CN103034071B - Exposure machine alignment method and control equipment - Google Patents
Exposure machine alignment method and control equipment Download PDFInfo
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- CN103034071B CN103034071B CN201210541365.6A CN201210541365A CN103034071B CN 103034071 B CN103034071 B CN 103034071B CN 201210541365 A CN201210541365 A CN 201210541365A CN 103034071 B CN103034071 B CN 103034071B
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- alignment mark
- alignment
- light shield
- substrate
- mark
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Abstract
The invention discloses an exposure machine alignment method, which is used for increasing the alignment success rate and improving the production efficiency. The method comprises the following steps: moving a base platform bearing a photomask and performing alignment operation on an alignment mark of the photomask and an alignment mark of a base plate; and determining to move the base platform bearing the photomask and perform alignment operation on the alignment mark of the photomask and the alignment mark of the base plate when the alignment of the alignment mark of the photomask and the alignment mark of the base plate is not realized. The invention also discloses exposure machine alignment control equipment.
Description
Technical field
The present invention relates to technical field of liquid crystal display, relate in particular to a kind of exposure machine alignment method and opertaing device.
Background technology
In thin film transistor-liquid crystal display (Thin Film Transistor-Liquid Crystal Display, TFT-LCD) generative process, need to repeatedly use photoetching process.In photoetching process, utilize and there is the light shield (Mask) of layout and ultraviolet light to scribbling the base board to explosure of photoresist, the pattern on light shield can be projected on the photoresistance of substrate, then by being developed in the pattern that copies light shield on glass substrate.In the generative process of TFT-LCD, need repeatedly carry out several times photoetching and just can complete the making of thin-film transistor array base-plate and color membrane substrates.
Before employing exposure machine exposes, first need to carry out bit manipulation, aligning accuracy is one of important parameter of exposure machine, directly affects exposure effect.In single exposure process, being mainly operating as of exposure machine: pre-contraposition (Pre-alignment)-> spacing control (Gap Control)-> contraposition (Alignment)-> expose (Exposure).
In existing exposure machine alignment mode, the base station (mask stage) that carries light shield by movement carries out the aligning of the alignment mark (work mark) on alignment mark (mask mark) and the substrate on light shield, thereby realizes contraposition.
But, in existing alignment mode, owing to being subject to the impact of the factors such as mask stage structure space restriction, making to realize mask mark and work mark and aim at.Wherein, tend to, because alignment mark exceeds field range and causes too much focusing on sharpness too low (focusing on to such an extent that score value (Score) is lower), make artificially to judge, exposure machine can only, in temporary transient waiting status, can not normally expose.This will affect the mobility of equipment, reduces production efficiency.
This just need to seek a kind of new exposure machine alignment method, to improve contraposition success ratio.
Summary of the invention
The invention provides a kind of exposure machine alignment method and opertaing device, in order to improve contraposition success ratio, enhance productivity.
The concrete technical scheme that the embodiment of the present invention provides is as follows:
A kind of exposure machine alignment method, comprising:
The base station of mobile carrying light shield carries out the alignment function of the alignment mark of light shield and the alignment mark of substrate;
Determine the alignment mark of unrealized light shield and the alignment mark of substrate on time, the base station of mobile bearing substrate carries out the alignment function of the alignment mark of light shield and the alignment mark of substrate.
A kind of exposure machine contraposition opertaing device, comprising:
The first control module, the base station that moves carrying light shield for controlling carries out the alignment function of the alignment mark of light shield and the alignment mark of substrate;
The second control module, for determine the alignment mark of unrealized light shield and the alignment mark of substrate on time, the base station of controlling mobile bearing substrate carries out the alignment function of the alignment mark of light shield and the alignment mark of substrate.
Based on technique scheme, in the embodiment of the present invention, in the time that the base station of mobile carrying light shield carries out the alignment function failure of the alignment mark of light shield and the alignment mark of substrate, the base station of mobile bearing substrate carries out the alignment function of the alignment mark of substrate and the alignment mark of light shield, because the base station of bearing substrate is not subject to the restriction of design space, its mobile range can meet the needs of alignment mark coupling, the situation about cannot aim at that the operation of effectively having avoided traditional only base station of mobile carrying light shield to carry out alignment mark aligning causes, improve contraposition success ratio, and then improve production efficiency.
