CN201066954Y - Plasm device with magnetic field enhancing device - Google Patents
Plasm device with magnetic field enhancing device Download PDFInfo
- Publication number
- CN201066954Y CN201066954Y CNU2007201699254U CN200720169925U CN201066954Y CN 201066954 Y CN201066954 Y CN 201066954Y CN U2007201699254 U CNU2007201699254 U CN U2007201699254U CN 200720169925 U CN200720169925 U CN 200720169925U CN 201066954 Y CN201066954 Y CN 201066954Y
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- Prior art keywords
- magnetic patch
- electrode
- plasma
- magnetic field
- transfer roller
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E30/00—Energy generation of nuclear origin
- Y02E30/10—Nuclear fusion reactors
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- Chemical Vapour Deposition (AREA)
Abstract
The utility model provides a plasma device with a magnetic field strengthening device, which belongs to a plasma application field and is used to improve the density of plasma in a plasma region. The plasmas are restricted in a certain magnetic field through the magnetic field strengthening device which is a magnet block array (12) formed by a permanent magnet matching with the structure of an electrode. The intensity of an introducing magnetic field is 10 to 1000 Mt. In a plasma chemical vapor deposition device which is suitable for the continuous winding technique of a substrate material, the magnet block array (12) consists of an external magnet block array (13) and an internal magnet block array (14) which are corresponded with a left rotating roller electrode (2) and a right rotating roller electrode (3). The good effects the utility model are: the utility model can be used for the plasma chemical vapor deposition to polymerize a manometer-level functional protective film by the deposition on the surface of the substrate material which is of high density and good barrier property; the utility model can be used in an atmospheric discharging device to operate a material modification treatment and a material surface modification treatment, which can increase the application performance and effect of the plasma and is of high speed.
Description
Technical field
The utility model belongs to plasma applicating technology field, relates to a kind of plasma device with magnetic field intensifier.
Background technology
In the prior art, no matter plasma device is the glow discharge type under the vacuum state, or the anti-electric type of the corona under the atmospheric condition, the problem that the plasma density in the ubiquity plasma slab is not high.How to improve the density of plasma in the plasma slab, thereby improve the application performance and the effect of plasma, be the problem that receives much attention in this area always.
Summary of the invention
The technical problem that solves:
A kind of plasma device with magnetic field intensifier is provided, can with plasma confinement in certain field region, improves the density of plasma in the plasma slab, thereby improve the application performance and the effect of plasma.
The technical scheme that adopts:
Plasma device with magnetic field intensifier, basic structure with plasma device is formed, comprise driving power, electrode and frame, and be contained on the frame drive by the base material of action of plasma continuously or the mechanism of batch (-type) by plasma slab, it is characterized in that: also having can be with plasma confinement in certain field region, improve the magnetic field intensifier of plasma density in the plasma slab, described magnetic field intensifier mainly is the magnetic patch assembly of forming with permanent magnet, and be fixed on the corresponding supporting support, support is contained on the frame; The intensity that the magnetic field intensifier is introduced magnetic field is 10～1000mT.
Beneficial effect:
Because plasma is constrained in certain field region, thereby can improve the density of plasma in the plasma slab; Be used for vacuum electric-discharge device, install as plasma activated chemical vapour deposition (PECVD), gas component with chemical monomer is a working gas, can become to have the nano thin-film of nanometer grade thickness at the substrate surface deposition polymerization, described nano thin-film density height, to intercept the gas molecule performance good, difficult drop-off, described nano thin-film function excellence is widely used; Be used for the atmospheric discharge device, according to plasma device, especially the difference of discharge electrode structure can be used for the modification of material is handled, and perhaps is used for the modification of body surface is handled; Can improve the application performance and the effect of plasma, and speed is fast.
