CN103576468A - Exposure equipment and control method of baffle of same - Google Patents
Exposure equipment and control method of baffle of same Download PDFInfo
- Publication number
- CN103576468A CN103576468A CN201210285757.0A CN201210285757A CN103576468A CN 103576468 A CN103576468 A CN 103576468A CN 201210285757 A CN201210285757 A CN 201210285757A CN 103576468 A CN103576468 A CN 103576468A
- Authority
- CN
- China
- Prior art keywords
- baffle plate
- baffle
- substrate
- electric signal
- receiver
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention discloses exposure equipment and a control method of the baffle of the same. The exposure equipment comprises a baffle and a baffle driver, wherein the baffle is provided with a transmitter and a receiver; the baffle and the baffle driver are used for automatically fixing the position of the baffle when used together with a base plate provided with multiple groups of induction points. The control method comprises the following steps that the baffle and the baffle driver work together with the base plate with multiple groups of induction points to automatically fix the position of the baffle; the baffle is provided with the transmitter and the receiver, the transmitter transmits a detection signal to the base plate, and the receiver collects reflected signals reflected through the induction points on the base plate and forms electrical signals according to the optical signals of the reflected signals; the baffle driver fixes the position of the baffle according to the electrical signals. According to the technical scheme, the exposure equipment disclosed by the invention can be used for automatically fixing the position of the baffle, enhances the test accuracy and reduces the complexity of a test process.
Description
Technical field
The present invention relates to the exposure technique in liquid crystal display preparation, relate in particular to a kind of exposure sources and baffle plate control method thereof.
Background technology
At Thin Film Transistor (TFT) (TFT-LCD, Thin Film Transistor-Liquid Crystal Display) in production run, utilize exposure machine and various types of mask plate, can on substrate, form various figure, as signal wire, gate line, raceway groove, via hole etc.Baffle plate is a core component in exposure machine.Adopt prior art, current baffle position, all needs to utilize artificial elder generation measure under the microscope and determine, and then carry out manual correction on exposure machine.Adopt existing manual type to determine baffle position out of true and technique relative complex.
Summary of the invention
In view of this, fundamental purpose of the present invention is to provide a kind of exposure sources and baffle plate control method thereof, can automatically determine baffle position.
For achieving the above object, technical scheme of the present invention is achieved in that
, this exposure sources comprises baffle plate and flapper actuator, and described baffle plate and flapper actuator are for coordinating with the substrate with many group induction points the position of automatically determining baffle plate, and described many group induction points lay respectively at exposure region one side; Wherein, described baffle plate is provided with transmitter and receiver,
Described transmitter, for emission detection signal to substrate;
Described receiver, for gathering the reflected signal of induction point reflection on substrate, and forms electric signal according to the light signal of described reflected signal;
Described flapper actuator, for determining the position of baffle plate according to described electric signal.
Wherein, described receiver comprises optical fiber probe, for gathering the reflected signal of induction point reflection on substrate.
Wherein, described transmitter and described receiver are positioned at the heteropleural of described baffle plate, and described transmitter is positioned at described baffle-panels to described substrate one side, and described receiver is positioned at described baffle plate to described mask plate one side.
Wherein, described flapper actuator, is further used for, according to the having or nothing of described electric signal, determining the position of baffle plate.
Wherein, described flapper actuator, is further used for the peak value size variation according to described electric signal, determines the position of baffle plate.
A baffle plate control method for exposure sources, the method comprises: baffle plate and flapper actuator coordinate with the substrate with many group induction points the position of automatically determining baffle plate; Baffle plate is provided with transmitter and receiver, wherein,
Transmitter emission detection signal is to substrate;
Receiver gathers the reflected signal of induction point reflection on substrate, and forms electric signal according to the light signal of described reflected signal;
Flapper actuator is determined the position of baffle plate according to described electric signal.
Wherein, described flapper actuator determines that according to described electric signal the position of baffle plate specifically comprises:
According to having or nothing of described electric signal, determine the position of baffle plate.
