CN103451617A - Shielding box for vacuum coating - Google Patents
Shielding box for vacuum coating Download PDFInfo
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- CN103451617A CN103451617A CN2013104300227A CN201310430022A CN103451617A CN 103451617 A CN103451617 A CN 103451617A CN 2013104300227 A CN2013104300227 A CN 2013104300227A CN 201310430022 A CN201310430022 A CN 201310430022A CN 103451617 A CN103451617 A CN 103451617A
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- Prior art keywords
- shielding
- coating
- shield blade
- shielding box
- shell
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Abstract
The invention discloses a shielding box for vacuum coating, which comprises a housing (1) and a plurality of shielding sheets (2). The shielding box is characterized in that the plurality of independently arranged shielding sheets (2) are arranged in the housing (1); the shielding sheets (2) are arranged in parallel; each shielding sheet (2) is provided with a plurality of through holes (3).Since the shielding box is provided with the independent shielding sheets and each shielding sheet is provided with the through holes, the shielding box can effectively adsorb the metal layer in the repeated coating or long-time coating process, and the metal residues can not fall to the coated workpiece, thereby reducing the coating defects of the coated workpiece, and achieving the goal of improving the optical and mechanical properties of the coated film layer. The independent shielding sheets can be easily extracted and separated and independently cleaned, thereby effectively reducing the unnecessary loss of human resources and material resources. The shielding box has the characteristics of simple structure and high adsorption efficiency, and is convenient to use; the shielding box can be independently or combinedly installed in a proper position near the coating source in the coating chamber.
Description
Technical field
The present invention relates to the coating technique field, specifically a kind ofly strengthen the plated film chamber to the adsorptive power of metal level and prevent the shielded cell for vacuum plating that metallic residue drops on workpiece to be plated in coating process.
Background technology
In the vacuum plating process, when the metallic vapor sent by coating source is deposited to workpiece to be plated, also can partly be splashed on the inwall of plated film chamber, in the course of time cause the accumulation of metal level on chamber inner wall, these metal levels can have influence on the working effect of chamber on the one hand, cleaning gets up to be not easy very much on the other hand, causes unnecessary manpower and materials loss.And along with the increase of coating times or time, the metal level deposited on the plated film chamber inner wall is also more and more thicker, and these metal levels adhere to and built on the sand, metallic residue just is very easy to drop on workpiece to be plated in coating process at the chamber wall surface, cause the coating defects of workpiece to be plated.
Summary of the invention
The objective of the invention is for the deficiencies in the prior art, the invention provides and a kind ofly strengthen the plated film chamber to the adsorptive power of metal level and prevent the shielded cell for vacuum plating that metallic residue drops on workpiece to be plated in coating process.
The objective of the invention is to solve by the following technical programs:
A kind of shielded cell for vacuum plating, comprise shell and shield blade, it is characterized in that in described shell being provided with a plurality of independent shield blade that arrange, shield blade be arranged in parallel each other and each shield blade on all be provided with a plurality of through holes.
The inwall that described shell is " Qian " shape and shell is provided with groove, and each shield blade is all inserted in shell along corresponding groove.
The through hole that described through hole is evenly distributed on shield blade and any two shield blade is all mutually corresponding.
Described shell and shield blade adopt steel, copper material, aluminium or alloy material to make.
The present invention has the following advantages compared to existing technology:
The shielded cell that the present invention adopts, there are a plurality of emptying apertures owing to having on a plurality of independently shield blade and each shield blade, can be in plated film repeatedly or long-time plated film the active adsorption metal level, metallic residue can not drop on workpiece to be plated yet, thereby reduced the coating defects of workpiece to be plated, reached the purpose of improving plated film rete optics and mechanical property; This shielded cell can be arranged near the suitable position of coating source in the plated film chamber as required alone or in combination.
There are a plurality of separate shield blade in shielded cell of the present invention, can extract as required and separate and clean separately, effectively reduced unnecessary manpower and materials loss; There are characteristics simple in structure, easy to use and that adsorption efficiency is high, suitable promoting the use of.
The accompanying drawing explanation
Accompanying drawing 1 is structural representation of the present invention.
Wherein: 1-shell; 2-shield blade; 3-through hole.
Embodiment
Below in conjunction with accompanying drawing and embodiment, the present invention is further illustrated.
As shown in Figure 1: a kind of shielded cell for vacuum plating, comprise shell 1 and shield blade 2, shell, 1 and shield blade 2 adopt steel, copper material, aluminium or alloy material to make, be provided with a plurality of independent shield blade 2 that arrange in shell 1, shield blade 2 be arranged in parallel each other and each shield blade 2 on all be provided with a plurality of through holes 3, it is all mutually corresponding that through hole 3 is evenly distributed on through hole 3 on shield blade 2 and any two shield blade 2.Specifically, the inwall that shell 1 is " Qian " shape and shell 1 is provided with groove, and each shield blade 2 is all inserted in shell 1 along corresponding groove.
The shielded cell that the present invention adopts, there are a plurality of emptying apertures 3 owing to having on a plurality of independently shield blade 2 and each shield blade 2, can be in plated film repeatedly or long-time plated film the active adsorption metal level, metallic residue can not drop on workpiece to be plated yet, thereby reduced the coating defects of workpiece to be plated, reached the purpose of improving plated film rete optics and mechanical property; A plurality of separate shield blade 2 can extract as required separates and cleans separately, has effectively reduced unnecessary manpower and materials loss; This shielded cell there are characteristics simple in structure, easy to use and that adsorption efficiency is high, therefore can be arranged near the suitable position of coating source in the plated film chamber as required alone or in combination.
Above embodiment only, for explanation technological thought of the present invention, can not limit protection scope of the present invention with this, every technological thought proposed according to the present invention, and any change of doing on the technical scheme basis, within all falling into protection domain of the present invention; The technology that the present invention does not relate to all can be realized by prior art.
Claims (4)
1. the shielded cell for vacuum plating, comprise shell (1) and shield blade (2), it is characterized in that in described shell (1) being provided with a plurality of independent shield blade (2) that arrange, shield blade (2) be arranged in parallel each other and each shield blade (2) on all be provided with a plurality of through holes (3).
2. the shielded cell for vacuum plating according to claim 1, is characterized in that the inwall that described shell (1) is " Qian " shape and shell (1) is provided with groove, and each shield blade (2) is all inserted in shell (1) along corresponding groove.
3. the shielded cell for vacuum plating according to claim 1, is characterized in that described through hole (3) is evenly distributed on all mutual correspondence of through hole (3) on shield blade (2) and any two shield blade (2).
4. the shielded cell for vacuum plating according to claim 1, is characterized in that described shell (1) and shield blade (2) adopt steel, copper material, aluminium or alloy material to make.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310430022.7A CN103451617B (en) | 2013-09-22 | 2013-09-22 | A kind of shielded box for vacuum coating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310430022.7A CN103451617B (en) | 2013-09-22 | 2013-09-22 | A kind of shielded box for vacuum coating |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103451617A true CN103451617A (en) | 2013-12-18 |
| CN103451617B CN103451617B (en) | 2016-06-15 |
Family
ID=49734443
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310430022.7A Active CN103451617B (en) | 2013-09-22 | 2013-09-22 | A kind of shielded box for vacuum coating |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103451617B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109355631A (en) * | 2018-11-29 | 2019-02-19 | 宁波江丰电子材料股份有限公司 | The device and its processing method of uniformity of film are improved in sputtering system |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10140351A (en) * | 1996-11-05 | 1998-05-26 | Kobe Steel Ltd | Inline type vacuum film forming device |
| CN201400713Y (en) * | 2009-03-06 | 2010-02-10 | 中国南玻集团股份有限公司 | Baffle plate structure of vacuum coating |
| CN203559120U (en) * | 2013-09-22 | 2014-04-23 | 无锡启晖光电科技有限公司 | Shielding box for vacuum plating |
-
2013
- 2013-09-22 CN CN201310430022.7A patent/CN103451617B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10140351A (en) * | 1996-11-05 | 1998-05-26 | Kobe Steel Ltd | Inline type vacuum film forming device |
| CN201400713Y (en) * | 2009-03-06 | 2010-02-10 | 中国南玻集团股份有限公司 | Baffle plate structure of vacuum coating |
| CN203559120U (en) * | 2013-09-22 | 2014-04-23 | 无锡启晖光电科技有限公司 | Shielding box for vacuum plating |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109355631A (en) * | 2018-11-29 | 2019-02-19 | 宁波江丰电子材料股份有限公司 | The device and its processing method of uniformity of film are improved in sputtering system |
| CN109355631B (en) * | 2018-11-29 | 2020-12-22 | 宁波江丰电子材料股份有限公司 | Device for improving film uniformity on sputtering system and processing method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103451617B (en) | 2016-06-15 |
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Effective date of registration: 20160229 Address after: 214213, Jiangsu Yixing economic and Technological Development Zone Pioneer Park two phase A5 building Applicant after: JIANGSU YITA NEW MATERIAL TECHNOLOGY CO., LTD. Address before: Huishan Economic Development Zone Xingzhi WITHUB Park B District 39-37-101 road 214174 Jiangsu city of Wuxi Province Applicant before: Wuxi Qihui Photoelectric Technology Co., Ltd. |
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