CN104014509B - A kind of large stretch of cleaning machine - Google Patents

A kind of large stretch of cleaning machine Download PDF

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Publication number
CN104014509B
CN104014509B CN201410251767.1A CN201410251767A CN104014509B CN 104014509 B CN104014509 B CN 104014509B CN 201410251767 A CN201410251767 A CN 201410251767A CN 104014509 B CN104014509 B CN 104014509B
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China
Prior art keywords
cleaning
single arm
arm robot
frame
cleaning machine
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CN201410251767.1A
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CN104014509A (en
Inventor
叶竹之
石清
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Sichuan Taimeike Technology Co., Ltd.
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Chengdu Tai Meike Crystal Tech Inc
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Priority to CN201410251767.1A priority Critical patent/CN104014509B/en
Publication of CN104014509A publication Critical patent/CN104014509A/en
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/10Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • B08B3/123Cleaning travelling work, e.g. webs, articles on a conveyor
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26DRYING
    • F26BDRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B21/00Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Cleaning By Liquid Or Steam (AREA)

Abstract

The invention discloses a kind of large stretch of cleaning machine, it comprises frame (6), high-pressure blast equipment for drying (15), the erection of frame (6) middle and lower part has loading working table (7), ultrasonic cleaner (9), ultrasonic wave shake plate, wide slow moving water-removal groove (10), conveying device (12), frame (6) top is provided with reducing motor, guide rail (2) and single arm robot (3), single arm robot (3) is located at guide rail (2) and goes up and drive single arm robot (3) to move horizontally on guide rail (2) by reducing motor, single arm robot (3) upper end is provided with cylinder (4), reducing motor is positioned at cylinder (4) back lower place, cylinder (4) makes single arm robot (3) move up and down, frame (6) is also provided with a controller (5), controller (5) is electrically connected with reducing motor (1) and cylinder (4).The invention has the beneficial effects as follows: it has the advantage that automaticity is high, product yield is high, product quality is high and energy consumption is low.

