CN103816770A - Gas purifier - Google Patents
Gas purifier Download PDFInfo
- Publication number
- CN103816770A CN103816770A CN201210465860.3A CN201210465860A CN103816770A CN 103816770 A CN103816770 A CN 103816770A CN 201210465860 A CN201210465860 A CN 201210465860A CN 103816770 A CN103816770 A CN 103816770A
- Authority
- CN
- China
- Prior art keywords
- gas
- liquid alloy
- purifier
- liquid
- steel container
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000007789 gas Substances 0.000 claims abstract description 66
- 239000007788 liquid Substances 0.000 claims abstract description 39
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 36
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 34
- 239000000956 alloy Substances 0.000 claims abstract description 33
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 26
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 16
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 16
- 239000001301 oxygen Substances 0.000 claims abstract description 16
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 14
- 239000007787 solid Substances 0.000 claims abstract description 14
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims abstract description 12
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims abstract description 12
- 229910052733 gallium Inorganic materials 0.000 claims abstract description 12
- 239000001257 hydrogen Substances 0.000 claims abstract description 12
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 12
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims abstract description 11
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 7
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910052786 argon Inorganic materials 0.000 claims abstract description 6
- RBFQJDQYXXHULB-UHFFFAOYSA-N arsane Chemical compound [AsH3] RBFQJDQYXXHULB-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910000070 arsenic hydride Inorganic materials 0.000 claims abstract description 6
- 239000001307 helium Substances 0.000 claims abstract description 6
- 229910052734 helium Inorganic materials 0.000 claims abstract description 6
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910052743 krypton Inorganic materials 0.000 claims abstract description 6
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910052754 neon Inorganic materials 0.000 claims abstract description 6
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910052724 xenon Inorganic materials 0.000 claims abstract description 6
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 claims abstract description 6
- 239000004411 aluminium Substances 0.000 claims description 30
- 229910000831 Steel Inorganic materials 0.000 claims description 11
- 239000010959 steel Substances 0.000 claims description 11
- 239000011261 inert gas Substances 0.000 claims description 7
- 150000002431 hydrogen Chemical class 0.000 claims description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 5
- 229910021529 ammonia Inorganic materials 0.000 claims description 5
- 230000002411 adverse Effects 0.000 claims description 3
- 238000004090 dissolution Methods 0.000 claims 1
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 abstract description 10
- 229910052751 metal Inorganic materials 0.000 abstract description 10
- 239000002184 metal Substances 0.000 abstract description 10
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 abstract description 5
- 239000001569 carbon dioxide Substances 0.000 abstract description 5
- 229910002092 carbon dioxide Inorganic materials 0.000 abstract description 5
- 229910002091 carbon monoxide Inorganic materials 0.000 abstract description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 5
- 229910001868 water Inorganic materials 0.000 abstract description 5
- 238000010992 reflux Methods 0.000 abstract description 2
- 239000004065 semiconductor Substances 0.000 abstract description 2
- 239000010935 stainless steel Substances 0.000 abstract 2
- 229910001220 stainless steel Inorganic materials 0.000 abstract 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 abstract 1
- 229910000838 Al alloy Inorganic materials 0.000 description 16
- 239000012535 impurity Substances 0.000 description 7
- 150000002739 metals Chemical class 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
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Abstract
The invention discloses a gas purifier. The key technology of the purifier is to melt metal aluminum (solid) in metal gallium (liquid) to form a liquid alloy material. The alloy material is placed in a stainless steel container, wherein the stainless steel container comprises a gas inlet and a gas outlet; the gas inlet is formed in the liquid alloy; the gas outlet is kept in the liquid alloy; when a gas passes through the liquid alloy, oxygen, water and oxygen-containing gases such as carbon dioxide and carbon monoxide in the gas are absorbed by the liquid alloy. The gas passing through the purifier has the oxygen content of a PPB (Part per Billion) order. A liquid alloy reflux-proof device is arranged at the gas inlet to prevent the liquid alloy reflux from jetting out from the gas inlet in a reverse manner. The purifier can be used for purifying hydrogen, nitrogen, inertia gases (helium, neon, argon, krypton and xenon), and reducing gases (arsenic hydride, hydrogen phosphide and ammonia gas etc.), and is suitable for being applied to gases in the semiconductor industry.
