride coating for selective absorption of sunlight spectrum
Technical field
The present invention relates to a kind of coating for selective absorption of sunlight spectrum, in solar parabolic through power generation system, also can be used for, in solar industry heating, solar airconditioning and solar seawater desalination system, belonging to solar energy heat utilization technical field.
Background technology
The photo-thermal conversion efficiency of slot type vacuum heat collection pipe depends on optical property and the high-temperature stability of spectral selective absorbing coating.In general, spectral selective absorbing coating needs the low-launch-rate (< 0.10,400 DEG C) when having high-absorbility (> 0.94) and high temperature, because the thermal radiation loss of coating and T 4direct proportionality.The stability of coating in hot environment is also very important, which dictates that the operating temperature of coating.
Cermet composite coating has good heat endurance, is mainly used in middle high-temperature field, is one of Recent study focus.Cermet composite coating is that metallic is mixed in the dielectric matrix such as oxide or nitride, makes coating have very strong absorption to solar spectrum by the band-to-band transition of metal and short grained resonance.Cermet composite coating (the Pt-Al that multiple transition metal and ceramic matrix are formed 2o 3, Ni-Al 2o 3, Mo-Al 2o 3, W-Al 2o 3, Ni-SiO 2deng) all there is good optical property and Vacuum Heat stability.But these coatings in atmosphere heat endurance are poor, this is mainly because the oxidation of metallic in air ambient or diffusion.Meanwhile, in preparation process, because oxygen is as reacting gas, in general the composite coating formed is M-MO-Al2O3, and (M=Pt, Ni, Mo, W, Ni etc.) have impact on the optical property of coating.
Transition metal nitride or oxide have good heat endurance in atmosphere, and this is because d or the f subgrade of transition metal has the electronics do not matched completely, such as W 2n, Mo 2n etc.In these coatings, introduce third element Al, form WAlN, MoAlN, the coating of metallic state to nonmetal state can be obtained by the content controlling Al in coating, improve the resistance to elevated temperatures of coating simultaneously.These coatings are desirable absorption layer materials of solar spectral selective absorbing coating.
Chinese invention patent CN8510042 relates to a kind of Al-N/A1 coating for selective absorption, and this coating can adopt single technology Al target response Slag coating, and technique is simple, cost is low, and the absorptivity of coating can reach 0.93, emissivity 0.06 (100 DEG C).Middle low-temperature solar energy vacuum heat collection pipe is widely applied.But this coating is when higher temperature works, the aluminum particulate activity in coating increases, and the thermal diffusion effect of metallic and dielectric is strengthened, and coating structure is disorderly, and coating performance declines, and have impact on collecting efficiency and the life-span of vacuum tube.
Chinese invention patent CN96102331.7 relates to a kind of M-AlN (M=SS, W etc.) spectral selective absorbing coating, and this coating adopts metallic target at Ar+N 2under atmosphere, reactive sputtering is formed.Owing to have employed two dc power supply, deposition efficiency increases, and coating heat resistance is improved.But this coating is only limited in vacuum environment and works, there is oxidation and diffusion in metallic in air ambient, causes coating failure.
European patent WO2012/172505Al relates to a kind of spectral selective absorbing coating of bimetallic nitride composite coating, will have the W of high-temperature stability xn or Mo xn is entrained in AlN xmiddle as absorbed layer, because metal nitride has good high-temperature stability, make coating have high high-temp stability.Complicated process of preparation in this patent of invention, needs W xn or Mo xn and AlN xseparate one-tenth phase, cost is relatively high.
Summary of the invention
The object of the invention is the defect for above-mentioned prior art, the coating for selective absorption of sunlight spectrum of a kind of transition metal nitride as absorbed layer is proposed, the coating of the present invention has the features such as excellent optical performance, heat-resisting ability be strong, be easy to realize in preparation technology and regulate and control simple, being applicable in the solar energy heat utilization under high ambient conditions.
The spectral selective absorbing coating that the present invention proposes is outside from matrix, be followed successively by metallic red outer high reflection layer, the first absorbed layer, the second absorbed layer, antireflection layer, it is characterized in that, described first absorbed layer and the second absorbed layer are respectively by the transition metal nitride Mo that composition is different 2the MoAlN formation that third element Al is formed is introduced in N.In order to improve adhesion and the stability of coating, between substrate and the outer high reflection layer of metallic red, increasing tack coat, outside metallic red, increase diffusion impervious layer between high reflection layer and the first absorbed layer, outside antireflection layer, increase overcoat.
