CN103509657A - Component surface cleaning method - Google Patents
Component surface cleaning method Download PDFInfo
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- CN103509657A CN103509657A CN201310485425.1A CN201310485425A CN103509657A CN 103509657 A CN103509657 A CN 103509657A CN 201310485425 A CN201310485425 A CN 201310485425A CN 103509657 A CN103509657 A CN 103509657A
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- component surface
- component
- cleaning method
- cleaning
- surface cleaning
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Abstract
The invention discloses a component surface cleaning method. In the component surface cleaning method, a silicate liquid containing suspending colloidal particles is adopted as a cleaning agent, the silicate content of the silicate liquid is greater than 0.3%; a step of removing wax adsorbed on the surface of a component after surface cleaning is eliminated, and recontamination of the component can be prevented; by changing the rotation speed of a cleaning mechanism and performing forward cleaning and reverse cleaning alternately, the cleaning degree of the cleaning mechanism is greatly improved, and the surface of the component can be cleaned without loss.
Description
Technical field
The present invention relates to semiconductor surface cleaning method, be specially adapted to component surface cleaning method.
Background technology
In semi-conductor industry field, conventionally need to clean component surfaces such as silicon wafers in process of production, but the cleaning method agents useful for same conventionally adopting carries out etching to the surface of component, makes component surface attenuation, and affects use and the performance of component.
Therefore, need a kind of new technical scheme to address the above problem.
Summary of the invention
The problem and shortage existing for above-mentioned prior art, the object of this invention is to provide a kind of component surface cleaning method, and simple to operate, degree of cleaning are high.
For achieving the above object, the technical solution used in the present invention is a kind of component surface cleaning method, and the sanitising agent of employing is the silicate liquid that includes suspensoid particle, and described silicate content is greater than 0.3%.
Preferably, silicate is a kind of in potassium silicate or water glass, or both mixing solutionss.
Preferably, colloidal solid material is identical with component surface material to be cleaned.
Preferably, colloidal solid concentration is 0.5 ~ 1.5g/l.
Preferably,
Comprise the following steps:
1) component to be cleaned are put into the sanitising agent that is arranged in cleaning mechanism;
2) cleaning mechanism carries out the clean rotation of forward under the driving of step-down gear;
3) oppositely cleaning component carried out in step-down gear reverse rotation.
Preferably, the speed of rotation of cleaning mechanism is changed step by step by step-down gear.
Preferably, the clean and reverse cleaning of forward carries out in an alternating manner.
The present invention compared to existing technology, its advantage is sanitising agent energy dissolving wax of the present invention, and reduced the step that wax is adsorbed on to component surface after carrying out surface cleaning and divests, and can prevent that component from polluting again, utilize the rotating speed that changes cleaning mechanism, coordinate Direct/Reverse to clean and hocket, greatly improve the clean dynamics of cleaning mechanism, to component surface is loss-free, clean.
Embodiment
Below in conjunction with specific embodiment, technical scheme of the present invention is described in detail, in following examples, the rotating speed of step-down gear is 100 ~ 200rpm.
Embodiment 1:
The sanitising agent of the present embodiment is that concentration is the potassium silicate liquid of the suspensoid particle of 0.5g/l, and potassium silicate content is 0.5%.
Operation steps is as follows:
1) component to be cleaned are put into the sanitising agent that is arranged in cleaning mechanism;
2) cleaning mechanism carries out the clean rotation of forward under the driving of step-down gear;
3) oppositely cleaning component carried out in step-down gear reverse rotation;
4) the clean and reverse cleaning of forward carries out in an alternating manner;
5) component to be cleaned are taken out, with clear water, rinse well.
Component surface after clean is clean, without bubble particles and undissolved glue, meets clean requirement.
Embodiment 2:
The sanitising agent of the present embodiment is that concentration is the sodium silicate liquid of the suspensoid particle of 1.0g/l, and water glass content is 0.8%.
Operation steps is identical with embodiment 1.
Component surface after clean is clean, without bubble particles and undissolved glue, meets clean requirement.
