CN105605814A - Solar spectrum selective absorption coating and preparation method thereof - Google Patents
Solar spectrum selective absorption coating and preparation method thereof Download PDFInfo
- Publication number
- CN105605814A CN105605814A CN201410686903.XA CN201410686903A CN105605814A CN 105605814 A CN105605814 A CN 105605814A CN 201410686903 A CN201410686903 A CN 201410686903A CN 105605814 A CN105605814 A CN 105605814A
- Authority
- CN
- China
- Prior art keywords
- layer
- target
- coating
- selective absorption
- preparation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/40—Solar thermal energy, e.g. solar towers
Landscapes
- Physical Vapour Deposition (AREA)
- Laminated Bodies (AREA)
- Surface Treatment Of Optical Elements (AREA)
Abstract
The invention discloses a solar spectrum selective absorption coating and a preparation method thereof. The absorption coating comprises a metal infrared high-reflection layer, an absorption layer, an antireflection layer and a protection layer which are successively arranged outwards from a substrate, wherein the absorption layer is formed by transition metal nitrogen oxide MoxAl1-xOyN1-y or WxAl1-xOyN1-y; x is 0.1-0.9; y is 0.1-0.9. The preparation method of the solar spectrum selective absorption coating comprises the following steps: (1) preparing the metal infrared high-reflection layer on the surface of the substrate via a direct-current magnetron sputtering method; (2) carrying out co-sputtering of an Mo or W and Al pure metal target or an MoAl or WAl target with fixed components in the atmosphere of argon, nitrogen and oxygen to form the adsorption layer; (3) selecting an Al target and preparing the antireflection layer via a direct-current or medium-frequency magnetron sputtering method; and (4) selecting an Si target and preparing the protection layer via the direct-current or medium-frequency magnetron sputtering method. The absorption coating has the characteristics of excellent optical performance, strong high temperature resistance and excellent weather resistance; the preparation method of the absorption coating is easy to implement and simple to regulate, and is suitable for the application status of flat plate collectors in China.
Description
Technical field
The present invention relates to a kind of coating for selective absorption of sunlight spectrum (heat absorbing coating) and preparation method thereof, canBe applied in flat plate collector, also can be used for solar industry heating, solar airconditioning and solar energy sea water lightIn change system, belong to solar energy heat utilization technical field.
Background technology
Coating for selective absorption of sunlight spectrum (heat absorbing coating) is a kind of special surface, is characterized in tooSunlight spectral limit (0.3-2.5 μ m) has a higher absorptivity α, region of ultra-red (2.5-25 μ m) have very lowEmissivity ε, it converts the solar energy of low energy densities to the heat energy of high-energy-density, solar energy richnessCollection gets up, and improves solar energy thermal conversion efficiency, is the core material of plate solar collector. To absorbingThe main object of coating research is to improve solar energy optical-thermal transformation efficiency, is improving heat collector to the sunWhen the absorptivity α of radiation, under its operating temperature, heat collector surface has compared with low-launch-rate ε. Simultaneously dull and stereotypedThe working environment of heat collector has determined that absorber coatings also should possess that optical property long-term stability, weatherability are strong, shapeBecome the features such as the simple and environmentally safe of coating process.
Nonselective common pitch-dark, optionally sulfuration has been experienced in the application of flat plate collector coating materialThe stages such as lead, metal oxide coating, black nickel, black chromium, aluminium anodes coating, vacuum coating coating, thisA little coatings respectively have pluses and minuses.
Paint coatings adopts japanning method manufacture craft, and it is using the powder with light selecting performance absorption as pigment(Si, Ge, PbS and some compound transition metal oxides) and binding agent (thiazolinyl material and organosilicon etc.)Be mixed and made into coating, then by methods such as spraying, dipping, brushings, coating be coated on thermal-arrest substrate, be coated withLayer is generally all more than several microns. The absorptivity of coating between 0.87-0.92, emissivity 0.3-0.6 itBetween, use the heat collector thermal efficiency of the type coating lower. In addition, because binding agent at high temperature may warmSeparate, its tack is poor, easily peels off, and reduces heat absorption capacity, causes the heat collector that adopts paint coatingsService life shorter.
