CN104150767B - The composition of alkaline earth aluminates glass substrate - Google Patents
The composition of alkaline earth aluminates glass substrate Download PDFInfo
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- CN104150767B CN104150767B CN201310378658.1A CN201310378658A CN104150767B CN 104150767 B CN104150767 B CN 104150767B CN 201310378658 A CN201310378658 A CN 201310378658A CN 104150767 B CN104150767 B CN 104150767B
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- 239000011521 glass Substances 0.000 title claims abstract description 107
- 239000000758 substrate Substances 0.000 title claims abstract description 47
- 239000000203 mixture Substances 0.000 title claims abstract description 19
- 150000004645 aluminates Chemical class 0.000 title claims abstract description 17
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 22
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 15
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims abstract description 14
- 229910052681 coesite Inorganic materials 0.000 claims abstract description 14
- 229910052593 corundum Inorganic materials 0.000 claims abstract description 14
- 229910052906 cristobalite Inorganic materials 0.000 claims abstract description 14
- 229910052682 stishovite Inorganic materials 0.000 claims abstract description 14
- 229910052905 tridymite Inorganic materials 0.000 claims abstract description 14
- 229910001845 yogo sapphire Inorganic materials 0.000 claims abstract description 14
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum oxide Inorganic materials [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 claims abstract description 9
- 229910001404 rare earth metal oxide Inorganic materials 0.000 claims description 7
- KTUFCUMIWABKDW-UHFFFAOYSA-N oxo(oxolanthaniooxy)lanthanum Chemical compound O=[La]O[La]=O KTUFCUMIWABKDW-UHFFFAOYSA-N 0.000 claims description 5
- GOLCXWYRSKYTSP-UHFFFAOYSA-N Arsenious Acid Chemical compound O1[As]2O[As]1O2 GOLCXWYRSKYTSP-UHFFFAOYSA-N 0.000 abstract description 9
- 230000004927 fusion Effects 0.000 abstract description 7
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Inorganic materials O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 abstract description 4
- 150000001875 compounds Chemical class 0.000 abstract description 4
- 238000011161 development Methods 0.000 abstract description 4
- 229910052788 barium Inorganic materials 0.000 abstract description 2
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 abstract description 2
- 229910001385 heavy metal Inorganic materials 0.000 abstract description 2
- ODINCKMPIJJUCX-UHFFFAOYSA-N Calcium oxide Chemical compound [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 20
- IATRAKWUXMZMIY-UHFFFAOYSA-N strontium oxide Inorganic materials [O-2].[Sr+2] IATRAKWUXMZMIY-UHFFFAOYSA-N 0.000 description 13
- 239000000292 calcium oxide Substances 0.000 description 11
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 8
- 229920005591 polysilicon Polymers 0.000 description 8
- QHGNHLZPVBIIPX-UHFFFAOYSA-N tin(II) oxide Inorganic materials [Sn]=O QHGNHLZPVBIIPX-UHFFFAOYSA-N 0.000 description 8
- 239000002585 base Substances 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 238000005516 engineering process Methods 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 239000010408 film Substances 0.000 description 5
- 239000005357 flat glass Substances 0.000 description 5
- 239000004973 liquid crystal related substance Substances 0.000 description 5
- 238000002844 melting Methods 0.000 description 5
- 230000008018 melting Effects 0.000 description 5
- 229910021417 amorphous silicon Inorganic materials 0.000 description 4
- 229910021419 crystalline silicon Inorganic materials 0.000 description 4
- 238000004031 devitrification Methods 0.000 description 4
- 239000011159 matrix material Substances 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 229910052787 antimony Inorganic materials 0.000 description 3
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 3
- 238000005352 clarification Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 238000007665 sagging Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 2
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 description 2
- 229910052785 arsenic Inorganic materials 0.000 description 2
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 2
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 2
- 230000006378 damage Effects 0.000 description 2
- 239000000156 glass melt Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 231100000614 poison Toxicity 0.000 description 2
- 230000007096 poisonous effect Effects 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000001953 recrystallisation Methods 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 229920001621 AMOLED Polymers 0.000 description 1
- FUJCRWPEOMXPAD-UHFFFAOYSA-N Li2O Inorganic materials [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 description 1
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 1
- 238000006124 Pilkington process Methods 0.000 description 1
- 229910001413 alkali metal ion Inorganic materials 0.000 description 1
