CN106091443A - A kind of slective solar energy absorbing coating - Google Patents
A kind of slective solar energy absorbing coating Download PDFInfo
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- CN106091443A CN106091443A CN201610391626.9A CN201610391626A CN106091443A CN 106091443 A CN106091443 A CN 106091443A CN 201610391626 A CN201610391626 A CN 201610391626A CN 106091443 A CN106091443 A CN 106091443A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
- C23C28/322—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
- C23C28/3455—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer with a refractory ceramic layer, e.g. refractory metal oxide, ZrO2, rare earth oxides or a thermal barrier system comprising at least one refractory oxide layer
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24S—SOLAR HEAT COLLECTORS; SOLAR HEAT SYSTEMS
- F24S70/00—Details of absorbing elements
- F24S70/20—Details of absorbing elements characterised by absorbing coatings; characterised by surface treatment for increasing absorption
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/40—Solar thermal energy, e.g. solar towers
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Abstract
The present invention relates to photo-thermal technical field of solar, disclose a kind of slective solar energy absorbing coating, it is included in reflective substrate layer, composite absorption layer and anti-reflection layer that substrate surface sets gradually from inside to outside, it is characterized in that: described reflective substrate layer uses Investigation of Large Area Electron Beam evaporation coating technique to be prepared from, and the Coating Materials that coating process is used is aluminum, copper or silver；Described composite absorption layer is gradient-structure silicon absorbed layer, is made up of polycrystalline silicon membrane the most from bottom to up, microcrystalline sillicon film layer, nanocrystalline silicon film and amorphous silicon film layer；Described anti-reflection layer is by monolayer CuMnOxLayer composition, or be CuMnO by internal layerxLayer, outer layer are SnO2The composite double layer composition of layer.Coating prepared by the present invention not only has the optical selective energy of excellence, coating stress effect in heat treatment process can also be alleviated, improve the absorptivity-emissivity ratio of coating, substantially increase weatherability and the stability of absorber coatings, thus improve the service life of heat collector.The most also there is preferable heat stability.
Description
Technical field
The present invention relates to photo-thermal technical field of solar, be specifically related to a kind of slective solar energy absorbing coating.
Background technology
Coating for selective absorption of sunlight spectrum has high-selenium corn at the sunlight wave band that wave-length coverage is 0.3 μm-2.5 μm
Rate, has low-E at the infrared band that wave-length coverage is 2.5 μm-50 μm, therefore, and coating for selective absorption of sunlight spectrum
It is widely used in solar thermal collector or thermal-collecting tube, is the core material realizing solar energy hot-cast socket.At present, the existing sun
Spectral selective absorbing coating mainly includes infrared reflecting layer, the absorbed layer being successively set on the substrates such as glass, aluminum, rustless steel
And anti-reflection layer, wherein, the Main Function of infrared reflecting layer is reflection infrared ray, reduces the radiation that heat is outside, works as infrared external reflection
In the case of layer reaches certain thickness, infrared reflecting layer is the finest and close, and infrared external reflection effect is the best, and heat-insulating property is the best；Absorbed layer is used
Absorbing solar energy, temperature raises and is translated into heat energy, and anti-reflection layer is used for reducing at absorbed layer and Air Interface too
Sunlight reflects, so that more sunlight arrives absorbed layer through anti-reflection layer.
Along with solar thermal utilization demand and the development of technology, the range of application of solar energy heat collection pipe is from cryogenic applications
(<100 DEG C) to middle temperature application (100-400 DEG C) and high temperature application (>400 DEG C) development, constantly to meet sea water
The use requirement of high-temperature applications in desalination, solar electrical energy generation etc..But, for solar energy heat collection pipe, operating temperature
The highest, the highest to the thermal stability requirement of coating for selective absorption.Along with the rising of operating temperature, metal component is susceptible to layer
Between phase counterdiffusion, thus cause the solar spectrum absorbance of this coating substantially to reduce, infrared emittance drastically raises, and affects coating
Use temperature and the life-span.
Additionally, though the most common anti-reflection layer can increase the transmitance of visible region, but to the protected effect of coating not
Ideal, and how restricted in the selection of material, it is difficult to obtain satisfied effect；The coating of multiple structure is deposited in sintering process
In the phenomenon that surface stress increases so that crackle occurs in the coating phase after sintering, affect the final optics of coating and select absorbability
Energy.Simultaneously as the thermal coefficient of expansion difference of interlayer materials is relatively big, therefore between coated film layer, interfacial stress is relatively big, causes film
Layer occurs, during high/low temperature experiment and use, the probability come off.
