CN104183523A - Isolated spraying device of two types of gases - Google Patents

Isolated spraying device of two types of gases Download PDF

Info

Publication number
CN104183523A
CN104183523A CN201410370639.9A CN201410370639A CN104183523A CN 104183523 A CN104183523 A CN 104183523A CN 201410370639 A CN201410370639 A CN 201410370639A CN 104183523 A CN104183523 A CN 104183523A
Authority
CN
China
Prior art keywords
hole
gas
shower tray
face component
tray face
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201410370639.9A
Other languages
Chinese (zh)
Inventor
吴凤丽
苏欣
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Piotech Inc
Original Assignee
Piotech Shenyang Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Piotech Shenyang Co Ltd filed Critical Piotech Shenyang Co Ltd
Priority to CN201410370639.9A priority Critical patent/CN104183523A/en
Publication of CN104183523A publication Critical patent/CN104183523A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

An isolated spraying device of two types of gases aims at solving the problems that the cost is high, the processing period is long and waste products tend to appear in the prior art. The spraying device comprises an air inlet flange, a gas separating part, a sidewall and a spraying disk part, and is internally provided with two gas channels isolated from each other, wherein two gas inlets for the two types of gases are arranged at the upper end of the gas separating part, the two channels extend to the edge of the gas separating part, the longer gas channel directly extends into a cavity, formed by the gas separating part and the spraying disk part, of the spraying device, the shorter gas channel communicates with multiple channels that are not completely drilled and formed in a radial shape in the spraying disk part, the air inlet flange and the gas separating part serve as a first portion, the sidewall and the spraying disk part serve as a second portion, and the welded first and second portions are soldered so that holes A and holes C of the gas separating part are communicated in one to one correspondence and all holes B are communicated with an interlayer formed by the spraying disk part and the sidewall. The isolated spraying device employs a common machine-tooled manner, the two types of gases can be isolated and sprayed according to technical requirements, and the isolated spraying device is mainly applied to semiconductor film plating equipment.