Anodized coating is that metal substrate is carried out to anodized, and preparation has the porous that gradient distributesSurface, then obtains high solar absorptance by mix metal in hole, low infrared with substrateEmission characteristics is combined together and can obtains selective assimilation effect. Alumilite process coating is the most ripe sunUtmost point oxidation technology. The basic process of preparation is in dilute phosphoric acid solution middle-jiao yang, function of the spleen and stomach by aluminium flake (or copper-aluminum composite board core)Utmost point oxidation, forms porous oxide film, then alternating current in nickelous sulfate or stannous sulfate solution on aluminium surfaceSeparate, nickel tin ion reduce deposition, in the hole of oxidation, forms and has spectrum selectivity surface, its absorptivityGenerally between 0.89-0.91, and emissivity is generally between 0.13-0.15.
Black chrome coating is to adopt electro-plating method on solar heat-collection plate, to prepare black chromium selective electroplating layer, commonThe absorptivity of black chrome coating class collecting plate is at 0.93-0.97, and emissivity is between 0.07-0.14. Adopt plating blackChromium process needs first prime coat on plating piece, as plated copper, nickel dam increase adhesive force, and then could black coatingChromium is higher to technological requirement.
Vacuum evaporation, sputter coating and ion plating etc. are one of basic film manufacturing technologies. They are requirement allWill there be certain vacuum in the space of deposit film. Magnetron sputtering compared with vacuum evaporation, its vacuum equipment ratioSimpler, technology controlling and process is more convenient, and the selective absorption that easily obtains uniformity in large area is coated withLayer. Magnetron sputtering technique is easier to because of controlling diaphragm composition, Thickness Ratio, thus be often combined with optical design withPrepare high performance selective absorber coatings. Common film owner to comprise AlN-Al film system (CN8510042),(nitrogen) oxidation nickel chromium triangle+protective layer, titanium oxynitrides+protective layer, titanium aluminium nitrogen (oxygen)+protective layer etc. WhereinAlN-Al adopts traditional glass-vacuum tube film technique, and film is tied to form ripe, absorptivity > 92%, emissivity< 5%, but thermal ageing test and salt spray test result are all undesirable. (nitrogen) oxidation nickel chromium triangle adds protective layer absorptivityBe better than 93%, have protective finish, good weatherability, but emissivity is higher than 10%. Adopt titanium oxynitrides film system to addThe absorber coatings absorptivity of protective layer is higher than 93% left and right, and emissivity is at 4-5%.
Summary of the invention
The object of the invention is the defect for above-mentioned prior art, provide a kind of novel solar spectrum to selectProperty absorber coatings, this absorber coatings has the spies such as excellent optical performance, heat-resisting ability is strong, weatherability is goodPoint.
Another object of the present invention is to provide a kind of preparation side of described coating for selective absorption of sunlight spectrumMethod, the method is easy to realize and regulate and control simply, is applicable to the application present situation of flat plate collector in China.
For achieving the above object, the present invention is by the following technical solutions:
A novel coating for selective absorption of sunlight spectrum, outside from substrate, be followed successively by metallic red outer high anti-Penetrate layer, absorbed layer, antireflection layer and protective layer, wherein absorbed layer is by transition metal nitrogen oxideMoxAl1-xOyN1-yOr WxAl1-xOyN1-yForm, wherein, x=0.1-0.9, y=0.1-0.9.
In the present invention, the material of described substrate is stainless steel, Cu or Al.
In the present invention, the outer high reflection layer of described metallic red be simple metal W, Mo, Al, Cu, Au, Ag,Any one in Pt, Ni, Cr, thickness is 30-500nm.
In the present invention, described absorbed layer is many sublayer structures of composition gradual change, and thickness is 30-300nm.
In the present invention, nitride, oxide or nitrogen oxide that described antireflection layer is Al, comprise AlN,Al2O3And AlON, or the combination of above-mentioned film; Adopt the preparation method of direct current or medium frequency magnetron sputtering,Thickness is 10-300nm.
In the present invention, nitride, oxide or nitrogen oxide that described protective layer is Si, comprise Si3N4、SiO2And SiON, or the combination of above-mentioned film; The preparation method who adopts direct current or medium frequency magnetron sputtering, thickness is10-300nm。
A preparation method for described coating for selective absorption of sunlight spectrum, comprises the following steps:
(1) adopt direct current magnetron sputtering process high reflection layer outside substrate surface is prepared metallic red;
(2) adopt Mo or W and Al simple metal target, or adopt MoAl or the WAl target of frozen composition,Under argon gas, nitrogen and oxygen atmosphere, cosputtering forms absorbed layer;
(3) select Al target, adopt direct current or medium frequency magnetron sputtering legal system for antireflection layer;
(4) select Si target, adopt direct current or medium frequency magnetron sputtering legal system for protective layer.
