CN103994876A - Optical axis bounce amount test system - Google Patents
Optical axis bounce amount test system Download PDFInfo
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- CN103994876A CN103994876A CN201410143038.4A CN201410143038A CN103994876A CN 103994876 A CN103994876 A CN 103994876A CN 201410143038 A CN201410143038 A CN 201410143038A CN 103994876 A CN103994876 A CN 103994876A
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Abstract
Disclosed is an optical axis bounce amount test system. The system comprises a paraboloid reflector, a planar mirror, a target source, a raster ruler, a linear guide rail, a slip bench, a displacement control mechanism, and an image acquisition and processing mechanism. The slip bench can move on the linear guide rail; the displacement control mechanism controls the motion of the slip bench; the target source is fixed on the slip bench; the raster ruler is used for measuring the defocus displacement amount of the target source along the guide rail on a main optical axis for calculation of a simulated target distance; the target source provides an aiming target during optical axis bounce amount testing for detected photoelectric instruments working over each spectrum band; optical signals, after reflected through the planar mirror by the target source, are reflected by the paraboloid reflector to the detected photoelectric instruments to form a test optical path; and according to different signals acquired by the image acquisition and processing mechanism when the target source is at different positions, the change amounts of focusing front and rear optical axes are calculated when the detected photoelectric instruments are used to observe a far target and a near target.
Description
Technical field
The present invention relates to a kind of system that the optical axis jerk value of photoelectric instrument is tested, this test macro is mainly used in measuring under laboratory condition before and after photoelectric instrument zoom or front and back are switched in width visual field, and photoelectric instrument aims at the angle variable quantity of optical axis spatial direction.This test macro, owing to can accurately simulating continuously the target of various distances, therefore also can be used for the measurement of many optical axises of hyperchannel photoelectricity instrument spacing intersection precision.The invention belongs to optical detective technology field.
Background technology
In photoelectric instrument, optical axis jerk value refers to the variable quantity of optical axis in visual field switching or continuous vari-focus process.Optical axis jerk value is not stablized constant, and for same photoelectric instrument, its randomness is very large.Optical axis jerk value has important impact to photoelectric instrument pointing accuracy, especially larger on high-precision photoelectric instrument impact.Current, for the optical axis jerk value in the handoff procedure of visual field, be mainly to take target source, parallel light tube, turntable and transit to coordinate test; But lack means of testing for the optical axis jerk value in continuous vari-focus process.The present invention solves optical axis jerk value test problem.Meanwhile, owing to can accurately simulating continuously the target of various distances, therefore also can be used for the measurement of the many optical axises of hyperchannel photoelectricity instrument intersection precision in certain distance.
Summary of the invention
The invention discloses a kind of optical axis jerk value test macro, comprise: optical table (1), off-axis parabolic mirror assembly (2), plane reflection mirror assembly (3), target source assembly (4), grating scale (5), guide rail (6), slippage platform (7), displacement control gear (8), image acquisition and disposal system (9), is characterized in that:
Described each parts are fixed on vibration isolation and stable optical table (1);
Described target source assembly (4) can provide the run-home in when test of optical axis jerk value for being operated in the tested photoelectric instrument (10) of each spectral coverage;
Described target source assembly (4) is fixed on slippage platform (7);
Described slippage platform (7) can be upper mobile at described guide rail (6);
Described displacement control gear (8) is controlled the movement of slippage platform (7);
Described grating scale (5) read head is fixed on slippage platform (7), with target source assembly (4), move simultaneously, and measurement target source component (4) along guide rail (6) the out of focus displacement on primary optical axis, and then calculate the target range of simulation;
The target light signal that described target source assembly (4) produces is reflected by off-axis parabolic mirror assembly (2) again and is projected to tested photoelectric instrument (10) after plane reflection mirror assembly (3) reflection, forms optical system for testing (11);
Described image acquisition and disposal system (9) gather the image that tested photoelectric instrument (10) observes, interpretation goes out each relative impact point in test position aiming graduation center and whether has deviation, if there is deviation, by target source two dimension micrometer mechanism, measure this place's change of error amount, according to the optical position relation of this position, and then the angle variable quantity that before and after focusing, optical axis points to when calculating tested photoelectric instrument and observing far and near target.
Can realize the photoelectric instrument of visible ray, low-light and infrared viewing aiming in continuous vari-focus, focusing process, and the optical axis jerk value test of front and back is switched in visual field.
