CN105423948B - The device of aspheric surface is detected using the stitching interferometer of distorting lens - Google Patents
The device of aspheric surface is detected using the stitching interferometer of distorting lens Download PDFInfo
- Publication number
- CN105423948B CN105423948B CN201510922163.XA CN201510922163A CN105423948B CN 105423948 B CN105423948 B CN 105423948B CN 201510922163 A CN201510922163 A CN 201510922163A CN 105423948 B CN105423948 B CN 105423948B
- Authority
- CN
- China
- Prior art keywords
- sub
- aperture
- distorting lens
- interference
- interferometer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
Abstract
The device that aspheric surface is detected using the stitching interferometer of distorting lens belongs to technical field of optical detection, and the present invention includes interference detecting system, distorting lens compensation system, mechanical adjusting mechanism and computer digital animation module;Specifically comprise the following steps:Step 1:Build the stitching interferometer detection device using distorting lens;Step 2:Divide sub-aperture;Step 3:It is moved to sub-aperture path position to be detected, according to modeling and interference fringe adjustment distoring mirror shape or refractive index;Step 4:The processing of sub-aperture interferogram sampling;Step 5: sub-aperture hysterisis error corrects;Step 6: unified face shape splicing.Present invention combination distorting lens and sub-aperture stitching interferometer detection method can efficiently reduce the unified required sub-aperture number of covering, increase the effective area of each sub-aperture and overlapping region, solve the problems, such as to influence to splice precision due to overlay region very little.
Description
Technical field
The invention belongs to technical field of optical detection, and in particular to a kind of aspherical using the stitching interferometer detection of distorting lens
The device of face shape.
Background technology
It is common surface testing technology to interfere detection technique, it is the opposite detection of tested surface and the plane of reference.The plane of reference
Typically plane or spherical surface, the plane after polishing is detected with them and when spherical surface is not in more interference fringe, and is used
The detection of spherical reference face is aspherical, and when aspherical slope is larger, interference fringe density is also more.When interference fringe density is super
When crossing the nyquist frequency of interferometer detector, interference fringe can not be differentiated by detector, cause aspherical not being measured.
For larger aspherical of slope, using sub-aperture stitching interferometer detection method, larger aspherical of slope is divided into multiple
Small-bore sub-aperture so that the interference fringe in each sub-aperture can be detected resolution.
But when aspherical bore slope is excessive, the area that each sub-aperture from center to edge can be detected is increasingly
It is small, it needs more sub-aperture that could cover at this time entire aspherical, reduces detection efficiency, increase machine error, detection
Time and data processing amount etc..
Invention content
It is an object of the invention to propose that a kind of stitching interferometer using distorting lens detects the device of aspheric surface, solve
The problem that detection efficiency of the existing technology is low, machine error is big, detection time is long and data processing amount is big.In conjunction with distorting lens
Technology and annular sub-aperture stitching interferometer detection method can efficiently reduce the unified required sub-aperture number of covering, increase each
Sub-aperture effective area solves the problems, such as to influence splicing precision since overlay region is small.
To achieve the above object, the device that the stitching interferometer of the invention using distorting lens detects aspheric surface includes becoming
Shape mirror compensation system, interference detecting system, mechanical adjusting mechanism and computer digital animation module;
The computer digital animation module includes that distorting lens control unit, multidimensional adjusting table control unit, interference pattern are adopted
Collect processing unit, hysterisis error correction unit and sub-aperture stitching algorithm unit;
It is to be detected it is aspherical be fixed on the mechanical adjusting mechanism, the interference detecting system pass through distorting lens compensation system
Spy in the optical path difference of system compensation and aspherical reflected light to be detected, the interferogram sampling processing unit and interference detecting system
Survey device connection;
The interferogram sampling processing unit is connect with the distorting lens control unit and hysterisis error correction unit, is deformed
Mirror control unit carries out closed loop feedback according to interference pattern to the adjusting of distorting lens, and control multidimensional adjusting table control unit is to multidimensional tune
Whole movement carries out closed loop feedback control, and the collected each sub-aperture interference pattern of detector is handled through the interferogram sampling
Cell processing obtains each sub-aperture and returns to Wave-front phase, and each sub-aperture returns to Wave-front phase and corrects unit through hysterisis error
Each sub-aperture diametric plane shape information is obtained, each sub-aperture diametric plane shape information handles to obtain unified face through sub-aperture stitching algorithm unit
Shape information.
The mechanical adjusting mechanism includes clamping device and multidimensional adjusting table, described to be detected aspherical to pass through clamping device
It is fixed on the multidimensional adjusting table.
The interference detecting system is Tai Man-Green's type interferometer or Feisuo type interferometer.