Silicon thin film material has excellent optics and physicochemical characteristic, is microelectronics and the particularly important basis of photoelectronic industry
Material, be widely used in quasiconductor, microelectronics, photoelectron, information show, optical communication, laser, precision optical machinery, national defense and military and
The various fields such as domestic and international major scientific projects.Silicon thin film material is also used widely at photovoltaic and photo-thermal field in recent years.
Summary of the invention
In order to solve existing middle high temperature solar energy selective absorption coating heat-resisting, weather-proof, wear no resistance and the life-span is low etc.
Shortcoming, the invention reside in offer and a kind of had both possessed good selective absorbing performance, be provided simultaneously with heat-resisting, corrosion-resistant, wear-resistant
Good with weather resistance, it is suitable for the coating structure of industrialization quantity-produced gradient-structure silicon thin film.
For realizing object above, the technical scheme is that
A kind of slective solar energy absorbing coating, is included in reflective substrate layer that substrate surface sets gradually from inside to outside, compound
Absorbed layer and anti-reflection layer, it is characterised in that: described reflective substrate layer use the preparation of Investigation of Large Area Electron Beam evaporation coating technique and
Becoming, the Coating Materials that coating process is used is aluminum, copper or silver；Described composite absorption layer is gradient-structure silicon absorbed layer,
It is made up of polycrystalline silicon membrane the most from bottom to up, microcrystalline sillicon film layer, nanocrystalline silicon film and amorphous silicon film layer；Described anti-reflection layer
By monolayer CuMnOxLayer composition, or be CuMnO by internal layerxLayer, outer layer are SnO2The composite double layer composition of layer.
As preferred technical scheme, described substrate is aluminium strip, stainless steel band or copper strips.
As preferred technical scheme, the thickness of described reflective substrate layer is 50nm ~ 1000nm.
As preferred technical scheme, film thickness scope 1250-3200nm of described gradient-structure silicon absorbed layer.
As preferred technical scheme, the preferred scope of film thickness of described gradient-structure silicon absorbed layer is 1800-
2700nm。
As preferred technical scheme, the thickness range that preferred structure is polycrystalline silicon membrane of described composite absorption layer
350nm-800nm, the thickness range 300nm-800nm of microcrystalline sillicon film layer, the thickness range 350nm-of nanocrystalline silicon film
800nm, the thickness range 250nm-800nm of amorphous silicon film layer.
As preferred technical scheme, the refractive index of described composite absorption layer is 3.45-4.3, can be various by regulation
Thickness and the crystalline ratio of micro structure silicon layer change, and continuously adjust and can form graded films.
As preferred technical scheme, between described reflective substrate layer and composite absorption layer, it is provided with chromic oxide isolation
Layer.This layer of Main Function is that the high temperature controlling reflective substrate layer metal is reunited and hinders reflective substrate layer metal toward gradient-structure silicon
The diffusion of absorbed layer.
As preferred technical scheme, described CuMnOxLayer is by CuMnOxComplex sol is prepared from, described CuMnOx
Complex sol is by nano-solid granule and CuMnOxColloidal sol is blended prepares gained, and described nano-solid granule is rare-earth oxidation
Thing or silicon compound, described rare earth oxide is terbia. Diterbium trioxide, cerium oxide or strontium oxide, and described silicon compound is silicon oxide.
As preferred technical scheme, described CuMnOxThe surface roughness of layer is 50 ~ 80nm.
Compared to the prior art, what the present invention produced has the beneficial effects that:
1, the present invention designs ingenious, practical, by using a kind of Investigation of Large Area Electron Beam evaporation coating technique to prepare selection
The reflective substrate layer of property solar energy absorbing coating, can increase the thickness of reflective substrate layer, and these thicker coatings can be light
Change places and make selective solar heat absorption coating have lower infrared emission ratio.While having lower transmitting ratio, select
Property solar heat absorber coatings is affected the least by base material condition.Meanwhile, of a relatively high production capacity can had
In the case of, it is achieved the improvement to the reflective substrate layer quality of selective solar heat absorption coating, and then can help improve also
Improve the serviceability of solar thermal collector.
