CN101221258A - Three-dimensional ultra-discrimination diffraction optical device used for two-photon micro machining and its design method - Google Patents
Three-dimensional ultra-discrimination diffraction optical device used for two-photon micro machining and its design method Download PDFInfo
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- CN101221258A CN101221258A CNA2007101788110A CN200710178811A CN101221258A CN 101221258 A CN101221258 A CN 101221258A CN A2007101788110 A CNA2007101788110 A CN A2007101788110A CN 200710178811 A CN200710178811 A CN 200710178811A CN 101221258 A CN101221258 A CN 101221258A
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Abstract
A 3D super-resolution diffraction optical device used for double photon fine processing includes a circular body composed of an outside supporter and a transparent material. The surface of the body is provided with a plurality of concentric round ring areas and the thickness of each round ring area is different; the rules of the thickness of the each round ring area are as follows: the thickness difference of neighboring ring belts is one half of the wavelength Lambada of an incident light wave; the thickness difference of the neighboring ring belt areas leads the femtosecond lasers used by the polymerization processing of the double photons to generate a phase difference with a dimension of Pi after the femtosecond lasers respectively permeate the neighboring ring belt areas; the thicknesses of two areas separated by one ring belt are the same and the periphery dimension of the main body part is consistent with a diaphragm at an inlet of a microscopic objective in a double photon processing system. The optical device has the advantages of simple structure and low processing cost and can simultaneously improve the transverse and axial processing resolution of an original system. The apparatus can carry out detailed design aiming at different microscope values, can exert the 3D enhancement action during a double photon dry or oil dipping type fine processing and can be used for processing the two-dimensional patterns and 3D structure of submicron grade.
Description
Technical field
The present invention relates to the three-dimensional ultra-discrimination diffraction optical device and the method for designing thereof of two-photon microfabrication.
Background technology
Along with the develop rapidly of micro-nano technical applications, people not only carry out to minification and raising precision direction the requirement of microfabrication, and more and more towards processing variation and the development of device three-dimensional aspect.At back two requirements, middle and later periods nineteen nineties, the formal Fs laser double photon fine machining method that rises became the important supplement to traditional micro-nano process technology.
The Fs laser double photon Micrometer-Nanometer Processing Technology relates to technical fields such as contemporary optics, electronics, laser technology, exact instrument, computer technology and Based Intelligent Control, has become a research focus of recent micro-nano process technology.Existing Fs laser double photon microfabrication system as shown in Figure 1, primary structure comprises femto-second laser, light path switch, beam attenuation device, beam expander, completely reflecting mirror, microcobjective, micropositioner etc.Fs laser double photon microfabrication principle is to control by computer-controlled program
Moving of micropositioner, make the focus point of femtosecond laser beam in the photoetching colloid, scan by predefined paths, and open optical gate in the precalculated position, make the focus place produce instantaneous superpower light field, cause this place's photoresist two-photon polymerized reaction takes place, and can in developing process subsequently, be remained (negative glue) or be rinsed (positive glue).After the scanning of finishing whole paths, photoresist developed can obtain required microtexture.Therefore, open the resulting congruent point of optical gate at every turn and be minimum article shaped, the bulk of this point has promptly directly been reacted the machining resolution of two-photon microfabrication system.
In existing Fs laser double photon microfabrication system, owing to be subjected to the restriction of diffraction phenomena, its machining resolution is difficult to further raising.At present the numerical aperture that improves microcobjective is arranged usually, adopt the immersion type job operation, reduce incident laser power and shorten the single-point time shutter etc. for improving method that machining resolution takes.Preceding two kinds of methods depend on the device that microcobjective production firm is provided, and numerical aperture of objective has been difficult to continue to improve at present, in fact the two kinds of methods of regulating technological parameter in back can only can't substantially improve the two-photon machining resolution infinitely near the theoretical resolution of existing system.
On the other hand, the pupil filtering method can be improved the imaging resolution characteristic effectively by add special diffraction optical device in light path, improves optical system resolution.Generally, the zones of different of diffraction optical device has different transmitances and phase-shift phase to incident light, plane wave will correspondingly change through amplitude behind this diffractive optical element and phase place, the corresponding variation also will take place in the final focal spot light distribution that obtains through focusing, diffractive optical element be carried out appropriate design can realize that just resolution strengthens.Diffraction optical device generally is divided into pure phase bit-type, net amplitude type and phase amplitude mixed type three classes.The existing pure phase bit-type diffractive optical element that studies confirm that can obtain maximum diffraction efficiency and design freedom, Ando Hideo then further specifies for annular concentric pure phase bit-type diffractive optical element, only strengthen effect (Jpn.J.Appl.Phys through obtaining optimum resolution during the phase place phase difference of pi behind the adjacent area when incident light, 1992,31,557-567).
