CN103882491A - Electroplating mold diameter control structure - Google Patents

Electroplating mold diameter control structure Download PDF

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Publication number
CN103882491A
CN103882491A CN201410130146.8A CN201410130146A CN103882491A CN 103882491 A CN103882491 A CN 103882491A CN 201410130146 A CN201410130146 A CN 201410130146A CN 103882491 A CN103882491 A CN 103882491A
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CN
China
Prior art keywords
micelle
electroplating
plating
control structure
plating mould
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Granted
Application number
CN201410130146.8A
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Chinese (zh)
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CN103882491B (en
Inventor
曲悦峰
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Shenzhen Hong Kong Long Dragon Co Ltd
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Individual
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Priority to CN201410130146.8A priority Critical patent/CN103882491B/en
Publication of CN103882491A publication Critical patent/CN103882491A/en
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Publication of CN103882491B publication Critical patent/CN103882491B/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Abstract

The invention discloses an electroplating mold diameter control structure, including an electroplating mold body, wherein a strip is arranged on the upper surface of the electroplating mold body, and a mask strip is arranged on the back surface of the strip; an electroplating region is arranged on the electroplating mold body, a groove is arranged on the edge of the electroplating region, and a first colloidal particle is embedded in the groove; a ceramic nail is arranged on the electroplating mold, a second colloidal particle is arranged on the periphery of the ceramic nail, lug bosses higher than the electroplating mold body are arranged on the upper surfaces of the first colloidal particle and the second colloidal particle, and the lug bosses on the first colloidal particle and the second colloidal particle have the same height. The electroplating mold diameter control structure has the beneficial effects of being capable of effectively controlling the mold diameter and greatly reducing the cost.

Description

A kind of plating mould diameter control structure
Technical field
The present invention relates to a kind of plating mould diameter control structure.
Background technology
This technology is applicable to selective electroplating mould, is applied to the lead frame of electronic component (IC, diode, LED, triode etc.), or bonder terminal partially plating gold, silver-plated, zinc-plated.Lead frame and terminal are metal materials (copper, iron or alloy), are banded coiled strip.Selective electroplating is the position of controlling plating district by special plating mould, guarantees to need the ground of plating to plate, and does not need the place of plating not plate.Due to the easy seepage of electroplating solution, plating is installed silicone-rubber seals (being commonly called as micelle) near district, and presses silica gel mask band at lead frame or the terminal back side, utilizes the elasticity of silica gel to help sealing current.
On mould, there is ceramic locating pin to insert in the pilot hole of band material and anticipate position to band.The upper hole of band material to the distance in hole should and mould on be pinned to the arc length Perfect Matchings between nail, otherwise band material can depart from pottery nail, or pilot hole distortion.Due to pottery nail be one week uniform, arc length is difficult to measure, and in actual design and processing, is therefore to control arc length by the diameter of control mould.This has just proposed very high requirement to mould diameter precision, and diameter is generally in 244mm left and right, and error can not be greater than 0.03mm.
Mould is plastic material, and its diameter is difficult to accomplish very accurate:
1. its coefficient of thermal expansion is much larger than metal, and man-hour is very long, generally all to process one to two day, and the therefore envrionment temperature in the course of processing, machine temperature has larger variation, causes mould diameter to produce error;
2. plastics internal stress is large, poor rigidity, and the distortion that the internal stresses release in the course of processing causes is also very large;
3. plastics poor rigidity, is affected by clamping power and has distortion, and after machining, the size of measuring on fixture and the size removing while use also have very big difference.
4. other are because the intended diameter that material strip feature causes is difficult to situation about being consistent with actual effective diameter.
Because mould diameter scrapping of being forbidden to cause is the main reason that this type of mould is scrapped.Owing to being plating mould, long term operation environment is 60~70 degrees Celsius, and band material has punching burr and its friction, and in strong acid or strong base solution, therefore moulding stock requirement is high temperature resistant, and high-frequency insulation is good, water-intake rate is low, self lubricity good (wear-resisting), and intensity is high, good toughness, coefficient of thermal expansion is low, good stability of the dimension, corrosion-resistant, ageing-resistant, be easy to machining, meet a kind of material of only having of full terms---PEEK.Only have a qualified supplier in the whole world, so material price is very expensive, the loss of scrapping is very large.
Summary of the invention
In order to overcome the deficiencies in the prior art, the invention provides a kind of plating mould diameter control structure.The scheme that the present invention adopts is:
A kind of plating mould diameter control structure, comprises plating mould body, and plating mould body upper surface is provided with band material, and the band material back side is provided with mask band; Plating mould body is provided with electroplating region, and electroplating region edge is provided with groove, is embedded with the first micelle in groove; Plating mould is provided with pottery nail, is provided with the second micelle in pottery nail periphery, and the first micelle and the second micelle upper surface are equipped with the boss that exceeds plating mould body, and the boss on the first micelle and the second micelle is contour.
Preferably, groove cross-sectional shape is L shaped, and the first micelle cross-sectional shape is identical with groove cross-sectional shape L shaped, and boss is located at the section anyhow in micelle cross section near the end top of electroplating region.
Preferably, the first micelle and the second micelle are connected as a single entity.
Beneficial effect of the present invention is, sets up near of pottery nail the micelle of controlling diameter.According to the concrete size difference of band material, this micelle may be integrated with the micelle of controlling plating district size, may be also independently.This micelle protrudes die surface contour with the micelle in control plating district, uses after this micelle, and band material no longer includes with PEEK expects the chance contacting, completely by micelle control mould effective diameter: in the time that mould finds that through trying out diameter is bigger than normal, micelle is done thinner; When diameter is less than normal, micelle is done thicker.Because micelle mould is made of synthetic glass, material cost is very low.The man-hour requirement tens hours of reforming in addition plating mould, this type of micelle mould of reforming only needs one hour.
Brief description of the drawings
Fig. 1 is that prior art plating mould coordinates schematic diagram with micelle and mask band.
Fig. 2 is for being with material to coordinate schematic diagram with plating mould diameter.
Fig. 3 is plating mould diameter control architecture schematic diagram of the present invention.
Embodiment
Below in conjunction with the drawings and specific embodiments, the present invention is described in further details.
Plating mould diameter control structure, comprises plating mould body 1, and plating mould body upper surface is provided with band material 2, and the band material back side is provided with mask band 3; Plating mould body is provided with electroplating region 4, and electroplating region edge is provided with groove 5, is embedded with the first micelle 6 in groove; Plating mould is provided with pottery nail 7, and being provided with the second micelle 8, the first micelles and the second micelle upper surface in pottery nail periphery, to be equipped with boss on boss 9, the first micelles and the second micelle that exceeds plating mould body contour.
Groove cross-sectional shape is L shaped, and the first micelle cross-sectional shape is identical with groove cross-sectional shape L shaped, and boss is located at the 61 end tops near electroplating region of section anyhow in the first micelle cross section.
The first micelle and the second micelle also can be connected as a single entity.
The above; it is only preferred embodiment of the present invention; not in order to limit the present invention, any trickle amendment that every foundation technical spirit of the present invention is done above embodiment, be equal to and replace and improve, within all should being included in the protection domain of technical solution of the present invention.