When target source assembly (4) is placed in to off-axis parabolic mirror assembly (2) focal point F place, be equivalent to simulate infinite point target, f is the focal length of off-axis parabolic mirror assembly (2).
Target source assembly (4) is placed in to off-axis parabolic mirror assembly (2) primary optical axis, and while being X place apart from the distance of focal point F, being equivalent to simulated range is L place target; The optical axis jerk value test macro that is f for off-axis parabolic mirror assembly (2) focal length, when target source assembly (4) is X from off-axis parabolic mirror assembly (2) focal point F to catoptron direction displacement, the target range of simulation is L, and the computing formula of its corresponding relation is:
L=f
2/X
In formula: L---simulated target distance;
F---off-axis parabolic mirror focal length;
X---target source defocusing amount.
Described guide rail is biserial line slideway (6).
For take infinity point as test reference benchmark, the optical axis jerk value of electro-optical system when examination distance is L, its computing formula is:
In formula: θ---the optical axis angle of beating;
F---off-axis parabolic mirror focal length;
X---target source defocusing amount;
X---guidance axis level is to line deviation;
Y---guidance axis is vertically to line deviation.
Accompanying drawing explanation
Fig. 1 optical axis jerk value test macro forms schematic diagram
Fig. 2 simulates the light path schematic diagram of infinite distance target
The light path schematic diagram of Fig. 3 simulated range L target
Fig. 4 graduation aims at schematic diagram
Embodiment
Below in conjunction with accompanying drawing, preferred embodiment of the present invention is described in detail, thereby so that the advantage of invention and feature can be easier to be it will be appreciated by those skilled in the art that, protection scope of the present invention is made to more explicit defining.
Refer to Fig. 1 to Fig. 4, the embodiment of the present invention comprises:
An optical axis jerk value test macro, comprises an optical table 1, off-axis parabolic mirror assembly 2, plane reflection mirror assembly 3, target source assembly 4, grating scale 5, biserial line slideway 6, slippage platform 7, displacement control gear 8, image acquisition and disposal system 9, tested photoelectric instrument 10.
Optical table 1, for each parts of mounting test system, and keeps stable relative position relation.
Off-axis parabolic mirror assembly 2, for tested electro-optical system provides 10 the simulated target of 25m to infinite distance is provided, for guaranteeing that multisystem, all band, high precision measurement need, its bore Φ=400mm, focal distance f=3500mm.
Plane reflection mirror assembly 3, for adjusting the direction of main optical path 11, and extend testing systemic-function.
Target source assembly 4, is mainly used in providing test run-home for being operated in the photoelectric instrument of each spectral coverage, and the displacement of the vertical primary optical axis adjustment of measurement target.
Grating scale 5, for measurement target source along guide rail the out of focus displacement on primary optical axis, and then calculate the target range of simulation.
Biserial line slideway 6, is high precision line slideway, adopts two guide rail working methods, overall length 800mm, and effectively impulse stroke is greater than 500mm, can simulate infinite distance to any distance target of 25m.
Slippage platform 7, carrying target source along primary optical axis translation motion, and drives the read head motion of grating scale 5 on guide rail 6.
Displacement control gear 8, for promoting slippage platform 7 translation motion on line slideway, and controls the position of target source assembly 4.
Image acquisition and disposal system 9, for gathering the image that tested photoelectric instrument observes, interpretation goes out each relative impact point in test position aiming graduation center and whether has deviation, if there is deviation, by the two-dimentional micrometer mechanism of target source 4, measure this place's change of error amount, according to the optical position relation of this position, and then the angle variable quantity that before and after focusing, optical axis points to when calculating tested photoelectric instrument and observing far and near target.
Specified operational procedure and using method in actual test process are as follows:
(1) first tested electro-optical system is set up and is fixed on the 10th position in Fig. 1;
(2) according to spectral radiance scope and the intensity in the spectrum working range select target source 4 of tested instrument, for example, for white-light visualization system, should light graduation background light source; For microvision system, should be first that graduation background light source intensity adjustment is extremely minimum, then strengthen gradually the intensity of light source; For infrared imaging system, should first open graduation wing flats temperature detect switch (TDS), after preheating 1min, work again.
(3) confirm the initial reference test position of target source 4.First the vertical primary optical axis direction of target graduation is made zero, then set along test primary optical axis to initial position.For example selecting infinity point is initial reference position, first starts displacement control gear 8, and the dividing plane of target source 4 is adjusted to position shown in Fig. 2, at off-axis parabolic mirror focal point F place, is now equivalent to simulate infinite point target.
