CN104266820A - Pressure decay method based small orifice conductance measuring method - Google Patents
Pressure decay method based small orifice conductance measuring method Download PDFInfo
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- CN104266820A CN104266820A CN201410484796.2A CN201410484796A CN104266820A CN 104266820 A CN104266820 A CN 104266820A CN 201410484796 A CN201410484796 A CN 201410484796A CN 104266820 A CN104266820 A CN 104266820A
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- pressure
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- upstream chamber
- small orifice
- cathode ionization
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Abstract
The invention discloses a pressure decay method based small orifice conductance measuring method. The pressure decay method based small orifice conductance measuring method comprises the steps of adopting a pressure decay method to enable the inflation pressure of an upstream chamber to be decayed through a measured small orifice and then form dynamic balanced pressure, utilizing a capacitive film vacuum gauge good in linearity and an ultrahigh vacuum thermionic cathode ionization vacuum gauge good in linearity to respectively measure the pressure of the upstream chamber and pressure of a downstream chamber, and obtaining a conductance measuring result of the measured small orifice under the corresponding inflation pressure according to a shape rule, geometric dimension, an accurately-measurable conductance value of a small flow limiting hole and accurately-calculable characteristics. By means of the pressure decay method based small orifice conductance measuring method, measurement time is effectively shortened, small orifice conductance measuring efficiency is improved, the problems of low-pressure small orifice conductance measurement and high-pressure small orifice conductance measurement are solved, full-range small orifice conductance measurement is achieved, and the uncertainty of measurement is low.
Description
Technical field
The present invention relates to orifice conductance measurement technical field, particularly relate to a kind of method adopting pressure-decay method to measure orifice conductance.
Background technology
Measuring the object of orifice conductance is the orifice conductance value obtaining each test pressure point place, thus obtains matched curve that whole calibration range inner flow guide changes with admission pressure and equation.
Conductance for regular shape aperture can be obtained by theory calculate, but cannot Measurement accuracy or irregular aperture for size, and its conductance can only obtain in method measurement by experiment.It is wherein a solution that constant volume method measures orifice conductance.
Document " constant volume method measures the technique study of orifice conductance, " vacuum " the 43rd volume the 1st phase, in January, 2006, the 62nd page ~ 66 pages ", describe the conductance measuring method adopting constant volume method to measure non-regular shape aperture.The method adopts absolute pressure formula capacitor thin film vacuum meter to measure aperture admission pressure, and aperture admission pressure variation delta p measured by differential pressure type capacitor thin film vacuum meter, thus obtains matched curve and equation that conductance changes with admission pressure.The advantage of the method is adopted to be to utilize the method for cumulative integral to make conductance uncertainty of measurement less.
The weak point of such scheme is embodied in following 3 points:
One is, when the method measures corresponding orifice conductance value under a certain air inlet pressure force, differential pressure type capacitor thin film vacuum meter need be adopted to measure the variable quantity of admission pressure in a period of time t, i.e. Δ p, the least resolution that this variable quantity should be greater than differential pressure type capacitor thin film vacuum meter just can be measured to, therefore, this time period t answers long enough, such as, time period t is adopted to be 720s in the document, with satisfied measurement needs.Therefore, complete orifice conductance multimetering, all processes continues a few hours usually, and efficiency is lower.
Two are, in measuring process, volume wall there will be desorbing gas phenomenon, and Measuring Time is longer, and body desorption rate is larger, and desorption gas can mix in test gas, cause admission pressure variation delta p cannot Measurement accuracy.Due to constant volume method, to measure time of each measured point of orifice conductance longer, and when charge pressure is lower, admission pressure variable quantity needs the time more grown could be measured by differential pressure type capacitor thin film vacuum meter, and it is also larger therefore to measure the impact that pressure is subject to accordingly.
Three are, when charge pressure is higher, there will be the variable quantity of pressure in constant volume chamber and exceed the measurement range of differential pressure type capacitor thin film vacuum meter;
The orifice conductance value that above three kinds of situations are corresponding under causing utilizing constant volume method Measurement accuracy low-pressure and high pressure, cannot meet the needs that orifice conductance gamut is measured, and the measurement duration is long, efficiency is lower.
Summary of the invention
In view of this, the invention provides a kind of pressure-decay method that adopts and measure the method for orifice conductance, can efficiently, corresponding under Measurement accuracy low-pressure and high pressure orifice conductance value, meet the needs of orifice conductance gamut measurement.
