CN103644859A - Device and method used for measuring deformation of diamond anvil under high temperature high pressure condition - Google Patents

Abstract

The device relates to the non-contact measuring field and particularly relates to a device and a method used for measuring deformation of a diamond anvil under the high temperature high pressure condition. The method and the device are provided according to the technical problems existing in the prior art. Specifically, deformation of the diamond anvil under the high temperature high pressure condition is acquired through a probe light emission light path, a signal reception light path and a signal processing computer; broad band probe light is provided by the probe light emission light path, signal light returned back from a front table top of the diamond anvil and reference light returned from a back table top of the diamond anvil are collected by the signal reception light path, and frequency spectrum interference of the two light beams is generated in a fiber spectrometer of the signal reception light path; a frequency spectrum interference signal outputted by the fiber spectrometer is processed by the computer, and deformation of the diamond anvil under the high temperature high pressure condition is acquired.

Description

Measure the device and method of diamond anvil deformation under thermal extremes condition of high voltage

Technical field

The present invention relates to non-contact measurement field, especially relate to the device and method of measuring diamond anvil deformation under thermal extremes condition of high voltage.

Background technology

The invention of diamond press (DAC) is the important breakthrough of quiet High-Voltage Experimentation research field with application, also be the most general high pressure generating apparatus in current quiet high pressure research field, the ability that its produces UHV (ultra-high voltage) for people provide more profound understanding material under thermal extremes condition of high voltage physics, chemical property may.By DAC loading technique, people have carried out the research of phase transformation, state equation, intensity, the velocity of sound and the optical property of material under thermal extremes condition of high voltage, magnetic property, electrical properties etc.

Utilizing DAC to carry out in the measurements such as conductivity, the velocity of sound and pressure gradient method intensity, the original position of thickness of sample is accurately measured most important, and the deformation meeting under high pressure of diamond anvil and packing has a strong impact on the accurate measurement of thickness of sample.If can access the deformation data of diamond anvil under high-temperature and high-pressure conditions, can carry out refine to the thickness of sample under high pressure, thereby improve experimental precision.To diamond anvil, deformation under high pressure mainly contains the methods such as finite element numerical simulation, X-ray transmission imaging and contact miking and assesses; Finite element numerical simulation depends on the characterisitic parameter of set up model and diamond anvil and gasket material, X-ray transmission imaging method needs the synchrotron radiation light source of high brightness, while expending the synchrotron radiation machine of a large amount of preciousnesses, miking owned by France in contact type measurement, measuring accuracy is limited and cannot provide the pattern of pressing anvil facial disfigurement.In sum, there is no at present effective method diamond anvil is measured in the deformation under High Temperature High Pressure, be difficult to meet under DAC loading environment thickness of sample is carried out to the requirement that original position is accurately measured.

Summary of the invention

Technical matters to be solved by this invention is: the problem existing for prior art, provides a kind of device and method of measuring diamond anvil deformation under thermal extremes condition of high voltage.The present invention comprises that surveying light launches light path, signal receiving light path and signal process computer; Described detection light transmitting light path provides broad band to survey light, and described signal receiving light path collects table top returns from diamond anvil flashlight and from the reference light that table top returns thereafter, two-beam, in the fiber spectrometer of signal receiving light path, frequency spectrum interference occurs; By computing machine, process the frequency spectrum interference signal of fiber spectrometer output, obtain the deformation of diamond anvil under thermal extremes condition of high voltage.

The technical solution used in the present invention is as follows:

A kind of device of measuring diamond anvil deformation under thermal extremes condition of high voltage comprises surveys light transmitting light path, signal receiving light path and signal process computer; Described detection light transmitting light path provides broad band to survey light, and described signal receiving light path collects table top returns from diamond anvil flashlight and from the reference light that table top returns thereafter, two-beam, in the fiber spectrometer of signal receiving light path, frequency spectrum interference occurs; By computing machine, process the frequency spectrum interference signal of fiber spectrometer output, obtain the deformation of diamond anvil under thermal extremes condition of high voltage.

