CN104276754A - Silicate glass substrate for flat-panel display - Google Patents
Silicate glass substrate for flat-panel display Download PDFInfo
- Publication number
- CN104276754A CN104276754A CN201310378661.3A CN201310378661A CN104276754A CN 104276754 A CN104276754 A CN 104276754A CN 201310378661 A CN201310378661 A CN 201310378661A CN 104276754 A CN104276754 A CN 104276754A
- Authority
- CN
- China
- Prior art keywords
- glass substrate
- flat
- glass
- silicate glass
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
Abstract
The invention discloses a silicate glass substrate for a flat-panel display. The glass substrate comprises the following components by molar percent: 64-70% of SiO2, 12-16% of Al2O3, 3-8.5% of B2O3, 6.5-9.5% of CaO, 2.5-5% of SrO and 0.02-0.1% of SnO. The glass substrate disclosed by the invention is the silicate glass substrate for the flat-panel display having the advantages of relatively high strain point, relatively low melting temperature, relatively low liquidus temperature and environmental friendliness, and is especially applicable for glass substrates for low-temperature polysilicon thin-film transistor liquid crystal displays (LTPSTFT-LCD) and glass substrates for organic electroluminescence (OEL) displays.
Description
Technical field
The invention belongs to glass manufacturing area, relate to a kind of alkaline earth aluminoborosilicate glass ingredient, it can be widely used in the glass substrate making flat-panel screens, is particularly suitable for low-temperature polysilicon film transistor liquid-crystal display (LTPS TFT-LCD) base plate glass and organic electro-luminescent display (OEL) base plate glass.
Background technology
Along with the fast development of plane display industry, the demand of various display device is constantly increased, active matrix liquid crystal display (LTPS TFT-LCD) device of such as active matrix liquid crystal display (AMLCD), Organic Light Emitting Diode (OLED) and application of cold temperature polycrystalline silicon technology, these display devices all produce thin film transistor (TFT) technology based on use thin film semiconductor material.Silica-based TFT can be divided into non-crystalline silicon (a-Si) TFT, polysilicon (p-Si) TFT and silicon single crystal (SCS) TFT, wherein non-crystalline silicon (a-Si) TFT is the technology that present main flow TFT-LCD applies, but, the active matrix TFT made on the amorphous silicon thin film due to its electronic mobility low, and have to device area be done slightly large, therefore on very little elemental area, occupy many ratios, make the aperture opening ratio of pixel (effective pixel area/all elemental areas) be only about 70%.Have a strong impact on effective utilization of backlight, although and passive liquid crystal display can not display video image, but its aperture opening ratio is high (disregards pixel separation, can 100% be reached), vying each other in aperture opening ratio, cause being developed the multi-crystal TFT active matrix that aperture opening ratio reaches more than 80%, i.e. P-TFT-LCD.An electronic mobility order of magnitude higher than the electronic mobility of non-crystalline silicon of polysilicon, therefore device can be done smaller, and aperture opening ratio is naturally high.And, because electronic mobility improves an order of magnitude, the requirement of AMOLED to drive current can be met.LTPS polysilicon (p-Si) TFT can improve the time of response of indicating meter simultaneously, improve the brightness of indicating meter, and not can that very high Drive of row and column device is also done on the polysilicon layer of liquid crystal display substrate completely by speed, make panel have narrow frame (Narrow Frame Size) and the characteristic of high image quality simultaneously, more frivolous display device can be manufactured.
Non-crystalline silicon (a-Si) TFT technology, the treatment temp in procedure for producing can complete at 300 ~ 450 DEG C of temperature.LTPS polysilicon (p-Si) TFT needs repeatedly to process at relatively high temperatures in processing procedure process, substrate can not must deform in multiple high temp treating processes, this just proposes higher requirement to base plate glass performance, preferred strain point higher than 650 DEG C, more preferably higher than 670 DEG C, 720 DEG C.The coefficient of expansion of glass substrate needs the expansion coefficient similar with silicon simultaneously, and reduce stress and destruction as far as possible, therefore the preferred thermal linear expansion coefficient of base plate glass is 28 ~ 39 × 10
-7/ DEG C between.For the ease of producing, reduce production cost, the glass as display base plate should have lower temperature of fusion and liquidus temperature.