In described preparation method, for different film materials can by adjust sputtering power, high-purity Ar,High-purity N2With high-purity O2Flow and sedimentation time control each thicknesses of layers and composition.
Principle of the present invention is: by controlling MoxAl1-xOyN1-yOr WxAl1-xOyN1-yThe composition of coating,The Mo of forming component gradual changexAl1-xOyN1-yOr WxAl1-xOyN1-yCoating, obtains top layer to substrate refractive indexThe coating structure increasing gradually, absorbs and Mo at multilayer films interferencexAl1-xOyN1-yOr WxAl1-xOyN1-yBe coated withUnder the Intrinsic Gettering double action of layer, obtain the coating for selective absorption of sunlight spectrum of function admirable. In addition,Form fine and close protective layer on top layer, blocked the chlorion (Cl in salt mist environment-) enter coating insidePassage, delayed the corrosion of coating in salt mist environment, improved the decay resistance of coating, obtainedExcellent optical performance, the heat absorbing coating that decay resistance is strong.
The invention has the advantages that:
Absorber coatings of the present invention has the features such as excellent optical performance, heat-resisting ability is strong, weatherability is good,Its absorptivity α can reach 0.94-0.96, and emissivity ε≤0.05 (82 DEG C), heatproof temperature reaches 300 DEG C, according toGB GB/T6424-1997 carries out salt spray test, and after 96h, coating performance decay is less than 2%, meets solar energyThe instructions for use of flat plate collector.
Absorber coatings of the present invention is easy to realize and regulate and control simply aspect preparation technology, is applicable to flat heat collectingDevice is in the application present situation of China.
Brief description of the drawings
Fig. 1 is the generalized section of coating for selective absorption of sunlight spectrum structure of the present invention.
Detailed description of the invention
Below in conjunction with drawings and Examples, the invention will be further described, but embodiments of the present invention are notBe limited to this.
The invention provides a kind of heat absorbing coating of transition metal nitrogen oxide as absorbent layer structure that have, as Fig. 1Shown in, this coating comprises 4 tunics, outside from substrate, be followed successively by the outer high reflection layer 1 of metallic red, absorbed layer 2,Antireflection layer 3, protective layer 4, wherein absorbed layer 2 has the coating structure of multilayer gradual change.
The outer high reflection layer of metallic red is by any one in W, Mo, Al, Cu, Au, Ag, Pt, Ni, CrPlant composition, be positioned at tack coat top, the thickness of the outer high reflection layer of metallic red is 30-500nm. Absorbed layer byMoxAl1-xOyN1-yOr WxAl1-xOyN1-yForm, wherein, x=0.1-0.9, y=0.1-0.9. This absorbed layer canTo adopt Mo or W and Al simple metal target, under argon gas, nitrogen and oxygen atmosphere, cosputtering forms, and also canThe MoAl or the WAl target that adopt frozen composition, under argon gas, nitrogen and oxygen atmosphere, sputter forms, and absorbsThe thickness of layer is 30-300nm. Antireflection layer is mainly nitride, oxide or the nitrogen oxide of Al, comprisesAlN、Al2O3And AlON, or the combination of above-mentioned film. The target that this antireflection layer adopts is Al target,The preparation method who adopts direct current or medium frequency magnetron sputtering, the thickness of antireflection layer is 10-300nm. Protective layer masterIf the nitride of Si, oxide or nitrogen oxide, comprise Si3N4、SiO2And SiON, or above-mentioned thinThe combination of film. The target that this protective layer adopts is Si target, adopts the preparation side of direct current or medium frequency magnetron sputteringMethod, thickness is 10-300nm.
Embodiment 1
With Mo/MoxAl1-xOyN1-y/ AlON/SiON spectral selective absorbing coating is example, its preparation process asUnder:
Step 1: the outer high reflection layer of preparation metallic red; Adopt metal M o target (purity is 99.99%) direct currentMagnetically controlled sputter method, by vacuum chamber forvacuum to 1.0 × 10-3Pa, passes into purity and is 99.999% Ar and doFor sputter gas, flow is 180sccm, and regulating sputtering pressure is 4.5 × 10-1Pa. Open Mo target, powerFor 20KW, sputter 10min, the Mo film of preparation 100nm.