Wherein, described flapper actuator determines that according to described electric signal the position of baffle plate specifically comprises:
According to the peak value size variation of described electric signal, determine the position of baffle plate.
Exposure sources provided by the invention and baffle plate control method thereof, baffle plate and flapper actuator, for coordinating with the substrate with many group induction points the position of automatically determining baffle plate, are organized induction point more and are laid respectively at exposure region one side.Wherein, baffle plate is provided with transmitter and receiver, and transmitter emission detection signal is to substrate; Receiver is used for gathering the reflected signal of induction point reflection on substrate, and forms electric signal according to the light signal of reflected signal; Flapper actuator is determined the position of baffle plate according to electric signal.Adopt the present invention, owing to controlling moving or stopping of baffle plate, thereby automatically determine baffle position, manually determine that with prior art the mode of baffle position is compared, not only test accurately and greatly reduce the complexity of test technology, save manpower consumption.
Accompanying drawing explanation
Fig. 1 is the position relationship exemplary plot that the present invention is provided with baffle plate and substrate, flapper actuator and the mask plate of transmitter and receiver;
Fig. 2 is that the film of substrate in the present invention is through the pictorial diagram after exposure-processed for the first time;
Fig. 3 to Fig. 6 is the film of substrate in the present invention pictorial diagram after several times exposure-processed.
Description of reference numerals:
101: transmitter 102: receiver
103: flapper actuator 104: baffle plate
105: substrate 106: mask plate 107: product to be exposed
Embodiment
Below by drawings and the specific embodiments, the present invention is described in further detail again.
As shown in Figure 1, this exposure sources comprises: be provided with the baffle plate 104 of transmitter 101 and receiver 102, flapper actuator 103; Wherein, baffle plate 104 and flapper actuator 103 are used in conjunction with, and for coordinating with the substrate 105 with many group induction points the position of automatically determining baffle plate, described many group induction points lay respectively at exposure region one side.
Here, receiver 102 comprises optical fiber probe, for gathering the reflected signal of induction point reflection on substrate.
Here, transmitter 101 and receiver 102 are positioned at the heteropleural of baffle plate 104, and transmitter 101 is positioned at baffle plate 104 towards substrate 105 1 sides, and receiver 102 is positioned at baffle plate 104 to mask plate 106 1 sides.
Here, flapper actuator 103, is further used for, according to the having or nothing of electric signal, determining the position of baffle plate.
Here, flapper actuator 103, is further used for the peak value size variation according to electric signal, determines the position of baffle plate.
A baffle plate control method for exposure sources, the method comprises: baffle plate and flapper actuator coordinate with the substrate with many group induction points the position of automatically determining baffle plate; Baffle plate is provided with transmitter and receiver, wherein,
Transmitter emission detection signal is to substrate;
Receiver gathers the reflected signal of induction point reflection on substrate, and forms electric signal according to the light signal of described reflected signal;
Flapper actuator is determined the position of baffle plate according to described electric signal.
Here, flapper actuator determines that according to described electric signal the position of baffle plate specifically comprises: according to having or nothing of described electric signal, determine the position of baffle plate.
Here, flapper actuator determines that according to described electric signal the position of baffle plate specifically comprises: according to the peak value size variation of described electric signal, determine the position of baffle plate.
Below, take the situation that detectable signal is ultraviolet light specifically sets forth.
In the present invention, mercury lamp emission ultraviolet light in transmitter 101, when this ultraviolet light incides on the film of substrate 105, ultraviolet light is after the reflection of substrate 105, reflected light can be received the optical fiber probe stretching out in device 102 and gather, optical fiber probe gathers after the reflected light of induction point reflection on substrate 105, and forms electric signal according to catoptrical light signal, and flapper actuator 103 is determined the position of baffle plate according to described electric signal.
As shown in Figure 2, baffle plate 104 is positioned at the surrounding (being positioned at four positions up and down of mask plate 106) of mask plate 106, that is to say, and when exposure, corresponding 4 baffle plates of mask plate.