(4) adjust the focal length of tested photoelectric instrument 10, make the target differentiation 12 that in its clear Fig. 4 of observing, target source 4 produces, be now equivalent to electro-optical system observation infinite distance target.Under image acquisition and disposal system 9 auxiliary, to adjust electro-optical system and make it aim at graduation 13 graduation 12 that accurately aims at the mark, the regulation now optical axis of tested electro-optical system is oriented to initial reference optical axis and points to, and it points to angle and counts 0.
(5) the measuring distance L of target simulation shown in design drawing 3, the defocusing amount X of calculating target source 4, its computing formula is:
X=f
2/L
For example, suppose L=100m, f=3.5m, X is:
X=3.5×3.5÷100=0.1225m
(6) start displacement control gear 8, under the measurement monitoring of grating scale 5, move to plane reflection mirror assembly 3 in adjustment aim source 4, stops, now the test position of target source 4 in simulated range 100m when its displacement is 0.1225m.
(7) keep tested electro-optical system 10 whole motionless, only adjust its focal length and make it clearly observe target graduation 12, be now equivalent to electro-optical system observation and aim at the target in 100m distance.Under image acquisition and disposal system 9 auxiliary, judge target graduation 12 and aim at graduation 13 and whether accurately aim at, if still accurately unchanged to optical axis sensing angle before and after the focusing of criterion electro-optical system, optical axis jerk value test result is 0.If change, carry out next step.
(8) the two-dimentional micrometer adjusting mechanism in adjustment aim source 4, under image acquisition and disposal system 9 auxiliary, readjust target graduation 12 and aims at graduation inregister, adjustment magnitude x and y that record measures.
(9) optical axis calculating now by following formula points to angle θ
For example, suppose x=0.001m, y=0.001m, at f=3.5m, under X=0.1225m condition, calculates
θ=arctan[(0.001
2+0.001
2)
1/2/(3.5-0.1225)]=0.02399°
Under above-mentioned sample condition, while recording tested electro-optical system observation 100m distance objective, when it aims at optical axis with respect to observation infinite distance target, the aiming optical axis spatial direction angle jerk value producing because of focusing is 0.02399 °.
The foregoing is only embodiments of the invention; not thereby limit the scope of the claims of the present invention; every equivalent structure or equivalent flow change of utilizing instructions of the present invention and accompanying drawing to do; or be directly or indirectly used in other relevant technical fields, be all in like manner included in scope of patent protection of the present invention.
Claims (6)
1. an optical axis jerk value test macro, comprising: optical table (1), off-axis parabolic mirror assembly (2), plane reflection mirror assembly (3), target source assembly (4), grating scale (5), guide rail (6), slippage platform (7), displacement control gear (8), image acquisition and disposal system (9); It is characterized in that:
Described each parts are fixed on vibration isolation and stable optical table (1);
Described target source assembly (4) can provide the run-home in when test of optical axis jerk value for being operated in the tested photoelectric instrument (10) of each spectral coverage;
Described target source assembly (4) is fixed on slippage platform (7);
Described slippage platform (7) can be upper mobile at described guide rail (6);
Described displacement control gear (8) is controlled the movement of slippage platform (7);
Described grating scale (5) read head is fixed on slippage platform (7), with target source assembly (4), move simultaneously, and measurement target source component (4) along guide rail (6) the out of focus displacement on primary optical axis, and then calculate the target range of simulation;
The target light signal that described target source assembly (4) produces is reflected by off-axis parabolic mirror assembly (2) again and is projected to tested photoelectric instrument (10) after plane reflection mirror assembly (3) reflection, forms optical system for testing;
Described image acquisition and disposal system (9) gather the image that tested photoelectric instrument (10) observes, interpretation goes out each relative impact point in test position aiming graduation center and whether has deviation, if there is deviation, by target source two dimension micrometer mechanism, measure this place's change of error amount, according to the optical position relation of this position, and then the angle variable quantity that before and after focusing, optical axis points to when calculating tested photoelectric instrument and observing far and near target.
2. optical axis jerk value test macro according to claim 1, is characterized in that:
Can realize the photoelectric instrument of visible ray, low-light and infrared viewing aiming in continuous vari-focus, focusing process, and the optical axis jerk value test of front and back is switched in visual field.