Description

Two kinds of gas barrier formula spray equipments
Technical field
The present invention relates to the spray equipment that a kind of semiconductor coated film equipment adopts.In this spray equipment, by two kinds of gas autonomous channels are set, realize two kinds of gases before flowing out spray equipment mutually isolation flow, and flow out spray equipment simultaneously and carry out coating process process, the invention belongs to semiconductive thin film deposition applications and manufacturing technology field.
Background technology
Existing semiconductor coated film equipment, because often need two or more gases to pass into cavity in technical process simultaneously, react, but pass into before cavity at described two or more gases, when described two or more gases are in the spray equipment being entered by different pipelines, can not meet, if meet, can be at the inner chemical reaction that occurs of spray equipment, cause described two or more gases that chemical reaction occurs before entering cavity and generate other single kinds or number of chemical material and lose described two or more gases as the chemical property of technological reaction thing, and because of the mostly be granular accessory substance of described two or more gases in the inner antedating response formation of spray equipment, make wafer or other forms of thin-film carrier surface with particle, form the defect of product, cause the yields of product greatly to reduce.For reaching current atom layer deposition process requirement, people have proposed the rear mixing spray equipment of various ways, but, these spray equipments adopt sandwich construction to form the gas passage of mutual isolation more, and between each laminate, weld the intensive parts such as air guide post, or, in the mode of an enterprising line cutting of part, form mezzanine space and air guide post.When welding sandwich construction, must carry out soldering repeatedly, the soldering of repeatedly melting down before easily making it that repeatedly soldering causes is melted, the air-tightness that affects spray equipment is also difficult to ensure that demonstrate,proving each gas passage of mutually isolating isolates completely, the processing mode of line cutting requires a great deal of time, and need to change continually the cutting filament breaking.This just causes the processing cost of spray equipment, and process-cycle, scrappage increase greatly.
Summary of the invention
The present invention be take and addressed the above problem as object, mainly solves that the processing cost that prior art exists is high, the process-cycle long and easily occurs the problem of waste product.
For achieving the above object, the present invention adopts following technical proposals: two kinds of gas barrier formula spray equipments, comprise inlet flange, minute gas parts, sidewall and four parts of shower tray face component.Described spray equipment inside is provided with two gas passages of mutual isolation, and two gas accesses of two kinds of gases are arranged on a minute upper end for gas parts.Described minute gas parts are circular tabular, portion is provided with and replaces radial some gas passages adjacent and that length is different within it, described, replace in radial some gas passages adjacent and that length is different, longer gas passage is started to extend by a minute gas parts center, and shorter gas passage is by slightly starting to extend away from the position of dividing gas parts center.Two kinds of described passages all extend to a minute edge for gas parts.Difference is: longer gas passage directly leads in the cavity of the spray equipment being formed by minute gas parts and shower tray face component, and shorter gas passage communicates with radial some ducts of not boring of one-tenth radially in shower tray face component.Below described some ducts of not boring in described shower tray face component, half through hole of processing one row or different array way.Between described some ducts of not boring in described shower tray face component, process some through holes, described through hole communicates with the cavity of spray equipment.Above-mentioned through hole and half through hole are all drilled in shower tray face component, quantity and the position in radial some ducts of not boring of one-tenth radially in shower tray face component, arranging and array format of through hole and half through hole is uniformly distributed the through hole of shower tray face component and half through hole as far as possible.Like this, the first gas is entered by the first entrance of minute gas parts center of spray equipment, edge flowing along longer gas passage to minute gas parts in minute gas parts, arrive behind the edge of minute gas parts, enter in the cavity of minute gas parts and the formation of shower tray face component, then some through holes of processing between the some ducts of not boring by air distribution disk face flow out.The second gas is entered by the second entrance of minute gas parts center of spray equipment, edge flowing along shorter gas passage to minute gas parts in minute gas parts, arrive behind the edge of minute gas parts, enter in minute gas blowout tray face component in the radial some ducts of not boring of one-tenth radially, then row that bore from the radial below, some ducts of not boring of one-tenth radially or flow out without half through hole of array way.
Beneficial effect of the present invention and feature:
The present invention adopts the form of several simple components welding, and, every kind of parts all adopt turning common in industry, milling, brill etc. to remove the processing mode of material, realize the desired two kinds of gases of technique and mutually isolated spray function, shortened the process-cycle of spray equipment, reduced processing cost and scrappage, the reliability of spray equipment is guaranteed.