2, the present invention uses sol-gal process to prepare copper manganese colloidal sol, and nano-solid granule is joined copper manganese by a certain percentage
In colloidal sol, form solid-liquid solid solution；The pinning effect of nano-solid granule can alleviate colloidal sol should in heat treatment process
The phenomenon that power is excessive, prevents the generation of crackle, makes coating finer and close.
3, owing to have employed gradient-structure silicon absorbed layer so that on the one hand the absorber coatings of the present invention can be greatly improved too
Sunlight absorption efficiency, on the other hand significantly reduces the emissivity of whole coating, has the advantages that photo-thermal conversion efficiency is high, can be wide
The general heat collector being applied to middle high temperature solar photothermal deformation.Meanwhile, stack combinations silicon thin film considerably increases product design
Motility and the range of choice, can be for the corresponding structural parameters of concrete Market Selection.
4, the absorber coatings of the present invention is under keeping high-absorbility and low-launch-rate premise, has simple in construction, improves work
The advantage of industry production efficiency.Owing to absorber coatings is adapted to the combination of various forms silicon structure, published compared to other
Absorber coatings, can substantially increase weatherability and the stability of absorber coatings, thus improve the service life of heat collector.
5, in the absorber coatings of the present invention, gradient-structure silicon absorbed layer is prepared material therefor and can be selected flexibly, as silane,
Trichlorosilane etc..
6, the sealing coat chromic oxide of the present invention has fabulous temperature stabilization effect to reflective substrate layer silver, makes this absorption
Coating can long-term work under the atmospheric environment of 500 DEG C.
Accompanying drawing explanation
For the technical scheme being illustrated more clearly that in the embodiment of the present invention, in embodiment being described below required for make
Accompanying drawing be briefly described, it should be apparent that, below describe in accompanying drawing be only some embodiments of the present invention, for
From the point of view of those of ordinary skill in the art, on the premise of not paying creative work, it is also possible to obtain other according to these accompanying drawings
Accompanying drawing, wherein:
Fig. 1 is the structural representation of the present invention；
Fig. 2 is the structural representation of gradient-structure silicon absorbed layer.
Detailed description of the invention
Below in conjunction with the accompanying drawing in present example, the technical scheme in the embodiment of the present invention is carried out clear, complete
Ground describes.Obviously, described embodiment is only a part of embodiment of the present invention rather than whole embodiments.Based on sending out
Embodiment in bright, the every other enforcement that those of ordinary skill in the art are obtained under not making creative work premise
Example, broadly falls into the scope of protection of the invention.
As it is shown in figure 1, the present invention proposes a kind of slective solar energy absorbing coating, including anti-reflection the most from top to bottom
Layer, composite absorption layer, buffer layer, reflective substrate layer and substrate.
Wherein:
Substrate is aluminium strip, stainless steel band or copper strips material；
Reflective substrate layer uses Investigation of Large Area Electron Beam evaporation coating technique to be prepared from, and the Coating Materials that coating process is used is
Aluminum, copper or silver, its thickness is 50nm ~ 1000nm；
Buffer layer is the chromic oxide that one layer of 100nm is thick, and it is formed by magnetron sputtering deposition, this layer of Main Function
It is that the high temperature controlling reflective substrate layer metal is reunited and hinders reflective substrate layer metal toward the diffusion of gradient-structure silicon absorbed layer.
As in figure 2 it is shown, composite absorption layer is gradient-structure silicon absorbed layer, by polycrystalline silicon membrane the most from bottom to up, micro-
Crystal silicon film layer, nanocrystalline silicon film and amorphous silicon film layer composition, its total thickness is 350nm-800nm, wherein microcrystalline sillicon film
The thickness range of layer is 300nm-800nm, and the thickness range of nanocrystalline silicon film is 350nm-800nm, the thickness of amorphous silicon film layer
Degree scope is 250nm-800nm.The refractive index of composite absorption layer is 3.45-4.3, can be by regulating various micro structure silicon layers
Thickness and crystalline ratio change, and continuously adjust and can form graded films.
Anti-reflection layer is by monolayer CuMnOxLayer composition, or be CuMnO by internal layerxLayer, outer layer are SnO2The composite double layer of layer
Composition.
