CN203002199U - Gas purifier - Google Patents
Gas purifier Download PDFInfo
- Publication number
- CN203002199U CN203002199U CN 201220610543 CN201220610543U CN203002199U CN 203002199 U CN203002199 U CN 203002199U CN 201220610543 CN201220610543 CN 201220610543 CN 201220610543 U CN201220610543 U CN 201220610543U CN 203002199 U CN203002199 U CN 203002199U
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- gas
- gallium
- aluminum alloy
- purifier
- gases
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Abstract
The utility model discloses a gas purifier. A core of the purifier is as follows: a gallium-aluminum alloy is formed through dissolving aluminum metal (solid) in gallium metal (liquid) and is put in a stainless steel vessel. The stainless steel vessel comprises a gas inlet and a gas outlet, the gas inlet is inserted into the gallium-aluminum alloy, and the gas outlet is located above the gallium-aluminum alloy. When gases pass through the gallium-aluminum alloy, oxygen-containing gases, such as oxygen gas, water, carbon dioxide and carbon monoxide, in the gases are absorbed by the gallium-aluminum alloy. After passing through the purifier, the gases have the oxygen content which is generally in a ppb (parts per billion) level. A gallium-aluminum alloy reflux preventing device is arranged at the gas inlet so as to prevent the gallium-aluminum alloy from refluxing and reversely spouting from the gas inlet. The purifier can be used for purifying hydrogen gas, nitrogen gas, inert gases (helium, neon, argon, krypton and xenon) and in the semiconductor industry.
Description
Technical field
The present invention relates to contain in a kind of gas purifier, particularly purifying hydrogen, nitrogen, inert gas, reducibility gas etc. the impurity of oxygen element.
Background technology
In semi-conductor industry, often need hydrogen, nitrogen, inert gas (helium, neon, argon, krypton, xenon), reducibility gas (arsenic hydride, hydrogen phosphide, ammonia, silication hydrogen etc.), and need these gases to have " ultra-high purity ", especially need the tool utmost point that the impurity such as oxygen, water, carbon dioxide, carbon monoxide of rudimentary content is arranged.
Gas purifier on market normally uses " active metals " such as aluminium, magnesium, zirconiums to take on getter.When hydrogen, nitrogen, inert gas (helium, neon, argon, krypton, xenon), reducibility gas (arsenic hydride, hydrogen phosphide, ammonia, silication hydrogen etc.) during by these active metals, oxygen wherein, water, carbon dioxide, carbon monoxide are by these metal absorptions, and gas obtains purifying.Yet these active metals are all solids, after the Surface absorption of solid contains oxygen element, become metal oxide, form one deck " shell " in the metal surface, and the metal that this one deck " shell " has hindered solid interior further absorbs.
Metallic aluminium is solid.The fusing point of gallium is 30 ℃, is generally liquid.Because aluminium plus gallium all belongs to IIIA family element, both intermiscibilities are better.In the time of 300 ℃, the solubility of aluminium in gallium reaches more than 5%.Improve temperature, the solubility of aluminium in gallium also can increase.When the gallium-aluminum alloy, in gas, oxygenate impurity is absorbed by aluminium (a kind of active metal) when the gas that needs purifying, and the oxide that generates aluminium floats over the gallium-aluminum alloy surface, can not resemble to form one deck " shell " on the surface solid material.
Summary of the invention
A kind of gas purifier, this purifier comprises a kind of gallium-aluminum alloy---and be dissolved in gallium (liquid) by metallic aluminium (solid) and form gallium-aluminum alloy (1), this material is placed in a rustless steel container (2).Contain gas access (3) and gas vent (4) on rustless steel container (2), insert in gallium-aluminum alloy (1) gas access (3), and gas vent (4) is on gallium-aluminum alloy (1).By in gallium-aluminum alloy (1), the foreign gas that the oxygen in gas, water, carbon dioxide, carbon monoxide etc. contain oxygen element is all absorbed by metallic aluminium when gas, and the oxide that generates aluminium floats over the gallium-aluminum alloy surface.Contain an anti-gallium-aluminum alloy backflow device (5) on gas access (3), prevent (3) the oppositely ejection from the gas access of gallium-aluminum alloy (1) adverse current.This purifier can purifying hydrogen, nitrogen, inert gas (helium, neon, argon, krypton, xenon), reducibility gas (arsenic hydride, hydrogen phosphide, ammonia, silication hydrogen etc.).
Gallium-aluminum alloy (1) is placed in rustless steel container (2).The shell of rustless steel container (2) is used heater (6) heated constant temperature usually.Thermostat temperature is below 500 ℃.Give gallium-aluminum alloy (1) heating, the one, can increase the solubility of aluminium in gallium, the 2nd, the chemism of increase metallic aluminium improves the chemical reaction velocity that aluminium absorbs oxygen impurities.
Generally, can put into too much solid metal aluminium block (7) to gallium-aluminum alloy.When the liquid aluminium in gallium-aluminum alloy (1) consumes due to the absorption oxygen impurities, solid aluminum (7) will further be dissolved in and form liquid aluminium in gallium, to keep the stable content of aluminium in gallium-aluminum alloy (1), until all solids aluminium block runs out of.