Summary of the invention
The technical problem to be solved in the present invention is to provide one to be had improved strain point, compared with low melting temperature, compared with low liquidus temperature and eco-friendly flat-panel screens silicate glass substrate, is particularly useful for low-temperature polysilicon film transistor liquid-crystal display (LTPS TFT-LCD) base plate glass and organic electro-luminescent display (OEL) base plate glass.
For solving the problems of the technologies described above, the technical solution used in the present invention is:
A kind of flat-panel screens silicate glass substrate, the molar percentage of each composition component of described glass substrate respectively:
SiO
2 64~70%，
Al
2O
3 12~16%，
B
2O
3 3~8.5%，
CaO 6.5~9.5%，
SrO 2.5~5%，
SnO 0.02~0.1%。
With Mole percent gauge, described SrO/ (CaO+SrO) <0.4.
With Mole percent gauge, described Al
2o
3/ (CaO+SrO) >1.0.
SiO
2be glass-former, if content is lower than 64%, the coefficient of expansion can be made too high, the easy devitrification of glass, improve SiO
2content contributes to glass lightweight, and thermal expansivity reduces, and strain point increases, and chemical resistant properties increases, but high temperature viscosity raises, and be unfavorable for like this melting, general kiln is difficult to meet, so SiO
2content be 64 ~ 70%.
Al in described glass substrate
2o
3molar content preferably 13.8 ~ 15.0%, B
2o
3molar content preferably 3 ~ 8.0%.In the alkali-free aluminoborosilicate belonging to TFT-LCD, boron oxide B
2o
3be very important component, it has three-fold coordination, four-coordination two kinds of co-ordination states, and different ratio produces impact greatly to glass structure and performance.Work as B
2o
3when content is higher, under the condition of high temperature, there is good fluxing action, but due to the complicacy of system high-aluminum alkali-free, after low-temperature condition forms sheet glass, B
2o
3mostly be arranged in boron oxygen triangle body, glass structure is relatively loose, is unsuitable for being used as low-temperature polysilicon film transistor liquid-crystal display (LTPS TFT-LCD) base plate glass.The present invention is by reducing B in composition
2o
3content (3 ~ 8mol%), improve Al
2o
3content (13.8 ~ 15mol%), make that there is when glass melt is cooled to shaping range of viscosities less boron oxygen triangle body, there is more aluminum-oxygen tetrahedron simultaneously, thus significantly improve glass low-temperature viscosity and mechanical characteristics, effective especially for lifting strain point of glass.
The molar content of CaO preferably 6.5 ~ 8.7% in described glass substrate.Calcium oxide is in order to promote melting and the adjustment glass ware forming of glass.If calcium oxide content is less than 6% in the present invention, cannot reduce the viscosity of glass, content is too much, and glass easily can occur crystallization, and thermal expansivity also can amplitude variation be greatly, unfavorable to successive process greatly.Strontium oxide is as fusing assistant and prevent glass from occurring crystallization, if content is too much, glass density can be too high, causes the quality of product overweight.
SiO in described glass substrate
2molar content preferably 65 ~ 68.5%.
Al
2o
3the raising of content can cause glass high temperature viscosity to increase, and present invention reduces Network former SiO
2the highest interpolation upper limit, improve the minimum interpolation lower limit of network outer body CaO.Thus obtain strain point higher than 710 DEG C, density is less than 2.48g/cm
3, there is practical TFT-LCD glass substrate compared with performances such as low melting temperatures.The strain point of most of silicate glass increases along with the increase of glass-former content and the minimizing of modifier content.But high temperature melting and clarification difficulty can be caused simultaneously, cause refractory corrosion to aggravate, increase energy consumption and production cost.The present invention adopts technique scheme, also ensures that high temperature viscosity there will not be large lifting, even reduces while low temperature viscosity is increased.