The one that what the base material in the present invention was chosen is in stainless steel, Cu, Al, glass and Si;
Outside metallic red in the present invention, high reflection layer is any one in simple metal W, Mo, Al, Cu, Au, Ag, Pt, Ni, Cr, and thickness is 30-500 nanometer;
Absorbed layer in the present invention is by Mo xal 1-xn is formed, wherein, and x=0.1-0.9.Absorbed layer is many sublayer structures of single layer structure or composition gradual change.Mo xal 1-xn adopts Mo and Al simple metal target, and under argon gas and nitrogen atmosphere, cosputtering forms, and also can adopt the MoAl target of frozen composition, sputters and form under argon gas and nitrogen atmosphere.Thickness is 30-300 nanometer;
Antireflection layer in the present invention is the nitride of Al or oxide mainly, comprises AlN or Al 2o 3.The target that this layer adopts is Al simple metal target, adopts the preparation method of direct current or medium frequency magnetron sputtering, or adopts AlN or Al 2o 3ceramic target adopts the preparation method of radio-frequency sputtering, and thickness is 10-300 nanometer;
Tack coat in the present invention is W, Mo, Ti, Zr, AlN, TiN, ZrN and Al 2o 3in any one, thickness is 1-200 nanometer;
Diffusion impervious layer in the present invention is AlN, TiN, TiAlN, Al 2o 3, TiO 2in any one, thickness is 1-100 nanometer;
Overcoat in the present invention is the nitride of Si, oxide or nitrogen oxide mainly, comprises Si 3n 4, SiO 2and SiON.The target that this layer adopts is Si target, and adopt the preparation method of direct current or medium frequency magnetron sputtering, thickness is 0-150 nanometer.
In coating for selective absorption of sunlight spectrum of the present invention, the absorbed layer of this coating for selective absorption of sunlight spectrum can be one deck or two-layer, for when two-layer, is that the first absorption subgrade, second absorbs subgrade; First absorbs subgrade, second absorbs subgrade by Mo xal 1-xn is formed, wherein, x=0.1-0.9, just the first x value absorbed in subgrade, the second absorption subgrade is different, and the x value namely in x=0.1-0.9 is different, and e.g., absorb in subgrade first, x value is 0.6; Absorb in subgrade second, x value is 0.2; Also can be absorb in subgrade first, x value be 0.2; Absorb in subgrade second, x value is 0.6; First absorbs subgrade, the second absorption subgrade gross thickness is 30-300 nanometer.
The present invention is directed to different film materials and control each thicknesses of layers and composition by adjustment sputtering power, the flow of nitrogen-oxygen-argon and sedimentation time.That is, absorber coatings is by adjusting sputtering power, high-purity Ar, high-purity N 2with high-purity O 2in the flow of one or more and sedimentation time control thickness and the composition of each absorber coatings.
Principle of the present invention is: by transition metal M o 2introducing third element Al in N, define MoAlN, not only increase the resistance to elevated temperatures of coating, simultaneously by controlling the content of Mo and Al in coating, accurately can control the optical constant (refractive index and extinction coefficient) of coating.By structural design, obtain from top layer to the coating structure that substrate refractive index increases gradually, under the Intrinsic Gettering double action that multilayer film absorbs step by step with MoAlN coating, obtain the coating for selective absorption of sunlight spectrum of function admirable.
The present invention is a kind of coating for selective absorption of sunlight spectrum and preparation method thereof, its advantage is: prepared coating absorptivity α can reach 0.96, emissivity ε≤0.05 (82 DEG C), ε≤0.10 (400 DEG C), ε≤0.13 (500 DEG C), heatproof temperature reaches 550 DEG C, meets the requirement that solar energy high temperature utilizes.This preparation technology of coating is simple, and cost is low, and the coating adopting the method to make may be used in air and vacuum environment.
Accompanying drawing explanation
Fig. 1 is the generalized section realizing the simplest coating structure of the present invention, and Fig. 2 is the generalized section of the coating structure after increasing auxiliary function layer.
