CN103643221A - Plasma device equipped with magnetic field enhancement rotation array electrodes - Google Patents
Plasma device equipped with magnetic field enhancement rotation array electrodes Download PDFInfo
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- CN103643221A CN103643221A CN201310418810.4A CN201310418810A CN103643221A CN 103643221 A CN103643221 A CN 103643221A CN 201310418810 A CN201310418810 A CN 201310418810A CN 103643221 A CN103643221 A CN 103643221A
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Abstract
The invention provides a plasma device equipped with magnetic field enhancement rotation array electrodes and belongs to the plasma physics basic and application fields. The plasma device is characterized by comprising a vacuum chamber, a discharging system and a winding system. The discharging system and the winding system are both arranged in the vacuum chamber. The discharging system comprises rotation array electrodes (2-1), radio-frequency or high-frequency power supplies (2-2), insulation blocks and plasma (2-4). Two output ends of the radio-frequency or high-frequency power supplies (2-2) are connected with the ends of the rotation array electrodes respectively. The rotation array electrodes (2-1) and the vacuum chamber (1-1) are separated by the insulation blocks (2-3). An outer magnet is located above or under the rotation electrode rollers, forms a closed magnetic loop with an inner magnet, and plasma generated from discharging is restrained. The plasma device realizes discharging to the electrode array, the array electrodes are flexible matrix rotation rollers at the same time, density of plasma is raised, discharging stability is increased, discharging interference among the rotation array electrodes is eliminated and pollution of a deposition thin film to the vacuum chamber is reduced.
Description
Technical field
The invention belongs to plasma physics basis and applied technical field, particularly a kind of plasma discharge apparatus with magnetic field enhancing rotation array electrode.
Background technology
In prior art, adopt that the plasma chemical treatment of volume-p-volume or plasma activated chemical vapour deposition exist away that film speed is slow, diffuse discharge pollution vacuum chamber, thin film deposition speed is low and the problem such as poor processing effect.Simultaneously, no matter currently used plasma discharge apparatus is the wide variety of glow-type electric discharge under vacuum state, or the corona type under atmospheric condition electric discharge, the problem such as the plasma density in ubiquity plasma slab is not high, discharge stability is poor and deposit film is inhomogeneous.How to realize plasma auxiliary chemical vapor deposition technology reaches high speed, high performance thin film preparation, reduces the density of diffuse discharge to plasma body in vacuum chamber pollution, raising plasma slab in volume-p-volume depositing operation, thereby the performance and the effect that improve plasma ion assisted deposition film are the problems receiving much attention in this area always.
Summary of the invention
The object of the present invention is to provide a kind of plasma device that magnetic field strengthens rotation array electrode that has, realization, by the region of plasma containment the action of a magnetic field between rotation array electrode, has solved production method, the mutual interference of multi-electrode electric discharge phase, the very scabrous key technical problems such as realization of settling to vacuum-chamber wall pollution, discharge stability and sedimental high rate deposition of high density plasma.