The pupil filtering method has been widely used in aspects such as CD read and write, confocal microscope, photoetching at present.For example, Chinese patent 200510050520.4 " a kind of diffraction optical element that improves head storage density " has proposed a kind of by concentric two printing opacity bright rings and the diffraction optical element that light tight Crape ring constitutes, it can improve 10-15% with head storage density with dwindling the radial dimension of focal beam spot.Propose in the Chinese patent 200410006359.6 " differential confocal scanning detection method " to improve transverse resolution in the confocal detection by the optical ultra-discrimination diffractive optical element with high spatial resolution.
But the pupil filtering technology of above raising only need consider to improve the resolution of a dimension, and the requirement of focal spot secondary lobe is not strict yet, and the resolution that therefore is not suitable in the double photon three dimension processing improves.In addition, the method for designing of existing iris filter is limited to the small value aperture situation more, need carry out brand-new design during for employing immersion job operation.
Summary of the invention
The objective of the invention is to overcome the shortcoming of prior art, propose a kind of ultra-discrimination diffraction optical device and method for designing thereof that improves two-photon micro-nano machining 3 D resolution.Ultra-discrimination diffraction optical device of the present invention adopts different project organizations under different numerical aperture situations, be positioned over before the microcobjective, can improve the radial and axial resolution of focal beam spot simultaneously, make focal spot side lobe intensity and central intensity attenuation ratio meet the qualification requirement.
The diffraction optical device that the present invention proposes comprises the circular body that outside support and transparent material constitute, and as quartz, optical glass etc., the entire body zone is identical to the transmitance of incident laser.The body surfaces structure forms a plurality of donuts zone through microfabrication, and each donut area thickness difference makes incident laser produce different phase shifts through zones of different.The vertical view of this device main body is a series of donut structures, and the rule of the thickness of each circle ring area is as follows: the thickness difference of adjacent endless belt is 1/2nd incident light wave length λ, and the thickness in two zones of the endless belt of being separated by is identical.This makes that having size through the laser corrugated after the modulation of adjacent loops region is the phase differential of π.Main body endless belt number is generally more than five, it is good more that the many more resolution that may reach of endless belt number strengthen effect, but along with the increase of endless belt number, resolution strengthens raising degree and little, so the selection of endless belt number should and be processed into original consideration in conjunction with difficulty of processing.
In actual applications, the Outside Dimensions of this device main body part is consistent with the microcobjective inlet aperture stop size in the two-photon system of processing, be placed between the microcobjective entrance pupil, carry out the corrugated shaping by collimated laser beam to incident, improve near the light distribution of laser focusing point, can realize the purpose that sharpening focuses on the focal spot main lobe, dwindles main lobe half high half-breadth ratio.And according to two-photon polymerized mechanism, have only light intensity intensity greater than the just possible polymerization reaction take place in the focal spot central area of polymerization threshold value, and the threshold value of generation two-photon reaction is very strong.Therefore under the constant situation of other influence factors such as time shutter, the dimensional resolution of light distribution and number of free radical and final solidified cell is one to one, and the main lobe that has promptly dwindled half high half-breadth is than meaning dwindling of two-photon single-point aggregation features size.
The present invention introduces diffraction optical device in the Fs laser double photon microfabrication system, can break through the resolution limit of original system, improves about 10% on original resolution basis, and the original system structure needs to change hardly.This device surface has only the two-stage bench height, greatly reduces difficulty of processing and has reduced the error that alignment processing brings, and the optimization of resolution enhancer has also been satisfied in this design simultaneously.This device surface endless belt number is about five, and the minimum ring bandwidth is about tens microns, and difficulty of processing is little, cost is low, improves under the little situation than the resolution enhancer of bringing at more endless belt, has good cost performance.
The specific design method of diffraction optical device of the present invention.Key step comprises:
1, determine the femtosecond laser wavelength adopted, the base material refractive index, numerical aperture of objective, inlet aperture stop size, diffraction optical device endless belt number, maximum secondary lobe/main lobe strength ratio, minimum main lobe strength retrogression such as compares at parameter.
Secondary lobe/main lobe strength ratio wherein, the central intensity attenuation ratio all is the curves of light distribution at focal spot central authorities.According to the laser beam characteristic, the curve of light distribution of focal spot central authorities is class Gaussian distribution, and the full width at half maximum value of its main lobe has promptly characterized the laser energy intensity and two-photon polymerized area size takes place.Therefore, the resolution enhancer can recently be represented with the main lobe full width at half maximum of taking the resulting curve of light distribution in super-resolution device front and back.