Step 2: prepare absorbed layer; Selecting purity is the Al that 99.99% Mo target and purity are 99.99%Target, passes into purity and is 99.999% Ar as sputter gas, and fixing Ar flow is 180sccm, passes into pureDegree is 99.999% N2As reacting gas, firm discharge is 100sccm, and passing into purity is 99.999%O2As reacting gas, flow increases gradually, is increased to 30sccm by 0. Regulating sputtering pressure is 4.5×10-1Pa. Open Mo target and Al target power supply, Mo target power output is 23KW, and Al target power output is 15KW,Be 330-400V by cathode voltage monitoring system control Al target sputtering voltage, utilize intermediate frequency-DC sputturing methodMode deposits 15min, the Mo of preparation 80nmxAl1-xOyN1-yFilm.
Step 3: prepare antireflection layer; Selecting purity is 99.99% Al target, and passing into purity is 99.999%Ar as sputter gas, flow is 180sccm, passes into purity and be 99.999% N2As reacting gas,Flow is 50sccm, passes into purity and be 99.999% O2As reacting gas, flow is 20sccm. AdjustJoint sputtering pressure is 5.0 × 10-1Pa. Open Al target, power is 15KW, by cathode voltage monitoring systemControl sputtering voltage is 330-400V, utilizes medium frequency magnetron sputtering deposition 30min, the AlON of preparation 60nmFilm.
Step 4: prepare protective layer; Selecting purity is 99.99% Si target, passes into purity and be 99.999%Ar is as sputter gas, and flow is 180sccm, passes into purity and be 99.999% N2As reacting gas,Flow is 60sccm, passes into purity and be 99.999% O2As reacting gas, flow is 10sccm. AdjustJoint sputtering pressure is 5.0 × 10-1Pa. Open Si target, power is 10KW, utilizes medium frequency magnetron sputtering deposition30min, the SiON film of preparation 30nm.
Prepared coating absorptivity is 0.94, and emissivity is 0.05 (82 DEG C), and heatproof temperature reaches 300DEG C, carrying out salt spray test according to GB GB/T6424-1997, after 96h, coating performance decays to 2%.
Embodiment 2
With W/WxAl1-xOyN1-y/AlN/Al2O3/ SiON spectral selective absorbing coating is example, its preparation processAs follows:
Step 1: the outer high reflection layer of preparation metallic red; Adopt metal W target (purity is 99.99%) DC magneticControl sputtering method, by vacuum chamber forvacuum to 1.0 × 10-3Pa, passes into purity and is 99.999% Ar conductSputter gas, flow is 180sccm, regulating sputtering pressure is 4.5 × 10-1Pa. Open W target, power is20KW, sputter 15min, the W film of preparation 150nm.
Step 2: prepare absorbed layer; Selecting purity is the Al target that 99.99% W target and purity are 99.99%,Pass into purity and be 99.999% Ar as sputter gas, fixing Ar flow is 180sccm, passes into purity and is99.999% N2As reacting gas, firm discharge is 120sccm, passes into purity and be 99.999% O2As reacting gas, flow increases gradually, is increased to 40sccm by 0. Regulating sputtering pressure is 5.0 × 10-1pa。Open W target and Al target power supply, W target power output is 20KW, and Al target power output is 12KW, passes through cathodic electricityPressing monitoring system control Al target sputtering voltage is 330-400V, utilizes intermediate frequency-DC sputturing method mode to deposit20min, the W of preparation 90nmxAl1-xOyN1-yFilm.
Step 3: prepare antireflection layer; Selecting purity is 99.999% Al target, and passing into purity is 99.999%Ar as sputter gas, flow is 180sccm, passes into purity and be 99.999% N2As reacting gas.Regulating sputtering pressure is 5.0 × 10-1Pa. Open Al target, power is 15KW, utilizes medium frequency magnetron sputtering heavyLong-pending 20min, the AlN film of preparation 40nm; Close afterwards N2, pass into purity and be 99.999% O2AsReacting gas, flow is 10sccm, Al target is sputter 15min under 15KW power, the Al of preparation 30nm2O3Film.
Step 4: prepare protective layer; Selecting purity is 99.99% Si target, passes into purity and be 99.999%Ar is as sputter gas, and flow is 180sccm, passes into purity and be 99.999% N2As reacting gas,Flow is 60sccm, passes into purity and be 99.999% O2As reacting gas, flow is 10sccm. AdjustJoint sputtering pressure is 5.0 × 10-1Pa. Open Si target, power is 10KW, utilizes medium frequency magnetron sputtering deposition30min, the SiON film of preparation 30nm.
