CN202782003U - Solar selective absorption coating - Google Patents
Solar selective absorption coating Download PDFInfo
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- CN202782003U CN202782003U CN 201220396216 CN201220396216U CN202782003U CN 202782003 U CN202782003 U CN 202782003U CN 201220396216 CN201220396216 CN 201220396216 CN 201220396216 U CN201220396216 U CN 201220396216U CN 202782003 U CN202782003 U CN 202782003U
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/40—Solar thermal energy, e.g. solar towers
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Abstract
The utility model discloses a solar selective absorption coating which comprises a substrate, wherein an infrared high-reflection layer, a first nonproliferation layer, a first absorption layer, a second absorption layer and an anti-reflection layer are plated on the substrate layer by layer; and the first absorption layer is a high metal volume fraction absorption layer, and the second absorption layer is a low metal volume fraction absorption layer. The coating disclosed by the invention has the advantages of high solar absorptivity, low emissivity, stable film system structure and excellent thermal stability.
Description
Technical field
The utility model relate to a kind of with the magnetron sputtering film preparation, non-proliferation, constitutionally stable solar selective absorbing coating, belong to solar energy optical-thermal conversion using field.
Background technology
At present at home in the solar energy heat utilization industry, collecting system take complete glass vacuum sun thermal-collecting tube as photothermal converter spare is most widely used, and the coating for selective absorption that adheres on the vacuum heat collection pipe absorber (inner tube) is used for absorbing the solar radiant energy of incident and converting it into heat energy.
The coating for selective absorption that domestic solar energy enterprise produces vacuum heat collection pipe mainly is to utilize the prepared ALN-AL of magnetron sputtering technique and SS-ALN/Cu coating, along with progress and the means of production of technology are constantly perfect, the shared market share of vacuum heat collection pipe that the SS-ALN/Cu coating is made is increasing, the SS-ALN/Cu coating is that three kinds of targets (aluminium target, stainless steel target, copper target) are made, its film structure is mainly three layers: infrared high reflection layer, absorbed layer, antireflection layer, wherein absorbed layer is that two different subgrades of metal volume fraction form (as shown in Figure 1).Base material: glass tube; Infrared high reflection layer: the copper metal film of TP2 copper target preparation; Absorbed layer 2: high metal volume fraction composite membrane (HMVF); Absorbed layer 1: low metal volume fraction composite membrane (LMVF); Antireflection layer: aluminium nitride (ALN) deielectric-coating.
When above-mentioned each film layer group is combined, just consisted of solar selective absorbing coating.Sunlight sees through the antireflection layer same energy transform into heat energy that is absorbed by the absorption layer, and light wave is in the process that each interlayer is propagated, because the difference of each sublevel optical parametric so that light wave in interlayer generation Multi reflection and mutual interference, so just further increased the absorption of rete to light radiation, and infrared high reflection layer can effectively stop the external radiation heat loss of working media.
In the environment of temperature more than 300 ℃, metallic in the high metal volume fraction absorbed layer in the SS-ALN/Cu coating for selective absorption will be to diffusion mobility in the substrate layer (infrared high reflection layer), thereby cause high metal volume fraction absorbed layer (HMVF) metallic concentration to diminish, simultaneously because the diffusion of metallic descends the composition of the substrate layer purity that changes, the result is that the absorptivity of coating descends, emissivity rises.We have done following experiment for this reason: with spectrophotometer and emissivity detector the coating that just has been coated with is detected, absorptivity (α) is 0.92, emissivity (ε
h) 0.05, then 10
-3Under the Pa vacuum state this coating is carried out 400 ℃ and 1 hour baking of constant temperature, again coating is detected, coating absorptivity 0.88, emissivity 0.07, the color of substrate layer (infrared high reflection layer) has also become golden yellow by the aubergine before the baking simultaneously.Experimental result shows that when the SS-ALN/Cu coating was used, film structure will be destroyed in the environment more than 300 ℃, performance decays.
The utility model content
The utility model is for the defective that above-mentioned SS-ALN/Cu coating exists, and prepared that a kind of solar absorptance is high, emissivity is low, and film structure is stable simultaneously, the solar selective absorbing coating of excellent heat stability.
The technical solution adopted in the utility model is:
A kind of solar selective absorbing coating comprises base material, successively is coated with on the base material: infrared high reflection layer, the first barrier layer, the first absorbed layer, the second absorbed layer and antireflection layer; Wherein the first absorbed layer is that high metal volume fraction absorbed layer, the second absorbed layer are low metal volume fraction absorbed layer.
Between the first absorbed layer and the second absorbed layer the second barrier layer is set also.
Infrared high reflection layer is copper substrate layer, and the first barrier layer is the aluminium nitride media coating, and the first absorbed layer is filling factor f
1=0.3 ~ 0.45 resulting SS-AlN composite membrane; The second absorbed layer is filling factor f
2=0.15 ~ 0.3 resulting SS-AlN composite membrane.
