CN103424794A - Transmission-type spectro-grating and interference lithography system - Google Patents
Transmission-type spectro-grating and interference lithography system Download PDFInfo
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- CN103424794A CN103424794A CN201310395325XA CN201310395325A CN103424794A CN 103424794 A CN103424794 A CN 103424794A CN 201310395325X A CN201310395325X A CN 201310395325XA CN 201310395325 A CN201310395325 A CN 201310395325A CN 103424794 A CN103424794 A CN 103424794A
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/10—Beam splitting or combining systems
- G02B27/1086—Beam splitting or combining systems operating by diffraction only
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1842—Gratings for image generation
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1866—Transmission gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70408—Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect
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Abstract
Provided are a transmission-type spectro-grating and an interference lithography system. The transmission-type spectro-grating comprises a grating groove-shaped area placed on an incident plane and a light blocking area placed on the periphery of the grating groove-shaped area. The grating groove-shaped area comprises a stair-shaped grating structure, and the stair-shaped grating structure is provided with a transmission stair plane and a non-transmission area. The transmission-type spectro-grating can achieve maximum modulation to +/-1 level light, beam splitting light which is transmitted out is made to have the highest energy utilization rate, and an interference pattern obtained through the transmission-type spectro-grating has good border quality, is capable of achieving conducting of precise splicing patterns, and enables a large-size interference lithography technology to be improved obviously.
Description
Technical field
The present invention relates to technical field of lithography, the spectro-grating of particularly using in a kind of interference photoetching technology and the interference lithography system of utilizing this spectro-grating to form.
Background technology
Interference photoetching technology is the important branch in photoetching technique, has been subject in recent years paying attention to widely.The main advantage of interference lithography is to obtain very high graphics resolution.In the situation that the wavelength X of optical system and numerical aperture NA are certain, the obtainable minimum feature of interference optics is λ/(4NA), be 1/2 of common projection imaging optical system.In addition, the interference lithography light path is simple, and the figure cycle of preparation is accurate, good uniformity.
Interference light is carved with the light path scheme of two quasi-representatives.Light path scheme one is the holographic light path of taking.(reference: PhD dissertation Toward Nano-accuracy in Scan Beam Interference Lithography P24-26) typical light path as shown in Figure 1, laser beam is divided into two by semi-transparent semi-reflecting spectroscope, then separately after filtering and expand, finally at surface of the work, form the interference of two light beams.The main limitation of this light path scheme have following some:
The first, optical path length, volume is large, and anti-interference performance is poor.Simultaneously, light path is had relatively high expectations to the coherent length of laser.Generally be applicable to Experiments of Optics indoor, be not suitable in the optics process equipment.The second, the photoetching breadth is limited.Be subject to the restriction in the aperture of beam expanding lens, the interference lithography zone is generally less than 300mm.If increase the aperture of beam expanding lens, manufacture difficulty and cost significantly increase.The 3rd, the graphical quality at the edge of patterned area is poor.At first, because the light distribution on beam cross section becomes Gaussian distribution, cause the light intensity at patterned area edge relatively obviously to weaken (referring to Fig. 2) in middle part.Secondly, parallel beam that neither be strict through the laser beam of beam expanding lens output, but a spherical wave, causing thus the striped in interference lithography zone is not strict parallel lines, but is hyperbola distribution, edge region is (referring to Fig. 3) especially obviously.
Due to above-mentioned the 3rd point.Its exposure area is not easy to realize accurate splicing exposure, thereby has limited this scheme for the large format photoetching.
Light path scheme two is projection imaging light paths.This light path scheme, compare the holographic light path of taking, and has following clear superiority:
Light path is short, volume is small and exquisite, anti-interference internal force is strong, is applicable in the optics process equipment.Owing to combining imaging optical path, the shape of its exposure area and profile are easy to control, and are conducive to realize large tracts of land splicing exposure.
Can adopt multiple light-splitting device on concrete light-splitting method, wherein the light-splitting method based on diffraction grating is important representative wherein, and it has following advantage:
One, to the coherence of lighting source, require low.
Two, light channel structure is simple and reliable, and is easy to combine with the projection imaging light path.
Three, the multi-stage light after beam splitting has good consistance.
Four, core original paper diffraction grating, volume is small and exquisite, is easy to preparation.
Due to above-mentioned advantage, the projection optical interference circuit based on the diffraction grating light splitting occupies critical role in interference lithography, and its light path typical structure as shown in Figure 4.
Diffraction grating is core parts in this type of light path system.For the two-beam interference of realizing ideal, the COMPLEX AMPLITUDE of the order of diffraction of desirable diffraction grating output as shown in Figure 5: the intensity of '+1 ' grade and ' 1 ' grade is equal, and to have concentrated the whole energy in the light field, other order of diffraction energy be zero.
In fact, existing diffraction grating can't reach above-mentioned ideal distribution.Several structures that are easy to preparation of the general employing of existing diffraction grating, its Typical Representative is cosine phase grating and rectangular bit phase grating.The former is usually general adopts holographic method of taking to make, and the latter adopts the methods such as laser direct-writing and mask exposure to make usually.
The order of diffraction COMPLEX AMPLITUDE obtained based on these two kinds of diffraction grating, still have larger gap with ideal distribution.Even to its structural parameters, comprise that cycle, groove depth and dutycycle etc. are regulated and controled and optimize, still can only obtain limited improvement.Its typical case's output order of diffraction distributes as shown in Figure 6.
Its main deficiency shows as:
First: ± 1 order diffraction efficiency has much room for improvement.Second: to the useless order of diffraction (0 grade and 2 grades of higher levels time), can't realize abundant inhibition.
For the first point, at present known sinusoidal phase grating ± the diffraction efficiency maximal value of 1 grade is about 68%; The rectangular bit phase grating, be 1/2 in dutycycle, and phase modulation is while being π, can obtain maximum ± 1 order diffraction efficiency approximately 81%.But still remain further to be improved.
For second point, the Noise and Interference of light field is larger.0 grade and 2 higher levels time sneak into ± 1 grade in.Even adopt diaphragm filtering, its filtering accuracy is difficult to realize.If diaphragm blocks very few, cause filtering unclean; If diaphragm blocks too much, damage ± 1 grade of light.Finally make in the interference fringe of exposure and have distortion and noise, and the graphical quality at edge is not good enough.
Due to above-mentioned the 2nd point.Its exposure area is not easy to realize accurate splicing exposure, thereby has limited this scheme for the large format photoetching.
Summary of the invention
In view of this, the present invention proposes a kind of transmission-type spectro-grating and interference lithography system.Adopt this spectro-grating and interference lithography system, the graphical quality of processing is higher, and is easy to realize large area precision splicing exposure.
To achieve these goals, the technical scheme that transmission-type spectro-grating of the present invention provides is as follows:
Comprise the grating flute profile district that is positioned at transmission plane and be positioned at peripheral De Zuguang district, this grating flute profile district, described grating flute profile district comprises the optical grating construction of periodic distribution, this optical grating construction has flute profile transmission plane and non-transmissive district, forms an oblique angle between described flute profile transmission plane and grating basal plane.
Preferably, the dutycycle of described flute profile transmission plane and described optical grating construction is 0.6-0.8.
Preferably, the dutycycle of described flute profile transmission plane and described optical grating construction is
Preferably, described non-transmissive district is the zanjon structure, and its degree of depth is greater than the depth capacity of described flute profile transmission plane.
Preferably, described Zu Guang district is provided with the resistance luminescent material.
Preferably, the optical grating construction of described periodic distribution is one-dimensional grating or two-dimensional grating.
Further, the technical scheme of a kind of interference lithography system provided by the invention is as follows:
Comprise light source, beam splitting device, projection optics mirror group and article carrying platform, described beam splitting device is above-mentioned transmission-type spectro-grating, and the light cross section of described light source emission is greater than the grating flute profile district size of described transmission-type spectro-grating.
Preferably, the light of described light source emission incides on the transmission plane of described transmission-type spectro-grating,
The incident direction of this light and described grating basal plane are formed into firing angle, meet following relation between described incident angle and described oblique angle:
[sin(θ)-sin(θ-2γ)]d/λ＝N+1/2，
Wherein, θ is incident angle, and γ is oblique angle, and N is natural number.
Preferably, described projection optics mirror group comprises at least two group lens combination, and those lens combination form imaging optical path, and described transmission-type spectro-grating forms the object plane of this imaging optical path, place a workpiece on described article carrying platform, this surface of the work forms the image planes of this imaging optical path.
Compared with prior art, technical scheme of the present invention has following technical advantage:
The first, interference lithography system of the present invention can realize to optical interference circuit required ± enhancing of 1 order diffraction light, and the useless order of diffraction time fully suppresses to other.Wherein, 0 grade of light is completely eliminated, and senior light more than 2 grades is also suppressed fully.Compare existing spectral interference optical machining system and method based on cosine phase grating or rectangular bit phase grating, optical grating construction proposed by the invention and supporting light path, ± 1 order diffraction efficiency is higher, reaches as high as 92.3%.
The second, compare existing interference lithography system, the homogeneity of the interference figure (striped or dot matrix) that interference lithography system of the present invention obtains is better, and the light distribution of the exposure light field of acquisition approaches desirable cosine distribution more.
The graphical quality at the exposure light field edge that three, interference lithography system of the present invention obtains significantly promotes, and is specially adapted to accurate splicing exposure to realize large area lithography.
Four, interference lithography system of the present invention is simple and reliable for structure, without diaphragm is set, carries out light field filtering.Adopt imaging optical path in light path, the profile of interference optical field and shape are determined by profile and the shape of diffraction grating self, control by the choice to a plurality of groove faces of diffraction grating, can realize that the pixelation of interference optical field pattern is controlled, thereby attainable graphics processing is not limited to cycle shape structure.
The accompanying drawing explanation
In order to be illustrated more clearly in the embodiment of the present invention or technical scheme of the prior art, below will the accompanying drawing of required use in embodiment or description of the Prior Art be briefly described, apparently, accompanying drawing in the following describes is only some embodiments of the present invention, for those of ordinary skills, under the prerequisite of not paying creative work, can also obtain according to these accompanying drawings other accompanying drawing.
Fig. 1 is typical optical interference circuit structural representation;
Fig. 2 is the distribution schematic diagram of interference region light intensity;
Fig. 3 is the distortion schematic diagram of typical interference fringe;
Fig. 4 is the interference lithography system architecture schematic diagram of existing projection imaging;
Fig. 5 is the diffraction spectrum of desirable spectro-grating;
Fig. 6 is the diffraction spectrum of the existing spectro-grating of reality;
Fig. 7 A is the structural representation of transmission-type spectro-grating of the present invention;
Fig. 7 B is the structural representation of the projection-type spectro-grating of another embodiment of the present invention;
Fig. 8 is the structural representation of interference lithography system of the present invention;
Fig. 9 is the order of diffraction COMPLEX AMPLITUDE of transmission-type spectro-grating of the present invention;
Figure 10 is the optical microscope figure of the single exposure interference figure of employing interference lithography system acquisition of the present invention.
Embodiment
As described in the background art, in existing interference lithography technique, while using diffraction grating as light-splitting device, because there is the defect that diffraction efficiency is low and the useless order of diffraction can't fully suppress in diffraction grating, there is the problem of the unintelligible and marginal distortion of striped in the interference image while making exposure.
Therefore the object of the invention is to propose a kind of interference photoetching technology that is applied in the transmission-type spectro-grating in interference lithography technique and uses this spectro-grating, this transmission-type spectro-grating can be when improving diffraction grating ± 1 order diffraction efficiency, suppress the diffraction light energy of other grade time, especially the efficiency of 0 grade of light and ± 2 grades of light, make this grating ± 1 order diffraction efficiency can reach more than 92%, obviously is better than the diffraction efficiency of existing spectro-grating.
Below, will be described in detail technical scheme of the present invention.
Refer to Fig. 7 A, Fig. 7 A is the structure of transmission-type spectro-grating of the present invention.As shown in the figure, this spectro-grating 1 comprises the grating flute profile district 11 that is positioned at the plane of incidence 10 and is positioned at this 11 peripheral De Zuguang districts 12, grating flute profile district.In general, grating flute profile district 11 is shaped as circle or square, while certainly this grating grooved district 11 being designed to other shape, also without prejudice to the use of this spectro-grating 1.The area in grating grooved district 11 is unsuitable excessive, should guarantee to expand light source irradiation on this spectro-grating 1 time, the size of hot spot is greater than the area in this grating grooved district 11, so, after incident ray shines the plane of incidence 10 of spectro-grating 1, hot spot in grating grooved district 11 partly is transmitted, the hot spot part that is positioned at Zu Guang district 12 is absorbed or reflects, for the diffraction grating of the full chi optical grating construction in common surface, the present invention is by limiting the distribution size of grating groove zone at whole grating surface, play the effect of a diaphragm, make the hot spot be transmitted there is good border consistance, can realize the border auto-alignment of each exposure without any technique of alignment.Can reduce again useless transmitted light optical interference circuit is caused to unnecessary impact simultaneously.
Described grating flute profile district 11 comprises the stepped optical grating construction 110 that the degree of depth increases progressively gradually, has transmission cascaded surface 111 and non-transmissive district 112 on each ladder of this stepped optical grating construction.The ladder angle of described stepped optical grating construction is γ.At another kind of embodiment, the cascaded surface of this stepped optical grating construction can be also inclined-plane, as shown in Figure 7 B.When incident ray incides on this optical grating construction, the part on transmission cascaded surface 111 is transmitted, and the part in non-transmissive district 112 is absorbed.Transmission cascaded surface 111 is similar to common blazed grating principle, plays the effect of diffraction light splitting.Different from common diffraction spectro-grating is, spectro-grating of the present invention, in optical grating construction, added non-transmissive zone, this non-transmissive district 112 and transmission cascaded surface 111 have formed the optical grating construction of single-order jointly, utilize non-transmissive district 112 to realize the dutycycle regulation and control for transmission cascaded surface 111, when needing transmission cascaded surface 111 to account for the ratio of whole optical grating construction when large, that non-transmissive district 112 is designed is less, and dutycycle hour that need to transmission cascaded surface 111 is shared can strengthen the size in non-transmissive district 112.The effect of playing for above-mentioned adjusting, will be described in detail hereinafter.
Further, this non-transmissive district 112 can be the light dark space formed by being produced on surperficial resistance luminescent material, when light incides this subregion, can't form transmission.
Further, this stair-stepping optical grating construction 110 can be one-dimensional grating or two-dimensional grating.For one-dimensional grating, the exposure figure formed after interfering through beam splitting light is light and dark striated figure.To and two-dimensional grating, the exposure figure formed after beam splitting light is interfered is light and dark dot pattern.
Described Zu Guang district 12 is formed by the resistance luminescent material that is produced on the spectro-grating surface, and this resistance luminescent material can not cause light transmissive material for black dyes, ink or its.
Refer to Fig. 8, Fig. 8 is the structural representation of interference lithography system of the present invention.As shown in the figure, this interference lithography system comprises light source 20, beam splitting device 10, projection optics mirror group 30 and article carrying platform 40.Beam splitting device 10 is above-mentioned transmission-type spectro-grating, and light source 20 preferably adopts the LASER Light Source that coherence property is good, and the light beam that this LASER Light Source is sent, through suitable collimation with after expanding light path, forms transmitted light on the oblique transmission plane that is mapped to beam splitter part 10.Usually, require the hot spot cross-sectional sizes of this incident beam to be greater than the grating flute profile district size of transmission-type spectro-grating.So just can make the border of transmitted light naturally be limited by the border in grating flute profile district, need not consider the problem of aiming at.
Processing work or optical system are carried in described article carrying platform 40 holders, and this article carrying platform 40 is movable on X, two dimensions of Y.By controlling relatively moving of article carrying platform and optical system, can realize large-area lithography process.
Described projection optics mirror group 30 comprises at least two group lens 31 and 32, and these two groups of lens 31 and 32 form imaging optical path.The transmission plane of transmission-type spectro-grating wherein is object plane, and the surface of the work of placing on article carrying platform 40 is image planes.Incident beam, after 10 light splitting of beam splitting device, then passes through projection optics mirror group 30, finally on the processing work surface be placed on article carrying platform 40, forms the two-beam interference exposure.
Further, the transmission-type spectro-grating ± 1 grade of light is formed in the equivalent stop of described projection optics mirror group, and the light of all the other grade time is formed on outside this equivalence diaphragm.In figure, 22 is equivalent stops of projection optics mirror group 30, and dependent optical element.Due to the limited aperture of projection optics mirror group, the light field that exceeds its effective aperture will be blocked and can't see through.
In order to understand better creativeness of the present invention and technique effect, below will do concrete analysis to the physical principle of above-mentioned transmission-type spectro-grating and the interference lithography system of utilizing this spectro-grating to form.It is pointed out that following theoretical analysis part is also the part of creative ideas of the present invention, but not the deduction of those skilled in the art's routine, the specific embodiment of the invention part is only a kind of concrete application of this invention creation.
According to the information optics theory, with the parallel light of unit amplitude, with the θ angle, incide on described spectro-grating 12, the order of diffraction COMPLEX AMPLITUDE obtained on frequency plane is:
Wherein λ is the incident light wavelength, the focal length that f is projection optics mirror group 31, the groove number that M is spectro-grating, the incident angle that θ is incident light, the ladder angle that γ is stepped optical grating construction, the groove width that d is single optical grating construction is the cycle, the shared width that a is flute profile transmission plane 111.
First of COMPLEX AMPLITUDE E is factor of diffraction by a single slit, and it has determined the envelope of E, and its profile is the sinc type function.
Second of COMPLEX AMPLITUDE E is the multislit interference factor.
The applicant, when this expression formula is carried out to mathematical analysis, draws to draw a conclusion:
1, in the situation that optical source wavelength λ and grating parameter (ladder angle γ and groove width d) are certain, change incidence angle θ, can be so that inferior the moving left and right of sinc envelope relatively of each order of diffraction.
According to this conclusion, especially, when incidence angle θ meets following formula:
[sin (θ)-sin (θ-2 γ)] d/ λ=N+1/2, N is integer.
Can be so that certain two order of diffraction time be arranged in the main peak of sinc envelope, and be symmetric.Can obtain thus the elimination fully to 0 grade of light, simultaneously ± 1 grade of light has been concentrated most energy of light field.
2, change the dutycycle a/d of transmission cascaded surface in whole optical grating construction, can realize each order of diffraction time the relative sinc envelope of spacing zero point spacing increase or reduce.
According to this conclusion, choose suitable dutycycle a/d, can realize ± senior more than 2 grades time be positioned at the sinc envelope zero point near, thereby fully suppressed.Usually, while being chosen between 0.6-0.8 by this dutycycle a/d, can obtain a higher diffraction efficiency.The optimum dutycycle of working as
The time, the maximal value 92.3% of can the obtain ± diffraction efficiency of 1 grade has provided each corresponding level time COMPLEX AMPLITUDE in Fig. 9.As shown in the figure, by appropriate dutycycle a/d and incident angle are set, in the diffraction spectrum of this spectro-grating, zero order light is eliminated, thereby the light more than ± 2 grades is suppressed near its shared amplitude energy minimum of spacing at zero point of sinc envelope, and the maximum of the diffraction efficiency of now ± 1 grade approaches desirable diffraction grating output efficiency.
Based on above-mentioned principle, in the spectro-grating of the present invention's design, not only consider the affect parameter of grating for the diffraction light splitting, be the parameters such as the ladder angle of grating and incident angle of light, also considered in this grating the modulation parameter for diffraction efficiency, add non-transmissive zone in optical grating construction, made the transmission cascaded surface account for the dutycycle of whole optical grating construction adjustable.So, can be so that the capacity usage ratio of the two bundle beam splitting light that obtained by spectro-grating of the present invention be maximum and the resolution of the conoscope image that forms is the highest.
Below, illustrate that the present invention utilizes the above-mentioned interference etching system to carry out the method for interference lithography exemplifying a specific embodiment.
1, adopt semiconductor laser as light source, optical maser wavelength is 405nm, laser power 200mw, and laser beam, after filtering and beam-expanding collimation, projects on the transmission plane of transmission-type spectro-grating.
2, projection optics mirror group 30 adopts micro projecting light path, and the micro multiple is optional to 100 times from 5 times according to lens ratio.In typical situation, adopt 20 times of camera lenses, its numerical aperture NA=0.45.
3, the material of spectro-grating is silicon, and parameter is as follows: cycle 10um, and the ladder angle of transmission cascaded surface (similar blazing angle) 13 degree, dutycycle is 0.75.Optimal incident angle in fact is about 27.4 degree, in actual light path, can finely tune incident angle, so that '+1 ' grade of Energy for Symmetrical with ' 1 ' grade equates.
4, specifically add man-hour, can adopt the flight Exposure mode, laser instrument is done short pulse exposure, platform continuous motion.The processing work surface is placed on to the machining area of article carrying platform, can obtains high working (machining) efficiency and positioning precision.During the flight exposure, can control the relative displacement speed between platform and photohead, each single width exposure figure is spliced, because single exposure figure of the present invention has good border quality, border distortion and resolution preferably can not occur, so, after having spliced, relatively existing interference lithography figure, just have better integrality and accuracy.
Refer to Figure 10, Figure 10 is the interference figure of the single exposure of employing interference lithography system acquisition of the present invention, as can be seen from the figure, at the pattern edge place, almost keeping complete boundary, and all interference dot matrix are also high-visible, effect is better than current interference lithography pattern far away.
In sum, the present invention proposes a kind of transmission-type spectro-grating and interference lithography system, this transmission-type spectro-grating can be realized the maximum modulation of right ± 1 grade light, make the beam splitting light that transmission is gone out there is the highest capacity usage ratio, the conoscope image of the acquisition by this transmission-type spectro-grating, there is good border quality, can complete and carry out accurate splicing figure, make the large format interference photoetching technology be promoted significantly.
To the above-mentioned explanation of the disclosed embodiments, make professional and technical personnel in the field can realize or use the present invention.Multiple modification to these embodiment will be apparent for those skilled in the art, and General Principle as defined herein can be in the situation that do not break away from the spirit or scope of the present invention, realization in other embodiments.Therefore, the present invention will can not be restricted to embodiment illustrated herein, but will meet the widest scope consistent with principle disclosed herein and features of novelty.
Claims (9)
1. a transmission-type spectro-grating, it is characterized in that: comprise the grating flute profile district that is positioned at the plane of incidence and be positioned at peripheral De Zuguang district, this grating flute profile district, described grating flute profile district comprises the stepped optical grating construction that the degree of depth increases progressively gradually, and this stepped optical grating construction has transmission cascaded surface and non-transmissive district.
2. transmission-type spectro-grating as claimed in claim 1, it is characterized in that: the dutycycle of described flute profile transmission plane and described optical grating construction is 0.6-0.8.
3. transmission-type spectro-grating as claimed in claim 1, it is characterized in that: the dutycycle of described flute profile transmission plane and described optical grating construction is
4. transmission-type spectro-grating as claimed in claim 1 is characterized in that: described non-transmissive district is by the light dark space that is produced on surperficial resistance luminescent material and forms.
5. transmission-type spectro-grating as claimed in claim 1, it is characterized in that: described Zu Guang district is provided with the resistance luminescent material.
6. transmission-type spectro-grating as claimed in claim 1, it is characterized in that: described stepped optical grating construction is one-dimensional grating or two-dimensional grating.
7. an interference lithography system, comprise light source, beam splitting device, projection optics mirror group and article carrying platform, it is characterized in that: described beam splitting device is the described transmission-type spectro-grating of claim 1 to 6, and the light cross section of described light source emission is greater than the grating flute profile district size of described transmission-type spectro-grating.
8. interference lithography system as claimed in claim 7, it is characterized in that: the light of described light source emission incides on the transmission plane of described transmission-type spectro-grating, the incident direction of this light and described grating basal plane are formed into firing angle, meet following relation between described incident angle and described oblique angle:
[sin(θ)-sin(θ-2γ)]d/λ＝N+1/2，
Wherein, θ is incident angle, and γ is oblique angle, and N is natural number.
9. interference lithography system as claimed in claim 7, it is characterized in that: described projection optics mirror group comprises at least two group lens combination, those lens combination form imaging optical path, described transmission-type spectro-grating forms the object plane of this imaging optical path, place a workpiece on described article carrying platform, this surface of the work forms the image planes of this imaging optical path.
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| CN201310395325.XA CN103424794B (en) | 2013-09-03 | 2013-09-03 | A kind of transmission-type spectro-grating and interference lithography system |
| PCT/CN2014/084170 WO2015032262A1 (en) | 2013-09-03 | 2014-08-12 | Transmission-type light-splitting grating and interference photoetching system |
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| WO2015032262A1 (en) * | 2013-09-03 | 2015-03-12 | 苏州大学张家港工业技术研究院 | Transmission-type light-splitting grating and interference photoetching system |
| JP2020038383A (en) * | 2019-11-07 | 2020-03-12 | 株式会社エガリム | Method for producing lighting device for holograms and method for producing holographic optical element |
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| CN102722091B (en) * | 2012-07-04 | 2014-04-30 | 苏州大学 | Two-beam interference photoetching method and system |
| CN103424794B (en) * | 2013-09-03 | 2016-01-20 | 苏州大学 | A kind of transmission-type spectro-grating and interference lithography system |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2015032262A1 (en) * | 2013-09-03 | 2015-03-12 | 苏州大学张家港工业技术研究院 | Transmission-type light-splitting grating and interference photoetching system |
| JP2020038383A (en) * | 2019-11-07 | 2020-03-12 | 株式会社エガリム | Method for producing lighting device for holograms and method for producing holographic optical element |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2015032262A1 (en) | 2015-03-12 |
| CN103424794B (en) | 2016-01-20 |
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