CN104238782A - Touch screen electrode preparation method - Google Patents
Touch screen electrode preparation method Download PDFInfo
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- CN104238782A CN104238782A CN201310225710.XA CN201310225710A CN104238782A CN 104238782 A CN104238782 A CN 104238782A CN 201310225710 A CN201310225710 A CN 201310225710A CN 104238782 A CN104238782 A CN 104238782A
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Abstract
The invention relates to a touch screen electrode preparation method. The touch screen electrode preparation method includes the following steps of generating a transparent conducting film layer on a transparent base material; generating a metal film layer on the transparent conducting film layer; patterning a combination film layer of the transparent conducting film layer and the metal film layer to generate a touch induction pattern and a metal lead wire pattern; generating a protection layer on the metal lead wire pattern; corroding the metal film layer in an area free of the protection layer. According to the touch screen electrode preparation method, a traditional photo process is abandoned, a simple lead wire protection and metal corrosion method is used for replacing traditional techniques of coating film sheltering and silver paste silk-screen printing, and the touch screen electrode preparation method is simple and efficient.
Description
Technical field
The present invention relates to touch-screen field, particularly a kind of preparation method of touch screen electrode.
Background technology
Touch-screen is a kind of input equipment, conveniently can realize the reciprocation of people and computing machine and other portable mobile apparatus.In recent years, based on the capacitance touch screen of tin indium oxide (ITO) transparent conductive film, particularly projecting type capacitor screen can carry out referring to identify more, realizes multi-point touch, is widely used in mobile interchange equipment, as smart mobile phone, and Portable tablet personal computer.
The manufacture craft of traditional touch-screen mainly contains " wet technique processed " and " drying technics " two kinds, so-called " wet technique processed " be exactly employing gold-tinted technique come etched touch shield needed for ITO and metal pattern; Its technical process is: first, and substrate deposits ITO, then adopts gold-tinted technique to etch ITO electrode pattern; Secondly, at transparent conductive film layer deposition last layer metal alloy film, metal pattern is etched by gold-tinted technique again; Moreover corresponding FPC is bound in pressing, so far a touch-screen has been prepared substantially; Finally can to fit respectively at the non-coated surface of substrate and circuit surface other rete (as electrostatic film, blow-out disc, double faced adhesive tape etc.), with the effect playing protection or match with corresponding application component.Drying technics is with the difference of wet technique processed the method etching electrode pattern on ITO and metallic diaphragm, and in drying technics, adopt laser technology etching ITO, metal pattern then adopts the modes such as serigraphy silver slurry or aluminium paste to complete.
The gold-tinted cumbersome adopted in wet technique processed, comprise printing peelable glue, exposure, develop, come unstuck, clean, acid corrosion, all multiple operation such as cleaning, therefore, this technique has the low and shortcomings such as equipment cost height of yields.And adopt screen printing mode to make to metallic circuit in drying technics process, its live width line-spacing is large, cause the area occupied of metal routing too large, this and current market demand trend are runed counter to, and material cost is too high, printing precision requires too high, seriously constrain product yield and production capacity, production cost is higher.
Summary of the invention
The object of the invention is to overcome problems of the prior art, a kind of preparation method of touch screen electrode is provided.
The present invention is achieved in that a kind of preparation method of touch screen electrode, and described method comprises the steps: to generate a transparent conductive film layer over the transparent substrate; Described transparent conductive film layer generates a metallic diaphragm; Patterning is carried out to the composite film of described transparent conductive film layer and metallic diaphragm, generates touch-control sensing electrode pattern and metal lead-outs pattern; Described metal lead-outs pattern generates a protective seam; And erode the metallic diaphragm of unprotect layer region.
Preferably, the material of described transparent conductive film layer is macromolecule transparent conductive material, comprise ITO, AZO, BZO, GZO, Graphene one or more.
Preferably, transparent conductive film layer generates for adopting magnetron sputtering plating, evaporation coating or chemical vapour deposition technique by the described transparent conductive film layer that generates over the transparent substrate over the transparent substrate.
