CN103472682A - Method for preparing diffraction micro-optical elements based on mask lithography technique and injection molding - Google Patents
Method for preparing diffraction micro-optical elements based on mask lithography technique and injection molding Download PDFInfo
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Abstract
The invention discloses a method for preparing diffraction micro-optical elements based on a mask lithography technique and injection molding, which enables the preparation to be developed toward miniaturization, mass production, low cost and rapid molding. The method for preparing the diffraction micro-optical elements comprises the following steps of firstly, preparing mask graphics of the micro-optical elements, such as binary raster and wave zone plates, by cartographic software; then preparing photoetching mask plates on chrome plated glass plates; then applying the chrome plated mask plates to a contact-type photoetching system; and preparing micro-optical element graphics on metal alloys coated with a positive photoresist by virtue of the photoetching technology, and etching the micro-optical element graphics by virtue of an electrochemical etching technology, so that the graphics on the chromium mask plates are transferred to a metal alloy base plate in one-to-one correspondence. The metal alloys etched with the graphics can act as movable mold cores on injection molding molds, and the micro-optical elements on the metal alloys can be transferred to optical plastics by virtue of the injection molding molds. The method is mainly characterized in that mold cores are convenient to replace, and the various diffraction micro-optical elements can be prepared by replacing mold cores with different graphics.
Description
Technical field
The present invention relates to a kind of method based on mask lithography technology and injection mo(u)lding making diffractive micro-optical element.
Background technology
Mostly the making of diffractive micro-optical element in the past is to adopt traditional photoetching technique, first on the media such as glass, apply one deck photoresist (photoresist), utilize the mode of transfer printing that the micro optical element figure designed is copied to one by one on the photoetching hectograph on special-purpose contact exposure litho machine.Through conventional lithography process, form micro optical element on the photoresist of glass plate or silicon chip, then, after the micro-amplification detection of slices, select qualified device to carry out ion beam etching, formed micro optical element not only area is little, and the equipment such as required reactive ion etching machine are also very expensive.
As need the micro optical element that diffraction efficiency is higher, every all needs to carry out repeatedly alignment, need on the specialized equipments such as reactive ion etching machine, carry out repeatedly ion beam etching again, the last micro optical element that forms many steps on glass medium or silicon chip.So one by one the process-cycle long, and yield rate is low, can not meet the needs of making the fine structure micro optical element far away.
Summary of the invention
The object of the present invention is to provide a kind of method of making diffractive micro-optical element based on mask lithography technology and injection mo(u)lding, it have advantages of easy to operate, yield rate is high and the cycle is short.
The present invention is achieved like this, and realization of the present invention depends on the transmission-type imaging optical path experimental provision that a kind of diffractive micro-optical element core rod is made.The pilot system of this self design comprises purple light light source (high-pressure sodium lamp), instant-plugging mask grillage, focus control, the prism beam splitter, CCD camera, 10 times of miniature object lens of precision, the photoresist sheet substrate frame, Z axis micropositioner, the accurate automatically controlled large stroke translation stage of X-Y-axis and microcomputer; Wherein the purple light light source also comprises that an optical fiber source expands and collimating mirror, the below of purple light light source is instant-plugging mask grillage, the centre of the focus control between instant-plugging mask grillage and 10 times of miniature object lens of precision is connected respectively prism beam splitter and CCD camera with a side, it under 10 times of miniature object lens of precision, is the photoresist sheet substrate frame, the photoresist sheet substrate frame connects Z axis micropositioner and the accurate automatically controlled large stroke translation stage of X-Y-axis of below, and the accurate automatically controlled large stroke translation stage of X-Y-axis connects microcomputer.During operation, first on Digital Micromirror Device (DMD), utilize computer software design to generate the micro optical element figure, then expose on digital litho machine and obtain the micro optical element mask plate of transmission-type.