Utilize the cooperation of above-mentioned exposure sources and mask plate and substrate, can on the film of substrate, form figure, and when forming figure, automatically determine the position of baffle plate, concrete:
1, on the film of substrate, make while being exposed the first layer metal figure (being exposed the fundamental figure of product) on product, because first layer metal figure is metal entirely, do not form any figure, therefore can not determine exposure area according to reflected light, can only manually measure under the microscope and regulate to determine exposure area, through after exposure-processed for the first time, on the film of substrate, form figure as shown in Figure 3.
2,, when making is exposed other layer pattern on product, owing to being formed with the figure shown in Fig. 3 on the film of substrate, so exposure sources can be determined the position of baffle plate automatically according to reflected light; Concrete:
Scheme one: as shown in Figure 2, four baffle plates 104 can be moved to mask plate 106 by mask plate 106 surroundings in the direction of arrows, and the transmitter 101 in exposure sources is to substrate 105 emitting ultraviolet lights simultaneously; When baffle plate 104 moves to first induction point to mask plate 106, according to the catoptrical light signal of receiving, obtain electric signal; Flapper actuator 103 can be determined and now occur first electric current maximum value according to this electric signal, therefore can determine that baffle plate 104 is the positions that are positioned at first induction point, flapper actuator 103 sends feedback signal to baffle plate 104, and baffle plate 104 stops moving after receiving feedback signal; Utilize exposure sources on the film of substrate 105, to form figure as shown in Figure 4, in Fig. 4, four limits of black heavy line square frame represent respectively four baffle plates 104, thereby realize according to electric signal, automatically determine baffle position.
When the next figure of preparation, moving substrate 105, as shown in Figure 5, carries out the processing procedure that the preceding paragraph is described, so repeatedly; Here, the induction point of dash area can be repeated exposure.
This mode is applicable to form and figure identical in Fig. 2, figure comprises dash area and induction point arranged side by side, if when the figure of other layer of preparation, want to obtain being different from the figure in Fig. 2, for example only expect the figure of dash area, do not expect induction point figure arranged side by side, need employing scheme two.
Scheme two: as shown in Figure 2, baffle plate moves to mask plate, the transmitter 101 in exposure sources is to substrate 105 emitting ultraviolet lights simultaneously; When baffle plate 104 moves to first induction point to mask plate 106, according to the catoptrical light signal of receiving, obtain electric signal; Processor 103 can be determined corresponding first electric current maximum value of current location according to this electric signal, then baffle plate 104 continues to move to mask plate 106, while moving to first induction point and second middle certain position of induction point, according to the catoptrical light signal of receiving, obtain electric signal, flapper actuator 103 can be determined corresponding first electric current minimal value of current location according to this electric signal; Baffle plate 104 continues to move to mask plate 106, until while moving to the 3rd induction point, according to the catoptrical light signal of receiving, obtain electric signal, flapper actuator 103 can be determined corresponding the 3rd the electric current maximum value of current location according to this electric signal, then to baffle plate 104, send feedback signal, baffle plate 104 stops moving after receiving feedback signal.As shown in Figure 6, utilize exposure sources and mask plate to form figure on the film of substrate, and realize and automatically determine baffle position.When the next figure of preparation, moving substrate 105, then carry out said process, so repeatedly; In said process, baffle plate 104 stops mobile when x electric current maximum value.
In sum, by above scheme, when the needed figure of preparation exposure, be provided with the baffle plate of transmitter and receiver, and flapper actuator coordinates with substrate and the mask plates with many group induction points, can automatically determine the position of baffle plate, be a kind of flexibly, automatic test technology, compared with prior art, reduce process complexity, and improved measuring accuracy.
The above, be only preferred embodiment of the present invention, is not intended to limit protection scope of the present invention, all any modifications of doing within the spirit and principles in the present invention, is equal to and replaces and improvement etc., within all should being included in protection scope of the present invention.
