CN105571833B - Wave aberration indoor detection method under the heavy caliber photoelectric detecting system difference elevation angle - Google Patents
Wave aberration indoor detection method under the heavy caliber photoelectric detecting system difference elevation angle Download PDFInfo
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Abstract
The present invention relates to wave aberration indoor detection methods under a kind of heavy caliber photoelectric detecting system difference elevation angle, are disposed in light path：Target target plate and lighting system；Small-bore collimating optical system with iris；First turns back beam splitter prism；Second turns back beam splitter prism；Head third is measured to turn back beam splitter prism；Measure the first beam splitter prism of head；Second beam splitter prism；First photoelectric auto-collimator；Third beam splitter prism；Second photoelectric auto-collimator.Wave aberration indoor detection method under the heavy caliber photoelectric detecting system difference elevation angle of the present invention is mainly used for wave aberration under the heavy caliber photoelectric detecting system difference elevation angle and detects, can realize image quality and its stability quantitative assessment under the different elevations angle.
Description
Technical field
The invention belongs to optical detection and field of optical measurements, more particularly to a kind of heavy caliber photoelectric detecting system difference is faced upward
Wave aberration indoor detection method under angle.
Background technology
Constantly increase with primary optical system bore in ground photoelectric detecting system, photoelectric detecting system tracking imaging process
The Large diameter primary optical system elevation angle, which will change, to produce bigger effect its optical performance stability.Correlation emulation and experiment table
Bright, when optical system bore is close to 3m, the elevation angle is changed to the face deformationization that zenith (90 °) caused by horizontal (0 °) and about reaches
More than λ/11 (RMS, λ=632.8nm), the defocusing amount caused by elevation angle variation is more than 17mm, and optical axis dynamic error in pointing is more than
0.01°.As two aspects of optical performance stability, the stability of image quality and optical parameter directly affects imaging and differentiates
Power and measurement accuracy.At present heavy caliber photoelectric detecting system mostly by install additional adaptive optics system to above-mentioned wave front aberration with
Atmospheric perturbation introduce synthesis wavefront distortion carry out adaptive corrective, but be limited to adaptive optics system dynamic straightening speed with
Contradiction between levelling thickness range, therefore, to assure that variable quantity can ensure photodetection in levelling thickness range before optical system complex wave
The image quality of system.And the system wavefront distortion that gravity causes under the above-mentioned different elevation angle be mostly before the larger low frequency wave of magnitude accidentally
Difference needs to be measured and verified and controlled in a certain range before adaptive optics system installs additional.
Currently used for system wave aberration detection heavy-calibre planar speculum, parallel light tube auto-collimation interference detection method or
Sub-aperture stitching interferometer detection method is difficult to be suitable for heavy caliber photoelectric detecting system Wave-front measurement under the different elevations angle.For this purpose, this
Invention propose it is a kind of based on sub-aperture slope of wave surface sampled measurements, then reconstruct unified wavefront optical path arrangement and
Corresponding test equipment technical solution, available for the system wave aberration under the detection heavy caliber photoelectric detecting system difference elevation angle.Mesh
Before, above-mentioned sub-aperture slope sampled measurements principle is limited by sampling density, system configuration etc. and is limited, and can not still replace completely so far
Unified interference detection or outdoor sight star detection, presently, there are main limitation include：
(1) heeling error of itself is difficult to control during sub-aperture scanning, and current technology thinking passes through raising mostly
Kinematic accuracy, positioning accuracy of mechanical scanning system etc. passively reduce this error.Thus equipment instrument, weight is caused substantially to increase
Add.And limited by thus caused sampling accumulated error, sub-aperture sampling density is difficult to improve, the inhibition of sub-aperture heeling error
Residual error is still unsatisfactory for the accuracy requirement of wavefront reconstruction.
(2) it during sub-aperture scanning, is influenced by environmental errors such as flow perturbation, the vibrations of non-equiphase, sub-aperture slope
There are random meausrement errors, are equivalent to and attached a random error background in the wavefront finally reconstructed, in wavefront information
Medium-high frequency part bring larger measurement error.
(3) to ensure scanning accuracy, the most volume weight of current measuring device is huge, and being not easy to realize makes under the different elevations angle
With flexibility is poor with applicability.