The present invention includes following steps: (1) makes micro optical element metal alloy core rod: at first, utilize above-mentioned transmission-type imaging optical path experimental provision, generate the optical element lay photoetching mask plate on chromium film glass offset plate.Utilize the graphics edition design software to carry out the design of micro optical element mask on microcomputer, first obtain micro optical element mask (master can by 10 times of Enlargement Designs of finished product micro optical element) on the digital photolithography machine.After the light beam that purple light light source (high-pressure sodium lamp) sends expands and collimates through fiber optic point source, shine directly on instant-plugging mask plate (master), the light beam transmitted through the prism beam splitter, again by 10 times of final minification object lens by the graphic projection on mask plate (master) on the metal alloy substrate that applies photoresist, make figure imaging on the photoetching hectograph the most clear (picture dwindled by 10:1) by focus control.The light beam transmitted requires with miniature object lens, photoetching hectograph coaxial.Due to the effect of prism beam splitter, during focusing the sharpness of imaging can be on the CCD camera monitored arriving.The accurate automatically controlled large stroke translation stage of X-Y-axis and Z axis micropositioner can accurately project the figure through 10 times of final minification on the photoetching hectograph;
Utilize photoetching technique to make diffractive micro-optical element on metal alloy, the design and fabrication of core rod is to adopt electrochemical etching method, by the micro optical element graph transfer printing, to what obtain on the metal alloy substrate, this movable injection core can be used as the embedded core rod of activity on the injection mould die;
Embedded core rod requires: the firstth, and the manufacture craft of core rod and method; The secondth, embedded core rod is changed convenient, utilizes same injection mold, changes the core rod with different various layouts, can produce the diffractive micro-optical element of various corresponding patterns.
(2) injection mo(u)lding of diffractive micro-optical element is made: the metal alloy substrate grinding and polishing-→ pre-service (cleanings) of substrate-→ the even glue of photoresist-→ front baking-→ exposure-→ rear the baking-→ develop-→ post bake-→ electrochemical etching of metal substrate-→ remove photoresist-→ the metal alloy core rod-→ injection mold assembles-→ the injection machine injection moulding-→ injection-molded finished (micro optical element is retained on optical plastic);
The design of injection mold and making are to adopt injection molding method to complete the gordian technique copied.The design and fabrication of injection mold requires existing reproduction technology can be had Hi-Fi copying, and can make the diffraction efficiency of surperficial micro optical element and the value that homogeneity approaches original microstructure;
Injection mold is the main tool that diffractive micro-optical element copies moulding, and in general these normally mass productions of injection mo(u)lding duplicate, therefore requiring plastic injection mould should have in use few processing after high-level efficiency, high-quality and moulding or do not reprocess the characteristics of (repairing a die), is high-temperature nickel-based metal alloy so core material selects;
The design and fabrication of injecting smart mould is one of the most key part of the present invention, because the quality of mould is directly connected to the quality of finished product element.The design that is used for the injection essence mould of this test mainly divides three parts: the design of runner, the design of die cavity and the design of placing the die cavity of embedded mother matrix core rod.The design of runner and core rod die cavity is all to design and arrange according to the requirement of die cavity.Runner is the gate channel that makes the optical plastic of melting steadily enter each die cavity multi-cavity from sprue; The die cavity part, the overall exterior shape of main composition diffractive micro-optical element goods; The core rod of core rod die cavity part is mother matrix nickel based metal alloy substrates namely, and the above has the diffractive micro-optical element figure formed after the techniques such as overexposure and electrochemical etching, the detailed shape of main composition micro optical element goods.Because the diffractive micro-optical element finished product is very high to the requirement of integrity degree, so the thick stick that ejects of optical plastic finished product is not set in the Injection Mold Design of this test, but the core rod cavity lateral is designed to the inclined-plane of certain taper, while being die sinking, the workpiece be injection molding is directly pulled out by pull bar, allow the demoulding voluntarily of micro optical element finished product.
The present invention utilizes photoetching process first to obtain the micro optical element core rod of hard metal alloys material, it just look like a miniature steel seal seal, embed in the die of specially designed injection mold, utilize the transparent optical materials such as PMMA, CR-39, PC or PS of optical grade, just can rapid shaping on existing precise injection machine.
At first utilize the graphics softwares such as AUTOCAD or L-EDIT to design the mask artwork of some basic diffraction optical elements such as binary raster, Dammam (Dammaann) grating, imperial base (Ronchi) grating, fresnel's zone plate, these pictures are imported to computing machine, through the exposure of digital photolithography machine, on chromium plating film glass offset plate, produce lay photoetching mask plate.Again the chrome mask version is applied in the projection transmitted light etching system of self design, utilize photoetching technique to produce the diffractive micro-optical element array scribbling on the hard metal alloys substrate of positive photoresist, then adopt electrochemical etching technique to carry out etching to the metal alloy substrate, make pattern on mask one by one correspondence be transferred on the metal alloy substrate, this quarter, figuratum metal alloy substrate can be used as the movable core rod on injection mold.