Preferably, described detection light transmitting light path comprises:

With the wideband light source 10 of tail optical fiber, for sending detection light;

Three fiber port circulators 11,, export from optical fiber circulator 11 second ports the detection light of wideband light source 10 inputs by optical fiber circulator 11 first ports;

Optical fiber collimator 13, for the detection light of optical fiber circulator 11 second port outputs being transformed into the collimated light of free space transmission, and exports by optical fiber collimator 13 band anti-reflection film one end;

Microcobjective 6, for focusing on the front table top of diamond anvil 7 by the collimated light of optical fiber collimator 13 outputs;

Preferably, described signal receiving light path comprises:

Microcobjective 6, for collecting the reference light that table top returns from diamond anvil 7 and the flashlight that table top returns from it;

Optical fiber collimator 13, is coupled into optical fiber for reference light and the flashlight that microcobjective 6 is collected, and exports by optical fiber collimator 13 band tail optical fiber one end;

Optical fiber circulator 11, is connected the second port of optical fiber circulator 11 with optical fiber collimator 13 tail optical fibers, the reference light of collecting and flashlight are exported from optical fiber circulator 11 the 3rd port;

Fiber spectrometer 15, for receiving reference light and the flashlight of optical fiber circulator 11 the 3rd port output, and records the frequency spectrum interference signal that reference light and flashlight occur in spectrum domain;

Preferably, described computing machine 16 receives and processes the frequency spectrum interference signal of fiber spectrometer 15 outputs, calculate diamond anvil 7 at the one-tenth-value thickness 1/10 at each point place, and then analyze and to obtain the deformation data of diamond anvil 7 under high-temperature and high-pressure conditions, detailed process comprises:

Step 1: the spectral distribution of wideband light source 10 is E ₀(λ) flashlight, returning from diamond anvil 7 front and back table tops, the spectral distribution E of reference light ₁(λ), E ₂(λ) can be written as respectively:

$\left\{\begin{array}{c}{E}_1\left(\mathrm{\λ}\right)=a{E}_0\left(\mathrm{\λ}\right)e^{\mathrm{ik}(l+\mathrm{\Δ})}\\ E_2\left(\mathrm{\λ}\right)=b{E}_0\left(\mathrm{\λ}\right)e^{\mathrm{ikl}}\end{array}\right.---\left(1\right)$

Wherein a, b are constant, by the loss of surveying light transmitting light path and signal receiving light path, determined, k is wave vector, l is reference light and the common light path experiencing of flashlight while entering fiber spectrometer 15, the additional optical path difference that Δ=2nh produces in the front table top reflection of diamond anvil 7 for surveying light, n is the refractive index of diamond anvil 7, and h is the thickness of diamond anvil 7;

Step 2: the frequency spectrum interference signal expression of fiber spectrometer 15 records can be written as:

$\begin{array}{c}I\left(\mathrm{\λ}\right)=[E_1\left(\mathrm{\λ}\right)+E_2\left(\mathrm{\λ}\right)]{[E_1\left(\mathrm{\λ}\right)+E_2\left(\mathrm{\λ}\right)]}^{*}\\ ={\left|E_0\left(\mathrm{\λ}\right)\right|}^2[a^2+b^2+2\mathrm{ab}\cos \left(\mathrm{k\Δ}\right)]\end{array}---\left(2\right)$

Wavelength X in formula (2) is replaced with frequency υ, and (2) formula can be written as:

$I\left(\mathrm{\υ}\right)={\left|E_0\left(\mathrm{\υ}\right)\right|}^2[a^2+b^2+2\mathrm{ab}\cos \left(2\mathrm{\π}\frac{2\mathrm{nh}}{c}\mathrm{\υ}\right)]---\left(3\right)$

Wherein c is the light velocity in vacuum;

Step 3: from (3) formula, the frequency spectrum interference signal of fiber spectrometer 15 records is one and is subject to E in frequency field ₀(υ) cosine function of modulation, its frequency is 2nh/c, its physical significance is the transmission time difference that flashlight and reference light produce while experiencing different light paths, therefore by (3) formula is carried out to Fourier transform, can obtain the frequency f of frequency spectrum interference signal, be f=2nh/c, so the thickness of diamond anvil 7 under high-temperature and high-pressure conditions is h=fc/ (2n).Thickness during with diamond anvil 7 zero-pressure subtracts each other, and has obtained the deformation of diamond anvil 7 under high-temperature and high-pressure conditions;

Step 4: diamond anvil 7 is moved along the direction perpendicular to optical axis, obtain diamond anvil 7 table tops at the thickness at each point place radially, thereby obtain the pattern of diamond anvil 7 table tops under High Temperature High Pressure.

Preferably, described wideband light source 10 is that centre wavelength is the broad spectrum light source of 1550nm, and line width is not less than common spontaneous radiation (ASE) light source that 30nm or line width are not less than 30nm, and power is not less than 30mW.

Preferably, the resolution of described fiber spectrometer 15 is higher than 20pm, and available general spectrometer replaces.