- 239000005354 aluminosilicate glass Substances 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- GHPGOEFPKIHBNM-UHFFFAOYSA-N antimony(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Sb+3].[Sb+3] GHPGOEFPKIHBNM-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 239000006063 cullet Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- XUCJHNOBJLKZNU-UHFFFAOYSA-M dilithium;hydroxide Chemical compound [Li+].[Li+].[OH-] XUCJHNOBJLKZNU-UHFFFAOYSA-M 0.000 description 1
- 238000003280 down draw process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000006025 fining agent Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 230000005802 health problem Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- NOTVAPJNGZMVSD-UHFFFAOYSA-N potassium monoxide Inorganic materials [K]O[K] NOTVAPJNGZMVSD-UHFFFAOYSA-N 0.000 description 1
- 238000007363 ring formation reaction Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- 238000004017 vitrification Methods 0.000 description 1
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Abstract
The composition of alkaline earth aluminates glass substrate, solve the technical problem that and be to provide a kind of environmentally friendly, component of performance more perfect flat-panel screens glass substrate, employed technical scheme comprise that in former of described glass substrate, each component includes by mole meter: SiO269 ~ 75%, Al2O3 12.5 ~ 17.5%, CaO3.5 ~ 7.5%, SrO0.8 ~ 3%, ZnO3 ~ 6%, Y2O30.3 ~ 2.5%, La2O30.01~0.2%.The present invention does not contains As2O3、Sb2O3And compound, this glass does not contains heavy metal barium and compound thereof simultaneously, there is higher strain point, higher Young's modulus, higher transmitance, relatively low fusion temperature, relatively low liquidus temperature, relatively low density, meet flat pannel display industry development trend.
Description
Technical field
The invention belongs to glass manufacturing area, the composition of a kind of alkaline earth aluminates glass substrate, it can be extensive
It is applicable to make the glass substrate of flat-panel screens, photovoltaic device or the glass substrate of other photoelectric devices, is particularly suitable for
Low-temperature polysilicon film transistor liquid crystal display (LTPS TFT-LCD) base plate glass and organic electro-luminescent display (OEL)
Base plate glass.
Background technology
Along with the fast development of plane display industry, the demand of various display devices is constantly increased, such as active matrix
The active matrix liquid crystal of liquid crystal display (AMLCD), Organic Light Emitting Diode (OLED) and application low-temperature polysilicon silicon technology shows
(LTPS TFT-LCD) device, these display devices are all based on using thin film semiconductor material to produce thin film transistor (TFT) (TFT) skill
Art.Silica-based TFT can be divided into non-crystalline silicon (a-Si) TFT, polysilicon (p-Si) TFT and monocrystal silicon (SCS) TFT, wherein non-crystalline silicon (a-
Si) TFT is the technology of present main flow TFT-LCD application, but, the active matrix TFT made on the amorphous silicon thin film is due to it
Electron mobility is low, and has to make slightly larger by device area, therefore occupies many ratios on the least elemental area,
The aperture opening ratio (effective pixel area/whole elemental areas) making pixel is only about 70%.Have a strong impact on effective profit of backlight
With, although and passive liquid crystal shows and can not show video image, but its aperture opening ratio is high (disregarding pixel separation, up to 100%),
Vying each other in terms of aperture opening ratio, causes being developed aperture opening ratio and reaches the multi-crystal TFT active matrix of more than 80%, i.e. P-
TFT-LCD.Electron mobility an order of magnitude higher than the electron mobility of non-crystalline silicon of polysilicon, therefore device can be made little by one
A bit, aperture opening ratio is naturally high.It is additionally, since electron mobility and improves an order of magnitude, AMOLED can be met to driving electric current
Requirement.LTPS polysilicon (p-Si) TFT can improve the response time of display simultaneously, improves the brightness of display, and
The Drive of row and column device that can not be the highest by speed completely is also made on the polysilicon layer of liquid crystal display substrate, makes panel simultaneously
There is the characteristic of narrow frame (Narrow Frame Size) and high image quality, more frivolous display device can be manufactured.
Non-crystalline silicon (a-Si) TFT technology, the treatment temperature in procedure for producing can complete at a temperature of 300 ~ 450 DEG C.
LTPS polysilicon (p-Si) TFT needs the most repeatedly to process during processing procedure, and substrate must be at multiple high temp
Can not deform during reason, this just proposes higher requirement to base plate glass performance, and preferred strain point is higher than 670 DEG C,
More preferably above 710 DEG C, 750 DEG C.The coefficient of expansion of glass substrate needs the expansion coefficient similar with silicon simultaneously, as far as possible
Reducing stress and destruction, therefore the preferred thermal linear expansion coefficient of base plate glass is 28 ~ 39 × 10-7/ DEG C between.For the ease of life
Producing, reduce production cost, the glass as display base plate should have relatively low fusion temperature and liquidus temperature.