Description of drawings
Fig. 1, has the plasma device general structure schematic diagram of magnetic field intensifier;
Fig. 2, with the structural representation of the supporting corresponding arcuation magnetic patch assembly 12 of camber electrode;
Fig. 3, with the structural representation of the supporting corresponding tabular magnetic patch assembly 12 of flat pole;
The magnetic patch row of Fig. 4, magnetic patch assembly 12 organizes structural representation,
(a) vertically arrange with the longitudinal extension of electrode at N-S the two poles of the earth of magnetic patch;
(b) N-S the two poles of the earth of magnetic patch are transversely arranged with the horizontal expansion of electrode;
Embodiment
Further auspiciously in conjunction with the accompanying drawings add explanation;
The structure of the magnetic patch assembly 12 in the intensifier of described magnetic field is, corresponding with the corresponding electrode setted structure, as shown in Figure 1, left and right transfer roller electrode 2,3 for transfer roller shape electrode type, the magnetic patch assembly 12 of its supporting correspondence for above left and right transfer roller electrode 2,3 and/or below have be the cylindrical body of being with opening with extending axially of transfer roller electrode---promptly outside magnetic patch assembly 13, in the inner chamber of left and right transfer roller electrode 2,3, have simultaneously with outside magnetic patch assembly 13 corresponding in magnetic patch assembly 14; Perhaps as shown in Figure 2, upper and lower camber electrode 22,23 for the arcuation electrode type, the magnetic patch assembly 12 of its supporting correspondence is an arcuation magnetic patch assembly 24 on the last camber electrode 22, and the following arcuation magnetic patch assembly 25 under camber electrode 23 down; Perhaps as shown in Figure 3, upper and lower flat pole 26,27 for the planar electrode type, the magnetic patch assembly 12 of its supporting correspondence is the upper flat plate shape magnetic patch assembly 28 on upper flat plate type electrode 26, and the following tabular magnetic patch assembly 29 under following flat pole 27; The stain accumulation regions is shown plasma slab 4 among the figure.
As shown in Figure 4, the magnetic patch row in the magnetic patch assembly 12 organizes rule and is, walks crosswise the alternate formula row's group of N, S together according to N, the tight adhesive of S the two poles of the earth principle of opposite sex attraction, file between magnetic patch; Shown in Fig. 4 (a), N-S the two poles of the earth of each magnetic patch are extended with vertical (direction shown in the O-O ' among the figure) of electrode and are vertically arranged, the wide m of each magnetic patch in the file, and each isometric L in magnetic patch N-S the two poles of the earth in walking crosswise, the thickness of each magnetic patch are δ; Perhaps shown in Fig. 4 (b), N-S the two poles of the earth of each magnetic patch are transversely arranged with horizontal (direction shown in the S-S ' among the figure) extension of electrode, each isometric L in magnetic patch N-S the two poles of the earth in the file, and the wide m of each magnetic patch in walking crosswise, the thickness of each magnetic patch are δ; The thickness δ of each magnetic patch equates for well, and generally to select specification for use be L * m * δ=100 * 50 * 20mm to magnetic patch.
As shown in Figure 1, described plasma device with magnetic field intensifier, plasma activated chemical vapour deposition (PECVD) device for the vacuum glow discharge type, has vacuum chamber 1, working gas is introduced mechanism, it is characterized in that: also have the mechanism of drive fexible film base material continuous reeling formula by plasma slab, this mechanism has the base material transfer roller 6 that is contained in the bearing film base material 5 outside the vacuum chamber 1, film substrate 5, transfer roller 8 in the middle of No. 1, and enter vacuum chamber 1 through left-hand rotation roller electrode 2 tractions, by going out vacuum chamber 1 behind the plasma slab 4, then through returning and pass vacuum chamber 1 once more behind the transfer roller 9 in the middle of the 2#, afterwards, enter vacuum chamber 1 once more again through No. 3 middle transfer rollers 10, and through right-hand rotation roller electrode 3 tractions, and once more by going out vacuum chamber 1 behind the plasma slab 4 again, transfer roller 11 in the middle of No. 4 is wound on the finished product transfer roller 7 at last again; Magnetic patch assembly 12 in the intensifier of magnetic field, for above left and right transfer roller electrode 2,3 and/or below have extend axially with the transfer roller electrode and be the cylindrical body of being with opening---promptly outside magnetic patch assembly 13, in the inner chamber of left and right transfer roller electrode 2,3, have simultaneously with outside magnetic patch assembly 13 corresponding in magnetic patch assembly 14, outward, interior magnetic patch assembly 13,14 respectively row group be fixed on corresponding supporting outer, the inner support 15,16, outer, inner support 15,16 all is contained on the frame; Working gas is introduced mechanism, holds the closed container 17 that chemical monomer uses and is contained in outside the vacuum chamber 1, and be communicated with vacuum chamber 1 by inlet tube 18; Carrier gas then is communicated with closed container 17 by indirect conduit 19, also has the required direct conduit 20 of component (as oxygen) of introducing other working gass simultaneously and directly is communicated with vacuum chamber 1; Left and right transfer roller electrode 2,3 can connect two outputs of driving power 21 simultaneously, also can a ground connection, and another connects output, and left and right transfer roller electrode 2,3 also can be that two covers or many covers are parallel; Film substrate 5 is travelled to and fro between the path that vacuum chamber 1 reaches by plasma slab 4, can adjust by the quantity of transfer roller in the middle of adjusting and the installation site on frame.
