CN103917332A - 玻璃基板的制造方法 - Google Patents

玻璃基板的制造方法 Download PDF

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Publication number
CN103917332A
CN103917332A CN201280054271.4A CN201280054271A CN103917332A CN 103917332 A CN103917332 A CN 103917332A CN 201280054271 A CN201280054271 A CN 201280054271A CN 103917332 A CN103917332 A CN 103917332A
Authority
CN
China
Prior art keywords
glass substrate
manufacture method
water
lapping liquid
quality
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201280054271.4A
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English (en)
Chinese (zh)
Inventor
神谷广幸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Publication of CN103917332A publication Critical patent/CN103917332A/zh
Pending legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
    • B24B37/044—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor characterised by the composition of the lapping agent

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Liquid Crystal (AREA)
  • Surface Treatment Of Glass (AREA)
CN201280054271.4A 2011-11-01 2012-10-17 玻璃基板的制造方法 Pending CN103917332A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011-240117 2011-11-01
JP2011240117 2011-11-01
PCT/JP2012/076861 WO2013065491A1 (fr) 2011-11-01 2012-10-17 Procédé pour produire un substrat en verre

Publications (1)

Publication Number Publication Date
CN103917332A true CN103917332A (zh) 2014-07-09

Family

ID=48191847

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201280054271.4A Pending CN103917332A (zh) 2011-11-01 2012-10-17 玻璃基板的制造方法

Country Status (5)

Country Link
JP (1) JPWO2013065491A1 (fr)
KR (1) KR20140088535A (fr)
CN (1) CN103917332A (fr)
TW (1) TW201319231A (fr)
WO (1) WO2013065491A1 (fr)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105505231A (zh) * 2016-02-24 2016-04-20 湖南皓志科技股份有限公司 一种高效碳化硼研磨液及其配制方法
CN106002498A (zh) * 2016-08-01 2016-10-12 中国电子科技集团公司第四十六研究所 一种有机dast晶体的表面研磨工艺方法
CN107629701A (zh) * 2017-11-02 2018-01-26 东旭科技集团有限公司 抛光液及其制备方法
CN111373006A (zh) * 2017-11-17 2020-07-03 信越化学工业株式会社 合成石英玻璃基板用的抛光剂及合成石英玻璃基板的抛光方法

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10068602B2 (en) 2013-06-29 2018-09-04 Hoya Corporation Method for manufacturing glass substrate, method for manufacturing magnetic disk, and polishing liquid composition for glass substrate
CN104924200A (zh) * 2015-06-12 2015-09-23 衢州学院 一种用于蓝宝石晶片超精密加工的弥散强化磨盘

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CN1520449A (zh) * 2001-11-16 2004-08-11 昭和电工株式会社 铈基抛光料和铈基抛光浆料
CN1527870A (zh) * 2001-03-09 2004-09-08 三井金属k业株式会社 铈类研磨材料及研磨材料浆液和铈类研磨材料的制造方法
CN1550537A (zh) * 2003-05-09 2004-12-01 ��Ħ��ѧ��ҵ��ʽ���� 分散稳定性良好的研磨剂浆体及基板的制造方法
CN1697869A (zh) * 2000-10-06 2005-11-16 三井金属鉱业株式会社 研磨材料
JP2008131951A (ja) * 1995-06-07 2008-06-12 Gen Probe Inc Ｎｅｉｓｓｅｒｉａ種用の核酸プローブおよび増幅オリゴヌクレオチド
CN101331593A (zh) * 2005-12-16 2008-12-24 Jsr株式会社 化学机械研磨用水系分散体和化学机械研磨方法、以及用于调制化学机械研磨用水系分散体的试剂盒

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JPH05156239A (ja) * 1991-12-06 1993-06-22 Tokyo Daiyamondo Kogu Seisakusho:Kk 超精密加工用スラリー及び超精密加工用ペースト
JPH10237426A (ja) * 1997-02-21 1998-09-08 Nippon Oil Co Ltd ラップ加工用油剤組成物
JP2003213250A (ja) * 2001-11-16 2003-07-30 Showa Denko Kk セリウム系研磨材、セリウム系研磨材スラリー、ガラス基板の研磨方法及びガラス基板の製造方法
JP2003277733A (ja) * 2002-03-27 2003-10-02 Yasuhiro Tani 油性研磨剤および研磨方法
JP4439866B2 (ja) * 2003-10-02 2010-03-24 株式会社日本触媒 研磨液組成物
JP4641155B2 (ja) * 2004-06-03 2011-03-02 株式会社日本触媒 化学機械研磨用の研磨剤
JP4481898B2 (ja) * 2005-07-25 2010-06-16 ユシロ化学工業株式会社 水性砥粒分散媒組成物
JP5084670B2 (ja) * 2008-09-01 2012-11-28 日揮触媒化成株式会社 シリカゾルおよびその製造方法
JP5396047B2 (ja) * 2008-09-03 2014-01-22 三井金属鉱業株式会社 ガラス用研摩材スラリー
WO2011099313A1 (fr) * 2010-02-15 2011-08-18 日立化成工業株式会社 Solution de polissage cmp et procédé de polissage

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008131951A (ja) * 1995-06-07 2008-06-12 Gen Probe Inc Ｎｅｉｓｓｅｒｉａ種用の核酸プローブおよび増幅オリゴヌクレオチド
CN1697869A (zh) * 2000-10-06 2005-11-16 三井金属鉱业株式会社 研磨材料
CN1527870A (zh) * 2001-03-09 2004-09-08 三井金属k业株式会社 铈类研磨材料及研磨材料浆液和铈类研磨材料的制造方法
CN1520449A (zh) * 2001-11-16 2004-08-11 昭和电工株式会社 铈基抛光料和铈基抛光浆料
CN1550537A (zh) * 2003-05-09 2004-12-01 ��Ħ��ѧ��ҵ��ʽ���� 分散稳定性良好的研磨剂浆体及基板的制造方法
CN101331593A (zh) * 2005-12-16 2008-12-24 Jsr株式会社 化学机械研磨用水系分散体和化学机械研磨方法、以及用于调制化学机械研磨用水系分散体的试剂盒

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105505231A (zh) * 2016-02-24 2016-04-20 湖南皓志科技股份有限公司 一种高效碳化硼研磨液及其配制方法
CN106002498A (zh) * 2016-08-01 2016-10-12 中国电子科技集团公司第四十六研究所 一种有机dast晶体的表面研磨工艺方法
CN106002498B (zh) * 2016-08-01 2018-04-06 中国电子科技集团公司第四十六研究所 一种有机dast晶体的表面研磨工艺方法
CN107629701A (zh) * 2017-11-02 2018-01-26 东旭科技集团有限公司 抛光液及其制备方法
CN107629701B (zh) * 2017-11-02 2021-04-13 东旭光电科技股份有限公司 抛光液及其制备方法
CN111373006A (zh) * 2017-11-17 2020-07-03 信越化学工业株式会社 合成石英玻璃基板用的抛光剂及合成石英玻璃基板的抛光方法
CN111373006B (zh) * 2017-11-17 2022-04-26 信越化学工业株式会社 合成石英玻璃基板用的抛光剂及合成石英玻璃基板的抛光方法

Also Published As

Publication number Publication date
JPWO2013065491A1 (ja) 2015-04-02
KR20140088535A (ko) 2014-07-10
WO2013065491A1 (fr) 2013-05-10
TW201319231A (zh) 2013-05-16

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Application publication date: 20140709