Detailed description of the invention
Below in conjunction with drawings and Examples, the present invention is described in further detail.
The invention provides and a kind ofly have the coating for selective absorption of sunlight spectrum of transition metal nitride as absorbent layer structure, as shown in Figure 1, coating comprises 3 tunics, outside from matrix 0, is followed successively by metallic red outer high reflection layer 1, absorbed layer 2, antireflection layer 3.
The invention provides another kind and there is the coating for selective absorption of sunlight spectrum of transition metal nitride as absorbent layer structure, as shown in Figure 2, coating comprises from matrix 0 outside, is followed successively by the outer high reflection layer 1, first of metallic red and absorbs subgrade 2-1, the second absorption subgrade 2-2, antireflection layer 3.In order to improve adhesion and the stability of coating, between substrate 0 and the outer high reflection layer 1 of metallic red, increasing tack coat 4, outside metallic red, increase diffusion impervious layer 5 between high reflection layer 1 and the first absorbed layer 2-1, outside antireflection layer 3, increase overcoat 6.
The outer high reflection layer of metallic red is made up of any one in W, Mo, Al, Cu, Au, Ag, Pt, Ni, Cr, is positioned at tack coat top, and the thickness of the outer high reflection layer of metallic red is 30-500 nanometer; Absorbed layer is by Mo xal 1-xn is formed, wherein, and x=0.1-0.9.Mo xal 1-xn adopts Mo and Al simple metal target, and under argon gas and nitrogen atmosphere, cosputtering forms; Also can adopt the MoAl target of frozen composition, sputter and form under argon gas and nitrogen atmosphere, the thickness of absorbed layer is 30-300 nanometer.Antireflection layer is the nitride of Al or oxide mainly, includes AlN or Al 2o 3, the target that this layer adopts is Al simple metal target, and adopt the preparation method of direct current or medium frequency magnetron sputtering, the thickness of antireflection layer is 10-300 nanometer; This coating for selective absorption of sunlight spectrum also includes tack coat, and this tack coat is between substrate and the outer high reflection layer of metallic red, and tack coat is by W, Mo, Ti, Zr, AlN, TiN, ZrN and Al 2o 3in any one composition, be positioned at substrate surface, the thickness of tack coat is 1-200 nanometer; This coating for selective absorption of sunlight spectrum also includes diffusion impervious layer, and this diffusion impervious layer is outer between high reflection layer and absorbed layer in metallic red; Diffusion impervious layer is by AlN, TiN, TiAlN, Al 2o 3, TiO 2in any one composition, the thickness of diffusion impervious layer is 1-100 nanometer; This coating for selective absorption of sunlight spectrum also includes overcoat, and this overcoat is positioned at outside antireflection layer, and overcoat is the nitride of Si, oxide or nitrogen oxide mainly, includes Si 3n 4, SiO 2or SiON.The target that this layer adopts is Si target, and adopt the preparation method of direct current or medium frequency magnetron sputtering, the thickness of overcoat is 0-150 nanometer.
Embodiment 1
With Mo/Mo 0.5al 0.5n/AlN spectral selective absorbing coating is example.Preparation process is as follows:
Step one: the outer high reflection layer of preparation metallic red; Adopt metal M o target (purity is 99.99%) DC magnetron sputtering method, by vacuum chamber forvacuum to 5.0 × 10 -3pa, pass into purity be the Ar of 99.999% as sputter gas, flow is 180sccm, regulate sputtering pressure be 4.5 × 10 -1pa.Open Mo target, power is 20KW, sputtering 12min, the Mo film of preparation 200nm.