Brief description of the drawings
Fig. 1 is the existing cross-sectional view to base board to explosure;
Fig. 2 is the method flow diagram of realizing exposure machine contraposition in the embodiment of the present invention;
Fig. 3 is the schematic diagram in the embodiment of the present invention, work mark being split;
Alignment mark position view when Fig. 4 a is initial in the embodiment of the present invention in monitoring range;
Fig. 4 b be in the embodiment of the present invention mobile work mark to the schematic diagram at monitoring range center;
Fig. 4 c is the schematic diagram that in the embodiment of the present invention, work mark aims at mask mark;
Fig. 5 is the method flow diagram that carries out contraposition in the specific embodiment of the invention;
Fig. 6 is the structural representation of exposure machine contraposition opertaing device in the embodiment of the present invention.
Embodiment
The situation about cannot aim at causing for fear of traditional operation that only the mobile base station that carries light shield carries out alignment mark aligning, improves contraposition success ratio, and enhances productivity, and the embodiment of the present invention provides a kind of exposure machine alignment method.
Below in conjunction with accompanying drawing, the preferred embodiment of the present invention is elaborated.
Be the cross-sectional view to base board to explosure as shown in Figure 1, wherein, comprise the base station (mask stage) 101 for carrying light shield (mask) 102, mask102 is adsorbed in the lower surface of mask stage101 in the mode of vacuum suction, and comprise the base station (work stage) 104 of bearing substrate (Glass) 103, Glass103 is positioned over the upper surface of work stage104, also comprise the feet (work pin) 105 for supporting Glass103, this feet 105 runs through work stage104 up and down, move up and down to support Glass103.
Based on the structure shown in accompanying drawing 1, as shown in Figure 2, in the embodiment of the present invention, the method detailed flow process of exposure machine contraposition is as follows:
Step 201: the base station (mask stage) of mobile carrying light shield carries out the alignment function of the alignment mark (maskmark) of light shield and the alignment mark (work mark) of substrate.
Step 202: determine unrealized mask mark and work mark on time, the base station of mobile bearing substrate (work stage) carries out the alignment function of mask mark and work mark.
Preferably, in the embodiment of the present invention, before carrying out the alignment function of mask mark and work mark, work mark is split as to more than one sub-alignment mark, be divided into multiple sub pattern by the pattern of work mark, the corresponding sub-alignment mark of each sub pattern.
This is preferably in embodiment, the detailed process of carrying out the alignment function of mask mark and work mark is: searching for successively within sweep of the eye each sub-alignment mark, search after at least one sub-alignment mark determining, mobile mask stage or work stage carry out the alignment function of mask mark and the sub-alignment mark searching.
In a specific implementation, as shown in Figure 3, in the time that work mark is split as to more than one sub-alignment mark, taking the symcenter of work mark as true origin, taking abscissa axis and axis of ordinates as cut-off rule, work mark is divided into 4 sub-alignment marks.In the time carrying out the alignment function of mask mark and work mark, searching for successively within sweep of the eye 4 sub-alignment marks, search after a sub-alignment mark definite, mobile mask stage or work stage carry out mask mark and the alignment function that searches this sub-alignment mark.
This is preferably in embodiment, by work mark being split as to multiple sub-alignment marks, searching within sweep of the eye each sub-alignment mark, sub-alignment mark and mask mark that employing searches carry out alignment function, thereby can avoid in existing alignment mode, in the time that work mark can not appear within sweep of the eye completely, cause contraposition failure owing to cannot effectively identifying work mark, make it possible to only have the sub-alignment mark as a work mark part to appear within sweep of the eye, can effectively identify work mark, and then realize the alignment function of mask mark and work mark, further improve contraposition success ratio.
For example, as shown in accompanying drawing 4a ~ Fig. 4 c, be respectively arranged with work mark in the relative both sides of substrate, the corresponding contraposition process that shows a side work mark of the field range of monitor (Front monitor) before supposing, the corresponding contraposition process that shows opposite side work mark of field range of back eye monitor (Back monitor).As shown in accompanying drawing 4a, when initial, work mark only has half to appear at center, the visual field, if the pattern with complete workmark is searched in monitoring range, the possibility that searches work mark is less, if search in monitoring range with 4 1/4work mark after splitting, be arranged in part work mark within the vision, can search two in 4 1/4work mark after fractionation, one of them 1/4work mark that employing searches carries out bit manipulation, can make work mark and mask mark be aligned to center, the visual field.
Preferably, step 201 can repeat set point number.Particularly, mobile mask stage carries out the alignment function of mask mark and work mark, realizes aiming at of mask mark and work mark if determine, finishes; If determine unrealized mask mark and work mark on time, mobile maskstage carries out the alignment function of mask mark and work mark again; Repeat this process, until mobile maskstage is while reaching the first set point number.
