CN103424794B - A kind of transmission-type spectro-grating and interference lithography system - Google Patents
A kind of transmission-type spectro-grating and interference lithography system Download PDFInfo
- Publication number
- CN103424794B CN103424794B CN201310395325.XA CN201310395325A CN103424794B CN 103424794 B CN103424794 B CN 103424794B CN 201310395325 A CN201310395325 A CN 201310395325A CN 103424794 B CN103424794 B CN 103424794B
- Authority
- CN
- China
- Prior art keywords
- grating
- transmission
- light
- district
- spectro
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/10—Beam splitting or combining systems
- G02B27/1086—Beam splitting or combining systems operating by diffraction only
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1842—Gratings for image generation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1866—Transmission gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70408—Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect
Abstract
A kind of transmission-type spectro-grating and interference lithography system, this transmission-type spectro-grating comprises the grating flute profile district being positioned at the plane of incidence and the Zu Guang district being positioned at this periphery, grating flute profile district, described grating flute profile district comprises stepped optical grating construction, and this stepped optical grating construction has transmission echelon face and non-transmissive district.This transmission-type spectro-grating can realize the maximum modulation of right ± 1 grade light, the beam splitting light that transmission is gone out has the highest capacity usage ratio, by the conoscope image of the acquisition of this transmission-type spectro-grating, there is good borderline quality, can complete and carry out accurate splicing figure, large format interference photoetching technology is promoted significantly.
Description
Technical field
The present invention relates to technical field of lithography, the spectro-grating particularly used in a kind of interference photoetching technology and the interference lithography system utilizing this spectro-grating to be formed.
Background technology
Interference photoetching technology is the important branch in photoetching technique, receives in recent years and payes attention to widely.The main advantage of interference lithography is to obtain very high graphics resolution.When the wavelength X of optical system and numerical aperture NA certain, the obtainable minimum feature of interference optics is λ/(4NA), is 1/2 of common projection imaging optical system.In addition, interference lithography light path is simple, and the figure cycle of preparation is accurate, and homogeneity is good.
Interference light is carved with the light path scheme of two quasi-representatives.Light path scheme one is holographic shooting light path.(reference: PhD dissertation TowardNano-accuracyinScanBeamInterferenceLithographyP24-26) typical light paths as shown in Figure 1, laser beam is divided into two by semi-transparent semi-reflecting spectroscope, then separately after filtering and expand, the interference of two light beams is finally formed at surface of the work.The primary limitation of this light path scheme have following some:
The first, optical path length, volume is large, and resistance to interference performance is poor.Meanwhile, light path requires higher to the coherent length of laser.Generally be applicable to Experiments of Optics indoor, be not suitable in photo process equipment.The second, photoetching breadth is limited.By the restriction in the aperture of beam expanding lens, interference lithography region is generally less than 300mm.If increase the aperture of beam expanding lens, then manufacture difficulty and cost significantly increase.3rd, the graphical quality at the edge of patterned area is poor.First, because the light distribution on beam cross section becomes Gaussian distribution, cause the light intensity at patterned area edge relatively obviously to weaken (referring to Fig. 2) at middle part.Secondly, the parallel beam that the laser beam exported through beam expanding lens neither be strict, but a spherical wave, cause the striped in interference lithography region not to be strict parallel lines thus, but in hyperbola distribution, edge region especially obviously (referring to Fig. 3).
Due to above-mentioned 3rd point.Its exposure area is not easy to realize accurate splicing exposure, thus limits the program for large format photoetching.
Light path scheme two is projection imaging light paths.This light path scheme, compare holographic shooting light path, there is following clear superiority:
Light path is short, compact, anti-interference internal force strong, is applicable in photo process equipment.Owing to combining imaging optical path, the shape of its exposure area and profile are easy to control, and are conducive to realizing large area splicing exposure.
