CN103718255A - 具有高耐电晕性的涂层及其制造方法 - Google Patents
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Abstract
本发明涉及绝缘材料的涂层。该涂层不仅可以施加到三维部件上,还可以施加到片材如薄膜和织物材料上。通过可湿化学制造的涂层中的硅烷组分和/或硅氧烷组分显著提高耐电晕性。该层可以通过颗粒改性。
Description
本发明涉及用于塑料的涂层。该涂层不仅可以施加到三维部件上,还可以施加到片材如薄膜和织物材料上。
电机(变压器电机、发电机)根据它们的功率和构造模式具有复杂的绝缘系统。用于这一用途的聚合物材料具有非常合适的电绝缘性质并且便宜和容易地适应所需几何形状。这些材料的缺点通常是针对高场强下的放电的低长期稳定性。
本发明的一个目的是提供具有改进的电晕稳定性并包含聚合物材料的优点的材料。
通过如说明书、附图和权利要求书公开的本发明的主题实现该目的。
本发明相应地提供聚合物绝缘材料的涂层,其包含1至10层并且是基本硅酸酯质的(silikatisch),其中所述涂层包含硅酸酯质基础单元与有机基团的合适的共混物,以便可将其施加到柔性基材上,各层的涂层厚度为0.1至100微米,各层可湿化学制造,其中前体是硅烷、硅氧烷和/或硅酸酯。本发明还提供制造聚合物绝缘材料的涂层的方法,其中所述涂层通过湿化学法以一层或多层施加,各层在固化后产生厚度为0.1至100微米/层的紧实层。
本涂层是基本硅酸酯质的,意味着各层的主要构造在每种情况下包含Si-O单元,其提供高的电晕稳定性,但为了可容易地施加到柔性或易弯曲的载体上,根据层还包含不同的有机基团和/或不同浓度的有机基团,它们提供层的柔性和/或涂层在柔性表面上的粘合性。
根据一个有利的实施方案,硅烷前体是原硅酸四乙酯(TEOS)和/或甲基三乙氧基-硅烷 (MTES)。
合适的有机基团的实例是包含环氧基、氨基、丙烯酸基和/或乙烯基作为官能团的改性有机硅烷。在这种情况中,制成杂化聚合物层。
在三维部件上以及在片材如薄膜和织物材料上,该硅酸酯质涂层具有在每层0.1至100微米范围,优选0.1至50微米范围内的层厚度。
该涂层可包含总共1至10层,有利地包含1至5层,尤其优选1至3层。
根据一个有利的实施方案,其中特别提高涂层的层厚度及其柔性,该涂层除包含硅烷和/或硅氧烷组分外还包含常规树脂体系,如环氧化物体系、不饱和聚酯体系、聚酯体系、酚体系、氰酸酯体系、乙烯基酯体系或其它已知的树脂体系。
该树脂体系或涂层溶胶本身在此还可包含填料,例如金属氧化物材料、氧化硅、氧化铝、碳化硅和/或氮化硅,或与无填料的聚合物/硅酸酯质层相比提高热导率的所有已知的其它颗粒材料。
各层的作用是调节该涂层的机械性质。为了平衡在柔性带和薄膜的情况中或由于涂层基材与涂层之间的热膨胀差异引起的机械应力,在此实现基材附近的涂层的聚合物-弹性结构和远离基材的涂层的高度无机结构的梯度构造。
因此,如果该涂层总共包含多个层,有利的是例如连接聚合绝缘体的层具有最高的有机基团比例以便柔性化,而位于最外的层具有最高的Si-O单元比例以确保电晕稳定性。
根据本发明,可以实现可稳固生产和使用的便宜、新型、电晕稳定的材料解决方案。借助此处提出的材料方案,可以通过调节杂化特性(有机和无机交联结构)而在宽范围内调节机械性质(硬度、脆性、柔性),尤其是对柔性的片材涂层方面而言。
因此可以设计电稳固和机械稳固的系统,其甚至在片状绝缘材料的弯曲载荷下也可以可靠地使用。
不同于通过物理方法(物理气相沉积,PVD)施加的现有SiOx层,可以调节该层以使涂布的薄膜材料不会在热氧化负荷下加速脆化。
实施例:
通过湿化学法施加不同制品。合适的方法是刮刀涂施、旋涂、浸渍、喷涂,对分块的基材分批操作,而对于连续条带如薄膜或织物则卷到卷操作。
通过将无机前体原硅酸四乙酯(TEOS)与网络改性剂甲基三乙氧基硅烷(MTES)和水(H2O)混合,一种材料制品例如产生具有杂化特性的材料。根据无机前体TEOS与有机改性的烷氧基硅烷MTES的摩尔比,可以实现从“二氧化硅玻璃”到“二氧化硅橡胶”的性质变化。
除已存在的有机改性的烷氧基硅烷MTES外,还可以将本身也能与自身和与其它成分形成网络的有机官能硅烷添加到该溶胶中。另外将3-环氧丙氧基丙基三甲氧基硅烷(GPTMS)添加到该TEOS:MTES溶胶中。GPTMS能够进入无机网络中,也能参与有机交联。
通过湿化学刮刀涂布法施加该制品。使用螺旋刮刀将该涂料溶液施加到已用离子发生器清洁的PET表面上。使涂布面在空气中通风/干燥至少20小时。在通风后,该层在95-100°C下固化2.5小时。在涂布第二面时采用相同方案。
使用IEC 343b滑动装置验证侵蚀稳定性方面的性质特征。在标准EN 60343中描述了这种验证并根据该标准用于本试验。对于该滑动装置,在样品表面的切线上产生TE。对样品施加TE和进行老化240小时。
在电老化后记录表面效应:
在用TE负荷之后,绝缘材料样品在表面上表现出不同的效应。最常见的特征是可通过激光-光学手段定性和定量测定的剥蚀。
结果:
本发明的溶胶形成在240小时后在表面上仅产生点蚀的层。四个不同样品薄膜的平均侵蚀深度为18微米。这意味着PET薄膜仅遭受局部劣化至初始厚度的最多一半,而没有出现如参照的损伤。
唯一的附图显示涂布的PET绝缘薄膜与未涂布的PET薄膜的比较,各样品存在标准偏差。
两个样品的侵蚀深度的差异非常清晰可见。未涂布的PET薄膜通过该试验而表现出几乎225微米的侵蚀深度,而对于涂布薄膜侵蚀穿透度低10倍,最多仅为25微米。因此,由其制成的绝缘体的寿命提高10倍。
本发明涉及绝缘材料的涂层。该涂层不仅可以施加到三维部件上,还可以施加到片材如薄膜和织物材料上。通过可湿化学制造的涂层中的硅烷组分和/或硅氧烷组分显著提高耐电晕性。
Claims (7)
1. 聚合物绝缘材料的涂层,其包含1至10层并且是基本硅酸酯质的,其中所述涂层包含硅酸酯质基础单元与有机基团的合适的共混物,以便可将其施加到柔性基材上,各层的层厚度为0.1至100微米,各层可湿化学制造,其中前体是硅烷、硅氧烷和/或硅酸酯。
2. 如权利要求1中所述的涂层,所述硅烷或含硅烷的化合物和/或硅氧烷或含硅氧烷的化合物由包含原硅酸四乙酯(TEOS)和/或甲基三乙氧基硅烷的前体制备。
3. 如权利要求2中所述的涂层,所述涂层内的有机基团含量随层而变化,以使所述涂层内的无机Si-O单元的含量向外提高,换言之向远离基材的方向提高。
4. 如权利要求3中所述的涂层,所述有机硅成分是包含环氧基、氨基、丙烯酸基和/或乙烯基作为官能团的改性有机硅烷。
5. 如权利要求1-4中所述的涂层,所述体系进一步包含填料,例如金属氧化物材料、氧化硅、氧化铝、碳化硅和/或氮化硅。
6. 如前述权利要求任一项中所述的涂层,其中所述涂层进一步包含常规树脂体系,如环氧化物体系、不饱和聚酯体系、聚酯体系、酚体系、氰酸酯体系、乙烯基酯体系或其它已知的树脂体系。
7. 制造如权利要求1至6任一项中所述的涂层的方法,其中所述涂层通过湿化学法以一层或多层施加,各层在固化后产生厚度为0.1至100微米/层的紧实层。
Applications Claiming Priority (3)
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DE102011080884A DE102011080884A1 (de) | 2011-08-12 | 2011-08-12 | Beschichtung mit hoher Koronabeständigkeit, sowie Herstellungsverfahren dazu |
DE102011080884.1 | 2011-08-12 | ||
PCT/EP2012/064476 WO2013023880A1 (de) | 2011-08-12 | 2012-07-24 | Beschichtung mit hoher koronabeständigkeit, sowie herstellungsverfahren dazu |
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CN103718255A true CN103718255A (zh) | 2014-04-09 |
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US (1) | US20140248479A1 (zh) |
EP (1) | EP2742513B1 (zh) |
CN (1) | CN103718255B (zh) |
DE (1) | DE102011080884A1 (zh) |
RU (1) | RU2606447C2 (zh) |
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CN106010174B (zh) * | 2016-05-31 | 2018-06-05 | 山东面面佳环保科技有限公司 | 一种改性聚芳醚耐高温绝缘漆及其制备方法 |
RU2688969C2 (ru) * | 2017-02-21 | 2019-05-23 | Игорь Александрович Зябрев | Способ получения полых покрытий при газопорошковой лазерной наплавке со сканированием излучения |
EP3462463A1 (de) | 2017-09-28 | 2019-04-03 | Siemens Aktiengesellschaft | Isolationssystem, isolationsstoff und isolationsmaterial zur herstellung des isolationssystems |
