CN103816770B - A kind of gas purifier - Google Patents
A kind of gas purifier Download PDFInfo
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- CN103816770B CN103816770B CN201210465860.3A CN201210465860A CN103816770B CN 103816770 B CN103816770 B CN 103816770B CN 201210465860 A CN201210465860 A CN 201210465860A CN 103816770 B CN103816770 B CN 103816770B
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- Prior art keywords
- gas
- liquid
- liquid alloy
- alloy
- purifier
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- 239000007789 gas Substances 0.000 claims abstract description 61
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 36
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 34
- 239000007788 liquid Substances 0.000 claims abstract description 34
- 239000000956 alloy Substances 0.000 claims abstract description 33
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 24
- 239000004411 aluminium Substances 0.000 claims abstract description 17
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 14
- 239000007787 solid Substances 0.000 claims abstract description 14
- 229910000831 Steel Inorganic materials 0.000 claims abstract description 13
- 239000010959 steel Substances 0.000 claims abstract description 13
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims abstract description 12
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims abstract description 12
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims abstract description 12
- 229910052733 gallium Inorganic materials 0.000 claims abstract description 12
- 239000001257 hydrogen Substances 0.000 claims abstract description 12
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 12
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 11
- 239000001301 oxygen Substances 0.000 claims abstract description 11
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 11
- 229910052756 noble gas Inorganic materials 0.000 claims abstract description 8
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 7
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910021529 ammonia Inorganic materials 0.000 claims abstract description 6
- 229910052786 argon Inorganic materials 0.000 claims abstract description 6
- RBFQJDQYXXHULB-UHFFFAOYSA-N arsane Chemical compound [AsH3] RBFQJDQYXXHULB-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910000070 arsenic hydride Inorganic materials 0.000 claims abstract description 6
- 239000001307 helium Substances 0.000 claims abstract description 6
- 229910052734 helium Inorganic materials 0.000 claims abstract description 6
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910052743 krypton Inorganic materials 0.000 claims abstract description 6
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910052754 neon Inorganic materials 0.000 claims abstract description 6
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910052724 xenon Inorganic materials 0.000 claims abstract description 6
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 claims abstract description 6
- 230000002411 adverse Effects 0.000 claims abstract description 4
- 238000005507 spraying Methods 0.000 claims abstract description 4
- 229910000838 Al alloy Inorganic materials 0.000 claims description 17
- 150000002431 hydrogen Chemical class 0.000 claims description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 abstract description 10
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 abstract description 5
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 abstract description 5
- 239000001569 carbon dioxide Substances 0.000 abstract description 5
- 229910002092 carbon dioxide Inorganic materials 0.000 abstract description 5
- 229910002091 carbon monoxide Inorganic materials 0.000 abstract description 5
- 229910001882 dioxygen Inorganic materials 0.000 abstract description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 5
- 229910001868 water Inorganic materials 0.000 abstract description 5
- 239000004065 semiconductor Substances 0.000 abstract description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 239000012535 impurity Substances 0.000 description 7
- 150000002739 metals Chemical class 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
Landscapes
- Gas Separation By Absorption (AREA)
- Catalysts (AREA)
Abstract
The invention discloses a kind of gas purifier.The core of this purifier is to be dissolved in gallium (liquid) by metallic aluminium (solid), forms a kind of liquid alloy material, and this alloy material is placed in a rustless steel container.Containing gas access and gas outlet on rustless steel container, gas access is inserted in liquid alloy, and gas outlet is on liquid alloy.When gas is by liquid alloy, the gas containing oxygen element such as oxygen gas and water in gas, carbon dioxide, carbon monoxide is all absorbed by liquid alloy.After by this purifier in gas, oxygen content is generally in ppb (part per billion) magnitude.Containing a liquidproof alloy backflow device on gas access, prevent liquid alloy adverse current from reversely spraying from gas access.This purifier can be suitable for gas in semi-conductor industry use with purifying hydrogen, nitrogen, noble gas (helium, neon, argon, krypton, xenon), reducibility gas (arsenic hydride, hydrogen phosphide, ammonia etc.).
Description
Technical field
The present invention relates to the impurity containing oxygen element in a kind of gas purifier, particularly purifying hydrogen, nitrogen, noble gas, reducibility gas etc..
Background technology
In semi-conductor industry, it is frequently necessary to hydrogen, nitrogen, noble gas (helium, neon, argon, krypton, xenon), reducibility gas (arsenic hydride, hydrogen phosphide, ammonia, silication hydrogen etc.), and needing these gases to have " ultra-high purity ", especially needing have pole has the impurity such as the oxygen gas and water of rudimentary content, carbon dioxide, carbon monoxide.