Included the following steps using the method that the stitching interferometer of distorting lens detects aspheric surface:
Step 1:Build the device of the stitching interferometer detection aspheric surface using distorting lens;
Step 2:System modelling divides sub-aperture, and makes the reference paper of each sub-aperture, specially:
1) according to the radius of curvature of aspherical best fit ball to be detected, the bore of best fit ball, with reference to spherical surface
Radius of curvature, the bore with reference to spherical surface and sub-aperture overlapping region carry out sub-aperture planning;
2) right in optical design software according to the parameter of the specific device of aspherical interference detecting system in detection device
Aspherical interference detecting system is modeled, and system model is obtained;
3) sub-aperture is carried out in the system model that the planning for carrying out sub-aperture according to step 1) obtains in step 2) to draw
Point;
4) by high-precision spherical surface known to interferometer detection faces shape error ε, the measured value of high-precision spherical surface shape is obtained
Wsphere-test;It simulates desired reference spherical surface in Zemax optical design softwares to be detected high-precision spherical surface, high-precision spherical surface
Surface figure accuracy testing result is Wsphere-ideal, interferometer system error E is obtained by formula (1)IAssembly is manufactured with collimating mirror to miss
Poor EF:
EI+EF=Wsphere-test-Wsphere-ideal-2ε (1)
5) pass through any one sub-aperture diametric plane shape of system model analog detection desired aspheric Wasphere-ideal;It will be any one
A sub- aperture plane shape Wasphere-idealDeviate with reference to error caused by spherical surface as aspherical, sub-aperture is obtained according to formula (2)
Fixed phase Wreference:
Wreference=Wasphere-ideal+Wsphere-test-Wsphere-ideal-2ε (2);
Step 3:It is divided according to sub-aperture and obtains the amount of exercise for detecting each axis of multidimensional adjusting table needed for each sub-aperture to aspheric
Face is accurately positioned, and according to system model and interference fringe adjustment distoring mirror shape or refractive index, until interference fringe picture
Meet testing requirements;
Step 4:Each sub-aperture interference pattern is acquired by interferogram sampling processing unit, is carried out using unwrapping algorithm
Interference pattern phase demodulating, each sub-aperture Wave-front phase W that detector receives in being testedasphere-test;
Step 5:Each sub-aperture diametric plane shape ε is being calculated according to formula (3)asphere:
Wherein:Wasphere-testFor sub-aperture Wave-front phase
WreferenceFor the fixed phase of sub-aperture;
Step 6:According to each sub-aperture diametric plane shape ε obtained in step 5asphere, machine error is reduced by stitching algorithm
Each sub-aperture diametric plane graphic data is finally spliced, obtains unified face shape by the influence to splicing result.
The interference detecting system is Tai Man-Green's type interferometer or Feisuo type interferometer.
Distoring mirror shape or refractive index are adjusted according to system model and interference fringe described in step 3, until interfering item
Line figure meet testing requirements the specific steps are:
1) according to the Zelnick aberration at the detector that emulation detection obtains in optical design software, when interference detects
When system selects Twyman Green Interferometer, the face shape of distorting lens is set as the 1/2 of Zelnick aberration;When interference detection system
When system selects Feisuo interferometer, the aspherical required index distribution of compensation is calculated using the method for " inversion ", calculates compensation
Aspherical required phase, P are any point on aspherical, cross P and do aspherical normal, friendship distorting lens rear surface is M;Light
For line PM after distorting lens diffraction, friendship distorting lens front surface is N, then it is F to reflect last convergent point;The refractive index of wherein distorting lens is
ng, the refractive index of surrounding air is na;The aspherical distance away from distorting lens rear surface is d1, distorting lens thickness is d, and F is away from distorting lens
The distance of front surface is d2;
According to Fermat's principle, so that aspherical upper any point is all converged to point F along the light of normal emergence, then have:
na|PM|+ng|MN|+na| NF |=nad1+ngd+nad2
Distorting lens refractive index ng is calculated by formula (4):
2) by interfering detecting system to detect sub-aperture, interference fringe picture is obtained;
3) feedback regulation in step 1) is carried out to distorting lens according to the interference fringe picture obtained in step 2), until interference
Bar graph meets testing requirements, and distorting lens, which is adjusted, to be completed.
Stitching algorithm described in step 6 is specially:
1) sub-aperture diametric plane shape after introducing compensation rate is calculated according to formula (5)
Wherein:fk(x, y) is the compensation factor of sub-aperture;
L is the number for compensating factor;
For the face shape for i-th of sub-aperture that step 5 obtains;
FikThe penalty coefficient of factor is compensated for sub-aperture, least square method finds out each sub-aperture shown in formula (6)
Penalty coefficient Fik;
Wherein, N is the number of sub-aperture;
Sub-aperture counts from zero, i.e. sub-aperture centered on the 0th sub-aperture;
Indicate only pair there is j-th of sub-aperture of overlapping region to calculate with i-th of sub-aperture;
2) each sub-aperture diametric plane shape obtained according to step 1)Splicing obtains unified face shape, i.e., will ownIt is added, the face shape of overlapping region takes the weighted average of each sub-aperture data, the accuracy phase of weight and measurement data
It closes.
The optical design software is Zemax softwares.
Beneficial effects of the present invention are:Present invention combination distorting lens and sub-aperture stitching interferometer detection method, utilize distorting lens
Generate non-spherical wavefront matching tested surface difference sub-aperture region so that the unified required sub-aperture number of detection subtracts significantly
It is few, sub-aperture area is increased, to increase the overlay region of adjacent sub-aperture, reduces the accumulation of detection time, machine error,
Improve the efficiency and precision of detection.Efficiently solve the problems, such as that splicing precision caused by since sub-aperture area is too low is low, together
When increase splicing efficiency.