At preparation CuMnOxDuring layer, first, with Cu salt and Mn salt for metal cation source, ethanol is solvent, according to Cu
Ion: the mol ratio of Mn ion is the proportions solution A of 1:1；Citric acid is dissolved in dehydrated alcohol and forms solution B；Will
The pH value regulating mixed solution after solution A and solution B mix homogeneously is 5.5 ~ 6.5, the more concentrated concentration that obtains is 0.
The CuMnO of 2mol/L ~ 0. 5mol/LxColloidal sol；Then, by CuMnOxColloidal sol and ethanol mix according to the ratio of 1:3 ~ 1:4, water
Bath stirring is completely dissolved to colloidal sol, obtains solution C, is slowly added to nano-solid granule to solution C, and constant temperature stirs to solid
Grain is completely dispersed, and is subsequently adding chelating agent, continues constant temperature stirring, until the viscosity of colloidal sol is 4 ~ 5 mPa s, obtains CuMnOx
Complex sol；Finally, CuMnO is carried outxThe lifting coating film treatment of complex sol, repeats to lift coating film treatment technique 2 ~ 5 times, warp
Be dried, annealing heat treatment after, obtain monolayer CuMnOxLayer, the roughness on its surface is 50 ~ 80nm.The most above-described
Cu, Mn slaine is one or more in chlorate, nitrate and acetate；Described chelating agent is OP10 and poly-second two
One or both in alcohol；Described nano-solid granule is rare earth oxide or silicon compound, and described rare earth oxide is oxidation
Terbium, cerium oxide or strontium oxide, described silicon compound is silicon oxide.
And at preparation SnO2During layer, first, stannic chloride pentahydrate being dissolved in deionized water, regulation solution pH value is
3.5 ~ 4.5, prepare the SnO that concentration is 0.5mol/L2Colloidal sol, then carries out SnO2Colloidal sol lifting coating film treatment, then warp
After flash baking, annealing heat treatment, obtain SnO2Layer.
Embodiment 1
Specific implementation process is as follows:
Employing stainless pipe is as metal substrate, initially with Investigation of Large Area Electron Beam evaporation coating technique, using silver as plated film
Material, plates the reflective substrate layer that a layer thickness is 1000nm on substrate, and the Main Function of this layer is to strengthen infrared external reflection；?
As passing through the thick chromic oxide of one layer of 100nm of magnetron sputtering deposition on the silver layer of reflective substrate layer again, as Metal And Silicon
Buffer layer, this layer of Main Function is that the high temperature controlling reflective substrate layer silver is reunited and hinders reflective substrate layer silver to tie toward gradient
The diffusion of structure silicon absorbed layer.Metal And Silicon buffer layer is sequentially depositing the polycrystalline silicon membrane of 600nm thickness, 500 nanometers
The amorphous silicon film layer that thick microcrystalline sillicon film layer, nanocrystalline silicon film thick for 600nm and 700nm are thick, forms 2400nm thickness
Gradient-structure silicon absorbed layer, the nanocrystal silicon particle size in nanocrystalline silicon film is at 10nm.Last at gradient-structure silicon absorbed layer
Upper thermal spraying CuMnOxLayer is as anti-reflection layer, and its surface roughness is 50 nm.
Embodiment 2
The present embodiment and embodiment 1 are essentially identical, and its detailed process is as follows:
Employing copper coin pipe is as metal substrate, initially with Investigation of Large Area Electron Beam evaporation coating technique, using copper as Coating Materials,
Plating the reflective substrate layer that a layer thickness is 500nm on substrate, the Main Function of this layer is to strengthen infrared external reflection；As outward
Again by the chromic oxide that one layer of 100nm of magnetron sputtering deposition is thick in the layers of copper of reflective substrate layer, as Metal And Silicon medium
Sealing coat, this layer of Main Function is that the high temperature controlling reflective substrate layer copper is reunited and hinders reflective substrate layer copper toward gradient-structure silicon
The diffusion of absorbed layer.Metal And Silicon buffer layer is sequentially depositing thick for 800nm polycrystalline silicon membrane, 700 nanometer thickness
The nanocrystalline silicon film of microcrystalline sillicon film layer, 400nm thickness and the amorphous silicon film layer of 500nm thickness, form the thick gradient of 2400nm
Structure silicon absorbed layer, the nanocrystal silicon particle size in nanocrystalline silicon film is at 5nm.Last thermal jet on gradient-structure silicon absorbed layer
Being coated with by internal layer is CuMnOxLayer, outer layer are SnO2Layer composite double layer as anti-reflection layer, wherein CuMnOxThe surface roughness of layer
It is 80 nm.