Description

A kind of large stretch of cleaning machine
Technical field
The present invention relates to cleaning machine, particularly a kind of large stretch of cleaning machine.
Background technology
Producing and in the middle of life, needing clean thing a lot, kind and the link of needs cleaning are also a lot.Therefore, in order to tackle the clean thing of these numerous needs, society there is multiple cleaning equipment, have employed multiple cleaning process, for example embathe, scrub, pressure washing, vibration washing and steam purge etc., but when the article surface more complicated in the face of needing cleaning, as some surface irregularities, the component of machine having blind hole, some little especially and cleannes are had higher requirements products, as: during the part, electronic devices and components, circuit board assemblies etc. of clock and watch and precision optical machinery; Conventional cleaning method cannot reach requirement, even steam clean and Cleaning by High Pressure Water Jet also cannot meet the demand higher to cleannes.
Current supersonic wave cleaning machine is as the cleaning device that a kind of cleaning performance is good, and it has been widely used in the fields such as electronic apparatus, jewel, clock and watch, optical-mechanical.Supersonic wave cleaning machine is generally made up of ultrasonic cleaner, supersonic generator and the ultrasonic wave vibration plate etc. that includes oscillating plate and ultrasonic transducer, wherein, ultrasonic cleaner generally adopts good springiness, corrosion resistant high-quality stainless steel is made, ultrasonic wave vibration plate can adopt side hanging or bottom type to be installed in ultrasonic cleaner, ultrasonic transducer is fixedly installed in oscillating plate, and ultrasonic transducer is electrically connected with supersonic generator by connecting line.
Supersonic wave cleaning machine principle mainly transducer converts the acoustic energy in power ultrasonic frequency source to mechanical oscillation and by cleaning cell wall to the cleaning fluid radiate supersonic wave in trough, enables the microbubble in groove in liquid under the effect of sound wave thus keep vibrating.When acoustic pressure or the sound intensity be under pressure arrive to a certain degree time, bubble will undergoes rapid expansion, then closes suddenly again.In this section of process, the moment that bubble is closed produces shock wave, make the pressure and the office's temperature adjustment that produce 1012-1013pa around bubble, the immense pressure that this ultrasonic cavitation produces can be destroyed insoluble dirt and make them break up in solution, and steam type cavitation is to the direct repeated stock of dirt.Destroy on the one hand the absorption on dirt and cleaning part surface, another aspect can cause the fatigue rupture of crud layer and refuted from thus reach the object on cleaning objects surface.
Current wafer cleaning process is that teetertotter cleaning in single groove ultrasonic machine by wafer bulk storage in cleaning frame, surpasses wash through twice, one rinsing, dry with baking box again, complete final work, but wafer bulk storage is in cleaning frame, wafer stacks, be difficult to separately, wafer cleaning is clean, and rocks cleaning and the movement between different cell body needs manual working, wafer adopts baking box to dry, and high-temperature baking affects the physical characteristic of wafer.
Summary of the invention
The object of the invention is to the shortcoming overcoming prior art, large stretch of cleaning machine that a kind of wafer cleaning degree is high, cleaning process automation is high and human cost is low is provided.
Object of the present invention is achieved through the following technical solutions: a kind of large stretch of cleaning machine, it comprises frame, high-pressure blast equipment for drying, turning left from the right side to set up successively in described frame middle and lower part has loading working table, multiple ultrasonic cleaner, ultrasonic wave shake plate, wide slow moving water-removal groove, conveying device, described ultrasonic wave shake plate is arranged on the below in Ultrasonic Cleaning cell body, described upper rack is provided with reducing motor, guide rail and single arm robot, single arm robot to be located on guide rail and to drive single arm robot to move horizontally on guide rail by reducing motor, described single arm robot upper end is provided with cylinder, cylinder makes single arm robot move up and down, single arm robot lower end is provided with multiple hook, described hook hangs with the rack for cleaning of the large wafer of splendid attire, described rack for cleaning comprises at least two pieces of clamps, clamp offers multiple draw-in groove, the two ends of clamp are connected with connecting plate, described frame is also provided with a controller, controller is electrically connected with reducing motor and cylinder.
Described guide rail two ends are provided with the travel switch making the horizontal back and forth movement of single arm robot, and travel switch is connected with controller holding wire.
Described conveying device comprises multiple guide wheel, conveyer belt and conveying motor, described guide wheel is five and horizontal interval is arranged in frame, conveyer belt is looped around on guide wheel, and tightened by the guide wheel at two ends, described conveying motor is arranged in the frame that is positioned at below guide wheel, and conveying motor drives guide wheel to rotate by belt transmission.
Described frame bottom surface is provided with the roller being convenient to machine frame movement.
Clamp on described rack for cleaning is six pieces, and every two pieces of clamps are one group, and the draw-in groove correspondence often organizing clamp is arranged.
The connecting plate of described rack for cleaning is channel-section steel, is connected with many connecting rods between connecting plate, and connecting rod is by the clamp frame of rack for cleaning cavity wherein.
The both sides often organizing clamp of described rack for cleaning and bottom surface are provided with a pin.
Described hook is arranged on single arm robot uniformly and equidistantly.
Described high-pressure blast equipment for drying is positioned at above conveying device, and high-pressure blast equipment for drying is erected in frame.
Described frame upper right side is provided with a laminar flow hood.
The present invention has the following advantages: large stretch of cleaning machine of the present invention, and inserted by wafer in rack for cleaning, the clamp on rack for cleaning makes between wafer completely isolated, reduce the Area of bearing of wafer, guarantee that wafer each can clean up, improve the production yield of wafer, improve the product quality of wafer; Adopt automatic feed/discharge, the mobile employing single armed many hooks manipulator between cell body, adopts and automatically replaces operation manually, can simplify two manpowers, improve the automaticity of cleaning machine, reduce the human cost of wafer manufacture; Laminar flow hood is set, avoids the secondary pollution of wafer, ensure that the quality of product; Adopt high pressure positive blower, dry up with the moisture content of natural wind by wafer surface, reduce energy consumption, reduce the impact on wafer characteristics.
Accompanying drawing explanation
Fig. 1 is structural representation of the present invention
Fig. 2 is the schematic front view of rack for cleaning
Fig. 3 is the schematic top plan view of rack for cleaning
Fig. 4 is that schematic diagram is looked on a left side for rack for cleaning