Preferably, described microcobjective 6 operating distances are greater than 20mm, and enlargement factor is not less than 10 times.

Preferably, the device of measuring diamond anvil deformation under thermal extremes condition of high voltage also comprises auxiliary imaging optical path, for the auxiliary adjusting of surveying light transmitting light path and signal receiving light path, and the measuring position of monitoring diamond anvil 7 deformation.

Preferably, described auxiliary imaging optical path comprises lighting source 1, aperture 2, first lens 3, the first broadband spectroscope 4, the second broadband spectroscope 5, the second lens 8, feldspar mineral 9; By regulating the relative position of aperture 2, first lens 3, make the light that described lighting source 1 sends form parallel beam after small holes 2, first lens 3, then after the first broadband spectroscope 4, the second broadband spectroscope 5, by microcobjective 6, focused on the front table top of diamond anvil 7; Focal position images in feldspar mineral 9 after microcobjective 6, the second broadband spectroscope 5, the first broadband spectroscope 4, the second lens 8, the picture by feldspar mineral 9 complete observation to diamond anvil 7 front table tops; Wherein said the second broadband spectroscope 5 is positioned between microcobjective 6 and optical fiber collimator 13, and the second broadband spectroscope 5 is for the position of auxiliary adjustment optical fiber collimator 13; Described the first broadband spectroscope 4 and the second broadband spectroscope 5 medium light splitting faces are parallel to each other; The first broadband spectroscope 4 and the second broadband spectroscope 5, first lens 3, aperture 2 common optical axis, the logical optical surface of the first broadband spectroscope 4 is vertical with this optical axis; The second broadband spectroscope 5 and optical fiber collimator 13, microcobjective 6 common optical axis, the logical optical surface of the second broadband spectroscope 5 is vertical with this optical axis; The first broadband spectroscope 4 and the second lens 8, feldspar mineral 9 be common optical axis also, and this optical axis is perpendicular to the logical optical surface of the first broadband spectroscope 4.

The method of measuring diamond anvil deformation under thermal extremes condition of high voltage comprises:

Step 1: the first port of optical fiber circulator 11 is connected with the tail optical fiber of wideband light source 10, the second port of optical fiber circulator 11 is connected by the first optical patchcord 12 with optical fiber collimator 13, and the 3rd port of optical fiber circulator 11 is connected by the second optical patchcord 14 with fiber spectrometer 15;

Step 2: the position of placing diamond anvil 7 replaces with plane mirror, the illumination light by auxiliary imaging optical path is reflected mirror reflection, by after the second broadband spectroscope 5 transmissions, the position of coarse adjustment optical fiber collimator 13 and attitude; Open wideband light source 10, the attitude of fine setting optical fiber collimator 13, makes to be not less than 0.5% of wideband light source 10 output powers from the detection of optical power of optical fiber circulator 11 the 3rd port outgoing;

Step 3: add diamond anvil 7, front and back regulate the position of diamond anvil 7, make auxiliary imaging optical path can clearly observe the picture of diamond anvil 7 front table tops, and the contrast of the frequency spectrum interference signal obtaining by fiber spectrometer 15 is not less than 0.1;

Step 4: the interference spectrum data of fiber spectrometer 15 records are derived, by computing machine 16, process and obtain the one-tenth-value thickness 1/10 of diamond anvil 7 each points under High Temperature High Pressure, subtract each other with the thickness under normal temperature and pressure, obtain the deformation of diamond anvil 7 and the pattern information of table top.

Preferably, the described auxiliary imaging optical path course of work comprises:

Step 1: open lighting source 1, regulate the relative position of aperture 2, first lens 3 and lighting source 1, the illumination light that makes outgoing is directional light;

Step 2: the position and the attitude that regulate the first broadband spectroscope 4, the second broadband spectroscope 5, make the illumination light of outgoing be parallel to optical table, in the position of diamond anvil 7, place an alternative catoptron, and make this plane mirror reflecting surface perpendicular to optical axis, utilize the light reflecting back from the first broadband spectroscope 4 to regulate the second lens 8 and feldspar mineral 9;

Step 3: add microcobjective 6 between alternative catoptron and the second broadband spectroscope 5, by imaging in feldspar mineral 9, regulate position and the attitude of microcobjective 6.

In sum, owing to having adopted technique scheme, the invention has the beneficial effects as follows:

1) measure a device and method for diamond anvil deformation under thermal extremes condition of high voltage, by detection light transmitting light path, signal receiving light path, build simple light path and obtain desired signal.Wherein survey light transmitting light path and signal receiving light path some device wherein and share, can effectively reduce the device of this device, thereby improve the stability of system.