The design of injection mold and making are to adopt injection molding method to complete the gordian technique copied.Utilize the graphics softwares such as AUTOCAD to design array of figure and the mould drawing for making diffractive micro-optical element, processing and fabricating goes out corresponding injection mold, can utilize injection mould to be transferred on optical plastic the on-chip diffraction optical element array of metal alloy.The injection mold of this invention design is different from general fixed injection mold, it is quite convenient that its principal feature is to change core rod, in the situation that assurance mould and die overall dimensions are constant, use same set of mould and die, change the core rod that is carved with different micro optical element figures and just can produce the diffractive micro-optical element with various layouts, and, at least can realize assembling eight kinds of different micro optical element core rods on a die.
Technique effect of the present invention is: the present invention has not only realized the mass production of micro optical element, and the production cycle shortens dramatically, and it is convenient especially that core rod is changed, and the cost per unit of batch production is low, yield rate is high.Also there is the core rod of replacing advantage easily, change the core rod that is carved with different graphic and just can produce various diffractive micro-optical element.
The accompanying drawing explanation
The structural representation of Fig. 1 transmission-type imaging optical path experimental provision.
The method for making process frame chart of Fig. 2 metal alloy substrate (core rod).
Fig. 3 micro projection exposure core rod fabrication processing schematic diagram.
The micro-enlarged drawing in diffractive micro-optical element surface after Fig. 4 electrochemical etching.
Metal alloy core rod figure after Fig. 5 diffractive micro-optical element etching.
Fig. 6 mold integral assembling section.
Fig. 7 micro optical element core rod and runner schematic layout pattern.
The diffraction pattern of micro optical element during Fig. 8 He-Ne Lasers (633nm) normal incidence.
Purple light light source 2, instant-plugging mask grillage 3, focus control 4, prism beam splitter 5,6,10 times of miniature object lens 7 of precision of CCD camera, photoresist sheet substrate frame 8, Z axis micropositioner 9, the accurate automatically controlled large stroke translation stage 10 of X-Y-axis, microcomputer in the drawings, 1.
Embodiment
Below in conjunction with embodiment and contrast accompanying drawing the present invention is described in further detail.
The present invention utilizes picture editting's design softwares such as L-EDIT and AUTOCAD, the resolution of figure is arranged to minimum resolution with Digital Micromirror Device (DMD) consistent or become integer relation, first obtains micro optical element mask (being mother matrix) on the digital photolithography machine.As shown in Figure 1, purple light light source 1(high-pressure sodium lamp) after the light beam sent expands and collimates through fiber optic point source, shine directly into instant-plugging mask plate 2(mother matrix) on, the light beam transmitted through prism beam splitter 4, again by 10 times of final minification object lens 6 by the graphic projection on mask plate on the metal alloy substrate that applies photoresist, make figure surface imaging the most clear (picture dwindled by 10:1) on photoetching hectograph 7 in substrate frame by focus control 3.Due to the effect of prism beam splitter 4, can monitor the readability of focusing on CCD camera 5.The accurate automatically controlled large stroke translation stage 9 of X-Y-axis and Z axis micropositioner 8 can accurately project the figure through 10 times of final minification on photoetching hectograph metal alloy substrate.