In order to solve the problems of the technologies described above, the present invention is achieved in that
The method that described pressure-decay method measures orifice conductance comprises the following steps:
Step 1, tested aperture is connected between upstream chamber and downstream chamber; The exhaust pipe of downstream chamber is provided with current limliting aperture;
Step 2, UNICOM bleed unit and the exhaust pipe between upstream chamber and downstream chamber, bleed to upstream chamber and downstream chamber; Open the absolute pressure formula capacitor thin film vacuum meter that upstream chamber connects; When downstream room pressure is lower than 10
-2during the Pa order of magnitude, open the ultrahigh vacuum hot-cathode ionization gauge that downstream chamber connects;
Step 3, start that uniform speed is carried out to upstream chamber and downstream chamber and to heat up baking, and keep a period of time in baking maximum temperature, at the uniform velocity lower the temperature subsequently, temperature-fall period carries out degasification to ultrahigh vacuum hot-cathode ionization gauge, after continuing to be cooled to room temperature, stop baking, be pumped to final vacuum;
The exhaust pipe of step 4, cut-out upstream chamber, keeps the UNICOM of downstream chamber's exhaust pipe; UNICOM's upstream chamber, pipeline between tested aperture and downstream chamber, after upstream chamber pressure stability, return to zero to absolute pressure formula capacitor thin film vacuum meter;
Step 5, open the first vacuum valve between source of the gas and upstream chamber, upstream room is filled with test gas, needed for orifice conductance, test pressure regulates the aperture of the first vacuum valve, make upstream chamber set up corresponding test pressure point according to by low-pressure to the order of high pressure, and record the indicating value p of the absolute pressure formula capacitor thin film vacuum meter at each test pressure point place
1and the indicating value p of ultrahigh vacuum hot-cathode ionization gauge
2;
Step 6, the absolute pressure formula capacitor thin film vacuum obtained according to step 5 take into account the indicating value p of ultrahigh vacuum hot-cathode ionization gauge
1and p
2, the tested orifice conductance value C at each test pressure point place is obtained according to formulae discovery
1;
In formula: C
2for current limliting orifice conductance value, α is the ratio that backflows.
Preferably, formula (1) is reduced to:
The formula (2) that described step 6 obtains after adopting and simplifying carries out tested orifice conductance value C
1calculating.
Preferably, described final vacuum is 10
-8the Pa order of magnitude.
Preferably, the volume of described upstream chamber is at least 1L.
Preferably, the measurement range of described ultrahigh vacuum hot-cathode ionization gauge is 10
-9pa ~ 1Pa.
Preferably, in step 3, the judgment mode that described degasification completes is: when upstream chamber and downstream chamber reach capacity vacuum tightness, the indicating value of monitoring ultrahigh vacuum hot-cathode ionization gauge, indicating value reduces again after raising, when the final value after reducing is lower than the initial value before rising, and when final value tends to be steady, think that degasification completes.
Preferably, after described final value tends to be steady, first the degasification to ultrahigh vacuum hot-cathode ionization gauge is stopped, and then the degasification of opening ultrahigh vacuum hot-cathode ionization gauge, if when now confirming that the indicating value of ultrahigh vacuum hot-cathode ionization gauge does not change, then finally confirm that degasification completes.
Beneficial effect:
(1) the present invention adopts two vacuum meters to measure the pressure of tested aperture entrance and outlet respectively, because tested aperture top hole pressure change is comparatively trickle in some stage, therefore resolving power and the linearity all preferably ultrahigh vacuum hot-cathode ionization gauge is adopted, thus accurately can capture aperture top hole pressure variable quantity, to utilize entrance and exit pressure gauge to calculate orifice conductance.Because the resolving power of two vacuum meters of the present invention is all better, therefore do not need to wait for that admission pressure variable quantity acquires a certain degree to measure again, but the record that capacitor thin film vacuum takes into account ultrahigh vacuum hot-cathode ionization gauge measured value just can be completed while setting up air inlet pressure force, several seconds can complete, the time of several minutes need not be waited for, thus substantially increase measurement efficiency.Even if charge pressure is lower, also excessive impact can not be caused.
(2) because measuring process is of short duration, this internal volume wall desorption impact can be ignored time, and the variable quantity avoiding the pressure caused because of volume wall desorbing gas cannot Measurement accuracy and produce the problem of measured deviation.
(3) the present invention does not relate to the measurement problem of this parameter of admission pressure variable quantity, therefore the differential pressure type capacitor thin film vacuum meter adopting measurement range limited is avoided, and only measure inlet pressure with the absolute pressure formula capacitor thin film vacuum meter of wide-range, even if when therefore charge pressure is higher, also accurately can measure tested aperture entrance end pressure, thus the variable quantity avoiding tested aperture entrance end pressure exceedes the situation of the measurement range of differential pressure type capacitor thin film vacuum meter.