More preferably, the process that in step 202, mobile work stage aims at can repeat set point number.Particularly, mobile work stage carries out the alignment function of mask mark and work mark, realizes aiming at of mask mark and work mark if determine, finishes; If determine unrealized mask mark and work mark on time, mobile work stage carries out the alignment function of mask mark and work mark again; Repeat this process, until mobile work stage reaches the second set point number.
In practical application, in order to shorten substrate by the duration (tact time) of exposure desk as far as possible, need to limit the number of times that repeats mobile mask stage or work stage.Preferably, the first set point number that repeats mobile mask stage is 5 times, and the second set point number that repeats mobile work stage is 15 times.
This preferred embodiment in, carry out contraposition by repeatedly mobile mask stage and/or work stage, further improved the success ratio of contraposition.
Preferably, when mobile work stage carries out the alignment function of mask mark and work mark, mobile work stage makes work mark move predetermined amplitude along the abscissa axis direction of visual field plane, carries out the alignment function of mask mark and work mark; And/or mobile work stage makes work mark move predetermined amplitude along the axis of ordinates direction of visual field plane, carries out the alignment function of mask mark and work mark.Preferably, this predetermined amplitude is less than or equal to 400 microns (um).
This preferred embodiment can ensure work mark can occur at the center, the visual field of monitor, do not need the manually mobile work of searching mark, further improved success ratio and the production efficiency of contraposition.
Shown in accompanying drawing 5, the alignment mode embodiment of the present invention being provided by a specific embodiment is elaborated.
Step 501: mobile work stage or mask stage carry out the thick contraposition of work mark and mask mark;
Step 502: search surveillance device mask mark within the vision and work mark, calculate the position deviation between two alignment marks, particularly, work mark can be split as to four 1/4work mark, in the time of search, search for according to four 1/4work mark respectively;
Step 503: according to the position deviation calculating, mobile mask stage carry out work mark and maskmark to bit manipulation;
Step 504: search surveillance device mask mark within the vision and work mark again, judge whether two alignment marks are aimed at, particularly, work mark can be split as to four 1/4work mark, in the time of search, search for according to four 1/4work mark respectively; If aim at, expose, otherwise, turn and perform step 505;
Step 505: judge whether the number of times that mobile mask stage carries out exactitude position is more than or equal to 5 times, if so, performs step 506, otherwise, turn and perform step 503;
Step 506: mobile work stage carry out work mark and mask mark to bit manipulation;
Step 507: search surveillance device mask mark within the vision and work mark again, judge whether two alignment marks are aimed at, particularly, work mark can be split as to four 1/4work mark, in the time of search, search for according to four 1/4work mark respectively; If aim at, expose, otherwise, turn and perform step 508;
Step 508: judge whether the number of times that mobile work stage carries out exactitude position is more than or equal to 15 times, if so, finishes, otherwise, turn and perform step 506.
In practical application, in step 501 in the thick contraposition process of carrying out work mark and mask mark, in the image of monitor (as picture pick-up device) picked-up, judge whether the work mark of monitor identification and the resolution of mask mark are greater than 0.35, if be not more than, report to the police (Alarm), if be greater than, carry out carrying out smart contraposition process (being step 502 ~ step 508) after spacing control (Gap Control), adjust the distance between light shield lower surface and upper surface of base plate.
In practical application, carrying out after smart contraposition, before exposing, can also judge whether the work mark of monitor identification and the resolution of mask mark are greater than 0.7, if be greater than, expose, otherwise, report to the police.
Based on same inventive concept, the embodiment of the present invention also provides a kind of exposure machine contraposition opertaing device, and it controls the detailed process that exposure machine carries out contraposition can be referring to the description of said method part, repeats part and repeats no more, as shown in Figure 6, this opertaing device mainly comprises with lower module:
The first control module 601: the alignment function that carries out the alignment mark (mask mark) of light shield and the alignment mark (work mark) of substrate for controlling the base station (mask stage) of mobile carrying light shield;
The second control module 602, for determine unrealized mask mark and work mark on time, the base station (work stage) of controlling mobile bearing substrate carries out the alignment function of mask mark and work mark.
Preferably, also comprise pretreatment module 603, for work mark being split as to more than one sub-alignment mark.
Preferably, the first control module 601 or the second control module 602 specifically for: searching for successively within sweep of the eye each sub-alignment mark, search after at least one sub-alignment mark determining, control mobile maskstage or work stage and carry out the alignment function of mask mark and the sub-alignment mark searching
Preferably, the first control module 601 is specifically for the alignment function of controlling mobile mask stage and carry out mask mark and work mark, if determine unrealized mask mark and work mark on time, again control mobile mask stage and carry out the alignment function of mask mark and work mark, reach the first set point number until control mobile mask stage.