Prepared coating absorptivity is 0.95, and emissivity is 0.05 (82 DEG C), and heatproof temperature reaches 400DEG C, carrying out salt spray test according to GB GB/T6424-1997, after 96h, coating performance decays to 2%.
Embodiment 3
With Mo/MoxAl1-xOyN1-y/Al2O3/Si3N4Spectral selective absorbing coating is example, its preparation process asUnder:
Step 1: the outer high reflection layer of preparation metallic red; Adopt metal M o target (purity is 99.99%) direct currentMagnetically controlled sputter method, by vacuum chamber forvacuum to 1.0 × 10-3Pa, passes into purity and is 99.999% Ar and doFor sputter gas, flow is 180sccm, and regulating sputtering pressure is 4.5 × 10-1Pa. Open Mo target, powerFor 20KW, sputter 20min, the Mo film of preparation 200nm.
Step 2: prepare absorbed layer; Selecting purity is the Al that 99.99% Mo target and purity are 99.99%Target, passes into purity and is 99.999% Ar as sputter gas, and fixing Ar flow is 180sccm, passes into pureDegree is 99.999% N2As reacting gas, firm discharge is 120sccm, and passing into purity is 99.999%O2As reacting gas, flow increases gradually, is increased to 40sccm by 0. Regulating sputtering pressure is 5.0×10-1Pa. Open Mo target and Al target power supply, Mo target power output is 20KW, and Al target power output is 12KW,Be 330-400V by cathode voltage monitoring system control Al target sputtering voltage, utilize intermediate frequency-DC sputturing methodMode deposits 20min, the Mo of preparation 90nmxAl1-xOyN1-yFilm.
Step 3: prepare antireflection layer; Selecting purity is 99.999% Al target, and passing into purity is 99.999%Ar as sputter gas, flow is 180sccm, passes into purity and be 99.999% O2As reacting gas,Flow is 30sccm. Regulating sputtering pressure is 5.0 × 10-1Pa. Open Al target, power is 15KW, utilizesMedium frequency magnetron sputtering deposition 35min, the Al of preparation 70nm2O3Film.
Step 4: prepare protective layer; Selecting purity is 99.99% Si target, passes into purity and be 99.999%Ar is as sputter gas, and flow is 180sccm, passes into purity and be 99.999% N2As reacting gas,Flow is 60sccm. Regulating sputtering pressure is 5.0 × 10-1Pa. Open Si target, power is 10KW, utilizesMedium frequency magnetron sputtering deposition 30min, the Si of preparation 30nm3N4Film.
Prepared coating absorptivity is 0.95, and emissivity is 0.05 (82 DEG C), and heatproof temperature reaches 400DEG C, carrying out salt spray test according to GB GB/T6424-1997, after 96h, coating performance decays to 2%.
Claims (7)
1. a coating for selective absorption of sunlight spectrum, is characterized in that: outside from substrate, be followed successively by metalInfrared high reflection layer, absorbed layer, antireflection layer and protective layer, wherein absorbed layer is by transition metal nitrogen oxideMoxAl1-xOyN1-yOr WxAl1-xOyN1-yForm, wherein, x=0.1-0.9, y=0.1-0.9.
2. coating for selective absorption of sunlight spectrum according to claim 1, is characterized in that: described baseThe material at the end is stainless steel, Cu or Al.
3. coating for selective absorption of sunlight spectrum according to claim 1 and 2, is characterized in that: instituteStating the outer high reflection layer of metallic red is appointing in simple metal W, Mo, Al, Cu, Au, Ag, Pt, Ni, CrMeaning is a kind of, and thickness is 30-500nm.
4. coating for selective absorption of sunlight spectrum according to claim 1, is characterized in that: described suctionReceiving layer is many sublayer structures of composition gradual change, and thickness is 30-300nm.