Description of drawings
Fig. 1 is structural representation of the present invention.Wherein: the 1st, gallium-aluminum alloy.The 2nd, rustless steel container.The 3rd, the gas access.The 4th, gas vent.The 5th, anti-gallium-aluminum alloy backflow device.All liq flows in this device when gas reflux, can not spray from the gas access.The 6th, heater (containing radiator valve).The 7th, aluminium block.
The specific embodiment
Fig. 1 is the specific embodiment of the present invention schematic diagram.Purifier comprises a kind of gallium-aluminum alloy (1)---and be dissolved in by metallic aluminium (solid) and form in gallium (liquid), this material is placed in a rustless steel container (2).Contain gas access (3) and gas vent (4) on rustless steel container (2), insert in gallium-aluminum alloy (1) gas access (3), and gas vent (4) is on gallium-aluminum alloy (1).By in gallium-aluminum alloy (1), the foreign gas that the oxygen in gas, water, carbon dioxide, carbon monoxide etc. contain oxygen element is all absorbed by metallic aluminium when gas, and the oxide that generates aluminium floats over the surface of gallium-aluminum alloy.Contain an anti-gallium-aluminum alloy backflow device (5) on gas access (3), prevent (3) the oppositely ejection from the gas access of gallium-aluminum alloy (1) adverse current.This purifier can purifying hydrogen, nitrogen, inert gas (helium, neon, argon, krypton, xenon), reducibility gas (arsenic hydride, hydrogen phosphide, ammonia, silication hydrogen etc.).The shell of rustless steel container (2) is with heater (6) heated constant temperature to 350 ℃.To the gallium-aluminum alloy heating, the one, can increase the solubility of aluminium in gallium, the 2nd, the chemism of increase metallic aluminium improves the chemical reaction velocity that aluminium absorbs oxygen impurities.In addition, put into too much solid aluminum (7) at gallium-aluminum alloy.When the liquid aluminium in gallium-aluminum alloy consumed due to the absorption oxygen impurities, solid aluminum (7) will further be dissolved in and form liquid aluminium in gallium, to keep the stable content of aluminium in gallium-aluminum alloy, until all solids aluminium runs out of.
Claims (4)
1. gas purifier, it is characterized in that: this gas purifier comprises a kind of gallium-aluminum alloy (1), and this gallium-aluminum alloy (1) is placed in a rustless steel container (2); Gas access (3) and gas vent (4) are arranged on rustless steel container (2), and insert in gallium-aluminum alloy (1) gas access (3), and gas vent (4) is on gallium-aluminum alloy (1); When gas passed through gallium-aluminum alloy (1), the foreign gas that contains oxygen element in gas was all absorbed by this gallium-aluminum alloy (1); An anti-gallium-aluminum alloy backflow device (5) is arranged on gas access (3), prevent gallium-aluminum alloy (1) adverse current and (3) ejection from the gas access.
2. gas purifier as claimed in claim 1, the shell of described rustless steel container (2) are with heater 6 heated constant temperature, and thermostat temperature is below 500 ℃.
3. gas purifier as claimed in claim 1, gallium-aluminum alloy wherein are dissolved in gallium (liquid) by metallic aluminium (solid) and form.
4. gas purifier as claimed in claim 1, this purifier is used for purifying hydrogen, nitrogen, inert gas, reducibility gas; Wherein, described inert gas comprises: helium, neon, argon gas, Krypton, xenon; Described reducibility gas comprises: arsenic hydride, hydrogen phosphide, ammonia, silication hydrogen.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220610543 CN203002199U (en) | 2012-11-19 | 2012-11-19 | Gas purifier |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220610543 CN203002199U (en) | 2012-11-19 | 2012-11-19 | Gas purifier |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203002199U true CN203002199U (en) | 2013-06-19 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201220610543 Expired - Lifetime CN203002199U (en) | 2012-11-19 | 2012-11-19 | Gas purifier |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203002199U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103816770A (en) * | 2012-11-19 | 2014-05-28 | 刘祥林 | Gas purifier |
-
2012
- 2012-11-19 CN CN 201220610543 patent/CN203002199U/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103816770A (en) * | 2012-11-19 | 2014-05-28 | 刘祥林 | Gas purifier |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| ASS | Succession or assignment of patent right |
Owner name: HU'NAN HIEND PRODUCTS CO., LTD. Free format text: FORMER OWNER: LIU XIANGLIN Effective date: 20141013 |
|
| C41 | Transfer of patent application or patent right or utility model | ||
| COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: 100083 HAIDIAN, BEIJING TO: 414009 YUEYANG, HUNAN PROVINCE |
|
| TR01 | Transfer of patent right |
Effective date of registration: 20141013 Address after: 414009 Yunxi Industrial Park, Hunan, Yueyang Patentee after: HUNAN HIEND PRODUCTS CO.,LTD. Address before: 100083, room 11, building 35, No. 352, Qinghua East Road, Beijing, Haidian District Patentee before: Liu Xianglin |
|
| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20130619 |