Accompanying drawing explanation
Fig. 1 is of the present invention minute gas parts front view.
Fig. 2 is the left view of Fig. 1.
Fig. 3 is the cutaway view of B-B in Fig. 2.
Fig. 4 is the revolved sectional view of A-A in Fig. 1.
Fig. 5 is the front view of shower tray face component parts of the present invention.
Fig. 6 is the revolved sectional view of C-C in Fig. 5.
Fig. 7 is structural representation of the present invention.
Fig. 8 is the revolved sectional view of D-D in Fig. 7.
Embodiment
With reference to Fig. 1-Fig. 4, minute gas parts 1 for spray equipment are circular tabular, and there is step cutting pattern at plectane center, processes circular hole 4 on step cutting pattern, and circular hole 4 does not bore.In circular hole 4 outsides, process an annular groove 2, open some mounting holes 3 of circumference array at the bottom land of annular groove 2, mounting hole 3 does not bore.Dividing the edge of gas parts 1 to center position, radially, bore some slotted hole A 6, slotted hole A 6 is drilled in mounting hole 3, the quantity Matching of above-mentioned slotted hole A 6 and mounting hole 3.Dividing the edge of gas parts 1 to center position, radially, bore some slotted hole B 7, slotted hole B 7 is drilled in circular hole 4.Above-mentioned slotted hole A 6 and slotted hole B 7 alternately adjacent, radially, be distributed in minute gas parts 1.The aperture of above-mentioned slotted hole A 6, slotted hole B 7 is consistent, and is provided with the plug 5 matching with it, plug 5 shutoff slotted hole A 6, slotted hole B 7 in the edge of minute gas parts 1.On the axis direction of minute gas parts 1, bore uniform some hole A 8, A 8 positions in hole are slotted hole A 6 lower ends approaching minute gas parts 1 edge, hole A 8 communicates one by one with slotted hole A 6.
On the axis direction of minute gas parts 1, bore uniform some hole B 9, B 9 positions in hole are slotted hole B 7 lower ends the edge that approaches minute gas parts 1, hole B 9 communicates one by one with slotted hole B 7.
With reference to Fig. 5-Fig. 6, the shower tray face component 10 of spray equipment is circular tabular, and there is annular boss 11 in plectane edge, and there is edge 12 in the outside of annular boss 11.The some gussets 15 of radial distribution in shower tray face component 10, gusset 15 joins with the root of annular boss 11.From the lateral wall of annular boss 11, along gusset 15, bore uniform radially long blind hole 16, bore some hole C 14 on the end face of annular boss 11, hole C 14 communicates with long blind hole 16.In direction below long blind hole 16 in all gussets 15 and perpendicular to long blind hole 16 axis, bore a row spray aperture A17.Above-mentioned long blind hole 16 is provided with the plug A 19 matching with it in one end of annular boss 11 lateral walls, plug A 19 blocks long blind hole 16.On annular boss 11 lateral walls and avoid some hole C 14 of being drilled with on the end face of annular boss 11,, between every two hole C 14, radially in shower tray face component 10, bore perpendicular row holes 18.Avoid all gussets 15,, between each gusset 15 in shower tray face component 10, evenly bore some spray apertures 13.
With reference to Fig. 7-Fig. 8, two kinds of gas barrier formula spray equipments, are mainly comprised of inlet flange 20, minute gas parts 1, sidewall 25,10 4 parts of shower tray face component.At the upper end of minute gas parts 1 welding inlet flange 20, inlet flange 20 is by ring-shaped groove 2 sealings.Air inlet A 21 and air inlet B 22 are set on inlet flange 20, and air inlet A 21 communicates with the circular hole 4 of minute gas parts 1, and air inlet B 22 communicates with ring-shaped groove 2, and above-mentioned inlet flange 20 and minute gas parts 1 just become first part.The external diameter of sidewall 25 equates with the external diameter at the edge 12 of shower tray face component 10, the height of sidewall 25 equates with the height of the annular boss 11 of shower tray face component 10, sidewall is welded on the edge 12 of shower tray face component 10, sidewall 25 just becomes the second part with shower tray face component 10.Two parts after welding are brazed together, the hole A 8 of minute gas parts 1 is communicated one by one with hole C 14, the interlayer 23 of institute's porose B 9 and shower tray face component 10 and sidewall 25 formation is communicated, above-mentioned minute gas parts 1 and shower tray face component 10 formation cavitys 24.Like this, the first gas enters spray equipment from the air inlet A 21 of inlet flange 20, in the circular hole 4 of minute gas parts 1, start to flow into all slotted hole B 7, in slotted hole B 7, flow to the edge of minute gas parts 1, because meeting with plug 5, so from porose B 9 enter the interlayer 23 that shower tray face component 10 and sidewall 25 form, the more all perpendicular row hole 18 from annular boss 11 enters into cavity 24, finally from spray aperture 13, flows out spray equipments.The second gas enters spray equipment from the air inlet 22 of inlet flange 20, interior the flowing of ring-shaped groove 2 at minute gas parts 1, enter all mounting holes 3, all slotted hole A 6 that process communicates with all mounting holes 3 again, flow to the edge of minute gas parts 1, because meeting with plug 5, so from porose A 8 enter with all communicate one by one with hole A 8 institute porose C 14, finally, because meeting with plug A 19, so enter long blind hole 16 inside of boring in all gussets 15, flow in center towards shower tray face component 10, in flow process, from the spray aperture A 17 of long blind hole 16 belows, flow out spray equipment.