The glass substrate shown for plane, needs by technology such as sputtering, chemical vapor deposition (CVD)s at underlying substrate
Glass surface forms nesa coating, dielectric film, quasiconductor (polysilicon, amorphous silicon etc.) film and metal film, then passes through light
Etching (Photo-etching) technology forms various circuit and figure, if glass contains alkali metal oxide (Na2O, K2O,
Li2O), in heat treatment process, alkali metal ion diffuses into deposited semiconductor material, damages semiconductor film characteristic, therefore, glass
Glass should not contain alkali metal oxide, it is preferred that with SiO2、Al2O3、B2O3, alkaline earth oxide RO(RO=Mg, Ca, Sr) etc.
Alkaline earth aluminates glass for main constituent.
The strain point of most of silicate glasses along with the increase of glass former content and the minimizing of modifier content and
Increase, but high temperature melting and clarification difficulty can be caused simultaneously, cause refractory corrosion to aggravate, increase energy consumption and production cost.
Therefore, improved by component so that while low temperature viscosity increases, high temperature viscosity to be ensured does not haves big lifting, even
Reduce and be only the optimal breach improving strain point.
In the course of processing of glass substrate, base plate glass is horizontal positioned, and glass, under Gravitative Loads, has certain journey
That spends is sagging, and the elastic modelling quantity that sagging degree is directly proportional with glass to the density of glass is inversely proportional to.Along with substrate manufacture towards
Large scale, the development in slimming direction, in manufacture, the sagging of glass plate must draw attention.Therefore should design composition, make substrate
Glass has alap density and the highest elastic modelling quantity.
In order to obtain still alkali-free glass, utilize fining gases, produce when expelling glass reaction from glass melts
Gas, additionally when homogenizing fusing, needs, again with the fining gases produced, to increase alveolar layer footpath so that it is float, thus take
Go out the small bubble participated in.
, the viscosity as the glass melts of glass substrate for plane display device is high, need to be with higher temperature melting.?
In the glass substrate of this kind, generally cause Vitrification at 1300 ~ 1500 degree, deaeration under the high temperature more than 1500 degree, all
Matter.Therefore, in clarifier, it is widely used and can produce fining gases in wide temperature range (1300 ~ 1700 degree of scopes)
As2O3.But, As2O3Toxicity very strong, when the process of the manufacturing process of glass or cullet, it is possible to pollute environment
With bring health problem, its use is restricted.Once trial antimony clarification carrys out substitute for arsenic clarification.But, antimony itself is deposited
Problem in terms of causing environment and health.Although Sb2O3Toxicity unlike As2O3The highest, but Sb2O3Remain poisonous
's.And compared with arsenic, the temperature that antimony produces fining gases is relatively low, and the effectiveness removing this kind of glass blister is relatively low.
Summary of the invention
The technical problem to be solved in the present invention is to provide a kind of environmentally friendly, performance more perfect flat-panel screens glass
Substrate and component thereof, it is provided that even if a kind of clarifier does not use As2O3And/or Sb2O3, the most there is not the glass becoming surface defect
The formula of glass substrate, devises the aluminosilicate glass substrates of flat-panel screens, utilizes the glass substrate symbol that this formula prepares
Cyclization guaranteed request, without As2O3、Sb2O3And compound, this glass does not contains heavy metal barium and compound thereof simultaneously, has higher
Strain point, there is higher Young's modulus, there is higher transmitance, there is relatively low fusion temperature, there is relatively low liquid
Liquidus temperature, has relatively low density, meets flat pannel display industry development trend.It is suitable for merging glass tube down-drawing, float glass process etc. multiple
Molding mode is manufactured.
The present invention the technical scheme is that alkaline earth aluminates glass substrate and composition thereof for realizing goal of the invention, closes
Key is: in former of described glass substrate, each component includes by mole meter:
SiO269 ~ 75%,
Al2O312.5 ~ 17.5%,
CaO 3.5 ~ 7.5%,
SrO 0.8 ~ 3%,
ZnO 3 ~ 6%,
Y2O30.3 ~ 2.5%,
La2O3 0.01~0.2%。
The invention has the beneficial effects as follows: 1. the present invention has environment friendly, without any poisonous and harmful substance, clarifier
Tin monoxide SnO, SnO is used to be readily available material, and known without detrimental nature, it is used alone it as glass fining agent
Time, there is the higher temperature range producing fining gases, be suitable for the elimination of this kind of glass blister；2. by controlling SiO2+Al2O3>
86%、SrO/R’O<0.25、Y2O3/R’O<0.25、ZnO/(CaO+SrO)>0.3、Al2O3/(R’O+RE2O3)>0.95.Glass can be made
Glass has higher strain point, Young's modulus and relatively low fusion temperature, the good characteristic of liquidus temperature simultaneously；3. by means of
The glass substrate that the glass ingredient formula that the present invention provides produces can reach following technical specification after testing: 50～350
The thermal coefficient of expansion of degree is 28～34 × 10-7/℃；Strain point is more than 755 DEG C；Density is less than 2.65g/cm3, liquidus temperature
Less than 1160 DEG C, in per kilogram glass substrate, bubble diameter bubbles number in ＞ 0.lmm is invisible；4. due in instant component
ZnO, the RE contained2O3While improving strain point, fusion temperature can be greatly reduced, bring bigger to producing line Yield lmproved
Space, the production cost such as fuel, electric power is minimized simultaneously.
