CN103713096A - 识别气态分子污染源的方法 - Google Patents

识别气态分子污染源的方法 Download PDF

Info

Publication number
CN103713096A
CN103713096A CN201310028005.0A CN201310028005A CN103713096A CN 103713096 A CN103713096 A CN 103713096A CN 201310028005 A CN201310028005 A CN 201310028005A CN 103713096 A CN103713096 A CN 103713096A
Authority
CN
China
Prior art keywords
amc
sensor
workshop
source
cfd
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201310028005.0A
Other languages
English (en)
Chinese (zh)
Inventor
庄子寿
黄正吉
周政隆
杨棋铭
林进祥
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Taiwan Semiconductor Manufacturing Co TSMC Ltd
Original Assignee
Taiwan Semiconductor Manufacturing Co TSMC Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiwan Semiconductor Manufacturing Co TSMC Ltd filed Critical Taiwan Semiconductor Manufacturing Co TSMC Ltd
Priority to CN201810163704.9A priority Critical patent/CN108548892A/zh
Publication of CN103713096A publication Critical patent/CN103713096A/zh
Pending legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
    • G01N33/0004—Gaseous mixtures, e.g. polluted air
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F15/00—Digital computers in general; Data processing equipment in general
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Theoretical Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Food Science & Technology (AREA)
  • Medicinal Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • General Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Air Conditioning Control Device (AREA)
  • Examining Or Testing Airtightness (AREA)
CN201310028005.0A 2012-10-01 2013-01-24 识别气态分子污染源的方法 Pending CN103713096A (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201810163704.9A CN108548892A (zh) 2012-10-01 2013-01-24 识别气态分子污染源的方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/632,530 2012-10-01
US13/632,530 US9958424B2 (en) 2012-10-01 2012-10-01 Method of identifying airborne molecular contamination source

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CN201810163704.9A Division CN108548892A (zh) 2012-10-01 2013-01-24 识别气态分子污染源的方法

Publications (1)

Publication Number Publication Date
CN103713096A true CN103713096A (zh) 2014-04-09

Family

ID=50276411

Family Applications (2)

Application Number Title Priority Date Filing Date
CN201310028005.0A Pending CN103713096A (zh) 2012-10-01 2013-01-24 识别气态分子污染源的方法
CN201810163704.9A Pending CN108548892A (zh) 2012-10-01 2013-01-24 识别气态分子污染源的方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
CN201810163704.9A Pending CN108548892A (zh) 2012-10-01 2013-01-24 识别气态分子污染源的方法

Country Status (4)

Country Link
US (1) US9958424B2 (de)
KR (1) KR101491234B1 (de)
CN (2) CN103713096A (de)
DE (1) DE102013103696B4 (de)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113095002A (zh) * 2021-03-26 2021-07-09 中国石油大学(华东) 一种基于cfd伴随概率法的被困人员位置计算方法
CN113588884A (zh) * 2021-08-03 2021-11-02 亚翔系统集成科技（苏州）股份有限公司 一种基于amc在线监测系统的污染源查找方法

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105758996B (zh) * 2016-03-03 2017-08-25 重庆大学 大空间区域内电子鼻的布局方法
US10948470B2 (en) * 2016-04-29 2021-03-16 TricornTech Taiwan System and method for in-line monitoring of airborne contamination and process health
CN110823456B (zh) * 2019-09-29 2021-04-27 中国人民解放军陆军防化学院 一种自动搜索定位化学品输送管道泄漏点的方法和设备
CN112345698B (zh) * 2020-10-30 2022-04-12 大连理工大学 一种空气污染物监测站点的网格化排布方法
CN113607766B (zh) * 2021-08-03 2023-08-29 亚翔系统集成科技（苏州）股份有限公司 基于半导体生产线中不良产品的污染源查找方法
CN113607765B (zh) * 2021-08-03 2024-04-12 亚翔系统集成科技（苏州）股份有限公司 一种基于半导体生产线中不良产品的污染源查找方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2001282879A1 (en) 2000-07-08 2002-01-21 Semitool, Inc. Methods and apparatus for processing microelectronic workpieces using metrology
US7790545B2 (en) * 2005-06-16 2010-09-07 Nxp B.V. Semiconductor device having a polysilicon electrode including amorphizing, recrystallising, and removing part of the polysilicon electrode
US20070056925A1 (en) * 2005-09-09 2007-03-15 Lam Research Corporation Selective etch of films with high dielectric constant with H2 addition
CN100538300C (zh) * 2006-04-05 2009-09-09 财团法人工业技术研究院 过程气体泄漏源检测系统与方法
JP4767783B2 (ja) * 2006-07-26 2011-09-07 東京エレクトロン株式会社 液処理装置
TWI454851B (zh) * 2007-12-28 2014-10-01 尼康股份有限公司 An exposure apparatus, a moving body driving system, a pattern forming apparatus, and an exposure method, and an element manufacturing method
WO2009110048A1 (ja) * 2008-02-15 2009-09-11 日本ユニサンティスエレクトロニクス株式会社 半導体装置及びその製造方法
US8827695B2 (en) * 2008-06-23 2014-09-09 Taiwan Semiconductor Manufacturing Company, Ltd. Wafer's ambiance control
KR101017910B1 (ko) 2008-09-04 2011-03-04 (주)신성이엔지 클린룸 시스템
KR101025310B1 (ko) 2008-10-27 2011-03-29 건국대학교 산학협력단 독립형 환경 가스 측정 시스템
US8893642B2 (en) 2010-03-24 2014-11-25 Lam Research Corporation Airflow management for low particulate count in a process tool
JP2011204819A (ja) 2010-03-25 2011-10-13 Hitachi Kokusai Electric Inc 基板処理装置及び基板処理方法
US20120078417A1 (en) 2010-09-28 2012-03-29 International Business Machines Corporartion Detecting Energy and Environmental Leaks In Indoor Environments Using a Mobile Robot
US9543406B2 (en) * 2010-11-30 2017-01-10 Taiwan Semiconductor Manufacturing Company, Ltd. Structure and method for overlay marks