Invention content
Be to solve current heavy caliber, very heavy caliber photoelectric detecting system during engineering development, system imaging quality and
Its stability is difficult to quantitative, objective evaluation engineering roadblock, is scanned based on current sub-aperture slope and reconstructs unified wavefront
Basic skills, the present invention provides wave aberration indoor detection method under a kind of heavy caliber photoelectric detecting system difference elevation angle.
In order to solve the above-mentioned technical problem, technical scheme of the present invention is specific as follows：
Wave aberration indoor detection method under a kind of heavy caliber photoelectric detecting system difference elevation angle, sets successively in light path
It is equipped with：Target target plate and lighting system；Small-bore collimating optical system with iris；First turns back beam splitter prism；The
Two turn back beam splitter prism；Head third is measured to turn back beam splitter prism；Measure the first beam splitter prism of head；Second beam splitter prism；The
One photoelectric auto-collimator；Third beam splitter prism；Second photoelectric auto-collimator；
This method includes the following steps：
(1), photoelectric detecting system to be measured is controlled to rotate pitching shafting to a fixation pitch angle, and locks the shafting and ensures to survey
Pitch axis is stablized during amount；
(2), the laser light source in target target plate and lighting system is through the asterism mesh on spatial filter back lighting Target Board
Mark, and be irradiated into first for small-bore collimated light beam through the small-bore collimating optical system collimation with iris and turn back point
Beam prism；
(3), incident light is divided into two beams by the first beam splitter prism of turning back, wherein a branch of turn back is irradiated into light to be measured after 90 °
Electrical resistivity survey examining system, and imaging is received by its CCD；
(4), the small-bore directional light of another way for turning back beam splitter prism beam splitting through first is irradiated into second and turns back beam splitting rib
Mirror is simultaneously divided into two beams, wherein a branch of turn back is irradiated into photoelectric detecting system to be measured after 90 ° and is used as with reference to light beam, works as high speed machine
During shutter opening, corresponding asterism picture is received, and recorded after image procossing by the ccd detector in photoelectric detecting system to be measured
The two-dimensional coordinate of picture point；
(5), another beam, which is irradiated into, measures head, as measuring beam, through measure head third turn back beam splitter prism, survey
Photoelectric detecting system to be measured is irradiated into after amount head the first beam splitter prism beam splitting；When corresponding measurement head high speed machine shutter
During unlatching, corresponding asterism picture is received, and through image procossing postscript video recording point by the ccd detector in photoelectric detecting system to be measured
Two-dimensional coordinate；
(6), through measure head third turn back beam splitter prism beam splitting the small-bore collimated light beam of another beam directly by the first light
Electric autocollimator receives, and measures and obtain between the relative initial position of sub-aperture scanning position from y to scanning shift platform, z to scanning
Rotation of the scanning head around z-axis and around x-axis caused by the mechanical movement error of displacement platform；
(7), through measuring the small-bore collimated light beam of another beam of head the first beam splitter prism beam splitting through the second beam splitter prism, the
The second photoelectric auto-collimator is irradiated into after three beam splitter prisms, sub-aperture scanning position is directly measured by the second photoelectric auto-collimator
The scanning head caused by y to scanning shift platform, z to scanning shift platform mechanical movement error is around y-axis between putting relative initial position
Rotation；
(8), after completing above-mentioned (1)~(7) step measuring process, by the corresponding scanning sub-aperture of comprehensive electric-control system record
Measurement data include：By being remembered in the picture point two-dimensional coordinate of examining system record, step (4) by examining system CCD in step (3)
By the examining system CCD picture point two-dimensional coordinates recorded and step (6), step in the picture point two-dimensional coordinate of record, step (5)
(7) angle value that is recorded respectively from two photoelectric auto-collimators in, y are to scanning shift platform and z to scanning shift platform cathetus light
The sub-aperture sampled point two-dimensional coordinate that grid are fed back；Above-mentioned each measurement data will be as one group of data record in over-determined systems
In the measured database of data processing and resolving system；
(9), distinguish stepping to scanning shift platform to scanning shift platform and z from comprehensive electric control system controls y, make measurement sub-aperture
Diameter is moved to next sampled measurements position in pupil plane, measures another group after repeating above-mentioned measuring process (1)~(7) again
Data are recorded in measured database；
(10), it completes to cover photoelectric detecting system to be measured；After the sub-aperture scanning of entire pupil plane, by data processing system
Call it is above-mentioned it is each measure each group measurement data that is recorded of position, together with the focal length of photoelectric detecting system to be measured being previously entered,
The optical parameters such as relative aperture, then the wave according to corresponding algorithm resolving over-determined systems, that is, restructural photoelectric detecting system to be measured
Preceding information and items Zernike coefficients.