2) by signal process computer 16, receive and process the frequency spectrum interference signal of fiber spectrometer 15 outputs, calculate diamond anvil 7 at the one-tenth-value thickness 1/10 at each point place, and then analysis obtains the deformation data of diamond anvil 7 under high-temperature and high-pressure conditions.

3) through this device and method of experimental verification repeatedly can measure diamond anvil 7 under high-temperature and high-pressure conditions sub-micron to the deformation in hundreds of micrometer range, broken through the limitation of existing measuring method, possess DAC is loaded to the ability that lower sample in-situ thickness carries out refine, improve the measuring accuracy of the experiments such as resistivity measurement, pressure gradient method ionization meter and laser-ultrasound measurement.

4) through this device and method of experimental verification repeatedly, possess the ability of measurement diamond anvil 7 diamond anvil 7 table top patterns under thermal extremes condition of high voltage, thereby can original position obtain the pattern of sample under High Temperature High Pressure.

5) this measurement mechanism adopts conventional optical component to form, and is easy to debugging and operation, has larger application and promotional value.From technical scheme, set forth, reference light in this device and flashlight are respectively from the forward and backward table top of diamond anvil 7, and pass through identical path transmission to fiber spectrometer 15, it is a kind of typical common optical axis formula structure, this structure contributes to avoid the factors such as environmental temperature fluctuation, air turbulence, mechanical shock to the impact of measuring, and antijamming capability is strong.

Accompanying drawing explanation

Examples of the present invention will be described by way of reference to the accompanying drawings, wherein:

Fig. 1 is the structural representation of apparatus of the present invention.

Fig. 2 is the schematic diagram that in the present invention, reference light and flashlight produce.

Reference numeral: after 1-lighting source 2-aperture 3-first lens 4-first broadband spectroscope 5-second broadband spectroscope 6-microcobjective 7-diamond anvil 8-second lens 9-feldspar mineral (CCD) 10-wideband light source 11-optical fiber circulator 12-first optical patchcord 13-optical fiber collimator 14-the second optical patchcord 15-fiber spectrometer 16-computing machine 17-T301 stainless steel packing 18-diamond anvil, before table top 19. diamond anvils, light 21-reference light 22-flashlight is surveyed in table top 20-incident broadband.

Embodiment

Disclosed all features in this instructions, or the step in disclosed all methods or process, except mutually exclusive feature and/or step, all can combine by any way.

Disclosed arbitrary feature in this instructions (comprising any accessory claim, summary and accompanying drawing), unless narration especially all can be replaced by other equivalences or the alternative features with similar object.That is,, unless narration especially, each feature is an example in a series of equivalences or similar characteristics.

One, related description of the present invention:

1, thermal extremes condition of high voltage refers to pressure and is greater than standard atmospheric pressure, a temperature and is greater than room temperature.In quiet high pressure research field, general high voltage refers to 0GPa can reach 500GPa at present to hundreds of GPa(), high temperature refers to room temperature to several thousand degree (can reach 6000 degree at present).

2, as shown in Figure 2, two diamond anvils and T301 stainless steel packing adopt the assembling of " sandwich " formula, pushs diamond anvil and produce high pressure, by Resistant heating or LASER HEATING acquisition high temperature by special device.The present invention is under the condition all existing in High Temperature High Pressure, and the deformation of diamond anvil is measured in real time.Before diamond anvil, table top (diamond anvil culet) refers to face (the return signal light 22) (see figure 2) that diamond anvil directly contacts with T301 stainless steel packing.Table top after diamond anvil (diamond anvil back facet) refers to another face (referring back to the light 21) (see figure 2) that is parallel to front table top.

3, the course of work:

Survey the 11,13,6, the 7th in light transmitting light path, signal receiving light path, share, just optical transmission direction is different.

31), in apparatus of the present invention, the light path trend while not comprising auxiliary imaging optical path is: (in conjunction with Fig. 1,2)

311): from wideband light source 10, be followed successively by wideband light source 10, optical fiber circulator 11, optical fiber collimator 13, microcobjective 6, diamond anvil 7, produce incident broadband and survey light 20;

312): light 20 is surveyed in incident broadband, what from diamond anvil 7, table top returned is flashlight 22, what from diamond anvil 7, table top returned is reference light 21, and this two-beam is successively by microcobjective 6, optical fiber collimator 13, optical fiber circulator 11 and fiber spectrometer 15; When wherein reference light and flashlight are by fiber spectrometer 15, there is frequency spectrum interference, and record frequency spectrum interference signal by fiber spectrometer 15, frequency spectrum interference signal by 15 outputs of 16 pairs of fiber spectrometers of computing machine carries out signal processing, obtain the one-tenth-value thickness 1/10 of diamond anvil 7 under high-temperature and high-pressure conditions, and then analysis obtains deformation and the table top pattern of diamond anvil 7 under High Temperature High Pressure.