Concrete light-splitting method can adopt multiple light-splitting device, and be wherein important representative wherein based on the light-splitting method of diffraction grating, its tool has the following advantages:
One, low to the coherence requirement of lighting source.
Two, light channel structure is simple and reliable, and is easy to combine with projection imaging light path.
Three, the multi-stage light after beam splitting has good consistance.
Four, core original paper diffraction grating, compact, is easy to preparation.
Due to above-mentioned advantage, the projection optical interference circuit based on diffraction grating light splitting occupies critical role in interference lithography, and its light path typical structure as shown in Figure 4.
Diffraction grating is core parts in this type of light path system.In order to the two-beam interference of realizing ideal, the COMPLEX AMPLITUDE of the order of diffraction that desirable diffraction grating exports as shown in Figure 5: the intensity of '+1 ' level and '-1 ' level is equal, and has concentrated the whole energy in light field, and other order of diffraction energy is zero.
In fact, existing diffraction grating cannot reach above-mentioned ideal distribution.Several structure being easy to prepare of the general employing of existing diffraction grating, its Typical Representative is cosine phase grating and rectangular bit phase grating.The former is usually general adopts holographic method of taking to make, and the latter adopts the method such as laser direct-writing and mask exposure to make usually.
Based on the order of diffraction COMPLEX AMPLITUDE that these two kinds of diffraction grating obtain, still there is larger gap with ideal distribution.Even if to its structural parameters, comprise cycle, groove depth and dutycycle etc. and regulated and controled and optimize, still can only obtain limited improvement.Its typical case exports order of diffraction distribution as shown in Figure 6.
Its main deficiency shows as:
First: ± 1 order diffraction efficiency has much room for improvement.Second: abundant suppression cannot be realized to the useless order of diffraction (0 grade and 2 grades of higher levels time).
For the first point, sinusoidal phase grating known at present ± the diffraction efficiency maximal value of 1 grade is about 68%; Rectangular bit phase grating is 1/2 in dutycycle, and when phase modulation is π, can obtain maximum ± 1 order diffraction efficiency about 81%.But still need to be improved further.
For second point, the Noise and Interference of light field is larger.0 grade and 2 higher levels time are mixed into ± 1 grade in.Even if adopt diaphragm filtering, its filtering accuracy is difficult to realize.If diaphragm blocks very few, cause filtration unclean; If diaphragm blocks too much, damage ± 1 grade of light.Finally make to there is distortion and noise in the interference fringe exposed, and the graphical quality at edge is not good enough.
Due to above-mentioned 2nd point.Its exposure area is not easy to realize accurate splicing exposure, thus limits the program for large format photoetching.
Summary of the invention
In view of this, the present invention proposes a kind of transmission-type spectro-grating and interference lithography system.Adopt this spectro-grating and interference lithography system, the graphical quality of processing is higher, and is easy to realize large area precision splicing exposure.
To achieve these goals, the technical scheme that provides of transmission-type spectro-grating of the present invention is as follows:
Comprise the grating flute profile district being positioned at transmission plane and the Zu Guang district being positioned at this periphery, grating flute profile district, described grating flute profile district comprises the optical grating construction of periodic distribution, this optical grating construction has flute profile transmission plane and non-transmissive district, forms an oblique angle between described flute profile transmission plane and grating basal plane.
Preferably, the dutycycle of described flute profile transmission plane and described optical grating construction is 0.6-0.8.
Preferably, the dutycycle of described flute profile transmission plane and described optical grating construction is
Preferably, described non-transmissive district is zanjon structure, and its degree of depth is greater than the depth capacity of described flute profile transmission plane.
Preferably, described Zu Guang district is provided with resistance luminescent material.
Preferably, the optical grating construction of described periodic distribution is one-dimensional grating or two-dimensional grating.
Further, the technical scheme of a kind of interference lithography system provided by the invention is as follows:
Comprise light source, beam splitting device, projection optics mirror group and article carrying platform, described beam splitting device is above-mentioned transmission-type spectro-grating, and the light cross section that described light source is launched is greater than the grating flute profile district size of described transmission-type spectro-grating.
Preferably, the light that described light source is launched on the transmission plane of described transmission-type spectro-grating,
Incident direction and the described grating basal plane of this light form incident angle, meet following relation between described incident angle and described oblique angle:
[sin(θ)-sin(θ-2γ)]d/λ＝N+1/2，
Wherein, θ is incident angle, and γ is oblique angle, and N is natural number.
Preferably, described projection optics mirror group comprises at least two group lens combination, those lens combination composition imaging optical path, and described transmission-type spectro-grating forms the object plane of this imaging optical path, described article carrying platform is placed a workpiece, this surface of the work forms the image planes of this imaging optical path.
Compared with prior art, technical scheme of the present invention has following technical advantage:
The first, interference lithography system of the present invention can realize to needed for optical interference circuit ± enhancing of 1 order diffraction light, and other useless order of diffraction time fully to be suppressed.Wherein, 0 grade of light is completely eliminated, and senior the light of more than 2 grades is also suppressed fully.Compare the existing spectral interference optical machining system based on cosine phase grating or rectangular bit phase grating and method, optical grating construction proposed by the invention and supporting light path, ± 1 order diffraction efficiency is higher, reaches as high as 92.3%.
The second, compare existing interference lithography system, the homogeneity of the interference figure (striped or dot matrix) that interference lithography system of the present invention obtains is better, and the light distribution of the exposure light field of acquisition is more close to desirable cosine distribution.
Three, the graphical quality at the exposure light field edge of interference lithography system acquisition of the present invention significantly promotes, and is specially adapted to accurate splicing exposure to realize large area lithography.
Four, interference lithography system of the present invention is simple and reliable for structure, carries out light field filtering without the need to arranging diaphragm.Imaging optical path is adopted in light path, the profile of interference optical field and shape are determined by the profile of diffraction grating self and shape, by controlling the choice of the multiple groove face of diffraction grating, the pixelation that can realize interference optical field pattern controls, and thus attainable graphics processing is not limited to cycle shape structure.
Accompanying drawing explanation
In order to be illustrated more clearly in the embodiment of the present invention or technical scheme of the prior art, be briefly described to the accompanying drawing used required in embodiment or description of the prior art below, apparently, accompanying drawing in the following describes is only some embodiments of the present invention, for those of ordinary skill in the art, under the prerequisite not paying creative work, other accompanying drawing can also be obtained according to these accompanying drawings.
Fig. 1 is typical optical interference circuit structural representation;
Fig. 2 is the distribution schematic diagram of interference region light intensity;
Fig. 3 is the distortion schematic diagram of Typical interference striped;
Fig. 4 is the interference lithography system architecture schematic diagram of existing projection imaging;
Fig. 5 is the diffraction spectrum of desirable spectro-grating;
Fig. 6 is the diffraction spectrum of actual existing spectro-grating;
Fig. 7 A is the structural representation of transmission-type spectro-grating of the present invention;
Fig. 7 B is the structural representation of the projection-type spectro-grating of another embodiment of the present invention;
Fig. 8 is the structural representation of interference lithography system of the present invention;
Fig. 9 is the order of diffraction COMPLEX AMPLITUDE of transmission-type spectro-grating of the present invention;
Figure 10 is the optical microscope figure of the single exposure interference figure adopting interference lithography system of the present invention to obtain.
Embodiment
As described in the background art, in existing interference lithography technique, when using diffraction grating as light-splitting device, because diffraction grating exists the defect that the low and useless order of diffraction of diffraction efficiency cannot fully suppress, interference image when exposing is made to there is the unintelligible problem with marginal distortion of striped.