Comprehensive above three visible, the orifice conductance value that the present invention can be corresponding under Measurement accuracy low-pressure and high pressure, achieves the high-level efficiency measurement of the gamut of orifice conductance.
Accompanying drawing explanation
Fig. 1 is the structural drawing that pressure-decay method of the present invention measures orifice conductance device.
Fig. 2 is orifice conductance measurement result.
In figure: 1-first vacuum valve, 4-second vacuum valve, 9-the 4th vacuum valve, 11-the 3rd vacuum valve, 2-absolute pressure formula capacitor thin film vacuum meter, 3-upstream chamber, the tested aperture of 5-, 6-downstream chamber, 7-ultrahigh vacuum hot-cathode ionization gauge, 8-current limliting aperture, 10-are bled unit.
Embodiment
The present invention adopts pressure-decay method by upstream chamber charge pressure pressure in downstream chamber's formative dynamics balance after tested aperture decay, utilize linearly good absolute pressure formula capacitor thin film vacuum meter, ultrahigh vacuum hot-cathode ionization gauge measures upstream chamber, downstream chamber's pressure respectively, and utilize regular shape, physical dimension can the conductance value of current limliting aperture of the accurate measurement characteristic that can accurately calculate, obtain the conductance measurement result under the corresponding charge pressure of tested aperture.
To develop simultaneously embodiment below in conjunction with accompanying drawing, describe the present invention.
As shown in Figure 1, for pressure-decay method orifice conductance measurement device of the present invention, be made up of the first vacuum valve 1, second vacuum valve 4, the 4th vacuum valve 9, the 3rd vacuum valve 11, absolute pressure formula capacitor thin film vacuum meter 2, upstream chamber 3, tested aperture 5, downstream chamber 6, ultrahigh vacuum hot-cathode ionization gauge 7, current limliting aperture 8 and unit 10 of bleeding.Upstream chamber 3 is connected with source of the gas by the pipeline with the first vacuum valve 1, and be connected with downstream chamber 6 by the pipeline being connected with the second vacuum valve 4 and tested aperture 5 successively, unit 10 of bleeding is connected with downstream chamber 6 with the pipeline of current limliting aperture by being connected with the 4th vacuum valve 9 successively, unit 10 of bleeding also is connected with upstream chamber 3 by the pipeline being connected with the 3rd vacuum valve 11, thus realizes bleeding to both; Upstream chamber 3 connects absolute pressure formula capacitor thin film vacuum meter 2, and downstream chamber 6 is by Flange joint ultrahigh vacuum hot-cathode ionization gauge 7.Ultrahigh vacuum hot-cathode ionization gauge 7 has the advantages that resolving power is good, the linearity is good.In the present embodiment, the measurement range choosing ultrahigh vacuum hot-cathode ionization gauge 7 is 10
-9pa ~ 1Pa, this scope is applicable to the measurement of current nearly all orifice conductance.The volume of upstream chamber 3 should be greater than 1L, can ensure the voltage regulation result when charge pressure is lower like this.
The concrete implementation step that the present invention measures orifice conductance is as follows:
Step 1, tested aperture 5 is connected between downstream chamber 6 and vacuum valve 4;
Step 2, open unit 10 of bleeding, and the state of bleeding that unit of bleeding (10) keeps in whole measuring process; By opening the 4th vacuum valve 9 and the 3rd vacuum valve 11 makes bleed unit (10) and the exhaust pipe UNICOM between upstream chamber (3) and downstream chamber (6), thus realize bleeding to upstream chamber 3 and downstream chamber 6; Wherein, the exhaust pipe of bleeding between unit 10 and downstream chamber 6 is provided with regular shape, physical dimension can the current limliting aperture 8 of accurate measurement.
Open the absolute pressure formula capacitor thin film vacuum meter 2 that upstream chamber 3 connects, start to carry out equipment preheating; The preheat mode of absolute pressure formula capacitor thin film vacuum meter 2 keeps more than 24 hours, thus ensures the abundant preheating of absolute pressure formula capacitor thin film vacuum meter 2, and abundant preheating can effectively reduce the impact that the factors such as thermal transpiration effect, membrane stress produce measurement result.