In the above-mentioned technical solutions, step is further included after step (10)：
(11), it is measured using sub-aperture wavefront Relative slope, wavefront reconstruction error caused by low frequency flow perturbation in inhibition；
Second turns back beam splitter prism high speed machine shutter opening, measures head high speed machine shutter close, at this time small-bore collimated light beam
The two-dimensional coordinate of an asterism picture is recorded by photoelectric detecting system CCD to be measured after optical path；It second turns back beam splitting rib later
Mirror high speed machine shutter close measures head high speed machine shutter opening, then photoelectric detecting system CCD to be measured is recorded another again
The two-dimensional coordinate of a asterism picture.
In the above-mentioned technical solutions, step is further included after step (11)：
(12), after completing above-mentioned measuring process, the pitching shafting of photoelectric detecting system to be measured is rotated to next measurement angle
And repeat above-mentioned scanning survey step.
The present invention has following advantageous effect：
(1) wave aberration indoor detection method under the heavy caliber photoelectric detecting system difference elevation angle of the invention is mainly used for big
Wave aberration detects under the bore photoelectric detecting system difference elevation angle, can realize that image quality and its stability quantify under the different elevations angle
Evaluation.At present for system wave aberration detection be only capable of realize horizontal measurement, for the image quality at other elevations angle can only theory estimate
It calculates or is verified by outdoor sight star.Theoretical calculation is there are large error, and outdoor sight star method is disturbed by observation condition, outdoor environment
The conditions such as dynamic limit the measurement result that there are larger random error, is not easy to obtain and accurately and stablize.And outdoor sight satellite experiment
It needs just carry out after photoelectric detecting system is fully integrated, if adaptive optics system is insufficient to compensate for image quality wave
It is dynamic, then it needs to return to the state of the art of principal optical plane system adjustment, debug repeatedly again.And the present invention can carry out image quality inspection indoors
It surveys, measuring environment, target property are artificial controllable, and precision and repeatability are higher.In addition measuring device using the present invention can
In principal optical plane adjustment stage examinations, meets the needs of whole development flow is to test.
(2) wave aberration indoor detection method under the heavy caliber photoelectric detecting system difference elevation angle of the invention, proposes sub-aperture
It measures, the integrated light path arrangement that sub-aperture heeling error monitors, flow perturbation error inhibits, can effectively improve single
The measurement accuracy of sub-aperture.The accumulated error of entire scanning process can be thus reduced, sampling density is helped to improve and obtains
Close to the resolution ratio of interference detection, greatly improve the sampling of sub-aperture slope of wave surface and reconstruct unified this fundamental measurement side of wavefront again
The scope of application of method.
(3) wave aberration indoor detection method under the heavy caliber photoelectric detecting system difference elevation angle of the invention proposes to measure dress
The technical solution for being directly connected in electro-optical system main optical lens barrel end to be measured is put, system wave aberration is examined under the different elevations angle to realize
It surveys.The program need to carry out integrated design with examining system, be different from conventional external measuring device and the discrete work of examining system
Technology path, greatly improving test system flexibility and while reduce equipment cost, additionally aiding reduction vibration position phase
The sub-aperture the gradient measuring error as caused by coordinate drift of asterism caused by asynchronous.
Description of the drawings
The present invention is described in further detail with reference to the accompanying drawings and detailed description.
Fig. 1 is the light path arrangement of wave aberration indoor detection method under the heavy caliber photoelectric detecting system difference elevation angle of the invention
Schematic diagram.
Fig. 2 is the arrangement schematic diagram for connecting light path shown in Fig. 1 of photoelectric detecting system.