Preferably, the second control module 602 is specifically for the alignment function of controlling mobile work stage and carry out mask mark and work mark, if determine unrealized mask mark and work mark on time, again control mobile work stage and carry out the alignment function of mask mark and work mark, reach the second set point number until control mobile work stage.
Based on technique scheme, in the embodiment of the present invention, in the time that the base station of mobile carrying light shield carries out the alignment function failure of the alignment mark of light shield and the alignment mark of substrate, the base station of mobile bearing substrate carries out the alignment function of the alignment mark of substrate and the alignment mark of light shield, because the base station of bearing substrate is not subject to the restriction of design space, its mobile range can meet the needs of alignment mark coupling, the situation about cannot aim at that the operation of effectively having avoided traditional only base station of mobile carrying light shield to carry out alignment mark aligning causes, improve contraposition success ratio, and then improve production efficiency.
Wherein, work mark is split as to multiple sub-alignment marks, searching within sweep of the eye each sub-alignment mark, sub-alignment mark and mask mark that employing searches carry out alignment function, make it possible to only have the sub-alignment mark as a work mark part to appear within sweep of the eye, still can effectively identify work mark, and then realize the alignment function of mask mark and work mark, further improve contraposition success ratio.
In addition, carry out contraposition by repeatedly mobile mask stage and/or work stage, further improved the success ratio of contraposition.
Obviously, those skilled in the art can carry out various changes and modification and not depart from the spirit and scope of the present invention the present invention.Like this, if these amendments of the present invention and within modification belongs to the scope of the claims in the present invention and equivalent technologies thereof, the present invention is also intended to comprise these changes and modification interior.
Claims (11)
1. an exposure machine alignment method, is characterized in that, comprising:
The alignment mark of substrate is split as to more than one sub-alignment mark;
The base station of mobile carrying light shield carries out the alignment function of the alignment mark of light shield and the alignment mark of substrate;
Determine the alignment mark of unrealized light shield and the alignment mark of substrate on time, the base station of mobile bearing substrate carries out the alignment function of the alignment mark of light shield and the alignment mark of substrate.
2. the method for claim 1, is characterized in that, taking the symcenter of the alignment mark of described substrate as true origin, taking abscissa axis and axis of ordinates as cut-off rule, the alignment mark of described substrate is divided into 4 sub-alignment marks.
3. method as claimed in claim 1 or 2, is characterized in that, carries out the alignment function of the alignment mark of light shield and the alignment mark of substrate, specifically comprises:
Searching for successively within sweep of the eye each sub-alignment mark, searching described at least one after sub-alignment mark determining, the base station of mobile carrying light shield carries out the alignment mark of light shield and the alignment function of the described sub-alignment mark searching; Determine the alignment mark of unrealized light shield and the alignment mark of substrate on time, the alignment function of the alignment mark that the base station of mobile bearing substrate carries out light shield and the described sub-alignment mark searching.
4. method as claimed in claim 3, it is characterized in that, the base station of mobile carrying light shield carries out the alignment function of the alignment mark of light shield and the alignment mark of substrate, if determine the alignment mark of unrealized light shield and the alignment mark of substrate on time, the base station of mobile carrying light shield carries out the alignment function of the alignment mark of light shield and the alignment mark of substrate again, until the alignment mark of mobile light shield reaches the first set point number.
5. method as claimed in claim 4, it is characterized in that, the base station of mobile bearing substrate carries out the alignment function of the alignment mark of light shield and the alignment mark of substrate, if determine the alignment mark of unrealized light shield and the alignment mark of substrate on time, the base station of mobile bearing substrate carries out the alignment function of the alignment mark of light shield and the alignment mark of substrate again, until the base station of mobile bearing substrate reaches the second set point number.
6. method as claimed in claim 5, is characterized in that, described the first set point number is 5 times, and described the second set point number is 15 times.
7. method as claimed in claim 3, is characterized in that, the base station of mobile bearing substrate carries out the alignment function of the alignment mark of light shield and the alignment mark of substrate, specifically comprises:
The base station of mobile bearing substrate makes the alignment mark of substrate move predetermined amplitude along the abscissa axis direction of visual field plane, carries out the alignment function of the alignment mark of light shield and the alignment mark of substrate; And/or,
The base station of mobile bearing substrate makes the alignment mark of substrate move predetermined amplitude along the axis of ordinates direction of visual field plane, carries out the alignment function of the alignment mark of light shield and the alignment mark of substrate, and described predetermined amplitude is less than or equal to 400 microns.