5. coating for selective absorption of sunlight spectrum according to claim 1, is characterized in that: described in subtractReflecting layer is the combination of one or more films in nitride, oxide and the nitrogen oxide of Al, and thickness is10-300nm。
6. coating for selective absorption of sunlight spectrum according to claim 1, is characterized in that: described guarantorSheath is the combination of one or more films in nitride, oxide and the nitrogen oxide of Si, and thickness is10-300nm。
7. a preparation method for coating for selective absorption of sunlight spectrum claimed in claim 1, its feature existsIn: comprise the following steps:
(1) adopt direct current magnetron sputtering process high reflection layer outside substrate surface is prepared metallic red;
(2) adopt Mo or W and Al simple metal target, or adopt MoAl or the WAl target of frozen composition,Under argon gas, nitrogen and oxygen atmosphere, cosputtering forms absorbed layer;
(3) select Al target, adopt direct current or medium frequency magnetron sputtering legal system for antireflection layer;
(4) select Si target, adopt direct current or medium frequency magnetron sputtering legal system for protective layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410686903.XA CN105605814B (en) | 2014-11-25 | 2014-11-25 | A kind of coating for selective absorption of sunlight spectrum and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410686903.XA CN105605814B (en) | 2014-11-25 | 2014-11-25 | A kind of coating for selective absorption of sunlight spectrum and preparation method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105605814A true CN105605814A (en) | 2016-05-25 |
| CN105605814B CN105605814B (en) | 2019-02-05 |
Family
ID=55985959
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410686903.XA Active CN105605814B (en) | 2014-11-25 | 2014-11-25 | A kind of coating for selective absorption of sunlight spectrum and preparation method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN105605814B (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108679866A (en) * | 2018-04-28 | 2018-10-19 | 陕西科技大学 | Corrosion-resistant spectral selective absorbing coating and preparation method thereof |
| CN109900626A (en) * | 2017-12-08 | 2019-06-18 | 北京有色金属研究总院 | A kind of salt spray resistance evaluation method of heat collector solar absorbing film |
| CN112853292A (en) * | 2021-01-06 | 2021-05-28 | 湖北工业大学 | Preparation method of solar selective absorption coating and coating |
| CN113571614A (en) * | 2021-05-31 | 2021-10-29 | 华灿光电（浙江）有限公司 | Epitaxial wafer of deep ultraviolet light-emitting diode and preparation method thereof |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1159553A (en) * | 1995-06-19 | 1997-09-17 | 澳大利亚悉尼大学 | Solar energy selective absorption surface coating |
| CN101169485A (en) * | 2006-10-24 | 2008-04-30 | 北京航空航天大学 | Solar energy selective absorption coating |
| CN102353164A (en) * | 2011-08-25 | 2012-02-15 | 山东力诺新材料有限公司 | High-temperature solar selective absorption coating and preparation method thereof |
| US20120064335A1 (en) * | 2008-08-14 | 2012-03-15 | Lg Hausys, Ltd. | Low emissivity glass and method for manufacturing the same |
| CN102501459A (en) * | 2011-10-26 | 2012-06-20 | 东莞市康达机电工程有限公司 | Medium-and-high-temperature solar selective absorption coating and preparation method thereof |
| CN202573165U (en) * | 2012-03-23 | 2012-12-05 | 北京桑达太阳能技术有限公司 | NiCr series flat solar selective spectrum absorption coating |
| CN103029371A (en) * | 2012-12-31 | 2013-04-10 | 郭射宇 | Solar selective absorption membrane and preparation method thereof |
| CN104005003A (en) * | 2014-05-28 | 2014-08-27 | 北京天瑞星光热技术有限公司 | High temperature and salt spray resistance solar energy selective absorbing coating in atmosphere and preparation method of coating |
-
2014
- 2014-11-25 CN CN201410686903.XA patent/CN105605814B/en active Active
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1159553A (en) * | 1995-06-19 | 1997-09-17 | 澳大利亚悉尼大学 | Solar energy selective absorption surface coating |
| CN101169485A (en) * | 2006-10-24 | 2008-04-30 | 北京航空航天大学 | Solar energy selective absorption coating |
| US20120064335A1 (en) * | 2008-08-14 | 2012-03-15 | Lg Hausys, Ltd. | Low emissivity glass and method for manufacturing the same |
| CN102353164A (en) * | 2011-08-25 | 2012-02-15 | 山东力诺新材料有限公司 | High-temperature solar selective absorption coating and preparation method thereof |
| CN102501459A (en) * | 2011-10-26 | 2012-06-20 | 东莞市康达机电工程有限公司 | Medium-and-high-temperature solar selective absorption coating and preparation method thereof |