Gas purifier on market, it is common that take on getter with " active metals " such as aluminum, magnesium, zirconiums.When hydrogen, nitrogen, noble gas (helium, neon, argon, krypton, xenon), reducibility gas (arsenic hydride, hydrogen phosphide, ammonia, silication hydrogen etc.) are by these active metals, oxygen gas and water therein, carbon dioxide, carbon monoxide are obtained purification by these Metal absorption, gas.But these active metals are all solids, after the Surface absorption of solid contains oxygen element, becoming metal-oxide, form in metal surface one layer " shell ", this layer " shell " hinders the metal of solid interior and absorbs further.
Metallic aluminium is solid.The fusing point of gallium is 30 DEG C, normally liquid.Owing to aluminium plus gallium broadly falls into Group IIIA element, both intermiscibilities are preferable.When 300 DEG C, aluminum dissolubility in gallium reaches more than 5%.Improving temperature, aluminum dissolubility in gallium also can increase.When the gas needing purification passes through gallium-aluminum alloy, in gas, oxygenate impurity is absorbed by aluminum (a kind of active metal), and the oxide generating aluminum floats over gallium-aluminum alloy surface, will not form on surface one layer " shell " as solid material.
Summary of the invention
A kind of gas purifier, this purifier comprises a kind of liquid alloy material and is dissolved in gallium (liquid) by metallic aluminium (solid) and forms gallium-aluminum alloy material (1), and this material is placed in a rustless steel container (2).Rustless steel container (2) is upper containing gas access (3) and gas outlet (4), gas access (3) is inserted in liquid alloy (1), and gas outlet (4) is at liquid alloy (1) above.When gas is by liquid alloy (1), the foreign gas containing oxygen element such as oxygen gas and water in gas, carbon dioxide, carbon monoxide is all absorbed by metallic aluminium, and the oxide generating aluminum floats over gallium-aluminum alloy surface.Upper containing liquidproof alloy backflow device (5) in gas access (3), prevent liquid alloy (1) adverse current from reversely spraying from gas access (3).This purifier can be with purifying hydrogen, nitrogen, noble gas (helium, neon, argon, krypton, xenon), reducibility gas (arsenic hydride, hydrogen phosphide, ammonia, silication hydrogen etc.).
Gallium-aluminum alloy (1) is placed in rustless steel container (2).The shell of rustless steel container (2) leads to common heater (6) heated constant temperature.Thermostat temperature is below 500 DEG C.Heating to gallium-aluminum alloy (1), one is the dissolubility that can increase aluminum in gallium, and two are to increase the chemism of metallic aluminium, improves aluminum and absorbs the chemical reaction velocity of oxygen impurities.
Under normal circumstances, too much solid metal aluminium block (7) can be put into gallium-aluminum alloy.When the liquid aluminium in gallium-aluminum alloy (1) consumes owing to absorbing oxygen impurities, solid aluminum (7) will be dissolved in gallium formation liquid aluminium further, to maintain the stable content of aluminum in gallium-aluminum alloy (1), until all solids aluminium block runs out of.
Accompanying drawing explanation
Fig. 1 is the structural representation of the present invention.Wherein: 1 is gallium-aluminum alloy (liquid alloy).2 is rustless steel container.3 is gas access.4 is gas outlet.5 is liquidproof alloy backflow device.In when gas reflux, all liq flows to this device, will not spray from gas access.6 is heater (containing radiator valve).7 is aluminium block.
Detailed description of the invention
Fig. 1 is the detailed description of the invention schematic diagram of the present invention.Purifier comprises a kind of liquid alloy material and is dissolved in gallium (liquid) by metallic aluminium (solid) and forms gallium-aluminum alloy material (1), and this material is placed in a rustless steel container (2).Rustless steel container (2) is upper containing gas access (3) and gas outlet (4), gas access (3) is inserted in liquid alloy (1), and gas outlet (4) is at liquid alloy (1) above.When gas is by liquid alloy (1), the foreign gas containing oxygen element such as oxygen gas and water in gas, carbon dioxide, carbon monoxide is all absorbed by metallic aluminium, and the oxide generating aluminum floats over the surface of gallium-aluminum alloy.Upper containing liquidproof alloy backflow device (5) in gas access (3), prevent liquid alloy (1) adverse current from reversely spraying from gas access (3).This purifier can be with purifying hydrogen, nitrogen, noble gas (helium, neon, argon, krypton, xenon), reducibility gas (arsenic hydride, hydrogen phosphide, ammonia, silication hydrogen etc.).The shell of rustless steel container (2) by heater (6) heated constant temperature to 350 DEG C.Heating to gallium-aluminum alloy, one is the dissolubility that can increase aluminum in gallium, and two are to increase the chemism of metallic aluminium, improves aluminum and absorbs the chemical reaction velocity of oxygen impurities.It addition, put into too much solid aluminum (7) at gallium-aluminum alloy.When the liquid aluminium in gallium-aluminum alloy consumes owing to absorbing oxygen impurities, solid aluminum (7) will be dissolved in gallium formation liquid aluminium further, to maintain the stable content of aluminum in gallium-aluminum alloy, until all solids aluminum runs out of.
