CN103029374A - Medium-high temperature solar photothermal selective absorbing coating - Google Patents
Medium-high temperature solar photothermal selective absorbing coating Download PDFInfo
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- CN103029374A CN103029374A CN2011102998644A CN201110299864A CN103029374A CN 103029374 A CN103029374 A CN 103029374A CN 2011102998644 A CN2011102998644 A CN 2011102998644A CN 201110299864 A CN201110299864 A CN 201110299864A CN 103029374 A CN103029374 A CN 103029374A
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Abstract
The invention provides a novel medium-high temperature solar photothermal selective absorbing coating, which consists of five layers sequentially arranged from the substrate surface to the top of a heat absorbing body, wherein the first layer is a diffusion blocking layer, the second layer is an infrared reflecting layer, the third layer is a metal Ti and metal ceramic composite film, the fourth layer is a metal Ti and metal ceramic composite film, and the fifth layer is a single-layer antireflection film. Under the condition of the atmospheric quality factor being AM1.5, the absorptivity of the coating is 95.5 percent, the hemispherical emissivity is 9.8 percent, and the coating has good heat stability and can be used in vacuum environment within 450 DEG C for a long time. The coating has important practical value and wide application prospect in the field of solar heat utilization.
Description
Technical field
The present invention relates to a kind of new type solar energy photo-thermal coating for selective absorption, is one of key technology in the solar energy heat utilizations such as current solar groove type photo-thermal power generation, solar airconditioning, desalinization.Belong to solar energy heat utilization technical field.
Background technology
The solar energy heat utilization is one of important application mode of solar energy scientific utilization, the middle high temperature solar thermal utilization of current especially solar energy more and more is subject to people's attention, and it utilizes mode to comprise solar light-heat power-generation, solar seawater desalination, solar energy heating and drying, solar airconditioning etc.And the groove type solar photo-thermal power generation is the Typical Representative of high temperature solar thermal utilization in the solar energy, has important commercial applications prospect.And middle high temperature solar photo-thermal coating for selective absorption is groove type solar photo-thermal power generation core component---the key technology of solar energy heat collection pipe.
The solar energy optical-thermal coating for selective absorption has the high absorption at 0.3-2.5 μ m, in the high reflection characteristic of 2.5-25 μ m, is directly sunshine to be transformed into heat energy, prevents again the functional film of radiation loss simultaneously.For improving solar thermal utilization efficient, solar energy utilization just therefrom low temperature (80-300 ℃) develops to middle high temperature (300-600 ℃).2525
The present middle high temperature solar photo-thermal coating for selective absorption of research and development, its absorbed layer is the metallic cermet films of infusibility metallic cluster disperse in ceramic dielectric layer.The refractory metal material of selecting is mainly by W, Mo, Au, Cu, SS, Pt etc.Oxidation, diffusion etc. at high temperature easily occur in refractory metal particle cluster, thereby cause at high temperature be on active service for a long time its optical property of coating for selective absorption to descend, even lose efficacy.For this reason, we have proposed a kind of novel refractory metal titanium and have replaced metal material of the prior art.
The present middle high temperature solar photo-thermal coating for selective absorption of research and development, its reflecting layer adopts W, Mo, Au etc. as infrared reflecting layer, long service at high temperature, metal level easily and between the base material spreads, reduce film performance, for this reason, we propose to increase one deck diffusion impervious layer between infrared reflecting layer and substrate.
Summary of the invention
The object of the present invention is to provide a kind of middle high temperature applied solar energy photo-thermal coating for selective absorption, it is applicable to 450 ℃ with interior various solar energy optical-thermal converting systems, such as solar light-heat power-generation, solar airconditioning, solar energy drying and heating and desalinization etc.This figure layer has the high and low emissivity of high absorptivity and good heat endurance, and preparation technology is easy, is suitable for big batch production.
Middle high temperature solar photo-thermal coating for selective absorption involved in the present invention is comprised of five tunics to the top successively the heat absorption substrate surface, and composition and the proportioning of every tunic are as follows:
Base material is copper or stainless steel material.
Ground floor is diffusion impervious layer, by the thick Al of 20-200nm
2O
3Or the TiN film forms.
The second layer is infrared reflecting layer, and metallic copper or the gold thin film thick by 70-300nm consist of.
The 3rd layer is high tenor absorbed layer, and its composition is comprised of Titanium particle and insulating medium layer, and this insulating medium layer adopts Al
2O
3Or SiO
2Or AlN.The thickness of this layer is 30nm-80nm, and the volume content of Titanium is 30%-60%.