In figure, 1-laminar flow hood, 2-guide rail, 3-single arm robot, 4-cylinder, 5-controller, 6-frame, 7-loading working table, 8-roller, 9-ultrasonic cleaner, 10-wide slow moving water-removal groove, 11-carries motor, 12-conveying device, 13-guide wheel, 14-conveyer belt, 15-high-pressure blast equipment for drying, 16-links up with, 17-rack for cleaning, 18-clamp, 19-connecting rod, 20-connecting plate, 21-pin.
Detailed description of the invention
Below in conjunction with accompanying drawing, the present invention will be further described, and protection scope of the present invention is not limited to the following stated:
As shown in Figure 1, a kind of large stretch of cleaning machine, it comprises frame 6, high-pressure blast equipment for drying 15, turning left from the right side to set up successively in described frame 6 middle and lower part has loading working table 7, multiple ultrasonic cleaner 9, ultrasonic cleaner 9 in the present embodiment is two, ultrasonic wave shake plate, wide slow moving water-removal groove 10, conveying device 12, described ultrasonic wave shake plate is arranged on the below in ultrasonic cleaner 9 body, described frame 6 top is provided with reducing motor, guide rail 2 and single arm robot 3, single arm robot 3 to be located on guide rail 2 and to drive single arm robot 3 to move horizontally on guide rail 2 by reducing motor, described single arm robot 3 upper end is provided with cylinder 4, cylinder 4 makes single arm robot 3 move up and down, reducing motor is positioned at cylinder (4) back lower place, single arm robot 3 lower end is provided with multiple hook 16, described hook 16 hangs with the rack for cleaning 17 of the large wafer of splendid attire, hook 16 on single arm robot 3 can catch on four rack for cleaning simultaneously, as Fig. 2 ~ Fig. 4, described rack for cleaning 17 comprises at least two pieces of clamps 18, clamp 18 offers multiple draw-in groove, the two ends of clamp 18 are connected with connecting plate 20, described frame 6 is also provided with a controller 5, controller 5 is electrically connected with reducing motor and cylinder 4.
In order to realize single arm robot 3 automatic rotary in the present embodiment, described guide rail 2 two ends are provided with the travel switch making the horizontal back and forth movement of single arm robot 3, travel switch is connected with holding wire with controller 5, when reducing motor rotates forward, reducing motor drives single arm robot 3 to turn left and moves horizontally, when single arm robot 3 touches the travel switch of guide rail 2 left end, reducing motor quits work, travel switch by signal by transmission of wireless signals to controller 5, controller 5 starts cylinder 4, cylinder 4 makes single arm robot 3 move down, when single arm robot 3 moves to down stroke, rack for cleaning 17 on the hook 16 of single arm robot 3 is placed on corresponding position, then cylinder 4 makes single arm robot 3 up move again, when single arm robot 3 runs to up stroke, cylinder 4 quits work, controller 5 starts reducing motor reversion, make single arm robot 3 level toward moving right, when touching the travel switch of guide rail 2 right-hand member, reducing motor quits work, then signal is flowed to controller 5 by wireless signal by travel switch, controller 5 control cylinder 4 is descending, the hook 16 on single arm robot 3 is made to hook rack for cleaning 17, then controller 5 control cylinder 4 is up, rack for cleaning 17 is mentioned, when single arm robot 3 runs to up stroke, cylinder 4 quits work, controller 5 starts reducing motor and rotates forward, single arm robot 3 is turned left move horizontally, then circulate above-mentioned action successively, complete the automatic loading/unloading of rack for cleaning 17.
In the present embodiment, rack for cleaning 17 on loading working table 7, by manually rack for cleaning 17 being placed on loading working table 7, in order to the hook 16 meeting single arm robot 3 can easily hook rack for cleaning 17, described hook 16 is arranged on single arm robot 3 uniformly and equidistantly, and the distance of hook 16 on the distance of rack for cleaning 17 on described loading working table 7, ultrasonic cleaner 9 and wide slow moving water-removal groove 10 and single arm robot 3 is equidistant.
In the present embodiment, described conveying device 12 comprises multiple guide wheel 13, conveyer belt 14 and conveying motor 11, described guide wheel 13 is five and horizontal interval is arranged in frame 6, conveyer belt 14 is looped around on guide wheel 13, and tightened by the guide wheel 13 at two ends, described conveying motor 11 is arranged in the frame 6 that is positioned at below guide wheel 13, and conveying motor 11 drives guide wheel 13 to rotate by belt transmission.
In this implementation column, clamp 18 on described rack for cleaning 17 is six pieces, every two pieces of clamps are one group, and the draw-in groove correspondence often organizing clamp is arranged, chip card is in draw-in groove, make to separate completely between wafer, under ul-trasonic irradiation, guarantee that every wafer can evenly be cleaned, further in order to improve the service life of rack for cleaning 17, the connecting plate 20 of rack for cleaning 17 is stainless steel, many connecting rods 19 are connected with between connecting plate 20, connecting rod 19 is by clamp 18 frame of rack for cleaning 17 cavity wherein, the both sides often organizing clamp of rack for cleaning 17 and bottom surface are provided with a pin 21.
In the present embodiment, described frame 6 upper right side is provided with a laminar flow hood 1, and laminar flow hood 1 avoids cleaned wafer again to pollute, and ensure that the quality of product.
In the present embodiment, described high-pressure blast equipment for drying 15 is positioned at above conveying device 12, and high-pressure blast equipment for drying 15 is erected in frame 6, and rack for cleaning 17 is slowly transported to below high-pressure blast equipment for drying 15 by conveying device 12, make to be carried out drying by cleaned wafer by air-dry mode.
Further in order to realize the movement of frame 6, frame 6 bottom surface is provided with roller 8.
The course of work of the present invention is divided into following steps:
1. sheet is shelved: wafer to be inserted in rack for cleaning 17, make between wafer completely isolated, reduces the Area of bearing of wafer, guarantees that hyperacoustic intensity can be beaten on wafer uniformly;
2. charging: the rack for cleaning 17 installing wafer is put on cleaning machine loading working table 7;
3. move cleaning: reducing motor drives single arm robot 3 left and right horizontal to move, and cylinder 4 stretching motion, makes single arm robot 3 move up and down; Hook 16 on single arm robot 3 can catch on four rack for cleaning 17 simultaneously, by four of the rightmost side rack for cleaning 17(containing feed position) be moved to the left a material level, make the rack for cleaning 17 of the leftmost side be placed in flow line stations; Repetitive operation, makes rack for cleaning 17 successively through each station, completes cleaning;
4. dry: rack for cleaning 17 enters the air-dry region (two stations) on streamline, after induction, high pressure positive blower device 15 works, and dries up with the moisture of natural wind by the wafer surface on rack for cleaning 17;
5. discharging: rack for cleaning 17 is transferred the end that device 14 is transported to streamline, takes out cleaning 17 frame, then please wash frame 17 and put into loading working table 7, then circulate successively, complete the automatic cleaning of large stretch of cleaning machine.