Claims (8)
1. an exposure sources, this exposure sources comprises baffle plate and flapper actuator, it is characterized in that, described baffle plate and flapper actuator are for coordinating with the substrate with many group induction points the position of automatically determining baffle plate, and described many group induction points lay respectively at exposure region one side; Wherein, described baffle plate is provided with transmitter and receiver,
Described transmitter, for emission detection signal to substrate;
Described receiver, for gathering the reflected signal of induction point reflection on substrate, and forms electric signal according to the light signal of described reflected signal;
Described flapper actuator, for determining the position of baffle plate according to described electric signal.
2. exposure sources according to claim 1, is characterized in that, described receiver comprises optical fiber probe, for gathering the reflected signal of induction point reflection on substrate.
3. exposure sources according to claim 1, it is characterized in that, described transmitter and described receiver are positioned at the heteropleural of described baffle plate, and described transmitter is positioned at described baffle-panels to described substrate one side, and described receiver is positioned at described baffle plate to described mask plate one side.
4. according to the exposure sources described in claim 1,2 or 3, it is characterized in that described flapper actuator is further used for, according to the having or nothing of described electric signal, determining the position of baffle plate.
5. according to the exposure sources described in claim 1,2 or 3, it is characterized in that, described flapper actuator, is further used for the peak value size variation according to described electric signal, determines the position of baffle plate.
6. a baffle plate control method for exposure sources, is characterized in that, the method comprises: baffle plate and flapper actuator coordinate with the substrate with many group induction points the position of automatically determining baffle plate; Baffle plate is provided with transmitter and receiver, wherein,
Transmitter emission detection signal is to substrate;
Receiver gathers the reflected signal of induction point reflection on substrate, and forms electric signal according to the light signal of described reflected signal;
Flapper actuator is determined the position of baffle plate according to described electric signal.
7. method according to claim 6, is characterized in that, described flapper actuator determines that according to described electric signal the position of baffle plate specifically comprises:
According to having or nothing of described electric signal, determine the position of baffle plate.
8. method according to claim 6, is characterized in that, described flapper actuator determines that according to described electric signal the position of baffle plate specifically comprises:
According to the peak value size variation of described electric signal, determine the position of baffle plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210285757.0A CN103576468B (en) | 2012-08-10 | 2012-08-10 | A kind of exposure sources and baffle plate control method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210285757.0A CN103576468B (en) | 2012-08-10 | 2012-08-10 | A kind of exposure sources and baffle plate control method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103576468A true CN103576468A (en) | 2014-02-12 |
| CN103576468B CN103576468B (en) | 2016-03-09 |
Family
ID=50048536
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210285757.0A Active CN103576468B (en) | 2012-08-10 | 2012-08-10 | A kind of exposure sources and baffle plate control method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103576468B (en) |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20020054231A1 (en) * | 2000-05-31 | 2002-05-09 | Nikon Corporation | Exposure method, exposure apparatus, and process of production of device |
| JP2005217241A (en) * | 2004-01-30 | 2005-08-11 | Toppan Printing Co Ltd | Exposure system and manufacturing method of multilayer printed wiring board |
| CN101051086A (en) * | 2006-04-04 | 2007-10-10 | 日新意旺机械股份有限公司 | Ion beam detection device and method, and ion beam irradiation device |