Fig. 3 is the coordinate system schematic diagram of light path shown in Fig. 1.
Fig. 4 is the measurement head combined prism principle schematic of light path shown in Fig. 1.
Fig. 5 is the beam splitter prism principle schematic of turning back of light path shown in Fig. 1.
Fig. 6 is photoelectric detecting system operation principle schematic diagram.
Fig. 7 is to realize the basic principle schematic that environmental perturbation error inhibits.
Reference numeral in figure is expressed as：
1-target target plate and lighting system；
2-small-bore the collimating optical system with iris；
3-the first turns back beam splitter prism；
4-the second turns back beam splitter prism；
5-measure head third and turn back beam splitter prism；
6-measurement the first beam splitter prism of head；
7-the second beam splitter prism；
8-the first photoelectric auto-collimator；
9-third beam splitter prism；
10-the second photoelectric auto-collimator；
11-y is to scanning shift platform；
12-z is to scanning shift platform；
13-sub-aperture scanning wave aberration measuring device；
14-photoelectric detecting system to be measured；
15-the second turns back beam splitter prism high speed machine shutter；
16-measurement head high speed machine shutter；
Remaining middle low frequency flow perturbation near 17-measured zone.
Specific embodiment
Wave aberration indoor detection method specifically proposes under the heavy caliber photoelectric detecting system difference elevation angle of the present invention：(1)
The technical solution of sub-aperture scanning is realized using polygon prism scanning system；(2) sub-aperture absolute slope measurement is improved to relatively
Slope measurement；(3) the sub-aperture two dimension heeling error monitoring light path of design integration；(4) present invention can also effectively realize measurement
Equipment lightweight, and test equipment and photoelectric detecting system to be measured are connected uses based on this proposition, with its pitching shafting of utilization
The technical solution at the different elevations angle is provided.At present, we have had developed Proof-Of Principle experimental rig, and pass through and test actual verification
The validity of foregoing invention content.
The present invention is described in detail below in conjunction with the accompanying drawings.
Wave aberration indoor detection method under the heavy caliber photoelectric detecting system difference elevation angle of the present invention, needs first before test
Precision calibration is carried out to the focal plane position of the small-bore collimating optical system 2 with iris in Fig. 1, due to the collimation
The focal length of system is far smaller than the focal length of electro-optical system to be measured, therefore need to ensure that its defocusing amount is less than 1/8 depth of focus.It can be used later
Scanning optical path in plane mirror close adjustment Fig. 1, it is ensured that the pattern displacement amount as caused by guide rail kinematic error is less than osculum
The 1/17 of diameter collimating optical system bore.After completing self calibration, the heavy caliber photoelectric detecting system difference of the present invention can be used to face upward
Wave aberration indoor detection method carries out wave aberration detection under angle.
(1) photoelectric detecting system to be measured 14 in attached drawing 6 is controlled to rotate pitching shafting to a fixation pitch angle first, and is locked
The tight shafting ensures that pitch axis is stablized in measurement process.
(2) laser light source in target target plate and lighting system 1 is through the asterism mesh on spatial filter back lighting Target Board
Mark, and be irradiated into first for small-bore collimated light beam through the collimation of small-bore collimating optical system 2 with iris and turn back
Beam splitter prism 3.
Incident light is divided into two beams by (3) first beam splitter prisms 3 of turning back, wherein a branch of turn back is irradiated into light to be measured after 90 °
Electrical resistivity survey examining system 14, and imaging is received by its CCD.It can be according to position coordinates of the picture point in CCD image planes and optical system
Sub-aperture scanning wave aberration measuring device 13 and photoelectric detecting system to be measured in relevant parameter interpretation measurement process shown in Fig. 6
To displacement, i.e. vibration phase difference before whether occurring between 14.
(4) the small-bore directional light of another way for turning back 3 beam splitting of beam splitter prism through first is irradiated into second and turns back beam splitting rib
Mirror 4 is simultaneously divided into two beams, wherein a branch of turn back is irradiated into photoelectric detecting system 14 to be measured after 90 ° as with reference to light beam, when at a high speed
When mechanical shutter 15 is opened, corresponding asterism picture is received by the ccd detector in photoelectric detecting system 14 to be measured, and through image at
Manage the two-dimensional coordinate of postscript video recording point.