When determining concrete parameter, should be taken into account that maximum secondary lobe/main lobe strength ratio is excessive and may cause other non-middle section polymerization reaction take place that the main lobe strength retrogression is not enough to cause two-photon polymerized reaction than the too small center light field strength that then may cause.On the other hand, too small maximum secondary lobe/main lobe strength ratio and excessive main lobe strength retrogression are than all causing final resolution to strengthen weakening of effect.Therefore, maximum secondary lobe/main lobe strength ratio is desirable about 0.2, and under the stronger situation of laser power, can retrain main lobe strength retrogression ratio.Choosing then of diffraction optical device endless belt number should take into full account difficulty of processing and cost, in general, diffraction optical device endless belt number is big more, and the result that final optimization pass design obtains is good more, and the result will improve amplitude and will diminish gradually but difficulty of processing and cost will improve greatly.
2, according to determined endless belt number n, each endless belt normalization radius that the diffractive optical element designing institute need be determined is (r
1, r
2R
N-1), 0＜r wherein
1＜...＜r
n＜1.If r
i(i=1,2 ... n-1) it is possible to get value traversal institute every 0.04, (r
1, r
2R
N-1) total 25! / (26-n)! Plant situation.Calculate its concrete secondary lobe/main lobe intensity resolution enhancer when at every kind of situation, can select several groups of optimal result and as the required initial solution of follow-up global optimization approach.
At the concrete computing formula of every kind of situation can referring to (Mathematical and Physical Sciences[J], 1959,253,358-379) and (photon journal [J], 2003,32).
Need the global optimization problem description of finding the solution as follows subsequently, wherein F is the function relevant with the resolution enhancer, under the different designs demand, have multi-form, M
A, M
TBe respectively secondary lobe/main lobe strength ratio axial and radially, M
0Be secondary lobe/main lobe strength ratio upper limit (as 0.2) of setting:
max{F} s.t?M
A＜M
0，M
T＜M
0，0＜r
1＜r
2＜…＜r
n-1＝1
Adopt the global optimization approach (as genetic Optimization Algorithm) of any maturation all can finally obtain the globally optimal solution of each endless belt normalization radius.
3, calculate the globally optimal solution (r of resulting each endless belt normalization radius according to step 2
1R
N-1) promptly determined each girdle radius (R of diffractive optical element in conjunction with object lens inlets diaphragm radius R
i=R*r
i, i=1,2...n-1).The substrate thickness of diffractive optical element does not influence resolution in theory and strengthens effect, but during practical application in order original optical path not to be produced excessive influence, should under the prerequisite that guarantees device strength, adopt thin substrate in conjunction with processing conditions.And to have analyzed the thickness difference of the adjacent endless belt of diffractive optical element be 1/2nd incident light wave length λ in the front.So far just determined the concrete structure of diffraction optical device substantially.
Description of drawings
Fig. 1 is existing Fs laser double photon polymerization process system schematic;
Among the figure, 101 femto-second lasers, 102 light path switch, 103 total reflective mirrors, 104 beam attenuators, 105 beam expanders, 106 microcobjectives, 107 photoresists, 108 micropositioners, 109 condensers, 110 control computer, 111 imaging lens, 112 spectroscopes, 113CCD, 114 supervisory computers;
Fig. 2 is the position view of diffraction optical device in system,
Among the figure, the femtosecond laser beam behind 201 collimator and extenders, 202 diffraction optical devices, 203 microcobjectives;
Fig. 3 is that the resolution of diffraction optical device strengthens principle schematic,
Among the figure, 301 for the laser phase through beam-expanding collimation distributes, and 303 for distributing through the laser phase that produces phase shift behind the diffraction optical device, and 305 is the light distribution of laser after microcobjective focuses on;
Fig. 4 focuses on the intensity distribution function that obtains through microcobjective respectively through diffraction optical device shaping (dotted portion) with without the laser beam (solid line part) of shaping,
Among the figure, 402/401 expression central optical overdamp ratio, the maximum side lobe intensity ratio of 403/402 expression, 404/405 is the resolution enhancer
Fig. 5 is the diffraction optical device structural representation;
Fig. 6 adds resolution enhance device radially respectively and does not add near horizontal, the vertically normalization light distribution focus that diffractive optical element obtains;
Fig. 7 adds three-dimensional resolution enhance device respectively and does not add near horizontal, the vertically normalization light distribution of focus that diffractive optical element obtains.
Embodiment
Further specify the present invention below in conjunction with the drawings and specific embodiments.
Existing Fs laser double photon polymerization process system as shown in Figure 1, behind the laser beam process light path switch 102 that femto-second laser 101 sends, total reflective mirror 103, beam attenuator 104, the beam expander 105, obtain the suitable collimated laser beam of energy, focus on through microcobjective 106 again and cause two-photon polymerized reaction in the photoresist 107, form a polymerization single-point at every turn at the focus place.Control the folding of moving of micropositioner 108 and light path switch 102 again by control computer 110 simultaneously, make the relative photoresist of laser focal spot walk out desired track, can the pointwise polymerization process go out desired three-dimensional structure.In addition, condenser 109, imaging len 111, spectroscope 112, the effect of CCD113 and supervisory computer 114 is to catch current manuscript picture in real time, realizes monitoring in real time.
The application of diffraction optics device of the present invention is to carry out on the basis of system shown in Figure 1.As shown in Figure 2, diffraction optical device 202 is placed on before the microcobjective 106, and the installation site is vertical with systematic optical axis concentric, and device 202 main part Outside Dimensions are consistent with the microcobjective 106 inlet aperture stop sizes in the system of processing.Like this, through the actual modulation of having passed through diffractive optical element 202 earlier before focusing of beam expander 105 collimated laser light bundles.
The structure of diffraction optical device of the present invention as shown in Figure 5, its circular body part is formed by the quartz substrate etching.The body surfaces structure forms a plurality of donuts zone through microfabrication, and the degree of depth difference of zones of different makes incident laser produce different phase shifts through zones of different.As shown in Figure 5, the vertical view of this device main body is a series of donut structures, can find out each annulus thickness alternate from semisectional view, the thickness difference of adjacent endless belt is 1/2nd incident light wave length λ, the thickness in two zones of an endless belt of being separated by is identical, and this makes that having size through the laser corrugated after the modulation of adjacent loops region is the phase differential of π.
The mechanism of action of this diffraction optical device 202 as shown in Figure 3,301 is the femtosecond laser beam initial phase distribution of parallel incident, 303 are the PHASE DISTRIBUTION behind the process diffractive optical element 202, solid line in 305 represents that partly PHASE DISTRIBUTION is 301 the directly light distribution after microcobjective focuses on of laser beam, and dotted portion represents that PHASE DISTRIBUTION is 303 the light distribution of laser beam after microcobjective focuses on.The effect of diffractive optical element 202 is that the laser phase that changes before microcobjective focuses on distributes.
Below, reach radially light distribution main lobe of sharpening, improve the radially purpose of two-photon processing resolution by selecting suitable device architecture parameter.Figure 4 shows that through the laser beam before and after the diffraction optical device shaping, focus on the intensity distribution function that obtains through microcobjective respectively, solid line and dotted line represent to use the intensity distribution function that obtains before and after the diffraction optical device respectively, 402/401 expression central optical overdamp ratio, the maximum side lobe intensity ratio of 403/402 expression, 404/405 is the resolution enhancer.
Two kinds of performances below in conjunction with diffraction optical device of the present invention illustrate method for designing of the present invention.
Use the concrete parameter of experimental system of the present invention to be: femtosecond laser wavelength X=740nm, base material (quartz) refractive index n=1.458, numerical aperture of objective NA=0.56, inlet diaphragm diameter=8mm, diffraction optical device endless belt number m=5.Limit radially secondary lobe/main lobe strength ratio less than M
0=0.25, the main lobe strength retrogression than S greater than S
0=0.3.
Because used numerical aperture of objective is less, can determine each light distribution parameter and each endless belt normalization radius r according to scalar diffraction theory
jBetween relational expression.Optimization aim is r
j, majorized function is F (r
j)=max{G
T, M
T＜M
0, S＞S
0, 0＜r
1＜r
2＜...＜r
n=1.Earlier traversal 25! / (26-n)! Plant possible (r
1, r
2R
N-1) situation, respectively every kind of situation is calculated F, M
T, all results are sorted, optimize the initial solution of best several situations as global optimization approach.Each endless belt normalization radius that utilizes global optimization approach finally to determine subsequently is r
1=0.328, r
2=0.4, r
3=0.518, r
4=0.655, radial resolution enhancer G
T=130.3%, radially, axial maximum side lobe intensity/main lobe strength ratio is respectively 3.7%, 33.6%, the central intensity attenuation ratio is 32.9%.Determined diffraction optical device structural representation as shown in Figure 5, thickness of detector Δ h=10 μ m wherein, device main body radius r=6mm, the two stage steps difference in height Δ d=851.53nm of diffraction optical device body surfaces.
In the two-photon system of processing, use before and after the above super-resolution device light intensity normalization comparison diagram as shown in Figure 6, wherein dotted line represents to have used the super-resolution device.As seen this device focal spot radially main lobe sharpening is arranged, and effective to Sidelobe Suppression, can play two-photon and process radially resolution humidification.
Embodiment 2
Use the concrete parameter of experimental system of the present invention to be: femtosecond laser wavelength X=740nm, base material (quartz) refractive index n=1.458, numerical aperture of objective NA=1.3, inlet diaphragm diameter=8mm, diffraction optical device endless belt number m=5.Limit radially, axial secondary lobe/main lobe strength ratio M
T, M
AAll less than M
0=0.25, main lobe strength retrogression ratio is greater than S
0=0.18.
Owing to used the immersion object lens of large-numerical aperture, need determine each light distribution parameter and each endless belt normalization radius r according to Vector Diffraction Theory
jBetween relational expression.Optimization aim is r
j, majorized function is F (r
j)=max{G
AG
T, M
A＜M
0, M
T＜M
0, S＞S
0, 0＜r
1＜r
2＜...＜r
n=1.Earlier traversal 25! / (26-n)! Plant possible (r
1, r
2R
N-1) situation, respectively every kind of situation is calculated F, M
A, M
T, all results are sorted, optimize the initial solution of best several situations as global optimization approach.Utilize global optimization approach to determine that finally each endless belt normalization radius is r then
1=0.25, r
2=0.33, r
3=0.43, r
4=0.49, radially, the axial resolution enhancer is respectively 111.3%, 108.2%, radially, axial maximum side lobe intensity ratio is respectively 24.9%, 6.4%, the central intensity attenuation ratio is 18%.Determined diffraction optical device structural representation as shown in Figure 5, thickness of detector Δ h=10 μ m wherein, device main body radius r=6mm, the two stage steps difference in height Δ d=851.53nm of diffraction optical device body surfaces.
In the two-photon system of processing, use before and after the above super-resolution device light intensity normalization comparison diagram as shown in Figure 6, wherein dotted line represents to have used the super-resolution device.As seen the radial and axial main lobe of this device focal spot all has sharpening, and effective to Sidelobe Suppression, can play two-photon machining 3 D resolution humidification.
Claims (4)
1. a three-dimensional ultra-discrimination diffraction optical device that is used for the two-photon microfabrication comprises the circular body that outside support and transparent material constitute, and it is characterized in that: body surfaces has a plurality of donuts zone, each donut area thickness difference; The rule of the thickness of each circle ring area is as follows: the thickness difference of adjacent endless belt is 1/2nd incident light wave length λ, and the thickness difference of adjacent ring region makes the used femtosecond laser of two-photon polymerized processing see through the back respectively and produces the big or small phase differential of π that is; The thickness in two zones of an endless belt of being separated by is identical, and the main part Outside Dimensions is consistent with the microcobjective inlet diaphragm in the two-photon system of processing.
2. the three-dimensional ultra-discrimination diffraction optical device that is used for the two-photon microfabrication as claimed in claim 1 is characterized in that: main part is made of same light transmissive material, and the entire body zone is identical to the transmitance of incident light.
3. the three-dimensional ultra-discrimination diffraction optical device that is used for the two-photon microfabrication as claimed in claim 1, it is characterized in that: this diffraction optical device (202) be placed in the two-photon system of processing microcobjective (106) before, the installation site is vertical with systematic optical axis concentric, and diffraction optical device (202) main part Outside Dimensions is consistent with microcobjective (106) inlet aperture stop size.
4. the method for designing that is used for the three-dimensional ultra-discrimination diffraction optical device of two-photon microfabrication as claimed in claim 1 is characterized in that comprising following concrete steps:
(1) determine the femtosecond laser wavelength adopted, the base material refractive index, numerical aperture of objective, inlet aperture stop size, diffraction optical device endless belt number, maximum secondary lobe/main lobe strength ratio, minimum main lobe strength retrogression such as compares at parameter;
(2) according to determined parameter and device endless belt number n, by to 25! / (26-n)! The kind situation travels through and obtains initial feasible solution, and operation global optimization computation program is carried out next step optimization;
(3) output diffraction optical device structural parameters
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| CN1209599C (en) * | 2004-02-27 | 2005-07-06 | 哈尔滨工业大学 | Differential confocal scanning detection method with high spatial resolution |
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