Embodiment 3:
The sanitising agent of the present embodiment is that concentration is water glass and the potassium silicate mixing liquid of the suspensoid particle of 1.5g/l, and this mixed industry liquid mesosilicic acid content is 1.0%.
Operation steps is identical with embodiment 1.
Component surface after clean is clean, without bubble particles and undissolved glue, meets clean requirement.
Claims (7)
1. component surface cleaning method, is characterized in that: the sanitising agent that described method adopts is the silicate liquid that includes suspensoid particle, and described silicate content is greater than 0.3%.
2. component surface cleaning method according to claim 1, is characterized in that: described silicate is a kind of in potassium silicate or water glass, or both mixing solutionss.
3. component surface cleaning method according to claim 1, is characterized in that: described colloidal solid material is identical with component surface material to be cleaned.
4. component surface cleaning method according to claim 3, is characterized in that: described colloidal solid concentration is 0.5 ~ 1.5g/l.
5. component surface cleaning method according to claim 4, is characterized in that: comprise the following steps:
5.1) component to be cleaned are put into the sanitising agent that is arranged in cleaning mechanism;
5.2) cleaning mechanism carries out the clean rotation of forward under the driving of step-down gear;
5.3) oppositely cleaning component carried out in step-down gear reverse rotation.
6. component surface cleaning method according to claim 5, is characterized in that: the speed of rotation of described cleaning mechanism is changed step by step by step-down gear.
7. component surface cleaning method according to claim 5, is characterized in that: the clean and reverse cleaning of described forward carries out in an alternating manner.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310485425.1A CN103509657A (en) | 2013-10-17 | 2013-10-17 | Component surface cleaning method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310485425.1A CN103509657A (en) | 2013-10-17 | 2013-10-17 | Component surface cleaning method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN103509657A true CN103509657A (en) | 2014-01-15 |
Family
ID=49893092
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310485425.1A Pending CN103509657A (en) | 2013-10-17 | 2013-10-17 | Component surface cleaning method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103509657A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106190597A (en) * | 2016-07-09 | 2016-12-07 | 嘉兴国弘环保科技有限公司 | The preparation method of waterless carwash liquid |
| CN106190602A (en) * | 2016-07-09 | 2016-12-07 | 嘉兴国弘环保科技有限公司 | Waterless carwash liquid |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1469918A (en) * | 2000-10-16 | 2004-01-21 | ���ֿ����ر��˹�˾ | Stabilized alkaline compositions for cleaning microelectronic substrates |
| CN101151714A (en) * | 2005-04-05 | 2008-03-26 | Sez股份公司 | Method for removing particles from a semiconductor surface |
| CN101402901A (en) * | 2008-11-12 | 2009-04-08 | 江门市蓬江区海润化工有限公司 | Silicon dioxide paste detergent with disinfection function and preparation method thereof |
| CN101705160A (en) * | 2009-11-06 | 2010-05-12 | 崔镇西 | Cleaning agent, preparation method thereof and use thereof in cleaning dirt on workpiece |
-
2013
- 2013-10-17 CN CN201310485425.1A patent/CN103509657A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1469918A (en) * | 2000-10-16 | 2004-01-21 | ���ֿ����ر��˹�˾ | Stabilized alkaline compositions for cleaning microelectronic substrates |
| CN101151714A (en) * | 2005-04-05 | 2008-03-26 | Sez股份公司 | Method for removing particles from a semiconductor surface |
| CN101402901A (en) * | 2008-11-12 | 2009-04-08 | 江门市蓬江区海润化工有限公司 | Silicon dioxide paste detergent with disinfection function and preparation method thereof |
| CN101705160A (en) * | 2009-11-06 | 2010-05-12 | 崔镇西 | Cleaning agent, preparation method thereof and use thereof in cleaning dirt on workpiece |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106190597A (en) * | 2016-07-09 | 2016-12-07 | 嘉兴国弘环保科技有限公司 | The preparation method of waterless carwash liquid |
| CN106190602A (en) * | 2016-07-09 | 2016-12-07 | 嘉兴国弘环保科技有限公司 | Waterless carwash liquid |
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| C05 | Deemed withdrawal (patent law before 1993) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20140115 |