Non-Patent Citations (6)

* Cited by examiner, † Cited by third party
Title
ROSEANNA M. NEUPAUER等: "Adjoint-derived location and travel time probabilities for a multidimensional groundwater system", 《WATER RESOURCES RESEARCH》 *
X. LIU等: "Location identification for indoor instantaneous point contaminant source by probability-based inverse Computational Fluid Dynamics modeling", 《INDOOR AIR》 *
XIANG LIU等: "Prompt tracking of indoor airborne contaminant source location with probability-based inverse multi-zone modeling", 《BUILDING AND ENVIRONMENT》 *
ZHIQIANG (JOHN) ZHAI等: "Principles and Applications of Probability-Based Inverse Modeling Method for Finding Indoor Airborne Contaminant Sources", 《BUILD SIMUL》 *
张腾飞: "辨识室内空气污染源的反问题建模", 《建筑热能通风空调》 *
殷士: "辨识室内气态污染源非稳态释放过程的CFD反问题建模", 《中国优秀硕士学位论文全文数据库工程科技Ⅰ辑》 *

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113095002A (zh) * 2021-03-26 2021-07-09 中国石油大学(华东) 一种基于cfd伴随概率法的被困人员位置计算方法
CN113588884A (zh) * 2021-08-03 2021-11-02 亚翔系统集成科技（苏州）股份有限公司 一种基于amc在线监测系统的污染源查找方法
CN113588884B (zh) * 2021-08-03 2023-08-15 亚翔系统集成科技（苏州）股份有限公司 一种基于amc在线监测系统的污染源查找方法

Also Published As

Publication number Publication date
DE102013103696A1 (de) 2014-04-03
KR20140043269A (ko) 2014-04-09
DE102013103696B4 (de) 2020-11-05
KR101491234B1 (ko) 2015-02-17
US20140095083A1 (en) 2014-04-03
CN108548892A (zh) 2018-09-18
US9958424B2 (en) 2018-05-01

Similar Documents

Publication Publication Date Title
CN103713096A (zh) 识别气态分子污染源的方法
US9121820B2 (en) Top-down fabrication method for forming a nanowire transistor device
CN102842518B (zh) 多晶硅假栅移除后的监控方法
CN104241161A (zh) 一种检测晶圆栅氧化物缺失缺陷的方法
CN104425302A (zh) 半导体器件的缺陷检测方法和装置
TWI472942B (zh) 半導體裝置的密度變化及密度偏差的驗證方法及執行驗證方法的電腦可讀取儲存媒體
TWI728399B (zh) 晶圓乾燥系統及方法
CN104217973B (zh) 检测多晶硅栅极氧化层缺失的方法
US8421585B2 (en) Alarm apparatus and manufacturing method
US7888142B2 (en) Copper contamination detection method and system for monitoring copper contamination
US10366932B2 (en) Method and system for wet chemical bath process
CN106093471B (zh) 一种含有自检测功能的面内压阻式加速度传感器及其制造方法
Djuzhev et al. Non-contact technique for determining the mechanical stress in thin films on wafers by profiler
CN110851984B (zh) 一种数据处理方法及装置
CN105247669A (zh) 半导体晶圆的评价方法
CN104201131B (zh) 评估多晶硅栅极氧化层缺失缺陷的方法
CN103822813B (zh) 半导体器件测试样品的制作方法
CN113588884B (zh) 一种基于amc在线监测系统的污染源查找方法
CN103904000A (zh) 采用电容衬度测试结构检测多晶硅底部桥连缺陷的方法
US7957917B2 (en) Copper contamination detection method and system for monitoring copper contamination
CN107331633A (zh) 一种原子层氧化物沉积针孔缺陷检测方法
US20170268941A1 (en) Tactile sensing intrumented wafer
CN108984913B (zh) 一种应用于干法去胶工艺的匹配验证方法
CN114678285A (zh) 半导体检测方法
Surapaneni Lifetime prediction of transistors: effects of temperature and water

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
RJ01 Rejection of invention patent application after publication
RJ01 Rejection of invention patent application after publication

Application publication date: 20140409