32), in apparatus of the present invention, the light path trend while comprising auxiliary imaging optical path is: (in conjunction with Fig. 1,2)

321): lighting source 1 emissive lighting light, after small holes 2, first lens 3, the first broadband spectroscope 4, the second broadband spectroscope 5, microcobjective 6, throws light on to the front table top of diamond anvil 7 successively;

22): the illuminated front table top of diamond anvil 7, successively by microcobjective 6, the second broadband spectroscope 5, the first broadband spectroscope 4, the second lens 8, image in feldspar mineral 9.

4, computing machine 16 receives and processes the interference signal of fiber spectrometer 15 output, calculates the one-tenth-value thickness 1/10 of diamond anvil 7 certain point, and then obtains the deformation of diamond anvil 7 and the detailed process of table top pattern comprises:

Step 1: the spectral distribution of wideband light source 10 is E ₀(λ) flashlight, returning from diamond anvil 7 front and back table tops, the spectral distribution E of reference light ₁(λ), E ₂(λ) can be written as:

$\left\{\begin{array}{c}{E}_1\left(\mathrm{\λ}\right)=a{E}_0\left(\mathrm{\λ}\right)e^{\mathrm{ik}(l+\mathrm{\Δ})}\\ E_2\left(\mathrm{\λ}\right)=b{E}_0\left(\mathrm{\λ}\right)e^{\mathrm{ikl}}\end{array}\right.---\left(1\right)$

Wherein a, b are constant, by the loss of surveying light transmitting light path and signal collection light path, determined, k is wave vector, l is reference light and the common light path experiencing of flashlight while entering fiber spectrometer 15, the additional optical path difference that Δ=2nh produces in the front table top reflection of diamond anvil 7 for surveying light, n is the refractive index of diamond anvil 7, and h is the thickness of diamond anvil 7;

Step 2: the frequency spectrum interference signal expression of fiber spectrometer 15 records can be written as:

$\begin{array}{c}I\left(\mathrm{\λ}\right)=[E_1\left(\mathrm{\λ}\right)+E_2\left(\mathrm{\λ}\right)]{[E_1\left(\mathrm{\λ}\right)+E_2\left(\mathrm{\λ}\right)]}^{*}\\ ={\left|E_0\left(\mathrm{\λ}\right)\right|}^2[a^2+b^2+2\mathrm{ab}\cos \left(\mathrm{k\Δ}\right)]\end{array}---\left(2\right)$

Wavelength X in formula (2) is replaced with frequency υ, and (2) formula can be written as:

$I\left(\mathrm{\υ}\right)={\left|E_0\left(\mathrm{\υ}\right)\right|}^2[a^2+b^2+2\mathrm{ab}\cos \left(2\mathrm{\π}\frac{2\mathrm{nh}}{c}\mathrm{\υ}\right)]---\left(3\right)$

Wherein c is the light velocity in vacuum;

Step 3: due to the comparatively smooth (E ideally of wideband light source 10 its frequency spectrums of selecting ₀(λ) or E ₀(υ) be constant), from (3) formula, the frequency spectrum interference signal of fiber spectrometer 15 record is a cosine function in frequency field, and its frequency is 2nh/c, and its physical significance is the transmission time difference that flashlight and reference light produce while experiencing different light paths.By (3) formula is carried out to Fourier transform, can obtain the frequency f of frequency spectrum interference signal, i.e. the thickness of f=2nh/c, so diamond anvil 7 under high-temperature and high-pressure conditions is h=fc/ (2n).Thickness during with diamond anvil 7 zero-pressure subtracts each other, and has obtained the deformation of diamond anvil 7 under high-temperature and high-pressure conditions.

Step 4: diamond anvil 7 is moved along the direction perpendicular to optical axis, obtain diamond anvil 7 table tops at thickness everywhere radially, thereby obtain the pattern of diamond anvil 7 table tops.