(5) another beam, which is irradiated into, measures head, as measuring beam, through measure head third turn back beam splitter prism 5, survey
Photoelectric detecting system 14 to be measured is irradiated into after amount 6 beam splitting of the first beam splitter prism of head.When corresponding measurement head high speed machine
When shutter 16 is opened, corresponding asterism picture is received, and after image procossing by the ccd detector in photoelectric detecting system 14 to be measured
Record picture point two-dimensional coordinate.
(6) through measure head third turn back 5 beam splitting of beam splitter prism the small-bore collimated light beam of another beam directly by the first light
Electric autocollimator 8 receives, and measures and obtain between the relative initial position of sub-aperture scanning position from y to scanning shift platform 11, z to sweeping
Scanning head caused by retouching the mechanical movement error of displacement platform 12 around z-axis and around x-axis rotation (determined by lens optical characteristic,
Sub-aperture heeling error is not introduced around z-axis rotation), that is, the x of sub-aperture is scanned to heeling error.Above-mentioned coordinate definition such as figure attached drawing
Shown in 3 coordinate system schematic diagrames.
(7) through measure 6 beam splitting of the first beam splitter prism of head the small-bore collimated light beam of another beam through the second beam splitter prism 7,
The second photoelectric auto-collimator 10 is irradiated into after third beam splitter prism 9, sub-aperture is directly measured by the second photoelectric auto-collimator
The scanning caused by y to scanning shift platform 11, z to 12 mechanical movement error of scanning shift platform between scan position relative initial position
The y of sub-aperture is scanned to heeling error around the rotation of y-axis in head.
(8) after completing above-mentioned (1)~(7) step measuring process, by the corresponding scanning sub-aperture of comprehensive electric-control system record
Measurement data include：By examining system in the picture point two-dimensional coordinate that is recorded in step (3) by examining system 14, step (4)
The picture point two-dimensional coordinate of 14CCD records, in step (5) by the examining system 14CCD picture point two-dimensional coordinates recorded and step
(6), the angle value that is recorded respectively from two photoelectric auto-collimators in step (7), y are to scanning shift platform 11 and z to scanning shift
The sub-aperture sampled point two-dimensional coordinate that 12 cathetus grating of platform is fed back.Above-mentioned each measurement data will be as in over-determined systems
One group of data is recorded in the measured database of data processing and resolving system.
(9) distinguish stepping to scanning shift platform 12 to scanning shift platform 11 and z from comprehensive electric control system controls y, make measurement
Sub-aperture is moved to next sampled measurements position in pupil plane, repeats another group again behind above-mentioned measuring process (1)~(7)
Measurement data record is in measured database.
(10) after the sub-aperture scanning for completing covering 14 entire pupil plane of photoelectric detecting system to be measured, by data processing system
Above-mentioned each each group measurement data for measuring position and being recorded is called, together with the coke of photoelectric detecting system to be measured 14 being previously entered
Over-determined systems, that is, restructural photoelectric detecting system to be measured is resolved away from optical parameters such as, relative apertures, then according to corresponding algorithm
Wavefront information and items Zernike coefficients.
(11) as shown in Figure 7, the present invention is measured using sub-aperture wavefront Relative slope, and low frequency flow perturbation draws in inhibition
The wavefront reconstruction error risen.Specific method is that the second beam splitter prism high speed machine shutter 15 of turning back is opened, and measures head high speed machine
Tool shutter 16 is closed, and small-bore collimated light beam records a star after optical path by photoelectric detecting system 14CCD to be measured at this time
The two-dimensional coordinate of point picture.The second beam splitter prism high speed machine shutter 15 of turning back is closed later, measures head high speed machine shutter 16
It opens, then photoelectric detecting system 14CCD to be measured records the two-dimensional coordinate of another asterism picture again.Analysis and experiments have shown that：Only
The opening and closing speed of above-mentioned shutter is wanted higher than the inverse of the frequency of examining system minute surface air-flow shake nearby, you can think asterism twice
The acquisition of coordinate is carried out at the same time.In data processing, measurement point is only calculated every time relative to the phase between reference point
To slope variation, the sub-aperture light beam heeling error as caused by being shaken air-flow can be cut in this way.