Therefore the object of the invention is to propose a kind of interference photoetching technology being applied in the transmission-type spectro-grating in interference lithography technique and using this spectro-grating, this transmission-type spectro-grating can while the order diffraction efficiency of raising diffraction grating ± 1, suppress the diffraction light energy of other grade time, especially the efficiency of 0 grade of light and ± 2 grades of light, make this grating ± 1 order diffraction efficiency can reach more than 92%, obviously be better than the diffraction efficiency of existing spectro-grating.
Below, will be described in detail technical scheme of the present invention.
Refer to Fig. 7 A, Fig. 7 A is the structure of transmission-type spectro-grating of the present invention.As shown in the figure, this spectro-grating 1 comprises the grating flute profile district 11 being positioned at the plane of incidence 10 and the Zu Guang district 12 being positioned at this periphery, grating flute profile district 11.In general, the shape in grating flute profile district 11 is circular or square, when certainly this grating grooved district 11 being designed to other shape, also without prejudice to the use of this spectro-grating 1.The area in grating grooved district 11 is unsuitable excessive, should ensure to expand light source irradiation on this spectro-grating 1 time, the size of hot spot is greater than the area in this grating grooved district 11, so, after incident ray is irradiated to the plane of incidence 10 of spectro-grating 1, be transmitted in the hot spot part in grating grooved district 11, the hot spot part being positioned at Zu Guang district 12 is then absorbed or is reflected, for the diffraction grating of the full chi optical grating construction in common surface, the present invention is by limiting the distribution size of grating groove region at whole grating surface, play the effect of a diaphragm, the hot spot be transmitted is made to have good border consistance, the border auto-alignment of each exposure can be realized without the need to any technique of alignment.Can reduce again useless transmitted light causes unnecessary impact to optical interference circuit simultaneously.
Described grating flute profile district 11 comprises the stepped optical grating construction 110 that the degree of depth increases progressively gradually, each ladder of this stepped optical grating construction has transmission echelon face 111 and non-transmissive district 112.The ladder angle of described stepped optical grating construction is γ.At another kind of embodiment, the cascaded surface of this stepped optical grating construction also can be inclined-plane, as shown in Figure 7 B.When incident ray incides on this optical grating construction, the part on transmission echelon face 111 is transmitted, and the part in non-transmissive district 112 is then absorbed.Transmission echelon face 111 is similar to common blazed grating principle, plays the effect of diffraction light splitting.With common diffraction spectro-grating unlike, spectro-grating of the present invention, in optical grating construction, add non-transmissive region, this non-transmissive district 112 and transmission echelon face 111 together form the optical grating construction of single-order, non-transmissive district 112 is utilized to realize regulating and controlling for the dutycycle in transmission echelon face 111, namely when need transmission echelon face 111 account for the ratio of whole optical grating construction large time, that is then designed in non-transmissive district 112 is less, and need the dutycycle hour shared by transmission echelon face 111, then can strengthen the size in non-transmissive district 112.For the effect that above-mentioned adjustment is played, will be described in detail hereinafter.
Further, this non-transmissive district 112 can be the light dark space formed by the resistance luminescent material being produced on surface, when light is to this subregion, cannot form transmission.
Further, this stair-stepping optical grating construction 110 can be one-dimensional grating or two-dimensional grating.For one-dimensional grating, the exposure figure formed after beam splitting light interference is light and dark striated figure.To and two-dimensional grating, the exposure figure formed after beam splitting light interference is then light and dark dot pattern.
Described Zu Guang district 12 is formed by the resistance luminescent material being produced on spectro-grating surface, this resistance luminescent material can for black dyes, ink or its can not cause light transmissive material.
Refer to Fig. 8, Fig. 8 is the structural representation of interference lithography system of the present invention.As shown in the figure, this interference lithography system comprises light source 20, beam splitting device 10, projection optics mirror group 30 and article carrying platform 40.Beam splitting device 10 is above-mentioned transmission-type spectro-grating, and light source 20 preferably adopts the LASER Light Source that coherence property is good, the light beam that this LASER Light Source sends, and through suitable collimation with after expanding light path, the oblique transmission plane being mapped to beam splitting device 10 forms transmitted light.Usually, require that the hot spot cross-sectional sizes of this incident beam is greater than the grating flute profile district size of transmission-type spectro-grating.So the border of transmitted light just can be made naturally to be limited by the border in grating flute profile district, the problem of aiming at need not be considered.
Described article carrying platform 40 holds in the palm and carries processing work or optical system, and this article carrying platform 40 is movable in X, Y two dimensions.By controlling the relative movement of article carrying platform and optical system, large-area lithography process can be realized.
Described projection optics mirror group 30 comprises at least two group lens 31 and 32, and these two groups of lens 31 and 32 form imaging optical path.The transmission plane of transmission-type spectro-grating is wherein object plane, and the surface of the work that article carrying platform 40 is placed is image planes.Incident beam after beam splitting device 10 light splitting, then through projection optics mirror group 30, is finally being placed in the formation two-beam interference exposure of the surface of the processing work on article carrying platform 40.
Further, transmission-type spectro-grating ± 1 grade of light is formed in the equivalent stop of described projection optics mirror group, and the light of all the other grade time is formed in outside this equivalent stop.In figure, 22 is equivalent stops of projection optics mirror group 30, and dependent optical element.Because the aperture of projection optics mirror group limits, the light field exceeding its effective aperture will be blocked and cannot be through.
In order to understand creativeness of the present invention and technique effect better, make a concrete analysis of to the physical principle of above-mentioned transmission-type spectro-grating and the interference lithography system that utilizes this spectro-grating to form below.It is pointed out that following theoretical analysis part is also a part for creative ideas of the present invention, but not the routine of those skilled in the art is inferred, specific embodiment of the invention part is only a kind of embody rule of this invention creation.
Theoretical according to information optics, with the parallel light of unit amplitude, incide on described spectro-grating 12 with θ angle, the order of diffraction COMPLEX AMPLITUDE that frequency plane obtains is:
Wherein λ is the wavelength of incident light, and f is the focal length of projection optics mirror group 31, and M is the groove number of spectro-grating, θ is the incident angle of incident light, γ is the ladder angle of stepped optical grating construction, and d is groove width and the cycle of single optical grating construction, and a is the shared width of flute profile transmission plane 111.
The Section 1 of COMPLEX AMPLITUDE E is factor of diffraction by a single slit, which determines the envelope of E, and its profile is sinc type function.
The Section 2 of COMPLEX AMPLITUDE E is the multislit interference factor.
Applicant, when carrying out mathematical analysis to this expression formula, draws to draw a conclusion:
1, when optical source wavelength λ and grating parameter (ladder angle γ and groove width d) certain, change incidence angle θ, each order of diffraction time the moving left and right of sinc envelope relatively can be made.
According to this conclusion, especially, when incidence angle θ meets following formula:
[sin (θ)-sin (θ-2 γ)] d/ λ=N+1/2, N is integer.
Certain two order of diffraction time can be made to be arranged in the main peak of sinc envelope, and to be symmetric.Can obtain the elimination completely to 0 grade of light thus, simultaneously ± 1 grade of light has concentrated most energy of light field.
2, change the dutycycle a/d of transmission echelon face in whole optical grating construction, can realize the relative sinc envelope of spacing of each order of diffraction time zero point spacing increase or reduction.
According to this conclusion, choose suitable dutycycle a/d, can realize ± near senior zero point time being positioned at sinc envelope of more than 2 grades, thus be adequately suppressed.Usually, when being chosen between 0.6-0.8 by this dutycycle a/d, a higher diffraction efficiency can be obtained.Optimum works as dutycycle
time, ± the maximal value 92.3% of the diffraction efficiency of 1 grade can be obtained, give each corresponding level time COMPLEX AMPLITUDE in fig .9.As shown in the figure, by arranging appropriate dutycycle a/d and incident angle, in the diffraction spectrum of this spectro-grating, zero order light is eliminated, the zero point that the light of more than ± 2 grades is suppressed in sinc envelope, the amplitude energy near spacing thus shared by it was minimum, and the diffraction efficiency of now ± 1 grade is maximum, close to desirable diffraction grating output efficiency.
Based on above-mentioned principle, in the spectro-grating of the present invention's design, not only consider the affecting parameters of grating for diffraction light splitting, the i.e. parameter such as ladder angle and incident angle of light of grating, have also contemplated that the modulation parameter for diffraction efficiency in this grating, namely in optical grating construction, add non-transmissive region, make transmission echelon face account for the dutycycle of whole optical grating construction adjustable.So, can make that the capacity usage ratio of the two bundle beam splitting light obtained by spectro-grating of the present invention is maximum and resolution that the is conoscope image formed is the highest.
Below, a specific embodiment is being exemplified to illustrate that the present invention utilizes above-mentioned interference etching system to carry out the method for interference lithography.
1, adopt semiconductor laser as light source, optical maser wavelength is 405nm, laser power 200mw, and laser beam, after filtering and beam-expanding collimation, projects on the transmission plane of transmission-type spectro-grating.
2, projection optics mirror group 30 adopts micro projecting light path, and micro multiple is optional to 100 times from 5 times according to lens ratio.In typical situation, adopt 20 times of camera lenses, its numerical aperture NA=0.45.
3, the material of spectro-grating is silicon, and parameter is as follows: cycle 10um, and 13 degree, the ladder angle (similar blazing angle) in transmission echelon face, dutycycle is 0.75.Optimal incident angle in fact is about 27.4 degree, can finely tune incident angle in actual light path, to make the Energy for Symmetrical of '+1 ' level and '-1 ' level equal.
4, specifically add man-hour, can adopt flight Exposure mode, namely laser instrument does Short pulse exposure, and platform moves continuously.Processing work surface is placed on the machining area of article carrying platform, high working (machining) efficiency and positioning precision can be obtained.During flight exposure, can relative displacement between parametric controller and photohead, each single width exposure figure is spliced, because single exposure figure of the present invention has good borderline quality, namely border distortion and good resolution can not be there is, so after having spliced, relatively existing interference lithography figure, has just had better integrality and accuracy.
Refer to Figure 10, Figure 10 is the interference figure of the single exposure adopting interference lithography system of the present invention to obtain, as can be seen from the figure, at pattern edge place, almost remain complete boundary, and all interference dot matrix are also high-visible, effect is better than current interference lithography pattern far away.
In sum, the present invention proposes a kind of transmission-type spectro-grating and interference lithography system, this transmission-type spectro-grating can realize the maximum modulation of right ± 1 grade light, the beam splitting light that transmission is gone out has the highest capacity usage ratio, by the conoscope image of the acquisition of this transmission-type spectro-grating, there is good borderline quality, can complete and carry out accurate splicing figure, large format interference photoetching technology is promoted significantly.
To the above-mentioned explanation of the disclosed embodiments, professional and technical personnel in the field are realized or uses the present invention.To be apparent for those skilled in the art to the multiple amendment of these embodiments, General Principle as defined herein can without departing from the spirit or scope of the present invention, realize in other embodiments.Therefore, the present invention can not be restricted to embodiment illustrated herein, but will meet the widest scope consistent with principle disclosed herein and features of novelty.
Claims (9)
1. a transmission-type spectro-grating, it is characterized in that: comprise the grating flute profile district being positioned at the plane of incidence and the Zu Guang district being positioned at this periphery, grating flute profile district, described grating flute profile district comprises the stepped optical grating construction that the degree of depth increases progressively gradually, each ladder of this stepped optical grating construction has transmission echelon face and non-transmissive district.
2. transmission-type spectro-grating as claimed in claim 1, is characterized in that: the dutycycle of described transmission echelon face and described optical grating construction is 0.6-0.8.
3. transmission-type spectro-grating as claimed in claim 1, is characterized in that: the dutycycle of described transmission echelon face and described optical grating construction is
4. transmission-type spectro-grating as claimed in claim 1, is characterized in that: described non-transmissive district forms light dark space by the resistance luminescent material being produced on this surface, non-transmissive district.
5. transmission-type spectro-grating as claimed in claim 1, is characterized in that: described Zu Guang district is provided with resistance luminescent material.
6. transmission-type spectro-grating as claimed in claim 1, is characterized in that: described stepped optical grating construction is one-dimensional grating or two-dimensional grating.
7. an interference lithography system, comprise light source, beam splitting device, projection optics mirror group and article carrying platform, it is characterized in that: described beam splitting device is the transmission-type spectro-grating described in claim 1 to 6, the light cross section that described light source is launched is greater than the grating flute profile district size of described transmission-type spectro-grating.
8. interference lithography system as claimed in claim 7, it is characterized in that: the light that described light source is launched is on the transmission echelon face of described transmission-type spectro-grating, the incident direction of this light and the basal plane of described stepped optical grating construction form incident angle, meet following relation between the ladder angle of described incident angle and described stepped optical grating construction:
[sin(θ)-sin(θ-2γ)]d/λ＝N+1/2，
Wherein, θ is incident angle, and γ is ladder angle, and N is natural number, and λ is the wavelength of incident light, and d is groove width and the cycle of single optical grating construction.
9. interference lithography system as claimed in claim 7, it is characterized in that: described projection optics mirror group comprises at least two group lens combination, these lens combination composition imaging optical path, described transmission-type spectro-grating forms the object plane of this imaging optical path, described article carrying platform is placed a workpiece, this surface of the work forms the image planes of this imaging optical path.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310395325.XA CN103424794B (en) | 2013-09-03 | 2013-09-03 | A kind of transmission-type spectro-grating and interference lithography system |
| PCT/CN2014/084170 WO2015032262A1 (en) | 2013-09-03 | 2014-08-12 | Transmission-type light-splitting grating and interference photoetching system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310395325.XA CN103424794B (en) | 2013-09-03 | 2013-09-03 | A kind of transmission-type spectro-grating and interference lithography system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103424794A CN103424794A (en) | 2013-12-04 |
| CN103424794B true CN103424794B (en) | 2016-01-20 |
Family
ID=49649804
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310395325.XA Expired - Fee Related CN103424794B (en) | 2013-09-03 | 2013-09-03 | A kind of transmission-type spectro-grating and interference lithography system |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN103424794B (en) |
| WO (1) | WO2015032262A1 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103424794B (en) * | 2013-09-03 | 2016-01-20 | 苏州大学 | A kind of transmission-type spectro-grating and interference lithography system |
| JP6854020B2 (en) * | 2019-11-07 | 2021-04-07 | 株式会社エガリム | Method for manufacturing a holographic lighting device and method for manufacturing a holographic optical element |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6341526B1 (en) * | 1998-07-29 | 2002-01-29 | Interscience, Inc. | Micromachined diffractive pressure sensor system |
| CN102955365A (en) * | 2011-08-22 | 2013-03-06 | 上海微电子装备有限公司 | Interference exposure device and method thereof |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0815510A (en) * | 1994-06-30 | 1996-01-19 | Nikon Corp | Binary optics and their production |
