CN104131289A - Antibacterial polishing solution and preparation method thereof - Google Patents
Antibacterial polishing solution and preparation method thereof Download PDFInfo
- Publication number
- CN104131289A CN104131289A CN201410308862.0A CN201410308862A CN104131289A CN 104131289 A CN104131289 A CN 104131289A CN 201410308862 A CN201410308862 A CN 201410308862A CN 104131289 A CN104131289 A CN 104131289A
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- CN
- China
- Prior art keywords
- parts
- auxiliary agent
- polishing solution
- water
- antibacterial
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Agricultural Chemicals And Associated Chemicals (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Lubricants (AREA)
Abstract
Description
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201410308862.0A CN104131289B (en) | 2014-07-01 | 2014-07-01 | A kind of polishing fluid with sterilization effect and preparation method thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201410308862.0A CN104131289B (en) | 2014-07-01 | 2014-07-01 | A kind of polishing fluid with sterilization effect and preparation method thereof |
Publications (2)
Publication Number | Publication Date |
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CN104131289A true CN104131289A (en) | 2014-11-05 |
CN104131289B CN104131289B (en) | 2015-09-23 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN201410308862.0A Expired - Fee Related CN104131289B (en) | 2014-07-01 | 2014-07-01 | A kind of polishing fluid with sterilization effect and preparation method thereof |
Country Status (1)
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CN (1) | CN104131289B (en) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006165541A (en) * | 2004-11-24 | 2006-06-22 | Rohm & Haas Electronic Materials Cmp Holdings Inc | Non-abrasive particle chemical mechanical polishing composition, and method related thereto |
CN101515546A (en) * | 2008-02-22 | 2009-08-26 | 罗门哈斯电子材料Cmp控股股份有限公司 | Polishing copper-containing patterned wafers |
CN101565823A (en) * | 2009-05-19 | 2009-10-28 | 青白江区兴林铝制品加工厂 | Surface treatment technology of reel aluminium strip |
CN103484866A (en) * | 2013-09-23 | 2014-01-01 | 无锡阳工机械制造有限公司 | Polishing anti-corrosion slurry |
-
2014
- 2014-07-01 CN CN201410308862.0A patent/CN104131289B/en not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006165541A (en) * | 2004-11-24 | 2006-06-22 | Rohm & Haas Electronic Materials Cmp Holdings Inc | Non-abrasive particle chemical mechanical polishing composition, and method related thereto |
CN101515546A (en) * | 2008-02-22 | 2009-08-26 | 罗门哈斯电子材料Cmp控股股份有限公司 | Polishing copper-containing patterned wafers |
US20090215266A1 (en) * | 2008-02-22 | 2009-08-27 | Thomas Terence M | Polishing Copper-Containing patterned wafers |
CN101565823A (en) * | 2009-05-19 | 2009-10-28 | 青白江区兴林铝制品加工厂 | Surface treatment technology of reel aluminium strip |
CN103484866A (en) * | 2013-09-23 | 2014-01-01 | 无锡阳工机械制造有限公司 | Polishing anti-corrosion slurry |
Also Published As
Publication number | Publication date |
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CN104131289B (en) | 2015-09-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CB03 | Change of inventor or designer information |
Inventor after: Wu Zhixiong Inventor after: Hu Shaogang Inventor after: Sun Wangen Inventor after: Jin Dongmiao Inventor before: Song Yuchun |
|
CB03 | Change of inventor or designer information | ||
TR01 | Transfer of patent right |
Effective date of registration: 20170717 Address after: Wuzhong Economic Development Zone in Suzhou City, Jiangsu province 215000 Dong Industrial Park six Feng Road No. 53 Patentee after: Suzhou weilishi Fine Chemical Co., Ltd. Address before: 233000 No. 404 South Daqing Road, hi tech Zone, Anhui, Bengbu Patentee before: Anhui Topusen Battery Co., Ltd. |
|
TR01 | Transfer of patent right | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20150923 Termination date: 20190701 |
|
CF01 | Termination of patent right due to non-payment of annual fee |