Claims (10)

1. a large stretch of cleaning machine, it comprises frame (6), high-pressure blast equipment for drying (15), it is characterized in that: turning left from the right side to set up successively in described frame (6) middle and lower part has loading working table (7), multiple ultrasonic cleaner (9), ultrasonic wave shake plate, wide slow moving water-removal groove (10), conveying device (12), described ultrasonic wave shake plate is arranged on the below in ultrasonic cleaner (9) body, described frame (6) top is provided with reducing motor, guide rail (2) and single arm robot (3), single arm robot (3) is located at guide rail (2) and goes up and drive single arm robot (3) to move horizontally on guide rail (2) by reducing motor, described single arm robot (3) upper end is provided with cylinder (4), cylinder (4) makes single arm robot (3) move up and down, reducing motor is positioned at cylinder (4) back lower place, single arm robot (3) lower end is provided with multiple hook (16), described hook (16) hangs with the rack for cleaning (17) of the large wafer of splendid attire, described rack for cleaning (17) comprises at least two pieces of clamps (18), (18) offer multiple draw-in groove to clamp, the two ends of clamp (18) are connected with connecting plate (20), described frame (6) is also provided with a controller (5), controller (5) is electrically connected with reducing motor and cylinder (4).
2. the large stretch of cleaning machine of one according to claim 1, is characterized in that: described guide rail (2) two ends are provided with the travel switch making single arm robot (3) horizontal back and forth movement, and travel switch is connected with holding wire with controller (5).
3. the large stretch of cleaning machine of one according to claim 1, it is characterized in that: described conveying device (12) comprises multiple guide wheel (13), conveyer belt (14) and conveying motor (11), described guide wheel (13) is five and horizontal interval is arranged in frame (6), conveyer belt (14) is looped around on guide wheel (13), and tightened by the guide wheel (13) at two ends, described conveying motor (11) be arranged on be positioned at guide wheel (13) below frame (6) on, and conveying motor (11) drive guide wheel (13) to rotate by belt transmission.
4. the large stretch of cleaning machine of one according to claim 1, is characterized in that: described frame (6) bottom surface is provided with the roller (8) being convenient to frame (6) movement.
5. the large stretch of cleaning machine of one according to claim 1, is characterized in that: the clamp (18) on described rack for cleaning (17) is six pieces, and every two pieces of clamps are one group, and the draw-in groove correspondence often organizing clamp is arranged.
6. the large stretch of cleaning machine of one according to claim 1, it is characterized in that: the connecting plate (20) of described rack for cleaning (17) is stainless steel, be connected with many connecting rods (19) between connecting plate (20), connecting rod (19) is by clamp (18) the frame cavity wherein of rack for cleaning (17).
7. the large stretch of cleaning machine of one according to claim 1, is characterized in that: the both sides often organizing clamp and the bottom surface of described rack for cleaning (17) are provided with a pin (21).
8. the large stretch of cleaning machine of one according to claim 1, is characterized in that: described hook (16) is arranged on single arm robot (3) uniformly and equidistantly.
9. the large stretch of cleaning machine of one according to claim 1, is characterized in that: described high-pressure blast equipment for drying (15) is positioned at conveying device (12) top, and high-pressure blast equipment for drying (15) is erected in frame (6).
10. the large stretch of cleaning machine of one according to claim 1, is characterized in that: described frame (6) upper right side is provided with a laminar flow hood (1).
CN201410251767.1A 2014-06-09 2014-06-09 A kind of large stretch of cleaning machine Active CN104014509B (en)