Detailed description of the invention
Alkaline earth aluminates glass substrate and composition thereof, itself it is crucial that: the massage of each component of former of described glass substrate
That percentages is:
SiO269 ~ 75%,
Al2O312.5 ~ 17.5%,
CaO 3.5 ~ 7.5%,
SrO 0.8 ~ 3%,
ZnO 3 ~ 6%,
Y2O30.3 ~ 2.5%,
La2O3 0.01~0.2%。
In described component: SiO2+Al2O3>86%。
In described component: SrO/R ' O < 0.25, wherein, R ' O=CaO+SrO+ZnO.
In described component: Y2O3/ R ' O < 0.25, wherein, R ' O=CaO+SrO+ZnO.
In described component: ZnO/ (CaO+SrO) > 0.3.
In described component: Al2O3/(R’O+RE2O3) > 0.95, wherein, R ' O=CaO+SrO+ZnO, RE2O3= Y2O3+
La2O3 。
Described glass substrate uses SnO as clarifier, is 0.05 ~ 0.15% with its content of molar percent.
In described component: SiO2Preferred molar percentage be 70 ~ 74%, Al2O3Preferred molar percentage be 13 ~ 17%.
In described component: the preferred molar percentage of ZnO is 3.5 ~ 5%.
In described component: Y2O3Preferred molar percentage be 0.35 ~ 2.0%.
The present invention, when implementing, first will include the raw material of above-mentioned each glass substrate correspondence oxide molar percent composition
After uniform stirring mixing, then mixing raw materials melt is processed, discharge bubble with the stirring of platinum rod and make vitreous humour homogenizing, then will
Its temperature is reduced to the glass substrate forming temperature range required for molding, and by annealing theory, producing flat-panel screens needs
The thickness of the glass substrate wanted, then the glass substrate of molding is carried out simple cold work, the finally base to glass substrate
This physical characteristic carries out test and becomes qualified products.
In the present invention, SiO2Molar content be 69～75%.SiO2It is glass former, if content is less than 69%, can make
The coefficient of expansion is the highest, the easy devitrification of glass, improves SiO2Content contributes to glass lightweight, and thermal coefficient of expansion reduces, strain point
Increasing, chemical resistance increases, but high temperature viscosity raises, and is so unfavorable for melting, and general kiln is difficult to meet, so SiO2's
Content is 69～75%.
Al2O3Molar content be 12.5～17.5%, in order to improve the intensity of glass structure, if content is less than 12.5%, glass
The easy devitrification of glass, is also easily subject to extraneous aqueous vapor and the erosion of chemical reagent.The A1 of high-load2O3Contribute to strain point of glass, resist
Increasing of curved intensity, but easily there is crystallization in too high glass, glass can be made to be difficult to melt, therefore A1 simultaneously2O3Content
It is 12.5～17.5%.
The molar content of CaO is 3.5～7.5%, and calcium oxide is in order to promote the melting of glass and to adjust glass mouldability.As
Really calcium oxide content is less than 3.5%, will be unable to reduce the viscosity of glass, and content is too much, and glass would tend to occur crystallize, thermal expansion
Coefficient also can amplitude variation greatly big, unfavorable to successive process.So the content of CaO is 3.5～7.5%.
The molar content of SrO is 0.8～3%, and strontium oxide is as flux and prevents glass from crystallize occur, if content mistake
Many, glass density can be the highest, and the quality causing product is overweight.So the content of SrO is defined as 0.8～3%.