Step 2: prepare absorbed layer; Select purity be 99.99% Mo target and purity be 99.99% Al target, pass into purity be the Ar of 99.999% as sputter gas, flow is 180sccm, passes into the N that purity is 99.999% 2as reacting gas, flow is 100sccm.Sputtering pressure is regulated to be 4.5 × 10 -1pa.Open Mo target and Al target power supply, Mo target power output is 20KW, Al target power output is 18KW, is 380 ~ 400V, utilizes intermediate frequency-DC sputturing method mode to deposit 20min by cathode voltage monitoring system control Al target sputtering voltage, the Mo of preparation 120nm 0.5al 0.5n film;
Step 3: prepare antireflection layer; Select purity be 99.99% Al target, pass into purity be the Ar of 99.999% as sputter gas, flow is 180sccm, passes into the N that purity is 99.999% 2as reacting gas, flow is 50sccm.Sputtering pressure is regulated to be 4.5 × 10 -1pa.Open Al target, power is 15KW, and controlling sputtering voltage by cathode voltage monitoring system is 380 ~ 400V, utilizes medium frequency magnetron sputtering to deposit 25min, the AlN film of preparation 60nm;
Prepared coating absorptivity can reach 0.90, emissivity ε≤0.05 (82 DEG C), ε≤0.09 (400 DEG C), ε≤0.12 (500 DEG C).Heatproof temperature reaches 500 DEG C.
Embodiment 2
With Mo/Mo 0.6al 0.4n/Mo 0.2al 0.8n/AlN spectral selective absorbing coating is example.Preparation process is as follows:
Step one: the outer high reflection layer of preparation metallic red; Adopt metal M o target (purity is 99.99%) DC magnetron sputtering method, by vacuum chamber forvacuum to 5.0 × 10 -3pa, pass into purity be the Ar of 99.999% as sputter gas, flow is 180sccm, regulate sputtering pressure be 4.5 × 10 -1pa.Open Mo target, power is 20KW, sputtering 12min, the Mo film of preparation 200nm.
Step 2: prepare the first absorbed layer; Select purity be 99.99% Mo target and purity be 99.99% Al target, pass into purity be the Ar of 99.999% as sputter gas, flow is 180sccm, passes into the N that purity is 99.999% 2as reacting gas, flow is 80sccm.Sputtering pressure is regulated to be 4.5 × 10 -1pa.Open Mo target and Al target power supply, Mo target power output is 20KW, Al target power output is 15KW, is 380 ~ 400V by cathode voltage monitoring system control Al target sputtering voltage, utilizes intermediate frequency-DC sputturing method deposition 15min, Mo of preparation 90nm 0.6al 0.4n film;
Step 3: prepare the second absorbed layer; Select purity be 99.99% Mo target and purity be 99.99% Al target, pass into purity be the Ar of 99.999% as sputter gas, flow is 180sccm, passes into the N that purity is 99.999% 2as reacting gas, flow is 60sccm.Sputtering pressure is regulated to be 4.5 × 10 -1pa.Open Mo target and Al target power supply, Mo target power output is 10KW, Al target power output is 20KW, is 360 ~ 390V by cathode voltage monitoring system control Al target sputtering voltage, utilizes intermediate frequency-DC sputturing method deposition 13min, Mo of preparation 40nm 0.2al 0.8n film;
Step 4: prepare antireflection layer; Select purity be 99.99% Al target, pass into purity be the Ar of 99.999% as sputter gas, flow is 180sccm, passes into the N that purity is 99.999% 2as reacting gas, flow is 50sccm.Sputtering pressure is regulated to be 4.5 × 10 -1pa.Open Al target, power is 15KW, and controlling sputtering voltage by cathode voltage monitoring system is 380 ~ 400V, utilizes medium frequency magnetron sputtering to deposit 25min, the AlN film of preparation 60nm;
Prepared coating absorptivity can reach 0.95, emissivity ε≤0.05 (82 DEG C), ε≤0.10 (400 DEG C), ε≤0.13 (500 DEG C).Heatproof temperature reaches 500 DEG C.
Embodiment 3
With Al 2o 3/ Mo/AlN/Mo 0.6al 0.4n/Mo 0.2al 0.8n/AlN/Si 3n 4spectral selective absorbing coating is example.Preparation process is as follows:
Step one: prepare tack coat on the stainless steel-based end; Select purity be 99.99% Al target, sputtering before by vacuum chamber forvacuum to 5 × 10 -3pa, pass into purity be the Ar of 99.999% as sputter gas, flow is 180sccm, passes into the O that purity is 99.999% 2as reacting gas, flow is 20sccm.Sputtering pressure is regulated to be 4.5 × 10 -1pa.Open Al target, power is 15KW.Controlling sputtering voltage by cathode voltage control system is 400 ~ 420V, utilizes medium frequency magnetron sputtering mode to deposit 35min, the Al of preparation 100nm 2o 3film;
Step 2: prepare the outer high reflection layer of metallic red on tack coat; Adopt metal M o target (purity is 99.99%) DC magnetron sputtering method, pass into purity be the Ar of 99.999% as sputter gas, flow is 180sccm, regulates sputtering pressure to be 4.5 × 10 -1pa.Open Mo target, power is 20KW, sputtering 12min, the Mo film of preparation 200nm.