Infrared high reflection layer thickness is 100 ~ 200nm, the first barrier layer thickness is 5 ~ 15nm, and high metal volume fraction absorber thickness is 30 ~ 90nm, and low metal volume fraction absorber thickness is 20 ~ 60nm, the second barrier layer thickness is 3 ~ 6nm, and antireflection layer thickness is 30 ~ 80nm.
Infrared high reflection layer thickness is 200nm, and the first barrier layer thickness is 8nm, and high metal volume fraction absorber thickness is 50nm, and low metal volume fraction absorber thickness is 40nm, and the second barrier layer thickness is 5nm, and antireflection layer thickness is 73nm.
The beneficial effects of the utility model are:
Use its advantage of the utility model to be because the fusing point of aluminium nitride (AlN) is 2200 ℃, has excellent high high-temp stability, be used as barrier layer with aluminium nitride (AlN), can play the effect that stops the metallic diffusion fully, absorptivity is high, emissivity is low, film structure is stable simultaneously, and reaction condition is less demanding, has saved production cost.
Description of drawings
Fig. 1 is the utility model solar selective absorbing coating structural representation;
Fig. 2 is the utility model solar selective absorbing coating reflectance curve figure.
Among the figure: 1, substrate; 2, infrared high reflection layer; 3, the first barrier layers; 4, the first absorbed layers; 5, the second barrier layers; 6, the second absorbed layers; 7, antireflection layer.
The specific embodiment
Now by reference to the accompanying drawings, the technical solution of the utility model is further described.
As shown in Figure 1, infrared high reflection layer 2(substrate layer), the first barrier layer 3, the first absorbed layer 4, the second barrier layer 5, the second absorbed layer 6, antireflection layer 7, the first absorbed layers be that high metal volume fraction absorbed layer, the second absorbed layer are low metal volume fraction absorbed layer the utility model coating for selective absorption successively is coated with on substrate of glass 1:.
The preparation method of coating is as follows:
Infrared high reflection layer: when vacuum chamber of film coating machine vacuum reaches working vacuum and spends, be filled with the pure inert gas argon gas in vacuum chamber, start the copper target, be coated with copper substrate layer at base material, thickness is 100 ~ 200nm;
The first barrier layer: be filled with reacting gas nitrogen when being filled with the working gas argon gas in vacuum chamber, start the aluminium target, be coated with pure aluminium nitride (AlN) deielectric-coating at infrared high reflection layer, thickness is 5 ~ 15nm;
The first absorbed layer (HMVF): be filled with reacting gas nitrogen when in vacuum chamber, being filled with the working gas argon gas, start aluminium target and stainless steel target, be coated with the SS-AlN composite membrane at the first barrier layer, filling factor f
1=0.3 ~ 0.45 thicknesses of layers is 30 ~ 90nm;
The second barrier layer: be filled with reacting gas nitrogen when in vacuum chamber, being filled with the working gas argon gas, be coated with pure aluminium nitride (AlN) deielectric-coating aluminium nitride (AlN), thickness 3 ~ 6nm at the first absorbed layer;
The second absorbed layer (LMVF): be filled with reacting gas nitrogen when in vacuum chamber, being filled with the working gas argon gas, start aluminium target and stainless steel target, be coated with the SS-AlN composite membrane at the second barrier layer, filling factor f
2=0.15 ~ 0.3 thicknesses of layers is 20 ~ 60nm;
Antireflection layer: be filled with reacting gas nitrogen (N when in vacuum chamber, being filled with working gas argon gas (Ar)
2), being coated with pure aluminium nitride (AlN) deielectric-coating at the second absorbed layer, thickness is 30 ~ 80nm.
When thickness parameter is: infrared high reflection layer thickness is 200nm, and the first barrier layer thickness is 8nm, and high metal volume fraction absorber thickness is 50nm, and low metal volume absorber thickness is 40nm, and the second barrier layer thickness is 5nm, and antireflection layer thickness is 73nm.This moment, best results was preferred parameter.
Between infrared high reflection layer and high metal volume fraction absorbed layer, increased barrier layer 1 respectively, between high metal volume fraction absorbed layer and low metal volume fraction absorbed layer, increased barrier layer 2, barrier layer 1,2 the same pure aluminium nitride (AlN) deielectric-coating that are with antireflection layer.It is pointed out that for barrier layer 2 and in the actual coating preparation process, also can not do as required.
Use coating for selective absorption of solar energy heating material of the present utility model and preparation method thereof, its advantage is because the fusing point of aluminium nitride (AlN) is 2200 ℃, has excellent high high-temp stability, be used as barrier layer with aluminium nitride (AlN), can play the effect that stops the metallic diffusion fully, reflect that simultaneously conditional request is not high, has saved production cost.