The metal alloy substrate grinding and polishing-→ pre-service (cleaning) of substrate-→ the even glue of photoresist-→ front baking-→ exposure-→ rear the baking-→ develop-→ post bake-→ electrochemical etching of metal substrate-→ remove photoresist-→ the metal alloy core rod-→ the injection mold assembling-→ the injection machine injection moulding-→ injection-molded finished (micro optical element is retained on optical plastic);
1, metal alloy substrate grinding and polishing: the nickel based metal alloy is cut into needed disk shape by line, the thick approximately 3～5mm of substrate, wanting to be made into can nonexpondable injection core, its surface grinding must be become to minute surface, just may produce high-quality finished product;
Corase grind can be used the abrasive paper for metallograph polishing, and fine grinding is used existing equipment-optic fiber polishing machine to be ground.Optic fiber polishing machine has a very smooth solid chassis, with the abrasive sheet of chassis size coupling, stick on chassis with being flattened, with cementing agent, the nickel based metal alloy substrates is fixed on fixture, by depression bar, fixture is pressed on abrasive sheet, pressure is applied to the sheet metal back side by fixture, can compensate the pressure differential at central authorities and edge.On depression bar, there is the counterweight can the alignment jig acting force downward to sheet metal.Start muller, set grinding rate, chassis starts uniform rotation.It should be noted that, chassis must be hard and smooth, and so just polishing metal sheet equably, make the sheet metal surfacing, reaches the minute surface requirement;
Need constantly to add a small amount of water to abrasive sheet in whole process of lapping, and generally need within 20 minutes, to change one time abrasive sheet, generally from coarse to fine, the abrasive sheet used in test is respectively 15 μ m, 6 μ m, 3 μ m, 1.5 μ m to the replacing order of abrasive sheet.Residual metal powder and some other spots are contained in metal substrate surface after grinding completes, ability rotary coating photoresist after need to being processed;
2, the pre-service of substrate: at first the metal alloy substrate being placed on to concentration is to clean in the NAOH solution more than 5%, metal substrate being put into to supersonic wave cleaning machine after rinsing well with clear water cleans several minutes again, clean with deionized water or distilled water flushing again, until the moisture film on metal substrate surface is complete;
After cleaning, clean metal substrate will carry out the drying processing at once, with filtering pressurized air, the moisture on metal substrate surface is dried up, and prevents that from there is water stain generation on surface.Again metal substrate is put into to heat in the baking oven of 100 ℃ of left and right again and dried 2 minutes, make the metal substrate surface keep dry to increase adherence before applying photoresist;
3, even glue: during spin coating, metal substrate is placed on the vacuum suction pallet of sol evenning machine, 10 seconds of low speed rotation first are set, allow photoresist drip after glue to spread and come, then 15～20 seconds of High Rotation Speed are set, make photoresist stick to equably the metal substrate surface.The rotating speed of the thickness of metal substrate photomask surface glue during mainly by the viscosity of photoresist and gluing decides: in the situation that 3500～4500 rev/mins of sol evenning machines, the thickness of photoresist is about 1 micron;
4, front baking: glue-coated metal substrate photoetching hectograph is put into to the baking oven the inside, oven temperature is adjusted to 110 ℃, dry 5 minutes.So that the abundant drying of photoresist film increases the adhesiveness of photoresist, to improve the resistance to corrosion of glue;
5, exposure: comprise and aiming at and exposure.Aligning is to make the micro optical element figure on mask clear with the miniature rear focusing of metal substrate of having got rid of glue.What test was used is the high-pressure sodium lamp ultraviolet source.Make light path for the micro optical element transmission-type, the metal substrate that has got rid of glue is placed on objective table, then will utilize the micro optical element figure mother matrix that digital photolithography mechanism performs to put on the instant-plugging mask frame, by focus control, make figure imaging on the photoetching hectograph the most clear (picture dwindled by 10:1).Again by testing definite Time Exposure (generally at 10～20 seconds);
6, rear baking: after exposure, need to be toasted to the metal substrate photoetching hectograph of the light that exposed to the sun the rear baking of i.e. exposure, be mainly the standing wave effect produced while reducing exposure.During due to baking, high temperature causes emulsion to spread in photoresist, thereby makes the border of exposure region and non-exposed area become more even;
7, develop: dry cooled metal substrate after exposing and take out, developed under sodium monochromatic light (gold-tinted).By developing, the part of positive photoresist exposure is owing to having absorbed light, and photoresist becomes the dissolved of solubility and removes, and unexposed part is left.It is vital in the development link grasping development time and temperature.The developer solution used in experiment is the sodium hydroxide solution that concentration is 3～5 ‰.The development temperature Optimal Control is at 21 ± 1 ℃.Development time is half a minute, finally uses the warm water photographic fixing;
8, post bake: the metal substrate after development must be processed through first drying again, with the adhesion between glued membrane after forcing and metal substrate, thereby makes photoresist can in etching, play the effect of the protection micro optical element figure that generates.The selection of the temperature and time of post bake is that metal substrate is placed in the baker of 110 ℃ and dries 2 minutes;
9, the electrochemical etching of metal substrate: purpose is that the micro optical element figure on photoresist is finally transferred on metal substrate.By through develop and after the metal alloy substrate that cures put into the electrolytic solution configured and carry out etching.Due to the corrosion resistivity of photoresist, the metal surface that is attached with the place of photoresist is protected, and exposed metal substrate surface will be etched away a part, just can obtain the figure consistent with micro optical element on photoresist after etching completes, as shown in Figure 3.Formula and the condition of work of electrochemical etching liquid are as shown in the table.
| Technical recipe | Deal |
| The concentrated sulphuric acid (H 2SO 4） | 900g/L(98% concentration 489.1mL) |
| Strong phosphoric acid (H 3PO 4） | 750g/L(98% concentration 441.2mL) |
| Citric acid (C 6H 8O 7） | 60g/L |
| Ammonium citrate (C 6H 5O 7（NH 4） 3） | 20g/L |
| Deionized water | 50mL |
| The anode current amount | 0.5A |
| Operating voltage | 9V |
| Electrolyte temperature | Room temperature |
| Polishing time | 15～40s |
| Anode material | Nickel based metal alloy substrates to be etched |
| Cathode material | Stereotype or corrosion resistant plate |
10, remove photoresist: will carry out surface after metal alloy substrate etching and remove photoresist.Under the condition of room temperature, the metal substrate after etching is placed in the sodium hydroxide solution that concentration is 5% and soaks the residual photoresist that can remove the metal substrate surface in 1～2 minute.As shown in Figure 2, for its process flow diagram, finally obtain the core rod finished product, micro optical element (concavo-convex) figure is retained on metal substrate, has listed as shown in Figure 4 the diffractive micro-optical elements such as binary raster, Darman raster, Ronchi grating and Fresnel zone plate;
11, metal alloy core rod, its diameter is 18mm, size contrasts as shown in Figure 5 with disme, has listed the pictorial diagram of several different metal alloy core rods in figure;
12, injection mold assembling, be illustrated in figure 6 the mold integral assembling section, assembling gets final product according to a conventional method, and 4 kinds of (8) the diffractive micro-optical element nickel based metal alloy substrates (core rod) that will make figure before installation embed wherein successively, and the distribution of micro optical element core rod as shown in Figure 7;
13, injection machine injection moulding, be assemblied in injection mold on precise injection machine according to a conventional method, and blanking is selected the optical plastics such as PMMA;
14, injection-molded finished, diffractive micro-optical element finally is retained on optical plastic; Impinge perpendicularly on the diffractive micro-optical element finished product with the He-Ne Lasers of a branch of redness, because finished product is the optical plastic that transparency is higher, therefore, can obtain the diffraction pattern of its transmitted light on receiving screen, as shown in Figure 8.
It is quite crucial containing the technology that the micro optical element of diffracting surface microstructure copied.It requires existing reproduction technology can be had Hi-Fi copying, and can make the diffraction efficiency of surperficial micro optical element and the value that homogeneity approaches original microstructure (binary or many ledge structures).Injection mold is the main tool that diffractive micro-optical element copies moulding, and in general these normally mass productions of injection mo(u)lding duplicate, therefore requiring plastic injection mould should have in use few processing after high-level efficiency, high-quality and moulding or do not reprocess the characteristics of (repairing a die), is high-temperature nickel-based metal alloy so core material selects.
The design and fabrication of injecting smart mould is one of the most key part of the present invention, because the quality of mould is directly connected to the quality of finished product element.As shown in Figure 6, the design for the injection of this experiment essence mould mainly divides three parts: the design of runner, the design of die cavity and the design of placing the die cavity of mother matrix core.The design of runner and core die cavity is all to design and arrange according to the design of die cavity.Runner is the gate channel that makes the optical plastic of melting steadily enter each die cavity multi-cavity from sprue; The die cavity part, the overall exterior shape of main composition diffractive micro-optical element goods; The core rod of core cavity section is mother matrix nickel based metal alloy substrates namely, and the above has the diffractive micro-optical element pattern formed after the techniques such as overexposure and electrochemical etching, the detailed shape of main composition micro optical element goods.
The layout of runner is to arrange according to the layout of die cavity, and both are unified, restriction mutually mutually.Take sprue as the center of circle, and whole runner layout size is 124mm * 124mm, and the die cavity diameter is about 18mm, and thickness is about 3mm, and the runner cross section diameter is respectively 6mm, 5mm and 1.5mm from coarse to fine, and runner length is about 50mm.End at runner is provided with cold slug well, prevents that cold burden from entering die cavity.From reducing injection molding cost consideration, this making adopts the distribution form of a multi-cavity mold, is provided with altogether 8 die cavities, take sprue as the center of circle, is annular and arranges, as shown in Figure 7.Because diffractive micro-optical element has the high-flatness requirement, so each die cavity also must reach the minute surface requirement by grinding and polishing.For guaranteeing homogeneous heating, in the die cavity bottom, also be provided with heater strip simultaneously.
The layout of this runner belongs to balanced type and distributes, be characterized in: the length of the runner from sprue to each die cavity, cross dimensions and shape thereof are identical, in order to guarantee the balanced charging simultaneously of each die cavity, inject complete simultaneously, both saved materials, manufactured also more convenient.The diameter of core cavity section is 18mm, consistent with the diameter of mother matrix nickel based metal alloy substrates, in order to guarantee the nickel based metal alloy substrates (core rod) of the diffractive micro-optical element array pattern made can be packed into.
The method that shortens injection time can adopt larger injection pressure when injection, the optical-grade plastic melt filling time is shortened, when the design cast gate, just should make gate area less so, make runner as far as possible short, so just can improve the mobility of optical plastic melt, make the optical plastics such as PMMA can be full of very soon die cavity.Because the diffractive micro-optical element finished product is very high to the requirement of integrity degree, so the thick stick that ejects of finished product is not set in the Design of Dies of this experiment, but cavity lateral is designed to the inclined-plane of certain taper, allow the demoulding voluntarily of finished product micro optical element.
The detection of diffractive micro-optical element finished product mainly comprises surface topography, surfaceness, number of steps and the diffraction efficiency thereof of detecting element.Micro optical element surface topography, surfaceness and number of steps mainly can be observed by micro-profilometer or electron microscope.And the index of weighing the most critical of diffractive micro-optical element performance is exactly the size of diffraction efficiency.The He-Ne Lasers that is 633nm with a branch of wavelength impinges perpendicularly on the micro optical element finished product, because finished product is the optical plastic that transparency is higher, therefore can obtain the diffraction pattern of its transmitted light on receiving screen, as shown in Figure 8, detect the light intensity P of transmission with the light power meter pointwise, can calculate the diffraction efficiency (P wherein of the micro optical element finished product be replicated on optical plastic with following formula
0centered by the principal maximum light intensity).
Claims (3)
1. a method of making diffractive micro-optical element based on mask lithography technology and injection mo(u)lding is characterized in that said method comprising the steps of:
(1) make micro optical element metal alloy core rod: it is based on transmission-type imaging optical path experimental provision and realizes;
At first generate the optical element lay photoetching mask plate on chromium film glass offset plate, utilize the graphics edition design software to carry out the design of micro optical element mask on microcomputer, first obtain the micro optical element mask on the digital photolithography machine; 10 times of amplifications that finished product micro optical element figure on mask is body; After the light beam that the purple light light source sends expands and collimates through fiber optic point source, shine directly on the instant-plugging mask, the light beam transmitted through the prism beam splitter, again by 10 times of final minification object lens by the graphic projection on mask on the metal alloy substrate that applies photoresist, by focus control, make figure imaging on the photoetching hectograph the most clear; And the light beam transmitted requires with miniature object lens, photoetching hectograph coaxial; Due to the effect of prism beam splitter, clear monitoring on the CCD camera; The accurate automatically controlled large stroke translation stage of X-Y-axis and Z axis micropositioner will accurately project through the figure of 10 times of final minification on the photoetching hectograph;
Then utilize photoetching technique to make diffractive micro-optical element on metal alloy, the design and fabrication of core rod is to adopt electrochemical etching method, by the micro optical element graph transfer printing, to what obtain on the metal alloy substrate, this movable injection core is as the embedded core rod of the activity on the injection mould die;
(2) injection mo(u)lding of diffractive micro-optical element is made: the metal alloy substrate grinding and polishing-→ pre-service of substrate-→ the even glue of photoresist-→ front baking-→ exposure-→ rear the baking-→ develop-→ post bake-→ electrochemical etching of metal substrate-→ remove photoresist-→ the metal alloy core rod-→ the injection mold assembling-→ the injection machine injection moulding-→ injection-molded finished.