When pressure in downstream chamber 6 is lower than 10
-2during the Pa order of magnitude, preferably when pressure in downstream chamber 6 is 9.56 × 10
-3during Pa, open the ultrahigh vacuum hot-cathode ionization gauge 7 that downstream chamber 6 connects, thus prevent too high pressure from causing damage to ultrahigh vacuum hot-cathode ionization gauge 7.Wherein, pumped vacuum systems generally can be furnished with monitoring vacuum meter, according to the reading of vacuum meter, can obtain now force value in downstream chamber 6.
Step 3, start that uniform speed is carried out to upstream chamber 3 and downstream chamber 6 and to heat up baking, and keep a period of time in baking maximum temperature, uniform speed's cooling subsequently, what temperature-fall period utilized ultrahigh vacuum hot-cathode ionization gauge 7 to carry carries out degasification to ultrahigh vacuum hot-cathode ionization gauge 7 except airway dysfunction, thus extract the desorption gas of ultrahigh vacuum hot-cathode ionization gauge 7 inside out, after continuing to be cooled to room temperature, stop baking; Bleed in bake process and continue to carry out, after stopping baking, continue to bleed, when the pressure in pipeline reaches capacity vacuum tightness, perform step 4.Adopt baking limit, the limit mode of bleeding, can guarantee to be attached to gas on volume wall can fully, desorption as soon as possible, and to be pumped.
Wherein, described final vacuum is 10
-8the Pa order of magnitude, the final vacuum of such as upstream chamber 3 and downstream chamber 6 can be chosen as 3.89 × 10 respectively
-8pa, 4.01 × 10
-8pa.
Wherein, the defining method that described degasification completes can be: the simplest a kind of scheme is that timing arrives, then think that degasification completes, but this scheme is not accurate enough.Optimal way is, toast temperature-fall period in upstream chamber 3 and downstream chamber 6 and degasification is carried out to ultrahigh vacuum hot-cathode ionization gauge 7, the indicating value of monitoring ultrahigh vacuum hot-cathode ionization gauge 7, because the incipient stage gas of degassing procedure can increase, therefore in vacuum meter, pressure raises, afterwards because gas is drawn out of, in vacuum meter, pressure reduces, and therefore reduces again after indicating value raises, and the final value reduced is lower than the initial value before rising, and final value tends to be steady, then tentatively think that degasification completes.After degasification completes, again open except airway dysfunction, then indicating value does not change, then confirm that degasification completes.
Step 4, close the 3rd vacuum valve 11 thus cut off the UNICOM of the exhaust pipe between unit 10 and upstream chamber 3 of bleeding, open the second vacuum valve 4 thus UNICOM's upstream chamber 3, tested aperture 5 and downstream chamber 6, the gas of upstream chamber 3 flows to downstream chamber 6 via tested aperture, now can see that upstream chamber 3 pressure can occur one and start fast to climb slowly afterwards by the indicating value of absolute pressure formula capacitor thin film vacuum meter 2, after the indicating value of absolute pressure formula capacitor thin film vacuum meter 2 is stable, think and now absolute pressure formula capacitor thin film vacuum meter 2 is returned to zero upstream chamber 3 pressure stability.
Step 5, open the first vacuum valve 1, be upstream filled with test gas N in room 3 by source of the gas
2, needed for orifice conductance, test pressure regulates the aperture of the first vacuum valve 1, the pressure of the upstream chamber (3) that absolute pressure formula capacitor thin film vacuum meter 2 is demonstrated according to by low-pressure to the order of high pressure in 0.1Pa ~ 10
5the scope of Pa sets up corresponding test pressure point, and records the indicating value p of the absolute pressure formula capacitor thin film vacuum meter 2 at each test pressure point place
1and the indicating value p of ultrahigh vacuum hot-cathode ionization gauge 7
2, as shown in table 1;
Table 1 orifice conductance measurement result
The indicating value p of step 6, the absolute pressure formula capacitor thin film vacuum meter 2 obtained according to step 5 and ultrahigh vacuum hot-cathode ionization gauge 7
1and p
2, the tested orifice conductance value C at each test pressure point place is calculated according to formula (1)
1;
In formula:
C
1-tested orifice conductance value, m
3/ s;
C
2-current limliting orifice conductance value, m
3/ s;
P
1-upstream chamber force value, Pa;
P
2-downstream chamber force value, Pa;
α-backflow ratio, dimensionless;
Because of P
1> > P
2, then formula (1) can be reduced to:
Wherein, adopt formula (1) or formula (2) all can calculate orifice conductance, but formula (2) is more simple, is more conducive to provide computing velocity.