There is the plasma device that magnetic field strengthens array electrode, it is characterized in that comprising: vacuum chamber, discharge system, reel system; Wherein discharge system, reel system are all contained in vacuum chamber; Vacuum chamber is divided into 3 chambers, and vacuum chamber 1-3, vacuum chamber 1-2 divide the both sides that occupy vacuum chamber 1-1,
Vacuum chamber 1-1Shi sediment chamber, reel system comprises the fexible film unreeling in part, rolling part and sediment chamber;
The part that unreels that vacuum chamber 1-2 is reel system provides vacuum condition, unreels part and comprises flexible substrate, guide roller, break-in roller, unreels;
The rolling that vacuum chamber 1-3 is reel system partly provides vacuum condition, and winding portion is divided and comprised flexible substrate, tension control roll, intermediate roll, deviation-rectifying system and rolling;
Discharge system 2 comprises rotation array electrode 2-1, radio frequency or high frequency electric source 2-2, collets 2-3 and plasma body 2-4; Two output terminals of radio frequency or high frequency electric source 2-2 are connected respectively to rotation array electrode tip, and collets 2-3 makes rotation array electrode 2-1 and the isolation of vacuum chamber 1-1 electricity; Plasma body 2-4 between the rotation array electrode of every pair of same structure is by discharge gas 2-5, and working gas 2-6 produces jointly;
Rotation array electrode 2-1 comprises 6～10 pairs, be rotating electrode roller 2-1-1, inner magnet 2-1-2, outer magnet 2-1-3, magnetic conductance 2-1-4 and the collets of upper and lower 3～5 pairs of same structures, rotating electrode roller is by driving motor driven rotary, in rotating machine roller, introduce recirculated cooling water, control rotating electrode surface temperature;
Outer magnet 2-1-3 is positioned at rotating electrode roller 2-1-1 top or below, and inner magnet 2-1-2 forms a closed magnetic loop, the plasma body that confined discharge produces;
6～10 pairs, the rotating electrode roller of 12～20 same structures is divided into upper and lower 3～5 couples of forming array electrode 2-1, and discharge power supply 2-2 output two ends are received respectively and formed on two rotating electrode rollers of magnetic loop, produce plasma body 2-4; Every pair of rotation array electrode comprises two electrode rollers, and on the adjacent electrode roller of adjacent two pairs of electrodes, polarity of voltage is necessarily identical;
The electrical connection of collets 2-1-3 isolation rotating electrode roller and vacuum chamber 1-1; It is inner that water coolant passes into rotating electrode roller 2-1, circulates, and guarantees that rotating electrode roll surface temperature is constant;
Driving motor driven rotary electrode roller 2-1-1 rotates flexible substrate 3-1-3 is transmitted on rotating electrode roller 2-1-1; Deviation-rectifying system is that flexible substrate 3-1-3 is controlled at the transmission deviation of axial direction due.
Further, the spacing between interior outer magnet should be less than 5mm.
Concrete:
Discharge system comprises that rotation array electrode 2-1, radio frequency or high frequency electric source 2-2, collets 2-3 and plasma body 2-4 form.Two output terminals of radio frequency or high frequency electric source 2-2 are connected respectively to array electrode end, and collets 2-3 makes array electrode 2-1 and the isolation of vacuum chamber 1-1 electricity.Plasma body 2-4 is by discharge gas 2-5, and working gas 2-6 produces (seeing Fig. 1 (b)) jointly.
In Fig. 1 (b), rotation array electrode 2-1 comprises 6～10 pairs, rotating electrode roller 2-1-1, the inner magnet 2-1-2, outer magnet 2-1-3, magnetic conductance 2-1-4 and the collets that are upper and lower 3～5 pairs of same structures form, rotating machine is by external driving motor driven rotary, in rotating machine roller, introduce recirculated cooling water, control rotating electrode surface temperature.
Outer magnet 2-1-3 is positioned at rotating electrode roller 2-1-1 top or below, and inner magnet 2-1-2 forms a closed magnetic loop (seeing Fig. 2 (a)), the plasma body that confined discharge produces; The magnetic field of outer magnet 2-1-3 is produced by one group of permanent magnet, and towards cylindric rotating electrode roller surface direction, the radial direction of rotating electrode, connect according to N-S, N-S, or S-N, S-N arranges (seeing Fig. 2 (b)) mutually between each magnet; At the axial direction due of rotating electrode, between each magnet, connect according to N-S-N-S, or S-N-S-N arranges (seeing Fig. 2 (c)).Outer magnet is being just to adopt permanent magnet near rotating electrode roller surface, and other parts adopt the magnetic conductance 2-1-4 that thickness is identical to connect, and in the magnetic polarity on two electrode roller surfaces of a pair of rotating electrode roller, want contrary (seeing Fig. 2 (a)).
Inner magnet 2-1-2 is inner at rotating electrode roller, magnetic field is produced by two-way permanent magnet, between two-way magnet, angle is 120 degree, between two-way magnet, there is magnetic conductance 2-1-4 to connect, its magnetic polarity and corresponding external magnet are contrary, if outer magnetic pole is N, must be that S(is shown in Fig. 1 (b) with the polarity of the internal magnet of its correspondence).Facing to cylindric rotating electrode roller side surface, i.e. rotating electrode radial direction, magnet is according to N-S, N-S, or S-N, S-N arrange (seeing Fig. 2 (b)); At rotating electrode axial direction due, between each magnet, connect according to N-S-N-S, or S-N-S-N arrangement, as Fig. 2 (c).