Description
Technical field
The present invention relates to the impurity that contains oxygen element in a kind of gas purifier, particularly purifying hydrogen, nitrogen, inert gas, reducibility gas etc.
Background technology
In semi-conductor industry, often need hydrogen, nitrogen, inert gas (helium, neon, argon, krypton, xenon), reducibility gas (arsenic hydride, hydrogen phosphide, ammonia, silication hydrogen etc.), and need these gases to there is " ultra-high purity ", especially need the tool utmost point to have the impurity such as the oxygen, water, carbon dioxide, carbon monoxide of rudimentary content.
Gas purifier on market, normally uses " active metals " such as aluminium, magnesium, zirconiums to take on getter.In the time that hydrogen, nitrogen, inert gas (helium, neon, argon, krypton, xenon), reducibility gas (arsenic hydride, hydrogen phosphide, ammonia, silication hydrogen etc.) pass through these active metals, oxygen wherein, water, carbon dioxide, carbon monoxide are absorbed by these metals, and gas obtains purifying.But these active metals are all solids, when the Surface absorption of solid contains after oxygen element, become metal oxide, form one deck " shell " in metal surface, the metal that this one deck " shell " has hindered solid interior further absorbs.
Metallic aluminium is solid.The fusing point of gallium is 30 ℃, is generally liquid.Because aluminium plus gallium all belongs to IIIA family element, both intermiscibilities are better.In the time of 300 ℃, the solubility of aluminium in gallium reaches more than 5%.Improve temperature, the solubility of aluminium in gallium also can increase.When the gas that needs purifying is during by gallium-aluminum alloy, in gas, oxygenate impurity is absorbed by aluminium (a kind of active metal), and the oxide that generates aluminium floats over gallium-aluminum alloy surface, can not resemble solid material and form one deck " shell " on surface.
Summary of the invention
A kind of gas purifier, this purifier comprises a kind of liquid alloy material---and be dissolved in gallium (liquid) and formed gallium-aluminum alloy material (1) by metallic aluminium (solid), this material is placed in a rustless steel container (2).On rustless steel container (2), contain gas access (3) and gas vent (4), insert in liquid alloy (1) gas access (3), and gas vent (4) is on liquid alloy (1).When gas is by liquid alloy (1), oxygen in gas, water, carbon dioxide, carbon monoxide etc. are all absorbed by metallic aluminium containing the foreign gas of oxygen element, and the oxide that generates aluminium floats over gallium-aluminum alloy surface.On gas access (3), contain an anti-liquid alloy backflow device (5), prevent that (3) oppositely spray liquid alloy (1) adverse current from gas access.This purifier can purifying hydrogen, nitrogen, inert gas (helium, neon, argon, krypton, xenon), reducibility gas (arsenic hydride, hydrogen phosphide, ammonia, silication hydrogen etc.).
Gallium-aluminum alloy (1) is placed in rustless steel container (2).Logical common heater (6) heated constant temperature of shell of rustless steel container (2).Thermostat temperature is below 500 ℃.Give gallium-aluminum alloy (1) heating, the one, can increase the solubility of aluminium in gallium, the 2nd, the chemism of increase metallic aluminium, raising aluminium absorbs the chemical reaction velocity of oxygen impurities.
Under normal circumstances, can put into too much solid metal aluminium block (7) to gallium-aluminum alloy.In the time that the liquid aluminium in gallium-aluminum alloy (1) consumes due to absorption oxygen impurities, solid aluminum (7) will further be dissolved in and in gallium, form liquid aluminium, to maintain the stable content of aluminium in gallium-aluminum alloy (1), until all solids aluminium block runs out of.
