CN104118157A - Low-radiation coated glass - Google Patents
Low-radiation coated glass Download PDFInfo
- Publication number
- CN104118157A CN104118157A CN201410335378.7A CN201410335378A CN104118157A CN 104118157 A CN104118157 A CN 104118157A CN 201410335378 A CN201410335378 A CN 201410335378A CN 104118157 A CN104118157 A CN 104118157A
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- layer
- low
- coated glass
- radiation
- rete
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Abstract
The invention discloses a low-radiation coated glass. The low-radiation coated glass comprises a glass substrate, the main surface of the glass substrate bears a plurality of layers of sputtering layers, and each sputtering layer comprises a low-radiation layer; wherein each low-radiation layer is composed of the following elements in percentage by weight: 90 to 99.9% of Ag, and 0.1 to 10% of La and/or Sm. A special low-radiation layer is selected to prepare the low-radiation coated glass, the special low-radiation layer is prepared by doping rare earth elements (La and Sm) into a silver layer, the doped tract elements (La and Sm) can retard the oxidation of the silver layer, and improve the stability of the silver layer, so the low radiation rate of the low-radiation coated glass can be maintained in a stable level, and is not affected by air which contacts the coated glass during the production process. Compared to the common silver layer which is not doped with La or Sm, the low-radiation coated glass has improved coating-film stability and radiation performance stability. Moreover, the doped La and Sm improve the uniformity of thin film on the substrate and the adhesion force of silver film at the same time.
Description
Technical field
The present invention relates to the low radiation coated glass that membranous layer stability is high, radiance is low.
Background technology
Glass is being played the part of key player in contemporary production and life, and the everyways such as building doors and windows, automotive window are used glass.In glass family, the new lover of energy-conserving and environment-protective is low radiation coated glass, is commonly called as low emissivity glass or Low-E glass; It can see through in visible ray, reflection in glass surface sputter, the rete of far infrared, thereby lowers the radiance of glass surface, reduces the heat transfer loss that glass causes because of heat radiation, improves the insulation ability of glass.
The employing fine silver film of existing low radiation coated glass is as low radiating layer; Its shortcoming is that oxidation damage easily occurs silver layer, and outward appearance is sent out crow, variable color, even also causes silver layer to lose efficacy, and makes low radiation coated glass lose heat-insulation and heat-preservation function, poor durability., arrange as diaphragms such as metal oxide films in the both sides of fine silver film, for fine silver film provides protection, to increase its durability for this reason.But this diaphragm does not shield to the oxidation of the production process that overcomes silver layer glassware; Such as remove limit portion coating with composition double glazing link in, silver layer still inevitably touches air, causing film is poor stability, radiance generation mutation.
Summary of the invention
The object of the invention is to overcome the defect existing in prior art, provide a kind of rete and radiance stable low radiation coated glass.
For this reason, low radiation coated glass of the present invention, comprises glass substrate, and its first type surface upper support has multilayer sputtering layer, and described sputtering layer comprises low radiating layer; Wherein, the composition of low radiating layer and percetage by weight thereof are: silver-colored Ag 90 ~ 99.9%, lanthanum La and/or samarium Sm 0.1 ~ 10%.
Compared with prior art, above-mentioned low radiation coated glass has been selected special low radiating layer, by rare earth doped La, Sm in silver layer, La, the Sm minor metallic element adulterating in silver layer can stop silver layer oxidation, improve the stability of silver layer, and then the stable low-E of the maintenance that makes low radiation coated glass, and be not subject to the impact of the ingress of air in production process.In addition La, the Sm adulterating in silver layer, also has simultaneously increases the effect of film at suprabasil uniformity and raising silverskin adhesive force.
Take into account cost and performance, preferably, the composition of described low radiating layer and percetage by weight thereof are: Ag 98.5 ~ 99.9%, La and/or Sm 0.1 ~ 1.5%.