Spacing between interior outer magnet should be less than 5mm, and magnet surface carries out corrosion-resistant treatments.
6～10 pairs, the rotating electrode roller of 12～20 same structures forms by conducting electricity good metal material processing, is divided into upper and lower 3～5 couples of forming array electrode 2-1, as shown in Fig. 1 (b).Discharge power supply 2-2 output two ends are received respectively and are formed on two rotating electrode rollers of magnetic loop, and high-voltage power supply is provided, and produce high density plasma 2-4.Adjacent two pairs of electrodes, on its adjacent roller, polarity of voltage is necessarily identical, prevents that between array electrode, electric discharge interference (is shown in Fig. 2 (b).
Driving motor is connected with rotating electrode roller 2-1, and driven rotary electrode roller rotates; The electrical connection of collets 2-1-3 isolation rotating electrode roller and vacuum chamber 1-1; It is inner that water coolant passes into rotating electrode roller 2-1, circulates, and guarantees that rotating electrode roll surface temperature is constant.Driving motor driven rotary electrode roller 2-1 rotates, and realizing film speed is 100～300m/min.
Reel system comprises and unreels indoor flexible film, nip rolls, tension control roll, break-in roller, driving motor; Fexible film in sediment chamber, the rotating electrode roller of each 3～5 pairs of same structures up and down; Fexible film, tension control roll, break-in roller, driving motor and deviation-rectifying system in rolling.
Driving motor driven rotary electrode roller 2-1-1 rotates flexible substrate 3-1-3 is transmitted on rotating electrode roller 2-1-1; Deviation-rectifying system is that flexible substrate 3-1-3 is controlled at the transmission deviation of axial direction due; Deviation-rectifying system is by detecting the monolateral position of flexible substrate by laser apparatus detector switch, to pick up flexible substrate position error signal, again flexible substrate position error signal is carried out to logical operation, produce electric control signal, drive outside topworks, deviation while revising the operation of coiling flexible substrate, controls flexible substrate in axial motion; Driving motor driven rotary electrode roller 2-1 rotation, guarantees that flexible substrate 3-1-3 moves between 6～10 pair array electrode 2-1, and 12～20 times through plasma body 2-4 region of discharge, front-back two-sided cvd silicon oxide film.
The technical problem solving:
A kind of plasma device that magnetic field strengthens rotation array electrode that has is provided, multipair electrode both can discharge, also can rotary transfer flexible substrate, can be by plasma containment in the action of a magnetic field region between rotation array electrode, realization is volume-p-reel plasma body assistant chemical vapor deposition nano thin-film at a high speed, electric discharge interference between the density of the interior plasma body of raising plasma slab, increase discharge stability, eliminating rotation array electrode, application performance and the effect of minimizing deposit film to the pollution of vacuum chamber, raising plasma cvd film.
The technical scheme adopting:
There is the plasma device basic structure composition that magnetic field strengthens rotation array electrode, comprise rotation array electrode 2-1, radio frequency or high frequency discharge power supply 2-2, collets 2-3, and be contained in drive in frame by the flexible parent metal of action of plasma continuously by the reel system of plasma slab.It is characterized in that: rotatable 6～10 pairs, upper and lower 3～5 pairs of metallic roll, are the delivery roll of flexible substrate transmission, are also the rotation array electrodes that produces uniform glow discharge simultaneously.They are metallic roll and are comprised of magnet, inner magnet in metallic roll forms closed magnetic loop, at region of discharge, produce the magnetic field of the electric field producing perpendicular to two electrodes, the plasma diffusion that confined discharge produces, increase electronics collision frequency, increase plasma density, reduce the electric discharge device that vacuum is polluted in plasma body disperse, realize high speed deposition or the processing of volume-p-volume nano thin-film.It is mainly that the magnetic patch molectron forming with permanent magnet forms the magnetic loop sealing that described magnetic field strengthens rotation array electrode device, and permanent magnet is fixed on corresponding supporting support; Support is contained in frame; The intensity that magnetic field enhancing device is introduced magnetic field is 10～1000mT.