Description of the drawings
Fig. 1 be the present invention using distorting lens stitching interferometer detect aspheric surface device in use Tai Man-Green
Structural schematic diagram when type interferometer;
Fig. 2 be the present invention using distorting lens stitching interferometer detect aspheric surface device in using Feisuo type interfere
Structural schematic diagram when instrument;
Fig. 3 is that the stitching interferometer using distorting lens of the present invention detects the method overhaul flow chart of aspheric surface;
Fig. 4 is that the stitching interferometer using distorting lens of the present invention detects the method sub-aperture Structure Planning of aspheric surface
Schematic diagram;
Fig. 5 is distoring mirror shape or folding in the method using the stitching interferometer detection aspheric surface of distorting lens of the present invention
Penetrate rate adjustment structural schematic diagram;
Wherein:1, frequency stabilized carbon dioxide laser, 2, collimating and beam expanding system, 3, Amici prism, 4, distorting lens, 5, imaging lens, 6, detection
Device, 7, convergence microscope group, 8, aspherical, 9, clamping device, 10, computer, 11, multidimensional adjusting table, 12, distorting lens control unit,
13, multidimensional adjusting table control unit, 14, interferogram sampling processing unit, 15, speculum, 16, standard mirror, 17, the plane of reference.
Specific implementation mode
Embodiments of the present invention are described further below in conjunction with the accompanying drawings.
The device that the stitching interferometer using distorting lens of the present invention detects aspheric surface includes distorting lens compensation system, does
Relate to detecting system, mechanical adjusting mechanism and computer digital animation module;
The computer digital animation module includes distorting lens control unit 12, multidimensional adjusting table control unit 13, interference
Figure acquisition process unit 14, hysterisis error correction unit and sub-aperture stitching algorithm unit;
To be detected aspherical 8 are fixed on the mechanical adjusting mechanism, and the interference detecting system is compensated by distorting lens
The optical path difference of system balance and aspherical 8 reflected light to be detected, the interferogram sampling processing unit 14 and interference detecting system
In detector 6 connect;
The interferogram sampling processing unit 14 is connect with the distorting lens control unit 12 and hysterisis error correction unit,
Distorting lens control unit 12 carries out closed loop feedback according to interference pattern to the adjusting of distorting lens 4, controls multidimensional adjusting table control unit
The movement of 13 pairs of multidimensional adjusting tables 11 carries out closed loop feedback control, described in the collected each sub-aperture interference pattern warp of detector 6
The processing of interferogram sampling processing unit 14 obtains each sub-aperture and returns to Wave-front phase, and each sub-aperture returns to Wave-front phase warp
Hysterisis error correction unit obtains each sub-aperture diametric plane shape information, and each sub-aperture diametric plane shape information is through sub-aperture stitching algorithm unit
Processing obtains unified face shape information.
The mechanical adjusting mechanism includes clamping device 9 and multidimensional adjusting table 11, and described to be detected aspherical 8 pass through clamping
Mechanism 9 is fixed on the multidimensional adjusting table 11.
Referring to attached drawing 1, the interference detecting system is Tai Man-Green's type interferometer, the light pencil that frequency stabilized carbon dioxide laser 1 is emitted
Collimated beam-expanding system 2 is expanded as angle pencil of ray directional light, and angle pencil of ray directional light, which propagates to forward at Amici prism 3, is divided into two
Road;Wherein backtracking is used as with reference to wave after the reflection of Amici prism 3 propagates to distorting lens 4 all the way;Another way is through Amici prism 3
It transmits first to assemble after propagating to convergence microscope group 7 forward and dissipate afterwards, diverging light again passes by convergence microscope group 7 after aspherical 8 reflection
Afterwards, detection wave is formed.It is imaged at detector 6 through imaging lens 5 after reference wave and detection wave interference.
Referring to attached drawing 2, the interference detecting system is Feisuo type interferometer, and the light pencil that frequency stabilized carbon dioxide laser 1 is emitted is through standard
Light after direct expansion beam system 2 propagates to forward at Amici prism 3, and the reflection of Amici prism 3 propagates to speculum 15, through standard mirror
16, for a part as wave is referred to after the reflection of the plane of reference 17, another part transmission propagates to forward distorting lens 4, anti-through aspherical 8
After again passing by distorting lens 4 after penetrating, detection wave is formed.After reference wave and detection wave interference detector 6 is imaged in through imaging lens 5
Place.
Need of work distorting lens drive system, interference detecting system, the computer control system of distorting lens compensation system are total
With completion.Closed loop feedback control is carried out to distorting lens 4 by the interference fringe picture of interferometer measurement.Distorting lens compensation system is main
Including distorting lens 4 and computer digital animation mould distorting lens control unit 12 in the block, according to 10 analogue simulation knot of computer
Fruit or interference detecting system measurement result obtain required 4 deflection of distorting lens, and controlling deformation mirror driver by computer 10 makes
Distorting lens 4 deforms.
