CN103576468B - A kind of exposure sources and baffle plate control method thereof - Google Patents
A kind of exposure sources and baffle plate control method thereof Download PDFInfo
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- CN103576468B CN103576468B CN201210285757.0A CN201210285757A CN103576468B CN 103576468 B CN103576468 B CN 103576468B CN 201210285757 A CN201210285757 A CN 201210285757A CN 103576468 B CN103576468 B CN 103576468B
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Abstract
The present invention discloses a kind of exposure sources and baffle plate control method thereof, this exposure sources comprises: be provided with transmitter and receiver baffle plate and flapper actuator, and baffle plate and flapper actuator are used for and have the substrate organizing induction point more and coordinate the position automatically determining baffle plate.This control method comprises: baffle plate and flapper actuator with there is the substrate organizing induction point more coordinate the position automatically determining baffle plate; Baffle plate is provided with transmitter and receiver, and wherein, transmitter emission detection signal is on substrate; Receiver gathers the reflected signal of induction point reflection on substrate, and forms electric signal according to the light signal of described reflected signal; Flapper actuator is according to the position of described electric signal determination baffle plate.According to technical scheme of the present invention, this exposure sources can determine the position of baffle plate automatically, improves measuring accuracy, reduces test technology complexity.
Description
Technical field
The present invention relates to the exposure technique in liquid crystal display preparation, particularly relate to a kind of exposure sources and baffle plate control method thereof.
Background technology
At Thin Film Transistor (TFT) (TFT-LCD, ThinFilmTransistor-LiquidCrystalDisplay) in production run, utilize exposure machine and various types of mask plate, various different figure can be formed on substrate, as signal wire, gate line, raceway groove, via hole etc.Baffle plate is a core component in exposure machine.Adopt prior art, current baffle position, all need to utilize and manually first carry out under the microscope measuring and determining, and then carry out manual correction on exposure machine.Adopt existing manual type determination baffle position and out of true and technique relative complex.
Summary of the invention
In view of this, fundamental purpose of the present invention is to provide a kind of exposure sources and baffle plate control method thereof, automatically can determine baffle position.
For achieving the above object, technical scheme of the present invention is achieved in that
A kind of exposure sources, this exposure sources comprises baffle plate and flapper actuator, and described baffle plate and flapper actuator are used for and have many substrates organize induction point and coordinates the position automatically determining baffle plate, and described induction point of organizing lays respectively at side, exposure region more; Wherein, described baffle plate is provided with transmitter and receiver,
Described transmitter, for emission detection signal to substrate;
Described receiver, for gathering the reflected signal of induction point reflection on substrate, and forms electric signal according to the light signal of described reflected signal;
Described flapper actuator, for the position according to described electric signal determination baffle plate.
Wherein, described receiver comprises optical fiber probe, for gathering the reflected signal of induction point reflection on substrate.
Wherein, described transmitter and described receiver are positioned at the heteropleural of described baffle plate, and described transmitter is positioned at described baffle-panels to described substrate side, and described receiver is positioned at described baffle plate to described mask plate side.
Wherein, described flapper actuator, is further used for having or nothing according to described electric signal, determines the position of baffle plate.
Wherein, described flapper actuator, is further used for the peak value size variation according to described electric signal, determines the position of baffle plate.
A baffle plate control method for exposure sources, the method comprises: baffle plate and flapper actuator with there is the substrate organizing induction point more coordinate the position automatically determining baffle plate; Baffle plate is provided with transmitter and receiver, wherein,
Transmitter emission detection signal is on substrate;
Receiver gathers the reflected signal of induction point reflection on substrate, and forms electric signal according to the light signal of described reflected signal;
Flapper actuator is according to the position of described electric signal determination baffle plate.
Wherein, described flapper actuator specifically comprises according to the position of described electric signal determination baffle plate:
Having or nothing according to described electric signal, determines the position of baffle plate.
Wherein, described flapper actuator specifically comprises according to the position of described electric signal determination baffle plate:
According to the peak value size variation of described electric signal, determine the position of baffle plate.
Exposure sources provided by the invention and baffle plate control method thereof, baffle plate and flapper actuator are used for and have many substrates organize induction point and coordinates the position automatically determining baffle plate, organize induction point more and lay respectively at side, exposure region.Wherein, baffle plate is provided with transmitter and receiver, and transmitter emission detection signal is on substrate; Receiver for gathering the reflected signal of induction point reflection on substrate, and forms electric signal according to the light signal of reflected signal; Flapper actuator is according to the position of electric signal determination baffle plate.Adopt the present invention, owing to can control movement or the stopping of baffle plate, thus automatically determine baffle position, compared with the mode manually determining baffle position with prior art, not only test accurately and greatly reduce the complexity of test technology, saves manpower consumption.