8. an exposure machine contraposition opertaing device, is characterized in that, comprising:
Pretreatment module, for being split as the alignment mark of substrate more than one sub-alignment mark;
The first control module, the base station that moves carrying light shield for controlling carries out the alignment function of the alignment mark of light shield and the alignment mark of substrate;
The second control module, for determine the alignment mark of unrealized light shield and the alignment mark of substrate on time, the base station of controlling mobile bearing substrate carries out the alignment function of the alignment mark of light shield and the alignment mark of substrate.
9. opertaing device as claimed in claim 8, it is characterized in that, described the first control module specifically for: searching for successively within sweep of the eye each sub-alignment mark, search described at least one after sub-alignment mark determining, the base station of controlling mobile carrying light shield carries out the alignment mark of light shield and the alignment function of the described sub-alignment mark searching;
Described the second control module specifically for: determine the alignment mark of unrealized light shield and the alignment mark of substrate on time, the base station of controlling mobile bearing substrate carries out the alignment mark of light shield and the alignment function of the described sub-alignment mark searching.
10. opertaing device as claimed in claim 9, it is characterized in that, described the first control module specifically for: the base station of controlling mobile carrying light shield carries out the alignment function of the alignment mark of light shield and the alignment mark of substrate, if determine the alignment mark of unrealized light shield and the alignment mark of substrate on time, the base station of again controlling mobile carrying light shield carries out the alignment function of the alignment mark of light shield and the alignment mark of substrate, reaches the first set point number until control the base station of mobile carrying light shield.
11. opertaing devices as claimed in claim 10, it is characterized in that, described the second control module specifically for: the base station of controlling mobile bearing substrate carries out the alignment function of the alignment mark of light shield and the alignment mark of substrate, if determine the alignment mark of unrealized light shield and the alignment mark of substrate on time, the base station of again controlling mobile bearing substrate carries out the alignment function of the alignment mark of light shield and the alignment mark of substrate, reaches the second set point number until control the base station of mobile bearing substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210541365.6A CN103034071B (en) | 2012-12-13 | 2012-12-13 | Exposure machine alignment method and control equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210541365.6A CN103034071B (en) | 2012-12-13 | 2012-12-13 | Exposure machine alignment method and control equipment |
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| Publication Number | Publication Date |
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| CN103034071A CN103034071A (en) | 2013-04-10 |
| CN103034071B true CN103034071B (en) | 2014-11-19 |
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| CN201210541365.6A Expired - Fee Related CN103034071B (en) | 2012-12-13 | 2012-12-13 | Exposure machine alignment method and control equipment |
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Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105629683B (en) * | 2014-11-21 | 2018-04-03 | 昆山工研院新型平板显示技术中心有限公司 | The alignment method of exposure machine |
| CN104597722B (en) * | 2015-01-21 | 2019-07-23 | 广东工业大学 | A kind of projection alignment alignment system and its alignment methods based on affine transformation homography matrix |
| CN107454320B (en) * | 2017-07-28 | 2020-01-31 | 京东方科技集团股份有限公司 | alignment devices and alignment methods |
| CN109116685B (en) * | 2018-09-14 | 2020-11-20 | 重庆惠科金渝光电科技有限公司 | Exposure method and exposure device thereof |
| CN109742050B (en) | 2019-01-03 | 2022-02-01 | 京东方科技集团股份有限公司 | Substrate and alignment method and equipment |
| CN112462575A (en) * | 2019-09-06 | 2021-03-09 | 台湾恒基股份有限公司 | Photoetching process method and plate positioning device thereof |
| CN111442906B (en) * | 2020-04-14 | 2021-08-24 | 深圳市华星光电半导体显示技术有限公司 | Display panel detection method and device |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2994968B2 (en) * | 1994-10-06 | 1999-12-27 | ウシオ電機株式会社 | Mask and work alignment method and apparatus |
| TW417158B (en) * | 1994-11-29 | 2001-01-01 | Ushio Electric Inc | Method and device for positioning mask and workpiece |
| JP2000021769A (en) * | 1998-07-06 | 2000-01-21 | Canon Inc | Aligning method and apparatus |
| JP3376961B2 (en) * | 1999-06-08 | 2003-02-17 | ウシオ電機株式会社 | Exposure equipment for positioning by moving the mask |
| CN100526994C (en) * | 2007-08-20 | 2009-08-12 | 上海微电子装备有限公司 | Transmission aligning mark combination and alignment method of light scribing device |
| CN101140423B (en) * | 2007-09-20 | 2012-05-02 | 上海微电子装备有限公司 | Transmission aligning mark combination used for mask alignment and mask alignment method thereof |
| JP2011066185A (en) * | 2009-09-17 | 2011-03-31 | Ushio Inc | Method for detecting work alignment mark, and exposure apparatus |
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