Claims (5)

1. two kinds of gas barrier formula spray equipments, comprise inlet flange, divide gas parts, sidewall and shower tray face component, it is characterized in that: described spray equipment inside is provided with two gas passages of mutual isolation, two gas accesses of two kinds of gases are arranged on a minute upper end for gas parts, described minute gas parts are circular tabular, portion is provided with and replaces radial some gas passages adjacent and that length is different within it, described, replace in radial some gas passages adjacent and that length is different, longer gas passage is started to extend by a minute gas parts center, shorter gas passage is by slightly starting to extend away from the position of dividing gas parts center, two kinds of described passages all extend to a minute edge for gas parts, longer gas passage directly leads in the cavity of the spray equipment being formed by minute gas parts and shower tray face component, shorter gas passage communicates with radial some ducts of not boring of one-tenth radially in shower tray face component, below some ducts of not boring in described shower tray face component, half through hole of processing one row or different array way, between described some ducts of not boring in described shower tray face component, process some through holes, described through hole communicates with the cavity of spray equipment, above-mentioned through hole and half through hole are all drilled in shower tray face component, adjust in shower tray face component quantity and the position in the radial some ducts of not boring of one-tenth radially, arranging and array format of through hole and half through hole, through hole and half through hole of shower tray face component are uniformly distributed.
2. two kinds of gas barrier formula spray equipments as claimed in claim 1, it is characterized in that: there is step cutting pattern at the plectane center of described minute gas parts, on step cutting pattern, process circular hole, circular hole does not bore, at circular hole outside processing one annular groove, at the bottom land of annular groove, open some mounting holes of circumference array, mounting hole does not bore, dividing the edge of gas parts to center position, radially, bore some slotted hole A, slotted hole A is drilled in mounting hole, the quantity Matching of above-mentioned slotted hole A and mounting hole, dividing the edge of gas parts to center position, radially, bore some slotted hole B, slotted hole B is drilled in circular hole, above-mentioned slotted hole A and slotted hole B are alternately adjacent, radially, be distributed on minute gas parts.
3. two kinds of gas barrier formula spray equipments as claimed in claim 2, it is characterized in that: described slotted hole A, the aperture of slotted hole B is consistent, and be provided with in the edge of minute gas parts the plug matching with it, plug shutoff slotted hole A, slotted hole B7, on the axis direction of minute gas parts, bore uniform some hole A, A position, hole is slotted hole A lower end and approaches a minute gas edge-of-part, hole A communicates one by one with slotted hole A, on the axis direction of minute gas parts, bore uniform some hole B, B position, hole is slotted hole B lower end the edge that approaches minute gas parts, hole B communicates one by one with slotted hole B.
4. two kinds of gas barrier formula spray equipments as claimed in claim 1, it is characterized in that: there is annular boss in the plectane edge of described shower tray face component, there is edge in the outside of annular boss, the some gussets of radial distribution in shower tray face component, the root of gusset and annular boss joins, from the lateral wall of annular boss, along gusset, bore uniform radially long blind hole, on the end face of annular boss, bore some hole C, hole C communicates with long blind hole, in direction below long blind hole in all gussets and perpendicular to long blind hole axis, bore a row spray aperture A, above-mentioned long blind hole is provided with the plug A matching with it in one end of annular boss lateral wall, plug A blocks long blind hole, on annular boss lateral wall and avoid some hole C of being drilled with on the end face of annular boss, between every two hole C, radially in shower tray face component, bore a perpendicular row hole, avoid all gussets, between each gusset in shower tray face component, evenly bore some spray apertures.
5. two kinds of gas barrier formula spray equipments as described in claim 1 or 2 or 4, it is characterized in that: the upper end welding inlet flange of described minute gas parts, inlet flange seals ring-shaped groove, air inlet A and air inlet B are set on inlet flange, air inlet A communicates with the circular hole of minute gas parts, air inlet B communicates with ring-shaped groove, above-mentioned inlet flange and minute gas parts just become first part, the external diameter of sidewall equates with the external diameter at the edge of shower tray face component, the height of sidewall equates with the height of the annular boss of shower tray face component, sidewall is welded on the edge of shower tray face component, sidewall and shower tray face component just become the second part, two parts after welding are brazed together, the hole A of minute gas parts is communicated one by one with hole C, make the interlayer that forms of porose B and shower tray face component and sidewall communicate, above-mentioned minute gas parts and shower tray face component form cavity.
CN201410370639.9A 2014-07-30 2014-07-30 Isolated spraying device of two types of gases Pending CN104183523A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201410370639.9A CN104183523A (en) 2014-07-30 2014-07-30 Isolated spraying device of two types of gases