Claims (1)
1. a gas purifier, it is characterised in that: this gas purifier comprises a kind of liquid alloy material
Material (1), this liquid alloy material (1) is placed in a rustless steel container (2)；Rustless steel container (2)
On have gas access (3) and a gas outlet (4), gas access (3) insert in liquid alloy (1), gas
Outlet (4) is at liquid alloy (1) above；When gas is by liquid alloy (1), oxygen-containing in gas
The foreign gas of element is all absorbed by this liquid alloy (1)；Gas access (3) have a liquid-proof
Body alloy backflow device (5), prevents liquid alloy (1) adverse current from spraying from gas access (3)；
Described liquid alloy material (1) is to be dissolved in gallium liquid by metallic aluminium solid to be formed
Gallium-aluminum alloy；
Shell heater (6) heated constant temperature of described rustless steel container (2), thermostat temperature
It it is 350 DEG C；
Described purifier is used for purifying hydrogen, nitrogen, noble gas, reducibility gas；Wherein,
Described noble gas includes: helium, neon, argon, Krypton, xenon；Described reduction
Property gas includes: arsenic hydride, hydrogen phosphide, ammonia, silication hydrogen.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210465860.3A CN103816770B (en) | 2012-11-19 | 2012-11-19 | A kind of gas purifier |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210465860.3A CN103816770B (en) | 2012-11-19 | 2012-11-19 | A kind of gas purifier |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103816770A CN103816770A (en) | 2014-05-28 |
| CN103816770B true CN103816770B (en) | 2016-08-24 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210465860.3A Active CN103816770B (en) | 2012-11-19 | 2012-11-19 | A kind of gas purifier |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103816770B (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105783417A (en) * | 2014-12-19 | 2016-07-20 | 常熟市永安工业气体制造有限公司 | Purification system for air separation system |
| CN105758118A (en) * | 2014-12-19 | 2016-07-13 | 常熟市永安工业气体制造有限公司 | Air separation system |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1745877A (en) * | 2005-08-18 | 2006-03-15 | 新乡化纤股份有限公司 | Method and apparatus for managing hydrogen sulfide tail gas |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102004018362B4 (en) * | 2004-04-13 | 2007-12-27 | Deutsche Montan Technologie Gmbh | High-pressure gas scrubber for the desulphurisation of coke oven gas |
| CN102312100A (en) * | 2011-09-29 | 2012-01-11 | 王亿理 | Lead zinc recovering device |
| CN202376886U (en) * | 2011-12-14 | 2012-08-15 | 武汉钢铁(集团)公司 | Inert gas purifier |
| CN203002199U (en) * | 2012-11-19 | 2013-06-19 | 刘祥林 | Gas purifier |
| CN103816787B (en) * | 2012-11-19 | 2016-08-03 | 湖南高安新材料有限公司 | A kind of gas purifier |
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- 2012-11-19 CN CN201210465860.3A patent/CN103816770B/en active Active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1745877A (en) * | 2005-08-18 | 2006-03-15 | 新乡化纤股份有限公司 | Method and apparatus for managing hydrogen sulfide tail gas |
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| CN103816770A (en) | 2014-05-28 |
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| ASS | Succession or assignment of patent right |
Owner name: HU'NAN HIEND PRODUCTS CO., LTD. Free format text: FORMER OWNER: LIU XIANGLIN Effective date: 20141020 |
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| C41 | Transfer of patent application or patent right or utility model | ||
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Free format text: CORRECT: ADDRESS; FROM: 100083 HAIDIAN, BEIJING TO: 414009 YUEYANG, HUNAN PROVINCE |
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| TA01 | Transfer of patent application right |
Effective date of registration: 20141020 Address after: 414009 Yunxi Industrial Park, Hunan, Yueyang Applicant after: HUNAN HIEND PRODUCTS CO.,LTD. Address before: 100083, room 11, building 35, No. 352, Qinghua East Road, Beijing, Haidian District Applicant before: Liu Xianglin |
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Effective date of registration: 20240419 Address after: 201210 Shanghai Pudong New Area China (Shanghai) Free Trade Pilot Zone No. 665, Zhangjiang Road, 3 Floors Patentee after: Lanhe Technology (Shanghai) Co.,Ltd. Country or region after: China Address before: 414009 Yunxi Industrial Park, Yueyang, Hunan Patentee before: HUNAN HIEND PRODUCTS CO.,LTD. Country or region before: China |