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DE10355668A1 (de) * | 2003-11-28 | 2005-06-23 | Institut für Neue Materialien Gemeinnützige GmbH | Isolationsmaterial |
DE102007020404A1 (de) * | 2006-09-18 | 2008-10-30 | Nano-X Gmbh | Verfahren zur Herstellung eines Beschichtungsmaterials |
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2011
- 2011-08-12 DE DE102011080884A patent/DE102011080884A1/de not_active Withdrawn
-
2012
- 2012-07-24 EP EP12742849.8A patent/EP2742513B1/de not_active Not-in-force
- 2012-07-24 CN CN201280039387.0A patent/CN103718255B/zh not_active Expired - Fee Related
- 2012-07-24 RU RU2014109352A patent/RU2606447C2/ru not_active IP Right Cessation
- 2012-07-24 WO PCT/EP2012/064476 patent/WO2013023880A1/de active Application Filing
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2014
- 2014-02-12 US US14/179,028 patent/US20140248479A1/en not_active Abandoned
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JP2004010864A (ja) * | 2002-06-11 | 2004-01-15 | Nippon Unicar Co Ltd | 耐トラッキング性水架橋性樹脂組成物、及びそれからなる絶縁被覆層を持つ電力ケーブル |
CN101821818A (zh) * | 2007-10-08 | 2010-09-01 | Abb研究有限公司 | 具有改善的抗电痕性和耐腐蚀性的表面改性的电绝缘系统 |
US20100059248A1 (en) * | 2008-09-09 | 2010-03-11 | Hitachi Cable, Ltd. & Hitachi Magnet Wire Corp. | Insulation coating and electric insulated wire |
WO2010127693A1 (en) * | 2009-05-05 | 2010-11-11 | Abb Research Ltd | Curable sol-gel composition |
CN102020850A (zh) * | 2009-09-10 | 2011-04-20 | 比亚迪股份有限公司 | 一种耐电晕组合物及其制备方法 |
WO2011057905A1 (de) * | 2009-11-10 | 2011-05-19 | Siemens Aktiengesellschaft | Beschichtete isolationsfolien für elektrische maschinen und herstellungsverfahren dazu |
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Publication number | Publication date |
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WO2013023880A1 (de) | 2013-02-21 |
EP2742513A1 (de) | 2014-06-18 |
US20140248479A1 (en) | 2014-09-04 |
CN103718255B (zh) | 2017-07-25 |
RU2014109352A (ru) | 2015-09-20 |
RU2606447C2 (ru) | 2017-01-10 |
DE102011080884A1 (de) | 2013-02-14 |
EP2742513B1 (de) | 2018-05-09 |
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