(12) after completing above-mentioned measuring process, the pitching shafting of photoelectric detecting system 14 to be measured is rotated to next measurement angle
And repeat above-mentioned scanning survey step.Sub-aperture scanning wave aberration measuring device 13 is bowed always with system under test (SUT) synchronous adjustment in this way
The elevation angle, and contribute to measurement error caused by reducing vibration.System wave aberration inspection is carried out in different pitch angles by examining system
Survey can quantitative assessment heavy caliber electro-optical system image quality and its stability under the different elevations angle (corresponding actual working state),
Setting and adjustment for follow-up adaptive optics system provide data basis.
The present invention operation principle be：
(1) laser light source is entered after spatial filter shaping by small-bore optical alignment system collimation for incipient beam of light
Beam splitting turns to prism, and a branch of turn back enters electro-optical system to be measured after 90 °, through its optical system imaging to ccd detector, according to picture
Relative position relation between point and label pixel point, can determine whether that test device is relative to tested Opto-electrical Section in entire measurement process
It whether there is the relative angle as caused by vibration etc. between system to change.
(2) another small-bore collimated light after prism beam splitting is turned back in beam splitting is irradiated into second piece of beam splitting rib of turning back again
Mirror wherein a branch of turn back also enters photoelectric detecting system to be measured after 90 °, measures head as with reference to light beam, another Shu Ze enters,
Electro-optical system to be measured is again introduced into after 90 ° are turned back as measurement light.In each measurement process, by entering in electro-optical system to be measured
Pupil in-plane displacement measurement head, you can realize each sub-aperture slope sampled measurements, then pass through continuous (instantaneous plesiochronous) acquisition
The slope of wave surface of measuring beam sub-aperture and reference beam sub-aperture, you can calculate between above-mentioned two sub-aperture relatively tiltedly
Rate, and cut environmental perturbation.And so on, it can realize that each measurement sub-aperture is relatively fixed with reference to relatively oblique between sub-aperture
Rate sampled measurements.
(3) it can be surveyed in real time by the another set of monitoring light path with measuring beam integrated design in above-mentioned measurement process
Measure sub-aperture heeling error (the three-dimensional dip error, wherein one-dimensional is heavy that each measurement sub-aperture is introduced due to mechanical movement error
It is remaining).And it is compensated by during final numerical computations are broken through with corrugated.
(4) as a result of above-mentioned error monitoring and compensation scheme, to the required precision of mechanical scanning motion system substantially
Decline, help to realize the substantially lightweight of test equipment.Thus measuring device can be directly fixedly connected on heavy caliber
On the lens barrel of photoelectric detecting system, directly drive measuring device under the different elevations angle into traveling wave picture using the pitching shafting of its own
Difference detection.Another advantage of said program is, by the way that measuring device and examining system are connected, can effectively reduce the different positions of vibration
Sub-aperture slope of wave surface measurement error caused by phase.
Data calculation：
Physical quantity (measurement data) includes as obtained by above-mentioned measurement process：Each sub-aperture collimated light beam is in light to be measured
The coordinate (two-dimensional Cartesian) of imaging point, sub-aperture sample point coordinate, each sub-aperture are in sampling location on electric system CCD
Corresponding two dimension heeling error (the two-dimentional angle between primary optical axis), each sub-aperture sampling instant exist with reference to sub-aperture collimated light beam
The two-dimensional coordinate of imaging point on examining system CCD.According to the focal length of above-mentioned measurement data and electro-optical system to be measured, relatively
The optical indexes such as aperture, according to wave front aberration fitting formula of the Zernike coefficients as basis function, resolving over-determined systems is
The wave aberration of photoelectric detecting system to be measured and its wavefront distribution can be obtained.(since the non-present patent application in algorithm part protects part,
It is not explained in detail herein)
Need include at illustrate two points：
(1) above-mentioned measurement sub-aperture and reference sub-aperture are sampled respectively by the sequence switch of machine high speed tool shutter
's.Passing through other laboratory environment control means, it is ensured that the time for exposure of shutter is reciprocal well below the frequency that air-flow is shaken,
It can thus be assumed that above-mentioned two sub-aperture is to complete to sample close to synchronization.