Mechanical adjusting mechanism includes in the positioning devices such as multidimensional adjusting table 11, grating scale and computer digital animation module
Multidimensional adjusting table control unit 13.Aspherical 8 are fixed on clamping device 9, and clamping device 9 is fixed on multidimensional adjusting table 11
On.The mirror pose to be measured detected needed for each sub-aperture is provided by sub-aperture planning, computer 10 can drive multidimensional adjusting table 11
Clamping device 9 is set to be translated along x, y, z axis, x, y-axis tilt, and are rotated around z-axis, the position of multi-dimensional movement can be by all directions grating scale etc.
Positioning device carries out closed loop feedback control.
Interferogram sampling processing unit 14 by 6 the image collected of detector through computer 10 processing after, export result to
Hysterisis error corrects unit, then obtains unified face shape information through sub-aperture stitching unit.
Referring to attached drawing 3, included the following steps using the method that the stitching interferometer of distorting lens detects aspheric surface:
Step 1:Build the device of the stitching interferometer detection aspheric surface using distorting lens;
Step 2:System modelling divides sub-aperture, and makes the reference paper of each sub-aperture, specially:
1) according to be detected aspherical 8 radius of curvature of best fit ball, the bore of best fit ball, with reference to spherical surface
Radius of curvature, the bore with reference to spherical surface and sub-aperture overlapping region carry out sub-aperture planning;
Referring to attached drawing 4, for example, aspherical 8 best fit ball, with reference to spherical surface, overlapping region such as following table:
Sub-aperture distribution is as follows:
2) according to the parameter of the specific device of aspherical 8 interference detecting system in detection device, in optical design software
Aspherical 8 interference detecting system is modeled, system model is obtained;
By taking Tai Man-Green's type interference detecting system as an example, the parameter of the specific device includes:Frequency stabilized carbon dioxide laser 1 goes out
The optical maser wavelength penetrated, the clear aperture and amplification factor of collimating and beam expanding system 2, the parameter of Amici prism 3, the bore of distorting lens 4,
The bore and surface curvature radius and thickness of imaging lens 5 are tested aspherical 8 nominal face shape equation and bore;
3) sub-aperture is carried out in the system model that the planning for carrying out sub-aperture according to step 1) obtains in step 2) to draw
Point;
4) by high-precision spherical surface known to interferometer detection faces shape error ε, the measured value of high-precision spherical surface shape is obtained
Wsphere-test;It simulates desired reference spherical surface in Zemax optical design softwares to be detected high-precision spherical surface, high-precision spherical surface
Surface figure accuracy testing result is Wsphere-ideal, interferometer system error E is obtained by formula (1)IAssembly is manufactured with collimating mirror to miss
Poor EF:
EI+EF=Wsphere-test-Wsphere-ideal-2ε (1)
5) pass through any one the sub-aperture diametric plane shape of system model analog detection desired aspheric 8 Wasphere-ideal;It will be arbitrary
One sub- aperture plane shape Wasphere-idealDeviate as aspherical 8 and refer to error caused by spherical surface, sub-aperture is obtained according to formula (2)
The fixed phase W of diameterreference:
Wreference=Wasphere-ideal+Wsphere-test-Wsphere-ideal-2ε (2);
Step 3:It is divided according to sub-aperture and obtains the amount of exercise for detecting 11 each axis of multidimensional adjusting table needed for each sub-aperture to non-
Spherical surface 8 is accurately positioned, and according to system model and interference fringe adjustment 4 face shape of distorting lens or refractive index, until interfering item
Line figure meets testing requirements;
Step 4:Acquire each sub-aperture interference pattern by interferogram sampling processing unit 14, using unwrapping algorithm into
Row interference pattern phase demodulating, each sub-aperture Wave-front phase W that detector 6 receives in being testedasphere-test;
Step 5:Each sub-aperture diametric plane shape ε is being calculated according to formula (3)asphere:
Wherein:Wasphere-testFor sub-aperture Wave-front phase
WreferenceFor the fixed phase of sub-aperture;
Step 6:According to each sub-aperture diametric plane shape ε obtained in step 5asphere, machine error is reduced by stitching algorithm
Each sub-aperture diametric plane graphic data is finally spliced, obtains unified face shape by the influence to splicing result.
The interference detecting system is Tai Man-Green's type interferometer or Feisuo type interferometer.