Coating for firm deposition detects, and its absorptivity (α) is 0.93, and hemisphere is to emissivity (ε
h) be 0.06, from reflectance curve shown in Figure 2, can see, the absorption notch length of rete is more than 1300nm, wider spectral absorption scope is arranged, curve has two to interfere low spot, illustrate that coating has obvious interference effect, the curve tail ascent stage is very precipitous, illustrates that whole coating has good solar energy selective absorbent properties.This coating is after through 40 minutes vacuum bakeout of 400 ℃ of constant temperature, and its absorptivity further rises to more than 0.95, and emissivity drops to below 0.05.This is because under high-temperature baking, and infrared high reflection layer (substrate layer) shrinks, and crystal lattice is arranged finer and close, and properties of infrared reflection improves, and the emissivity of film system is descended; Because the interpenetrative situation of foregoing each layer can not occur in the existence of barrier layer, but the metal ion in the high and low absorbed layer can spread in this layer, so just in time remedied rete in preparation process, the inhomogeneities that the metallic that the sputter inhomogeneities causes distributes, make the metallic in the height absorbed layer distribute more even, whole coating further strengthens the interference of light effect, thereby has improved the absorptivity of rete.
Claims (5)
1. a solar selective absorbing coating is characterized in that: comprise base material, successively be coated with on the base material: infrared high reflection layer, the first barrier layer, the first absorbed layer, the second absorbed layer and antireflection layer; Wherein the first absorbed layer is that high metal volume fraction absorbed layer, the second absorbed layer are low metal volume fraction absorbed layer.
2. solar selective absorbing coating as claimed in claim 1 is characterized in that: between the first absorbed layer and the second absorbed layer the second barrier layer is set also.
3. solar selective absorbing coating as claimed in claim 2, it is characterized in that: infrared high reflection layer is copper substrate layer, and the first barrier layer is the aluminium nitride media coating, and the first absorbed layer is filling factor f
1=0.3 ~ 0.45 resulting SS-AlN composite membrane; The second absorbed layer is filling factor f
2=0.15 ~ 0.3 resulting SS-AlN composite membrane.
4. solar selective absorbing coating as claimed in claim 3, it is characterized in that: infrared high reflection layer thickness is 100 ~ 200nm, the first barrier layer thickness is 5 ~ 15nm, high metal volume fraction absorber thickness is 30 ~ 90nm, low metal volume fraction absorber thickness is 20 ~ 60nm, the second barrier layer thickness is 3 ~ 6nm, and antireflection layer thickness is 30 ~ 80nm.
5. solar selective absorbing coating as claimed in claim 4, it is characterized in that: infrared high reflection layer thickness is 200nm, the first barrier layer thickness is 8nm, high metal volume fraction absorber thickness is 50nm, low metal volume fraction absorber thickness is 40nm, the second barrier layer thickness is 5nm, and antireflection layer thickness is 73nm.
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| Application Number | Priority Date | Filing Date | Title |
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| CN 201220396216 CN202782003U (en) | 2012-08-10 | 2012-08-10 | Solar selective absorption coating |
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| CN 201220396216 CN202782003U (en) | 2012-08-10 | 2012-08-10 | Solar selective absorption coating |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102816992A (en) * | 2012-08-10 | 2012-12-12 | 湖北桑夏太阳能产业有限公司 | Solar selective absorbing coating and preparation method thereof |
| CN103411335A (en) * | 2013-07-30 | 2013-11-27 | 中国科学院上海技术物理研究所 | Selective absorbing film set of radiation absorbing layer based on mixture |
| CN104894519A (en) * | 2015-04-14 | 2015-09-09 | 山东光普太阳能工程有限公司 | High temperature resistance low emission film used for solar energy and production method thereof |
| CN110422345A (en) * | 2019-07-26 | 2019-11-08 | 中国电子科技集团公司第三十三研究所 | A kind of OSR thermal control coating based on photonic crystal |
| WO2023026572A1 (en) * | 2021-08-26 | 2023-03-02 | 株式会社村田製作所 | Optical component |
-
2012
- 2012-08-10 CN CN 201220396216 patent/CN202782003U/en not_active Expired - Lifetime
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102816992A (en) * | 2012-08-10 | 2012-12-12 | 湖北桑夏太阳能产业有限公司 | Solar selective absorbing coating and preparation method thereof |
| CN103411335A (en) * | 2013-07-30 | 2013-11-27 | 中国科学院上海技术物理研究所 | Selective absorbing film set of radiation absorbing layer based on mixture |
| CN104894519A (en) * | 2015-04-14 | 2015-09-09 | 山东光普太阳能工程有限公司 | High temperature resistance low emission film used for solar energy and production method thereof |
| CN104894519B (en) * | 2015-04-14 | 2017-12-08 | 山东光普太阳能工程有限公司 | A kind of solar energy high temperature resistant is low to launch film layer and preparation method |
| CN110422345A (en) * | 2019-07-26 | 2019-11-08 | 中国电子科技集团公司第三十三研究所 | A kind of OSR thermal control coating based on photonic crystal |
| WO2023026572A1 (en) * | 2021-08-26 | 2023-03-02 | 株式会社村田製作所 | Optical component |
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