The molar content of SnO preferably 0.02 ~ 0.04% in described glass substrate.Tin protoxide SnO, finings when melting as glass or defrother, to improve the melting quality of glass.If content is too much, glass substrate devitrification can be caused.
The beneficial effect adopting technique scheme to produce is: (1) the present invention has environment friendly, not containing any hazardous and noxious substances, finings tin protoxide SnO holds facile material, and known nothing is harmful to character, when being used alone it as glass fining agent, there is the temperature range of higher generation fining gases, be applicable to the elimination of this kind of glass blister; (2) when not adding rare earth element, by Al
2o
3and RO controls within the scope of appropriate proportioning, glass can be made to have the good characteristic of higher strain point and lower temperature of fusion simultaneously; (3) glass substrate produced by means of glass ingredient formula provided by the invention can reach following technical indicator after testing: be 29 ~ 37 × 10-7/ DEG C at the thermal expansivity of 50 ~ 380 degree; Strain point is more than 710 DEG C; Density is less than 2.48g/cm
3, liquidus temperature is lower than 1120 DEG C, and liquidus viscosity is greater than 100,000 pool, and in per kilogram glass substrate, the bubbles number of bubble diameter in > 0.lmm is invisible; (4) because the present invention is not containing expensive rare earth oxide, raw materials cost is effectively controlled, and temperature of fusion significantly reduces simultaneously, and bring larger space to production line Yield lmproved, the production costs such as fuel are minimized.
Embodiment
The silicate glass substrate of flat-panel screens, in its raw material, each chemical composition is by mole% composed as follows:
SiO
2 64~70%，
Al
2O
3 12~16%，
B
2O
3 3~8.5%，
CaO 6.5~9.5%，
SrO 2.5~5%，
SnO 0.02~0.1%。
By a mole percentage amounts, wherein said SrO/ (SrO+CaO) <0.4, Al
2o
3/ (SrO+CaO) >1.0.Strain point can be made significantly to promote, the more important thing is and make glass melting temperature reduce simultaneously.
During preparation, first after said ratio being taken each chemical feedstocks, uniform stirring mixing, again by mixing raw material melt-processed, stir with platinum rod and discharge bubble, make glass metal homogenizing, then its temperature is reduced to shaping required glass substrate forming temperature range, by annealing theory, produces the thickness of the glass substrate that flat-panel screens needs, again cold work is carried out to shaping glass substrate, finally the Basic Physical Properties of glass substrate is tested.
Particularly, the physicals of the glass substrate of the component of each embodiment, proportioning and preparation is see table 1.
Table 1
In the various embodiments described above, in per kilogram glass substrate, the bubbles number of bubble diameter in > 0.lmm is invisible.Described Al
2o
3/ (SrO+CaO) >1.0, SrO/ (SrO+CaO) <0.4.
To sum up, glass substrate of the present invention has improved strain point, compared with low melting temperature, compared with low liquidus temperature and eco-friendly flat-panel screens silicate glass substrate, is particularly useful for low-temperature polysilicon film transistor liquid-crystal display (LTPS TFT-LCD) base plate glass and organic electro-luminescent display (OEL) base plate glass.
Claims (7)
1. a flat-panel screens silicate glass substrate, is characterized in that the molar percentage of each composition component of described glass substrate respectively:
SiO
2 64~70%，
Al
2O
3 12~16%，
B
2O
3 3~8.5%，
CaO 6.5~9.5%，
SrO 2.5~5%，
SnO 0.02~0.1%。
2. flat-panel screens silicate glass substrate according to claim 1, is characterized in that with Mole percent gauge, described SrO/ (CaO+SrO) <0.4.