Accompanying drawing explanation
Fig. 1 is structural representation of the present invention.Wherein: the 1st, gallium-aluminum alloy (liquid alloy).The 2nd, rustless steel container.The 3rd, gas access.The 4th, gas vent.The 5th, anti-liquid alloy backflow device.In the time of gas reflux, all liq flows in this device, can not spray from gas access.The 6th, heater (containing radiator valve).The 7th, aluminium block.
The specific embodiment
Fig. 1 is the specific embodiment of the present invention schematic diagram.Purifier comprises a kind of liquid alloy material---and be dissolved in gallium (liquid) and formed gallium-aluminum alloy material (1) by metallic aluminium (solid), this material is placed in a rustless steel container (2).On rustless steel container (2), contain gas access (3) and gas vent (4), insert in liquid alloy (1) gas access (3), and gas vent (4) is on liquid alloy (1).When gas is by liquid alloy (1), oxygen in gas, water, carbon dioxide, carbon monoxide etc. are all absorbed by metallic aluminium containing the foreign gas of oxygen element, and the oxide that generates aluminium floats over the surface of gallium-aluminum alloy.On gas access (3), contain an anti-liquid alloy backflow device (5), prevent that (3) oppositely spray liquid alloy (1) adverse current from gas access.This purifier can purifying hydrogen, nitrogen, inert gas (helium, neon, argon, krypton, xenon), reducibility gas (arsenic hydride, hydrogen phosphide, ammonia, silication hydrogen etc.).Heater for shell (6) heated constant temperature to 350 ℃ of rustless steel container (2).To gallium-aluminum alloy heating, the one, can increase the solubility of aluminium in gallium, the 2nd, the chemism of increase metallic aluminium, raising aluminium absorbs the chemical reaction velocity of oxygen impurities.In addition, put into too much solid aluminum (7) at gallium-aluminum alloy.In the time that the liquid aluminium in gallium-aluminum alloy consumes due to absorption oxygen impurities, solid aluminum (7) will further be dissolved in gallium and form liquid aluminium, to maintain the stable content of aluminium in gallium-aluminum alloy, until all solids aluminium runs out of.
Claims (4)
1. a gas purifier, is characterized in that: this gas purifier comprises a kind of liquid alloy material (1), and this liquid alloy material (1) is placed in a rustless steel container (2); On rustless steel container (2), there are gas access (3) and gas vent (4), insert in liquid alloy (2) gas access (3), and gas vent (4) is on liquid alloy (1); In the time that gas passes through liquid alloy (1), the foreign gas containing oxygen element in gas is all absorbed by this liquid alloy (1); On gas access (3), there is an anti-liquid alloy backflow device (5), prevent liquid alloy (1) adverse current and (3) ejection from gas access.
2. gas purifier as claimed in claim 1, heater 6 heated constant temperature for the shell of described rustless steel container (2), thermostat temperature is below 500 ℃.
3. gas purifier as claimed in claim 1, liquid alloy material is wherein formed in gallium liquid by metallic aluminium dissolution of solid.