Step 3: prepare diffusion impervious layer on the outer high reflection layer of metallic red; Select purity be 99.99% Al target, pass into purity be the Ar of 99.999% as sputter gas, flow is 180sccm, passes into the N that purity is 99.999% 2as reacting gas, flow is 60sccm.Sputtering pressure is regulated to be 4.5 × 10 -1pa.Open Al target, power is 8KW.Controlling sputtering voltage by cathode voltage monitoring system is 380 ~ 400V, utilizes medium frequency magnetron sputtering mode to deposit 10min, the AlN film of preparation 10nm;
Step 4: prepare the first absorbed layer on the diffusion barrier; Select purity be 99.99% Mo target and purity be 99.99% Al target, pass into purity be the Ar of 99.999% as sputter gas, flow is 180sccm, passes into the N that purity is 99.999% 2as reacting gas, flow is 80sccm.Sputtering pressure is regulated to be 4.5 × 10 -1pa.Open Mo target and Al target power supply, Mo target power output is 20KW, Al target power output is 15KW, is 380 ~ 400V by cathode voltage monitoring system control Al target sputtering voltage, utilizes intermediate frequency-DC sputturing method deposition 15min, Mo of preparation 90nm 0.6al 0.4n film;
Step 5: prepare the second absorbed layer; Select purity be 99.99% Mo target and purity be 99.99% Al target, pass into purity be the Ar of 99.999% as sputter gas, flow is 180sccm, passes into the N that purity is 99.999% 2as reacting gas, flow is 60sccm.Sputtering pressure is regulated to be 4.5 × 10 -1pa.Open Mo target and Al target power supply, Mo target power output is 10KW, Al target power output is 20KW, is 360 ~ 390V by cathode voltage monitoring system control Al target sputtering voltage, utilizes intermediate frequency-DC sputturing method deposition 13min, Mo of preparation 40nm 0.2al 0.8n film;
Step 6: prepare antireflection layer; Select purity be 99.99% Al target, pass into purity be the Ar of 99.999% as sputter gas, flow is 180sccm, passes into the N that purity is 99.999% 2as reacting gas, flow is 50sccm.Sputtering pressure is regulated to be 4.5 × 10 -1pa.Open Al target, power is 15KW, and controlling sputtering voltage by cathode voltage monitoring system is 380 ~ 400V, utilizes medium frequency magnetron sputtering to deposit 20min, the AlN film of preparation 50nm;
Step 7: prepare overcoat; Select purity be 99.99% Si target, pass into purity be the Ar of 99.999% as sputter gas, flow is 180sccm, passes into the N that purity is 99.999% 2as reacting gas, flow is 70sccm.Sputtering pressure is regulated to be 4.5 × 10 -1pa.Open Si target power supply, power is 12KW, utilizes magnetically controlled DC sputtering mode to deposit 20min, the Si of preparation 20nm 3n 4film;
Prepared coating absorptivity can reach 0.96, emissivity ε≤0.05 (82 DEG C), ε≤0.10 (400 DEG C), ε≤0.13 (500 DEG C).Heatproof temperature reaches 550 DEG C.
Above-described embodiment is only for illustration of the present invention, instead of restriction the present invention.

Claims (8)

1. a coating for selective absorption of sunlight spectrum, is characterized in that, this coating for selective absorption of sunlight spectrum includes from matrix outside, be followed successively by the functional layer of the outer high reflection layer of metallic red, absorbed layer, antireflection layer, wherein, absorbed layer and antireflection layer are single layer structure, or are many sublayer structures.
2. coating for selective absorption of sunlight spectrum according to claim 1, is characterized in that, the outer high reflection layer of metallic red is made up of any one in W, Mo, Al, Cu, Au, Ag, Pt, Ni, Cr, and thickness is 30-500 nanometer.
