CN103926799B - A kind of focusing leveling measuring method - Google Patents
A kind of focusing leveling measuring method Download PDFInfo
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- CN103926799B CN103926799B CN201310009894.6A CN201310009894A CN103926799B CN 103926799 B CN103926799 B CN 103926799B CN 201310009894 A CN201310009894 A CN 201310009894A CN 103926799 B CN103926799 B CN 103926799B
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- 238000000034 method Methods 0.000 title claims abstract description 35
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 52
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 52
- 239000010703 silicon Substances 0.000 claims abstract description 52
- 238000005259 measurement Methods 0.000 claims abstract description 25
- 230000003287 optical effect Effects 0.000 claims abstract description 10
- 238000013507 mapping Methods 0.000 claims abstract description 4
- 238000000605 extraction Methods 0.000 claims description 2
- 239000004744 fabric Substances 0.000 claims 1
- 238000002310 reflectometry Methods 0.000 abstract description 13
- 238000005516 engineering process Methods 0.000 abstract description 8
- 238000004364 calculation method Methods 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 238000001259 photo etching Methods 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005315 distribution function Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000010606 normalization Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
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CN201310009894.6A CN103926799B (en) | 2013-01-11 | 2013-01-11 | A kind of focusing leveling measuring method |
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CN201310009894.6A CN103926799B (en) | 2013-01-11 | 2013-01-11 | A kind of focusing leveling measuring method |
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CN103926799A CN103926799A (en) | 2014-07-16 |
CN103926799B true CN103926799B (en) | 2018-02-06 |
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CN201310009894.6A Active CN103926799B (en) | 2013-01-11 | 2013-01-11 | A kind of focusing leveling measuring method |
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Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
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CN104165596B (en) * | 2014-09-02 | 2017-01-25 | 南京中科神光科技有限公司 | Method and system for measuring defocusing amount |
CN105806239B (en) * | 2016-05-16 | 2018-07-24 | 北京控制工程研究所 | A kind of laser scan type star sensor defocus quantity measuring method |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
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KR0132269B1 (en) * | 1994-08-24 | 1998-04-11 | 이대원 | Alignment apparatus of stepper and control method therefor |
DE4434822C1 (en) * | 1994-09-29 | 1996-01-11 | Schott Glaswerke | Optical thickness measuring device for transparent objects |
JP2002156578A (en) * | 2000-11-20 | 2002-05-31 | Olympus Optical Co Ltd | Focus detector as well as objective lens, optical microscope or optical test apparatus having the same |
CN101276160B (en) * | 2008-05-09 | 2010-09-15 | 上海微电子装备有限公司 | Focusing and leveling device for photo-etching machine as well as measuring method |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
AD01 | Patent right deemed abandoned | ||
AD01 | Patent right deemed abandoned |
Effective date of abandoning: 20170829 |
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CB02 | Change of applicant information | ||
CB02 | Change of applicant information |
Address after: 201203 Shanghai Zhangjiang High Tech Park of Pudong New Area Zhang Road No. 1525 Applicant after: SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) Co.,Ltd. Address before: 201203 Shanghai Zhangjiang High Tech Park of Pudong New Area Zhang Road No. 1525 Applicant before: SHANGHAI MICRO ELECTRONICS EQUIPMENT Co.,Ltd. |
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CI02 | Correction of invention patent application | ||
CI02 | Correction of invention patent application |
Correction item: deemed abandonment of patent right Correct: The revocation of the patent right shall be regarded as giving up False: The patent right is deemed to be abandoned Number: 35-01 Volume: 33 |
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