In order to improve the durability of rete; overcoming stress release in deposition process and heat treatment process process has a negative impact to the durability of sputtering layer; preferably, described sputtering layer outwards comprises the first dielectric layer, the first protective layer, the first low radiating layer, the second protective layer, the second dielectric layer successively from glass substrate.
Or preferably, described sputtering layer outwards comprises the first dielectric layer, the first protective layer, the first low radiating layer, the second protective layer, the second dielectric layer, the 3rd protective layer, the second low radiating layer, the 4th protective layer, the 3rd dielectric layer successively from glass substrate.
Again or preferably, described sputtering layer outwards comprises the first dielectric layer, the first protective layer, the first low radiating layer, the second protective layer, the second dielectric layer, the 3rd protective layer, the second low radiating layer, the 4th protective layer, the 3rd dielectric layer, the 5th protective layer, the 3rd low radiating layer, the 6th protective layer, the 4th dielectric layer successively from glass substrate.
Said structure forms respectively Dan Yin, two silver, three silver medal structures, and has Local Symmetric structure, thereby can overcome to a certain extent stress release in deposition process and heat treatment process process, the durability of sputtering layer is had a negative impact.
In said structure, protective layer can be NiCr rete or titanium film layer or copper film layer etc.Dielectric layer can be titanium oxide film layer, tin-oxide rete, zinc oxide rete, Si oxide rete.
Preferably, described dielectric layer is the composite bed that the composite bed that is composited of titanium oxide rete and zinc oxide rete or silicon nitrogen oxide rete and zinc oxide rete are composited; Described protective layer is NiCr rete.
Compared with prior art, advantage and the beneficial effect of low radiation coated glass of the present invention are: low radiation coated glass of the present invention has been selected special low radiating layer, by rare earth doped La, Sm in silver layer, La, the Sm minor metallic element adulterating in silver layer can stop silver layer oxidation, improve the stability of silver layer, and then the stable low-E of the maintenance that makes low radiation coated glass, and be not subject to the impact of the ingress of air in production process.Compared with the silver layer of the La that undopes, Sm, low radiation coated glass of the present invention has plated film stability and the radiance stability of improvement.In addition La, the Sm adulterating in silver layer, also has simultaneously increases the effect of film at suprabasil uniformity and raising silverskin adhesive force.
Brief description of the drawings
Fig. 1 is the cross section structure schematic diagram of low radiation coated glass of the present invention in embodiment 1;
Fig. 2 is the cross section structure schematic diagram of low radiation coated glass of the present invention in embodiment 2;
Fig. 3 is the cross section structure schematic diagram of low radiation coated glass of the present invention in embodiment 3;
Fig. 4 is the cross section structure schematic diagram of low radiation coated glass of the present invention in embodiment 4.
In figure: 11 to 14, Si
3n
4rete; 21 to 24, TiO
2rete; 31 to 36, NiCr rete; 41, the first width is penetrated layer; 42, the second width is penetrated layer; 43, the 3rd width is penetrated layer; 51 to 54, ZnO film layer; 6, glass substrate.
Detailed description of the invention
Below in conjunction with accompanying drawing, the specific embodiment of the present invention is further described.Following examples are only for technical scheme of the present invention is more clearly described, and can not limit the scope of the invention with this.
The present invention is a kind of low radiation coated glass, comprises glass substrate, and its first type surface upper support has multilayer sputtering layer, and described sputtering layer comprises low radiating layer; Wherein, the composition of low radiating layer and percetage by weight thereof are: Ag 90 ~ 99.9%, La and/or Sm 0.1 ~ 10%, and the sputter of low radiating layer can be selected the sputtering condition same with traditional fine silver film, and as carried out sputter in Ar atmosphere, sputtering pressure scope is 2 × 10
-2~ 3 × 10
-4mbar.