Described rotation array electrode is by 6～10 pairs, upper and lower 3～5 same structures, the good metal material processing of conducting electricity forms cylinder roller.They are the delivery roll of flexible substrate transmission, are also the discharge electrodes that produces plasma body.Radio frequency or high frequency electric source 2-2 output two ends are received respectively and are formed on two rotating electrode rollers of magnetic loop, and high-voltage power supply is provided, and produce high density plasma 2-4.Adjacent two pairs of electrodes, on its electrode roller, polarity of voltage is necessarily identical, prevents that between array electrode, electric discharge is disturbed.The frequency of discharge power supply is 13.56MHz or 20kHz.
Beneficial effect:
Because the plasma body of discharge generation is constrained in the action of a magnetic field region of rotation array electrode, thus can improve the free path of electronics, the density of plasma body, reduce plasma body diffusion, reduce the pollution of settling to vacuum chamber; 6～10 pairs of rotation array electrodes can be realized the deposition to the repeatedly nano thin-film of matrix, realize the two-forty operation of plasma auxiliary chemical vapor deposition; Rotating electrode roller is simultaneously also flexible substrate delivery roll, reduced equipment complicated, reduction equipment space, reduce equipment cost; Adopt adjacent electrode polarity identical simultaneously, prevented that electric discharge between rotation array electrode from disturbing, realize rotating electrode uniform glow discharge right time.Plasma auxiliary chemical vapor deposition equipment, the gaseous fraction of reactive monomer of take is working gas, rotation array electrode discharges simultaneously and has realized plasma activated chemical vapour deposition and can run at high speed, and array electrode can be realized at a high speed volume-p-volume deposition, aggregate into the film with nanometer grade thickness at matrix surface; High and the basement membrane sticking power of described nano thin-film density large, anti-scratch strong, intercept gas molecule and water vapor permeable performance good, anti-small molecules and additive migration performance are strong, difficult drop-off; Described nano thin-film function excellence, acid and alkali-resistance, transmittance are high, are widely used field; For glow discharge device, according to plasma discharge apparatus, the difference of array electrode structure and electrode logarithm especially, discharge gas is different, can be used for to flexible substrate carry out modification, surface-functionalized or surface deposition is processed; Can improve application performance and the effect of plasma body, and speed is fast.
Accompanying drawing explanation
Fig. 1 (a) is for having the plasma device overall structure schematic diagram of magnetic field enhancing and rotation array electrode.Wherein, vacuum chamber 1-1, vacuum chamber 1-2, vacuum chamber 1-3, flexible substrate 3-1-3, unreel 3-1-4, rolling 3-1-5, guide roller 3-1-6, middle transfer roller 3-1-7, break-in roller 3-1-8, tensioning roller 3-1-9, rotation array electrode, radio frequency or high frequency electric source 2-2;
Fig. 1 (b) is rotation array electrode schematic diagram.Rotation array electrode 2-1, collets 2-3 and plasma body 2-4 form.The two ends of radio frequency or high frequency electric source 2-2 are connected respectively to array electrode end "+" and "-" electrode, and in adjacent two pairs of electrodes, the polarity of adjacent roller is necessarily identical; Collets 2-3 makes array electrode 2-1 and the isolation of vacuum chamber 1-1 electricity.Plasma body 2-4 is by discharge gas 2-5, and working gas 2-6 produces jointly.Rotation array electrode 2-1 comprises 6～10 pairs, and rotating electrode roller 2-1-1, the inner magnet 2-1-2 of upper and lower 3～5 pairs of same structures, outer magnet 2-1-3, magnetic conductance 2-1-4, collets, driving motor and recirculated cooling water form.
Fig. 2 (a) is inner magnet formation closed magnetic loop schematic perspective view.The magnetic polarity of outer magnet and inner magnet is necessarily contrary.Angle between inner magnet is 120 degree.
Fig. 2 (b) is along rotation array electrode axial direction due magnet arrangements mode, and extend and arrangement architecture schematic diagram with the axle of electrode at N-S the two poles of the earth of magnetic patch, magnet center rotational symmetry.Wherein in picture, mark 4-1 is magnetic patch group, L-magnet length, m-magnet width, δ-magnet thickness;
Fig. 2 (c) is along rotation array electrode radial direction magnet arrangements mode magnetic patch.Rotational symmetry centered by magnet is arranged with the radially extension of electrode in N-S the two poles of the earth.Wherein 4-1-magnetic patch group, L-magnet length, m-magnet width, δ-magnet thickness.
Embodiment
Fig. 1 (a) is the specific embodiment of the present invention overall structure schematic diagram.
Interior 2-1-2, outer magnetic patch 2-1-3 in the plasma discharge apparatus of described magnetic field enhancing array electrode and the structure of magnetic conductance 2-1-4 zoarium, corresponding with corresponding array electrode setted structure, as shown in Fig. 1 (b).Left and right rotating electrode roller 2-1-1 for rotating electrode roller 2-1-1, the structure of the interior 2-1-2 of its supporting correspondence, outer magnetic patch 2-1-3 and magnetic conductance 2-1-4 molectron has above or below left and right transfer roller electrode is magnetic patch molectron 2-1-3 outside cylindrical body with opening-with extending axially of rotating electrode roller, in the inner chamber of left and right rotating electrode roller, magnetic patch 2-1-2 has and forms closed magnetic loop with the corresponding molectron of outer magnetic patch 2-1-3 simultaneously;
Shown in Fig. 2, the magnetic patch row in magnetic patch molectron organizes rule and is, according to N, the tight adhesive of S the two poles of the earth principle of opposite sex attraction, file between magnetic patch, walks crosswise the alternate formula row's group of N, S together.Fig. 2 (a) is inner magnet formation closed magnetic loop schematic perspective view.The magnetic polarity of outer magnet and inner magnet is necessarily contrary.Angle between inner magnet is 120 degree.Shown in Fig. 2 (b), the N-S of each magnetic patch, N-S the two poles of the earth are longitudinal arrangement with the radially extension of electrode, the wide m of each magnetic patch in file, and the isometric L in each magnetic patch N-S the two poles of the earth in walking crosswise, the thickness of each magnetic patch is δ; Axially as shown in Fig. 2 (c), N-S-N-S the two poles of the earth of each magnetic patch are axial array with extending axially of electrode, the isometric L in each magnetic patch N-S the two poles of the earth in file, and the wide m of each magnetic patch in walking crosswise, the thickness of each magnetic patch is δ; The thickness δ of each magnetic patch equates for well, and it is L * m * δ=150 * 30 * 30mm that general magnetic patch is selected specification.
As shown in Figure 1, described in there is the plasma device that magnetic field strengthens array electrode, be a kind of plasma CVD device of vacuum glow discharge type, there is discharging vacuum chamber 1-1, discharge gas 2-5, working gas 2-6 introduces vacuum chamber.It is characterized in that: also there is roll up continuously-p-rolling of the flexible substrate of drive 3-1-3 by the mechanism of plasma slab 2-4, the base material that this mechanism has the carrying flexible substrate 3-1-3 being contained in vacuum chamber 1-1 rotates upper left rotating electrode roller, film substrate 3-1-3, through plasma discharge 2-4-1, through the transmission of bottom left rotating electrode roller traction, by entering plasma slab 2-4 after bottom left rotating electrode roller 2-1-1; Through upper right rotating electrode roller 2-1-1, flexible substrate 3-1-3 returns to and passes electrod-array 2-1 through plasma discharge 2-4-2 again, through bottom left rotating electrode roller 2-1-1-traction, transmit again, by entering plasma slab 2-4 after bottom left rotating electrode roller 2-1-1, and through right-hand rotation roller electrode through upper right rotating electrode roller 2-1-1, flexible substrate 3-1-3 returns to and passes array electrode 2-1 through plasma discharge 2-4 again.So continuous through left rotation and right rotation electrode roller, reach the deposition to the nano thin-film on carrying flexible substrate surface 12～20 times, be finally wound on wind-up roll 3-1-5.