3. optical axis jerk value test macro according to claim 2, is characterized in that:
When target source assembly (4) is placed in to off-axis parabolic mirror assembly (2) focal point F, be equivalent to simulate infinite point target, f is the focal length of off-axis parabolic mirror assembly (2).
4. optical axis jerk value test macro according to claim 2, is characterized in that:
Target source assembly (4) is placed in to off-axis parabolic mirror assembly (2) primary optical axis, and while being X place apart from the distance of focal point F, being equivalent to simulated range is L place target; The optical axis jerk value test macro that is f for off-axis parabolic mirror assembly (2) focal length, when target source assembly (4) is X from off-axis parabolic mirror assembly (2) focal point F to catoptron (3) direction displacement, the target range of simulation is L, and the computing formula of its corresponding relation is:
L=f
2/X
In formula: L---simulated target distance;
F---off-axis parabolic mirror focal length;
X---target source defocusing amount.
5. optical axis jerk value test macro according to claim 1, is characterized in that:
Described guide rail is biserial line slideway (6).
6. optical axis jerk value test macro according to claim 2, is characterized in that:
For take infinity point as test reference benchmark, the optical axis jerk value of electro-optical system when examination distance is L, its computing formula is:
In formula: θ---the optical axis angle of beating;
F---off-axis parabolic mirror focal length;
X---target source defocusing amount;
X---guidance axis level is to line deviation;
Y---guidance axis is vertically to line deviation.
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106405856A (en) * | 2016-10-18 | 2017-02-15 | 中国航空工业集团公司洛阳电光设备研究所 | Method for detecting optical axis stability of optical lens during focusing process |
| CN108426700A (en) * | 2017-12-26 | 2018-08-21 | 北京空间机电研究所 | A kind of gravity is directed toward camera lens optical axis the detection method of influence |
| CN110657961A (en) * | 2019-10-12 | 2020-01-07 | 西安泰豪红外科技有限公司 | Method for measuring optical axis shaking amount of zoom camera |
| CN110673338A (en) * | 2019-10-15 | 2020-01-10 | 河南平原光电有限公司 | Method for reducing optical axis jumping quantity of zoom lens under high and low temperature |
| CN110702378A (en) * | 2018-07-10 | 2020-01-17 | 上海微电子装备（集团）股份有限公司 | Optical axis pointing detection device and detection method |
| CN114397090A (en) * | 2021-11-15 | 2022-04-26 | 中国科学院西安光学精密机械研究所 | Method for quickly measuring parallelism of optical axis of continuous zooming camera |
| CN115061289A (en) * | 2022-06-24 | 2022-09-16 | 青岛理工大学 | Rapid assembly system and method for off-axis parabolic mirror |
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Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106405856A (en) * | 2016-10-18 | 2017-02-15 | 中国航空工业集团公司洛阳电光设备研究所 | Method for detecting optical axis stability of optical lens during focusing process |
| CN108426700A (en) * | 2017-12-26 | 2018-08-21 | 北京空间机电研究所 | A kind of gravity is directed toward camera lens optical axis the detection method of influence |
| CN108426700B (en) * | 2017-12-26 | 2019-08-09 | 北京空间机电研究所 | A kind of gravity is directed toward the detection method of influence on camera lens optical axis |
| CN110702378A (en) * | 2018-07-10 | 2020-01-17 | 上海微电子装备（集团）股份有限公司 | Optical axis pointing detection device and detection method |
| CN110702378B (en) * | 2018-07-10 | 2021-08-27 | 上海微电子装备（集团）股份有限公司 | Optical axis pointing detection device and detection method |
| CN110657961A (en) * | 2019-10-12 | 2020-01-07 | 西安泰豪红外科技有限公司 | Method for measuring optical axis shaking amount of zoom camera |
| CN110673338A (en) * | 2019-10-15 | 2020-01-10 | 河南平原光电有限公司 | Method for reducing optical axis jumping quantity of zoom lens under high and low temperature |
| CN114397090A (en) * | 2021-11-15 | 2022-04-26 | 中国科学院西安光学精密机械研究所 | Method for quickly measuring parallelism of optical axis of continuous zooming camera |
| CN114397090B (en) * | 2021-11-15 | 2023-05-02 | 中国科学院西安光学精密机械研究所 | Method for rapidly measuring optical axis parallelism of continuous zoom camera |
| CN115061289A (en) * | 2022-06-24 | 2022-09-16 | 青岛理工大学 | Rapid assembly system and method for off-axis parabolic mirror |
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Application publication date: 20140820 |