Sputtering layer, except low radiating layer, also comprises the conventional sputtering layer such as dielectric layer, protective layer, and wherein, protective layer can be NiCr rete or titanium film layer or copper film layer etc.; Dielectric layer can be titanium oxide film layer, tin-oxide rete, zinc oxide rete, Si oxide rete.
This low radiation coated glass is by rare earth doped La, Sm in silver layer, La, the Sm minor metallic element adulterating in silver layer can stop silver layer oxidation, improve the stability of silver layer, and then the stable low-E of the maintenance that makes low radiation coated glass, and be not subject to the impact of the ingress of air in production process.In addition La, the Sm adulterating in silver layer, also has simultaneously increases the effect of film at suprabasil uniformity and raising silverskin adhesive force.
Embodiment 1
The present invention is a kind of low radiation coated glass, comprises glass substrate, and its first type surface upper support has multilayer sputtering layer, and described sputtering layer outwards comprises Si successively from glass substrate
3n
4rete, NiCr rete, the first low radiating layer, NiCr rete, Si
3n
4rete; Wherein, the composition of the first low radiating layer and percetage by weight thereof are: Ag 90%, La 10%.
Fig. 1 has represented the cross section structure schematic diagram of low radiation coated glass in embodiment 1.Wherein Si
3n
4rete 11,12 forms respectively first, second dielectric layer, to improve the hardness of sputtering layer on glass substrate 6 surfaces, improves durability; NiCr rete 31,32 forms respectively first, second protective layer, and raising the first width is penetrated the adhesive force of layer 41 and dielectric layer, stops the first width to penetrate the oxidation of layer 41.
Embodiment 2
The present invention is a kind of low radiation coated glass, comprises glass substrate, and its first type surface upper support has multilayer sputtering layer, and described sputtering layer outwards comprises that from glass substrate described sputtering layer outwards comprises TiO successively from glass substrate successively
2rete, NiCr rete, the first low radiating layer, NiCr rete, TiO
2rete, NiCr rete, the second low radiating layer, NiCr rete, TiO
2rete; Wherein, the composition of first, second low radiating layer and percetage by weight thereof are: Ag 99.9%, Sm 0.1%.
Fig. 2 has represented the cross section structure schematic diagram of low radiation coated glass in embodiment 2.Wherein TiO
2rete 21,22,23 forms respectively first, second, third dielectric layer, to improve the hardness of sputtering layer, improves durability; NiCr rete 31,32,33,34 forms respectively first, second, third, fourth protective layer, improves first, second width and penetrates layer 41,42 and the adhesive force of dielectric layer, stops first, second width to penetrate layers 41,42 oxidation.
Embodiment 3
The present invention is a kind of low radiation coated glass, comprises glass substrate, and its first type surface upper support has multilayer sputtering layer, and described sputtering layer outwards comprises TiO successively from glass substrate
2rete, ZnO film layer, NiCr rete, the first low radiating layer, NiCr rete, ZnO film layer, TiO
2rete, NiCr rete, the second low radiating layer, NiCr rete, TiO
2rete, ZnO film layer, NiCr rete, the 3rd low radiating layer, NiCr rete, ZnO film layer, TiO
2rete; Wherein, the composition of first, second, third low radiating layer and percetage by weight thereof are: Ag 98.5%, La 0.5% and Sm 1%.
Fig. 3 has represented the cross section structure schematic diagram of low radiation coated glass in embodiment 3.TiO
2rete 21,22,23,24 forms first, second, third compound dielectric layer with ZnO film layer 51,52,53,54 one by one, and wherein ZnO film layer 51,52,53,54 improves anti-reflection property and the planarization of retes; NiCr rete 31,32,33,34,35,36 forms respectively first, second, third, fourth, the 5th, the 6th protective layer; improve first, second, third width and penetrate the adhesive force of layer 41,42,43 and dielectric layer, stop first, second, third width to penetrate the oxidation of layer 41,42,43.