Preferably, the described transparent conductive film layer that generates over the transparent substrate is that employing is shifted, transparent conductive film layer generates by attaching Graphene method over the transparent substrate.
Preferably, the described transparent conductive film layer that generates over the transparent substrate is that employing applies, transparent conductive film layer generates by the method for printing over the transparent substrate.
Preferably, described transparent conductive film layer generates a metallic diaphragm generated on transparent conductive film layer by metallic diaphragm for adopting sputter deposition method, evaporation coating method or electrochemical plating, the metal material of described formation metallic diaphragm is aluminium, silver, copper or its alloy film.
Preferably, the described composite film to described transparent conductive film layer and metallic diaphragm carries out patterning, generation touch-control sensing electrode pattern and metal lead-outs pattern make touch-control sensing electrode pattern for adopting laser or mechanical scratching, transparent conductive film layer and metallic diaphragm is saturating in the same time, disposable generation touch-control sensing electrode pattern.
Preferably, the described protective seam that generates on described metal lead-outs pattern is for printing or being coated on metal lead-outs pattern.
Preferably, the metallic diaphragm eroding unprotect layer region described in adopts mordant and described mordant Acidity of Aikalinity corresponding with described metal film.
Preferably, described touch screen electrode can be single drive electrode, single induction electrode or comprises the individual layer combination electrode of drive electrode and induction electrode.
The present invention has the following advantages:
Adopt nesa coating touch control electrode pattern and metal lead-outs pattern to complete simultaneously, obviate the shortcoming of gold-tinted technique; After electrode pattern completes, do a protective seam above metal lead-outs pattern, adopt special corrosion treatment mode, remove the metallic diaphragm on nesa coating Touch Zone, safe and reliable, yields is high.
Accompanying drawing explanation
Fig. 1 is present invention process schematic flow sheet;
Fig. 2 is that the present invention delineates composite membrane planimetric map;
Fig. 3 is protective seam of the present invention printing planimetric map;
Fig. 4 is PIN district of the present invention protective tapes planimetric map.
Embodiment
In order to make object of the present invention, technical scheme and advantage clearly understand, below in conjunction with drawings and Examples, the present invention is further elaborated.Should be appreciated that specific embodiment described herein only in order to explain the present invention, be not intended to limit the present invention.
The preparation method of touch screen electrode as shown in figures 1-4, comprises the steps: to generate a transparent conductive film layer over the transparent substrate; Described transparent conductive film layer generates a metallic diaphragm; Patterning is carried out to the composite film of described transparent conductive film layer and metallic diaphragm, generates touch-control sensing electrode pattern and metal lead-outs pattern; Described metal lead-outs pattern generates a protective seam; And erode the metallic diaphragm of unprotect layer region.
The described transparent conductive film layer that generates over the transparent substrate is for adopting magnetron sputtering plating, evaporation coating or chemical vapour deposition technique, being generated over the transparent substrate by transparent conductive film layer.The described transparent conductive film layer that generates over the transparent substrate is that employing is shifted, transparent conductive film layer generates by attaching Graphene method over the transparent substrate.The described transparent conductive film layer that generates over the transparent substrate is that employing applies, transparent conductive film layer generates by the method for printing over the transparent substrate.Described transparent conductive film layer generates a metallic diaphragm generated on transparent conductive film layer by metallic diaphragm for adopting sputter deposition method, evaporation coating method or electrochemical plating, the metal material of described formation metallic diaphragm is aluminium, silver, copper or its alloy film.The described composite film to described transparent conductive film layer and metallic diaphragm carries out patterning, generation touch-control sensing electrode pattern and metal lead-outs pattern make touch-control sensing electrode pattern for adopting laser or mechanical scratching, transparent conductive film layer and metallic diaphragm is saturating in the same time, disposable generation touch-control sensing electrode pattern.The described protective seam that generates on described metal lead-outs pattern is for printing or being coated on metal lead-outs pattern.The described metallic diaphragm eroding unprotect layer region adopts mordant and described mordant Acidity of Aikalinity corresponding with described metal film.Described touch screen electrode can be single drive electrode, single induction electrode or comprises the individual layer combination electrode of drive electrode and induction electrode.
The present invention is introduced in detail below in conjunction with specific embodiment.
Embodiment one
1, see Fig. 1 a, Fig. 2, prepare panel layer 1 with single substrate, the surrounding on single substrate forms non-viewfinder area 11, and the zone line that non-viewfinder area surrounds is window touch area 12.
Single substrate of the present invention can select glass, thickness 0.4mm ~ 1.2mm, preferred 0.7mm ± 0.1mm and 1.1mm ± 0.1mm and 0.55mm ± 0.1mm.In a particular embodiment, described single substrate is monolithic panel glass, and its thickness is 0.7mm, through chemicosolidifying process, makes the hardened face glass sheet that skin hardness is greater than more than 6H.Cleaning rear surface becomes the transparent window touch area 12 in the non-viewfinder area 11 of surrounding ink and central authorities through ink silk screen printing, and adopt high temperature ink, twice half tone silk-screen, thickness is 0.005 ~ 0.02mm; Ink is through excess temperature 200 ~ 250 DEG C annealing, and the time is 20 ~ 120 minutes, becomes and LOGO and keyboard etc. can be with to decorate hardened face glass sheet.
2, see Fig. 1 b, Fig. 2, Fig. 3, panel layer 1 generates layer of transparent conductive membrane layer 2, cover 12nd district or whole window touch area 12 and non-form ink area 11; The material of transparent conductive film layer 2 can select one or more of the transparent polymer such as ITO, AZO, BZO, FTO or Graphene conductive material.
In a particular embodiment, described transparent conductive film layer 2, material is ITO, and adopt sputtering technology to be prepared on the surface of described single substrate, cover whole window touch area 12 and non-form ink area 11, ito film is thick is 100 dust ~ 500 dusts.
3, see Fig. 1 c, Fig. 2, Fig. 3, transparent conductive film layer generates metallic diaphragm 3, cover window touch area 12 and non-form ink area 11; Metallic diaphragm 3 can be aluminium, silver, copper or its alloy film, also can be the composite metal retes such as MoNb/Al/MoNb, Al/MoNb, NiCu/Al/NiCu, Ti/Al/Ti, Al/Ti, MoNb/Cu/MoNb, Cu/MoNb, NiCu/Cu/NiCu, Ti/Cu/Ti, Cu/Ti.
In a particular embodiment, described metallic diaphragm 3, its metal material is Cu/MoNb composite metal rete, adopts sputtering technology to be prepared on the surface of described transparent conductive film layer 2, and covers whole window touch area 12 and non-form ink area 11.The present invention's depositing metal membrane layer 3 immediately after deposition of transparent conductive film layer 2 on the substrate of touch-screen, transparent conductive film layer 2 does not need to do to cover after depositing, and saves processing step and produces material;
4, see Fig. 1 d, Fig. 2, patterning is carried out to the composite film of transparent conductive film layer 2 and metal film 3 layers, generate and comprise touch control line pattern 21 and metal lead-outs road pattern 22; Usual employing laser grooving and scribing mode or machinery line delineation mode delineate electrode pattern.
In a particular embodiment, adopt laser grooving and scribing mode etching pattern, laser directly carves ITO/ metal composite rete, completes touch control line pattern 21 and metal lead-outs pattern 22 simultaneously; Touch pattern adopts triangle pattern, laser width 20 ~ 60um.
5, see Fig. 1 e, Fig. 3, the metal lead-outs pattern delineated generates a protective seam 4, and protective seam is not corroded mainly for the protection of metal lead-outs road; Its material can be other coatings of ink, photoresistance glue or resistance to acid attack; It can be printing or be coated in above metallic circuit.
In a particular embodiment, on metal lead-outs, serigraphy one deck ink does protective seam 4, adopts the half tone of 420 orders, tension force 32N, ink thickness 5 ~ 10um.The metallic circuit in PIN region abdicates not printing ink.
6, see Fig. 1 f, Fig. 2, Fig. 3, Fig. 4, adopt mordant to be corroded totally by the metallic diaphragm 3 of unprotect layer overlay area, and do not hurt the transparent conductive film layer 2 below metallic diaphragm 3; This mordant is corresponding with metallic diaphragm 3 used, can be acid also can be alkaline;
In a particular embodiment, be attached to easily tearing not cull adhesive tape 5 the PIN region (see figure 4) protected without ink.Adopt the acid mixed solutions such as hydrochloric acid, sulfuric acid, sulfate to be corrosive liquid, touch control electrode panel is put into corrosive liquid, normal temperature corrosion 3 ~ 5min.After corrosion, after cleaning, drying process is carried out to contact panel, the protective tapes 5 of PIN of tearing.
The foregoing is only preferred embodiment of the present invention, not in order to limit the present invention, all any amendments done within the spirit and principles in the present invention, equivalent replacement and improvement etc., all should be included within protection scope of the present invention.
Claims (10)
1. a preparation method for touch screen electrode, is characterized in that, described method comprises the steps:
Generate a transparent conductive film layer over the transparent substrate;
Described transparent conductive film layer generates a metallic diaphragm;
Patterning is carried out to the composite film of described transparent conductive film layer and metallic diaphragm, generates touch-control sensing electrode pattern and metal lead-outs pattern;
Described metal lead-outs pattern generates a protective seam; And
Erode the metallic diaphragm of unprotect layer region.
2. the preparation method of touch screen electrode according to claim 1, it is characterized in that, the material of described transparent conductive film layer is macromolecule transparent conductive material, comprise ITO, AZO, BZO, GZO, Graphene one or more.
3. the preparation method of touch screen electrode according to claim 1, it is characterized in that, the described transparent conductive film layer that generates over the transparent substrate is for adopting magnetron sputtering plating, evaporation coating or chemical vapour deposition technique, being generated over the transparent substrate by transparent conductive film layer.
4. the preparation method of touch screen electrode according to claim 1, is characterized in that, described generate over the transparent substrate a transparent conductive film layer for adopting transfer, attach Graphene method transparent conductive film layer generated over the transparent substrate.
5. the preparation method of touch screen electrode according to claim 1, is characterized in that, described generate over the transparent substrate a transparent conductive film layer be adopt coating, transparent conductive film layer generates by the method for printing over the transparent substrate.
6. the preparation method of touch screen electrode according to claim 1, it is characterized in that, described transparent conductive film layer generates a metallic diaphragm generated on transparent conductive film layer by metallic diaphragm for adopting sputter deposition method, evaporation coating method or electrochemical plating, the metal material of described formation metallic diaphragm is aluminium, silver, copper or its alloy film.
7. the preparation method of touch screen electrode according to claim 1, it is characterized in that, the described composite film to described transparent conductive film layer and metallic diaphragm carries out patterning, generation touch-control sensing electrode pattern and metal lead-outs pattern make touch-control sensing electrode pattern for adopting laser or mechanical scratching, transparent conductive film layer and metallic diaphragm is saturating in the same time, disposable generation touch-control sensing electrode pattern.
8. the preparation method of touch screen electrode according to claim 1, is characterized in that, the described protective seam that generates on described metal lead-outs pattern is for printing or be coated on metal lead-outs pattern.
9. the preparation method of touch screen electrode according to claim 1, is characterized in that, described in erode unprotect layer region metallic diaphragm adopt mordant and described mordant Acidity of Aikalinity corresponding with described metal film.
10. according to the preparation method of the arbitrary described touch screen electrode of claim 1-9, it is characterized in that, described touch screen electrode can be single drive electrode, single induction electrode or comprises the individual layer combination electrode of drive electrode and induction electrode.
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| CN201310225710.XA CN104238782A (en) | 2013-06-07 | 2013-06-07 | Touch screen electrode preparation method |
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| US20150199049A1 (en) * | 2014-01-13 | 2015-07-16 | Lg Innotek Co., Ltd. | Touch window and touch device including the same |
| CN105302400A (en) * | 2015-11-12 | 2016-02-03 | 昆山群安电子贸易有限公司 | Capacitive screen and manufacturing method thereof |
| CN105446564A (en) * | 2015-11-12 | 2016-03-30 | 昆山群安电子贸易有限公司 | Capacitive screen and manufacturing method therefor |
| CN105677127A (en) * | 2016-03-15 | 2016-06-15 | 江苏宇天港玻新材料有限公司 | Touch screen induction layer frame wire and forming process thereof |
| CN106155416A (en) * | 2016-07-07 | 2016-11-23 | 无锡格菲电子薄膜科技有限公司 | A kind of composite membrane touch sensing and preparation method thereof |
| CN106168867A (en) * | 2016-07-21 | 2016-11-30 | 武汉华星光电技术有限公司 | Capacitance plate and preparation method thereof |
| CN106249974A (en) * | 2016-07-28 | 2016-12-21 | 深圳市骏达光电股份有限公司 | Capacitive touch screen silver slurry circuit typography |
| CN107230539A (en) * | 2016-03-25 | 2017-10-03 | 昆山厚声电子工业有限公司 | Flat electrode arrangement resistor and its manufacture craft |
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| US10303292B2 (en) | 2014-01-13 | 2019-05-28 | Lg Innotek Co., Ltd. | Touch window and touch device including the same |
| US20150199049A1 (en) * | 2014-01-13 | 2015-07-16 | Lg Innotek Co., Ltd. | Touch window and touch device including the same |
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| US9898125B2 (en) * | 2014-01-13 | 2018-02-20 | Lg Innotek Co., Ltd. | Touch window and touch device including the same |
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| CN105302400A (en) * | 2015-11-12 | 2016-02-03 | 昆山群安电子贸易有限公司 | Capacitive screen and manufacturing method thereof |
| CN105446564A (en) * | 2015-11-12 | 2016-03-30 | 昆山群安电子贸易有限公司 | Capacitive screen and manufacturing method therefor |
| CN105446564B (en) * | 2015-11-12 | 2019-06-14 | 昆山群安电子贸易有限公司 | The manufacturing method of capacitance plate |
| CN105302400B (en) * | 2015-11-12 | 2019-04-12 | 昆山群安电子贸易有限公司 | Capacitance plate and its manufacturing method |
| CN105677127A (en) * | 2016-03-15 | 2016-06-15 | 江苏宇天港玻新材料有限公司 | Touch screen induction layer frame wire and forming process thereof |
| CN107230539A (en) * | 2016-03-25 | 2017-10-03 | 昆山厚声电子工业有限公司 | Flat electrode arrangement resistor and its manufacture craft |
| CN106155416A (en) * | 2016-07-07 | 2016-11-23 | 无锡格菲电子薄膜科技有限公司 | A kind of composite membrane touch sensing and preparation method thereof |
| CN106155416B (en) * | 2016-07-07 | 2019-05-07 | 无锡第六元素电子薄膜科技有限公司 | A kind of composite membrane touch sensing and preparation method thereof |
| CN106168867A (en) * | 2016-07-21 | 2016-11-30 | 武汉华星光电技术有限公司 | Capacitance plate and preparation method thereof |
| CN106249974A (en) * | 2016-07-28 | 2016-12-21 | 深圳市骏达光电股份有限公司 | Capacitive touch screen silver slurry circuit typography |
| CN106249974B (en) * | 2016-07-28 | 2019-11-15 | 深圳市骏达光电股份有限公司 | Capacitive touch screen silver paste route printing technology |
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Application publication date: 20141224 |