In the plasma CVD device as shown in Figure 1 with magnetic field intensifier; described working gas is the gaseous component after the chemical monomer material gasification; also can contain other components; as oxygen; after the working gas discharge; can form the function nano protective film in the substrate surface deposition, as organic chemistry of silicones monomer, HMDO (C
6H
18OSi
2) or tetramethyl disiloxane (C
4H
14OSi
4), can enter vacuum chamber 1 from evaporation type or with the carrier gas portable type, discharge back forms the organic silicon nano film with excellent function in the surperficial fast deposition polymerization of film substrate 5, and its thickness of this kind film is 1～1000nm, to the transmitance of oxygen less than 50ml/cm
2/ 24h is less than 10g/m to the transmitance of water vapour
2/ 24h; Also can directly use other gases as working gas, the nano thin-film that deposition has the difference in functionality characteristic, base material is by the time of effective plasma slab---and be to be discharge time 2～200 seconds; The discharge air pressure of vacuum chamber is 0.05～20Pa; Plasma driving power frequency is 1KHZ～13.56MHZ.
The magnetic field intensity that the magnetic field intensifier is introduced is generally 50～500mT.
Carrier gas---promptly in plasma CVD device, carry the gas that the gas component of introducing chemical monomer enters vacuum chamber, as argon gas, helium.
Measure the intensity of introducing magnetic field with SG-3-A type numeral teslameter, the middle section of measuring position between two electrodes, the intensity of introducing magnetic field is high more, then helps the intensity of enhanced discharge more, help the generation of plasma, and help plasma confinement in certain field region.
With the vacuum glow discharge device is example, and the conventional vacuum brightness is put in the electric discharge device, and the density of plasma is 1.0 * 10 in the plasma slab
8～1.0 * 10
9/ cm
3, in the vacuum glow discharge device of the present invention, the density of plasma is 1.0 * 10 in the plasma slab
10～1.0 * 10
11/ cm
3
Described plasma slab is meant the gas discharge zone that the positive and negative electric charge of discharge generation equates.
Described effective plasma slab is meant that the magnetic force of magnetic field intensifier is mainly concentrated the plasma slab of effect, and the electronics that gas discharge produces in this district, the density of ion are equal to or greater than 1.0 * 10
10～1.0 * 10
11/ cm
3
Described " constraint ", be meant that magnetic field concentrates on the positive and negative electric charge constraint of discharge generation in certain field region, avoid or reduce plasma " escaping ", and gas discharge is had the effect of enhancing, thereby improve the density of plasma in the plasma slab.
Claims (5)
1. the plasma device that has the magnetic field intensifier, basic structure with plasma device is formed, comprise driving power, electrode and frame, and be contained on the frame drive by the base material of action of plasma continuously or the mechanism of batch (-type) by plasma slab, it is characterized in that: also having can be with plasma confinement in certain field region, improve the magnetic field intensifier of plasma density in the plasma slab, described magnetic field intensifier mainly is the magnetic patch assembly of forming with permanent magnet, and be fixed on the corresponding supporting support, support is contained on the frame; The intensity that the magnetic field intensifier is introduced magnetic field is 10～1000mT.