Embodiment 4
The present invention is a kind of low radiation coated glass, comprises glass substrate, and its first type surface upper support has multilayer sputtering layer, and described sputtering layer outwards comprises Si successively from glass substrate
3n
4rete, ZnO film layer, NiCr rete, the first low radiating layer, NiCr rete, ZnO film layer, Si
3n
4rete, NiCr rete, the second low radiating layer, NiCr rete, Si
3n
4rete, ZnO film layer, NiCr rete, the 3rd low radiating layer, NiCr rete, ZnO film layer, Si
3n
4rete; Wherein, the composition of first, second, third low radiating layer and percetage by weight thereof are: Ag 99%, La 0.5% and Sm 0.5%.
Fig. 4 has represented the cross section structure schematic diagram of low radiation coated glass in embodiment 4.Si
3n
4rete 11,12,13,14 forms first, second, third compound dielectric layer with ZnO film layer 51,52,53,54 one by one, and wherein ZnO film layer 51,52,53,54 improves anti-reflection property and the planarization of retes; NiCr rete 31,32,33,34,35,36 forms respectively first, second, third, fourth, the 5th, the 6th protective layer; improve first, second, third width and penetrate the adhesive force of layer 41,42,43 and dielectric layer, stop first, second, third width to penetrate the oxidation of layer 41,42,43.
In embodiment 1-4, the sputtering layer of low radiation coated glass forms respectively Local Symmetric structure, overcome to a certain extent the destruction of stress release to sputtering layer in deposition process and heat treatment process process, improve the durability of sputtering layer, and then improved plated film stability and the radiance stability of low radiation coated glass.
The above is only the preferred embodiment of the present invention; it should be pointed out that for those skilled in the art, do not departing under the prerequisite of the technology of the present invention principle; can also make some improvements and modifications, these improvements and modifications also should be considered as protection scope of the present invention.
Claims (6)
1. a low radiation coated glass, is characterized in that, comprises glass substrate, and its first type surface upper support has multilayer sputtering layer, and described sputtering layer comprises low radiating layer; Wherein, the composition of low radiating layer and percetage by weight thereof are: Ag 90 ~ 99.9%, La and/or Sm 0.1 ~ 10%.
2. low radiation coated glass as claimed in claim 1, is characterized in that, the composition of described low radiating layer and percetage by weight thereof are: Ag 98.5 ~ 99.9%, La and/or Sm 0.1 ~ 1.5%.
3. low radiation coated glass as claimed in claim 2, is characterized in that, described sputtering layer outwards comprises the first dielectric layer, the first protective layer, the first low radiating layer, the second protective layer, the second dielectric layer successively from glass substrate.
4. low radiation coated glass as claimed in claim 2; it is characterized in that, described sputtering layer outwards comprises the first dielectric layer, the first protective layer, the first low radiating layer, the second protective layer, the second dielectric layer, the 3rd protective layer, the second low radiating layer, the 4th protective layer, the 3rd dielectric layer successively from glass substrate.
5. low radiation coated glass as claimed in claim 2; it is characterized in that, described sputtering layer outwards comprises the first dielectric layer, the first protective layer, the first low radiating layer, the second protective layer, the second dielectric layer, the 3rd protective layer, the second low radiating layer, the 4th protective layer, the 3rd dielectric layer, the 5th protective layer, the 3rd low radiating layer, the 6th protective layer, the 4th dielectric layer successively from glass substrate.