The molar content of ZnO is 3 ~ 6 %, bivalent metal oxide according to it in the periodic table of elements status with to character shadow
Ring difference, two classes can be divided into: a class is in the alkaline earth oxide of main group, its ion R2+There are 8 exoelectron structures；
Equations of The Second Kind is positioned at periodic chart subgroup (such as ZnO, CdO etc.), its ion R2+There are 18 outer electronic structures, in glass both
Configuration state from glass property impact be different.ZnO can reduce glass high temperature viscosity (such as 1500 degree), is conducive to eliminating
Bubble；Below softening point, there are lifting intensity, hardness, the chemical resistance of increase glass simultaneously, reduce thermal expansion coefficient of glass
Effect.In alkali-free glass system, add appropriate ZnO and contribute to suppressing crystallize, recrystallization temperature can be reduced.In theory, ZnO
In alkali-free glass, after introducing glass as network outer body, general with [ZnO under high temperature4Presented in], relatively [ZnO6] glass
Structure is more loose, is under the identical condition of high temperature with the glass without ZnO and compares, and the glass viscosity containing ZnO is less, atom
Movement velocity is bigger, it is impossible to form nucleus, needs to reduce further temperature, is just conducive to the formation of nucleus, thus, reduce glass
The crystallize ceiling temperature of glass.ZnO content too much can make the strain point of glass be greatly lowered.So the content of ZnO is defined as 3 ~ 6
Mole %.
Rare-earth oxide Y2O3Elastic modelling quantity and the strain point of glass can be significantly improved, glass can be reduced simultaneously
Fusion temperature.In the present invention, Y2O3Molar content be 0.3 ~ 2.5%.Y2O3When content is more than 2.5%, stable to devitrification of glass
Property unfavorable, and excessively increase glass cost.
Rare-earth oxide La2O3With Y2O3Similar, the elastic modelling quantity of glass can be significantly improved, and glass can be reduced
Fusion temperature, but the density of glass can be greatly increased.Content too much can increase cost, reduces stability, glass, makes crystallize
Performance increases.In the present invention, under the conditions of equimolar amounts, it is used in mixed way Y2O3And La2O3Ratio is used alone Y2O3Recrystallization temperature
Low.Therefore La2O3Molar content be 0.01 ~ 0.2%.
In the present invention, glass composition can also be added with the Tin monoxide SnO of 0.05～0.15mol%, melt as glass
Clarifier during solution or defrother, to improve the melting quality of glass.If content is too much, glass substrate devitrification, institute can be caused
With its addition less than 0.15mol%.
Table 1 below and table 2 give 12 specific embodiments that in formula, each component measures with molar percentage:
Table 1:
Table 2:
Claims (10)
1. the composition of alkaline earth aluminates glass substrate, it is characterised in that: each component of former of described glass substrate by mole
Percentages is:
SiO269 ~ 75%,
Al2O312.5 ~ 17.5%,
CaO 3.5 ~ 7.5%,
SrO 0.8 ~ 3%,
ZnO 3 ~ 6%,
Y2O30.3 ~ 2.5%,
La2O3 0.01~0.2%。
The composition of alkaline earth aluminates glass substrate the most according to claim 1, it is characterised in that: in described component: SiO2
+Al2O3>86%。
The composition of alkaline earth aluminates glass substrate the most according to claim 1, it is characterised in that: in described component:
SrO/ CaO+SrO+ZnO <0.25。
The composition of alkaline earth aluminates glass substrate the most according to claim 1, it is characterised in that: in described component:
Y2O3/ CaO+SrO+ZnO <0.25。
The composition of alkaline earth aluminates glass substrate the most according to claim 1, it is characterised in that: in described component:
ZnO/(CaO+SrO)>0.3。
The composition of alkaline earth aluminates glass substrate the most according to claim 1, it is characterised in that: in described component:
Al2O3/( CaO+SrO+ZnO +RE2O3) > 0.95, wherein, RE2O3= Y2O3+ La2O3。
The composition of alkaline earth aluminates glass substrate the most according to claim 1, it is characterised in that: described glass substrate is adopted
With SnO as clarifier, it is 0.05 ~ 0.15% with its content of molar percent.
The composition of alkaline earth aluminates glass substrate the most according to claim 1, it is characterised in that: in described component: SiO2
Molar percentage be 70 ~ 74%, Al2O3Molar percentage be 13 ~ 17%.
The composition of alkaline earth aluminates glass substrate the most according to claim 1, it is characterised in that: in described component:
The molar percentage of ZnO is 3.5 ~ 5%.
The composition of alkaline earth aluminates glass substrate the most according to claim 1, it is characterised in that: in described component:
Y2O3Molar percentage be 0.35 ~ 2.0%.
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| CN116813196A (en) | 2018-06-19 | 2023-09-29 | 康宁股份有限公司 | Glass with high strain point and high Young modulus |
| CN109613218B (en) * | 2018-12-10 | 2020-05-12 | 彩虹（合肥）液晶玻璃有限公司 | Method and system for testing stock |
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