Claims (3)

1. a plating mould diameter control structure, is characterized in that, comprises plating mould body, and plating mould body upper surface is provided with band material, and the band material back side is provided with mask band; Plating mould body is provided with electroplating region, and electroplating region edge is provided with groove, is embedded with the first micelle in groove; Plating mould is provided with pottery nail, is provided with the second micelle in pottery nail periphery, and the first micelle and the second micelle upper surface are equipped with the boss that exceeds plating mould body, and the boss on the first micelle and the second micelle is contour.
2. plating mould diameter control structure as claimed in claim 1, is characterized in that, groove cross-sectional shape is L shaped, and the first micelle cross-sectional shape is identical with groove cross-sectional shape L shaped, and boss is located at the section anyhow in micelle cross section near the end top of electroplating region.
3. plating mould diameter control structure as claimed in claim 1, is characterized in that, the first micelle and the second micelle are connected as a single entity.
CN201410130146.8A 2014-04-02 2014-04-02 A kind of electroplating mold diameter control structure Expired - Fee Related CN103882491B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201410130146.8A CN103882491B (en) 2014-04-02 2014-04-02 A kind of electroplating mold diameter control structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201410130146.8A CN103882491B (en) 2014-04-02 2014-04-02 A kind of electroplating mold diameter control structure

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CN103882491A true CN103882491A (en) 2014-06-25
CN103882491B CN103882491B (en) 2016-05-18

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113733380A (en) * 2021-08-30 2021-12-03 深圳市长龙点金科技有限公司 Colloidal particle structure for enhancing noble metal covering efficiency

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0788899A (en) * 1993-09-22 1995-04-04 Mitsubishi Plastics Ind Ltd In-mold plating molds
JP2004084059A (en) * 2002-07-04 2004-03-18 Sumitomo Electric Ind Ltd Die for plating with fine pattern, fine metal structure, die for fine working, method for producing die for plating with fine pattern, and method for producing fine metal structure
JP2004217995A (en) * 2003-01-14 2004-08-05 Nikon Corp Method for producing electroformed product
CN202830196U (en) * 2012-08-15 2013-03-27 中山品高电子材料有限公司 Lead frame electroplating die for part spraying
CN202865360U (en) * 2012-09-20 2013-04-10 中山复盛机电有限公司 Plating mould

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0788899A (en) * 1993-09-22 1995-04-04 Mitsubishi Plastics Ind Ltd In-mold plating molds
JP2004084059A (en) * 2002-07-04 2004-03-18 Sumitomo Electric Ind Ltd Die for plating with fine pattern, fine metal structure, die for fine working, method for producing die for plating with fine pattern, and method for producing fine metal structure
JP2004217995A (en) * 2003-01-14 2004-08-05 Nikon Corp Method for producing electroformed product
CN202830196U (en) * 2012-08-15 2013-03-27 中山品高电子材料有限公司 Lead frame electroplating die for part spraying
CN202865360U (en) * 2012-09-20 2013-04-10 中山复盛机电有限公司 Plating mould

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113733380A (en) * 2021-08-30 2021-12-03 深圳市长龙点金科技有限公司 Colloidal particle structure for enhancing noble metal covering efficiency
CN113733380B (en) * 2021-08-30 2024-06-07 深圳市长龙点金科技有限公司 Colloidal particle structure for enhancing precious metal coverage efficiency

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