2. a kind of method of making diffractive micro-optical element based on mask lithography technology and injection mo(u)lding as claimed in claim 1, it is characterized in that the transmission-type imaging optical path experimental provision described in step (1) comprises the purple light light source, instant-plugging mask grillage, focus control, the prism beam splitter, the CCD camera, 10 times of miniature object lens of precision, the photoresist sheet substrate frame, the Z axis micropositioner, the accurate automatically controlled large stroke translation stage of X-Y-axis and microcomputer, wherein the purple light light source also comprises that pointolite expands and collimating mirror, the below of purple light light source is instant-plugging mask grillage, the centre of the focus control between instant-plugging mask grillage and 10 times of miniature object lens of precision is connected respectively prism beam splitter and CCD camera with a side, it under 10 times of miniature object lens of precision, is the photoresist sheet substrate frame, the photoresist sheet substrate frame connects Z axis micropositioner and the accurate automatically controlled large stroke translation stage of X-Y-axis of below, the accurate automatically controlled large stroke translation stage of X-Y-axis connects microcomputer.
3. a kind of method of making diffractive micro-optical element based on mask lithography technology and injection mo(u)lding as claimed in claim 1, the core material that it is characterized in that the injection molding described in step (2) is high-temperature nickel-based metal alloy, injection molding comprises the die cavity of the embedded mother matrix core rod of runner, die cavity and placement, and wherein the design of runner and core rod die cavity is all to design and arrange according to the requirement of die cavity; Runner is the gate channel that makes the optical plastic of melting steadily enter each die cavity multi-cavity from sprue; The die cavity part, the overall exterior shape of main composition diffractive micro-optical element goods; The core rod of core rod die cavity part is mother matrix nickel based metal alloy substrates namely, and the above has the diffractive micro-optical element figure formed after the techniques such as overexposure and electrochemical etching, the detailed shape of main composition micro optical element goods; Because the diffractive micro-optical element finished product is very high to the requirement of integrity degree, thus the thick stick that ejects of optical plastic finished product is not set in Injection Mold Design, but the core rod cavity lateral is designed to the inclined-plane of tapering, so that the demoulding voluntarily of micro optical element finished product.
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| CN111633881A (en) * | 2020-05-29 | 2020-09-08 | 中南大学 | Preparation method of grating structure color functional surface based on injection molding |
| CN113504594A (en) * | 2021-06-01 | 2021-10-15 | 南昌航空大学 | Simple manufacturing method of zero-thickness grating on surface of metal material |
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| CN105480938A (en) * | 2014-10-10 | 2016-04-13 | 中芯国际集成电路制造(上海)有限公司 | MEMS device and preparation method thereof, electronic device |
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| CN104597719B (en) * | 2015-01-12 | 2016-09-14 | 北京同方生物芯片技术有限公司 | Nickel positive mold manufacture method based on positive photoresist |
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| CN104890188A (en) * | 2015-05-03 | 2015-09-09 | 陈伟娅 | Spectacle lens mirror surface injection molding casting structure and die thereof |
| CN111505210A (en) * | 2020-04-29 | 2020-08-07 | 华中科技大学 | Integrated micromachining device for gas sensor chip |
| CN111633881A (en) * | 2020-05-29 | 2020-09-08 | 中南大学 | Preparation method of grating structure color functional surface based on injection molding |
| CN113504594A (en) * | 2021-06-01 | 2021-10-15 | 南昌航空大学 | Simple manufacturing method of zero-thickness grating on surface of metal material |
| CN114089476A (en) * | 2021-11-25 | 2022-02-25 | Oppo广东移动通信有限公司 | Optical waveguide lens, method for preparing optical waveguide lens and augmented reality equipment |
| KR102454787B1 (en) * | 2022-05-06 | 2022-10-14 | 주식회사피에스디이 | Automatic mold replacement type nano-impriniting lithography apparatus and method therefor |
| CN115420315A (en) * | 2022-08-30 | 2022-12-02 | 昂泰微精医疗科技(上海)有限公司 | Manufacturing process of ultramicro servo motor encoder grating disk |
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