6. the low radiation coated glass as described in claim 3 to 5 any one, it is characterized in that, described dielectric layer is the composite bed that the composite bed that is composited of titanium oxide rete and zinc oxide rete or silicon nitrogen oxide rete and zinc oxide rete are composited; Described protective layer is NiCr rete.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410335378.7A CN104118157A (en) | 2014-07-15 | 2014-07-15 | Low-radiation coated glass |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410335378.7A CN104118157A (en) | 2014-07-15 | 2014-07-15 | Low-radiation coated glass |
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|---|---|
| CN104118157A true CN104118157A (en) | 2014-10-29 |
Family
ID=51763904
Family Applications (1)
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|---|---|---|---|
| CN201410335378.7A Pending CN104118157A (en) | 2014-07-15 | 2014-07-15 | Low-radiation coated glass |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105621901A (en) * | 2015-12-23 | 2016-06-01 | 内蒙古坤瑞玻璃股份有限公司 | Rare earth doped and modified single crystal silver Low-E glass and preparation method thereof |
| CN107056084A (en) * | 2017-05-31 | 2017-08-18 | 信义节能玻璃（芜湖）有限公司 | Three-silver-layer low-radiation coated glass and manufacture method and application |
| CN111253084A (en) * | 2020-03-25 | 2020-06-09 | 四川猛犸半导体科技有限公司 | Thin film device |
| CN115093801A (en) * | 2022-06-21 | 2022-09-23 | 常州山由帝杉防护材料制造有限公司 | Energy-saving window film for hollow glass and preparation method and application thereof |
| CN116375358A (en) * | 2023-03-17 | 2023-07-04 | 吴江南玻华东工程玻璃有限公司 | Low-E coated glass matched with photovoltaic cell and preparation method |
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| TW200632120A (en) * | 2004-12-10 | 2006-09-16 | Heraeus Gmbh W C | Sputter target of a silver alloy, its use and glass substrate with thermal insulation layer |
| CN101218185A (en) * | 2005-05-11 | 2008-07-09 | 旭硝子欧洲平板玻璃股份有限公司 | Sun blocking stack |
| CN102515562A (en) * | 2011-12-23 | 2012-06-27 | 福耀玻璃工业集团股份有限公司 | Coated product |
| CN203567281U (en) * | 2013-09-02 | 2014-04-30 | 信义玻璃（营口）有限公司 | Double-silver low-emissivity coated glass |
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Patent Citations (5)
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| JPS5957235A (en) * | 1982-09-27 | 1984-04-02 | Nippon Telegr & Teleph Corp <Ntt> | Optical recording thin film |
| TW200632120A (en) * | 2004-12-10 | 2006-09-16 | Heraeus Gmbh W C | Sputter target of a silver alloy, its use and glass substrate with thermal insulation layer |
| CN101218185A (en) * | 2005-05-11 | 2008-07-09 | 旭硝子欧洲平板玻璃股份有限公司 | Sun blocking stack |
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Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105621901A (en) * | 2015-12-23 | 2016-06-01 | 内蒙古坤瑞玻璃股份有限公司 | Rare earth doped and modified single crystal silver Low-E glass and preparation method thereof |
| CN107056084A (en) * | 2017-05-31 | 2017-08-18 | 信义节能玻璃（芜湖）有限公司 | Three-silver-layer low-radiation coated glass and manufacture method and application |
| CN107056084B (en) * | 2017-05-31 | 2023-11-17 | 信义节能玻璃（芜湖）有限公司 | Three-silver low-emissivity coated glass and manufacturing method and application thereof |
| CN111253084A (en) * | 2020-03-25 | 2020-06-09 | 四川猛犸半导体科技有限公司 | Thin film device |
| CN115093801A (en) * | 2022-06-21 | 2022-09-23 | 常州山由帝杉防护材料制造有限公司 | Energy-saving window film for hollow glass and preparation method and application thereof |
| WO2023245542A1 (en) * | 2022-06-21 | 2023-12-28 | 常州山由帝杉防护材料制造有限公司 | Energy-saving window film for insulating glass unit, preparation method therefor, and use thereof |
| CN115093801B (en) * | 2022-06-21 | 2024-04-19 | 江苏航天山由科技有限公司 | Energy-saving window film for hollow glass and preparation method and application thereof |
| CN116375358A (en) * | 2023-03-17 | 2023-07-04 | 吴江南玻华东工程玻璃有限公司 | Low-E coated glass matched with photovoltaic cell and preparation method |
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Application publication date: 20141029 |