The 4th layer is the low-metal content absorbed layer, and its composition still is comprised of Titanium particle and insulating medium layer, and this insulating medium layer still adopts Al
2O
3Or SiO
2Or AlN.The thickness of this layer is 20nm-80nm, and the volume content of Titanium is 15%-30%.
Layer 5 is the thick antireflection layer of 30-90nm, and this antireflection layer adopts Al
2O
3Or SiO
2Or AlN.
Middle high temperature solar photo-thermal coating for selective absorption involved in the present invention adopts the magnetically controlled sputter method preparation.
The present invention can be used for high temperature solar heat collecting element in the preparation; The present invention has increased Al
2O
3Or the TiN film is as diffusion impervious layer; Absorbed layer adopts Titanium nano particle and other transparent medium (such as Al
2O
3Or SiO
2Or AlN) mixes the metal-ceramic composite film that forms.
Advantage of the present invention:
The present invention relates to a kind of new type solar energy coating for selective absorption, its advantage is: the present invention increases Al between metallic red outer reflective layer and substrate
2O
3Or the anti-diffusion impervious layer of TiN, guaranteed the long-time stability of infrared reflecting layer under hot operation; Absorbed layer among the present invention has adopted the Titanium nano particle, and this is difficult for oxidation Titanium under 600 ℃, even oxidation reaction at high temperature occurs, and can be at the Surface Creation Ti of Titanium
xO
yOr Ti
xAl
yThe ON film, it has stoped the further oxidation of titanium, and itself has the solar selectively absorption characteristic, can not exert an influence to whole coating performance.Solar selectively absorbing coating involved in the present invention is applicable to 450 ℃ with interior middle high-temperature solar thermal-collecting tube.
Under air quality factors A M1.5 condition, coating absorptivity of the present invention is 95.5%, and hemispherical emissivity is 9.8%, and this coating has good heat endurance, can use under the vacuum environment in 450 ℃ for a long time.The present invention has important practical value and wide application prospect at solar energy heat utilization field.
Description of drawings
Fig. 1 is coating profile layer structural representation of the present invention.
The specific embodiment
Following examples are implementation method of the present invention, only are used for explanation the present invention, but not are used for restriction the present invention.
Embodiment:
In conjunction with coating profile layer shown in Figure 1, the preparation technology of coating flow process is: (1) uses magnetic control sputtering system, selects 99.7% Ti target, 99.99% Al
2O
3Target and 99.99% Cu target.Matrix uses the 316L stainless steel.Before the deposition beginning, the vacuum chamber base vacuum is evacuated to 4 * 10
-4Pa.(2) be filled with working gas Ar, adjust flux so that vacustat in sputtering pressure 0.1Pa.Open Al
2O
3The radio-frequency sputtering power supply of target, regulating power are to 500W, and voltage is 2000V, to Al
2O
3Carry out reactive sputtering, prepared the thick Al of 20nm
2O
3Diffusion impervious layer.(3) regulate the Ar flow to sputtering pressure 0.1Pa, open the dc sputtering power of Cu target, regulation voltage is to 400V, and electric current 0.1A prepares the thick infrared high reflection layer of Cu of 90nm.(4) be filled with working gas Ar, adjust flux so that vacustat in sputtering pressure 0.1Pa.Open Al
2O
3The radio-frequency sputtering power supply of target, regulating power are to 500W, and voltage is 2000V, to Al
2O
3Carry out reactive sputtering; Open the dc sputtering power of Ti target, regulation voltage is to 400V, and electric current 0.1A carries out d.c. sputtering to Ti.Utilize the revolution of matrix, successively by two target tops, thereby be deposited as Ti/Al
2O
3Sublayer structure alternately.Wherein, the 3rd layer namely high titanium doped layer, and gross thickness is 8.4nm, the volume content of titanium is 43.0% (particle diameter of titanium determines by the thickness of subgrade, and the thickness of subgrade can be at 1-10nm, and the thickness of its particle diameter and subgrade is suitable), the thickness of Ti is 1.8nm in each cycle, Al
2O
3Thickness be 2.4nm, totally two cycles; The 4th layer namely low titanium doped layer, and gross thickness is 60.2nm, and the volume content of titanium is 27%, codeposition Ti/Al
2O
3In 9 cycles, the thickness of Ti is 1.8nm (particle diameter of titanium determines by the thickness of subgrade, and the thickness of subgrade can be at 1-10nm, and the thickness of its particle diameter and subgrade is suitable) in each cycle, Al
2O
3Thickness be 4.87nm.(5) be filled with working gas Ar, adjust flux so that vacustat in sputtering pressure 0.1Pa.Open Al
2O
3The radio-frequency sputtering power supply of target, regulating power are to 500W, and voltage is 2000V, to Al
2O
3Carry out reactive sputtering, prepared the thick Al of 46.9nm
2O
3Antireflection layer.