4 face shape of distorting lens or refractive index are adjusted according to system model and interference fringe described in step 3, until interference
Bar graph meet testing requirements the specific steps are:
1) according to the Zelnick aberration at the detector 6 that emulation detection obtains in optical design software, when interference is examined
When examining system selects Twyman Green Interferometer, the face shape of distorting lens 4 is set as the 1/2 of Zelnick aberration;When interference detects
When system selects Feisuo interferometer, the index distribution needed for compensation aspherical 8 is calculated using the method for " inversion ", calculates and mends
The phase needed for aspherical 8 is repaid, referring to attached drawing 5, P is any point on aspherical 8, crosses the normal that P does aspherical 8, alternation
4 rear surface of shape mirror is M;For light PM after 4 diffraction of distorting lens, friendship 4 front surface of distorting lens is N, then it is F to reflect last convergent point;
Wherein the refractive index of distorting lens 4 is ng, the refractive index of surrounding air is na;Aspherical 8 distances away from 4 rear surface of distorting lens are d1,
4 thickness of distorting lens is d, and distances of the F away from 4 front surface of distorting lens is d2;
According to Fermat's principle, so that any point on aspherical 8 is all converged to point F along the light of normal emergence, then have:
na|PM|+ng|MN|+na| NF |=nad1+ngd+nad2
4 refractive index n of distorting lens is calculated by formula (4)g:
2) by interfering detecting system to detect sub-aperture, interference fringe picture is obtained;
3) feedback regulation in step 1), Zhi Daogan are carried out to distorting lens 4 according to the interference fringe picture obtained in step 2)
It relates to bar graph and meets testing requirements, distorting lens 4, which is adjusted, to be completed.
Stitching algorithm described in step 6 is specially:
1) sub-aperture diametric plane shape after introducing compensation rate is calculated according to formula (5)
Wherein:fk(x, y) is the compensation factor of sub-aperture;
L is the number for compensating factor;
For the face shape for i-th of sub-aperture that step 5 obtains;
FikThe penalty coefficient that factor is compensated for sub-aperture, each sub-aperture is found out by the least square method as shown in formula (6)
Penalty coefficient Fik;
Wherein, N is the number of sub-aperture;
Sub-aperture counts from zero, i.e. sub-aperture centered on the 0th sub-aperture;
Indicate only pair there is j-th of sub-aperture of overlapping region to calculate with i-th of sub-aperture;
2) according to each sub-aperture diametric plane shape obtained in step 1)Splicing obtains unified face shape, i.e., will be usedIt is added, the face shape of overlapping region takes the weighted average of each sub-aperture data, the accuracy phase of weight and measurement data
It closes.
The optical design software is Zemax softwares, is that the optical design developed by Radiant Zemax companies of the U.S. is soft
Part.
Claims (7)
1. using distorting lens stitching interferometer detection aspheric surface device, which is characterized in that including distorting lens compensation system,
Interfere detecting system, mechanical adjusting mechanism and computer digital animation module;
The computer digital animation module includes distorting lens control unit (12), multidimensional adjusting table control unit (13), interference
Figure acquisition process unit (14), hysterisis error correction unit and sub-aperture stitching algorithm unit;
Aspherical (8) to be detected are fixed on the mechanical adjusting mechanism, and the interference detecting system is compensated by distorting lens is
The optical path difference of system compensation and aspherical (8) reflected light to be detected, the interferogram sampling processing unit (14) and interference detection system
Detector (6) connection in system;
The interferogram sampling processing unit (14) connect with the distorting lens control unit (12) and hysterisis error correction unit,
Distorting lens control unit (12) carries out closed loop feedback, control multidimensional adjusting table control according to interference pattern to the adjusting of distorting lens (4)
Unit (13) carries out closed loop feedback control to the movement of multidimensional adjusting table (11), and the collected each sub-aperture of detector (6) is dry
It relates to figure to handle through the interferogram sampling processing unit (14), obtains each sub-aperture and return to Wave-front phase, each sub-aperture is returned
It returns Wave-front phase and obtains each sub-aperture diametric plane shape information through hysterisis error correction unit, each sub-aperture diametric plane shape information is through sub-aperture
Stitching algorithm cell processing obtains unified face shape information;
Using distorting lens stitching interferometer detect aspheric surface device detection method includes the following steps:
Step 1:Build the device of the stitching interferometer detection aspheric surface using distorting lens;
Step 2:System modelling divides sub-aperture, and makes the reference paper of each sub-aperture, specially:
1) according to the radius of curvature of the best fit ball of aspherical (8) to be detected, the bore of best fit ball, with reference to the song of spherical surface
Rate radius, the bore with reference to spherical surface and sub-aperture overlapping region carry out sub-aperture planning;
2) according to the parameter of the specific device of aspherical interference detecting system in detection device, to aspheric in optical design software
Face interference detecting system is modeled, and system model is obtained;
3) sub-aperture division is carried out in the system model that the planning carried out to sub-aperture according to step 1) obtains in step 2);
4) by high-precision spherical surface known to interferometer detection faces shape error ε, the measured value of high-precision spherical surface shape is obtained
Wsphere-test;It simulates desired reference spherical surface in Zemax optical design softwares to be detected high-precision spherical surface, high-precision spherical surface
Surface figure accuracy testing result is Wsphere-ideal, interferometer system error E is obtained by formula (1)IAssembly is manufactured with collimating mirror to miss
Poor EF:
EI+EF=Wsphere-test-Wsphere-ideal-2ε (1)
5) pass through any one sub-aperture diametric plane shape of system model analog detection desired aspheric (8) Wasphere-ideal;By any one
Sub-aperture diametric plane shape Wasphere-idealDeviate as aspherical (8) and refer to error caused by spherical surface, sub-aperture is obtained according to formula (2)
Fixed phase Wreference:
Wreference=Wasphere-ideal+Wsphere-test-Wsphere-ideal-2ε (2);
Step 3:It is divided according to sub-aperture and obtains the amount of exercise for detecting multidimensional adjusting table (11) each axis needed for each sub-aperture to aspheric
Face (8) is accurately positioned, and according to system model and interference fringe adjustment distorting lens (4) face shape or refractive index, until interference
Bar graph meets testing requirements;
Step 4:Each sub-aperture interference pattern is acquired by interferogram sampling processing unit (14), is carried out using unwrapping algorithm
Interference pattern phase demodulating, each sub-aperture Wave-front phase W that detector (6) receives in being testedasphere-test;
Step 5:Each sub-aperture diametric plane shape ε is being calculated according to formula (3)asphere:
Wherein:Wasphere-testFor sub-aperture Wave-front phase
WreferenceFor the fixed phase of sub-aperture;
Step 6:According to each sub-aperture diametric plane shape ε obtained in step 5asphere, machine error is reduced to splicing by stitching algorithm
Each sub-aperture diametric plane graphic data is finally spliced, obtains unified face shape by influence as a result.