2. the plasma device with magnetic field intensifier according to claim 1, it is characterized in that: the structure of magnetic patch assembly (12) is, corresponding with the corresponding electrode setted structure, left side to transfer roller shape electrode type, right-hand rotation roller electrode (2), (3), the magnetic patch assembly (12) of its supporting correspondence is on a left side, right-hand rotation roller electrode (2), (3) top and/or below have is the cylindrical body of being with opening---promptly outer magnetic patch assembly (13) with extending axially of transfer roller electrode, simultaneously on a left side, right-hand rotation roller electrode (2), (3) have in the inner chamber and the corresponding interior magnetic patch assembly (14) of outer magnetic patch assembly (13); Upper and lower camber electrode (22), (23) for the arcuation electrode type, the magnetic patch assembly (12) of its supporting correspondence is the last arcuation magnetic patch assembly (24) on last camber electrode (22), and the following arcuation magnetic patch assembly (25) under following camber electrode (23); Upper and lower flat pole (26), (27) for the planar electrode type, the magnetic patch assembly (12) of its supporting correspondence is the upper flat plate shape magnetic patch assembly (28) on upper flat plate type electrode (26), and the following tabular magnetic patch assembly (29) under following flat pole (27).
3. the plasma device with magnetic field intensifier according to claim 2, it is characterized in that: the magnetic patch row during the magnetic patch combination is complete organizes rule and is, walks crosswise the alternate formula row's group of N, S together according to N, the tight adhesive of S the two poles of the earth principle of opposite sex attraction, file between magnetic patch; Vertically arrange with the longitudinal extension of electrode at N-S the two poles of the earth of each magnetic patch, each magnetic patch wide (m) in the file, and each magnetic patch N-S the two poles of the earth isometric (L) in walking crosswise, the thickness of each magnetic patch is (δ); Perhaps, N-S the two poles of the earth of each magnetic patch are transversely arranged with the horizontal expansion of electrode, each magnetic patch N-S the two poles of the earth isometric (L) in the file, and each magnetic patch wide (m) in walking crosswise, the thickness of each magnetic patch is (δ).
4. the plasma device with magnetic field intensifier according to claim 1, plasma CVD device for the vacuum glow discharge type, has vacuum chamber (1), working gas is introduced mechanism, it is characterized in that: also have the mechanism of drive fexible film base material continuous reeling formula by plasma slab, this mechanism has the base material transfer roller (6) that is contained in the outer bearing film base material (5) of vacuum chamber (1), film substrate (5), transfer roller (8) in the middle of No. 1, and enter vacuum chamber (1) through left-hand rotation roller electrode (2) traction, by going out vacuum chamber (1) behind the plasma slab (4), then through returning and pass vacuum chamber (1) once more behind the transfer roller (9) in the middle of No. 2, afterwards, again through No. 3 middle transfer rollers (10), and enter vacuum chamber (1) once more through right-hand rotation roller electrode (3) traction, and once more by going out vacuum chamber (1) behind the plasma slab (4) again, transfer roller (11) in the middle of No. 4 is wound on the finished product transfer roller (7) at last again; Magnetic patch assembly (12) in the intensifier of magnetic field, for extending axially with the transfer roller electrode of having in the top of left and right transfer roller electrode (2), (3) and/or below is the cylindrical body of being with opening---promptly outside magnetic patch assembly (13), in the inner chamber of left and right transfer roller electrode (2), (3), have simultaneously with outside magnetic patch assembly (13) corresponding in magnetic patch assembly (14), outward, interior magnetic patch assembly (13), (14) respectively row's group be fixed on corresponding supporting outer, inner support (15), (16), outer, inner support (15), (16) all are contained on the frame; Working gas is introduced mechanism, holds the closed container (17) that chemical monomer uses and is contained in outside the vacuum chamber (1), and be communicated with vacuum chamber (1) by inlet tube (18); Carrier gas then is communicated with closed container (17) by indirect conduit (19), also has the required direct conduit (20) of other working gas components of introducing simultaneously and directly is communicated with vacuum chamber (1); Left and right transfer roller electrode (2), (3) can connect two outputs of driving power (21) simultaneously, also can ground connection, and another connects output, and left and right transfer roller electrode (2), (3) they also can be that two covers or many covers are parallel; Film substrate (5) is travelled to and fro between vacuum chamber (1) and is reached the path of passing through plasma slab (4), can adjust by the quantity of transfer roller in the middle of adjusting and the installation site on frame.