Magnetic patch molectron in magnetic field enhancing device, extends axially with rotating electrode roller the cylindrical body being with opening for what have below above left and right transfer roller electrode 2-1-1 and territory; Working gas discharge gas 2-5,2-6 introduce mechanism, hold the encloses container that chemical monomer uses and are contained in outside vacuum chamber 1-1, and be communicated with vacuum chamber 1-1 by inlet tube; Electric discharge carrier gas 2-5 is communicated with encloses container by indirect conduit; Also have the component of other working gass of introducing as oxygen, required direct conduit is directly communicated with vacuum chamber 1-1 simultaneously; Left and right rotating electrode roller 2-1-1 connects two output terminals of radio frequency or high-frequency drive power supply 2-2 simultaneously, also can a ground connection, and another connects output terminal.To 6～10 pairs of rotation array electrodes, it is identical that adjacent two pairs of rotating electrode adjacent rollers connect electric power polarity.
In the plasma discharge apparatus with magnetic field enhancing array electrode as shown in Figure 1; described working gas is the gaseous component after the gasification of chemical monomer material; also can contain other components; as oxygen, nitrogen; after working gas electric discharge; can be at substrate surface formation of deposits functional nano protective film, as methane, acetylene, organosilicon, aluminium trimethide, zinc chloride, hexamethyldisiloxane (C
6h
18oSi
2) or tetramethyl disiloxane (C
4h
14oSi
4) etc. monomer, can enter vacuum chamber 1-1 from evaporation type or with carrier gas portable type, after electric discharge, in the fast deposition polymerization of flexible substrate surface, form the nano thin-films such as diamond, quasi-diamond, organosilicon, aluminum oxide, zinc oxide with excellent function, its thickness of this kind of film is 1～1000nm, and the transmitance of oxygen is less than to 3m1/cm
2/ 24h, to the transmitance of water vapor for being less than 3g/m
2/ 24h; Also can directly use other gases as working gas, deposition has the nano thin-film of difference in functionality characteristic, base material by effective plasma slab time-be to be discharge time 0.1～200 second; The electric discharge air pressure of vacuum chamber is 0.05～20Pa; Plasma body driving power frequency is 1KHz～13.56MHz.
The magneticstrength that magnetic field strengthens the plasma discharge apparatus introducing of array electrode is generally 10～1000mT.
The gaseous fraction that reactive monomer is introduced in carrier gas-carry in plasma CVD device enters the gas of vacuum chamber, as hydrogen, argon gas, helium, nitrogen etc.
Adopt SG-3-A type numeral Tesla meter to measure the intensity of introducing magnetic field, the middle section of measuring position between two electrodes and the surface of rotating electrode, the intensity of introducing magnetic field has certain scope.Magneticstrength too a little less than, be unfavorable for plasma containment, plasma density is low, discharge stability is poor, air pressure is high; Magneticstrength is too high, and pair roller electrode has sputter effect, affects composition and the quality of deposit film, so magneticstrength need to be in certain field region.
Take vacuum glow discharge device as example, and in conventional vacuum brightness electric discharge device, in plasma slab, the density of plasma body is 1.0 * 10
8～1.0 * 10
9/ cm
3, in vacuum glow discharge device of the present invention, in plasma slab, the density of plasma body is 1.0 * 10
10～1.0 * 10
11/ cm
3.
Described plasma slab, produces the geseous discharge region that positive and negative electric charge is equal while referring to electric discharge.
Described magnetic field strengthens plasma slab, refers to that the magnetic line of force of the device of magnetic field enhancing array electrode is mainly concentrated the plasma slab of effect, increases the running length of electronics, and the electronics that in this district, geseous discharge produces, the density of ion are equal to or greater than 1.0 * 10
10～1.0 * 10
11/ cm
3.
Described " constraint ", refer to that magnetic field retrains the positive and negative electric charge of discharge generation to concentrate in certain field region under Coulomb force effect, avoid or reduce plasma body " escaping ", and the collision frequency of particle in geseous discharge is had to the effect of enhancing, thereby improve the density of plasma body in plasma slab.
Described rotating electrode roller, refers to and can active rotation transport flexible substrate, is again that electrode produces plasma discharge.
Described array electrode, refers to that electrode logarithm is greater than more than 2 pairs, can produce uniform glow discharge simultaneously.
Described electric discharge is disturbed, and refers at electrode logarithm and is greater than more than 2, and between adjacent two pairs of electrode rollers, do not produce electric discharge, its electric polarity is identical, current potential is identical.