2. the stitching interferometer according to claim 1 using distorting lens detects the device of aspheric surface, which is characterized in that
The mechanical adjusting mechanism includes clamping device (9) and multidimensional adjusting table (11), and aspherical (8) to be detected pass through clamping machine
Structure (9) is fixed on the multidimensional adjusting table (11).
3. the stitching interferometer according to claim 1 using distorting lens detects the device of aspheric surface, which is characterized in that
The interference detecting system is Tai Man-Green's type interferometer or Feisuo type interferometer.
4. the stitching interferometer according to claim 1 using distorting lens detects the device of aspheric surface, which is characterized in that
The interference detecting system is Tai Man-Green's type interferometer or Feisuo type interferometer.
5. the stitching interferometer according to claim 4 using distorting lens detects the device of aspheric surface, which is characterized in that
Distorting lens (4) face shape or refractive index are adjusted according to system model and interference fringe described in step 3, until interference fringe picture
Meet testing requirements the specific steps are:
1) according to the Zelnick aberration at the detector (6) that emulation detection obtains in optical design software, when interference detects
When system selects Twyman Green Interferometer, the face shape of distorting lens (4) is set as the 1/2 of Zelnick aberration;When interference detects
When system selects Feisuo interferometer, the index distribution compensated needed for aspherical (8) is calculated using the method for " inversion ", is calculated
The phase needed for aspherical (8) is compensated, P is any point on aspherical (8), crosses the normal that P does aspherical (8), alternation shape
Mirror (4) rear surface is M;For light PM after distorting lens (4) diffraction, friendship distorting lens (4) front surface is N, then reflects last convergent point
For F;Wherein the refractive index of distorting lens (4) is ng, the refractive index of surrounding air is na;Aspherical (8) are away from distorting lens (4) rear surface
Distance be d1, distorting lens (4) thickness is d, and distances of the F away from distorting lens (4) front surface is d2;
According to Fermat's principle, so that any point on aspherical (8) is all converged to point F along the light of normal emergence, then have:
na|PM|+ng|MN|+na| NF |=nad1+ngd+nad2
Distorting lens (4) refractive index ng is calculated by formula (4):
2) by interfering detecting system to detect sub-aperture, interference fringe picture is obtained;
3) feedback regulation in step 1) is carried out to distorting lens (4) according to the interference fringe picture obtained in step 2), until interference
Bar graph meets testing requirements, and distorting lens (4), which is adjusted, to be completed.
6. the stitching interferometer according to claim 1 using distorting lens detects the device of aspheric surface, which is characterized in that
Stitching algorithm described in step 6 is specially:
1) sub-aperture diametric plane shape after introducing compensation rate is calculated according to formula (5)
Wherein:fk(x, y) is the compensation factor of sub-aperture;
L is the number for compensating factor;
For the face shape for i-th of sub-aperture that step 5 obtains;
FikThe penalty coefficient that factor is compensated for sub-aperture, the benefit of each sub-aperture is found out by the least square method as shown in formula (6)
Repay coefficient Fik;
Wherein:N is the number of sub-aperture;
Sub-aperture counts from zero, i.e. sub-aperture centered on the 0th sub-aperture;
Indicate only pair there is j-th of sub-aperture of overlapping region to calculate with i-th of sub-aperture;
2) according to each sub-aperture diametric plane shape obtained in step 1)Splicing obtains unified face shape, i.e., will be used
It is added, the face shape of overlapping region takes the weighted average of each sub-aperture data.