5, the position relationship of the first broadband spectroscope 4 and the second broadband spectroscope 5: between the first broadband spectroscope 4 and the second broadband spectroscope 5, distance is not less than 10cm, the first broadband spectroscope 4 and the second broadband spectroscope 5 medium light splitting faces are parallel to each other; The first broadband spectroscope 4 and the second broadband spectroscope 5, first lens 3, aperture 2 common optical axis, the logical optical surface of the first broadband spectroscope 4 is vertical with this optical axis; The second broadband spectroscope 5 and optical fiber collimator 13, microcobjective 6 common optical axis, the logical optical surface of the second broadband spectroscope 5 is vertical with this optical axis; The first broadband spectroscope 4 and the second lens 8, feldspar mineral 9 be common optical axis also, and this optical axis is perpendicular to the logical optical surface of the first broadband spectroscope 4.

6, microcobjective 6 operating distances are greater than 20mm, and enlargement factor is not less than 10 times.Wideband light source 10 can be common spontaneous radiation (ASE) light source, and spectrum width General Requirements is greater than 30nm, and spectrum is more smooth, and power is not less than 30mW.

Embodiment mono-:

This measures the device implementation step of diamond anvil deformation under thermal extremes high pressure:

The first step, opens lighting source 1, regulates the relative position of aperture 2, first lens 3 and lighting source 1, and the illumination light that makes outgoing is directional light;

Second step, regulate position and the attitude of the first broadband spectroscope 4, the second broadband spectroscope 5, make the illumination light of outgoing be parallel to optical table, in the position of diamond anvil 7, place an alternative plane mirror, and make it reflecting surface perpendicular to optical axis, utilize the light reflecting back from the first broadband spectroscope 4 to regulate the second lens 8 and feldspar mineral 9;

The 3rd step, adds microcobjective 6, by imaging in feldspar mineral 9, regulates the attitude of microcobjective 6;

The 4th step, optical fiber circulator 11 first ports are connected with the tail optical fiber of wideband light source 10, optical fiber circulator 11 second ports are connected by the first optical patchcord 12 with optical fiber collimator 13, and optical fiber circulator 11 the 3rd port is connected by the second optical patchcord 14 with fiber spectrometer 15;

The 5th step, utilizes replaced catoptron to reflect, by the illumination light of the second broadband spectroscope 5 transmissions, regulated the attitude of optical fiber collimator 13; Open wideband light source 10, the attitude of fine setting optical fiber collimator 13, makes to be not less than 0.5% of wideband light source 10 emergent powers from the detection of optical power of optical fiber circulator 11 the 3rd port outgoing;

The 6th step, opens fiber spectrometer 15, carries out suitable parameter setting; Add diamond anvil 7, front and back fine adjustment diamond stone is pressed the position of anvil 7, make can clearly observe by feldspar mineral 9 picture of diamond anvil 7 front table tops, and the contrast of the frequency spectrum interference signal obtaining by fiber spectrometer 15 is not less than 0.1;

The 7th step, by signal process computer 16, the interference spectrum data of fiber spectrometer 15 records are derived and calculated, detailed process is: the wavelength of interference spectrum data is converted to frequency, then carry out the repetition frequency that Fourier transform draws frequency domain interference fringe, calculate the thickness of diamond anvil 7 under High Temperature High Pressure, and further obtain the deformation of diamond anvil 7 under High Temperature High Pressure;

The 8th step, as need obtain the pattern of diamond anvil 7 table tops under High Temperature High Pressure, need along moving diamond anvil 7 perpendicular to optical axis direction, gather successively experimental data and repeat the 7th step, can obtain diamond anvil 7 in thickness distribution radially, thereby obtain the pattern of diamond anvil 7 table tops under High Temperature High Pressure.

The present invention is not limited to aforesaid embodiment.The present invention can expand to any new feature or any new combination disclosing in this manual, and the arbitrary new method disclosing or step or any new combination of process.

Claims (10)

1. measure a device for diamond anvil deformation under thermal extremes condition of high voltage, it is characterized in that comprising that surveying light launches light path, signal receiving light path and signal process computer; Described detection light transmitting light path provides broad band to survey light, and described signal receiving light path collects table top returns from diamond anvil flashlight and from the reference light that table top returns thereafter, two-beam, in the fiber spectrometer of signal receiving light path, frequency spectrum interference occurs; By computing machine, process the frequency spectrum interference signal of fiber spectrometer output, obtain the deformation of diamond anvil under thermal extremes condition of high voltage.