3. flat-panel screens silicate glass substrate according to claim 1 and 2, is characterized in that with Mole percent gauge, described Al
2o
3/ (CaO+SrO) >1.0.
4. flat-panel screens silicate glass substrate according to claim 3, is characterized in that Al in described glass substrate
2o
3molar content be 13.8 ~ 15.0%, B
2o
3molar content be 3 ~ 8.0%.
5. flat-panel screens silicate glass substrate according to claim 3, is characterized in that the molar content of CaO in described glass substrate is 6.5 ~ 8.7%.
6. flat-panel screens silicate glass substrate according to claim 3, is characterized in that the molar content of SnO in described glass substrate is 0.02 ~ 0.04%.
7. flat-panel screens silicate glass substrate according to claim 3, is characterized in that SiO in described glass substrate
2molar content be 65 ~ 68.5%.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310378661.3A CN104276754A (en) | 2013-08-27 | 2013-08-27 | Silicate glass substrate for flat-panel display |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310378661.3A CN104276754A (en) | 2013-08-27 | 2013-08-27 | Silicate glass substrate for flat-panel display |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN104276754A true CN104276754A (en) | 2015-01-14 |
Family
ID=52252167
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310378661.3A Pending CN104276754A (en) | 2013-08-27 | 2013-08-27 | Silicate glass substrate for flat-panel display |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104276754A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110746111A (en) * | 2019-09-29 | 2020-02-04 | 彩虹显示器件股份有限公司 | Glass substrate and application thereof as glass substrate |
| CN114716143A (en) * | 2022-04-13 | 2022-07-08 | 青岛融合装备科技有限公司 | Alkali-free boroaluminosilicate glass for liquid crystal glass substrate |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5885914A (en) * | 1995-07-28 | 1999-03-23 | Asahi Glass Company Ltd. | Alkali-free glass and display substrate |
| TWI252844B (en) * | 2003-12-25 | 2006-04-11 | Po-I Kuo | Glasses for display panels |
| CN102030475A (en) * | 2010-10-15 | 2011-04-27 | 北京工业大学 | Environmentally-friendly alkali-free aluminoborosilicate glass for TFT-LCD |
| CN102320739A (en) * | 2007-09-29 | 2012-01-18 | 株式会社小原 | Opticglass |
| CN102690056A (en) * | 2012-04-01 | 2012-09-26 | 东旭集团有限公司 | A formula of glass substrate used for flat panel display |
-
2013
- 2013-08-27 CN CN201310378661.3A patent/CN104276754A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5885914A (en) * | 1995-07-28 | 1999-03-23 | Asahi Glass Company Ltd. | Alkali-free glass and display substrate |
| TWI252844B (en) * | 2003-12-25 | 2006-04-11 | Po-I Kuo | Glasses for display panels |
| CN102320739A (en) * | 2007-09-29 | 2012-01-18 | 株式会社小原 | Opticglass |
| CN102030475A (en) * | 2010-10-15 | 2011-04-27 | 北京工业大学 | Environmentally-friendly alkali-free aluminoborosilicate glass for TFT-LCD |
| CN102690056A (en) * | 2012-04-01 | 2012-09-26 | 东旭集团有限公司 | A formula of glass substrate used for flat panel display |
Non-Patent Citations (2)
| Title |
|---|
| 中国大百科全书出版社编辑部: "《中国大百科全书 轻工》", 30 November 1991, article "《中国大百科全书 轻工》", pages: 35-36 * |
| 张碧栋等: "《连续玻璃纤维工艺基础》", 29 February 1988 * |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110746111A (en) * | 2019-09-29 | 2020-02-04 | 彩虹显示器件股份有限公司 | Glass substrate and application thereof as glass substrate |
| CN114716143A (en) * | 2022-04-13 | 2022-07-08 | 青岛融合装备科技有限公司 | Alkali-free boroaluminosilicate glass for liquid crystal glass substrate |
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| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20150114 |
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