After preparation is finished, use Lamada 950 ultraviolets/visible/near infrared spectrophotometer and TJ 270-300 infrared spectrophotometer respectively to coating reflectivity of (0.3-3um) and infra-red radiation wave band (2.5-25um) in the solar spectrum scope is tested, passing through the absorptivity that calculates the present embodiment coating is 95.5%; Hemispherical emissivity is 9.8%.
Under atmospheric condition, after processing through 450 ℃ of constant temperature of 48 hours, coating is without coming off and crack performance, and the absorptivity of rete and emissivity do not change.
Can see from the present embodiment, solar energy coating involved in the present invention has high absorptance and low-launch-rate, high high-temp stability is good, production technology is simple, is easy to organize large-scale production; For example: after being attached in the substrate, it can be used for the surface selectivity absorber coatings of middle high-temperature solar thermal-collecting tube.
Claims (4)
1. high temperature solar photo-thermal coating for selective absorption in a kind is coated in the substrate, upwards is followed successively by diffusion impervious layer, infrared reflecting layer, high tenor absorbed layer, low-metal content absorbed layer, medium antireflection layer from substrate surface; It is characterized in that:
Diffusion impervious layer is Al
2O
3Or TiN thin layer;
Infrared reflecting layer is metallic copper or gold thin film layer;
High tenor absorbed layer is comprised of Titanium particle and dielectric, and described high tenor refers to that the volume content of Titanium in absorbed layer is 35%-60%; Insulating medium layer rice Al
2O
3Or SiO
2Or AlN;
The low-metal content absorbed layer is comprised of Titanium particle and dielectric, and described low-metal content refers to that the volume content of Titanium in absorbed layer is 10%-25%; Insulating medium layer rice Al
2O
3Or SiO
2Or AlN;
The medium antireflection layer is Al
2O
3Or SiO
2Or AlN thin layer.
2. middle high temperature solar photo-thermal coating for selective absorption as claimed in claim 1 is characterized in that:
Base material is copper or stainless steel material.
3. middle high temperature solar photo-thermal coating for selective absorption as claimed in claim 1 is characterized in that:
Ground floor is diffusion impervious layer, by the thick Al of 20-200nm
2O
3Or the TiN film forms;
The second layer is infrared reflecting layer, and metallic copper or the gold thin film thick by 70-300nm consist of;
The 3rd layer is high tenor absorbed layer, and its composition is comprised of Titanium particle and insulating medium layer, and this dielectric adopts Al
2O
3Or SiO
2Or AlN; The thickness of this layer is 30nm-80nm, and the volume content of Titanium is 35%-60%;
The 4th layer is the low-metal content absorbed layer, and its composition still is comprised of Titanium particle and insulating medium layer, and this dielectric still adopts Al
2O
3Or SiO
2Or AlN; The thickness of this layer is 20nm-80nm, and the volume content of Titanium is 10%-25%;
Layer 5 medium antireflection layer is the thick antireflection layer of 30-90nm, and this antireflection layer adopts Al
2O
3Or SiO
2Or AlN.
4. such as claim 1,2,3 or 4 described middle high temperature solar photo-thermal coating for selective absorption, it is characterized in that:
Described high tenor absorbed layer and low-metal content absorbed layer are to adopt the preparation of magnetron sputtering deposition method, and it adopts cosputtering or the preparation of many subgrades of alternating deposit method by Titanium and dielectric, and each subgrade thickness is in 1-10nm; Described dielectric is Al
2O
3Or AlN or SiO
2Material.
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Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103398483A (en) * | 2013-07-19 | 2013-11-20 | 中国科学院广州能源研究所 | Solar intermediate-temperate high-temperature selective absorbing coating with absorbing layers composed of boron-containing compounds and preparation method of solar intermediate-temperate high-temperature selective absorbing coating |
CN103434208A (en) * | 2013-09-01 | 2013-12-11 | 慈溪市科创电子科技有限公司 | Multi-layer composite heat-insulating film and preparation method thereof |
CN105015108A (en) * | 2015-07-22 | 2015-11-04 | 赛柏利安工业技术(苏州)有限公司 | Multi-function layer nitride low radiation energy saving glass |
CN105546858A (en) * | 2015-12-10 | 2016-05-04 | 淄博环能海臣环保技术服务有限公司 | Single aluminum target magnetron sputtering solar selective absorbing coating |
CN105605803A (en) * | 2015-04-07 | 2016-05-25 | 赵炜 | Tube-plate structure solar heat collector system provided with heat absorbing film |
CN106091446A (en) * | 2016-06-15 | 2016-11-09 | 中国科学院兰州化学物理研究所 | A kind of titanium nitride base solar coating for selective absorption and preparation method thereof |
CN108613423A (en) * | 2016-12-02 | 2018-10-02 | 北京有色金属研究总院 | A kind of high temperature selective solar spectrum absorbing membrane and preparation method thereof |
CN110029347A (en) * | 2019-04-04 | 2019-07-19 | 南京邮电大学 | A kind of high thermal stability solar energy optical-thermal switching film and preparation method thereof |
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US4122239A (en) * | 1976-01-19 | 1978-10-24 | Centre National D'etudes Spatiales | Solar absorbers with layers of nickel/chromium alloy and dielectric material |
CN1613807A (en) * | 2004-12-10 | 2005-05-11 | 邹定国 | Metal ceramic film of embedding titanium or titanium alloy |
JP2007509315A (en) * | 2003-10-09 | 2007-04-12 | オカス コーポレーション | Two-layer bolometer-type infrared sensor and method for manufacturing the same |
CN101818328A (en) * | 2010-04-22 | 2010-09-01 | 常州博士新能源科技有限公司 | Preparation method of multilayer compound solar energy selective absorption plating layer |
CN102122006A (en) * | 2010-08-05 | 2011-07-13 | 北京有色金属研究总院 | Solar spectrum selective absorbing coating and preparation method thereof |
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2011
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US4122239A (en) * | 1976-01-19 | 1978-10-24 | Centre National D'etudes Spatiales | Solar absorbers with layers of nickel/chromium alloy and dielectric material |
JP2007509315A (en) * | 2003-10-09 | 2007-04-12 | オカス コーポレーション | Two-layer bolometer-type infrared sensor and method for manufacturing the same |
CN1613807A (en) * | 2004-12-10 | 2005-05-11 | 邹定国 | Metal ceramic film of embedding titanium or titanium alloy |
CN101818328A (en) * | 2010-04-22 | 2010-09-01 | 常州博士新能源科技有限公司 | Preparation method of multilayer compound solar energy selective absorption plating layer |
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Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103398483A (en) * | 2013-07-19 | 2013-11-20 | 中国科学院广州能源研究所 | Solar intermediate-temperate high-temperature selective absorbing coating with absorbing layers composed of boron-containing compounds and preparation method of solar intermediate-temperate high-temperature selective absorbing coating |
CN103398483B (en) * | 2013-07-19 | 2015-07-01 | 中国科学院广州能源研究所 | Solar intermediate-temperate high-temperature selective absorbing coating with absorbing layers composed of boron-containing compounds and preparation method of solar intermediate-temperate high-temperature selective absorbing coating |
CN103434208A (en) * | 2013-09-01 | 2013-12-11 | 慈溪市科创电子科技有限公司 | Multi-layer composite heat-insulating film and preparation method thereof |
CN103434208B (en) * | 2013-09-01 | 2015-06-03 | 陈卓杰 | Multi-layer composite heat-insulating film and preparation method thereof |
CN105605803A (en) * | 2015-04-07 | 2016-05-25 | 赵炜 | Tube-plate structure solar heat collector system provided with heat absorbing film |
CN105015108A (en) * | 2015-07-22 | 2015-11-04 | 赛柏利安工业技术(苏州)有限公司 | Multi-function layer nitride low radiation energy saving glass |
CN105546858A (en) * | 2015-12-10 | 2016-05-04 | 淄博环能海臣环保技术服务有限公司 | Single aluminum target magnetron sputtering solar selective absorbing coating |
CN106091446A (en) * | 2016-06-15 | 2016-11-09 | 中国科学院兰州化学物理研究所 | A kind of titanium nitride base solar coating for selective absorption and preparation method thereof |
CN108613423A (en) * | 2016-12-02 | 2018-10-02 | 北京有色金属研究总院 | A kind of high temperature selective solar spectrum absorbing membrane and preparation method thereof |
CN110029347A (en) * | 2019-04-04 | 2019-07-19 | 南京邮电大学 | A kind of high thermal stability solar energy optical-thermal switching film and preparation method thereof |
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Application publication date: 20130410 |