2. the device of measurement diamond anvil according to claim 1 deformation under thermal extremes condition of high voltage, is characterized in that described detection light transmitting light path comprises:

With the wideband light source of tail optical fiber, for sending detection light;

Optical fiber circulator,, exports from optical fiber circulator the second port the detection light of wideband light source input by optical fiber circulator the first port;

Optical fiber collimator, for the detection light of optical fiber circulator the second port output is transformed into the collimated light of free space transmission, and exports by optical fiber collimator band anti-reflection film one end;

Microcobjective, for focusing on the collimated light of optical fiber collimator output table top before diamond anvil.

3. the device of measurement diamond anvil according to claim 2 deformation under thermal extremes condition of high voltage, is characterized in that described signal receiving light path comprises:

Microcobjective, for collecting the reference light that table top returns from diamond anvil and the flashlight that table top returns from it;

Optical fiber collimator, is coupled into optical fiber for reference light and the flashlight that microcobjective is collected, and exports by optical fiber collimator band tail optical fiber one end;

Optical fiber circulator, is connected the second port of optical fiber circulator with optical fiber collimator tail optical fiber, the reference light of collecting and flashlight are exported from optical fiber circulator the 3rd port;

Fiber spectrometer, for receiving reference light and the flashlight of optical fiber circulator the 3rd port output, and records the frequency spectrum interference signal that reference light and flashlight occur in spectrum domain.

4. the device of measurement diamond anvil according to claim 3 deformation under thermal extremes condition of high voltage, it is characterized in that described computing machine receives and process the frequency spectrum interference signal of fiber spectrometer output, calculate diamond anvil at the one-tenth-value thickness 1/10 at each point place, and then analyze and to obtain the deformation data of diamond anvil under high-temperature and high-pressure conditions, detailed process comprises:

Step 1: the spectral distribution of wideband light source is E ₀(λ) flashlight, returning from diamond anvil front and back table top, the spectral distribution E of reference light ₁(λ), E ₂(λ) be written as respectively:

$\left\{\begin{array}{c}{E}_1\left(\mathrm{\λ}\right)=a{E}_0\left(\mathrm{\λ}\right)e^{\mathrm{ik}(l+\mathrm{\Δ})}\\ E_2\left(\mathrm{\λ}\right)=b{E}_0\left(\mathrm{\λ}\right)e^{\mathrm{ikl}}\end{array}\right.---\left(1\right)$

Wherein a, b are constant, by the loss of surveying light transmitting light path and signal receiving light path, determined, k is wave vector, l is reference light and the common light path experiencing of flashlight while entering fiber spectrometer, Δ=2nh is for surveying the light additional optical path difference that table top reflection produces before diamond anvil, n is the refractive index of diamond anvil, the thickness that h is diamond anvil;

Step 2: the frequency spectrum interference signal expression of fiber spectrometer record is written as:

$\begin{array}{c}I\left(\mathrm{\λ}\right)=[E_1\left(\mathrm{\λ}\right)+E_2\left(\mathrm{\λ}\right)]{[E_1\left(\mathrm{\λ}\right)+E_2\left(\mathrm{\λ}\right)]}^{*}\\ ={\left|E_0\left(\mathrm{\λ}\right)\right|}^2[a^2+b^2+2\mathrm{ab}\cos \left(\mathrm{k\Δ}\right)]\end{array}---\left(2\right)$

Wavelength X in formula (2) is replaced with frequency υ, and (2) formula is written as:

$I\left(\mathrm{\υ}\right)={\left|E_0\left(\mathrm{\υ}\right)\right|}^2[a^2+b^2+2\mathrm{ab}\cos \left(2\mathrm{\π}\frac{2\mathrm{nh}}{c}\mathrm{\υ}\right)]---\left(3\right)$

Wherein c is the light velocity in vacuum;

Step 3: from (3) formula, the frequency spectrum interference signal of fiber spectrometer record is one and is subject to E in frequency field ₀(υ) cosine function of modulation, its frequency is 2nh/c, its physical significance is the transmission time difference that flashlight and reference light produce while experiencing different light paths, therefore by (3) formula is carried out to Fourier transform, obtain the frequency f of frequency spectrum interference signal, i.e. the thickness of f=2nh/c, so diamond anvil under high-temperature and high-pressure conditions is h=fc/ (2n), thickness during with diamond anvil zero-pressure subtracts each other, and has obtained the deformation of diamond anvil under high-temperature and high-pressure conditions;

Step 4: diamond anvil, along moving perpendicular to the direction of optical axis, is obtained to diamond anvil table top at the thickness at each point place radially, thereby obtains the pattern of diamond anvil table top under High Temperature High Pressure.