5. the plasma device with magnetic field intensifier according to claim 4, it is characterized in that: the magnetic patch row during the magnetic patch combination is complete organizes rule and is, walks crosswise the alternate formula row's group of N, S together according to N, the tight adhesive of S the two poles of the earth principle of opposite sex attraction, file between magnetic patch; Vertically arrange with the longitudinal extension of electrode at N-S the two poles of the earth of each magnetic patch, each magnetic patch wide (m) in the file, and each magnetic patch N-S the two poles of the earth isometric (L) in walking crosswise, the thickness of each magnetic patch is (δ); Perhaps, N-S the two poles of the earth of each magnetic patch are transversely arranged with the horizontal expansion of electrode, each magnetic patch N-S the two poles of the earth isometric (L) in the file, and each magnetic patch wide (m) in walking crosswise, the thickness of each magnetic patch is (δ).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU2007201699254U CN201066954Y (en) | 2007-07-27 | 2007-07-27 | Plasm device with magnetic field enhancing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU2007201699254U CN201066954Y (en) | 2007-07-27 | 2007-07-27 | Plasm device with magnetic field enhancing device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201066954Y true CN201066954Y (en) | 2008-05-28 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNU2007201699254U Expired - Fee Related CN201066954Y (en) | 2007-07-27 | 2007-07-27 | Plasm device with magnetic field enhancing device |
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| CN (1) | CN201066954Y (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102497717A (en) * | 2011-11-25 | 2012-06-13 | 北京大学 | Magnet used for plasma device and plasma device |
| CN102575349A (en) * | 2009-10-05 | 2012-07-11 | 株式会社神户制钢所 | Plasma CVD device |
| CN103741121A (en) * | 2013-12-24 | 2014-04-23 | 北京北印东源新材料科技有限公司 | Double-sided coating device for soft base material |
| CN107217241A (en) * | 2017-08-03 | 2017-09-29 | 肇庆市科润真空设备有限公司 | Reinforced graphite alkene coating thin film device and method based on PECVD |
| CN107533039A (en) * | 2015-03-06 | 2018-01-02 | 机械解析有限公司 | The photoionization detector based on electric discharge for gas chromatography system |
| CN109104806A (en) * | 2018-09-21 | 2018-12-28 | 中国人民解放军军事科学院国防工程研究院 | A kind of device and method of magnetic field control plasma |
-
2007
- 2007-07-27 CN CNU2007201699254U patent/CN201066954Y/en not_active Expired - Fee Related
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102575349A (en) * | 2009-10-05 | 2012-07-11 | 株式会社神户制钢所 | Plasma CVD device |
| CN102575349B (en) * | 2009-10-05 | 2014-03-05 | 株式会社神户制钢所 | Plasma CVD device |
| CN102497717A (en) * | 2011-11-25 | 2012-06-13 | 北京大学 | Magnet used for plasma device and plasma device |
| CN103741121A (en) * | 2013-12-24 | 2014-04-23 | 北京北印东源新材料科技有限公司 | Double-sided coating device for soft base material |
| CN107533039A (en) * | 2015-03-06 | 2018-01-02 | 机械解析有限公司 | The photoionization detector based on electric discharge for gas chromatography system |
| CN107217241A (en) * | 2017-08-03 | 2017-09-29 | 肇庆市科润真空设备有限公司 | Reinforced graphite alkene coating thin film device and method based on PECVD |
| CN109104806A (en) * | 2018-09-21 | 2018-12-28 | 中国人民解放军军事科学院国防工程研究院 | A kind of device and method of magnetic field control plasma |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20080528 Termination date: 20110727 |