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Application Number Priority Date Filing Date Title
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CN104014509B true CN104014509B (en) 2015-12-02

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CN105363734A (en) * 2015-11-30 2016-03-02 苏州林信源自动化科技有限公司 Hanger mechanism in ultrasonic cleaner
CN105363733A (en) * 2015-11-30 2016-03-02 苏州林信源自动化科技有限公司 Ultrasonic washer
CN105539947B (en) * 2016-03-01 2018-04-03 四川南格尔生物科技有限公司 One kind pneumatically washes bagging apparatus and method
CN107051966A (en) * 2017-03-08 2017-08-18 常州市科沛达超声工程设备有限公司 Full-automatic silicon wafer cleans line and its method of work
CN107470267A (en) * 2017-09-26 2017-12-15 镇江金利源轴承有限公司 A kind of streamline of bearing cleaning
CN109013529A (en) * 2018-07-09 2018-12-18 邝婷 A kind of cleaning sterilizing device for medical tongue depressor in paediatrics
CN109382367A (en) * 2018-09-14 2019-02-26 芜湖美奥机械科技有限公司 The upper end cover cleaning device of air-conditioner compressor outer housing
CN109454149A (en) * 2018-11-06 2019-03-12 天津开山金属模具科技有限公司 Angle bar processing system with oscillatory type self-emptying rescinded angle swage tool
CN109454148A (en) * 2018-11-06 2019-03-12 天津开山金属模具科技有限公司 Angle bar production system with conveyor type self-emptying rescinded angle swage tool
CN110404874B (en) * 2019-06-25 2022-02-01 深圳市荣之鑫科技有限公司 Cleaning and drying device for electroplated silicon wafers for integrated circuit board production
CN111069169A (en) * 2019-12-30 2020-04-28 荆门微田智能科技有限公司 Track type wafer cleaning and drying complete machine assembly line
CN112474563A (en) * 2020-11-10 2021-03-12 深圳市创智联环保设备有限公司 Cleaning and drying device for electroplating piece reciprocating horizontal movement
CN112569381B (en) * 2020-12-02 2022-05-27 戴元君 Medical instrument disinfection device
CN113263009B (en) * 2021-05-19 2023-06-23 南京政通建设工程有限公司 Shaking lifting type flower bed false flower picking and cleaning device
CN114737199B (en) * 2022-03-28 2023-06-27 成都泰美克晶体技术有限公司 SC wafer corrosion cleaning system
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Effective date of registration: 20181113

Address after: 636600 First Floor, Building 10-1, Zhongshan Road Volkswagen Pioneer Park, Bazhong Economic Development Zone, Sichuan Province

Patentee after: Sichuan Taimeike Technology Co., Ltd.

Address before: 610017 No. 103 Tianying Road, West Park of Chengdu High-tech Zone, Sichuan Province

Patentee before: Chengdu Tai Meike Crystal Tech Inc.

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