7. the stitching interferometer according to claim 1 using distorting lens detects the device of aspheric surface, which is characterized in that
The optical design software is Zemax softwares.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201510922163.XA CN105423948B (en) | 2015-12-14 | 2015-12-14 | The device of aspheric surface is detected using the stitching interferometer of distorting lens |
PCT/CN2016/100862 WO2017101557A1 (en) | 2015-12-14 | 2016-09-29 | Surface shape detection device and method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201510922163.XA CN105423948B (en) | 2015-12-14 | 2015-12-14 | The device of aspheric surface is detected using the stitching interferometer of distorting lens |
Publications (2)
Publication Number | Publication Date |
---|---|
CN105423948A CN105423948A (en) | 2016-03-23 |
CN105423948B true CN105423948B (en) | 2018-10-16 |
Family
ID=55502328
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201510922163.XA Expired - Fee Related CN105423948B (en) | 2015-12-14 | 2015-12-14 | The device of aspheric surface is detected using the stitching interferometer of distorting lens |
Country Status (2)
Country | Link |
---|---|
CN (1) | CN105423948B (en) |
WO (1) | WO2017101557A1 (en) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105423948B (en) * | 2015-12-14 | 2018-10-16 | 中国科学院长春光学精密机械与物理研究所 | The device of aspheric surface is detected using the stitching interferometer of distorting lens |
CN105783780B (en) * | 2016-04-29 | 2018-10-26 | 浙江大学 | A kind of unconventional sub-aperture stitching interferometer detection device of free form surface and method |
CN106091978B (en) * | 2016-06-01 | 2019-02-19 | 西安工程大学 | The joining method of interference fringe image in inclined in type measurements by laser interferometry |
WO2018068199A1 (en) * | 2016-10-11 | 2018-04-19 | 中国科学院长春光学精密机械与物理研究所 | Measurement apparatus and method for transmission wavefront equation of aspherical surface compensator |
WO2018068225A1 (en) * | 2016-10-12 | 2018-04-19 | 中国科学院长春光学精密机械与物理研究所 | Measurement apparatus and measurement method for surface-shape error of rotating-axis symmetric curved surface |
CN107782254B (en) * | 2017-09-29 | 2019-05-21 | 中国科学院长春光学精密机械与物理研究所 | A kind of mixed compensating mode sub-aperture stitching surface testing method |
CN107796334A (en) * | 2017-11-29 | 2018-03-13 | 许昌学院 | A kind of surface testing system of aspherical optical element |
CN108267094B (en) * | 2018-01-12 | 2020-04-14 | 暨南大学 | Non-cylindrical surface interference splicing measurement system and method based on rotary CGH |
CN109506589B (en) * | 2018-12-25 | 2020-07-28 | 东南大学苏州医疗器械研究院 | Three-dimensional profile measuring method based on structural light field imaging |
CN109798840A (en) * | 2019-02-26 | 2019-05-24 | 中国科学院光电技术研究所 | The detection device of lens face shape deflection is detected in stitching interferometer instrument |
CN110109230B (en) * | 2019-05-24 | 2020-07-28 | 西安交通大学 | Intelligent splicing assembly method for aspheric surface complex curved surface workpiece |
CN110243306A (en) * | 2019-07-22 | 2019-09-17 | 中国工程物理研究院激光聚变研究中心 | Plane surface shape sub-aperture stitching interferometer measuring device and method based on robot |
CN110332883B (en) * | 2019-07-22 | 2021-03-30 | 中国科学院上海光学精密机械研究所 | Fizeau interferometer return error elimination method |
CN110487212B (en) * | 2019-08-02 | 2021-04-16 | 中北大学 | Device for detecting object surface shape based on vortex optical spiral phase shift interference |
CN110779443B (en) * | 2019-11-04 | 2021-04-02 | 中国科学院国家天文台南京天文光学技术研究所 | Edge sensor for splicing mirror surface based on interference principle and working method thereof |
CN111623957B (en) * | 2020-05-11 | 2022-03-25 | 中国科学院光电技术研究所 | Point cloud registration and splicing method for X-ray focusing lens splicing interference detection |
CN111811429B (en) * | 2020-07-14 | 2021-04-20 | 北京理工大学 | Sub-aperture splicing interference measurement method and device |
CN111895934B (en) * | 2020-07-31 | 2021-07-16 | 北京理工大学 | Optical element surface local gradient surface shape error interferometry method and device |
CN113029022B (en) * | 2021-02-25 | 2022-11-29 | 中国人民解放军国防科技大学 | Shape and position error interference measurement device and method for transparent hemispherical shell part |
CN113091638B (en) * | 2021-03-25 | 2022-06-28 | 中国科学院光电技术研究所 | Device and method for calibrating return error in surface shape measurement by interferometry |
CN113091644B (en) * | 2021-06-09 | 2021-09-07 | 中国工程物理研究院激光聚变研究中心 | Large-aperture optical element surface shape detection method based on stacked coherent diffraction imaging |
CN113465539B (en) * | 2021-07-06 | 2024-03-19 | 上海大学 | Automatic cylindricity measuring device and method based on sub-aperture interference splicing |
CN115790442A (en) * | 2022-11-15 | 2023-03-14 | 南京理工大学 | Interferometric measurement method based on large-caliber micro-displacement adjusting frame |
CN116577931B (en) * | 2023-07-14 | 2023-09-22 | 中国科学院长春光学精密机械与物理研究所 | Optical element splicing detection method based on instrument transfer function |