Above example only in order to technical scheme to be described, is not intended to limit；Although with reference to previous embodiment
The present invention is described in detail, it will be understood by those within the art that: it still can be to aforementioned each enforcement
Technical scheme described in example is modified, or wherein portion of techniques feature is carried out equivalent；And these amendment or
Replace, do not make the essence of appropriate technical solution depart from the spirit and scope of various embodiments of the present invention technical scheme.
Claims (10)
1. a slective solar energy absorbing coating, is included in reflective substrate layer that substrate surface sets gradually from inside to outside, multiple
Close absorbed layer and anti-reflection layer, it is characterised in that: described reflective substrate layer uses Investigation of Large Area Electron Beam evaporation coating technique to prepare
Forming, the Coating Materials that coating process is used is aluminum, copper or silver；Described composite absorption layer is that gradient-structure silicon absorbs
Layer, is made up of polycrystalline silicon membrane the most from bottom to up, microcrystalline sillicon film layer, nanocrystalline silicon film and amorphous silicon film layer；Described subtract
Anti-layer is by monolayer CuMnOxLayer composition, or be CuMnO by internal layerxLayer, outer layer are SnO2The composite double layer composition of layer.
2. according to a kind of slective solar energy absorbing coating described in claim 1, it is characterised in that: described substrate is aluminum
Band, stainless steel band or copper strips.
3. according to a kind of slective solar energy absorbing coating described in claim 1, it is characterised in that: described reflective substrate layer
Thickness be 50nm ~ 1000nm.
4. according to a kind of slective solar energy absorbing coating described in claim 1, it is characterised in that: described gradient-structure silicon
Film thickness scope 1250-3200nm of absorbed layer.
5. according to a kind of slective solar energy absorbing coating described in claim 1, it is characterised in that: described gradient-structure silicon
The film thickness scope of absorbed layer is 1800-2700nm.
A kind of slective solar energy absorbing coating the most according to claim 1, it is characterised in that: described composite absorption layer
Structure is the thickness range 350nm-800nm of polycrystalline silicon membrane, the thickness range 300nm-800nm of microcrystalline sillicon film layer, nanometer
The thickness range 350nm-800nm of crystal silicon film layer, the thickness range 250nm-800nm of amorphous silicon film layer.
7. according to a kind of slective solar energy absorbing coating described in claim 1, it is characterised in that: described composite absorption layer
Refractive index be 3.45-4.3.
8. according to a kind of slective solar energy absorbing coating described in claim 1, it is characterised in that: described reflective substrate layer
And between composite absorption layer, it is provided with chromic oxide buffer layer.
9. according to a kind of slective solar energy absorbing coating described in claim 1, it is characterised in that: described CuMnOxLayer by
CuMnOxComplex sol is prepared from, described CuMnOxComplex sol is by nano-solid granule and CuMnOxColloidal sol is blended system
Standby gained, described nano-solid granule is rare earth oxide or silicon compound, described rare earth oxide be terbia. Diterbium trioxide, cerium oxide or
Strontium oxide, described silicon compound is silicon oxide.
10. according to a kind of slective solar energy absorbing coating described in claim 1, it is characterised in that: described CuMnOxLayer
Surface roughness be 50 ~ 80nm.
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107400848A (en) * | 2017-07-31 | 2017-11-28 | 武汉理工大学 | A kind of solar selectively absorbing coating of sandwich construction and preparation method thereof |
| CN114576873A (en) * | 2022-01-26 | 2022-06-03 | 浙江大学 | Color solar photo-thermal conversion element |
| CN117784292A (en) * | 2023-11-24 | 2024-03-29 | 江苏东方硕华光学材料有限公司 | High-absorption optical coating material and preparation method thereof |
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| CN114576873A (en) * | 2022-01-26 | 2022-06-03 | 浙江大学 | Color solar photo-thermal conversion element |
| CN117784292A (en) * | 2023-11-24 | 2024-03-29 | 江苏东方硕华光学材料有限公司 | High-absorption optical coating material and preparation method thereof |
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