In the present embodiment, after tested, its value is 0.188 to α; Current limliting aperture 8, for size is through the regular aperture of metering, is 2.895 × 10 according to desirable aperture formula its conductance value known
-2m
3/ s; The conductance value of tested aperture can be obtained as shown in Figure 2 by formula (2).
In sum, these are only preferred embodiment of the present invention, be not intended to limit protection scope of the present invention.Within the spirit and principles in the present invention all, any amendment done, equivalent replacement, improvement etc., all should be included within protection scope of the present invention.
Claims (7)
1. pressure-decay method measures a method for orifice conductance, and the method comprises the following steps:
Step 1, tested aperture (5) is connected between upstream chamber (3) and downstream chamber (6); The exhaust pipe of downstream chamber (6) is provided with current limliting aperture (8);
Step 2, UNICOM bleed unit (10) and the exhaust pipe between upstream chamber (3) and downstream chamber (6), bleed to upstream chamber (3) and downstream chamber (6); Open upper absolute pressure formula capacitor thin film vacuum meter (2) connected of upstream chamber (3); When pressure in downstream chamber (6) is lower than 10
-2during the Pa order of magnitude, open the upper ultrahigh vacuum hot-cathode ionization gauge (7) connected of downstream chamber (6);
Step 3, start that uniform speed is carried out to upstream chamber (3) and downstream chamber (6) and to heat up baking, and keep a period of time in baking maximum temperature, uniform speed's cooling subsequently, temperature-fall period carries out degasification to ultrahigh vacuum hot-cathode ionization gauge (7), after continuing to be cooled to room temperature, stop baking; Continue to bleed until perform step 4 after the vacuum tightness that reaches capacity;
The exhaust pipe of step 4, cut-out upstream chamber (3), keeps the UNICOM of downstream chamber (6) exhaust pipe; UNICOM's upstream chamber (3), pipeline between tested aperture (5) and downstream chamber (6), after upstream chamber (3) pressure stability, return to zero to absolute pressure formula capacitor thin film vacuum meter (2);
Step 5, open the first vacuum valve (1) between source of the gas and upstream chamber (3), upstream room (3) are filled with test gas, needed for orifice conductance, test pressure regulates the aperture of the first vacuum valve (1), make upstream chamber (3) set up corresponding test pressure point according to by low-pressure to the order of high pressure, and record the indicating value p of absolute pressure formula capacitor thin film vacuum meter (2) at each test pressure point place
1and the indicating value p of ultrahigh vacuum hot-cathode ionization gauge (7)
2;
The indicating value p of step 6, absolute pressure formula capacitor thin film vacuum meter (2) obtained according to step 5 and ultrahigh vacuum hot-cathode ionization gauge (7)
1and p
2, the tested orifice conductance value C at each test pressure point place is calculated according to formula (1)
1;
In formula: C
2for current limliting orifice conductance value, α is the ratio that backflows.
2. the method for claim 1, is characterized in that, described formula (1) is reduced to:
The formula (2) that described step 6 obtains after adopting and simplifying carries out tested orifice conductance value C
1calculating.
3. the method for claim 1, is characterized in that, described final vacuum is 10
-8the Pa order of magnitude.
4. the method for claim 1, is characterized in that, the volume of described upstream chamber (3) is at least 1L.
5. the method for claim 1, is characterized in that, the measurement range of described ultrahigh vacuum hot-cathode ionization gauge (7) is 10
-9pa ~ 1Pa.
6. the method for claim 1, it is characterized in that, in step 3, the judgment mode that described degasification completes is: when upstream chamber (3) and downstream chamber (6) reach capacity vacuum tightness, the indicating value of monitoring ultrahigh vacuum hot-cathode ionization gauge (7), indicating value reduces again after raising, when the final value after reducing is lower than the initial value before rising, and final value is when tending to be steady, think that degasification completes.
7. method as claimed in claim 6, it is characterized in that, after described final value tends to be steady, first the degasification to ultrahigh vacuum hot-cathode ionization gauge (7) is stopped, and then the degasification of opening ultrahigh vacuum hot-cathode ionization gauge (7), if when now confirming that the indicating value of ultrahigh vacuum hot-cathode ionization gauge (7) does not change, then finally confirm that degasification completes.
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107389304A (en) * | 2017-08-14 | 2017-11-24 | 上海卫星装备研究所 | A kind of positive pressure measuring device of aperture water conservancy diversion and its measuring method |
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2014
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| CN107389304A (en) * | 2017-08-14 | 2017-11-24 | 上海卫星装备研究所 | A kind of positive pressure measuring device of aperture water conservancy diversion and its measuring method |
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Application publication date: 20150107 |