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201410370639.9A CN104183523A (en) 2014-07-30 2014-07-30 Isolated spraying device of two types of gases

Publications (1)

Publication Number Publication Date
CN104183523A true CN104183523A (en) 2014-12-03

Family

ID=51964470

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201410370639.9A Pending CN104183523A (en) 2014-07-30 2014-07-30 Isolated spraying device of two types of gases

Country Status (1)

Country Link
CN (1) CN104183523A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115161617A (en) * 2022-09-08 2022-10-11 拓荆科技(上海)有限公司 Gas distribution structure and vapor deposition equipment
CN115505904A (en) * 2022-10-27 2022-12-23 拓荆科技股份有限公司 Spray set of many gas flow channel

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115161617A (en) * 2022-09-08 2022-10-11 拓荆科技(上海)有限公司 Gas distribution structure and vapor deposition equipment
CN115161617B (en) * 2022-09-08 2023-01-13 拓荆科技(上海)有限公司 Gas distribution structure and vapor deposition equipment
CN115505904A (en) * 2022-10-27 2022-12-23 拓荆科技股份有限公司 Spray set of many gas flow channel
CN115505904B (en) * 2022-10-27 2023-11-24 拓荆科技股份有限公司 Spray set of many air current passageway

Similar Documents

Publication Publication Date Title
CN104195525B (en) Two kinds of independent uniformly jet spray equipments of gas
TWI759741B (en) Gas distribution showerhead for semiconductor processing
CN107075670B (en) Monolithic gas distribution manifold and a variety of construction technologies and its use case
CN104183523A (en) Isolated spraying device of two types of gases
RU2531391C2 (en) Extrusion tool for pipe extrusion
TW201419403A (en) Chemical control features in wafer process equipment
CN107454730A (en) Plasma arc cutting systems and relevant operation method including the ring that circles round
JP2012102732A5 (en)
US20170115072A1 (en) Heat exchangers
JP7179972B2 (en) Chamber intake structure and reaction chamber
CN104178749A (en) Two-gas isolate type central uniform gas dividing and spraying device
CN104087912A (en) Gas distributor for CVD reactor
JP7124213B2 (en) Gas Intake Device and Atomic Layer Deposition Apparatus for Atomic Layer Deposition Process
CN204138763U (en) Three kinds of even air chamber spray equipments of gas barrier formula list
CN113330142A (en) Gas inlet device for a CVD reactor
CN101770933A (en) Plasma process equipment and gas distribution device thereof
CN104103483B (en) A kind of inlet duct and plasma processing device
CN204134774U (en) Three kinds of two even air chamber spray equipments of gas barrier formula
CN104498905A (en) Top gas-intaking disc for reaction chamber of metal-organic compound chemical vapor deposition equipment
CN205258600U (en) Gas device is spared to combined type
US20200009588A1 (en) Low-flow emitter
CN206591176U (en) Atmosphere isolation device between a kind of multi-chamber
US20020086071A1 (en) Extrusion head for extruding a tube-shaped strand from at least one thermoplastic melt for producing blown films
EP4169056A1 (en) Nebuliser outlet
CN107110100A (en) Fuel injection device nozzle plate

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20141203

WD01 Invention patent application deemed withdrawn after publication