| CN101158821A (en) * | 2007-08-31 | 2008-04-09 | 上海微电子装备有限公司 | Aligning mark, alignment method and aligning system |
| CN101276774A (en) * | 2007-03-28 | 2008-10-01 | 沈阳芯源先进半导体技术有限公司 | Control apparatus and control method for automatic positioning of wafer |
| CN101286012A (en) * | 2007-04-13 | 2008-10-15 | 株式会社Orc制作所 | Projection exposure apparatus |
| CN101738882A (en) * | 2008-11-14 | 2010-06-16 | 优志旺电机株式会社 | Alignment mark detecting method and apparatus |
| WO2012035843A1 (en) * | 2010-09-13 | 2012-03-22 | 株式会社オーク製作所 | Projection aligner |
| CN102449188A (en) * | 2009-06-24 | 2012-05-09 | 株式会社爱发科 | Vacuum film forming apparatus and method for detecting position of shutter plate of vacuum film forming apparatus |
| CN202372754U (en) * | 2011-12-31 | 2012-08-08 | 北京京东方光电科技有限公司 | Exposure machine and exposure system |
-
2012
- 2012-08-10 CN CN201210285757.0A patent/CN103576468B/en active Active
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20020054231A1 (en) * | 2000-05-31 | 2002-05-09 | Nikon Corporation | Exposure method, exposure apparatus, and process of production of device |
| JP2005217241A (en) * | 2004-01-30 | 2005-08-11 | Toppan Printing Co Ltd | Exposure system and manufacturing method of multilayer printed wiring board |
| CN101051086A (en) * | 2006-04-04 | 2007-10-10 | 日新意旺机械股份有限公司 | Ion beam detection device and method, and ion beam irradiation device |
| CN101276774A (en) * | 2007-03-28 | 2008-10-01 | 沈阳芯源先进半导体技术有限公司 | Control apparatus and control method for automatic positioning of wafer |
| CN101286012A (en) * | 2007-04-13 | 2008-10-15 | 株式会社Orc制作所 | Projection exposure apparatus |
| CN101158821A (en) * | 2007-08-31 | 2008-04-09 | 上海微电子装备有限公司 | Aligning mark, alignment method and aligning system |
| CN101738882A (en) * | 2008-11-14 | 2010-06-16 | 优志旺电机株式会社 | Alignment mark detecting method and apparatus |
| CN102449188A (en) * | 2009-06-24 | 2012-05-09 | 株式会社爱发科 | Vacuum film forming apparatus and method for detecting position of shutter plate of vacuum film forming apparatus |
| WO2012035843A1 (en) * | 2010-09-13 | 2012-03-22 | 株式会社オーク製作所 | Projection aligner |
| CN202372754U (en) * | 2011-12-31 | 2012-08-08 | 北京京东方光电科技有限公司 | Exposure machine and exposure system |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103576468B (en) | 2016-03-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103091521B (en) | Method of probe and lead foot automatic aiming and probe station testing system thereof | |
| CN103414912B (en) | A kind of method and device evaluating bore hole stereo display crosstalk | |
| CN103744271B (en) | A kind of laser direct writing system and photoetching method | |
| CN101655534A (en) | Testing device and method of flat-panel display panel | |
| CN105278454A (en) | Robot hand-eye positioning algorithm based on mechanical arm visual positioning system | |
| CN106994429B (en) | Dispenser system and method, display device and electronic equipment for backlight module | |
| CN104698660A (en) | Grasping device and grasping method both for mark position of base plate | |
| CN103324025B (en) | Mask plate and apply its detect exposure defect method | |
| CN104808586A (en) | Coating machine | |
| CN106154768A (en) | A kind of ic substrate re-expose method based on mask plate | |
| KR20170105025A (en) | Adaptive groove focusing and leveling device and method | |
| CN103605436B (en) | Interaction projection location method and interaction projection device | |
| CN104362108A (en) | Photoelectric testing device | |
| CN203760048U (en) | OLED panel display defect restoring system | |
| CN103645743B (en) | Visual-alignment controls system and method | |
| CN103885299B (en) | A kind of exposure system | |
| CN103576468A (en) | Exposure equipment and control method of baffle of same | |
| CN205352314U (en) | Novel laser range finder detects device | |
| CN104503118A (en) | Panel lead wire detection device and detection method | |
| CN203298974U (en) | Digital type white light sighting telescope comprehensive calibration instrument | |
| CN102937774B (en) | Lens module detecting device | |
| CN104889774A (en) | Device for rapidly switching tool | |
| CN103471501A (en) | Decal positioning projection apparatus, decal positioning projection system, and decal positioning projection method | |
| CN103698648A (en) | Line detecting device | |
| CN206919842U (en) | Optical displacement measurement device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |