CN103836409B - 一种led光源及其制备方法 - Google Patents

一种led光源及其制备方法 Download PDF

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CN103836409B
CN103836409B CN201310576070.7A CN201310576070A CN103836409B CN 103836409 B CN103836409 B CN 103836409B CN 201310576070 A CN201310576070 A CN 201310576070A CN 103836409 B CN103836409 B CN 103836409B
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ito
led
chip
led chip
glass
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CN103836409A (zh
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孙明
庄文荣
陈兴保
戴坚
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Ayura Terua Limited by Share Ltd
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Abstract

<b>本发明涉及一种</b><b>LED</b><b>光源及制备方法,属于</b><b>LED</b><b>技术领域,本发明所述的</b><b>LED</b><b>光源包括玻璃壳体,以及密封在玻璃壳体内的</b><b>LED</b><b>芯片及承载</b><b>LED</b><b>芯片的透明基板,本发明的</b><b>LED</b><b>光源制备简单,使用便捷。</b>

Description

一种LED光源及其制备方法
技术领域
本发明涉及一种LED光源及其制备方法,属于LED光源制备技术领域。
背景技术
光源就是发光二极管(LED)为发光体的光源。发光二极管发明于20世纪60年代,在随后的数十年中,其基本用途是作为收录机等电子设备的指示灯。这种灯泡具有效率高、寿命长的特点,可连续使用10万小时,比普通白炽灯泡长100倍。在未来5年,这种光源将成为下一代照明的主流产品。
从发光效率角度,LED经过几十年的技术改良,其发光效率有了较大的提升。白炽灯、卤钨灯光效为12-24流明/瓦,荧光灯50~70流明/瓦,钠灯90~140流明/瓦,大部分的耗电变成热量损耗。LED光效经改良后已达到达50~200流明/瓦或更高,而且其光的单色性好、光谱窄,无需过滤可直接发出有色可见光。同时,世界各国仍然在做加紧提高LED光效方面的研究,在不远的将来其发光效率将有更大的提高。
从能源节约角度,LED单管功率0.03~0.06瓦,采用直流驱动,单管驱动电压1.5~3.5伏,电流15~18毫安,反应速度快,可在高频操作。同样照明效果的情况下,耗电量是白炽灯泡的万分之一,是荧光灯管的二分之一。据日本估计,如采用光效比荧光灯还要高两倍的LED替代日本一半的白炽灯和荧光灯。每年可节约相当于60亿升原油。就桥梁护栏灯例,同样效果的一支日光灯40多瓦,而采用LED每支的功率只有8瓦,而且可以七彩变化。
为使LED光源更简单、便捷地运用于替代传统光源,各大厂家、研发机构均在不断地对LED光源进行改进或重新设计结构,使其更符合市场需求。
发明内容
本发明提供了一种新型LED光源及其制备方法,所述的新型LED光源包括玻璃壳、两颗或两颗以上LED芯片、玻璃基板及电极、引线,LED芯片封装于玻璃基板上,被玻璃壳包封,玻璃基板表面溅镀有AlN作为散热层,并且利用ITO透光性及导电性,在需要电性导通的LED芯片与芯片之间、芯片与引线之间部位溅镀ITO作为电路图,LED芯片固定于玻璃基板的ITO上,LED芯片通过ITO电路图实现芯片与芯片之间、LED芯片与电源之间的电性导通,封装于玻璃基板的LED芯片及玻璃基板均密封在玻璃壳内,使LED芯片与外界电源电性导通的基板引线分别与电极连接,电极上的引出线与电源连接,固定LED芯片的玻璃基板密封于玻璃壳内,玻璃基板引线端及基板引线、电极及电极上的引出线被融封在玻璃壳的一端,电极上的引出线从融封的玻璃壳端向外引出。
本发明的LED芯片的P、N极分别直接固定于相应的ITO电路图上,实现电性导通连接。所述的直接固定,可以是LED芯片的P、N极通过透明导电胶与ITO固定并电性导通连接;也可以是LED芯片的P、N极通过锡膏与ITO固定,经回流焊进行电性导通连接。
本发明的LED光源,其LED芯片固定于ITO上后直接实现了芯片与芯片直接,芯片与电源之间的电性导通,所以LED芯片固定后直接在玻璃基板及LED芯片表面涂覆荧光粉,本发明的玻璃壳表面可进一步涂覆一层荧光粉层,可用于对LED芯片在工作状态下发光的二次激发,同时也因LED芯片上的部分荧光粉有可能在玻璃壳融封时受温度影响失活,在玻璃壳表面再加设一层荧光粉可以预防LED芯片所发射的光激发未完全导致的蓝光泄露。为了便于LED光源运用于不同的灯内,玻璃壳体积V,优选0.1cm3<V<15cm3。
本发明的LED光源其由于LED芯片的P、N极直接固定于基板的ITO上的,在后续在LED封装体上涂覆荧光粉时LED芯片的P、N极侧荧光粉涂覆不到,所以本发明所述的LED芯片,可以在LED芯片制程中,LED芯片P\N极侧在芯片切割后未裂片时对P\N极以外区域进行溅镀荧光粉。
本发明一方面为提高LED芯片在工作状态下散热,另一方面避免玻璃壳内的器件尤其是ITO免收外界环境影响,在于玻璃壳上进一步包含有一个充气、排气口,通过充气、排气口,玻璃壳内为真空或充有氮气和氦气的混合气体,充气、排气口熔融密封。由于ITO具有很强的吸水性,所以会吸收空气中的水份和二氧化碳并产生化学反应而变质,俗称“霉变”,因此以ITO作为电路的玻璃基板在封装LED芯片后,以玻璃壳作为密封材料进行密封,隔绝与外界环境接触,另一方面本发明通过对玻璃壳能进行充气可有效提高LED光源在工作状态的的热发散,降低LED芯片工作温度,玻璃壳内所充的氮气和氦气的混合气体,优选体积比为5:1-2:1之间,室温下玻璃壳内的气体压力控制在0.05-0.15MPa之间。
本发明的玻璃基板在封装LED芯片时可以不使用荧光粉,荧光粉仅在后续玻璃壳密封后均匀涂覆于密封玻璃壳表面,用于对LED芯片出光激发,通过对玻璃壳表面加设荧光粉可以有效避免荧光粉与LED芯片发热体直接接触而容易老化。玻璃壳密封处理后经冷却后在玻璃壳表面涂覆荧光粉层。
本发明LED光源的制备方法,在玻璃基板溅镀完AlN层后通过旋转进行溅镀ITO,旋转频率为40-60Hz,Sn掺杂量控制在7%-12%之间,ITO的厚度为20nm-200nm之间,氧流量控制在2-7sccm。优选Sn掺杂量控制在9%-11%之间,ITO的厚度为140nm-180nm之间,氧流量控制在3-5sccm。溅镀ITO后无退火工序。本发明一方面为使ITO溅镀层更平整并且相对透光性及电阻率能达到最优化,在溅镀过程中本发明人研究发现在溅镀过程中玻璃基板保存40-60Hz的频率溅镀效果达到最佳,另一方面由于本发明的玻璃基板在溅镀ITO前其上面已经镀有一层AlN层,确切地讲,本发明的ITO电路是溅镀于AlN层上的,由于AlN层的存在,在ITO整个制备过程中其温度都不能超过300℃,一旦超过300℃,AlN层将会影响玻璃基板的光透性,但在一般玻璃基板溅镀ITO制备过程中均进行退火工序以此降低ITO表面的粗糙度、电阻率,提高ITO的光透性,并经研究发现ITO退火的工序温度越高所制备出的ITO光电效果越佳,尤其当达到450℃时,但是针对本发明由于与传统的玻璃基板制备ITO不同是在AlN层上制备ITO,所以本发明发明人在ITO过程中加入旋转电镀的方式,来提高ITO的光电性能,省略后续的退火工序,同时省略后续的退火工序也降低了退火工序带来的ITO中Sn、In变价的风险,有效控制了ITO光电性能的稳定性。本发明的发明人发现ITO在溅镀的过程中In2O3和SnO2有部分会分解成低价的氧化物,这些氧化物对于ITO膜的光透性、电阻率和成膜粗糙度有影响(低价氧化物迁移率低,会造成不同区域ITO成膜速率不同,最终出现粗糙或者黑点)。氧流量过高会造成电阻上升,氧流量过低又会造成穿透率下降和成膜黑点、粗糙。所以通氧时要兼顾电阻和光透性及粗糙的问题,而这三者与通氧量相关,方向相反,所以通氧不能太多,也不能不通,需要调整到一个最佳的参数,进而得到透光性、电阻、形态较好的ITO,本发明的发明人经无数次实验发现本发明ITO制备过程中当氧流量控制在2-7sccm,优选3-5sccm时,能得到透光性、电阻率、形态等相对参数最佳的ITO电路。
附图说明
本发明的附图是为了对本发明进一步说明,而非对本发明发明范围的限制。
图1、LED芯片、透明基板上均涂覆有均匀的荧光粉的LED封装体示意图
图2、LED芯片上涂覆有均匀的荧光粉的LED封装体示意图
图3、LED芯片直接固定于ITO电路图上的示意图
图4、引线端融封的LED光源
图5、引线端融封封装体涂覆有荧光粉的LED光源
图6、带有充气、排气口的LED光源
图7、带有充气、排气口玻璃罩表面涂覆荧光粉的LED光源
1、为LED芯片;1'、为涂覆有荧光粉的LED芯片;2、为玻璃基板;2'、为涂覆有荧光粉的玻璃基板;3、为玻璃壳;3'、为涂覆用荧光粉的融封玻璃壳;4、为玻璃壳融封部位;5、为电极;6、为引线;7、为排气、充气口;7’、为涂覆有荧光粉的排气、充气口;8、为涂覆有荧光粉的玻璃基板;8'、为未涂覆荧光粉的玻璃基板;9、为涂覆有荧光粉的芯片;9'、为未涂覆荧光粉的芯片;10为蒸镀于基板表面的ITO。
具体实施方式
本发明的实施例是为了对本发明进一步说明,而非对本发明的发明范围的限制。
实施例
取玻璃基板进行乙醇清洗后在玻璃基板表面溅镀AlN层,随后直接在AlN层上需要电性导通的LED芯片与芯片之间、芯片与引线之间部位旋转溅镀ITO作为电路,通过光刻胶遮掩遮住不需要溅镀部位,使ITO与ITO电路之间互不导通,玻璃基板的旋转频率为50Hz,Sn掺杂量控制在10%左右,ITO的厚度为160nm,氧流量控制在5sccm,溅镀完ITO后去除光刻胶,在各ITO电路两端分别固定一个LED芯片的P极和另一个LED芯片的N极,LED芯片为在LED芯片制程中,LED芯片P\N极侧在芯片切割未裂片时对P\N极以外区域进行溅镀荧光粉后再进行裂片所得的LED芯片。各LED芯片使ITO与ITO电路之间相互电性导通,对固定完的LED芯片表面及玻璃基板各表面进行涂覆荧光粉,把封装好LED芯片的玻璃基板与玻璃壳一端熔融固定,并在玻璃壳融封部位引出引线,通过玻璃壳另一端的充气、排气口对玻璃壳进行抽真空并充入氮气和氦气的混合气体,使氮气和氦气的体积比为5:1-2:1之间,并控制玻璃壳在室温下的气体压力为0.05-0.15MPa之间,最后对玻璃壳的排气、充气口进行融封处理。在玻璃壳表面再涂覆均匀的荧光粉层。

Claims (15)

1.一种LED光源,包括玻璃壳、两颗或两颗以上LED芯片、玻璃基板及电极、引线,LED芯片封装于玻璃基板上,被玻璃壳包封,玻璃基板表面溅镀有AlN作为散热层,需要电性导通的LED芯片与芯片之间、芯片与引线之间部位溅镀ITO作为电路图,LED芯片固定于玻璃基板的ITO上,LED芯片通过ITO电路图实现芯片与芯片之间、LED芯片与电源之间的电性导通,其特征在于:
所述玻璃基板进行乙醇清洗后溅镀AlN层;溅镀完AlN后直接在AlN层上需要电性导通的LED芯片与芯片之间、芯片与引线之间部位溅镀ITO作为电路,ITO与ITO电路之间互不导通;
所述ITO电路的两端分别固定一个LED芯片的P极和另一个LED芯片的N极;所述ITO与ITO电路之间通过固定的LED芯片相互导通;所述固定完的LED芯片表面及玻璃基板的各表面还涂覆有荧光粉;
封装好LED芯片的玻璃基板与玻璃壳熔封固定,并在玻璃壳融封部位引出引线。
2.根据权利要求1所述的LED光源,其特征在于LED芯片的P、N极分别直接固定于相应的ITO电路图上,实现电性导通连接。
3.根据权利要求2所述的LED光源,其特征在于LED芯片的P、N极通过透明导电胶与ITO固定并电性导通连接。
4.根据权利要求2所述的LED光源,其特征在于LED芯片的P、N极通过锡膏与ITO固定并电性导通连接。
5.根据权利要求1所述的LED光源,其特征在于所述的玻璃壳表面涂覆有荧光粉层,玻璃壳体积V,0.1cm3<V<15cm3
6.根据权利要求1所述的LED光源,其特征在于玻璃壳上进一步包含有一个充气、排气口,通过充气、排气口,玻璃壳内为真空或充有氮气和氦气的混合气体,充气、排气口熔融密封。
7.根据权利要求1所述的LED光源,其特征在于所述的玻璃基板在封装LED芯片时未使用荧光粉,荧光粉均匀涂覆于密封玻璃壳表面。
8.一种LED光源的制备方法,其特征在于:
选择玻璃基板进行乙醇清洗后溅镀AlN层;
溅镀完AlN后直接在AlN层上需要电性导通的LED芯片与芯片之间、芯片与引线之间部位溅镀ITO作为电路,ITO与ITO电路之间互不导通;
在ITO电路两端分别固定一个LED芯片的P极和另一个LED芯片的N极;
ITO与ITO电路之间通过固定的LED芯片相互导通;
对固定完的LED芯片表面及玻璃基板各表面进行涂覆荧光粉;
把封装好LED芯片的玻璃基板与玻璃壳熔封固定,并在玻璃壳融封部位引出引线。
9.根据权利要求8所述的LED光源的制备方法,其特征在于玻璃基板通过旋转进行溅镀ITO,旋转频率为40-60Hz,Sn掺杂量控制在7%-12%之间,ITO的厚度为20nm-200nm之间,氧流量控制在2-7sccm,溅镀ITO后无退火工序。
10.根据权利要求9所述的LED光源的制备方法,其特征在于Sn掺杂量控制在9%-11%之间,ITO的厚度为140nm-180nm之间,氧流量控制在3-5sccm。
11.根据权利要求8所述的LED光源的制备方法,其特征在于LED芯片的P/N极与ITO电路之前是通过透明的导电胶固定或者通过锡焊经回流焊固定。
12.根据权利要求8所述的LED光源的制备方法,其特征在于玻璃壳上进一步包含有一个充气、排气口,玻璃壳在引线端熔封后,通过充气、排气口,玻璃壳内为真空或充有氮气和氦气的混合气体,充气、排气口熔融密封。
13.根据权利要求12所述的LED光源的制备方法,其特征在于玻璃壳内充的氮气和氦气的混合气体,体积比为5:1-2:1之间,室温下玻璃壳内的气体压力控制在0.05-0.15MPa之间。
14.根据权利要求8所述的LED光源的制备方法,其特征在于所述的LED芯片,为在LED芯片制程中,LED芯片P/N极侧在芯片切割未裂片时对P/N极以外区域进行溅镀荧光粉。
15.根据权利要求8所述的制备方法,其特征在于玻璃壳密封处理后经冷却后在玻璃壳表面涂覆荧光粉层。
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