| US20030090763A1 (en) * | 2001-11-13 | 2003-05-15 | Adc Telecommunications, Inc. | Echelle grating interleaver |
| JP2005010423A (en) * | 2003-06-18 | 2005-01-13 | Nippon Telegr & Teleph Corp <Ntt> | Optical signal multiplexer/demultiplexer |
| JP4475501B2 (en) * | 2003-10-09 | 2010-06-09 | インターナショナル・ビジネス・マシーンズ・コーポレーション | Spectroscopic element, diffraction grating, composite diffraction grating, color display device, and duplexer |
| CN102722091B (en) * | 2012-07-04 | 2014-04-30 | 苏州大学 | Two-beam interference photoetching method and system |
| CN102998914B (en) * | 2012-12-31 | 2015-01-14 | 苏州大学 | Write-through lithography processing system and lithography method |
| CN103424794B (en) * | 2013-09-03 | 2016-01-20 | 苏州大学 | A kind of transmission-type spectro-grating and interference lithography system |
-
2013
- 2013-09-03 CN CN201310395325.XA patent/CN103424794B/en not_active Expired - Fee Related
-
2014
- 2014-08-12 WO PCT/CN2014/084170 patent/WO2015032262A1/en active Application Filing
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6341526B1 (en) * | 1998-07-29 | 2002-01-29 | Interscience, Inc. | Micromachined diffractive pressure sensor system |
| CN102955365A (en) * | 2011-08-22 | 2013-03-06 | 上海微电子装备有限公司 | Interference exposure device and method thereof |
Non-Patent Citations (1)
| Title |
|---|
| 阶梯透射光栅衍射效率的研究;张耀举;《中国激光》;20030731;第30卷(第7期);601-604 * |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2015032262A1 (en) | 2015-03-12 |
| CN103424794A (en) | 2013-12-04 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5016149A (en) | Illuminating method and illuminating apparatus for carrying out the same, and projection exposure method and projection exposure apparatus for carrying out the same | |
| CN103424795B (en) | A kind of reflective spectro-grating and interference lithography system | |
| CN102998914B (en) | Write-through lithography processing system and lithography method | |
| CN102565904B (en) | Method for preparing large-size grating by utilizing grating imaging scan lithography | |
| CN103488036B (en) | Holographic three-dimensional projection screen and projecting method thereof | |
| CN104111590B (en) | Based on the laser direct-writing device of combined vortex bivalve focal beam spot | |
| KR101560617B1 (en) | Light Generating Apparatus and Method For Controlling the Same | |
| CN103424996B (en) | A kind of optical machining system and method | |
| EP2977816B1 (en) | Pupil shaping optical system for lithography machine and method for generating off-axis illumination modes | |
| CN102722091B (en) | Two-beam interference photoetching method and system | |
| JP2018537718A (en) | Method and system for printing an array of geometric elements | |
| CN103424794B (en) | A kind of transmission-type spectro-grating and interference lithography system | |
| CN101221258A (en) | Three-dimensional ultra-discrimination diffraction optical device used for two-photon micro machining and its design method | |
| CN211661329U (en) | Micro axicon manufacturing device based on femtosecond laser refractive index modification technology | |
| CN102360091B (en) | Equipotential equal light intensity beam splitting Dammam optical grating and manufacturing method thereof | |
| CN102902192B (en) | A kind of for debuging or the Practical computer teaching holographic element of detecting optical element | |
| CN101295553B (en) | X ray holography diffraction grating beam divider | |
| CN105511074B (en) | The micro-nano light field modulating system of real time-varying parameter and interference lithography system | |
| JPH0611609A (en) | Exposure device | |
| US9869857B2 (en) | Optical grating phase modulator for laser interference photoetching system | |
| CN102736451B (en) | Three-beam interference lithography method and system | |
| CN103048789A (en) | Optical system producing long-distance light with similar non-diffraction grating type linear structure | |
| US9933703B2 (en) | Photolithographic illuminator device enabling controlled diffraction | |
| CN104765145A (en) | Achieving method of varifocal lens based on reflection-type micromirror arrays | |
| CN103760639A (en) | Method and device for manufacturing multiple two-dimensional photonic crystal structures |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20160120 Termination date: 20180903 |