(2) since the present invention utilizes the benchmark for measuring sub-aperture and being reconstructed with reference to the Relative slope between sub-aperture as corrugated
Data, therefore in final reconstruct wavefront, it is also necessary to it is integral inclined (since the photoelectric detecting system actually measured is to remove its
Collimated light path, wavefront are plane wave, and there is no tilt).
(3) defocus error of small-bore optical alignment system and heavy caliber photoelectric detecting system to be measured needs stringent control,
Above-mentioned error has larger impact to wavefront reconstruction precision, needs strictly to correct before measuring and accurate calibration.
The present invention is based on the system wave aberration testing principles that the discrete sampling of sub-aperture slope reconstructs unified wavefront again, propose
Specific optical path and error monitoring light path arrangement scheme, main innovation are with invention part：
(1) sub-aperture slope measurement is converted to two sub-aperture Relative slopes to measure, can effectively reduces environmental perturbation error；
(2) design scanning monitoring integration light path can monitor and compensate wavefront reconstruction error caused by sub-aperture tilts；
(3) by measuring device and photoelectric detecting system to be measured being connected, it can be achieved that instrument lightweight and reducing vibration pair
The influence of measurement accuracy.
Obviously, the above embodiments are merely examples for clarifying the description, and is not intended to limit the embodiments.It is right
For those of ordinary skill in the art, can also make on the basis of the above description it is other it is various forms of variation or
It changes.There is no necessity and possibility to exhaust all the enbodiments.And the obvious variation thus extended out or
Among changing still in the protection domain of the invention.
Claims (3)
1. wave aberration indoor detection method under a kind of heavy caliber photoelectric detecting system difference elevation angle, sets gradually in light path
Have：Target target plate and lighting system；Small-bore collimating optical system with iris；First turns back beam splitter prism；Second
It turns back beam splitter prism；Head third is measured to turn back beam splitter prism；Measure the first beam splitter prism of head；Second beam splitter prism；First
Photoelectric auto-collimator；Third beam splitter prism；Second photoelectric auto-collimator；
It is characterized in that, this method includes the following steps：
(1), photoelectric detecting system to be measured is controlled to rotate pitching shafting to a fixation pitch angle, and locks shafting guarantee and measured
Pitch axis is stablized in journey；
(2), the laser light source in target target plate and lighting system is through the asterism target on spatial filter back lighting Target Board, and
Small-bore collimating optical system through carrying iris, which is collimated, to be irradiated into first for small-bore collimated light beam and turns back beam splitting rib
Mirror；
(3), incident light is divided into two beams by the first beam splitter prism of turning back, wherein a branch of turn back is irradiated into photoelectricity to be measured after 90 ° and visits
Examining system, and imaging is received by its CCD；
(4), the small-bore directional light of another way for turning back beam splitter prism beam splitting through first is irradiated into second and turns back beam splitter prism simultaneously
It is divided into two beams, wherein a branch of turn back is irradiated into photoelectric detecting system to be measured after 90 ° and is used as with reference to light beam, when high speed machine shutter
During unlatching, corresponding asterism picture is received, and through image procossing postscript video recording point by the ccd detector in photoelectric detecting system to be measured
Two-dimensional coordinate；
(5), another beam, which is irradiated into, measures head, as measuring beam, turns back beam splitter prism, measurement head through measuring head third
Photoelectric detecting system to be measured is irradiated into after portion's the first beam splitter prism beam splitting；When corresponding measurement head high speed machine shutter opening
When, corresponding asterism picture is received, and through image procossing postscript video recording point two dimension by the ccd detector in photoelectric detecting system to be measured
Coordinate；
(6), through measure head third turn back beam splitter prism beam splitting the small-bore collimated light beam of another beam directly by the first photoelectricity from
Collimator receives, and measures and obtain between the relative initial position of sub-aperture scanning position from y to scanning shift platform, z to scanning shift
Rotation of the scanning head around z-axis and around x-axis caused by the mechanical movement error of platform；