4. gas purifier as claimed in claim 1, this purifier is for purifying hydrogen, nitrogen, inert gas, reducibility gas; Wherein, described inert gas comprises: helium, neon, argon gas, Krypton, xenon; Described reducibility gas comprises: arsenic hydride, hydrogen phosphide, ammonia, silication hydrogen.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210465860.3A CN103816770B (en) | 2012-11-19 | 2012-11-19 | A kind of gas purifier |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210465860.3A CN103816770B (en) | 2012-11-19 | 2012-11-19 | A kind of gas purifier |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103816770A true CN103816770A (en) | 2014-05-28 |
| CN103816770B CN103816770B (en) | 2016-08-24 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210465860.3A Active CN103816770B (en) | 2012-11-19 | 2012-11-19 | A kind of gas purifier |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103816770B (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105758118A (en) * | 2014-12-19 | 2016-07-13 | 常熟市永安工业气体制造有限公司 | Air separation system |
| CN105783417A (en) * | 2014-12-19 | 2016-07-20 | 常熟市永安工业气体制造有限公司 | Purification system for air separation system |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005102502A1 (en) * | 2004-04-13 | 2005-11-03 | Deutsche Montan Technologie Gmbh | High-pressure gas scrubber for desulphurizing coke oven gas |
| CN1745877A (en) * | 2005-08-18 | 2006-03-15 | 新乡化纤股份有限公司 | Method and apparatus for managing hydrogen sulfide tail gas |
| CN102312100A (en) * | 2011-09-29 | 2012-01-11 | 王亿理 | Lead zinc recovering device |
| CN202376886U (en) * | 2011-12-14 | 2012-08-15 | 武汉钢铁(集团)公司 | Inert gas purifier |
| CN203002199U (en) * | 2012-11-19 | 2013-06-19 | 刘祥林 | Gas purifier |
| CN103816787A (en) * | 2012-11-19 | 2014-05-28 | 刘祥林 | Gas purifier |
-
2012
- 2012-11-19 CN CN201210465860.3A patent/CN103816770B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005102502A1 (en) * | 2004-04-13 | 2005-11-03 | Deutsche Montan Technologie Gmbh | High-pressure gas scrubber for desulphurizing coke oven gas |
| CN1745877A (en) * | 2005-08-18 | 2006-03-15 | 新乡化纤股份有限公司 | Method and apparatus for managing hydrogen sulfide tail gas |
| CN102312100A (en) * | 2011-09-29 | 2012-01-11 | 王亿理 | Lead zinc recovering device |
| CN202376886U (en) * | 2011-12-14 | 2012-08-15 | 武汉钢铁(集团)公司 | Inert gas purifier |
| CN203002199U (en) * | 2012-11-19 | 2013-06-19 | 刘祥林 | Gas purifier |
| CN103816787A (en) * | 2012-11-19 | 2014-05-28 | 刘祥林 | Gas purifier |
Non-Patent Citations (1)
| Title |
|---|
| 王利民等: "《精细有机合成新方法》", 31 March 2004, 化学工业出版社 * |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105758118A (en) * | 2014-12-19 | 2016-07-13 | 常熟市永安工业气体制造有限公司 | Air separation system |
| CN105783417A (en) * | 2014-12-19 | 2016-07-20 | 常熟市永安工业气体制造有限公司 | Purification system for air separation system |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103816770B (en) | 2016-08-24 |
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| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| ASS | Succession or assignment of patent right |
Owner name: HU NAN HIEND PRODUCTS CO., LTD. Free format text: FORMER OWNER: LIU XIANGLIN Effective date: 20141020 |
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| C41 | Transfer of patent application or patent right or utility model | ||
| COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: 100083 HAIDIAN, BEIJING TO: 414009 YUEYANG, HUNAN PROVINCE |
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| TA01 | Transfer of patent application right |
Effective date of registration: 20141020 Address after: 414009 Yunxi Industrial Park, Hunan, Yueyang Applicant after: HUNAN HIEND PRODUCTS CO.,LTD. Address before: 100083, room 11, building 35, No. 352, Qinghua East Road, Beijing, Haidian District Applicant before: Liu Xianglin |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20240419 Address after: 201210 Shanghai Pudong New Area China (Shanghai) Free Trade Pilot Zone No. 665, Zhangjiang Road, 3 Floors Patentee after: Lanhe Technology (Shanghai) Co.,Ltd. Country or region after: China Address before: 414009 Yunxi Industrial Park, Yueyang, Hunan Patentee before: HUNAN HIEND PRODUCTS CO.,LTD. Country or region before: China |