Accompanying drawing explanation
Fig. 1 is that the present invention is provided with the baffle plate of transmitter and receiver and the position relationship exemplary plot of substrate, flapper actuator and mask plate;
Fig. 2 is the pictorial diagram of film after first time exposure-processed of substrate in the present invention;
Fig. 3 to Fig. 6 is the pictorial diagram of film after several times exposure-processed of substrate in the present invention.
Description of reference numerals:
101: transmitter 102: receiver
103: flapper actuator 104: baffle plate
105: substrate 106: mask plate 107: product to be exposed
Embodiment
Below by drawings and the specific embodiments, the present invention is described in further detail again.
As shown in Figure 1, this exposure sources comprises: the baffle plate 104 being provided with transmitter 101 and receiver 102, flapper actuator 103; Wherein, baffle plate 104 and flapper actuator 103 with the use of, for there is many substrates 105 organize induction point coordinate the position automatically determining baffle plate, described induction point of organizing lays respectively at side, exposure region more.
Transmitter 101, is exposed product 107 for emission detection signal to substrate 105;
Receiver 102, for gathering the reflected signal of induction point reflection on substrate 105, and forms electric signal according to the light signal of described reflected signal;
Flapper actuator 103, for the position according to described electric signal determination baffle plate.
Here, receiver 102 comprises optical fiber probe, for gathering the reflected signal of induction point reflection on substrate.
Here, transmitter 101 and receiver 102 are positioned at the heteropleural of baffle plate 104, and transmitter 101 is positioned at baffle plate 104 towards substrate 105 side, and receiver 102 is positioned at baffle plate 104 to mask plate 106 side.
Here, flapper actuator 103, is further used for having or nothing according to electric signal, determines the position of baffle plate.
Here, flapper actuator 103, is further used for the peak value size variation according to electric signal, determines the position of baffle plate.
A baffle plate control method for exposure sources, the method comprises: baffle plate and flapper actuator with there is the substrate organizing induction point more coordinate the position automatically determining baffle plate; Baffle plate is provided with transmitter and receiver, wherein,
Transmitter emission detection signal is on substrate;
Receiver gathers the reflected signal of induction point reflection on substrate, and forms electric signal according to the light signal of described reflected signal;
Flapper actuator is according to the position of described electric signal determination baffle plate.
Here, flapper actuator specifically comprises according to the position of described electric signal determination baffle plate: having or nothing according to described electric signal, determines the position of baffle plate.
Here, flapper actuator specifically comprises according to the position of described electric signal determination baffle plate: according to the peak value size variation of described electric signal, determine the position of baffle plate.
Below, be that the situation of ultraviolet light is specifically set forth with detectable signal.
In the present invention, mercury lamp emission ultraviolet light in transmitter 101, when this ultraviolet light incides on the film of substrate 105, ultraviolet light is after the reflection of substrate 105, reflected light can be received the optical fiber probe stretched out in device 102 and gathered, optical fiber probe gathers after the reflected light of induction point reflection on substrate 105, and forms electric signal according to the light signal of reflected light, and flapper actuator 103 is according to the position of described electric signal determination baffle plate.
As shown in Figure 2, baffle plate 104 is positioned at the surrounding (being positioned at four positions up and down of mask plate 106) of mask plate 106, that is, when exposing, and corresponding 4 baffle plates of mask plate.
Utilize the cooperation of above-mentioned exposure sources and mask plate and substrate, figure can be formed on the film of substrate, and while formation figure, automatically determine the position of baffle plate, concrete:
When 1, making first layer metal figure (being exposed the fundamental figure of product) that be exposed on product on the film of substrate, because first layer metal figure is metal entirely, do not form any figure, therefore exposure area can not be determined according to reflected light, can only manually carry out under the microscope measuring and regulate to determine exposure area, after first time exposure-processed, the film of substrate is formed figure as shown in Figure 3.
2, when making other layer pattern be exposed on product, due to the film of substrate being formed with the figure shown in Fig. 3, therefore exposure sources can determine the position of baffle plate automatically according to reflected light; Concrete:
Scheme one: as shown in Figure 2, four baffle plates 104 can be moved by the circumferential mask plate 106 of mask plate 106 4 in the direction of arrows, and the transmitter 101 simultaneously in exposure sources is to substrate 105 emitting ultraviolet light; When baffle plate 104 moves to first induction point to mask plate 106, the light signal according to the reflected light received obtains electric signal; Flapper actuator 103 can be determined now to occur first Current maxima according to this electric signal, therefore can determine that baffle plate 104 is the positions being positioned at first induction point, flapper actuator 103 sends feedback signal to baffle plate 104, and baffle plate 104 stops mobile after receiving feedback signal; Utilize exposure sources on the film of substrate 105, form figure as shown in Figure 4, in Fig. 4, four limits of black heavy line square frame represent four baffle plates 104 respectively, thus realize automatically determining baffle position according to electric signal.
When preparing next figure, moving substrate 105, as shown in Figure 5, performs the processing procedure that the preceding paragraph describes, so repeatedly; Here, the induction point of dash area can by repeated exposure.
This mode is applicable to form the figure identical with Fig. 2, figure comprises dash area and induction point arranged side by side, if when preparing the figure of other layer, want the figure obtaining being different from Fig. 2, such as only expect the figure of dash area, do not expect induction point figure arranged side by side, then need employing scheme two.
Scheme two: as shown in Figure 2, baffle plate moves to mask plate, and the transmitter 101 simultaneously in exposure sources is to substrate 105 emitting ultraviolet light; When baffle plate 104 moves to first induction point to mask plate 106, the light signal according to the reflected light received obtains electric signal; Processor 103 can determine corresponding first Current maxima of current location according to this electric signal, then baffle plate 104 continues to move to mask plate 106, when moving to certain position in the middle of first induction point and second induction point, light signal according to the reflected light received obtains electric signal, and flapper actuator 103 can determine corresponding first the electric current minimal value of current location according to this electric signal; Baffle plate 104 continues to move to mask plate 106, until when moving to the 3rd induction point, light signal according to the reflected light received obtains electric signal, flapper actuator 103 can determine corresponding 3rd Current maxima of current location according to this electric signal, then send feedback signal to baffle plate 104, baffle plate 104 stops mobile after receiving feedback signal.As shown in Figure 6, utilize exposure sources and mask plate to form figure on the film of substrate, and realize automatically determining baffle position.When preparing next figure, moving substrate 105, then perform said process, so repeatedly; In said process, baffle plate 104 stops mobile when xth Current maxima.
In sum, by above scheme, when preparing the figure required for exposure, be provided with the baffle plate of transmitter and receiver, and flapper actuator with have organize induction point substrate and mask plate coordinate, automatically can determine the position of baffle plate, be one flexibly, automatic test technology, compared with prior art, reduce process complexity, and improve measuring accuracy.
The above, be only preferred embodiment of the present invention, be not intended to limit protection scope of the present invention, and all any amendments done within the spirit and principles in the present invention, equivalent replacement and improvement etc., all should be included within protection scope of the present invention.
Claims (3)
1. an exposure sources, this exposure sources comprises baffle plate and flapper actuator, it is characterized in that, described baffle plate and flapper actuator are used for and have many substrates organize induction point and coordinates the position automatically determining baffle plate, and the induction point of group more than described lays respectively at side, exposure region; Wherein, described baffle plate is provided with transmitter and receiver,
Described transmitter, for emission detection signal to substrate;
Described receiver, for gathering the reflected signal of induction point reflection on substrate, and forms electric signal according to the light signal of described reflected signal;
Described flapper actuator, for according to described electric signal have or without, according to the position of any one mode determination baffle plate in the peak value size variation of described electric signal, described baffle plate is positioned at the surrounding of mask plate;
Wherein, described receiver comprises optical fiber probe, for gathering the reflected signal of induction point reflection on substrate.
2. exposure sources according to claim 1, it is characterized in that, described transmitter and described receiver are positioned at the heteropleural of described baffle plate, and described transmitter is positioned at described baffle-panels to described substrate side, and described receiver is positioned at described baffle plate to described mask plate side.
3. a baffle plate control method for exposure sources, is characterized in that, the method comprises: baffle plate and flapper actuator with there is the substrate organizing induction point more coordinate the position automatically determining baffle plate; Baffle plate is provided with transmitter and receiver, wherein,
Transmitter emission detection signal is on substrate;
Receiver gathers the reflected signal of induction point reflection on substrate, and forms electric signal according to the light signal of described reflected signal;
Flapper actuator according to electric signal have or without, according to the position of any one mode determination baffle plate in the peak value size variation of described electric signal, described baffle plate is positioned at the surrounding of mask plate;
Wherein, described receiver comprises optical fiber probe, by the reflected signal of described optical fiber probe collection induction point reflection on substrate.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201210285757.0A CN103576468B (en) | 2012-08-10 | 2012-08-10 | A kind of exposure sources and baffle plate control method thereof |
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| CN201210285757.0A CN103576468B (en) | 2012-08-10 | 2012-08-10 | A kind of exposure sources and baffle plate control method thereof |
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| CN103576468A CN103576468A (en) | 2014-02-12 |
| CN103576468B true CN103576468B (en) | 2016-03-09 |
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| JP2001345245A (en) * | 2000-05-31 | 2001-12-14 | Nikon Corp | Method and device for exposure and method of manufacturing device |
| JP2005217241A (en) * | 2004-01-30 | 2005-08-11 | Toppan Printing Co Ltd | Exposure system and manufacturing method of multilayer printed wiring board |
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| CN101051086A (en) * | 2006-04-04 | 2007-10-10 | 日新意旺机械股份有限公司 | Ion beam detection device and method, and ion beam irradiation device |
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| CN103576468A (en) | 2014-02-12 |
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