3. coating for selective absorption of sunlight spectrum according to claim 1, is characterized in that, absorbed layer is by Mo xal 1-xn is formed, wherein, and x=0.1-0.9; The thickness of absorbed layer is 30-300 nanometer.
4. coating for selective absorption of sunlight spectrum according to claim 1, is characterized in that, antireflection layer is nitride or the oxide composition of Al, includes AlN or Al 2o 3; The thickness of antireflection layer is 10-300 nanometer.
5. coating for selective absorption of sunlight spectrum according to claim 1, it is characterized in that, this coating for selective absorption of sunlight spectrum also includes tack coat, and this tack coat is between substrate and the outer high reflection layer of metallic red, and tack coat is by W, Mo, Ti, Zr, AlN, TiN, ZrN and Al 2o 3in any one composition, the thickness of tack coat is 1-200 nanometer.
6. coating for selective absorption of sunlight spectrum according to claim 1, is characterized in that, this coating for selective absorption of sunlight spectrum also includes diffusion impervious layer, and this diffusion impervious layer is outer between high reflection layer and absorbed layer in metallic red; Diffusion impervious layer is by AlN, TiN, TiAlN, Al 2o 3, TiO 2in any one composition, the thickness of diffusion impervious layer is 1-100 nanometer.
7. coating for selective absorption of sunlight spectrum according to claim 1, it is characterized in that, this coating for selective absorption of sunlight spectrum also includes overcoat, and this overcoat is positioned at outside antireflection layer, overcoat is the nitride of Si, oxide or nitrogen oxide composition, includes Si 3n 4, SiO 2or SiON, the thickness of overcoat is 0-150 nanometer.
8. coating for selective absorption of sunlight spectrum according to claim 1, is characterized in that, the absorbed layer of this coating for selective absorption of sunlight spectrum is two-layer, and namely first absorbs subgrade, the second absorption subgrade; First absorbs subgrade, second absorbs subgrade by Mo xal 1-xn is formed, wherein, x=0.1-0.9, just the first x value absorbed in subgrade, the second absorption subgrade is different; First absorbs subgrade, the second absorption subgrade gross thickness is 30-300 nanometer.
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CN104691028A (en) * 2015-03-20 2015-06-10 武汉理工大学 High-reflectivity thermal insulating layer material and preparation method thereof
CN105568238A (en) * 2015-12-30 2016-05-11 中国建材国际工程集团有限公司 Preparation method for film system provided with solar selective absorption thin film
CN105734565A (en) * 2016-03-01 2016-07-06 江苏贝德莱特太阳能科技有限公司 High-temperature radiation selective coating
CN105783297A (en) * 2016-03-01 2016-07-20 江苏贝德莱特太阳能科技有限公司 Absorptive and continuously adjustable solar spectrum selective absorption coating
CN107270564A (en) * 2016-04-07 2017-10-20 北京有色金属研究总院 A kind of sunlight heat absorber coatings
CN108645062A (en) * 2018-04-18 2018-10-12 华中科技大学 A kind of solar energy heating film

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CN104691028A (en) * 2015-03-20 2015-06-10 武汉理工大学 High-reflectivity thermal insulating layer material and preparation method thereof
CN105568238A (en) * 2015-12-30 2016-05-11 中国建材国际工程集团有限公司 Preparation method for film system provided with solar selective absorption thin film
CN105568238B (en) * 2015-12-30 2020-11-13 中国建材国际工程集团有限公司 Preparation method of film system with solar selective absorption film
CN105734565A (en) * 2016-03-01 2016-07-06 江苏贝德莱特太阳能科技有限公司 High-temperature radiation selective coating
CN105783297A (en) * 2016-03-01 2016-07-20 江苏贝德莱特太阳能科技有限公司 Absorptive and continuously adjustable solar spectrum selective absorption coating
CN107270564A (en) * 2016-04-07 2017-10-20 北京有色金属研究总院 A kind of sunlight heat absorber coatings
CN107270564B (en) * 2016-04-07 2019-11-15 有研工程技术研究院有限公司 A kind of sunlight heat absorber coatings
CN108645062A (en) * 2018-04-18 2018-10-12 华中科技大学 A kind of solar energy heating film
CN108645062B (en) * 2018-04-18 2019-11-05 华中科技大学 A kind of solar energy heating film

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Application publication date: 20150114