| CN202573165U (en) * | 2012-03-23 | 2012-12-05 | 北京桑达太阳能技术有限公司 | NiCr series flat solar selective spectrum absorption coating |
| CN103029371A (en) * | 2012-12-31 | 2013-04-10 | 郭射宇 | Solar selective absorption membrane and preparation method thereof |
| CN104005003A (en) * | 2014-05-28 | 2014-08-27 | 北京天瑞星光热技术有限公司 | High temperature and salt spray resistance solar energy selective absorbing coating in atmosphere and preparation method of coating |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109900626A (en) * | 2017-12-08 | 2019-06-18 | 北京有色金属研究总院 | A kind of salt spray resistance evaluation method of heat collector solar absorbing film |
| CN109900626B (en) * | 2017-12-08 | 2021-06-01 | 有研工程技术研究院有限公司 | Salt spray resistance performance evaluation method of solar energy absorption film for heat collector |
| CN108679866A (en) * | 2018-04-28 | 2018-10-19 | 陕西科技大学 | Corrosion-resistant spectral selective absorbing coating and preparation method thereof |
| CN112853292A (en) * | 2021-01-06 | 2021-05-28 | 湖北工业大学 | Preparation method of solar selective absorption coating and coating |
| CN113571614A (en) * | 2021-05-31 | 2021-10-29 | 华灿光电（浙江）有限公司 | Epitaxial wafer of deep ultraviolet light-emitting diode and preparation method thereof |
| CN113571614B (en) * | 2021-05-31 | 2022-08-12 | 华灿光电（浙江）有限公司 | Epitaxial wafer of deep ultraviolet light-emitting diode and preparation method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| CN105605814B (en) | 2019-02-05 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN102121757B (en) | Non-vacuum solar spectrum selective absorption coating and preparation method thereof | |
| CN102122006B (en) | Solar spectrum selective absorbing coating and preparation method thereof | |
| CN104005003B (en) | High temperature and salt spray resistance solar energy selective absorbing coating in atmosphere and preparation method of coating | |
| US8424513B2 (en) | Method for the production of an absorber plate for solar collectors | |
| CN101922816B (en) | Solar selective absorbing coating and preparation method thereof | |
| CN103029371A (en) | Solar selective absorption membrane and preparation method thereof | |
| CN101666557B (en) | Non-vacuum solar spectrum selective absorption film and preparation method thereof | |
| CN102620456B (en) | Medium-and-low-temperature solar selective absorption thin film and preparation method thereof | |
| CN103162452B (en) | Inoxidizability solar spectrum selective absorbing coating and preparation method thereof | |
| CN101660117B (en) | Solar selective absorbing coating and preparation method thereof | |
| CN105605814A (en) | Solar spectrum selective absorption coating and preparation method thereof | |
| CN106884145B (en) | A kind of coating for selective absorption of sunlight spectrum and preparation method thereof | |
| CN102501459B (en) | Preparation method of medium-and-high-temperature solar selective absorption coating | |
| Hao et al. | Thermal stability of nitride solar selective absorbing coatings used in high temperature parabolic trough current | |
| CN102734956A (en) | Solar medium and high-temperature selective heat absorption coating | |
| CN106500374B (en) | A kind of biphase composite solar absorber coatings and manufacturing method | |
| CN103302917A (en) | Dual-absorption-layer TiON weather-resistant photothermal coating and preparation method thereof | |
| CN104279779A (en) | Metal nitride solar spectrum selective absorption coating | |
| CN103255377B (en) | A kind of nano combined Cr-Al-O solar spectrum Selective absorber coating and preparation method thereof | |
| CN102615879B (en) | NiCr system flat plate solar energy spectrally selective absorbing coating and preparation method thereof | |
| Hao et al. | Preparation and thermal stability on non-vacuum high temperature solar selective absorbing coatings | |
| CN103727693A (en) | Metal-medium multilayered structure color-adjustable sun photo-thermal absorbing coating | |
| CN108468033B (en) | High-temperature-resistant solar selective absorption coating and preparation method thereof | |
| CN104279780B (en) | A kind of transition metal nitride heat absorbing coating | |
| CN202573165U (en) | NiCr series flat solar selective spectrum absorption coating |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20190624 Address after: 101407 No. 11 Xingke East Street, Yanqi Economic Development Zone, Huairou District, Beijing Patentee after: Research Institute of engineering and Technology Co., Ltd. Address before: No. 2, Xinjie street, Xicheng District, Beijing, Beijing Patentee before: General Research Institute for Nonferrous Metals |
|
| TR01 | Transfer of patent right |