5. the device of measurement diamond anvil according to claim 4 deformation under thermal extremes condition of high voltage, it is characterized in that described wideband light source is that centre wavelength is the broad spectrum light source of 1550nm, line width is not less than common spontaneous radiation (ASE) light source that 30nm or line width are not less than 30nm, and power is not less than 30mW.

6. the device of measurement diamond anvil according to claim 4 deformation under thermal extremes condition of high voltage, it is characterized in that described microcobjective operating distance is greater than 20mm, enlargement factor is not less than 10 times, and described fiber spectrometer resolution, higher than 20pm, replaces with general spectrometer.

7. according to the device of the measurement diamond anvil deformation under thermal extremes condition of high voltage one of claim 1 to 6 Suo Shu, characterized by further comprising auxiliary imaging optical path, for the auxiliary adjusting of surveying light transmitting light path and signal receiving light path, and the measuring position of monitoring diamond anvil deformation.

8. the device of measurement diamond anvil according to claim 7 deformation under thermal extremes condition of high voltage, is characterized in that described auxiliary imaging optical path comprises lighting source, aperture, first lens, the first broadband spectroscope, the second broadband spectroscope, the second lens, feldspar mineral; By regulating the relative position of aperture, first lens, make the light that described lighting source sends form parallel beam after small holes, first lens, then after the first broadband spectroscope, the second broadband spectroscope, by microcobjective, focused on before diamond anvil on table top; Focal position images in feldspar mineral after microcobjective, the second broadband spectroscope, the first broadband spectroscope, the second lens, the picture by feldspar mineral complete observation to table top before diamond anvil; Wherein said the second broadband spectroscope is positioned between microcobjective and optical fiber collimator, and the second broadband spectroscope is for the position of auxiliary adjustment optical fiber collimator; Described the first broadband spectroscope and the second broadband spectroscope medium light splitting face are parallel to each other; The first broadband spectroscope and the second broadband spectroscope, first lens, aperture common optical axis, the first spectroscopical logical optical surface in broadband is vertical with this optical axis; The second broadband spectroscope and optical fiber collimator, microcobjective common optical axis, the second spectroscopical logical optical surface in broadband is vertical with this optical axis; The first broadband spectroscope and the second lens, feldspar mineral common optical axis, and this optical axis is perpendicular to the first spectroscopical logical optical surface in broadband.

9. according to the method for the measurement diamond anvil deformation under thermal extremes condition of high voltage one of claim 1 to 8 Suo Shu, comprise:

Step 1: the first port of optical fiber circulator is connected with the tail optical fiber of wideband light source, and the second port of optical fiber circulator is connected by the first optical patchcord with optical fiber collimator, the 3rd port of optical fiber circulator is connected by the second optical patchcord with fiber spectrometer;

Step 2: the position of placing diamond anvil replaces with plane mirror, the illumination light by auxiliary imaging optical path is reflected mirror reflection, by after the second broadband spectroscope transmission, the position of coarse adjustment optical fiber collimator and attitude; Open wideband light source, the attitude of fine setting optical fiber collimator, makes to be not less than 0.5% of wideband light source output power from the detection of optical power of optical fiber circulator the 3rd port outgoing;

Step 3: add diamond anvil, front and back regulate the position of diamond anvil, make auxiliary imaging optical path can clearly observe the picture of the front table top of diamond anvil, and the contrast of the frequency spectrum interference signal obtaining by fiber spectrometer is not less than 0.1;

Step 4: the interference spectrum data of fiber spectrometer record are derived, process and obtain the one-tenth-value thickness 1/10 of diamond anvil each point under High Temperature High Pressure by computing machine, subtract each other with the thickness under normal temperature and pressure, obtain the deformation of diamond anvil and the pattern information of table top.

10. according to the method for the measurement diamond anvil deformation under thermal extremes condition of high voltage one of claim 9 Suo Shu, it is characterized in that the described auxiliary imaging optical path course of work comprises:

Step 1: open lighting source, regulate the relative position of aperture, first lens and lighting source 1, the illumination light that makes outgoing is directional light;

Step 2: regulate the first broadband spectroscope, the second spectroscopical position, broadband and attitude, make the illumination light of outgoing be parallel to optical table, in the position of diamond anvil, place an alternative plane mirror, and make this mirror reflection surface perpendicular to optical axis, utilize the light reflecting back from the first broadband spectroscope to regulate the second lens 8 and feldspar mineral;

Step 3: add microcobjective between alternative catoptron and the second broadband spectroscope, by imaging in feldspar mineral, regulate position and the attitude of microcobjective.

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