Claims (2)
1. there is the plasma device that magnetic field strengthens array electrode, it is characterized in that comprising: vacuum chamber, discharge system, reel system; Wherein discharge system, reel system are all contained in vacuum chamber; Vacuum chamber is divided into 3 chambers, and vacuum chamber (1-3), vacuum chamber (1-2) minute occupy the both sides of vacuum chamber (1-1),
Vacuum chamber (1-1) is sediment chamber, and reel system comprises the fexible film unreeling in part, rolling part and sediment chamber;
The part that unreels that vacuum chamber (1-2) is reel system provides vacuum condition, unreels part and comprises flexible substrate, guide roller, break-in roller, unreels;
The rolling that vacuum chamber (1-3) is reel system partly provides vacuum condition, and winding portion is divided and comprised flexible substrate, tension control roll, intermediate roll, deviation-rectifying system and rolling;
Discharge system comprises rotation array electrode (2-1), radio frequency or high frequency electric source (2-2), collets (2-3) and plasma body (2-4); Two output terminals of radio frequency or high frequency electric source (2-2) are connected respectively to rotation array electrode tip, and collets (2-3) make rotation array electrode (2-1) and the isolation of vacuum chamber (1-1) electricity; Plasma body between the rotation array electrode of every pair of same structure is by discharge gas (2-5), and working gas (2-6) produces jointly;
Rotation array electrode comprises 6～10 pairs, be rotating electrode roller, inner magnet, outer magnet, magnetic conductance and the collets of upper and lower 3～5 pairs of same structures, rotating electrode roller, by driving motor driven rotary, is introduced recirculated cooling water in rotating machine roller, control rotating electrode surface temperature;
Outer magnet is positioned at above or below rotating electrode roller, and inner magnet forms a closed magnetic loop, the plasma body that confined discharge produces;
Discharge power supply output two ends are received respectively and are formed on two rotating electrode rollers of magnetic loop, produce plasma body; Every pair of rotation array electrode comprises two electrode rollers, and on the adjacent electrode roller of adjacent two pairs of electrodes, polarity of voltage is necessarily identical;
Driving motor driven rotary electrode roller rotates flexible substrate is transmitted on rotating electrode roller; Deviation-rectifying system is that flexible substrate is controlled at the transmission deviation of axial direction due.
2. the plasma device with magnetic field enhancing array electrode according to claim 1, is characterized in that: the spacing between interior outer magnet should be less than 5mm.
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| CN107683632A (en) * | 2015-06-04 | 2018-02-09 | 希尔德斯海姆霍尔茨明登哥廷根应用科学和艺术大学 | Equipment for especially strap-like objects to be carried out with plasma treatment |
| CN107683632B (en) * | 2015-06-04 | 2021-02-19 | 希尔德斯海姆霍尔茨明登哥廷根应用科学和艺术大学 | Device for plasma treatment of especially strip-shaped objects |
| CN106890552A (en) * | 2017-03-13 | 2017-06-27 | 苏州盟力环境科技有限公司 | A kind of plasma gas processing unit |
| CN107217241A (en) * | 2017-08-03 | 2017-09-29 | 肇庆市科润真空设备有限公司 | Reinforced graphite alkene coating thin film device and method based on PECVD |
| CN107815661A (en) * | 2017-12-11 | 2018-03-20 | 陈立国 | Circular Magnetic electrode device and the takeup type surface modifying apparatus for including it |
| CN108655115A (en) * | 2018-06-01 | 2018-10-16 | 江阴瑞兴科技有限公司 | A kind of continuous feeding/discharging type plasma cleaning equipment |
| CN114910851A (en) * | 2021-02-10 | 2022-08-16 | 清华大学 | Diode-based nonlinear response MRI (magnetic resonance imaging) image enhancement super-structure surface device |
| CN114910851B (en) * | 2021-02-10 | 2024-04-26 | 清华大学 | Diode-based nonlinear response MRI image enhanced super-structured surface device |
| CN114653960A (en) * | 2022-03-31 | 2022-06-24 | 四川真火等离子研究院有限公司 | Method for preparing superfine high-purity spherical titanium powder by magnetizing radio frequency plasma |
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| CN103643221B (en) | 2015-10-28 |
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