CN117249912B (en) * | 2023-11-20 | 2024-02-13 | 苏州致将智能光电有限公司 | Method and system for detecting large-caliber optical element |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103776389A (en) * | 2014-01-10 | 2014-05-07 | 浙江大学 | High-precision aspheric combined interference detection device and high-precision aspheric combined interference detection method |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3495861B2 (en) * | 1996-11-05 | 2004-02-09 | キヤノン株式会社 | Aspherical shape measuring method and device |
JP2002267426A (en) * | 2001-03-12 | 2002-09-18 | Canon Inc | Shape-measuring instrument and method |
CN102288390B (en) * | 2005-04-05 | 2014-11-26 | Qed技术国际股份有限公司 | Method for accurate high-resolution measurements of aspheric surfaces |
CN100580407C (en) * | 2005-10-31 | 2010-01-13 | 中国科学院光电技术研究所 | Deep aspherical mirror detection system with big bore |
CN100567932C (en) * | 2008-05-28 | 2009-12-09 | 中国科学院光电技术研究所 | Fan shape off-axis aspherical mirror splicing measuring systems |
CN101709955B (en) * | 2009-11-24 | 2011-02-23 | 中国科学院长春光学精密机械与物理研究所 | Device for detecting surface shape of optical aspheric surface by sub-aperture stitching interferometer |
CN102506750A (en) * | 2011-10-28 | 2012-06-20 | 中国科学院长春光学精密机械与物理研究所 | Partial-compensation aspherical reflector surface shape detection method |
JP6000577B2 (en) * | 2012-03-09 | 2016-09-28 | キヤノン株式会社 | Aspherical surface measuring method, aspherical surface measuring device, optical element processing apparatus, and optical element manufacturing method |
CN102661719B (en) * | 2012-04-16 | 2014-03-26 | 中国人民解放军国防科学技术大学 | Near-null compensator, surface shape measuring instrument and measuring method for matching measurement of sub-apertures of aspheric surfaces |
CN105423948B (en) * | 2015-12-14 | 2018-10-16 | 中国科学院长春光学精密机械与物理研究所 | The device of aspheric surface is detected using the stitching interferometer of distorting lens |
-
2015
- 2015-12-14 CN CN201510922163.XA patent/CN105423948B/en not_active Expired - Fee Related
-
2016
- 2016-09-29 WO PCT/CN2016/100862 patent/WO2017101557A1/en active Application Filing
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103776389A (en) * | 2014-01-10 | 2014-05-07 | 浙江大学 | High-precision aspheric combined interference detection device and high-precision aspheric combined interference detection method |
Non-Patent Citations (1)
Title |
---|
张敏.《子孔径拼接检测技术的研究》.《中国博士学位论文全文数据库 基础科学辑》.2015,(第9期),正文第61、62、75、83、87页. * |
Also Published As
Publication number | Publication date |
---|---|
WO2017101557A1 (en) | 2017-06-22 |
CN105423948A (en) | 2016-03-23 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN105423948B (en) | The device of aspheric surface is detected using the stitching interferometer of distorting lens | |
EP1869401B1 (en) | Method for accurate high-resolution measurements of aspheric surfaces | |
CN102147240B (en) | Method and device for measuring multiple element parameters in differential con-focus interference manner | |
KR101458257B1 (en) | Stitching of near-nulled subaperture measurements | |
JP5896792B2 (en) | Aspherical surface measuring method, aspherical surface measuring device, and optical element processing device | |
CN102288132B (en) | Method for measuring vertex curvature radius deviation of aspheric surface by using laser tracking instrument | |
CN107782254B (en) | A kind of mixed compensating mode sub-aperture stitching surface testing method | |
EP2369319A2 (en) | Aspheric object measuring method and apparatus | |
WO2021203707A1 (en) | Automatic surface shape measurement apparatus and method using laser interferometry | |
KR101643113B1 (en) | Integrated wavefront sensor and profilometer | |
CN109556531B (en) | Accurate calibration system and method for point diffraction interferometer light path based on image information | |
CN110188321B (en) | Primary and secondary mirror calibration method based on neural network algorithm | |
JPS5866006A (en) | Contour measuring device to which excessive measuring point is arranged | |
CN107421436B (en) | Aspherical interferometer measuration system and method based on the spatial light modulator plane of reference | |
JP6000577B2 (en) | Aspherical surface measuring method, aspherical surface measuring device, optical element processing apparatus, and optical element manufacturing method | |
CN101290218B (en) | Method for correcting principle error of aspherical non-zero digit detection | |
CN103134660B (en) | Method acquiring telescope primary and secondary mirror alignment error based on astigmatism decomposition | |
CN102997863A (en) | Direct detection system for surface-shape errors in full-aperture optical aspheric surfaces | |
CN108895972A (en) | A kind of method and apparatus based on the optical element vertex radius measurement for calculating holography | |
US20170074648A1 (en) | Method for calibrating a measuring device | |
CN112596259B (en) | High-precision off-axis aspheric reflector optical axis leading-out method and system | |
CN101922920A (en) | Asphere measurement method and device | |
CN106225715A (en) | A kind of pentaprism scanning detection method for non-spherical reflector | |
CN106404354A (en) | Device and method for measurement of aspheric compensator transmission wavefront equation | |
CN105352451B (en) | A kind of accurate omnipotent compensating glass and design method based on deformable mirror |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20181016 Termination date: 20201214 |
|
CF01 | Termination of patent right due to non-payment of annual fee |