(7), through measuring the small-bore collimated light beam of another beam of head the first beam splitter prism beam splitting through the second beam splitter prism, third point
The second photoelectric auto-collimator is irradiated into after beam prism, sub-aperture scanning position phase is directly measured by the second photoelectric auto-collimator
The scanning head caused by y to scanning shift platform, z to scanning shift platform mechanical movement error turns around y-axis between initial position
It is dynamic；
(8), after completing above-mentioned (1)~(7) step measuring process, by the survey of the corresponding scanning sub-aperture of comprehensive electric-control system record
Amount data include：By the picture point two-dimensional coordinate of examining system record, recorded by examining system CCD in step (4) in step (3)
By in the examining system CCD picture point two-dimensional coordinates recorded and step (6), step (7) in picture point two-dimensional coordinate, step (5)
Angle value, the y recorded respectively from two photoelectric auto-collimators is anti-to scanning shift platform and z to scanning shift platform cathetus grating institute
The sub-aperture sampled point two-dimensional coordinate of feedback；Above-mentioned each measurement data is recorded in data using as one group of data in over-determined systems
In the measured database of processing and resolving system；
(9), distinguish stepping to scanning shift platform to scanning shift platform and z from comprehensive electric control system controls y, move measurement sub-aperture
Next sampled measurements position to pupil plane is moved, is repeated another group of measurement data again behind above-mentioned measuring process (1)~(7)
It is recorded in measured database；
(10), it completes to cover photoelectric detecting system to be measured；After the sub-aperture scanning of entire pupil plane, called by data processing system
Above-mentioned each each group measurement data for measuring position and being recorded, together with the focal length of photoelectric detecting system to be measured being previously entered, relatively
The optical parameters such as aperture, then the wavefront letter according to corresponding algorithm resolving over-determined systems, that is, restructural photoelectric detecting system to be measured
Breath and items Zernike coefficients.
2. wave aberration indoor detection method under the heavy caliber photoelectric detecting system difference elevation angle according to claim 1, special
Sign is, step is further included after step (10)：
(11), it is measured using sub-aperture wavefront Relative slope, wavefront reconstruction error caused by low frequency flow perturbation in inhibition；Second
It turns back beam splitter prism high speed machine shutter opening, measures head high speed machine shutter close, small-bore collimated light beam is through surveying at this time
The two-dimensional coordinate of an asterism picture is recorded after amount light path by photoelectric detecting system CCD to be measured；It second turns back beam splitter prism height later
Fast mechanical shutter is closed, and measures head high speed machine shutter opening, then photoelectric detecting system CCD to be measured records another star again
The two-dimensional coordinate of point picture.
3. wave aberration indoor detection method under the heavy caliber photoelectric detecting system difference elevation angle according to claim 2, special
Sign is, step is further included after step (11)：
(12), after completing above-mentioned measuring process, the pitching shafting of photoelectric detecting system to be measured, which is rotated to next measurement angle, lays equal stress on
Multiple above-mentioned scanning survey step.
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| CN110579749A (en) * | 2018-06-11 | 2019-12-17 | 视锐光科技股份有限公司 | Time-of-flight ranging device and method for identifying image |
| CN109612512B (en) * | 2018-10-23 | 2021-11-23 | 南京航空航天大学 | Multi-mode integrated test platform and test method for space-based photoelectric system |
| CN109613346B (en) * | 2018-12-28 | 2020-11-13 | 中国科学院新疆天文台 | Reconstruction method and system for far-field directional pattern of reflector antenna |
| CN110361163B (en) * | 2019-06-14 | 2021-06-04 | 中科院南京天文仪器有限公司 | Device and method for detecting large-caliber optical system by parallel light tube suspension scanning |
| CN111189620B (en) * | 2020-01-14 | 2021-01-15 | 中国科学院长春光学精密机械与物理研究所 | Wavefront aberration estimation method based on shape characteristics of star spot |
| CN114353694B (en) * | 2022-01-07 | 2022-12-27 | 中国科学院长春光学精密机械与物理研究所 | Device and method for detecting low-frequency-band aberration in optical free-form surface |
| CN114721442B (en) * | 2022-04-11 | 2023-05-30 | 中国科学院光电技术研究所 | Closed loop tracking method based on gyrotron photoelectric tracking device |
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